JPH03245697A - Manufacture of diaphragm for speaker - Google Patents

Manufacture of diaphragm for speaker

Info

Publication number
JPH03245697A
JPH03245697A JP4120990A JP4120990A JPH03245697A JP H03245697 A JPH03245697 A JP H03245697A JP 4120990 A JP4120990 A JP 4120990A JP 4120990 A JP4120990 A JP 4120990A JP H03245697 A JPH03245697 A JP H03245697A
Authority
JP
Japan
Prior art keywords
film
plasma flame
diaphragm
polishing
mold
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP4120990A
Other languages
Japanese (ja)
Other versions
JP2669095B2 (en
Inventor
Masatomi Okumura
奥村 正富
Yoshikazu Uchiumi
良和 内海
Hisao Watai
渡井 久男
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP2041209A priority Critical patent/JP2669095B2/en
Publication of JPH03245697A publication Critical patent/JPH03245697A/en
Application granted granted Critical
Publication of JP2669095B2 publication Critical patent/JP2669095B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Diaphragms For Electromechanical Transducers (AREA)

Abstract

PURPOSE:To reduce generation of cracks by applying plasma flame spraying of a ceramics to the die of a prescribed shape whose surface is processed smoothly so as to form a film, polishing smoothly the surface of the film, removing the forming from the die and baking the film in an inactive gas. CONSTITUTION:A plasma flame spraying device 1 is used to manufacture at first a film of a prescribed shape. The plasma flame spraying device 1 is provided with an electrode 1a and a nozzle 1b and a mixture gas 1c mixing gaseous hydrogen of a proper quantity in gaseous argon or nitrogen is introduced between the electrode 1a and the nozzle 1b. Then power is applied between the electrode and the nozzle to ionize the mixture gas thereby forming a plasma flame. Since the plasma flame has high temperature and a high speed, when a B4C whose mean particle diameter is 10-50micron being a diaphragm material is introduced from a supply port 3 into the plasma flame, the material is molten, collides with the die 4, is adhered, cooled, solidified and deposited and the film 5 made of B4C is formed. Then the surface is smoothed by using #320-600 Emily polishing paper.

Description

【発明の詳細な説明】 [産業上の利用分野] この発明はスピーカー用振動板の製造方法に関するもの
である。
DETAILED DESCRIPTION OF THE INVENTION [Industrial Field of Application] The present invention relates to a method of manufacturing a diaphragm for a speaker.

[従来の技術] 第4図および第5図はそれぞれ特開昭60−1691号
公報に示されたスピーカー用振動板の製造方法を示す図
であり、第4図は振動板形成用皮膜を構成するプラズマ
溶射装置の断面図、第5図は上記皮膜の焼成装置を示す
断面図である。すなわち振動板は第4図に示すプラズマ
溶射装置(1)を用い、まず例えばドーム形状を有する
皮膜に製造される。
[Prior Art] Figures 4 and 5 are diagrams showing a method of manufacturing a speaker diaphragm disclosed in Japanese Patent Application Laid-open No. 60-1691, respectively. FIG. 5 is a cross-sectional view showing the above-mentioned coating firing apparatus. That is, the diaphragm is first manufactured into a film having a dome shape, for example, using a plasma spraying apparatus (1) shown in FIG.

そして上記のプラズマ溶射装置(1)は電極(1a)と
ノズル(1b)を有し、これらの間に窒素あるいはアル
ゴンガス中に適当量の水素ガスを混合した混合ガス(I
C)を導入する。そして上記電極(18)とノズル(1
b)間に電力を加えることで上記混合ガスは電離されプ
ラズマ炎となる。このプラズマ炎は高温、高速であるた
め、この中に振動板の材料である溶肘用粉体を供給口(
3)から投入すれば溶融し、型(4)に衝突し付着、冷
却、固化堆積し皮膜(5)が形成され、この皮膜は型か
ら離される。
The above plasma spraying apparatus (1) has an electrode (1a) and a nozzle (1b), between which a mixed gas (I
C) is introduced. Then, the electrode (18) and the nozzle (1
b) By applying electric power in between, the above-mentioned mixed gas is ionized and becomes a plasma flame. Since this plasma flame has high temperature and high speed, the molten elbow powder, which is the material of the diaphragm, is fed into the plasma flame through the supply port (
When poured from step 3), it melts, collides with the mold (4), adheres, cools, solidifies and deposits to form a film (5), which is separated from the mold.

