JPH03264571A - Epoxy-based compound, production thereof and cured resin obtained from same compound - Google Patents
Epoxy-based compound, production thereof and cured resin obtained from same compoundInfo
- Publication number
- JPH03264571A JPH03264571A JP2061267A JP6126790A JPH03264571A JP H03264571 A JPH03264571 A JP H03264571A JP 2061267 A JP2061267 A JP 2061267A JP 6126790 A JP6126790 A JP 6126790A JP H03264571 A JPH03264571 A JP H03264571A
- Authority
- JP
- Japan
- Prior art keywords
- formula
- epoxy
- compound
- curing
- group
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 150000001875 compounds Chemical class 0.000 title claims abstract description 47
- 239000004593 Epoxy Substances 0.000 title claims abstract description 37
- 238000004519 manufacturing process Methods 0.000 title claims description 5
- 229920005989 resin Polymers 0.000 title abstract description 14
- 239000011347 resin Substances 0.000 title abstract description 14
- 125000002029 aromatic hydrocarbon group Chemical group 0.000 claims abstract description 5
- 150000001732 carboxylic acid derivatives Chemical class 0.000 claims abstract description 3
- 125000005843 halogen group Chemical group 0.000 claims abstract description 3
- 125000001183 hydrocarbyl group Chemical group 0.000 claims abstract 4
- 229910052736 halogen Inorganic materials 0.000 claims abstract 2
- -1 amide compound Chemical class 0.000 claims description 23
- 239000003822 epoxy resin Substances 0.000 claims description 10
- 229920000647 polyepoxide Polymers 0.000 claims description 10
- 239000000126 substance Substances 0.000 claims description 9
- 239000003795 chemical substances by application Substances 0.000 claims description 6
- 239000003999 initiator Substances 0.000 claims description 6
- 125000003277 amino group Chemical group 0.000 claims description 4
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 4
- 125000004432 carbon atom Chemical group C* 0.000 claims description 3
- 229910052739 hydrogen Inorganic materials 0.000 claims description 2
- 239000001257 hydrogen Substances 0.000 claims description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims 1
- 150000002367 halogens Chemical class 0.000 claims 1
- 238000002844 melting Methods 0.000 abstract description 6
- 230000008018 melting Effects 0.000 abstract description 6
- 239000000853 adhesive Substances 0.000 abstract description 3
- 230000001070 adhesive effect Effects 0.000 abstract description 3
- 238000005266 casting Methods 0.000 abstract description 2
- 239000011159 matrix material Substances 0.000 abstract description 2
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 abstract 1
- 239000004215 Carbon black (E152) Substances 0.000 abstract 1
- 239000011248 coating agent Substances 0.000 abstract 1
- 238000000576 coating method Methods 0.000 abstract 1
- 239000011365 complex material Substances 0.000 abstract 1
- 229930195733 hydrocarbon Natural products 0.000 abstract 1
- 239000011810 insulating material Substances 0.000 abstract 1
- 239000000463 material Substances 0.000 abstract 1
- 238000002360 preparation method Methods 0.000 abstract 1
- 238000001723 curing Methods 0.000 description 22
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 12
- 238000006243 chemical reaction Methods 0.000 description 12
- 239000000047 product Substances 0.000 description 11
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 9
- 238000005481 NMR spectroscopy Methods 0.000 description 7
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 6
- BRLQWZUYTZBJKN-UHFFFAOYSA-N Epichlorohydrin Chemical compound ClCC1CO1 BRLQWZUYTZBJKN-UHFFFAOYSA-N 0.000 description 6
- 238000004566 IR spectroscopy Methods 0.000 description 6
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 6
- 239000003513 alkali Substances 0.000 description 5
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 5
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 5
- CWLKGDAVCFYWJK-UHFFFAOYSA-N 3-aminophenol Chemical compound NC1=CC=CC(O)=C1 CWLKGDAVCFYWJK-UHFFFAOYSA-N 0.000 description 4
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 description 4
- 125000003647 acryloyl group Chemical group O=C([*])C([H])=C([H])[H] 0.000 description 4
- 229910052799 carbon Chemical group 0.000 description 4
- 239000003054 catalyst Substances 0.000 description 4
- USIUVYZYUHIAEV-UHFFFAOYSA-N diphenyl ether Chemical compound C=1C=CC=CC=1OC1=CC=CC=C1 USIUVYZYUHIAEV-UHFFFAOYSA-N 0.000 description 4
- 150000003839 salts Chemical class 0.000 description 4
- 239000002904 solvent Substances 0.000 description 4
- LTVUCOSIZFEASK-MPXCPUAZSA-N (3ar,4s,7r,7as)-3a-methyl-3a,4,7,7a-tetrahydro-4,7-methano-2-benzofuran-1,3-dione Chemical compound C([C@H]1C=C2)[C@H]2[C@H]2[C@]1(C)C(=O)OC2=O LTVUCOSIZFEASK-MPXCPUAZSA-N 0.000 description 3
- 239000004925 Acrylic resin Substances 0.000 description 3
- 229920000178 Acrylic resin Polymers 0.000 description 3
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- 239000004305 biphenyl Substances 0.000 description 3
- 235000010290 biphenyl Nutrition 0.000 description 3
- 238000006704 dehydrohalogenation reaction Methods 0.000 description 3
- 238000000921 elemental analysis Methods 0.000 description 3
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 3
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N phenylbenzene Natural products C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 3
- 239000000843 powder Substances 0.000 description 3
- 150000003242 quaternary ammonium salts Chemical class 0.000 description 3
