JPH0327883A - Manufacture of aluminum alloy clad plate with crystal assembly azimuth controlled - Google Patents

Manufacture of aluminum alloy clad plate with crystal assembly azimuth controlled

Info

Publication number
JPH0327883A
JPH0327883A JP16129189A JP16129189A JPH0327883A JP H0327883 A JPH0327883 A JP H0327883A JP 16129189 A JP16129189 A JP 16129189A JP 16129189 A JP16129189 A JP 16129189A JP H0327883 A JPH0327883 A JP H0327883A
Authority
JP
Japan
Prior art keywords
aluminum alloy
clad plate
rolling
alloy
less
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP16129189A
Other languages
Japanese (ja)
Other versions
JP2687597B2 (en
Inventor
Akihiko Takahashi
明彦 高橋
Hitoshi Yasuda
均 安田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Chemical Co Ltd
Original Assignee
Sumitomo Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Chemical Co Ltd filed Critical Sumitomo Chemical Co Ltd
Priority to JP1161291A priority Critical patent/JP2687597B2/en
Publication of JPH0327883A publication Critical patent/JPH0327883A/en
Application granted granted Critical
Publication of JP2687597B2 publication Critical patent/JP2687597B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Abstract

PURPOSE:To obtain an aluminum alloy plate having a different crystal aggregate azimuth in the thickness direction of the plate by changing dimension of a cyrstallization or a deposit of an additional alloy element and changing recrystallization behavior of an aluminum alloy. CONSTITUTION:Dimensions of a crystallization becomes large when a cooling speed at the time of solidification of an Al alloy is decreased, and become small when the cooling speed is increased. Dimension of a deposite can be varied extending from a particle size of several mum or above to a complete solid solution state by quenching and an artificial aging treatment. As for clad rolling for superposing an Al alloy plate in which the crystallization or the deposit whose dimensions are large exceeding 1mum on an average exits, and an Al alloy plate in which that which is small being less than 1mum on an average, a regular method is used. In such a way, in the same alloy plate, a different crystal assembly azimuth is obtained.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、異なった結晶集合方位をもつ板を重ね合せた
構造を有するアルミニウム合金クラッド板の製造方法に
関するものであり、スパッタリング用ターゲットに用い
ることができる。
[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to a method for manufacturing an aluminum alloy clad plate having a structure in which plates having different crystal orientations are stacked, and is used as a sputtering target. be able to.

〔従来の技術〕[Conventional technology]

電子産業の発展とともに、ICやLSIの需要が増加し
ている。これ等の素子に用いられる配線は、高純度アル
ミニウムまたはその合金をターゲットとして、スパッタ
リングにより薄膜化して用いられるのが主である。
With the development of the electronics industry, demand for ICs and LSIs is increasing. The wiring used in these devices is mainly made into a thin film by sputtering using high-purity aluminum or an alloy thereof as a target.

溶融金属の蒸発による蒸着注とは異なり、スパッタ法で
はターゲットの表面および内部の結晶構造がターゲット
からの原子の放出特性に大きな影響を与えることが知ら
れている。
Unlike vapor deposition by evaporating molten metal, it is known that in the sputtering method, the surface and internal crystal structure of the target has a large effect on the characteristics of emitting atoms from the target.

そこで、高純度アルミニウムまたはその合金のターゲッ
トは、結晶方位の影響を避けるため微細でしかも結晶方
位がランダムになるように製造されてきた。しかしなが
ら、スパッタリングによりターゲットが消耗し、その形
状が変化して放出特性が変化するが、このような放出特
性の変化を避けるためには、結晶方位がランダムである
よりは特定の分布を持った集合方位であることが好まし
い場合もあるということが判明した。
Therefore, targets of high-purity aluminum or its alloys have been manufactured to be fine and have random crystal orientations in order to avoid the influence of crystal orientation. However, sputtering wears out the target, changing its shape and changing its emission characteristics.In order to avoid such changes in emission characteristics, it is better to use a set of crystals with a specific distribution rather than a random crystal orientation. It has been found that in some cases it is preferable to be azimuth.