このようにして得られた皮膜の表面は第1図、第2図に
示すように型側面のA面は溶融した溶射粉が押しつぶさ
れて型(4)の表面に対応した平滑な面となる。一方溶
射装置側面のB面は押しつぶされかたが少なく表面は溶
融した粒子の粒径に対応して凹凸が激しい表面状態とな
る。そして溶射したままのこの状態の皮膜(5)は粉末
粒子間の結合は比較的弱く機械的強度が低い、そのため
振動板の重要な特性であるE/ρ(E:ヤング率、ρ:
密度)も小さい、そこで第2図の部分拡大図に示すよう
に溶射後の皮膜(5)を例えばカーボン製円筒に入れア
ルゴンガス雰囲気中で1000℃〜2300℃で焼成す
る。この処理を施すことにより粒子間の結合が大幅に強
くなりE / p値の大きな振動板を得ることができる
As shown in Figures 1 and 2, the surface of the film obtained in this way becomes a smooth surface corresponding to the surface of the mold (4) due to the crushing of the molten thermal spray powder on side A of the side of the mold. . On the other hand, surface B on the side surface of the thermal spraying device is not crushed so much that the surface has severe irregularities corresponding to the particle size of the molten particles. The coating (5) in this state as sprayed has relatively weak bonding between powder particles and low mechanical strength, which is an important characteristic of the diaphragm, E/ρ (E: Young's modulus, ρ:
Therefore, as shown in the partially enlarged view of FIG. 2, the thermally sprayed coating (5) is placed in a carbon cylinder, for example, and fired at 1000 DEG C. to 2300 DEG C. in an argon gas atmosphere. By applying this treatment, the bond between the particles is significantly strengthened, and a diaphragm with a large E/p value can be obtained.

[発明が解決しようとする課題] 従来の振動板の製造方法においては皮膜(5)を溶射し
たままの状態で離型、焼成を行い振動板にしていた。し
かし第1図の(1−1)および第2図の(2−1)に示
すように、溶射したままの皮膜(5)では型(4)の反
対側の表面B面は凹凸が激しいので、振動板として振動
させた際に凹曲部でクラックの芽が発生しやすく、また
この芽より割れが拡がり、大きな振幅に耐えられなくな
る。
[Problems to be Solved by the Invention] In the conventional method for manufacturing a diaphragm, the diaphragm was made by releasing and firing the coating (5) while it was sprayed. However, as shown in (1-1) in Figure 1 and (2-1) in Figure 2, in the as-sprayed coating (5), the surface B on the opposite side of the mold (4) is extremely uneven. When it is vibrated as a diaphragm, cracks tend to form in the concave portions, and the cracks spread from these buds, making it unable to withstand large vibrations.

また第6図に示すようにドーム状の振動板においては、
振動板の立ち上がり部にはボイスコイル(9)を巻く必
要があるが、表面の凹凸が激しいとエツジ部でコイルの
絶縁皮膜が破れる等の問題点があった。
Furthermore, as shown in Fig. 6, in the case of a dome-shaped diaphragm,
It is necessary to wind the voice coil (9) around the rising part of the diaphragm, but if the surface is extremely uneven, there are problems such as the insulation film of the coil being torn at the edges.

この発明は上記の問題点を解消するためになされたもの
で、クラックの発生の少ない高信頼性のスピーカー用振
動板を製造することを目的とする。
This invention was made to solve the above problems, and an object thereof is to manufacture a highly reliable speaker diaphragm with less occurrence of cracks.

