JPH03259264A - Manufacture of electrographic photosensitive body - Google Patents
Manufacture of electrographic photosensitive bodyInfo
- Publication number
- JPH03259264A JPH03259264A JP5925890A JP5925890A JPH03259264A JP H03259264 A JPH03259264 A JP H03259264A JP 5925890 A JP5925890 A JP 5925890A JP 5925890 A JP5925890 A JP 5925890A JP H03259264 A JPH03259264 A JP H03259264A
- Authority
- JP
- Japan
- Prior art keywords
- cleaning
- cleaning solution
- alkaline cleaning
- weak alkaline
- stress
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 5
- 239000000758 substrate Substances 0.000 claims abstract description 26
- 238000004140 cleaning Methods 0.000 claims abstract description 24
- 239000000463 material Substances 0.000 claims abstract description 13
- 229910000838 Al alloy Inorganic materials 0.000 claims abstract description 6
- 108091008695 photoreceptors Proteins 0.000 claims description 11
- 239000010407 anodic oxide Substances 0.000 abstract description 3
- 238000005406 washing Methods 0.000 abstract 2
- 230000000052 comparative effect Effects 0.000 description 8
- 239000000243 solution Substances 0.000 description 7
- 238000000034 method Methods 0.000 description 5
- 229910045601 alloy Inorganic materials 0.000 description 4
- 239000000956 alloy Substances 0.000 description 4
- 239000007864 aqueous solution Substances 0.000 description 4
- 239000011248 coating agent Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 230000007547 defect Effects 0.000 description 3
- 239000003599 detergent Substances 0.000 description 3
- 239000003960 organic solvent Substances 0.000 description 3
- 238000013020 steam cleaning Methods 0.000 description 3
- 238000004506 ultrasonic cleaning Methods 0.000 description 3
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000007935 neutral effect Effects 0.000 description 2
- 239000011368 organic material Substances 0.000 description 2
- 229910019064 Mg-Si Inorganic materials 0.000 description 1
- 229910019406 Mg—Si Inorganic materials 0.000 description 1
- BUGBHKTXTAQXES-UHFFFAOYSA-N Selenium Chemical compound [Se] BUGBHKTXTAQXES-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000011538 cleaning material Substances 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000001125 extrusion Methods 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- 239000004745 nonwoven fabric Substances 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 229910052711 selenium Inorganic materials 0.000 description 1
- 239000011669 selenium Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Photoreceptors In Electrophotography (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
この発明は、普通紙複写機、レーザビームプリンタなど
の電子写真応用装置に用いられる有機系電子写真用感光
体の製造方法に関し、詳しくは感光層形成前の導電性基
体表面の洗浄方法に関する。[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to a method for manufacturing an organic electrophotographic photoreceptor used in electrophotographic application devices such as plain paper copying machines and laser beam printers. The present invention relates to a method for cleaning the surface of a conductive substrate before layer formation.
有機系電子写真用感光体は、通常、導電性基体上に有機
材料からなる電荷発生層、電荷輸送層を順次塗布形成し
てなる感光層が設けられたものである。An organic electrophotographic photoreceptor usually has a photosensitive layer formed by sequentially coating a charge generation layer and a charge transport layer made of an organic material on a conductive substrate.
このような感光体の導電性基体としては、従来のセレン
などの無機材料を用いた感光体の場合と同様に、一般に
アルミニウムを主成分とする合金を材料とする円筒が用
いられる。すなわち、アルミニウムを主成分とする合金
(へl−Mn系合金へl −Mg−Si系合金など)を
押し出し成形性により円筒状とし、さらに引き抜き加工
、しごき加工を行って寸法精度を高めた円筒を用い、所
要の外形寸法に加工した後、その外表面を後工程におけ
る品質の維持、向上に役立つように均一な表面に仕上げ
、有機溶剤、中性洗剤2弱アルカリ洗剤などで洗浄して
使用する。As the conductive substrate of such a photoreceptor, a cylinder made of an alloy containing aluminum as a main component is generally used, as in the case of conventional photoreceptors using inorganic materials such as selenium. In other words, an alloy whose main component is aluminum (for example, a l-Mn-based alloy or a l-Mg-Si-based alloy) is made into a cylindrical shape by extrusion formability, and then drawn and ironed to improve dimensional accuracy. After processing it to the required external dimensions using do.
このような基体の具備すべき要件としては、a)表面が
局部的に変化せず安定であること。Requirements for such a substrate include: a) the surface should be stable without local changes;
b)所要の一定の表面粗さを安定して保っていること。b) The required constant surface roughness is stably maintained.