〔発明が解決しようとする課題〕[Problem to be solved by the invention]

板の厚さ方向に結晶集合方位が異なるアルミニウム合金
板を得る為には異なった結晶方位を有する単結晶板や特
定集合方位を有する板を重ね合わせてクラッド圧延によ
る方法が用いられるが、単結晶板や特定集合方位の板を
得ることは容易ではなく、またクラッド圧延時の塑性加
工や加熱により、もとの結晶組織が変化してしまい、こ
れまでは充分満足できるものを得ることができなかった
In order to obtain an aluminum alloy plate with different crystal orientations in the thickness direction of the plate, a method is used in which single crystal plates with different crystal orientations or plates with a specific aggregate orientation are stacked and clad rolled. It is not easy to obtain a plate or a plate with a specific collective orientation, and the original crystal structure changes due to plastic processing and heating during clad rolling, so it has not been possible to obtain a plate that is fully satisfactory until now. Ta.

〔課題を解決する為の手段〕[Means to solve problems]

かかる事情に鑑み、本発明者らは結晶集合方位の異なる
板が重なり合った構造の合金板の製造方法について鋭意
検討を行った結果、アルミニウムに添加した合金元素の
晶出物や析出物の寸法を変えたアルミニウム合金板を重
ね合せて、特定の圧下率と圧延温度でクラッド圧延し、
あるいは圧延後に熱処理を施すことにより、異なった結
晶集合方位が重なり合った構造をもつアルミニウム合金
板が容易に得られる事を見出した。
In view of these circumstances, the inventors of the present invention have conducted intensive studies on a method for producing an alloy plate having a structure in which plates with different crystal orientations overlap. The different aluminum alloy plates are stacked together and clad rolled at a specific rolling reduction rate and rolling temperature.
Alternatively, it has been found that an aluminum alloy plate having a structure in which different crystal orientations overlap can be easily obtained by heat-treating after rolling.

すなわち、本発明は同一組威で、添加合金元素の晶出物
や析出物の寸法が異なる2枚以上のアルミニウム合金板
を重ね合せる圧延において、圧延時の塑性加工量および
温度を制御することにより、添加合金元素の晶出物や析
出物の寸法が大きい合金板においては不連続再結晶が生
じ、添加合金元素の晶出物や析出物の寸法が小さい合金
板においては不連続再結晶が生じないか、あるいは生じ
ても部分的か、または連続再結晶させることを特徴とす
るアルミニウム合金クラッド板の製造方l去に関するも
のであり、添加合金元素の晶出物あるいは析出物の寸法
を変えることにより、アルミニウム合金の再結晶挙動を
変え、板の厚さ方向で異なった結晶集合方位を有するア
ルミニウム合金板を得るものである。
That is, the present invention has the advantage of controlling the plastic working amount and temperature during rolling in rolling of two or more aluminum alloy plates of the same assembly but having different sizes of crystallized substances or precipitates of added alloying elements. Discontinuous recrystallization occurs in alloy plates with large crystallized or precipitated additive alloying elements, and discontinuous recrystallization occurs in alloy plates with small crystallized or precipitated additive alloying elements. This relates to a method for producing an aluminum alloy clad plate characterized by no recrystallization, or partial or continuous recrystallization, and changing the dimensions of crystallized or precipitated substances of added alloying elements. By changing the recrystallization behavior of the aluminum alloy, an aluminum alloy plate having different crystal aggregation orientations in the thickness direction of the plate can be obtained.

以下本発明を詳細に説明する。The present invention will be explained in detail below.

アルミニウムに添加する合金元素としては、アルミニウ
ムとの固溶範囲を有することが必要であり、たとえばS
i, Cu. Ti. Cr, W, Mo, Mg等
を単独に添加したり、あるいはこれらのいくつかを複数
添加したものが用いられる。
The alloying element added to aluminum must have a solid solubility range with aluminum; for example, S
i, Cu. Ti. Cr, W, Mo, Mg, etc. may be added singly or a plurality of these may be added.

