JPH03269812A - Thin film laminated structure of thin-film magnetic head - Google Patents
Thin film laminated structure of thin-film magnetic headInfo
- Publication number
- JPH03269812A JPH03269812A JP6731590A JP6731590A JPH03269812A JP H03269812 A JPH03269812 A JP H03269812A JP 6731590 A JP6731590 A JP 6731590A JP 6731590 A JP6731590 A JP 6731590A JP H03269812 A JPH03269812 A JP H03269812A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- magnetic pole
- thin film
- pole layer
- throat height
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000010409 thin film Substances 0.000 title claims description 32
- 239000000758 substrate Substances 0.000 claims abstract description 8
- 230000000630 rising effect Effects 0.000 claims abstract description 6
- 229910010272 inorganic material Inorganic materials 0.000 claims description 14
- 239000011147 inorganic material Substances 0.000 claims description 14
- 239000011368 organic material Substances 0.000 claims description 7
- 239000011347 resin Substances 0.000 abstract description 13
- 229920005989 resin Polymers 0.000 abstract description 13
- 238000000034 method Methods 0.000 abstract description 11
- 238000000992 sputter etching Methods 0.000 abstract description 10
- 239000000463 material Substances 0.000 abstract description 9
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 abstract description 5
- 238000004544 sputter deposition Methods 0.000 abstract description 4
- 230000015572 biosynthetic process Effects 0.000 abstract description 3
- 230000003247 decreasing effect Effects 0.000 abstract 1
- 239000010410 layer Substances 0.000 description 82
- 230000000087 stabilizing effect Effects 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 4
- 239000004020 conductor Substances 0.000 description 3
- 238000004380 ashing Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 230000000903 blocking effect Effects 0.000 description 1
- 230000002542 deteriorative effect Effects 0.000 description 1
- 238000010292 electrical insulation Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 239000000615 nonconductor Substances 0.000 description 1
- 239000011241 protective layer Substances 0.000 description 1
- 230000002040 relaxant effect Effects 0.000 description 1
- 238000007790 scraping Methods 0.000 description 1
Landscapes
- Magnetic Heads (AREA)
Abstract
Description
【発明の詳細な説明】
〔概 要〕
薄膜磁気ヘッドの薄膜層の積層構構造に関し、特にその
製造の安定化構造に関し、
スロートハイトの長さの安定化に寄与する薄膜磁気ヘッ
ドの薄膜積層構造の提供を目的とし、薄膜磁気ヘッドに
おける薄膜層の積層構造であって、対磁極を成す２つの
磁極層のうちのスライダー基板に近い側の一方の磁極層
と、他方の磁極層の各先端スロートハイト間のギャップ
を維持、形成する無機材料層の平坦領域部（Ａ）から立
上っている領域部と、前記一方の磁極層との間に、該一
方の磁極層の段差を軽減するための有機材料層を形成さ
せたことを具備するよう構成する。[Detailed Description of the Invention] [Summary] Regarding the laminated structure of thin film layers of a thin film magnetic head, particularly regarding the stabilizing structure of its manufacturing, a thin film laminated structure of a thin film magnetic head that contributes to stabilizing the throat height length. The purpose is to provide a laminated structure of thin film layers in a thin film magnetic head, in which one of the two magnetic pole layers forming opposite magnetic poles is one magnetic pole layer on the side closer to the slider substrate, and each tip throat of the other magnetic pole layer. To reduce the level difference in the one magnetic pole layer between the area rising from the flat area (A) of the inorganic material layer that maintains and forms the gap between heights and the one magnetic pole layer. The organic material layer is formed.
本発明は薄膜磁気ヘッドの薄膜層の積層構造に関し、特
にその製造の安定化構造に関する。The present invention relates to a laminated structure of thin film layers of a thin film magnetic head, and more particularly to a structure for stabilizing its manufacture.