- 239000000243 solution Substances 0.000 description 3
- 229940018563 3-aminophenol Drugs 0.000 description 2
- PLIKAWJENQZMHA-UHFFFAOYSA-N 4-aminophenol Chemical compound NC1=CC=C(O)C=C1 PLIKAWJENQZMHA-UHFFFAOYSA-N 0.000 description 2
- PAYRUJLWNCNPSJ-UHFFFAOYSA-N Aniline Chemical compound NC1=CC=CC=C1 PAYRUJLWNCNPSJ-UHFFFAOYSA-N 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical group [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- 238000000862 absorption spectrum Methods 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- HFBMWMNUJJDEQZ-UHFFFAOYSA-N acryloyl chloride Chemical compound ClC(=O)C=C HFBMWMNUJJDEQZ-UHFFFAOYSA-N 0.000 description 2
- 150000001408 amides Chemical class 0.000 description 2
- WTEOIRVLGSZEPR-UHFFFAOYSA-N boron trifluoride Substances FB(F)F WTEOIRVLGSZEPR-UHFFFAOYSA-N 0.000 description 2
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 2
- 239000002131 composite material Substances 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- XXBDWLFCJWSEKW-UHFFFAOYSA-N dimethylbenzylamine Chemical compound CN(C)CC1=CC=CC=C1 XXBDWLFCJWSEKW-UHFFFAOYSA-N 0.000 description 2
- 239000012772 electrical insulation material Substances 0.000 description 2
- 125000003700 epoxy group Chemical group 0.000 description 2
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 2
- 150000002430 hydrocarbons Chemical group 0.000 description 2
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 229920003986 novolac Polymers 0.000 description 2
- 239000003973 paint Substances 0.000 description 2
- 229920001021 polysulfide Polymers 0.000 description 2
- 239000005077 polysulfide Substances 0.000 description 2
- 150000008117 polysulfides Polymers 0.000 description 2
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 239000011541 reaction mixture Substances 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- 150000003512 tertiary amines Chemical class 0.000 description 2
- AFINAILKDBCXMX-PBHICJAKSA-N (2s,3r)-2-amino-3-hydroxy-n-(4-octylphenyl)butanamide Chemical group CCCCCCCCC1=CC=C(NC(=O)[C@@H](N)[C@@H](C)O)C=C1 AFINAILKDBCXMX-PBHICJAKSA-N 0.000 description 1
- WQONPSCCEXUXTQ-UHFFFAOYSA-N 1,2-dibromobenzene Chemical compound BrC1=CC=CC=C1Br WQONPSCCEXUXTQ-UHFFFAOYSA-N 0.000 description 1
- GEYOCULIXLDCMW-UHFFFAOYSA-N 1,2-phenylenediamine Chemical compound NC1=CC=CC=C1N GEYOCULIXLDCMW-UHFFFAOYSA-N 0.000 description 1
- ITWBWJFEJCHKSN-UHFFFAOYSA-N 1,4,7-triazonane Chemical compound C1CNCCNCCN1 ITWBWJFEJCHKSN-UHFFFAOYSA-N 0.000 description 1
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- XMNIXWIUMCBBBL-UHFFFAOYSA-N 2-(2-phenylpropan-2-ylperoxy)propan-2-ylbenzene Chemical compound C=1C=CC=CC=1C(C)(C)OOC(C)(C)C1=CC=CC=C1 XMNIXWIUMCBBBL-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- NGNBDVOYPDDBFK-UHFFFAOYSA-N 2-[2,4-di(pentan-2-yl)phenoxy]acetyl chloride Chemical compound CCCC(C)C1=CC=C(OCC(Cl)=O)C(C(C)CCC)=C1 NGNBDVOYPDDBFK-UHFFFAOYSA-N 0.000 description 1
- RHTCRKVHXKKPER-UHFFFAOYSA-N 2-butylperoxyethyl hexanoate Chemical compound C(CCC)OOCCOC(CCCCC)=O RHTCRKVHXKKPER-UHFFFAOYSA-N 0.000 description 1
- LLDBOMNUMJVCBX-UHFFFAOYSA-N 2-butylperoxypropan-2-yl hydrogen carbonate Chemical compound CCCCOOC(C)(C)OC(O)=O LLDBOMNUMJVCBX-UHFFFAOYSA-N 0.000 description 1
- MPNXSZJPSVBLHP-UHFFFAOYSA-N 2-chloro-n-phenylpyridine-3-carboxamide Chemical compound ClC1=NC=CC=C1C(=O)NC1=CC=CC=C1 MPNXSZJPSVBLHP-UHFFFAOYSA-N 0.000 description 1
- WFUGQJXVXHBTEM-UHFFFAOYSA-N 2-hydroperoxy-2-(2-hydroperoxybutan-2-ylperoxy)butane Chemical compound CCC(C)(OO)OOC(C)(CC)OO WFUGQJXVXHBTEM-UHFFFAOYSA-N 0.000 description 1
- HLBLWEWZXPIGSM-UHFFFAOYSA-N 4-Aminophenyl ether Chemical compound C1=CC(N)=CC=C1OC1=CC=C(N)C=C1 HLBLWEWZXPIGSM-UHFFFAOYSA-N 0.000 description 1
- 229910015900 BF3 Inorganic materials 0.000 description 1
- 239000004342 Benzoyl peroxide Substances 0.000 description 1
- OMPJBNCRMGITSC-UHFFFAOYSA-N Benzoylperoxide Chemical compound C=1C=CC=CC=1C(=O)OOC(=O)C1=CC=CC=C1 OMPJBNCRMGITSC-UHFFFAOYSA-N 0.000 description 1
- UXVMQQNJUSDDNG-UHFFFAOYSA-L Calcium chloride Chemical compound [Cl-].[Cl-].[Ca+2] UXVMQQNJUSDDNG-UHFFFAOYSA-L 0.000 description 1
- MQJKPEGWNLWLTK-UHFFFAOYSA-N Dapsone Chemical compound C1=CC(N)=CC=C1S(=O)(=O)C1=CC=C(N)C=C1 MQJKPEGWNLWLTK-UHFFFAOYSA-N 0.000 description 1
- IAZDPXIOMUYVGZ-WFGJKAKNSA-N Dimethyl sulfoxide Chemical compound [2H]C([2H])([2H])S(=O)C([2H])([2H])[2H] IAZDPXIOMUYVGZ-WFGJKAKNSA-N 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 1
- LSDPWZHWYPCBBB-UHFFFAOYSA-N Methanethiol Chemical group SC LSDPWZHWYPCBBB-UHFFFAOYSA-N 0.000 description 1
- 238000006845 Michael addition reaction Methods 0.000 description 1
- OKIZCWYLBDKLSU-UHFFFAOYSA-M N,N,N-Trimethylmethanaminium chloride Chemical compound [Cl-].C[N+](C)(C)C OKIZCWYLBDKLSU-UHFFFAOYSA-M 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- LGRFSURHDFAFJT-UHFFFAOYSA-N Phthalic anhydride Natural products C1=CC=C2C(=O)OC(=O)C2=C1 LGRFSURHDFAFJT-UHFFFAOYSA-N 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
- KEAYESYHFKHZAL-UHFFFAOYSA-N Sodium Chemical compound [Na] KEAYESYHFKHZAL-UHFFFAOYSA-N 0.000 description 1
- GKXVJHDEWHKBFH-UHFFFAOYSA-N [2-(aminomethyl)phenyl]methanamine Chemical compound NCC1=CC=CC=C1CN GKXVJHDEWHKBFH-UHFFFAOYSA-N 0.000 description 1
- 150000008065 acid anhydrides Chemical class 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 150000003863 ammonium salts Chemical class 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 150000004982 aromatic amines Chemical class 0.000 description 1
