JPH03243676A - Coating composition and insulated wire - Google Patents

Coating composition and insulated wire

Info

Publication number
JPH03243676A
JPH03243676A JP2042235A JP4223590A JPH03243676A JP H03243676 A JPH03243676 A JP H03243676A JP 2042235 A JP2042235 A JP 2042235A JP 4223590 A JP4223590 A JP 4223590A JP H03243676 A JPH03243676 A JP H03243676A
Authority
JP
Japan
Prior art keywords
insulated wire
silicone resin
weight
parts
coating composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2042235A
Other languages
Japanese (ja)
Inventor
Hironori Matsuura
裕紀 松浦
Koichi Iwata
岩田 幸一
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Electric Industries Ltd
Original Assignee
Sumitomo Electric Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Electric Industries Ltd filed Critical Sumitomo Electric Industries Ltd
Priority to JP2042235A priority Critical patent/JPH03243676A/en
Publication of JPH03243676A publication Critical patent/JPH03243676A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To obtain a coating composition, composed of a compound prepared by hydrolyzing, dehydrating and condensing an alkoxide, silicone resin and inorganic filler, excellent in heat resistance and capable of providing insulated wires improved in dielectric strength after conversion into ceramics. CONSTITUTION:The objective composition obtained by blending (A) 100 pts. wt. compound prepared by hydrolyzing, dehydrating and condensing an alkoxide (e.g. a trialkoxyboron) expressed by the formula R'nM(OR)m (R is alkyl; R' is alkyl or aryl; M is metal; m is >=1; n is >=0) in a solvent with (B) 20-200 pts. wt. silicone resin and (C) 20-100 pts. wt. inorganic filler. The aforementioned composition is applied onto a conductor and baked to afford an insulated wire.

Description

【発明の詳細な説明】 (産業上の利用分野) 本発明は、耐熱性に優れる塗料組成物及び絶縁電線に関
するものである。
DETAILED DESCRIPTION OF THE INVENTION (Field of Industrial Application) The present invention relates to a coating composition with excellent heat resistance and an insulated wire.

(従来の技術と課題) アルコキシドを加水分解・脱水縮合せしめて得られる化
合物を用いて、基板等にコーティングし、種々の特性を
付与することが提案されている。付与される特性として
は化学的耐久性(耐酸性、耐アルカリ性及び耐水性等)
の増大、機械的強度の維持、反射率の調整、着色、電気
伝導度の付与等がある。また同溶液を用いて金属をコー
ティングすることも提案されており、金属の耐腐蝕性、
耐酸化性の増大、絶縁性の付与などが期待されている。
(Prior Art and Problems) It has been proposed to coat a substrate or the like with a compound obtained by hydrolysis/dehydration condensation of an alkoxide to impart various properties. Properties imparted include chemical durability (acid resistance, alkali resistance, water resistance, etc.)
increase, maintain mechanical strength, adjust reflectance, color, impart electrical conductivity, etc. It has also been proposed to coat metals with the same solution, improving the corrosion resistance of metals.
It is expected to increase oxidation resistance and provide insulation properties.

特に耐熱性が必要とされる金属基板へのコーティング材
料としての期待が大きい。
In particular, it has high expectations as a coating material for metal substrates that require heat resistance.

一方、電気電子機器に用いられる絶縁電線、特に自動車
電装品あるいは化学プラントの特殊な高温雰囲気下で使
用されるモーター等の静止コイルあるいは可動コイルに
おいては、従来では考えられなかった様な高温雰囲気の
条件下でも正常な運転が要求され始めてきた。この様な
用途に用いられる絶縁電線としては従来にも増して耐熱
性が要求される。
On the other hand, insulated wires used in electrical and electronic equipment, especially stationary coils or moving coils of motors used in special high-temperature atmospheres in automobile electrical components or chemical plants, are exposed to high-temperature atmospheres that were previously unimaginable. There is a growing demand for normal driving under such conditions. Insulated wires used in such applications are required to have higher heat resistance than ever before.