[課題を解決するための手段] この発明に係るスピーカー用振動板の製造方法は1表面
が平滑に加工された所定形状の型に、セラミックスをプ
ラズマ溶射して所定形状の皮膜を形成した後、この皮膜
の表面を平滑に研磨し、その後に離型し、この皮膜を不
活性ガス中で例えば1000℃〜2400℃で焼成して
振動板とするものである。
[Means for Solving the Problems] A method for manufacturing a speaker diaphragm according to the present invention includes: 1) forming a film in a predetermined shape by plasma spraying ceramics on a mold having a predetermined shape and having a smooth surface; The surface of this film is polished to a smooth surface, then released from the mold, and the film is fired in an inert gas at, for example, 1000°C to 2400°C to form a diaphragm.

[作 用] この発明における皮膜の表面を研磨することは皮膜の表
面粗さがなめらかになり、クラックの発生、伝播が押え
られ、またボイスコイルと皮膜の接合が強固になり、高
性能、高信頼性のスピーカー用振動板が得られることに
なる。
[Function] Polishing the surface of the film in this invention smoothes the surface roughness of the film, suppresses the occurrence and propagation of cracks, and strengthens the bond between the voice coil and the film, resulting in high performance and high performance. A reliable speaker diaphragm can be obtained.

[実施例コ 第4図および第5図はこの発明の製造方法に用いた装置
を示し、これは従来の製造方法に用いた装置と同様のも
のである。すなわちこの発明の振動板の製造には第4図
に示すプラズマ溶射装置(1)を用い、まず所定形状の
皮膜が製造される。上記プラズマ溶射装置(1)は電極
(1a)とノズル(1b)を有し、これらの間に窒素あ
るいはアルゴンガス中に適当量の水素ガスを混合した混
合ガス(1c)を導入する。そして上記電極とノズル間
に電力を加えることで上記混合ガスは電離されプラズマ
炎となる。このプラズマ炎は高温、高速であるため、こ
の中に振動板材料である平均粒径10ミクロン〜50ミ
クロンのB、Cを供給口(3)から投入すれば溶融し、
型(4)に衝突し付着、冷却、固化堆積しB4Cの皮膜
(5)が形成される。具体的には平均粒径17ミクロン
のB、C粉を用いて形成した皮膜の表面は、第2図(2
−1)のように溶射装置側面のB面は押しつぶされがた
が少ないため溶融したB4C粒子の粒径に対応した凹凸
となり、第3図の(3−1)に示す粗さの測定結果の通
り、10点平均粗さRzは約5ミクロンと凹凸の激しい
表面状態となる。
[Embodiment] Figures 4 and 5 show an apparatus used in the manufacturing method of the present invention, which is similar to the apparatus used in the conventional manufacturing method. That is, in manufacturing the diaphragm of the present invention, a plasma spraying apparatus (1) shown in FIG. 4 is used, and a coating having a predetermined shape is first manufactured. The plasma spraying apparatus (1) has an electrode (1a) and a nozzle (1b), between which a mixed gas (1c) of nitrogen or argon gas mixed with an appropriate amount of hydrogen gas is introduced. By applying electric power between the electrode and the nozzle, the mixed gas is ionized and becomes a plasma flame. Since this plasma flame has a high temperature and high speed, if B and C, which are diaphragm materials with an average particle size of 10 to 50 microns, are put into the flame from the supply port (3), they will melt.
It collides with the mold (4), adheres, cools, and solidifies to form a B4C film (5). Specifically, the surface of the film formed using B and C powders with an average particle size of 17 microns is shown in Figure 2 (2
As shown in -1), the surface B on the side surface of the thermal spraying device has less crushing and unevenness corresponding to the particle size of the molten B4C particles, resulting in the roughness measurement results shown in (3-1) in Figure 3. As expected, the 10-point average roughness Rz is approximately 5 microns, resulting in a highly uneven surface.

そこでこの表面を平滑にするため#320〜600のエ
ミリー研磨紙により研磨する。B4C粒子はエミリー研
磨紙に使われている研磨剤より硬いが、溶射された皮膜
のB4C粒子間の結合は比較的弱く容易に平滑にするこ
とができる。
Therefore, in order to make the surface smooth, it was polished with #320-600 Emily polishing paper. Although the B4C particles are harder than the abrasive used in Emily abrasive paper, the bonds between the B4C particles in the sprayed coating are relatively weak and can be easily smoothed.