- 235000019400 benzoyl peroxide Nutrition 0.000 description 1
- FWYSSOIRLVHQNC-UHFFFAOYSA-M benzyl(trimethyl)azanium;acetate Chemical compound CC([O-])=O.C[N+](C)(C)CC1=CC=CC=C1 FWYSSOIRLVHQNC-UHFFFAOYSA-M 0.000 description 1
- KXHPPCXNWTUNSB-UHFFFAOYSA-M benzyl(trimethyl)azanium;chloride Chemical compound [Cl-].C[N+](C)(C)CC1=CC=CC=C1 KXHPPCXNWTUNSB-UHFFFAOYSA-M 0.000 description 1
- 230000031709 bromination Effects 0.000 description 1
- 238000005893 bromination reaction Methods 0.000 description 1
- 125000001246 bromo group Chemical group Br* 0.000 description 1
- JHIWVOJDXOSYLW-UHFFFAOYSA-N butyl 2,2-difluorocyclopropane-1-carboxylate Chemical compound CCCCOC(=O)C1CC1(F)F JHIWVOJDXOSYLW-UHFFFAOYSA-N 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- 239000001110 calcium chloride Substances 0.000 description 1
- 229910001628 calcium chloride Inorganic materials 0.000 description 1
- 150000001721 carbon Chemical group 0.000 description 1
- 150000004649 carbonic acid derivatives Chemical class 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 125000001309 chloro group Chemical group Cl* 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 239000004035 construction material Substances 0.000 description 1
- 239000012933 diacyl peroxide Substances 0.000 description 1
- QGBSISYHAICWAH-UHFFFAOYSA-N dicyandiamide Chemical compound NC(N)=NC#N QGBSISYHAICWAH-UHFFFAOYSA-N 0.000 description 1
- ZZTCPWRAHWXWCH-UHFFFAOYSA-N diphenylmethanediamine Chemical compound C=1C=CC=CC=1C(N)(N)C1=CC=CC=C1 ZZTCPWRAHWXWCH-UHFFFAOYSA-N 0.000 description 1
- 238000004821 distillation Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- GKIPXFAANLTWBM-UHFFFAOYSA-N epibromohydrin Chemical compound BrCC1CO1 GKIPXFAANLTWBM-UHFFFAOYSA-N 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 150000004678 hydrides Chemical class 0.000 description 1
- 150000002460 imidazoles Chemical class 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 229910052744 lithium Inorganic materials 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- 229910052751 metal Chemical class 0.000 description 1
- 239000002184 metal Chemical class 0.000 description 1
- 150000002736 metal compounds Chemical class 0.000 description 1
- FQPSGWSUVKBHSU-UHFFFAOYSA-N methacrylamide Chemical compound CC(=C)C(N)=O FQPSGWSUVKBHSU-UHFFFAOYSA-N 0.000 description 1
- VHRYZQNGTZXDNX-UHFFFAOYSA-N methacryloyl chloride Chemical compound CC(=C)C(Cl)=O VHRYZQNGTZXDNX-UHFFFAOYSA-N 0.000 description 1
- PMHOLXNNEPPFNZ-UHFFFAOYSA-N n-(3-hydroxyphenyl)prop-2-enamide Chemical class OC1=CC=CC(NC(=O)C=C)=C1 PMHOLXNNEPPFNZ-UHFFFAOYSA-N 0.000 description 1
- XZSZONUJSGDIFI-UHFFFAOYSA-N n-(4-hydroxyphenyl)-2-methylprop-2-enamide Chemical compound CC(=C)C(=O)NC1=CC=C(O)C=C1 XZSZONUJSGDIFI-UHFFFAOYSA-N 0.000 description 1
- IINCSQCDGHHSOT-UHFFFAOYSA-N n-[3-(oxiran-2-ylmethoxy)phenyl]prop-2-enamide Chemical compound C=CC(=O)NC1=CC=CC(OCC2OC2)=C1 IINCSQCDGHHSOT-UHFFFAOYSA-N 0.000 description 1
- 238000000655 nuclear magnetic resonance spectrum Methods 0.000 description 1
- 150000001451 organic peroxides Chemical class 0.000 description 1
- 150000002989 phenols Chemical class 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- 239000000376 reactant Substances 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 239000012779 reinforcing material Substances 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 239000012312 sodium hydride Substances 0.000 description 1
- 229910000104 sodium hydride Inorganic materials 0.000 description 1
- 235000011121 sodium hydroxide Nutrition 0.000 description 1
- 125000001424 substituent group Chemical group 0.000 description 1
- YMBCJWGVCUEGHA-UHFFFAOYSA-M tetraethylammonium chloride Chemical compound [Cl-].CC[N+](CC)(CC)CC YMBCJWGVCUEGHA-UHFFFAOYSA-M 0.000 description 1
- CZDYPVPMEAXLPK-UHFFFAOYSA-N tetramethylsilane Chemical compound C[Si](C)(C)C CZDYPVPMEAXLPK-UHFFFAOYSA-N 0.000 description 1
- SRPWOOOHEPICQU-UHFFFAOYSA-N trimellitic anhydride Chemical compound OC(=O)C1=CC=C2C(=O)OC(=O)C2=C1 SRPWOOOHEPICQU-UHFFFAOYSA-N 0.000 description 1
- 239000000052 vinegar Substances 0.000 description 1
- 235000021419 vinegar Nutrition 0.000 description 1
- 230000004580 weight loss Effects 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Landscapes
- Epoxy Compounds (AREA)
- Epoxy Resins (AREA)
Abstract
Description
【発明の詳細な説明】
[産業上の利用分野]
本発明は、新規なエポキシ系化合物及びその製法並びに
それから得られる機械的特性1寸法安定性、耐熱性、耐
薬品性、電気的特性等に優れた新規なエポキシ系樹脂に
関するものである。[Detailed Description of the Invention] [Field of Industrial Application] The present invention relates to a novel epoxy compound, a method for producing the same, and mechanical properties obtained therefrom, such as dimensional stability, heat resistance, chemical resistance, electrical properties, etc. This invention relates to an excellent new epoxy resin.
[従来技術]
従来、エポキシ樹脂は、種々の優れた特性の故に、塗料
、電気絶縁材料、土木建築材料、接着剤及び繊維を補強
材として用いた複合材料などの広い分野で使用されてい
る。しかし、近年の技術の進歩に伴い、エポキシ樹脂に
対して求められる性能もより高度化し、より速く成形で
き、より耐熱性の高いものが求められている。[Prior Art] Conventionally, epoxy resins have been used in a wide range of fields such as paints, electrical insulation materials, civil engineering and construction materials, adhesives, and composite materials using fibers as reinforcing materials because of their various excellent properties. However, as technology advances in recent years, the performance required of epoxy resins has become more sophisticated, and there is a demand for epoxy resins that can be molded faster and have higher heat resistance.