この要求に対して、アルコキシドを加水分解、脱水縮合
せしめて得られる化合物を絶縁層とする方法が試みられ
たが、可とう性が不十分であったので可とう性を付与す
る樹脂の添加が検討されてきた。その結果、ポリ酢酸ビ
ニル、ポリビニルアルニール、ポリビニルホルマール、
ポリビニルアセタール、ポリビニルブチラールなどが該
溶剤に溶解でき、可どう性を向上させることができた。
In response to this demand, attempts were made to use a compound obtained by hydrolyzing and dehydrating alkoxide as an insulating layer, but the flexibility was insufficient, so it was necessary to add a resin that imparts flexibility. It has been considered. As a result, polyvinyl acetate, polyvinylalnyl, polyvinyl formal,
Polyvinyl acetal, polyvinyl butyral, etc. could be dissolved in the solvent, and the flexibility could be improved.

しかしながら、セラミック後の皮膜の絶縁破壊電圧が低
いという問題点があった。
However, there was a problem in that the dielectric breakdown voltage of the film after ceramic was low.

〔発明の構成〕[Structure of the invention]

本発明者らは、上記問題点を解決するために、鋭意検討
を重ねた結果、−数式R′nM (OR)m(ただし式
中Rはアルキル基をR′はアルキル基、アリール基をM
は金属をn、mは整数を示す)で表わされるアルコキシ
ドを溶剤中で加水分解、脱水縮合せしめて得られる化合
物とシリコーン樹脂と無機光てん剤とからなる塗料組成
物を導体上に直接あるいは他の絶縁物を介して塗布焼付
を行い絶縁電線を得ることにより問題点を解決したもの
である。
In order to solve the above-mentioned problems, the present inventors have made extensive studies and have found the following formula: -R'nM (OR)m (wherein R is an alkyl group, R' is an alkyl group,
A coating composition consisting of a compound obtained by hydrolysis and dehydration condensation of an alkoxide represented by n (metal is n, m is an integer) in a solvent, a silicone resin, and an inorganic photonic agent is applied directly onto the conductor or otherwise. This problem was solved by applying and baking the wire through the insulator to obtain an insulated wire.

以下本発明の詳細な説明する。The present invention will be explained in detail below.

本願発明に用いる一般式RnM(OR’)mで示される
アルコキシドとしては、アルコール類の水酸基の水素を
二価以上の価数を有する金属で置換した化合物であるこ
とが必要で、その中でも特に三アルコキシ硼素、ニアル
コキシマグネシウム、三アルコキシアルミニウム、ニア
ルコキシ珪素、三アルコキシ珪素、四アルコキシ珪素、
四アルコキシチタンフ・ヨび四アルコキシジルコニウム
が好マしい。また、これらのアルコキシドの二種あるい
はそれ以上のアルコキシドを用いることもできる。
The alkoxide represented by the general formula RnM(OR')m used in the present invention needs to be a compound in which the hydrogen of the hydroxyl group of an alcohol is replaced with a metal having a valence of two or more, and among these, especially three Alkoxyboron, nialkoxymagnesium, trialkoxyaluminum, nialkoxysilicone, trialkoxysilicone, tetraalkoxysilicone,
Tetraalkoxytitanium and tetraalkoxyzirconium are preferred. Moreover, two or more types of these alkoxides can also be used.

三アルコキシ硼素化合物としては、トリメチルポレート
、トリエチルポレート、トリプロピルポレート、トリブ
チルポレート等がある。
Examples of trialkoxyboron compounds include trimethyl porate, triethyl porate, tripropyl porate, and tributyl porate.

ニアルコキシマグネシウム化合物としては、マグネシウ
ムメトキシド、マグネシウムエトキシド、マグネシウム
プロポキシド、マグネシウムトキシド等がある。
Examples of the nialkoxymagnesium compounds include magnesium methoxide, magnesium ethoxide, magnesium propoxide, and magnesium toxide.

