JPH03246983A - Narrow-band excimer laser oscillator - Google Patents

Narrow-band excimer laser oscillator

Info

Publication number
JPH03246983A
JPH03246983A JP4361390A JP4361390A JPH03246983A JP H03246983 A JPH03246983 A JP H03246983A JP 4361390 A JP4361390 A JP 4361390A JP 4361390 A JP4361390 A JP 4361390A JP H03246983 A JPH03246983 A JP H03246983A
Authority
JP
Japan
Prior art keywords
excimer laser
etalons
laser oscillator
narrow
zero
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP4361390A
Other languages
Japanese (ja)
Inventor
Takashi Eura
隆 江浦
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP4361390A priority Critical patent/JPH03246983A/en
Publication of JPH03246983A publication Critical patent/JPH03246983A/en
Pending legal-status Critical Current

Links

Landscapes

  • Lasers (AREA)

Abstract

PURPOSE:To obtain a narrow-band excimer laser oscillator whose beam strength distribution is extremely stable by a method wherein the etalon part of a narrow-band excimer laser is kept at absolute zero or at a definite temperature near it. CONSTITUTION:Two kinds of etalons 4, 5 which are elements to form narrow bands and whose free spectral range is different are housed inside a hermetically sealed container 6; they are kept at absolute zero or at a definite temperature near it. When a laser beam passes the etalons 4, 5, one part of the laser beam is absorbed by the respective etalons 4, 5 and is changed into a heat energy. Generally, there is a tendency that a coefficient of thermal expansion becomes zero or extremely small at absolute zero or at a temperature near it. Thereby, the thermal expansion of the etalons 4, 5 can be suppressed to be zero or extremely small, and a laser beam oscillator whose beam strength distribution is stable can be obtained.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 この発明は、例えば半導体製造工程におけるリソグラフ
ィー等の縮小投影露光装置の光源として用いる狭帯域エ
キシマレーザ発振器の構造に関するものである。
DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to the structure of a narrow band excimer laser oscillator used as a light source for a reduction projection exposure apparatus such as lithography in a semiconductor manufacturing process.

〔従来の技術〕[Conventional technology]

従来のこの種の光源として、パターンの解像度を高める
ために紫外域の光を発生するものが用いられており、そ
の一つとして狭帯域エキシマレーザ発振器が使用されて
いる。
Conventional light sources of this type that generate light in the ultraviolet region are used to improve pattern resolution, and one example of such light sources is a narrowband excimer laser oscillator.

第4図は従来のこの種のエキシマレーザ発振器(例えば
特開昭64−53589号公報に記載された狭帯域エキ
シマレーザ発振器)を示すブロック図であり、図におい
て、1はリアミラー、2はレーザチャンバ、3はフロン
トミラーであり、通常の広帯域エキシマレーザはこの系
で発振する。そして、この系に狭帯域化素子として、例
えばフリースペクトラルレンジの異なる2種類のエタロ
ン4.5を設置することにより、狭帯域エキシマレーザ
発振器が構成される。なお、6〜11はレーザ発振波長
を一定に制御するための系であり、それぞれ6はビーム
スプリッタ、7はレンズ、8は光ファイバ、9は発振中
心波長及び中心波長パワー検出器、IOは波長コントロ
ーラ、11はドライバである。
FIG. 4 is a block diagram showing a conventional excimer laser oscillator of this type (for example, the narrowband excimer laser oscillator described in Japanese Patent Application Laid-Open No. 64-53589). In the figure, 1 is a rear mirror, and 2 is a laser chamber. , 3 is a front mirror, and a normal broadband excimer laser oscillates in this system. A narrowband excimer laser oscillator is constructed by installing, for example, two types of etalons 4.5 with different free spectral ranges as narrowband elements in this system. In addition, 6 to 11 are systems for controlling the laser oscillation wavelength to a constant value, and 6 is a beam splitter, 7 is a lens, 8 is an optical fiber, 9 is an oscillation center wavelength and a center wavelength power detector, and IO is a wavelength The controller 11 is a driver.