エポキシ基より短時間で硬化するものとしてはアクリロ
イル基があり、アクリロイル基を有する化合物を紫外線
やラジカル開始剤で重合を開始し硬化成形体としている
。そこでエポキシ化合物にこのアクリロイル基を導入す
ることが既に特開昭60−130580号に開示されて
いる。このエポキシ系化合物はアクリロイル基の速い硬
化特性を利用し、速く成形体の形状にすることができる
という特性を有する。There is an acryloyl group that cures in a shorter time than an epoxy group, and a compound having an acryloyl group is polymerized using ultraviolet light or a radical initiator to form a cured molded product. Therefore, the introduction of this acryloyl group into an epoxy compound has already been disclosed in JP-A-60-130580. This epoxy compound utilizes the fast curing property of the acryloyl group and has the property of being able to be quickly formed into a molded article.
しかし、この開示されたエポキシ系化合物は樹脂とした
ときの耐熱性が必ずしも十分ではなく、もっと高い耐熱
性とより優れた機械的特性とが要求されている。However, this disclosed epoxy compound does not necessarily have sufficient heat resistance when used as a resin, and higher heat resistance and better mechanical properties are required.
[発明の目的]
本発明の第一の目的は、硬化が速く耐熱性に優れたエポ
キシ系樹脂を与える新規なエポキシ系化合物を提供する
ことにあり、他の目的は、かかる化合物を効率的に製造
する方法を提供することにあり、さらに他の目的は、該
エポキシ系化合物を硬化剤を用いて硬化させてなる耐熱
性が良好、で機械的特性に優れたエポキシ系樹脂を提供
することにある。[Object of the Invention] The first object of the present invention is to provide a novel epoxy compound that cures quickly and provides an epoxy resin with excellent heat resistance. Another object of the present invention is to provide an epoxy resin having good heat resistance and excellent mechanical properties, which is obtained by curing the epoxy compound using a curing agent. be.
[発明の構成]
上記の如き本発明の目的は、
(1)下記一般式(I>で表わされる構造から主として
構成されるエポキシ系化合物、
1?
(n+m)価の芳香族炭化水素基である。[Structure of the Invention] The object of the present invention as described above is: (1) An epoxy compound mainly composed of a structure represented by the following general formula (I>), an aromatic hydrocarbon group having a valence of 1?(n+m) .
(2)下記一般式(n)で表わされる化合物のアミノ基
と
(H2N+。Ar −(OH) 、 −(II )
ン酸誘導基と
金物(IV)をつくり、次いで該アミド化合物(IV)
とエピハロヒドリンとを反応させ、しかる後、脱ハロゲ
ン化水素化することを特徴とする
るエポキシ系化合物の製造法。(2) The amino group of the compound represented by the following general formula (n) and (H2N+.Ar -(OH) , -(II)
A metal compound (IV) is prepared with a phosphoric acid derivative group, and then the amide compound (IV)
1. A method for producing an epoxy compound, which comprises reacting and epihalohydrin, followed by dehydrohalogenation.
(3)上記式(I>のエポキシ系化合物をエポキシ硬化
剤及びラジカル開始剤及び/又は紫外線で硬化して得ら
れたエポキシ系硬化樹脂、によって達成される。(3) This is achieved using a cured epoxy resin obtained by curing the epoxy compound of formula (I> above) with an epoxy curing agent, a radical initiator, and/or an ultraviolet ray.
以下、本発明について詳述する。The present invention will be explained in detail below.
本発明に係わる新規なエポキシ系化合物は、上記−形式
(1)で表わされる新規な化学構造を有するものである
。上記式(I>中、Rは水素及び/又は炭素原子数1−
〜4の炭化水素基であり、かかる炭素原子数1〜4の炭
化水素基としては、メチル、エチル、プロピル、ブチル
があげられる。The novel epoxy compound according to the present invention has a novel chemical structure represented by the above-mentioned format (1). In the above formula (I>, R is hydrogen and/or carbon number 1-
-4 hydrocarbon groups, and examples of such hydrocarbon groups having 1 to 4 carbon atoms include methyl, ethyl, propyl, and butyl.
Rの中では特に水素基及びメチル基が好適である。Among R, hydrogen groups and methyl groups are particularly preferred.
■は1〜4の整数であり、好ましくは1又は2であり、
まなmは1〜4の整数であり、好ましくは1又は2であ
る。■ is an integer from 1 to 4, preferably 1 or 2;
m is an integer of 1 to 4, preferably 1 or 2.
式(I>におけるGは、
CH3
である。Gを2個以上含むエポキシ化合物にあっては、
それぞれのGが上記のいずれかであればよい。G in formula (I> is CH3. In an epoxy compound containing two or more G,
Each G may be any of the above.
また、同式中のArはハロゲン原子及び/又は炭素数1
〜4のアルキル基で置換されていてもよい炭素原子数1
6以下の芳香族炭化水素基であり、<n十m>価の基で
ある。In addition, Ar in the same formula is a halogen atom and/or a carbon number 1
1 carbon atom optionally substituted with ~4 alkyl groups
It is an aromatic hydrocarbon group of 6 or less and has a valence of <n10m>.
かかる芳香族炭化水素基としては、単芳香族基、具体的
には無置換であるときの骨格名であげるとベンゼン、ナ
フタレン等、であり、あるいはAr’−Ar’又はAr
’ −X −Ar’ (ここでAr’は上記の単芳香
族基であり、Xは、O,SO2,CH2゜CH3−(、
−CH3,S、CF3−C−CF3等)の複芳香族基が
あげられ、具体的には無置換であるときの骨格名であげ
るとビフェニルベンゼン、ジフェニルエーテル、ジフェ
ニルメタ、/、 2.2’−ジフェニルプロパン、2.
2’−ジフェニルパーフルオロプロパン等である。単芳
香族基及び複芳香族基にはそれぞれにクロル、ブロム、
メチル、エチル、プロピル等の置換基を有することがで
きる。Examples of such aromatic hydrocarbon groups include monoaromatic groups, specifically benzene, naphthalene, etc. when unsubstituted, or Ar'-Ar' or Ar.
' -X -Ar' (where Ar' is the above-mentioned monoaromatic group, and X is O, SO2, CH2°CH3-(,
-CH3,S, CF3-C-CF3, etc.). Specifically, the skeleton names when unsubstituted are biphenylbenzene, diphenyl ether, diphenyl meta, /, 2.2' -diphenylpropane, 2.
2'-diphenylperfluoropropane and the like. Monoaromatic groups and polyaromatic groups include chloro, bromo,
It can have substituents such as methyl, ethyl, propyl, etc.