三アルコキシアルミニウム化合物としては、トリメトキ
シアルミニウム、トリエトキシアルミニウム、トリプロ
ポキシアルミニウム、トリブトキシアルミニウム等があ
る。
Examples of trialkoxyaluminum compounds include trimethoxyaluminum, triethoxyaluminum, tripropoxyaluminum, and tributoxyaluminum.

ニアルコキシ珪素化合物としては、ジメチルジェトキシ
ラン、ジフェニルジェトキシシラン、ジフェニルジメト
キシラン等がある。
Examples of the nialkoxy silicon compound include dimethyljethoxylan, diphenyljethoxysilane, diphenyldimethoxylan, and the like.

三アルコキシ珪素化合物としては、メチルトリメトキシ
ランフェニルトリメトキシシラン、メチルトリエトキシ
シラン、フェニルトリエトキシシラン等がある。
Examples of trialkoxy silicon compounds include methyltrimethoxylan phenyltrimethoxysilane, methyltriethoxysilane, and phenyltriethoxysilane.

四アルコキシ珪素化合物としては、テトラメトキシシラ
ン、テトラエトキシシラン、テトラブトキシシラン等が
ある。
Examples of tetraalkoxy silicon compounds include tetramethoxysilane, tetraethoxysilane, and tetrabutoxysilane.

四アルコキシチタン化合物としては、テトーyytチル
チタネート、テトラエチルチタネート、テトラプロピル
チタネート、テトラブチルチタネート等がある。
Examples of the tetraalkoxytitanium compound include tetoytyl titanate, tetraethyl titanate, tetrapropyl titanate, and tetrabutyl titanate.

四アルコキシジルコニウム化合物としてはテトラメチル
ジルコネート、テトラエチルジルコネート、テトラプロ
ピルジルコネート、テトラブチルジルコネート等がある
Examples of the tetraalkoxyzirconium compounds include tetramethylzirconate, tetraethylzirconate, tetrapropylzirconate, and tetrabutylzirconate.

また使用される反応触媒としては無機および有機の酸あ
るいはアルカリがある。
The reaction catalysts used include inorganic and organic acids or alkalis.

本発明で用いるシリコーン樹脂は、R51O2/−1,
R2S iO、Rs S IO17゜、 R102のよ
うな構成単位のものが使用できる。Rは、メチル基、フ
ェニル基などを示す。溶剤との相溶性、皮膜の機械的強
度を考慮した場合、有機樹脂と共重合した変性樹脂が好
ましく、例えばアルキド、ポリエステル、エポキシ、ウ
レタン、アクリル変性が挙げられる。中でもポリエステ
ル変性が溶剤との相溶性、皮膜の機械的強度の点からよ
り好ましい。
The silicone resin used in the present invention is R51O2/-1,
Constituent units such as R2S iO, RsSIO17°, and R102 can be used. R represents a methyl group, a phenyl group, or the like. In consideration of compatibility with the solvent and mechanical strength of the film, modified resins copolymerized with organic resins are preferred, such as alkyd, polyester, epoxy, urethane, and acrylic modified resins. Among these, polyester modification is more preferable in terms of compatibility with solvents and mechanical strength of the film.

シリコーン樹脂の添加量は、アルコキシドを溶剤中で加
水分解、脱水縮合せしめて得られる化合物100重量部
に対し、20重量部〜200重量部が好ましい。これは
、20重量部未満では、シリコーン樹脂添加の効果が少
なく、セラミック化後の絶縁破壊電圧が十分ではない。
The amount of silicone resin added is preferably 20 parts by weight to 200 parts by weight based on 100 parts by weight of a compound obtained by hydrolyzing and dehydrating an alkoxide in a solvent. If the amount is less than 20 parts by weight, the effect of adding the silicone resin will be small and the dielectric breakdown voltage after ceramicization will not be sufficient.