C)プリンタなどに用いられた場合、出力画像に基体表
面での露光光の反射に起因する干渉縞が発生しないこと
。C) When used in a printer or the like, interference fringes due to reflection of exposure light on the substrate surface should not occur in the output image.
d)洗浄性が良く、洗浄後の表面に異物、汚れが残存し
ていないこと。d) Cleanability is good, and no foreign matter or dirt remains on the surface after cleaning.
などが挙げられる。Examples include.
これらの項目のうち、a)、 b)およびC)項を満た
す有効な方法の一つとして、基体としてのアルミニウム
合金円筒の表面に陽極酸化皮膜(アルマイト層)を設け
ることが知られている。すなわち、アルミニウム合金円
筒外表面を超精密旋盤で所要の一定の粗さに均一に仕上
げたのち、陽極酸化処理を施して表面を硬質の陽極酸化
皮膜で被覆し、有機溶剤〈例えばトリクレン)中で超音
波洗浄し、さらに有機溶剤蒸気で蒸気洗浄して清浄にし
た基体を用いることが行われている。Among these items, it is known that one effective method for satisfying items a), b), and C) is to provide an anodized film (alumite layer) on the surface of an aluminum alloy cylinder serving as a base. That is, the outer surface of an aluminum alloy cylinder is uniformly finished to the required constant roughness using an ultra-precision lathe, then anodized to coat the surface with a hard anodic oxide film, and then processed in an organic solvent (e.g., trichlene). It is common practice to use a substrate that has been cleaned by ultrasonic cleaning and further steam cleaning with organic solvent vapor.
しかしながら、上述のような陽極酸化皮膜で被覆された
基体表面は洗浄性に問題があり、前述のような精密な洗
浄を行っても微小な異物や汚れを完全には取り除くこと
が難しく、このような基体を用いた感光体では残存する
異物や汚れに起因すると見られる画像欠陥が発生すると
いう問題があった。However, the substrate surface coated with the above-mentioned anodic oxide film has problems in cleaning performance, and even with the above-mentioned precision cleaning, it is difficult to completely remove minute foreign objects and dirt. Photoreceptors using such substrates have a problem in that image defects appear to be caused by residual foreign matter or dirt.
この発明は、上述の問題点を解消して、画像欠陥の少な
い高品質の出力画像の得られる有機系の電子写真用感光
体の製造方法を提供することを解決すべき課題とする。An object of the present invention is to provide a method for manufacturing an organic electrophotographic photoreceptor that eliminates the above-mentioned problems and provides a high-quality output image with few image defects.
上記の課題は、この発明によれば、表面に陽極酸化皮膜
が形成されたアルミニウム合金からなる導電性基体の表
面を弱アルカリ性洗浄液を用いて拭浄材によりストレス
を加えながら洗浄したのち、この基体表面に有機光導電
性材料を含む感光層を形成して感光体を製造することに
より解決される。According to the present invention, the above problem can be solved by cleaning the surface of a conductive substrate made of an aluminum alloy with an anodized film formed on the surface using a weak alkaline cleaning solution while applying stress with a wiping material. This problem is solved by manufacturing a photoreceptor by forming a photosensitive layer containing an organic photoconductive material on the surface.
拭浄材としては弱アルカリ性洗浄液に対して耐久性を有
する柔軟な材質のもの、例えばスポンジ。The cleaning material is a flexible material that is resistant to weakly alkaline cleaning solutions, such as a sponge.
不織布などを用いることができる。Non-woven fabric etc. can be used.
弱アルカリ性洗剤を用いて拭浄材でストレスを加えなが
ら洗浄することにより、従来の有機溶剤での超音波洗浄
および蒸気洗浄では除去しきれなかった異物、汚れを取
り除くことができ、基体表面の清浄度が大幅に向上する
。このようにして得られた表面清浄な基体を用いること
により、画像欠陥の少ない感光体が得られることになる
。By cleaning with a weak alkaline detergent and applying stress with a wiping material, it is possible to remove foreign substances and dirt that could not be removed by conventional ultrasonic cleaning and steam cleaning with organic solvents, and to clean the substrate surface. degree is significantly improved. By using the surface-clean substrate thus obtained, a photoreceptor with fewer image defects can be obtained.
以下、この発明の実施例について説明する。 Examples of the present invention will be described below.
実施例1
所要の外形寸法に加工されたアルミニウム合金円筒の表
面を超精密旋盤により所要の一定の粗さに加工し、その
表面を硫酸溶液で陽極酸化処理してアルマイト層を形成
した。この円筒表面を以下の工程で洗浄して導電性基体
とした。Example 1 The surface of an aluminum alloy cylinder that had been machined to the required external dimensions was machined to the required constant roughness using an ultra-precision lathe, and the surface was anodized with a sulfuric acid solution to form an alumite layer. The surface of this cylinder was cleaned in the following steps to obtain a conductive substrate.