第2図の(2−2)は研磨後のこの発明の皮膜の部分拡
大図である。また第3図の(3−3)は#400のエミ
リー研磨紙により研磨した場合のこの発明の皮膜の表面
粗さの測定結果を示す、この場合のRzは約1ミクロン
であった。また研磨紙を使う変わりにアルミナ、SIC
,5IO2等の研磨粉を圧縮空気を用いて吹き付けて研
磨しても平滑にできた。
FIG. 2 (2-2) is a partially enlarged view of the coating of the present invention after polishing. FIG. 3 (3-3) shows the measurement results of the surface roughness of the film of the present invention when polished with #400 Emily polishing paper; Rz in this case was about 1 micron. Also, instead of using abrasive paper, alumina, SIC
, 5IO2 or the like was sprayed using compressed air to make the surface smooth.

このように研磨した後、型(4)よりはずす、なおこの
型(4)に接していた面は従来と同様に型(4)の表面
粗さに対応しており、実施例では第3図の(3−2)に
示すような粗さでRzは0.5ミクロンであった。なお
離型の後に皮膜(5)の表面を研磨することもできるが
、この皮膜はもろいため形状に適応した治具を用いる必
要がある。さもないと研磨工程で割れることがあり、研
磨は離型前に行う方が良い、なお離型の後の皮膜(5)
は粉末粒子間の結合は比較的弱く機械的強度が低い、そ
のため振動板の重要な特性であるE/ρ(E:ヤング率
、ρ:密度)も小さい。したがって離型の後の皮膜(5
)は従来と同様に焼成炉(7)内の真空あるいは窒素、
アルゴン等の不活性雰囲気中で第5図に示すようにカー
ボン製円筒(6)に入れた状態で加熱源(B)で100
0℃〜2300℃で焼成する。その結果、粒子間の結合
が大幅に強くなりE/ρ値も太きくなる。
After polishing in this way, it is removed from the mold (4).The surface that was in contact with the mold (4) corresponds to the surface roughness of the mold (4) as in the conventional case, and in the example, it is shown in Fig. 3. The roughness as shown in (3-2) was 0.5 micron. Note that the surface of the film (5) can be polished after release from the mold, but since this film is fragile, it is necessary to use a jig adapted to the shape. Otherwise, it may crack during the polishing process, so it is better to perform polishing before releasing the mold, and the film after releasing the mold (5)
The bond between the powder particles is relatively weak and the mechanical strength is low. Therefore, E/ρ (E: Young's modulus, ρ: density), which is an important characteristic of the diaphragm, is also small. Therefore, the film after mold release (5
) is the same as before, using vacuum or nitrogen in the firing furnace (7),
In an inert atmosphere such as argon, as shown in Fig. 5, it was placed in a carbon cylinder (6) and heated by a heating source (B) for 100 minutes.
Calculate at 0°C to 2300°C. As a result, the bond between the particles becomes significantly stronger and the E/ρ value becomes larger.

第7図にアルゴン雰囲気中で2000℃で焼成した場合
の研磨したB面の粗さRzと、振動板の曲げ強度の関係
を示す、なお曲げ強度は短冊状のサンプルをドーム状振
動板と同じ方法で作製したものについて3点曲げ法によ
り測定している。この結果より明かなように表面粗さが
小さい程曲げ強度は大きくなる。研磨しないサンプル(
Rz約5ミクロン)は25Kg/m♂であるが、研磨に
より表面がなめらかになるにつれ曲げ強度は大きくなり
、Rzが1ミクロンになると曲げ強度は約30Kg/朧
Il+1となった。このように表面がなめらかになるに
つれて曲げ強度は大きくなるので、強度に関してはより
なめらかにする方が良い、しかし費用はかかるため目的
により研磨の程度を決めることが望ましい。
Figure 7 shows the relationship between the roughness Rz of the polished surface B and the bending strength of the diaphragm when fired at 2000°C in an argon atmosphere.The bending strength is the same for the strip-shaped sample as for the dome-shaped diaphragm. The three-point bending method was used to measure the products manufactured using this method. As is clear from this result, the smaller the surface roughness, the greater the bending strength. Samples without polishing (
Rz (approximately 5 microns) is 25 Kg/m♂, but as the surface becomes smoother by polishing, the bending strength increases, and when Rz becomes 1 micron, the bending strength becomes approximately 30 Kg/Oboro Il+1. In this way, the bending strength increases as the surface becomes smoother, so it is better to make it smoother in terms of strength, but since it is expensive, it is desirable to decide the degree of polishing depending on the purpose.