一方、200重量部より多い場合は、セラミック化後の
皮膜形成性が劣ってくるためである。
On the other hand, if the amount is more than 200 parts by weight, the film forming properties after ceramicization will be poor.

本発明で用いる無機充てん剤は、いかなるものも使用可
能であるが、例えばマイカ、アルミナ、シリカ、チタン
酸バリウム、ジルコン、ベリリア、マグネシア、クレー
などが挙げられるが、マイカが成膜性には好ましい。無
機充てん剤の添加量は、アルコキシドを溶剤中で加水分
解、脱水縮合せしめて得られる化合物100重量部に対
し、20重量部から100重量部が好ましい。20重量
部未満ではセラミック後の絶縁破壊電圧が不十分であり
、100重量部より多い場合は皮膜の可とう性が劣る。
Any inorganic filler can be used in the present invention, such as mica, alumina, silica, barium titanate, zircon, beryllia, magnesia, clay, etc., but mica is preferable for film-forming properties. . The amount of the inorganic filler added is preferably 20 to 100 parts by weight per 100 parts by weight of the compound obtained by hydrolyzing and dehydrating an alkoxide in a solvent. If it is less than 20 parts by weight, the dielectric breakdown voltage after ceramic is insufficient, and if it is more than 100 parts by weight, the flexibility of the film will be poor.

本発明で用いられる溶剤は、アルコール系溶剤が好まし
く、例えば、メタノール、エタノール、ブタノール、イ
ソプロピルアルコールなトカ挙ケられ、絶縁電線を作成
する場合、沸点の高いジエチレングリコールモノメチル
エーテル、ジエチレングリコールモノエチルエーテル、
ジエチレングリコールモノイソブチルエーテル、ジエチ
レングリコールモノエチルエーテル、ジエチレンクリコ
ールモノフェニルエーテルなどの溶剤がより好マしい。
The solvent used in the present invention is preferably an alcohol-based solvent, such as methanol, ethanol, butanol, and isopropyl alcohol. When making an insulated wire, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, which has a high boiling point,
More preferred are solvents such as diethylene glycol monoisobutyl ether, diethylene glycol monoethyl ether, and diethylene glycol monophenyl ether.

この株にして得られた塗料は、導体上に直接あるいは他
の絶縁物を介して塗布焼付けて絶縁電線と成す。この際
使用する導体としては融点及び耐酸化性の点からニッケ
ルメッキを施した銅線が望ましい。
The paint obtained from this stock is applied and baked onto a conductor directly or through another insulator to form an insulated wire. The conductor used in this case is preferably a nickel-plated copper wire from the viewpoint of melting point and oxidation resistance.

この様にして得られた絶縁電線は、そのままで用いるこ
ともできるが、絶縁電線の耐加工劣化性向上のため、さ
らに有機樹脂を主成分とする皮膜を形成することもまた
好ましい。ここでいう耐加工劣化性とは、絶縁電線を用
いてコイル成形や、捲線加工をする際、絶縁電線が受け
るダメージに耐えうる性能を言う。
The insulated wire thus obtained can be used as is, but in order to improve the resistance to processing deterioration of the insulated wire, it is also preferable to further form a film containing an organic resin as a main component. The term "processing deterioration resistance" as used herein refers to the ability of an insulated wire to withstand damage caused when the insulated wire is used for coil forming or winding.

有機樹脂としては、皮膜を形成しうる有機樹脂であれば
いかなるものでも用いることができるが本願発明の塗料
と同様に塗布焼付にて皮膜を形成できる点で焼付タイプ
の有機塗料を用いることは好ましい。その中でも有機樹
脂の機械的特性・熱的特性の点からポリイミド、ポリア
ミドイミド、ポリエステルイミド、ポリエステルが最も
好ましい。
As the organic resin, any organic resin that can form a film can be used, but it is preferable to use a baking type organic paint because it can form a film by coating and baking like the paint of the present invention. . Among these, polyimide, polyamideimide, polyesterimide, and polyester are most preferred from the viewpoint of mechanical and thermal properties of the organic resin.