(a) ) IJクレン超超音波洗浄3聞↓
(C)トリクレン蒸気洗浄
↓
(d)弱アルカリ性洗浄液(ジョンソン社製N(12
0 0の0、5容量%水溶液〉を基体表面に吹き付けな
から拭浄材〔鐘紡Q@製PVへスポンジ(ベルクリン)
〕でポリッシング
(e)純水洗浄
↓
(f)水切り,乾燥
実施例2.3
実施例1の洗浄工程(d)で用いた弱アルカリ性洗浄液
の濃度を変え、それぞれ1.0容量%水溶液。(a) ) IJ Clen ultrasonic cleaning for 3 cycles ↓ (C) Trichlene steam cleaning ↓ (d) Weak alkaline cleaning solution (Johnson N (12)
Spray 0.5% by volume aqueous solution of 00 on the surface of the substrate and use a wiping material [Kanebo Q @ PV sponge (Berklin)
] Polishing (e) Cleaning with pure water ↓ (f) Draining and drying Example 2.3 The concentration of the weakly alkaline cleaning solution used in the cleaning step (d) of Example 1 was changed, and each was a 1.0% by volume aqueous solution.
1、5容量%水溶液としたこと以外は実施例1と同様に
して、実施例2,実施例3の導電性基体とした。Conductive substrates of Examples 2 and 3 were prepared in the same manner as in Example 1 except that the aqueous solutions were 1.5% by volume.
比較例1
円筒表面の洗浄を実施例1の洗浄工程(C)まで行い以
後の工程を行わない従来の洗浄方法とし、比較例1の導
電性基体とした。Comparative Example 1 A conductive substrate of Comparative Example 1 was obtained by cleaning the cylindrical surface using a conventional cleaning method in which the cleaning step (C) of Example 1 was performed and the subsequent steps were not performed.
比較例2,3.4
実施例1の洗浄工程(d)で用いた弱アルカリ性洗浄液
のかわりに、それぞれ中性洗剤の5容量%水溶液,10
容量%水溶液, 15容量%水溶液を用いたこと以外は
実施例1と同様にして、比較例2,比較例3.比較例4
の導電性基体とした。Comparative Examples 2 and 3.4 Instead of the weakly alkaline cleaning solution used in the cleaning step (d) of Example 1, a 5% by volume aqueous solution of a neutral detergent and 10% by volume were used, respectively.
Comparative Example 2, Comparative Example 3. Comparative example 4
It was made into a conductive substrate.
これらの導電性基体について、その表面の水切れ、濡れ
性、外観を評価した。その結果を第1表に示す。These conductive substrates were evaluated for surface drainage, wettability, and appearance. The results are shown in Table 1.
また、これらの導電性基体上に有機材料からなる電荷発
生層、電荷輸送層を順次塗布形成して感光体を作製し、
塗工後外観、電気特性9画像品質(半導体レーザビーム
プリンタによる)を評価した。その結果を使用した導電
性基体に対応させて第1表に示す。In addition, a photoreceptor is prepared by sequentially coating and forming a charge generation layer and a charge transport layer made of an organic material on these conductive substrates.
After coating, appearance, electrical properties, and image quality (using a semiconductor laser beam printer) were evaluated. The results are shown in Table 1 in correspondence with the conductive substrates used.
第 1 表
第1表より、実施例の導電性基体は基体表面のアルマイ
ト層表面が比較例1に比べて非常に清浄になっており、
その上に電荷発生層、電荷輸送層を良好に塗布すること
ができ、電気特性1画像品質ともに優れた感光体が得ら
れることが判る。また、比較例2〜4より、拭浄材でス
トレスを加えながら洗浄を行っても、中性洗剤ではアル
マイト層表面の洗浄は不充分で、弱アルカリ性洗浄液を
用いることが必要であることが判る。Table 1 From Table 1, the surface of the alumite layer on the conductive substrate of the example is much cleaner than that of Comparative Example 1.
It can be seen that a charge generation layer and a charge transport layer can be coated satisfactorily thereon, and a photoreceptor with excellent electrical properties and image quality can be obtained. In addition, from Comparative Examples 2 to 4, it can be seen that even if cleaning is performed while applying stress with a wiping material, the surface of the alumite layer cannot be sufficiently cleaned with a neutral detergent, and it is necessary to use a weakly alkaline cleaning solution. .