添加元素量は、アルミニウムと添加元素との平衡状態図
からその範囲が決められるが、現実には添加元素は必ず
しも平衡的に存在するとは限らず好ましい成分範囲はも
う少し広くなる。たとえば、Siでは0.2〜2.0重
量%、Cuは0.2〜6.0重量%の範囲が好ましく、
それぞれ単独に、または両者を同時に添加すことができ
る。
The range of the amount of added elements is determined based on the equilibrium phase diagram between aluminum and the added elements, but in reality, the added elements do not necessarily exist in equilibrium, and the preferable range of components is a little wider. For example, Si is preferably in a range of 0.2 to 2.0% by weight, and Cu is preferably in a range of 0.2 to 6.0% by weight.
Each can be added individually or both can be added at the same time.

添加元素の晶出物あるいは析出物の寸l去を変える方広
は、通常の方法を用いることができ、たとえば晶出物の
寸法はアルミニウム合金の凝固時の冷却速度を遅くする
と大きくなり、冷却速度を早くすると小さくなる、とい
う方法が適用できる。
To change the size of crystallized substances or precipitates of added elements, a conventional method can be used.For example, the size of crystallized substances increases by slowing the cooling rate during solidification of an aluminum alloy, A method can be applied in which increasing the speed reduces the size.

析出物の寸法は、焼入れおよび人工時効処理により数μ
m以上の粒径から完全な固冶状態まで変化させることが
できる。
The size of the precipitates is reduced to several micrometers by quenching and artificial aging treatment.
It is possible to change the particle size from m or more to a completely solidified state.

晶出物または析出物の寸法がlμm以上の大きなものが
存在するアルミニウム合金板と、lμm未満の小さなも
のが存在するアルミニウム合金板とを重ね合わせるクラ
ッド圧延は通常の方l去が用いられる。晶出物または析
出物の寸法が異なるアルミニウム合金板を重ね合せてク
ラッド圧延をおこなうとき、全て同一組織となってしま
わないために以下の条件で圧延をおこなう必要がある。
A conventional method is used for clad rolling in which an aluminum alloy plate in which large crystallized substances or precipitates of 1 μm or more are present and an aluminum alloy plate in which small crystallized substances or precipitates of less than 1 μm are present are superimposed. When clad rolling is performed by stacking aluminum alloy plates having different sizes of crystallized substances or precipitates, it is necessary to carry out rolling under the following conditions in order to prevent them from forming the same structure.

つまり、クラッド圧延において圧下率は好ましくは15
%以上75%以下であり、圧延温度は250℃以上42
5℃以下が好ましい。
In other words, the rolling reduction ratio in clad rolling is preferably 15
% or more and 75% or less, and the rolling temperature is 250°C or more and 42
The temperature is preferably 5°C or lower.

250℃以下でクラッド圧延をおこなった後2 5 0
 ℃以上425℃以下で熱処理をおこなうことも有効で
ある。
After clad rolling at 250℃ or less 250
It is also effective to perform heat treatment at a temperature of 425°C or higher.

このような処理により同一合金板内で異なった結晶集合
方位が得られる。またアルミニウム合金の再結晶特性は
、添加合金元素の量や晶出物または析出物の寸法、塑性
加工量、加熱温度等により下記のようになる事が知られ
ている。
Through such treatment, different crystal aggregation orientations can be obtained within the same alloy plate. It is also known that the recrystallization characteristics of aluminum alloys vary as shown below depending on the amount of added alloying elements, the dimensions of crystallized substances or precipitates, the amount of plastic working, the heating temperature, etc.

(イ)不連続再結晶゜゜“゜・再結晶集合組織(口)連
続再結晶 ・゛゛加工集合類似組織(ハ)未再結晶  
゛゜゛  加工集合組織(“アルミニウム材料の基礎と
工業技術”軽金属協会編 p . 113(1985)
)このような現象の臨界寸法として粒径lμm以上であ
れば(イ)が、未満であれば(口)や(ハ)が生じるも
のと考えられる。
(a) Discontinuous recrystallization゜゜“゜・Recrystallization texture (mouth) Continuous recrystallization ・゛゛Working texture similar texture (c) Unrecrystallized
゛゜゛ Processed Texture (“Basics and Industrial Technology of Aluminum Materials” edited by the Light Metals Association, p. 113 (1985)
) If the grain size is 1 μm or more as the critical dimension for such a phenomenon, then (a) will occur, and if it is less than that, (c) or (c) will occur.