以下実施例に基づき本発明の詳細な説明する。The present invention will be described in detail below based on Examples.

(実施例1) ジエチレングリコールモノメチルエーテル(15モル)
にテトラエトキシシラン(2モル)ト水(8モル)とを
溶解し、さらに61%硝酸(0,01モル)を加え、8
0℃で5時間かく拌し反応させ塗料Aとする。
(Example 1) Diethylene glycol monomethyl ether (15 mol)
Tetraethoxysilane (2 mol) and water (8 mol) were dissolved in the solution, and 61% nitric acid (0.01 mol) was added to make 8
The mixture was stirred and reacted at 0°C for 5 hours to form paint A.

塗料Aにアルコキシドを加水分解、脱水縮合せしめた混
合物に対し、ポリエステル変性シリコーン樹脂100重
量部、マイカ50重量部を加え混合する。
100 parts by weight of polyester-modified silicone resin and 50 parts by weight of mica are added to a mixture of paint A and alkoxide subjected to hydrolysis and dehydration condensation and mixed.

この塗料を直径0.6 nunφのニッケルメッキ銅線
に塗布焼付し、厚さ8μmの皮膜を得さらに、バイヤー
−ML (ポリイミド)を上列として塗布焼付し、厚さ
16μmの二重構造を有する皮膜の絶縁電線を得た。
This paint was applied and baked on a nickel-plated copper wire with a diameter of 0.6 nunφ to obtain a film with a thickness of 8 μm.Furthermore, Bayer-ML (polyimide) was applied and baked on the upper row to form a double structure with a thickness of 16 μm. A film insulated wire was obtained.

(比較例1) 実施例1で作成した塗料Aにポリビニルブチラールを1
00重量部加え他は実施例1と同様にして絶縁電線を得
た。
(Comparative Example 1) Polyvinyl butyral was added to paint A prepared in Example 1.
An insulated wire was obtained in the same manner as in Example 1 except that 00 parts by weight was added.

(実施例2) 実施例1のテトラエトキシシラン2モルをテトラエトキ
シシラン1モル、メチルトリエトキシシラン1モルに変
え他は実施例1と同様にして絶縁電線を得た。
(Example 2) An insulated wire was obtained in the same manner as in Example 1 except that 2 moles of tetraethoxysilane in Example 1 were replaced with 1 mole of tetraethoxysilane and 1 mole of methyltriethoxysilane.

(実施例3) 実施例1のポリエステル変性シリコーン樹脂をアルキド
変性シリコーン樹脂に変え他は実施例1と同様にして絶
縁電線を得た。
(Example 3) An insulated wire was obtained in the same manner as in Example 1 except that the polyester-modified silicone resin in Example 1 was replaced with an alkyd-modified silicone resin.

(実施例4) 実施例1のポリエステル変性シリコーン樹脂をエポキシ
変性シリコーン樹脂に変え他は実施例1と同様にして絶
縁電線を得た。
(Example 4) An insulated wire was obtained in the same manner as in Example 1 except that the polyester-modified silicone resin in Example 1 was replaced with an epoxy-modified silicone resin.

(実施例5) 実施例1のマイカをアルミナに変え他は実施例1と同様
にして絶縁電線を得た。
(Example 5) An insulated wire was obtained in the same manner as in Example 1 except that mica in Example 1 was replaced with alumina.

(実施例6) 実施例1のマイカをシリカに変え他は実施例1と同様に
して絶縁電線を得た。
(Example 6) An insulated wire was obtained in the same manner as in Example 1 except that mica in Example 1 was replaced with silica.