なお焼成後の皮膜はB4C粒子間の結合が強<B4C粒
子の硬さが大きいため焼成後の研磨はきわめて困難であ
る。
Note that in the film after firing, the bond between the B4C particles is strong and the hardness of the B4C particles is large, so polishing after firing is extremely difficult.

このようにして製造したこの発明の振動板は皮膜の表面
が平滑になるためクラックの発生が少なく高振幅の振動
が可能となる。またボイスコイルと皮膜の接着が良好と
なり高入力を加えることが可能となり、例えば従来の研
磨していない振動板に比較して表面をRzが1ミクロン
になるように研磨したものの耐振幅、耐入力ともに約3
0%増大できた。なお振動板の材料としてこの実施例で
はB4Cを使用した例について説明したが他のセラミッ
クス、あるいはセラミックスと金属の混合材料でも同様
の効果が得られる。
Since the diaphragm of the present invention manufactured in this way has a smooth surface, cracks are less likely to occur, and high-amplitude vibration is possible. In addition, the adhesion between the voice coil and the film is good, making it possible to apply high input power.For example, compared to conventional unpolished diaphragms, the amplitude and input resistance of a diaphragm polished to an Rz of 1 micron are improved. Both about 3
I was able to increase it by 0%. Although B4C is used as the material for the diaphragm in this embodiment, similar effects can be obtained with other ceramics or a mixed material of ceramics and metal.

[発明の効果] この発明は以上のように表面が平滑に加工された所定形
状の型に、セラミックスをプラズマ溶射して皮膜を形成
した後、この皮膜の表面を平滑に研磨し、その後に離型
し、この皮膜を不活性ガス中で焼成したので、クラック
の発生が少なく高信頼性を有し、しかも耐振幅、耐入力
の大きい高性能のスピーカー用振動板が得られるという
効果がある。
[Effects of the Invention] As described above, the present invention involves forming a film by plasma spraying ceramics on a mold having a predetermined shape and having a smooth surface, and then polishing the surface of the film to make it smooth, and then releasing it. Since the film was molded and fired in an inert gas, it was possible to obtain a high-performance speaker diaphragm with little cracking, high reliability, and high amplitude and input resistance.

【図面の簡単な説明】[Brief explanation of drawings]

第1図はこの発明の製造法および従来の製造法によって
形成した振動板用の皮膜の表面の粗さを示し、(1−1
)は従来のもの、 (1−2)はこの発明のものである
。 第2図は上記各皮膜の粗さを示す部分拡大断面図であり
、(2−1)は従来のもの、(2−2)はこの発明のも
のである。 第3図は研磨前および研磨後の表面粗さの測定データで
あり、 (3−1)は第2図のB面の研磨前、(3−3
)はその研磨後、(3−2)は第2図のA面の測定デー
タである。 第4図は従来およびこの発明に係るプラズマ溶射装置お
よび溶射状態を示す断面図、第5図は同じく焼成装置を
示す断面図、第6図はドーム状振動板にボイスコイルを
接着した状態を示す側面図、第7図は振動板の表面粗さ
と曲げ強度の関係を示す特性図である。 なお図中(4)は型、(5)は皮膜である。 第 1 図 −1 −2 第 図 2m)前 )1 1麿債 −3 −2 第 図 第 図 第 図 第 図 2  3  4 8面の粗さRz (μり 手 続 補 正 書 (自 発)
FIG. 1 shows the surface roughness of diaphragm coatings formed by the manufacturing method of the present invention and the conventional manufacturing method, and shows (1-1
) is the conventional one, and (1-2) is the one of this invention. FIG. 2 is a partially enlarged cross-sectional view showing the roughness of each of the above-mentioned films, (2-1) is the conventional one, and (2-2) is the one of the present invention. Figure 3 shows the measurement data of surface roughness before and after polishing, (3-1) is before polishing of surface B in Figure 2, (3-3)
) is the measurement data of surface A in FIG. 2 after polishing, and (3-2) is the measurement data of surface A in FIG. Fig. 4 is a sectional view showing a conventional plasma spraying device and the spraying state of the present invention, Fig. 5 is a sectional view showing a firing device, and Fig. 6 is a sectional view showing a voice coil bonded to a dome-shaped diaphragm. The side view and FIG. 7 are characteristic diagrams showing the relationship between surface roughness and bending strength of the diaphragm. In the figure, (4) is the mold, and (5) is the film. 1 Figure-1-2 Figure 2m) Front) 1 1 Maro bond-3-2 Figure Figure Figure Figure Figure 2 3 4 8 surface roughness Rz (μri procedure amendment form (voluntary)