これらのうち好ましいのは、ベンゼン、トルエン、ナフ
タレン、クロルベンゼン、ジブロムベンゼン、2.2’
−ジフェニルイソプロパン、ジフェニルエーテル、ジフ
ェニルなどである。Among these, benzene, toluene, naphthalene, chlorobenzene, dibromobenzene, 2.2'
- diphenyl isopropane, diphenyl ether, diphenyl, etc.
本発明のエポキシ系化合物の具体例は次の通りである。Specific examples of the epoxy compounds of the present invention are as follows.
o=c−c=CH2 す 0 R 11 −C OH2 かかる新規なエポキシ系化合物は、融点の測定。o=cc=CH2 vinegar 0 R 11 -C OH2 The melting point of such a new epoxy compound can be measured.
赤外吸収スペクトル分析、核磁気共鳴スペクトル分析及
び元素分析等により同定される。Identified by infrared absorption spectroscopy, nuclear magnetic resonance spectroscopy, elemental analysis, etc.
かかる本発明の新規エポキシ系化合物(I)は次の経路
で合成できる。The novel epoxy compound (I) of the present invention can be synthesized by the following route.
まず下記−形式(If)で表わされる化合物のアミノ基
と
(H2N+、−Ar(−OH)。 −(II)O
OH2
[記−形式(I[>で表わされる化合物のカルボン酸誘
導基と
1
を反応させ、ヒドロキシ基を有するアミド化合物(IV
)をつくり、次いで該アミド化合物(IV)と2
エピハロヒドリンを反応させ、その後アルカリで脱ハロ
ゲン化水素化して製造する。First, the amino group of a compound represented by the following -form (If) and (H2N+, -Ar(-OH). -(II)O OH2 to form an amide compound having a hydroxy group (IV
), then react the amide compound (IV) with 2-epihalohydrin, and then perform dehydrohalogenation with an alkali.
前記化合物(II>の好ましい化合物の具体例としては
次のような芳香族アミンがあげられる。Specific examples of preferable compounds for the compound (II>) include the following aromatic amines.
C1(3 OH OH2 OH2 OH OH2 OH。C1(3 OH OH2 OH2 OH OH2 Oh.
C)(3
I−I
OH
3
一方、前記化合物(III>の好ましいカルボン酸4
誘導体の例は、アクリル酸又はメタクリル酸の酸塩化物
、酸ブロム化物、フェニルエステル、クレジルエステル
、ニトロフェニルエステル等である。C) (3 I-I OH 3 On the other hand, examples of preferred carboxylic acid 4 derivatives of the compound (III>) include acid chloride, acid bromination, phenyl ester, cresyl ester, nitrophenyl ester, etc. of acrylic acid or methacrylic acid. It is.
アミド生成反応は溶液法、界面法など通常の方法が適用
できる。For the amide production reaction, conventional methods such as a solution method and an interfacial method can be applied.
エピハロヒドリンの具体例は、エピクロルヒドリン、エ
ピブロムヒドリン、β−メチルエピクロムヒドリン、β
−メチルエピブロムヒドリンなどがあげられる。特に好
ましいのはエピクロルヒドリン、β−メチルエピクロム
ヒドリンである。これらは単独でも、2種類以上併用し
てもよい。エピハロヒドリンの使用量はヒドロキシ基を
有するアミド化合物(IV)に対して等モル以上であり
、好ましくは3倍モル以上である。必要に応じて非反応
性の溶媒を用いてもよい。Specific examples of epihalohydrin include epichlorohydrin, epibromohydrin, β-methylepichromehydrin, and β-methylepichromehydrin.
-Methyl epibromohydrin, etc. Particularly preferred are epichlorohydrin and β-methylepichromehydrin. These may be used alone or in combination of two or more. The amount of epihalohydrin used is at least equimolar, preferably at least 3 times the molar amount of the amide compound (IV) having a hydroxyl group. A non-reactive solvent may be used if necessary.
このエピハロヒドリンとの反応は、触媒の存在下で行い
、好ましい触媒としては4級アンモニウム塩がある。4
級アンモニウム塩としては、テトラメチルアンモニウム
クロリド、テトラエチルアンモニウムクロリド、ベンジ
ルトリメチルアンモ5
ニウムクロリド、ベンジルトリメチルアンモニウムアセ
テートなどのテトラアルキル型又はベンジルトリアルキ
ル型のものが好ましい。This reaction with epihalohydrin is carried out in the presence of a catalyst, and preferred catalysts include quaternary ammonium salts. 4
Preferred ammonium salts include tetraalkyl or benzyltrialkyl salts such as tetramethylammonium chloride, tetraethylammonium chloride, benzyltrimethylammonium chloride, and benzyltrimethylammonium acetate.
4級アンモニウム塩の使用量は化合物(IV)に対し、
0.001〜1モル倍の範囲が適当である。反応温度及
び反応時間は、30〜150°Cで30分〜10時間、
好ましくは60〜120℃で1〜5時間である。The amount of quaternary ammonium salt used is based on compound (IV),
A range of 0.001 to 1 mole is appropriate. The reaction temperature and reaction time are 30 to 150°C for 30 minutes to 10 hours.
Preferably, the temperature is 60 to 120°C for 1 to 5 hours.
アルカリによる脱ハロゲン化水素化はエピハロヒドリン
との反応に引続き行なうことができる。Alkali dehydrohalogenation can be carried out subsequent to the reaction with epihalohydrin.
また−場合によっては反応混合物から未反応のエピハロ
ヒドリンを分離した後、反応生成物をさらにアルカリと
反応させることもできる。It is also possible - optionally after separating off the unreacted epihalohydrin from the reaction mixture, to react the reaction product further with an alkali.
この反応で用いるアルカリとしては、ナトリウム、カリ
ウム、リチウム等のアルカリ金属塩及び/又はその水素
化物あるいは炭酸塩などの弱酸塩があげられる。この中
では水素化ナトリウムが好適である。アルカリに使用量
は化合物(IV)に対し、0.8モル以上、好ましくは
0.9〜3.5モルとする。反応温度及び時間は、室温
〜100℃で10分〜5時間、好ましくは40〜80℃
で30分〜3時間と6
する。Examples of the alkali used in this reaction include alkali metal salts such as sodium, potassium, and lithium, and/or weak acid salts such as their hydrides and carbonates. Among these, sodium hydride is preferred. The amount of alkali used is 0.8 mol or more, preferably 0.9 to 3.5 mol, based on compound (IV). The reaction temperature and time are room temperature to 100°C for 10 minutes to 5 hours, preferably 40 to 80°C.
30 minutes to 3 hours and 6.