(実施例7) 実施例1のポリエステル変性シリコーン樹脂の添加量を
10重量部に変え他は実施例1と同様にして絶縁電線を
得た。
(Example 7) An insulated wire was obtained in the same manner as in Example 1 except that the amount of polyester-modified silicone resin added was changed to 10 parts by weight.

(実施例8) 実施例1のポリエステル変性シリコーン樹脂の添加量を
20重量部に変え他は実施例1と同様にして絶縁電線を
得た。
(Example 8) An insulated wire was obtained in the same manner as in Example 1 except that the amount of polyester-modified silicone resin added was changed to 20 parts by weight.

(実施例9) 実施例1のポリエステル変性シリコーン樹脂の添加量を
50重量部に変え他は実施例1と同様にして絶縁電線を
得た。
(Example 9) An insulated wire was obtained in the same manner as in Example 1 except that the amount of polyester-modified silicone resin added was changed to 50 parts by weight.

(実施例10) 実施例1のポリエステル変性シリコーン樹脂の添加量を
200重量部に変え他は実施例1と同様にして絶縁電線
を得た。
(Example 10) An insulated wire was obtained in the same manner as in Example 1 except that the amount of the polyester-modified silicone resin added in Example 1 was changed to 200 parts by weight.

(実施例11) 実施例1のポリエステル変性シリコーン樹脂の添加量を
300重量部に変え他は実施例1と同様にして絶縁電線
を得た。
(Example 11) An insulated wire was obtained in the same manner as in Example 1 except that the amount of polyester-modified silicone resin added was changed to 300 parts by weight.

(実施例12) 実施例1のマイカの添加量を10重量部に変え他は実施
例1と同様にして絶縁電線を得た。
(Example 12) An insulated wire was obtained in the same manner as in Example 1 except that the amount of mica added in Example 1 was changed to 10 parts by weight.

(実施例13) 実施例1のマイカの添加量を20重量部に変え他は実施
例1と同様にして絶縁電線を得た。
(Example 13) An insulated wire was obtained in the same manner as in Example 1 except that the amount of mica added in Example 1 was changed to 20 parts by weight.

(実施例14) 実施例1のマイカの添加量を50重量部に変え他は実施
例1と同様にして絶縁電線を得た。
(Example 14) An insulated wire was obtained in the same manner as in Example 1 except that the amount of mica added in Example 1 was changed to 50 parts by weight.

(実施例15) 実施例1のマイカの添加量を200重量部に変え他は実
施例1と同様にして絶縁電線を得た。
(Example 15) An insulated wire was obtained in the same manner as in Example 1 except that the amount of mica added in Example 1 was changed to 200 parts by weight.

(実施例16) 実施例1のジエチレングリコール七ツメチルエーテルを
ジエチレングリコールジメチルエーテルに変え他は実施
例1と同様にして絶縁電線を得た。
(Example 16) An insulated wire was obtained in the same manner as in Example 1 except that diethylene glycol dimethyl ether was replaced with diethylene glycol dimethyl ether.

(実施例17) 実施例1のポリイミドをポリアミドイミドに変え他は実
施例1と同様にして絶縁電線を得た。
(Example 17) An insulated wire was obtained in the same manner as in Example 1 except that the polyimide in Example 1 was replaced with polyamideimide.

以上の比較例、実施例で得た絶縁電線の可とう性600
℃XIHr後の絶縁破壊電圧(BDV)を表1に示す。
Flexibility of insulated wires obtained in the above comparative examples and examples: 600
Table 1 shows the dielectric breakdown voltage (BDV) after ℃XIHr.

表1より明らかな如くアルコキシドを加水分解脱水縮合
せしめた化合物に、シリコーン樹脂、無機光てん剤を添
加混合することにより、600℃×lHr後すなわちセ
ラミック化後の製膜性が向上し絶縁破壊電圧が向上する
ことがわかる。
As is clear from Table 1, by adding and mixing a silicone resin and an inorganic photonic agent to a compound obtained by hydrolyzing, dehydrating, and condensing an alkoxide, the film formability after 600°C x lHr, that is, after ceramicization, is improved and the dielectric breakdown voltage is It can be seen that the results are improved.