従来において、薄膜磁気ヘッドの薄膜層の形成に際し、
基板上に下部磁極層を形成し、その上にギャップ層をス
パッタリングによって形成した後、コイル層を形成する
ための平面を確保すべく、即ち、ギャップ層の形成され
た下部磁極層の段差を軽減、緩和すべく、樹脂材から威
る電気絶縁層を形成させる。そして、この電気絶縁層の
先端位置から、上部磁極層が立ち上がる様に形成される
。Conventionally, when forming the thin film layer of a thin film magnetic head,
After forming a lower magnetic pole layer on a substrate and forming a gap layer thereon by sputtering, in order to secure a flat surface for forming a coil layer, in other words, the step difference in the lower magnetic pole layer on which the gap layer is formed is reduced. In order to alleviate the problem, an electrically insulating layer made of a resin material is formed. Then, the upper magnetic pole layer is formed to stand up from the tip position of this electrical insulating layer.
形成された薄膜層は、基板と共に機械的に切断され、磁
気ディスク等と対向すると共にスロートハイトの端面と
なる対向面が形成される。The formed thin film layer is mechanically cut together with the substrate to form an opposing surface that faces the magnetic disk etc. and becomes the end surface of the throat height.
然しなから、上述した樹脂材から戊る電気絶縁層の形成
後、上部磁極層を形成するまでの間には何層かの層の形
成が行われ、イオンミ＋ ＩＪタングプラズマ灰化処理
の過程が数回存在する。このイオンミーリング等は樹脂
層を削る作用を果たし、前述した電気絶縁層の先端部分
も削られ、後退する。その時イオンミーリング等のエツ
チング分布により電気絶縁層先端の後退量にバラツキが
生じる。この先端位置と、上述の対向面との距離はスロ
ートハイトの長さを支配する。このスロートハイトの長
さがその設計値から変動すると、磁気抵抗の増加につな
がり、磁束の流れが悪くなり、磁気特性の悪化をきたす
こととなる。However, after the formation of the electrical insulating layer made of the resin material described above and before the formation of the upper magnetic pole layer, several layers are formed, and the process of IonMi + IJ tongue plasma ashing treatment is performed. exists several times. This ion milling etc. has the effect of scraping the resin layer, and the tip portion of the electrical insulating layer described above is also scraped and retreats. At this time, variations occur in the amount of retreat of the tip of the electrical insulating layer due to the etching distribution due to ion milling or the like. The distance between this tip position and the above-mentioned opposing surface governs the length of the throat height. If the length of this throat height varies from its design value, this will lead to an increase in magnetic resistance, impairing the flow of magnetic flux, and deteriorating the magnetic properties.
依って本発明は、スロートハイトの長さの安定化に寄与
する薄膜磁気ヘッドの薄膜積層構造の提供を目的とする
。Therefore, an object of the present invention is to provide a thin film laminated structure for a thin film magnetic head that contributes to stabilizing the throat height length.
上記目的に鑑みて本発明は、薄膜磁気ヘッドにおける薄
膜層の積層構造であって、対磁極を成す２つの磁極層の
うちのスライダー基板に近い側の一方の磁極層と、他方
の磁極層の各先端スロートハイトの間のギャップを維持
、形成する無機材層の平坦領域部（Ａ）から立上ってい
る領域部と、前記一方の磁極層との間に、該一方の磁極
層の段差を軽減するための有機材料層を形成させたこと
を特徴とする薄膜磁気ヘッドの薄膜積層構造を提供する
。In view of the above object, the present invention provides a laminated structure of thin film layers in a thin film magnetic head, in which one of the two magnetic pole layers forming opposite magnetic poles is formed on the side closer to the slider substrate, and the other magnetic pole layer is placed on the side closer to the slider substrate. There is a step difference in the one magnetic pole layer between the area rising from the flat area (A) of the inorganic material layer that maintains and forms the gap between the throat heights of each tip and the one magnetic pole layer. The present invention provides a thin film laminated structure of a thin film magnetic head, which is characterized in that an organic material layer is formed to reduce the noise.