〔実施例〕〔Example〕

以下本発明を実施例により説明するが、本発明はこれ等
に限定されるものではない。
The present invention will be explained below with reference to Examples, but the present invention is not limited thereto.

実施例l Siを0.8%、Cuを2.0%含有した純度99. 
99%のアルミニウム合金板( 50x 200x 2
00mm) 2枚を520℃でlOHr均熱処理後、直
ちに水冷した。水冷後2枚のうち1枚を400℃で5H
r人工時効処理をおこない、SiとAI.Cuの析出物
を有する合金板を得た。
Example 1 Purity 99. containing 0.8% Si and 2.0% Cu.
99% aluminum alloy plate (50x 200x 2
00 mm) The two sheets were soaked in lOHr at 520° C. and immediately cooled with water. After cooling with water, one of the two sheets was heated to 400℃ for 5 hours.
rArtificial aging treatment is performed, and Si and AI. An alloy plate having Cu precipitates was obtained.

析出物の寸法は、試料の一部を切り取り研磨後フッ酸に
より軽くエッチングして析出物を顕出し、金属顕微鏡に
より測定した結果、平均3μmであった。それぞれの板
の重ね合わせる面をワイヤーブラシで粗面化し、350
℃の温度で圧下率60%でクラッド圧延をおこなった。
The size of the precipitates was determined by cutting out a part of the sample, polishing it, lightly etching it with hydrofluoric acid to reveal the precipitates, and measuring the size using a metallurgical microscope. The average size was 3 μm. Roughen the overlapping surfaces of each board with a wire brush, and
Cladding rolling was performed at a temperature of 0.degree. C. and a reduction ratio of 60%.

得られたクラッド板から結晶方位測定用のサンプルを切
出し、両面の結晶方位を極点図から求めた結果、均熱処
理後水冷し、その後人工時効処理を施した板の表面側は
(1001を中心とする再結晶の集合組織であり、均熱
処理後水冷のままの板の表面側はillO )を中心と
する熱間圧延の集合組織であった。
A sample for crystal orientation measurement was cut out from the obtained clad plate, and the crystal orientation on both sides was determined from the pole figure. As a result, the surface side of the plate, which was soaked, water-cooled, and then artificially aged, was (centered on 1001). The surface side of the plate that had been water-cooled after the soaking treatment had a hot rolling texture centered on illO2.

実施例2 Siを0.8%、Cuを1.0%含有した純度99. 
99%のアルミニウム合金板( 10 X 200 x
 200 mm)を2枚鋳造した。鋳造組織を実施例1
と同様にして金属顕微鏡により測定した結果、析出物の
平均粒径は10μmであった。該鋳造板のうち1枚を5
25℃でlOh『の均熱処理後水焼入れをおこなった。
Example 2 Purity 99.0 containing 0.8% Si and 1.0% Cu.
99% aluminum alloy plate (10 x 200 x
200 mm) were cast. Example 1 of casting structure
As a result of measurement using a metallurgical microscope in the same manner as above, the average particle size of the precipitates was 10 μm. One of the cast plates is 5
Water quenching was performed after soaking at 25°C for lOh.

これを金属顕微鏡観察したところ100倍では晶析物や
析出物は観察されなかった。
When this was observed under a metallurgical microscope, no crystallized substances or precipitates were observed under 100x magnification.

これら2枚の板の重ね合わせる面を旋盤にて而削した後
、ワイヤーブラシで粗面化しクラッド圧延した。圧延温
度は300℃で圧下率は60%であった。
The overlapping surfaces of these two plates were ground with a lathe, roughened with a wire brush, and clad rolled. The rolling temperature was 300°C and the reduction ratio was 60%.