第3図a、bは上記エキシマレーザ発振器に使用される
エタロンの詳細図を示したもので、合成石英基板12、
誘電体多層膜からなる高反射膜13.スペーサ14から
構成されており、2枚の合成石英基板12は3枚のスペ
ーサ14によりオプティカルコンタクトされ、発振波長
に最適なギャップ15が形成される。
FIGS. 3a and 3b show detailed views of the etalon used in the excimer laser oscillator, in which the synthetic quartz substrate 12,
Highly reflective film 13 consisting of a dielectric multilayer film. The two synthetic quartz substrates 12 are optically contacted by the three spacers 14 to form a gap 15 that is optimal for the oscillation wavelength.

従来の狭帯域エキシマレーザ発振器は上記のように構成
されており、出力レーザ光の一部をビームスプリッタ6
で分離し、レンズ7、光ファイバ8を通して発振中心波
長及び中心波長パワー検知器9によりモニターする。そ
して、そこで設定波長及び出力と比較の上、波長コント
ローラ10. ドライバ11によりエタロン4.5の例
えば角度を制御することにより、必要とする中心波長と
出力を得る。
A conventional narrowband excimer laser oscillator is configured as described above, and a part of the output laser light is sent to the beam splitter 6.
The oscillation center wavelength and the center wavelength power are monitored by a detector 9 through a lens 7 and an optical fiber 8. Then, after comparing the set wavelength and output, the wavelength controller 10. By controlling, for example, the angle of the etalon 4.5 using the driver 11, the required center wavelength and output are obtained.

〔発明が解決しようとする課題〕[Problem to be solved by the invention]

上述した従来の狭帯域エキシマレーザ発振器においては
、主に次のような問題点があった。
The conventional narrowband excimer laser oscillator described above mainly has the following problems.

■エタロン4,5がそこを通過するレーザビームにより
熱膨張を起こして、そのギャップ15が常に変化するこ
ととなり、そのため、常に波長制御を行う必要があった
(2) The etalons 4 and 5 undergo thermal expansion due to the laser beam passing through them, and the gap 15 between them constantly changes, so it is necessary to constantly control the wavelength.

■エタロン4,5のビーム断面において、ギャップ15
や熱膨張率がミクロに異なるので、ビーム強度分布が極
めて不安定であった。
■Gap 15 in the beam cross section of etalons 4 and 5
The beam intensity distribution was extremely unstable because of the microscopic differences in the thermal expansion coefficient and the beam intensity distribution.

この発明は上記のような問題点を解消するためになされ
たもので、波長制御が皆無又はほとんど不用であると共
に、ビーム強度分布の極めて安定した狭帯域エキシマレ
ーザ発振器を得て、生産ライン用に適した縮小投影型露
光装置用に最適なものを提供することを目的とする。
This invention was made to solve the above-mentioned problems, and it is possible to obtain a narrow-band excimer laser oscillator that requires no or almost no wavelength control and has an extremely stable beam intensity distribution, and is suitable for use in production lines. The purpose is to provide an optimal one for a suitable reduction projection type exposure apparatus.

〔課題を解決するための手段〕[Means to solve the problem]

この発明に係る狭帯域エキシマレーザ発振器は、エキシ
マレーザのレーザチャンバとリアミラーの間に、少なく
とも2つのエタロンを配置した発振器において、上記エ
タロン部を密閉容器に収納し、このエタロン部を絶対零
度若しくは絶対零度近傍の一定温度に保持させたことを
特徴とするものである。
The narrowband excimer laser oscillator according to the present invention has at least two etalons disposed between the laser chamber of the excimer laser and the rear mirror, and the etalon portion is housed in a sealed container, and the etalon portion is heated to absolute zero or absolute zero. It is characterized by being kept at a constant temperature near zero degrees.