薄膜磁気ヘッドの薄膜層を積層するプロセスにおいては
、イオンミーリング過程が数回必要となるが、樹脂材料
等の有機材料から成る層は前記イオンミーリング過程に
よって削られ易いが、アルミナ等の無機材料から威る層
は削られ難い性質を有している。このため、磁極層の段
差を軽減する有機材料層をギャップを形成する無機材料
層の下側に形成し、その後のイオンミーリング過程の影
響を遮断する。従って、スロートハイトの長さに影響を
与えるギャップ層平坦部の終端位置は、無機材料によっ
て形成されることとなるため、イオンミーリングによっ
て被削されることなく、その位置は安定化する。In the process of laminating the thin film layers of a thin film magnetic head, several ion milling processes are required. Layers made of organic materials such as resin materials are easily scraped by the ion milling process, but layers made of inorganic materials such as alumina are easily etched by the ion milling process. The intimidating layer has the property of being difficult to scrape away. For this reason, an organic material layer that reduces the step difference in the magnetic pole layer is formed under the inorganic material layer that forms the gap, thereby blocking the influence of the subsequent ion milling process. Therefore, since the end position of the gap layer flat part that affects the length of the throat height is formed of an inorganic material, the end position is stabilized without being cut by ion milling.
以下、本発明を添付図面に示す実施例に基づき更に詳細
に説明する。まず、第４図と第５図とを参照し、薄膜磁
気ヘッドの一般的な構成を説明する。磁気ディスク等に
対して浮上する作用を果たすスライダ基板１６に下部保
護層２４を設け、その上に下部磁極層１０を形成する。Hereinafter, the present invention will be explained in more detail based on embodiments shown in the accompanying drawings. First, the general structure of a thin film magnetic head will be explained with reference to FIGS. 4 and 5. A lower protective layer 24 is provided on a slider substrate 16 that functions to float relative to a magnetic disk, etc., and a lower magnetic pole layer 10 is formed thereon.
この下部磁極層１０は非磁性の無機材料層１８を挟持す
る構造で上部磁極層１２と対磁極を成す。この対磁極を
成す各先端部をスロートハイトと称す。この両磁極層１
０．１２の間には、コイル導体層１４を形成する必要が
あるが、該コイル導体層１４の絶縁作用を果たすと共に
、上述した下部磁極層１０と非磁性無機材料層１８とが
有する段差を緩和する樹脂材料等の有機材料層２０を、
上記無機材料層１８を形成した下部磁極層１０の上側に
形成しておく必要がある。また、コイル導体層１４と上
部磁極層１２との間も電気的に絶縁するための層２２を
設けている。なお、参照番号３０は磁気ディスク等との
対向面である。The lower magnetic pole layer 10 has a structure in which a nonmagnetic inorganic material layer 18 is sandwiched between the lower magnetic pole layer 10 and the upper magnetic pole layer 12 to form a counter magnetic pole. Each tip forming the opposite magnetic pole is called a throat height. Both magnetic pole layers 1
It is necessary to form the coil conductor layer 14 between 0.12 and 2.0. An organic material layer 20 such as a relaxing resin material,
It is necessary to form it above the bottom pole layer 10 on which the inorganic material layer 18 is formed. Further, a layer 22 for electrical insulation is also provided between the coil conductor layer 14 and the upper magnetic pole layer 12. Note that reference number 30 is a surface facing a magnetic disk or the like.