得られたクラッド板から結晶方位測定用のサンプルを切
出し、両面の結晶方位を極点図から求めた結果、鋳造の
ままの板では表面が[1001 に平行な再結晶の集合
方位で鋳造後均熱処理をして水焼入れをおこなった板の
表面は+1101 に平行な圧延の集合方位を示し、板
の厚さ方向に重なった集合方位を有しているのが認めら
れた。
A sample for crystal orientation measurement was cut from the obtained clad plate, and the crystal orientation on both sides was determined from the pole figure. As a result, the surface of the as-cast plate had a recrystallization collection orientation parallel to [1001] and was soaked after casting. It was observed that the surface of the plate subjected to water quenching in the same manner as shown in FIG.

実施例3 実施例lにおいて、圧延温度を150゜Cとし、圧下率
を55.%に変えた以外はすべて同様にしてクラッド板
を得た。得られたクラッド板を350℃でlO分間熱処
理後、結晶方位測定用のサンプルを切出し、両面の結晶
方位を極点図から求めた結果、均熱処理後水冷し、その
後人工時効処理を施した板の表面は+100 1 を中
心とする再結晶の集合組織であり、均熱処理後水冷まで
の板の表面は[1101を中心とする熱間圧延の集合組
織であった。
Example 3 In Example 1, the rolling temperature was 150°C and the rolling reduction was 55. A clad plate was obtained in the same manner except that the percentage was changed. After heat-treating the obtained clad plate at 350°C for 10 minutes, a sample for crystal orientation measurement was cut out, and the crystal orientation on both sides was determined from the pole figure. The surface had a recrystallized texture centered on +100 1 , and the surface of the plate after soaking until water cooling had a hot rolled texture centered on [1101].

比較例1 実施例lにおいて、圧下率を80%に変えた以外はすべ
て同様にした結果、両面ともttoo + を中心とす
る再結晶の集合組織であった。
Comparative Example 1 The same procedure as in Example 1 was carried out except that the rolling reduction was changed to 80%. As a result, both surfaces had a recrystallized texture centered on ttoo + .

比較例2 実施例lにおいて、圧延温度を450℃に変えた以外は
すべて同様にした結果、両面ともt1001を中心とす
る再結晶の集合組織であった。
Comparative Example 2 The same procedure as in Example 1 was repeated except that the rolling temperature was changed to 450° C. As a result, both surfaces had a recrystallized texture centered on t1001.

比較例3 実施例3において、圧延温度を200℃に変えた以外は
すべて同様にしてクラッド板を得た。得られたクラッド
板を熱処理せず、結晶方位測定用のサンプルを切出し、
両面の結晶方位を極点図から求めた結果、両面とも(1
101を中心とする熱間圧延の集合組織であった。
Comparative Example 3 A clad plate was obtained in the same manner as in Example 3 except that the rolling temperature was changed to 200°C. The obtained clad plate was not heat-treated, and samples for crystal orientation measurement were cut out.
As a result of finding the crystal orientation of both sides from the pole figure, both sides are (1
It had a hot-rolled texture centered around 101.

〔発明の効果〕〔Effect of the invention〕

本発明によれば厚さ方向で集合結晶方位の異なる結晶方
位制御クラッド板を通常の圧延方法にて容易に得ること
ができる。
According to the present invention, a crystal orientation controlled clad plate having different collective crystal orientations in the thickness direction can be easily obtained by a normal rolling method.

手続補正冑(自発)Procedure correction helmet (voluntary)

Claims (6)