〔作用〕[Effect]

この発明における狭帯域エキシマレーザ発振器は、エタ
ロン部を絶対零度若しくはその近傍の一定温度に保持す
ることにより、エタロンの熱膨張を零もしくは極めて小
さく抑えることができ、波長制御を皆無又はほとんど不
用のものにする。
The narrowband excimer laser oscillator according to the present invention is capable of suppressing the thermal expansion of the etalon to zero or extremely small by maintaining the etalon section at a constant temperature at or near absolute zero, and eliminates or almost eliminates the need for wavelength control. Make it.

〔実施例〕〔Example〕

以下、この発明の一実施例を図について説明する。第1
図は本実施例に係る狭帯域エキシマレーザ発振器の概略
構成を示すブロック図である1図において、1はリアミ
ラー、2はレーザチャンバ、3はフロントミラー、4.
5はそれぞれフリースベクトラルレンジの異なる2種類
のエタロン、6はビームスプリッタ、9は発振中心波長
及び中心波長パワー検知器、lOは波長コントローラ、
11はドライバ、16は密閉容器、17はウィンドを示
す。
An embodiment of the present invention will be described below with reference to the drawings. 1st
The figure is a block diagram showing a schematic configuration of a narrowband excimer laser oscillator according to the present embodiment. In Figure 1, 1 is a rear mirror, 2 is a laser chamber, 3 is a front mirror, 4.
5 is two types of etalons with different fleece vector ranges, 6 is a beam splitter, 9 is an oscillation center wavelength and center wavelength power detector, IO is a wavelength controller,
11 is a driver, 16 is a sealed container, and 17 is a window.

次に、この実施例の動作について説明する。狭帯域化素
子であるフリースペクトラルレンジの異なる2種類のエ
タロン4,5は、密閉容器16内に収容され、絶対零度
(OK)もしくはその近傍の一定温度に保持されている
Next, the operation of this embodiment will be explained. Two types of etalons 4 and 5 having different free spectral ranges, which are band narrowing elements, are housed in a closed container 16 and maintained at a constant temperature at or near absolute zero (OK).

そして、レーザビームがエタロン4.5を通過する時、
レーザビームの一部はエタロン4,5にそれぞれ吸収さ
れ熱エネルギーに変化するが、第2図に示すように一般
に絶対零度(OK)もしくはその近傍の温度においては
、熱膨張率は零もしくは極めて小さくなる傾向があり、
エタロン4゜5の熱膨張を零もしくは極めて小さく抑え
ることができる。なお、上記狭帯域エキシマレーザ発振
器に使用されるエタロン゛は前述した第3図a、bに示
したものと同様である。
And when the laser beam passes through etalon 4.5,
A portion of the laser beam is absorbed by the etalons 4 and 5 and converted into thermal energy, but as shown in Figure 2, the coefficient of thermal expansion is generally zero or extremely small at temperatures at or near absolute zero (OK). There is a tendency to
The thermal expansion of the etalon 4°5 can be suppressed to zero or extremely small. The etalon used in the narrow band excimer laser oscillator is the same as that shown in FIGS. 3a and 3b described above.

〔発明の効果〕〔Effect of the invention〕

以上にように、この発明によれば狭帯域エキシマレーザ
のエタロン部を絶対零度若しくはその近傍の一定温度に
保持することにより、エタロンの熱膨張を零もしくは極
めて小さく抑え、波長制御を皆無又はほとんど不用のも
のにすると共に、ビーム強度分布の極めて安定した狭帯
域エキシマレーザ発振器を提供することができる。
As described above, according to the present invention, by maintaining the etalon portion of a narrowband excimer laser at a constant temperature at or near absolute zero, the thermal expansion of the etalon can be suppressed to zero or extremely small, and wavelength control can be eliminated or almost eliminated. In addition, it is possible to provide a narrowband excimer laser oscillator with extremely stable beam intensity distribution.