第３１！Ｉは、第５１！ｌに示す絶縁層２２が２つの絶
縁層２２ａと２２ｂとに分かれ、かつ、コイル導体層１
４が２層の構成となっていることを除けば該第５図の薄
膜構造と同じであり、その先端スロートハイト１０ｅ、
１２ｅ近傍の拡大図である。上記Ｍ１８はアルミナ等の
非磁性の無機材料をスパッタリングにより形成させたも
のであり、下部磁極Ｈ１０の表面凹凸に沿って同一厚さ
の層が形成される。そうした凹凸の段差を軽減させると
共に、電気的な絶縁の作用を果たさせる樹脂材料の層２
０を非磁性無機材料層１８の上に形成している。図示の
如く、この樹脂層２０の先端位置Ｐ１は上部磁極層１２
の傾斜部の始点となり、従って、スロートハイ）１２ｅ
の長さＡを支配することとなる。31st! I am number 51! The insulating layer 22 shown in l is divided into two insulating layers 22a and 22b, and the coil conductor layer 1
4 has a two-layer structure, it is the same as the thin film structure shown in FIG. 5, and its tip throat height is 10e,
It is an enlarged view of the vicinity of 12e. The above M18 is formed by sputtering a non-magnetic inorganic material such as alumina, and a layer of the same thickness is formed along the surface irregularities of the lower magnetic pole H10. A layer 2 of a resin material that reduces such uneven steps and acts as an electrical insulator.
0 is formed on the nonmagnetic inorganic material layer 18. As shown in the figure, the tip position P1 of this resin layer 20 is located at the upper magnetic pole layer 12.
Therefore, the throat height) 12e
will govern the length A.
然しなから、この樹脂層２０を形成した後に各層１４．
２２ａ 、２２ｂ 、１２を形成するが、その過程にお
いて、イオンミーリングやプラズマ灰化処理の処理過程
が存在する。その結果、樹脂層２０の先端部が被削され
る時、装置のエツチング９卑により位置Ｐ１の変化量に
バラツキが生じ、寸法Ａが変動することとなる。これは
薄膜ヘッドの磁気特性を悪化させる。However, after forming this resin layer 20, each layer 14.
22a, 22b, and 12 are formed, and in the process, there are treatment steps such as ion milling and plasma ashing treatment. As a result, when the tip of the resin layer 20 is cut, the amount of change in the position P1 varies due to the etching process of the device, and the dimension A fluctuates. This deteriorates the magnetic properties of the thin film head.
上述した従来の薄膜磁気ヘッド製造上の課題を解決すべ
く、本発明においては第１図に示す様に、下部磁極層１
０の上に、まず、段差軽減用の樹脂層２０を形成し、そ
の後で非磁性無機材料層１８をスパッタリング形成する
。その後の過程は従来の場合と同様である。この様に形
成すると、上部磁極層１２の傾斜部の始点は無機材料層
１８の平坦領域部１８ａと、これと連続した立上り領域
部１８ｂとの交点Ｐ２となる。この層１８を形成後、イ
オンミーリングの過程が存在しても、アルミナ等の無機
材料は被削され難いため、点Ｐ２は不変位置として安定
化する。従って、スロートハイＨ２ｅの長さＡは安定化
され得る。In order to solve the problems in manufacturing the conventional thin film magnetic head described above, in the present invention, as shown in FIG.
0, first, a resin layer 20 for reducing the step difference is formed, and then a non-magnetic inorganic material layer 18 is formed by sputtering. The subsequent process is similar to the conventional case. When formed in this manner, the starting point of the inclined portion of the upper magnetic pole layer 12 becomes the intersection point P2 of the flat region portion 18a of the inorganic material layer 18 and the continuous rising region portion 18b. After forming this layer 18, even if an ion milling process is performed, inorganic materials such as alumina are difficult to abrade, so the point P2 is stabilized as an unchanging position. Therefore, the length A of the throat high H2e can be stabilized.
第２図は本発明に係る他の実施例を示す断面図であるが
、第１図の場合と異なるのは、層１８が２層に分かれて
おり、下部磁極層ＩＯの上にまず層１８Ａを形威し、次
に樹脂層２０を形成させ、更にその上に層１８Ｂを形成
する。スロートハイ）１２ｅの長さＡを支配する点Ｐ２
は、層１８Ｂの平坦領域部１８ａとその立上り領域部１
８ｂとの交点である。FIG. 2 is a sectional view showing another embodiment according to the present invention, but the difference from the case of FIG. 1 is that the layer 18 is divided into two layers, and a layer 18 Then, the resin layer 20 is formed, and the layer 18B is further formed thereon. Throat High) Point P2 that governs the length A of 12e
are the flat region 18a of the layer 18B and the rising region 1 of the layer 18B.