上述の反応によって得られるエポキシ系化合物は、上記
の如く未反応のエピハロヒドリンの他に4級アンモニウ
ム塩及び/又はアルカリなどの水溶性無機物を含むので
、通常、反応混合物より未反応のエピハロヒドリンを蒸
留除去した後、必要に応じトルエン、キシレンなどの水
と相溶し難い溶媒に溶解し、水溶性無機物を水により抽
出や炉別などの方法で除去することにより、硬化樹脂を
製造するに適した高品質のエポキシ系化合物とする。Since the epoxy compound obtained by the above reaction contains water-soluble inorganic substances such as quaternary ammonium salts and/or alkalis in addition to unreacted epihalohydrin as described above, unreacted epihalohydrin is usually removed from the reaction mixture by distillation. After that, if necessary, it is dissolved in a solvent that is difficult to miscible with water, such as toluene or xylene, and the water-soluble inorganic substances are removed by extraction with water or by furnace separation. Made of quality epoxy compound.
本発明の一般式(I)で表わされる新規エポキシ系化合
物は、常温で粘性な液状〜固体であり、それ自体従来公
知であるアクリル系樹脂の硬化法及び/又はエポキシ系
樹脂の硬化法により硬化せしめることができ、耐熱性に
優れ、機械的特性の良好な硬化樹脂とすることができる
。特に硬化においてはアクリル系樹脂の硬化とエポキシ
樹脂の硬化を併用することにより、良好な硬化樹脂が得
られる。The novel epoxy compound represented by the general formula (I) of the present invention is a viscous liquid to solid at room temperature, and is cured by a conventionally known acrylic resin curing method and/or epoxy resin curing method. It can be made into a cured resin with excellent heat resistance and good mechanical properties. Particularly in curing, a good cured resin can be obtained by using both the curing of the acrylic resin and the curing of the epoxy resin.
7
アクリル系樹脂の硬化法としては、通常よく使われるラ
ジカル開始剤あるいは紫外線照射により行われる。また
場合によってはアミノ基を用いたマイケル付加反応によ
る硬化法も利用できる。ラジカル開始剤としては、取扱
の上から有機過酸化物の使用が好ましく、かがる有機過
酸化物の例としてはケトンパーオキサイド、ハロイドパ
ーオキサイド、ジアシルパーオキサイド、パーオキシケ
タール、アルキルパーエステル、パーカーボネート類な
どがあげられ、具体的にはメチルエチルケトンパーオキ
サイド、ベンゾイルパーオキサイド。7. Acrylic resins are cured using commonly used radical initiators or ultraviolet irradiation. In some cases, a curing method using a Michael addition reaction using an amino group can also be used. As the radical initiator, it is preferable to use an organic peroxide from the viewpoint of handling. Examples of the radical initiator include ketone peroxide, halide peroxide, diacyl peroxide, peroxyketal, and alkyl perester. and percarbonates, specifically methyl ethyl ketone peroxide and benzoyl peroxide.
ジブチルパーオキシトリメチルシクロヘキサン。Dibutylperoxytrimethylcyclohexane.
ブチルパーオキシエチルヘキサネート、ブチルパーオキ
シイソプロピルカーボネート等があげられる。′まな使
用にあたっては3級アミン類やコバルトなどの金属塩の
重合促進剤を加えることもできる。Examples include butylperoxyethylhexanate, butylperoxyisopropyl carbonate, and the like. For further use, polymerization accelerators such as tertiary amines and metal salts such as cobalt can be added.
エポキシ化合物の硬化には硬化剤を用いる。硬化剤とし
ては、アミン類、酸無水物類、ポリアミド類、ポリスル
フィド樹脂、三フッ化ホウ素アミ8
ンコンプレックス、ノボラック樹脂、ジシアンジアミン
などの通常よく使用されるエポキシ用硬化剤が使用でき
る。具体的には、トリエチレントリアミン、インホロン
ジアミン、キシリレンジアミン、フェニレンジアミン、
ジアミノジフェニルメタン、ジアミノジフェニルスルホ
ン、ジアミノジフェニルエーテル、アニリン−ホルマリ
ン樹脂等、あるいは無水フタール酸、メチルナジック酸
無水物、トリメリット酸無水物、エチレングリコールビ
ストリメリテート等、あるいはメルカプタン基を両末端
にもつポリスルフィド樹脂、アニリンと三フッ化ホウ素
コンプレックス、フェノール−ホルマリンからの低分子
量、ノボラック樹脂、ジシアンジアミドなどである。ま
た硬化反応に際して、必要ならば3級アミン類、フェノ
ール類、イミダゾール類などの硬化促進剤を用いること
ができる。A hardening agent is used to harden the epoxy compound. As the curing agent, commonly used epoxy curing agents such as amines, acid anhydrides, polyamides, polysulfide resins, boron trifluoride amine complexes, novolac resins, and dicyandiamine can be used. Specifically, triethylenetriamine, inphoronediamine, xylylenediamine, phenylenediamine,
Diaminodiphenylmethane, diaminodiphenyl sulfone, diaminodiphenyl ether, aniline-formalin resin, etc., or phthalic anhydride, methylnadic anhydride, trimellitic anhydride, ethylene glycol bistrimelitate, etc., or polysulfide resins with mercaptan groups at both ends. , aniline and boron trifluoride complexes, low molecular weight from phenol-formalin, novolak resins, dicyandiamide, etc. Further, during the curing reaction, a curing accelerator such as tertiary amines, phenols, imidazoles, etc. can be used if necessary.
本発明のエポキシ系化合物の硬化反応は室温でも進行す
るが、好ましくは70〜250℃の間の温度に加熱して
行う。硬化時間は通常0.5〜5時間である。またここ
で得られる硬化物は好ましくは9
100℃以上の温度でキユアリングすることにより耐熱
性の向上がはかられる。Although the curing reaction of the epoxy compound of the present invention proceeds at room temperature, it is preferably carried out by heating to a temperature between 70 and 250°C. The curing time is usually 0.5 to 5 hours. Further, the heat resistance of the cured product obtained here is improved by curing preferably at a temperature of 9100°C or higher.
〈発明の効果)
本発明の新規なエポキシ系化合物は、低融点であり作業
性がよく、また硬化もラジカル硬化・紫外線硬化・エポ
キシ硬化などいずれでも硬化できる。硬化物は耐熱性が
高く、また耐衝撃性などの機械的特性に優れる。特に高
温で長期にわたり機械的特性を保持するという利点を有
する。(Effects of the Invention) The novel epoxy compound of the present invention has a low melting point and good workability, and can be cured by radical curing, ultraviolet curing, epoxy curing, etc. The cured product has high heat resistance and excellent mechanical properties such as impact resistance. It has the advantage of retaining its mechanical properties over a long period of time, especially at high temperatures.