【特許請求の範囲】[Claims] (1)同一組成で、添加合金元素の晶出物や析出物の寸
法が異なる2枚以上のアルミニウム合金板を重ね合せる
圧延において、圧延時の塑性加工量および温度を制御す
ることにより、添加合金元素の晶出物や析出物の寸法が
大きい合金板においては不連続再結晶が生じ、添加合金
元素の晶出物や析出物の寸法が小さい合金板においては
不連続再結晶が生じないか、あるいは生じても部分的か
、または連続再結晶させることを特徴とするアルミニウ
ム合金クラッド板の製造方法。
(1) When rolling two or more aluminum alloy plates of the same composition but with different sizes of crystallized or precipitated additive alloy elements, the additive alloy Does discontinuous recrystallization occur in alloy plates with large crystallized or precipitated elements, and does discontinuous recrystallization occur in alloy plates with small crystallized or precipitated elements of added alloying elements? Alternatively, a method for producing an aluminum alloy clad plate, characterized in that recrystallization is carried out partially or continuously even if it occurs.
(2)同一組成で、添加合金元素の晶出物や析出物の寸
法が異なる2枚以上のアルミニウム合金板を重ね合せる
合金クラッド板の製造方法において、各アルミニウム合
金板が共に不連続再結晶を生じない塑性加工量および温
度にてクラッド圧延後、添加合金元素の晶出物や析出物
の寸法の大きい合金板でのみ不連続再結晶が生じる温度
で熱処理することを特徴とするアルミニウム合金クラッ
ド板の製造方法。
(2) In a method for producing an alloy clad plate in which two or more aluminum alloy plates of the same composition but with different sizes of crystallized substances or precipitates of added alloying elements are stacked together, each aluminum alloy plate undergoes discontinuous recrystallization. An aluminum alloy clad plate characterized in that after clad rolling at a temperature and amount of plastic deformation that does not occur, heat treatment is performed at a temperature that causes discontinuous recrystallization only in alloy plates with large crystallized or precipitated crystals of added alloying elements. manufacturing method.
(3)特許請求の範囲第1項記載のアルミニウム合金ク
ラッド板の製造方法において、圧下率が15%以上75
%以下で、クラッド圧延温度が250℃以上425℃以
下であることを特徴とするアルミニウム合金クラッド板
の製造方法。
(3) In the method for manufacturing an aluminum alloy clad plate according to claim 1, the rolling reduction is 15% or more.
% or less, and the clad rolling temperature is 250°C or more and 425°C or less.
(4)特許請求の範囲第2項記載のアルミニウム合金ク
ラッド板の製造方法において、圧下率が15%以上75
%以下で、クラッド圧延温度が250℃未満であり、圧
延後の熱処理温度が250℃以上425℃以下であるこ
とを特徴とするアルミニウム合金クラッド板の製造方法
(4) In the method for manufacturing an aluminum alloy clad plate according to claim 2, the rolling reduction is 15% or more.
% or less, the clad rolling temperature is less than 250°C, and the heat treatment temperature after rolling is 250°C or more and 425°C or less.
(5)特許請求の範囲第1項および第2記項載のアルミ
ニウム合金クラッド板の製造方法において、添加合金の
晶出物や析出物の寸法の大きいものが粒径1μm以上で
あり、小さいものが粒径1μm未満または固溶状態であ
ることを特徴とするアルミニウム合金クラッド板の製造
方法。
(5) In the method for manufacturing an aluminum alloy clad plate according to claims 1 and 2, the large crystallized or precipitated particles of the additive alloy have a particle size of 1 μm or more, and the small ones have a particle size of 1 μm or more. A method for producing an aluminum alloy clad plate, characterized in that the particles have a particle size of less than 1 μm or are in a solid solution state.
(6)特許請求の範囲第1項および第2項記載のアルミ
ニウム合金クラッド板の製造方法において、添加成分元
素が0.2〜2.0%のSiか、0.2〜6.0%のC
uか、または0.2〜2.0%のSiと0.2〜6.0
%のCuであることを特徴とするアルミニウム合金クラ
ッド板の製造方法。
(6) In the method for manufacturing an aluminum alloy clad plate according to claims 1 and 2, the additional component element is 0.2 to 2.0% Si or 0.2 to 6.0% Si. C
u or 0.2-2.0% Si and 0.2-6.0
% of Cu.
JP1161291A 1989-06-23 1989-06-23 Method for producing aluminum alloy clad plate with controlled crystal aggregation direction Expired - Fee Related JP2687597B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1161291A JP2687597B2 (en) 1989-06-23 1989-06-23 Method for producing aluminum alloy clad plate with controlled crystal aggregation direction