Claims (1)
からなる導電性基体の表面を弱アルカリ性洗浄液を用い
て拭浄材によりストレスを加えながら洗浄したのち、こ
の基体表面に有機光導電性材料を含む感光層を形成する
ことを特徴とする電子写真用感光体の製造方法。1) After cleaning the surface of a conductive substrate made of an aluminum alloy with an anodized film formed on the surface using a weak alkaline cleaning solution while applying stress with a wiping material, the surface of this substrate contains an organic photoconductive material. A method for producing an electrophotographic photoreceptor, which comprises forming a photosensitive layer.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5925890A JP2682188B2 (en) | 1990-03-09 | 1990-03-09 | Manufacturing method of photoreceptor for electrophotography |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5925890A JP2682188B2 (en) | 1990-03-09 | 1990-03-09 | Manufacturing method of photoreceptor for electrophotography |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH03259264A true JPH03259264A (en) | 1991-11-19 |
JP2682188B2 JP2682188B2 (en) | 1997-11-26 |
Family
ID=13108173
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP5925890A Expired - Lifetime JP2682188B2 (en) | 1990-03-09 | 1990-03-09 | Manufacturing method of photoreceptor for electrophotography |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2682188B2 (en) |
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0772642A (en) * | 1993-09-01 | 1995-03-17 | Kobe Steel Ltd | Photosensitive drum |
JPH08262775A (en) * | 1995-03-27 | 1996-10-11 | Kobe Steel Ltd | Photoreceptor substrate and photoreceptor drum |
JP2002319495A (en) * | 2001-01-18 | 2002-10-31 | Semiconductor Energy Lab Co Ltd | Manufacturing method of light-emitting device |
JP2002334790A (en) * | 2001-02-19 | 2002-11-22 | Semiconductor Energy Lab Co Ltd | Light emitting device and its formation method |
JP2004071558A (en) * | 2002-07-25 | 2004-03-04 | Semiconductor Energy Lab Co Ltd | Method of manufacturing light-emitting device |
US7423293B2 (en) | 2001-02-19 | 2008-09-09 | Semiconductor Energy Laboratory Co., Ltd. | Light emitting device |
US7485478B2 (en) | 2001-02-19 | 2009-02-03 | Semiconductor Energy Laboratory Co., Ltd. | Light emitting device and method of manufacturing the same |
KR101011980B1 (en) * | 2002-07-25 | 2011-01-31 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | Method of fabricating light emitting device |
-
1990
- 1990-03-09 JP JP5925890A patent/JP2682188B2/en not_active Expired - Lifetime
Cited By (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0772642A (en) * | 1993-09-01 | 1995-03-17 | Kobe Steel Ltd | Photosensitive drum |
JPH08262775A (en) * | 1995-03-27 | 1996-10-11 | Kobe Steel Ltd | Photoreceptor substrate and photoreceptor drum |
JP2002319495A (en) * | 2001-01-18 | 2002-10-31 | Semiconductor Energy Lab Co Ltd | Manufacturing method of light-emitting device |
US7485478B2 (en) | 2001-02-19 | 2009-02-03 | Semiconductor Energy Laboratory Co., Ltd. | Light emitting device and method of manufacturing the same |
US7423293B2 (en) | 2001-02-19 | 2008-09-09 | Semiconductor Energy Laboratory Co., Ltd. | Light emitting device |
JP2002334790A (en) * | 2001-02-19 | 2002-11-22 | Semiconductor Energy Lab Co Ltd | Light emitting device and its formation method |
US7825419B2 (en) | 2001-02-19 | 2010-11-02 | Semiconductor Energy Laboratory Co., Ltd. | Light emitting device and method of manufacturing the same |
US8497525B2 (en) | 2001-02-19 | 2013-07-30 | Semiconductor Energy Laboratory Co., Ltd. | Light emitting device and method of manufacturing the same |
US8679875B2 (en) | 2001-02-19 | 2014-03-25 | Semiconductor Energy Laboratory Co., Ltd. | Light emitting device and method of manufacturing the same |
US8866184B2 (en) | 2001-02-19 | 2014-10-21 | Semiconductor Energy Laboratory Co., Ltd. | Light emitting device and method of manufacturing the same |
US9502679B2 (en) | 2001-02-19 | 2016-11-22 | Semiconductor Energy Laboratory Co., Ltd. | Light emitting device and method of manufacturing the same |
US9768405B2 (en) | 2001-02-19 | 2017-09-19 | Semiconductor Energy Laboratory Co., Ltd. | Light emitting device and method of manufacturing the same |
US9954196B2 (en) | 2001-02-19 | 2018-04-24 | Semiconductor Energy Laboratory Co., Ltd. | Light emitting device and method of manufacturing the same |
JP2004071558A (en) * | 2002-07-25 | 2004-03-04 | Semiconductor Energy Lab Co Ltd | Method of manufacturing light-emitting device |
KR101011980B1 (en) * | 2002-07-25 | 2011-01-31 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | Method of fabricating light emitting device |
Also Published As
Publication number | Publication date |
---|---|
JP2682188B2 (en) | 1997-11-26 |
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