Claims (4)

【特許請求の範囲】[Claims] (1)表面が平滑に加工された所定形状の型に、セラミ
ックスをプラズマ溶射して皮膜を形成した後、この皮膜
の表面を平滑に形磨し、その後に離型し、この皮膜を不
活性ガス中で焼成したことを特徴とするスピーカー用振
動板の製造方法。
(1) After forming a film by plasma spraying ceramics on a mold with a predetermined shape and a smooth surface, the surface of this film is polished to a smooth shape, then the mold is released, and this film is inert. A method for manufacturing a speaker diaphragm characterized by firing it in a gas.
(2)プラズマ溶射されるセラミックスが炭化ほう素(
B_4C)である特許請求の範囲第1項記載のスピーカ
ー用振動板の製造方法。
(2) Ceramics to be plasma sprayed are boron carbide (
B_4C) The method for manufacturing a speaker diaphragm according to claim 1.
(3)セラミックスのプラズマ溶射で得られた皮膜の表
面をアルミナ、エミリー、SIC等の研磨剤を用いた研
磨ペーパーで研磨するようにした特許請求の範囲第1項
記載のスピーカー用振動板の製造方法。
(3) Manufacture of a speaker diaphragm according to claim 1, in which the surface of the film obtained by plasma spraying of ceramics is polished with abrasive paper using an abrasive such as alumina, Emily, SIC, etc. Method.
(4)セラミックスのプラズマ溶射で得られた皮膜の表
面をアルミナ、SIC、SIO_2などの粉末を吹きつ
けて研磨するようにした特許請求の範囲第1項記載のス
ピーカー用振動板の製造方法。
(4) The method for manufacturing a speaker diaphragm according to claim 1, wherein the surface of the coating obtained by plasma spraying of ceramics is polished by spraying powder of alumina, SIC, SIO_2, etc.
JP2041209A 1990-02-23 1990-02-23 Manufacturing method of diaphragm for speaker Expired - Fee Related JP2669095B2 (en)

Priority Applications (1)

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JP2041209A JP2669095B2 (en) 1990-02-23 1990-02-23 Manufacturing method of diaphragm for speaker

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2041209A JP2669095B2 (en) 1990-02-23 1990-02-23 Manufacturing method of diaphragm for speaker

Publications (2)

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JPH03245697A true JPH03245697A (en) 1991-11-01
JP2669095B2 JP2669095B2 (en) 1997-10-27

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Family Applications (1)

Application Number Title Priority Date Filing Date
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Country Link
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Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61161099A (en) * 1985-01-09 1986-07-21 Mitsubishi Electric Corp Manufacture of diaphragm for speaker
JPS62251073A (en) * 1986-04-21 1987-10-31 Fujikura Ltd Ceramic processing method
JPS63223156A (en) * 1987-03-11 1988-09-16 Toshiba Corp Heat-resisting member and its production

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61161099A (en) * 1985-01-09 1986-07-21 Mitsubishi Electric Corp Manufacture of diaphragm for speaker
JPS62251073A (en) * 1986-04-21 1987-10-31 Fujikura Ltd Ceramic processing method
JPS63223156A (en) * 1987-03-11 1988-09-16 Toshiba Corp Heat-resisting member and its production

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