【図面の簡単な説明】[Brief explanation of drawings]

第1図はこの発明の一実施例に係る狭帯域エキシマレー
ザ発振器の概略構成を示すブロック図、第2図は温度−
熱膨張率カーブを示す図、第3図a、bはエキシマレー
ザ発振器に使用されるエタロンの詳細を示す側面図及び
正面図、第4図は従来のエキシマレーザ発振器を表すブ
ロック図である。 図中、1はリアミラー、2はレーザチャンバ、3はフロ
ントミラー、4.5はエタロン、6はビームスプリッタ
、9は発振中心波長及び中心波長パワー検出器、IOは
波長コントローラ、11はドライバ、16は密閉容器、
17はウィンドである。 なお、図中同一符号は同−又は相当部分を示す。
FIG. 1 is a block diagram showing a schematic configuration of a narrowband excimer laser oscillator according to an embodiment of the present invention, and FIG.
3A and 3B are side and front views showing details of an etalon used in an excimer laser oscillator, and FIG. 4 is a block diagram showing a conventional excimer laser oscillator. In the figure, 1 is a rear mirror, 2 is a laser chamber, 3 is a front mirror, 4.5 is an etalon, 6 is a beam splitter, 9 is an oscillation center wavelength and center wavelength power detector, IO is a wavelength controller, 11 is a driver, 16 is a closed container,
17 is a window. Note that the same reference numerals in the figures indicate the same or equivalent parts.

Claims (1)

【特許請求の範囲】 エキシマレーザのレーザチャンバとリアミラーの間に、
少なくとも2つのエタロンを配置した狭帯域エキシマレ
ーザ発振器において、 上記エタロン部を、絶対零度若しくは絶対零度近傍の一
定温度に保持させたことを特徴とする狭帯域エキシマレ
ーザ発振器。
[Claims] Between the laser chamber of the excimer laser and the rear mirror,
1. A narrowband excimer laser oscillator having at least two etalons arranged therein, wherein the etalon section is maintained at a constant temperature at or near absolute zero.
JP4361390A 1990-02-23 1990-02-23 Narrow-band excimer laser oscillator Pending JPH03246983A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4361390A JPH03246983A (en) 1990-02-23 1990-02-23 Narrow-band excimer laser oscillator

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4361390A JPH03246983A (en) 1990-02-23 1990-02-23 Narrow-band excimer laser oscillator

Publications (1)

Publication Number Publication Date
JPH03246983A true JPH03246983A (en) 1991-11-05

Family

ID=12668692

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4361390A Pending JPH03246983A (en) 1990-02-23 1990-02-23 Narrow-band excimer laser oscillator

Country Status (1)

Country Link
JP (1) JPH03246983A (en)

Similar Documents

Publication Publication Date Title
US6560254B2 (en) Line-narrowing module for high power laser
CN107810443B (en) Power scalable nonlinear optical wavelength converter
JP2000260684A (en) Aligner and illuminating system
JPH03155691A (en) Laser light stabilization and laser device
US20240291220A1 (en) Laser system, pulse laser light generating method, and electronic device manufacturing method
JP2003347627A (en) Uv laser device
KR100767301B1 (en) High power gas discharge laser with helium purged line narrowing unit
JPH03208387A (en) Higher harmonic generator for laser beam and aligner
JPH0480554B2 (en)
JP2006093661A (en) Optical system with wavefront correction optical surface
JP3857236B2 (en) High repetition rate UV excimer laser
US6542243B2 (en) Resonator optics monitoring method
JPH03246983A (en) Narrow-band excimer laser oscillator
WO2021049020A1 (en) Wavelength conversion system, laser system, and method for manufacturing electronic device
JP2747585B2 (en) Starting method of narrow band excimer laser
JP7537690B2 (en) Optical isolator, ultraviolet laser device, and method for manufacturing electronic device
US20230375847A1 (en) Optical isolator, ultraviolet laser device, and electronic device manufacturing method
JPH11261140A (en) Optical resonator
JPH01155673A (en) Laser wavelength control device
JPH0428276A (en) Narrow band laser device
JP2586656B2 (en) Wavelength stabilized laser device
JP7166362B2 (en) LASER SYSTEM AND ELECTRONIC DEVICE MANUFACTURING METHOD
JPH03288488A (en) Excimer laser device provided with narrow-band processing device
JP2002223018A (en) Control system of laser wavelength and control method thereof
JP2688991B2 (en) Narrow-band oscillation excimer laser