従ってこの樹脂は、接着剤、キャスティング樹脂、塗料
、電気絶縁材料、複合材料マトリックス樹脂などの他、
種々の用途に使用できる。Therefore, this resin can be used in adhesives, casting resins, paints, electrical insulation materials, composite matrix resins, etc.
Can be used for various purposes.
(実施例)
以下、実施例をあげて本発明を詳述するが、本発明はこ
れによって限定されるものでない。(Examples) Hereinafter, the present invention will be explained in detail with reference to Examples, but the present invention is not limited thereto.
また、各実施例において、エポキシ系化合物の同定に使
用した赤外吸収スペクトル分析(IR)。In addition, in each example, infrared absorption spectrum analysis (IR) was used to identify the epoxy compound.
核磁気共鳴スペクトル分析(NMR)の測定方法は次の
とおりである。The measurement method of nuclear magnetic resonance spectroscopy (NMR) is as follows.
a)赤外吸収スペクトル分析(IR)
0
得られた化合物と粉砕しなKBr粉末とを混合し、プレ
ス成形し常法により測定しな。a) Infrared absorption spectroscopy (IR) 0 The obtained compound and unpulverized KBr powder were mixed, press-molded, and measured using a conventional method.
b)核磁気共鳴スペクトル分析(NMR)溶媒に重水素
化ジメチルスルホキシドを使用し、標準サンプルとして
テトラメチルシランを使用して室温で測定した。b) Nuclear Magnetic Resonance Spectroscopy (NMR) Measured at room temperature using deuterated dimethyl sulfoxide as the solvent and tetramethylsilane as the standard sample.
実施例1
m−アミノフェノール109.1 g (1,0モル)
をテトラヒドロフラン(THF ) 500ccに溶解
し、そこにトリエチルアミン106gを加え水浴につけ
る。別にアクリルクロライド90.5g <1.0モル
)をT HF 200ccに溶解した液を調製し、さき
のmアミノフェノールのTHF溶液に攪拌下注加する。Example 1 m-aminophenol 109.1 g (1.0 mol)
was dissolved in 500 cc of tetrahydrofuran (THF), 106 g of triethylamine was added thereto, and the mixture was placed in a water bath. Separately, prepare a solution in which 90.5 g of acrylic chloride (<1.0 mol) is dissolved in 200 cc of THF, and add it to the THF solution of m-aminophenol with stirring.
反応後THFを減圧上除去し、酢酸エチルを加え反応物
を溶解し、さらに水を加え副生ずる塩を除去し酢酸エチ
ル層を分離し、次いで酢酸エチルをエバポレーターで除
去し乾燥すると141gの白色粉末が得られた。After the reaction, THF was removed under reduced pressure, ethyl acetate was added to dissolve the reactants, water was added to remove by-product salts, and the ethyl acetate layer was separated. Ethyl acetate was then removed using an evaporator and dried to yield 141 g of white powder. was gotten.
これはN−(3−ヒドロキシフェニル〉アクリ1 ルアミドである。This is N-(3-hydroxyphenyl>acryl) Ruamide.
次に、このN−(3−ヒドロキシフェニル)アクリルア
ミド73.5gとエピクロルヒドリン163.2gおよ
びトリメチルアンモニウムクロライド1.6gを3つ目
フラスコに入れ、120℃のバス温で攪拌下4時間反応
する。次いで、バス温を45℃に下げ5規定の苛性ソー
ダ水溶液112ccをゆっくり加える。滴下後同じ温度
で1時間反応を行い、終了する。反発後過剰のエピクロ
ルヒドリンを留去し、次いでTHFと塩化カルシウム5
重量%の水を加えよく混合すると、2層に分離した。T
HF層を分離し濃縮すると白色固体の粉末が72jg得
られた。Next, 73.5 g of this N-(3-hydroxyphenyl)acrylamide, 163.2 g of epichlorohydrin, and 1.6 g of trimethylammonium chloride are placed in a third flask and reacted for 4 hours with stirring at a bath temperature of 120°C. Next, the bath temperature was lowered to 45° C. and 112 cc of a 5N aqueous solution of caustic soda was slowly added. After the dropwise addition, the reaction is carried out at the same temperature for 1 hour, and then the reaction is completed. After repulsion, excess epichlorohydrin was distilled off, and then THF and calcium chloride 5
When % by weight of water was added and mixed well, the mixture was separated into two layers. T
The HF layer was separated and concentrated to obtain 72 g of white solid powder.
融点は73〜76℃であり、NMR(溶媒d6 DMS
O>よりエポキシ基、フェニルおよびアミドのHシグナ
ルがそれぞれ観測されN−(3−グリシジルオキシフェ
ニル)アクリルアミドであることがわかった。The melting point is 73-76 °C, NMR (solvent d6 DMS
From O>, H signals of epoxy group, phenyl, and amide were observed, and it was found that it was N-(3-glycidyloxyphenyl)acrylamide.
なお、元素分析値はC65,09%(計算値65.75
%)、H6゜03%(計算値5.94%)、H6,52
%(計2
算値6,39%)であった。またエポキシ当量は242
(計算値219〉であった。このものの赤外吸収スペク
トル分析(IR)及び核磁気共鳴スペクトル分析(NM
R)の結果はそれぞれ第1図及び第2図に示すとおりで
あった。The elemental analysis value is C65.09% (calculated value 65.75
%), H6゜03% (calculated value 5.94%), H6,52
% (total 2 calculated value 6.39%). Also, the epoxy equivalent is 242
(calculated value 219).Infrared absorption spectroscopy (IR) and nuclear magnetic resonance spectroscopy (NM
The results of R) were as shown in FIGS. 1 and 2, respectively.
次に、このエポキシ系化合物10g、無水メチルナジッ
ク酸5.8g、ベンジルジメチルアミン0.07g及び
t−ブチル−パーオキシ−2−エチルヘキサネート0.
2gを加え100℃で30分間硬化させ、次いで150
℃で10時間後硬化させた。100℃では20分間で硬
化する。Next, 10 g of this epoxy compound, 5.8 g of methylnadic anhydride, 0.07 g of benzyldimethylamine, and 0.0 g of t-butyl-peroxy-2-ethylhexanate.
Add 2g and cure at 100℃ for 30 minutes, then 150℃
It was post-cured for 10 hours at °C. It hardens in 20 minutes at 100°C.
得られた硬化物の熱変形温度は154℃であり、また重
量減少開始温度は368℃と耐熱性も高いものであった
。The heat distortion temperature of the obtained cured product was 154°C, and the weight loss start temperature was 368°C, indicating high heat resistance.