This is the intersection with 8b.
以上の説明から明らかな様に本発明によれば、薄膜磁気
ヘッドのスロートハイト部の長さの安定化に寄与する薄
膜積層構造が提供可能となる。As is clear from the above description, according to the present invention, it is possible to provide a thin film laminated structure that contributes to stabilizing the length of the throat height portion of a thin film magnetic head.
第１図は本発明に係る第１の実施例を示す断面図、
第２図は本発明に係る第２の実施例を示す断面図、
第３図は従来に係るスロートハイト部の断面図、第４図
は従来の薄膜磁気ヘッドの部分正面図、第５図は第４図
の矢視線ｖ−■による断面図である。
１０・・・下部磁極層、 １２・・・上部磁極層、
１８・・・アルミナ等の無機材料層、
２０・・・樹脂等の有機材料層。FIG. 1 is a sectional view showing a first embodiment of the present invention, FIG. 2 is a sectional view of a second embodiment of the present invention, and FIG. 3 is a sectional view of a conventional throat height portion. FIG. 4 is a partial front view of a conventional thin film magnetic head, and FIG. 5 is a sectional view taken along arrow line v--■ in FIG. 10... Lower magnetic pole layer, 12... Upper magnetic pole layer,
18... Inorganic material layer such as alumina, 20... Organic material layer such as resin.
Claims (1)
、対磁極を成す２つの磁極層（１０、１２）のうちのス
ライダー基板（１６）に近い側の一方の磁極層（１０）
と、他方の磁極層（１２）の各先端スロートハイト（１
０ｅ、１２ｅ）間のギャップ（Ｇ）を維持、形成する無
機材料層（１８）の平坦領域部（１８ａ）から立上って
いる領域部（１８ｂ）と、前記一方の磁極層（１０）と
の間に、該一方の磁極層の段差を軽減するための有機材
料層（２０）を形成させたことを特徴とする薄膜磁気ヘ
ッドの薄膜積層構造。1. A laminated structure of thin film layers in a thin film magnetic head, one of the two magnetic pole layers (10, 12) forming opposite magnetic poles, one of the magnetic pole layers (10) on the side closer to the slider substrate (16).
and the throat height (1) of each tip of the other magnetic pole layer (12).
a region portion (18b) rising from a flat region portion (18a) of an inorganic material layer (18) that maintains and forms a gap (G) between 0e and 12e; and the one magnetic pole layer (10). A thin film laminated structure of a thin film magnetic head, characterized in that an organic material layer (20) is formed between the layers to reduce a step difference in the one magnetic pole layer.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6731590A JP2874260B2 (en) | 1990-03-19 | 1990-03-19 | Thin film magnetic head |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6731590A JP2874260B2 (en) | 1990-03-19 | 1990-03-19 | Thin film magnetic head |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH03269812A true JPH03269812A (en) | 1991-12-02 |
| JP2874260B2 JP2874260B2 (en) | 1999-03-24 |
Family
ID=13341466
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP6731590A Expired - Fee Related JP2874260B2 (en) | 1990-03-19 | 1990-03-19 | Thin film magnetic head |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2874260B2 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1996006428A1 (en) * | 1994-08-25 | 1996-02-29 | International Business Machines Corporation | Low profile thin film write head |
-
1990
- 1990-03-19 JP JP6731590A patent/JP2874260B2/en not_active Expired - Fee Related
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1996006428A1 (en) * | 1994-08-25 | 1996-02-29 | International Business Machines Corporation | Low profile thin film write head |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2874260B2 (en) | 1999-03-24 |
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