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1161291A JP2687597B2 (en) 1989-06-23 1989-06-23 Method for producing aluminum alloy clad plate with controlled crystal aggregation direction

Publications (2)

Publication Number Publication Date
JPH0327883A true JPH0327883A (en) 1991-02-06
JP2687597B2 JP2687597B2 (en) 1997-12-08

Family

ID=15732319

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1161291A Expired - Fee Related JP2687597B2 (en) 1989-06-23 1989-06-23 Method for producing aluminum alloy clad plate with controlled crystal aggregation direction

Country Status (1)

Country Link
JP (1) JP2687597B2 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002332506A (en) * 2001-05-07 2002-11-22 Central Res Inst Of Electric Power Ind Structure material having function of suppressing propagation of cracking
CN106583467A (en) * 2016-12-30 2017-04-26 西南铝业(集团)有限责任公司 Hot rolling process method for 2050 alloy cast ingot

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002332506A (en) * 2001-05-07 2002-11-22 Central Res Inst Of Electric Power Ind Structure material having function of suppressing propagation of cracking
JP4591985B2 (en) * 2001-05-07 2010-12-01 財団法人電力中央研究所 Structural material
CN106583467A (en) * 2016-12-30 2017-04-26 西南铝业(集团)有限责任公司 Hot rolling process method for 2050 alloy cast ingot

Also Published As

Publication number Publication date
JP2687597B2 (en) 1997-12-08

Similar Documents

Publication Publication Date Title
JP2857015B2 (en) Sputtering target made of high-purity aluminum or its alloy
EP0281141B2 (en) Sputtering target
JP4593475B2 (en) Tantalum sputtering target
JPH04246170A (en) Aluminum target for magnetron spattering and method of its manufacture
JP2003500546A (en) Copper sputter target assembly and method of manufacturing the same
KR20040044481A (en) Silver alloy sputtering target and process for producing the same
KR900007975B1 (en) Aluminium alloy substrate for disk having superior suitability to plating
US6197134B1 (en) Processes for producing fcc metals
US5256202A (en) Ti-A1 intermetallic compound sheet and method of producing same
JP3079378B1 (en) Mo sputtering target material and method of manufacturing the same
JP2001026860A (en) Co-Pt-B BASE TARGET AND ITS PRODUCTION
JP6427290B1 (en) Aluminum alloy substrate for magnetic disk, method of manufacturing the same, and magnetic disk using the aluminum alloy substrate for magnetic disk
JP2671397B2 (en) Target for magnetron sputtering
JPH0327883A (en) Manufacture of aluminum alloy clad plate with crystal assembly azimuth controlled
JPH10195611A (en) Fcc metal in which crystal orientation is regulated and its production
JPH0756067B2 (en) Method for manufacturing aluminum foil
JP2712561B2 (en) Aluminum target for sputtering
JPH03120332A (en) Aluminum foil and its manufacture
JP5871106B2 (en) In alloy sputtering target, manufacturing method thereof, and In alloy film
JP3710009B2 (en) Aluminum alloy plate for magnetic disk substrate and manufacturing method thereof
JPH0864554A (en) Sputtering target material for forming thin film of thin film transistor
JPH10195610A (en) Fcc metal in which crystal orientation is regulated and its production
JPS6059982B2 (en) Method for manufacturing aluminum foil for electrolytic capacitor electrodes
JP2901854B2 (en) High purity titanium sputtering target
JPH0978168A (en) Aluminum alloy sheet

Legal Events

Date Code Title Description
S531 Written request for registration of change of domicile

Free format text: JAPANESE INTERMEDIATE CODE: R313531

S533 Written request for registration of change of name

Free format text: JAPANESE INTERMEDIATE CODE: R313533

R350 Written notification of registration of transfer

Free format text: JAPANESE INTERMEDIATE CODE: R350

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20070822

Year of fee payment: 10

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20080822

Year of fee payment: 11

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20080822

Year of fee payment: 11

RD05 Notification of revocation of power of attorney

Free format text: JAPANESE INTERMEDIATE CODE: R3D05

LAPS Cancellation because of no payment of annual fees