実施例2
実施例1と同様にp−アミノフェノールとメタクリルク
ロライドよりN−(4−ヒドロキシフェニル〉メタクリ
ルアミドをまず合成し、次いでこれをエピクロルヒドリ
ンでエポキシ化し、N(4−グリシジルオキシフェニル
)メタクリルア3
ミドを得た。このものの融点は94〜98℃であり、N
MRで構造を確認した。またエポキシ当量は261り計
算値233)であった。Example 2 N-(4-hydroxyphenyl)methacrylamide was first synthesized from p-aminophenol and methacryl chloride in the same manner as in Example 1, and then this was epoxidized with epichlorohydrin to form N(4-glycidyloxyphenyl)methacrylamide. 3 was obtained.The melting point of this product was 94-98°C, and N
The structure was confirmed by MR. The epoxy equivalent was 261 (calculated value 233).
次いでこのものを実施例1と同じ触媒、硬化条件で硬化
させ、硬化物を得な。この硬化物の熱変形温度は162
℃であった。Next, this product was cured using the same catalyst and curing conditions as in Example 1 to obtain a cured product. The heat distortion temperature of this cured product is 162
It was ℃.
実施例3
実施例1と同様に4−アミノ−4′−ヒドロキシジフェ
ニルエーテルとアクリルクロライドより中間体をつくり
、次いでこれをエピクロルヒドリンでエポキシ化するこ
とにより、下記化合物を得な。Example 3 The following compound was obtained by preparing an intermediate from 4-amino-4'-hydroxydiphenyl ether and acryl chloride in the same manner as in Example 1, and then epoxidizing this with epichlorohydrin.
このものの融点は131〜136℃であり、また元素分
析はC68,87%(計算値69.45%)、H5,5
3%(計算値5.47%)、N4.73%(計算値4,
50%)であった。また、このもののエポキシ当量は3
35(計算値311)であった。The melting point of this product is 131-136℃, and elemental analysis shows C68.87% (calculated value 69.45%), H5.5
3% (calculated value 5.47%), N4.73% (calculated value 4,
50%). Also, the epoxy equivalent of this product is 3
35 (calculated value 311).
この化合物を無水メチルナジック酸、ベンジル4
ジメチルアミンおよびジクミルパーオキサイドの触媒系
を用い150°Cで1時間、次いで170℃で5時間硬
化させ、硬化物を得な。このものの熱変形温度は169
℃であり、熱重量減少開始温度は379℃と高かった。This compound was cured using a catalyst system of methylnadic anhydride, benzyl dimethylamine and dicumyl peroxide at 150°C for 1 hour and then at 170°C for 5 hours to obtain a cured product. The heat distortion temperature of this item is 169
℃, and the thermogravimetric decrease starting temperature was as high as 379℃.
第1図は本発明に係る新規なエポキシ系化合物(実施例
1に記載のもの)の赤外線吸収スペクトル図であり、第
2図は同じ化合物の核磁気共鳴スペクトル図である。FIG. 1 is an infrared absorption spectrum diagram of the novel epoxy compound according to the present invention (described in Example 1), and FIG. 2 is a nuclear magnetic resonance spectrum diagram of the same compound.
Claims (1)
て構成されるエポキシ系化合物。 ▲数式、化学式、表等があります▼・・・( I ) [但し、式( I )において、Gは ▲数式、化学式、表等があります▼又は▲数式、化学式
、表等があります▼ を表わし、Rは水素及び/又は炭素原子数4以下の炭化
水素基であり、n、mはそれぞれ1〜4の整数である。 またArはハロゲン原子で置換されていてもよい炭素原
子数16以下の(n+m)価の芳香族炭化水素基である
。](2)下記一般式(II)で表わされる化合物のアミ
ノ基と ▲数式、化学式、表等があります▼・・・(II) [但し、式(II)におけるArは上記式( I )と同じ
。] 下記一般式(III)で表わされる化合物のカルボン酸誘
導基と ▲数式、化学式、表等があります▼・・・(III) [但し、式(III)におけるRは式( I )と同じYはハ
ロゲン、水酸基あるいは−O−R′、なおR′は炭化水
素基。] を反応させ、ヒドロキシル基を有するアミド化合物(I
V)をつくり、次いで該アミド化合物(IV)とエピハロ
ヒドリンとを反応させ、しかる後、脱ハロゲン化水素化
することを特徴とするエポキシ系化合物の製造法。 (3)請求項(1)に記載のエポキシ系化合物をエポキ
シ硬化剤及びラジカル開始剤及び/又は紫外線で硬化し
て得られたことを特徴とするエポキシ系硬化樹脂。[Scope of Claims] (1) An epoxy compound mainly composed of a structure represented by the following general formula (I). ▲There are mathematical formulas, chemical formulas, tables, etc.▼...(I) [However, in formula (I), G represents ▲There are mathematical formulas, chemical formulas, tables, etc.▼ or ▲There are mathematical formulas, chemical formulas, tables, etc.▼ , R are hydrogen and/or a hydrocarbon group having 4 or less carbon atoms, and n and m are each an integer of 1 to 4. Further, Ar is an (n+m)-valent aromatic hydrocarbon group having 16 or less carbon atoms which may be substituted with a halogen atom. ] (2) The amino group of the compound represented by the general formula (II) below and ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼... (II) [However, Ar in formula (II) is the same as the above formula (I). same. ] The carboxylic acid derivative group of the compound represented by the general formula (III) below and ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼... (III) [However, R in formula (III) is the same Y as in formula (I) is a halogen, a hydroxyl group or -O-R', where R' is a hydrocarbon group. ] to form an amide compound having a hydroxyl group (I
A method for producing an epoxy compound, which comprises preparing amide compound (IV), then reacting the amide compound (IV) with epihalohydrin, and then dehydrohalogenating the amide compound (IV). (3) A cured epoxy resin obtained by curing the epoxy compound according to claim (1) with an epoxy curing agent, a radical initiator, and/or an ultraviolet ray.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2061267A JPH03264571A (en) | 1990-03-14 | 1990-03-14 | Epoxy-based compound, production thereof and cured resin obtained from same compound |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2061267A JPH03264571A (en) | 1990-03-14 | 1990-03-14 | Epoxy-based compound, production thereof and cured resin obtained from same compound |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH03264571A true JPH03264571A (en) | 1991-11-25 |
Family
ID=13166282
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2061267A Pending JPH03264571A (en) | 1990-03-14 | 1990-03-14 | Epoxy-based compound, production thereof and cured resin obtained from same compound |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH03264571A (en) |
-
1990
- 1990-03-14 JP JP2061267A patent/JPH03264571A/en active Pending
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