〔発明の効果〕〔Effect of the invention〕

実施例で示されるように本発明の塗料を、導体上に直接
あるいは、他の絶縁物を介して塗布焼付した絶縁電線は
、セラミンク化後の絶縁破壊電圧が向上し、その効果は
大きく工業的価値は大きい。
As shown in the examples, insulated wires in which the paint of the present invention is applied and baked directly onto the conductor or through other insulators have improved dielectric breakdown voltage after ceramicization, and this effect is large enough to be used industrially. Great value.

547−547-

Claims (4)

【特許請求の範囲】[Claims] (1)一般式R′nM(OR)m(ただし式中Rはアル
キル基を、R′はアルキル基、アリール基をMは金属を
、mは1以上の整数、nは0以上の整数を示す)で示さ
れるアルコキシドを溶剤中で加水分解、脱水縮合せしめ
て得られる化合物と、シリコーン樹脂を無機充てん剤と
からなることを特徴とする塗料組成物。
(1) General formula R'nM(OR)m (wherein R is an alkyl group, R' is an alkyl group, M is a metal, m is an integer of 1 or more, and n is an integer of 0 or more) 1. A coating composition comprising a compound obtained by hydrolysis and dehydration condensation of an alkoxide represented by the following formula in a solvent, and a silicone resin as an inorganic filler.
(2)シリコーン樹脂がポリエステル変性である請求項
1記載の塗料組成物。
(2) The coating composition according to claim 1, wherein the silicone resin is modified with polyester.
(3)シリコーン樹脂及び無機充てん剤の添加量が、ア
ルコキシドを溶剤中で加水分解、脱水縮合せしめて得ら
れる化合物100重量部に対しシリコーン樹脂が20重
量部〜200重量部無機充てん剤が20〜100重量部
であることを特徴とする請求項1記載の塗料組成物。
(3) The amount of silicone resin and inorganic filler added is 20 to 200 parts by weight of silicone resin and 20 to 200 parts by weight of inorganic filler per 100 parts by weight of a compound obtained by hydrolyzing and dehydrating an alkoxide in a solvent. The coating composition according to claim 1, characterized in that the amount is 100 parts by weight.
(4)請求項1記載の塗料組成物を導体上に直接あるい
は絶縁物を介して塗布焼付けたことを特徴とする絶縁電
線。
(4) An insulated wire, characterized in that the coating composition according to claim 1 is applied and baked onto a conductor directly or via an insulator.
JP2042235A 1990-02-21 1990-02-21 Coating composition and insulated wire Pending JPH03243676A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2042235A JPH03243676A (en) 1990-02-21 1990-02-21 Coating composition and insulated wire

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2042235A JPH03243676A (en) 1990-02-21 1990-02-21 Coating composition and insulated wire

Publications (1)

Publication Number Publication Date
JPH03243676A true JPH03243676A (en) 1991-10-30

Family

ID=12630371

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2042235A Pending JPH03243676A (en) 1990-02-21 1990-02-21 Coating composition and insulated wire

Country Status (1)

Country Link
JP (1) JPH03243676A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2000012640A1 (en) * 1998-09-01 2000-03-09 Catalysts & Chemicals Industries Co., Ltd. Coating fluid for forming low-permittivity silica-based coating film and substrate with low-permittivity coating film
WO2000018847A1 (en) * 1998-09-25 2000-04-06 Catalysts & Chemicals Industries Co., Ltd. Coating fluid for forming low-permittivity silica-based coating film and substrate with low-permittivity coating film
US20140065418A1 (en) * 2012-09-04 2014-03-06 Hitachi Metals, Ltd. Insulated wire and coil using the same

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2000012640A1 (en) * 1998-09-01 2000-03-09 Catalysts & Chemicals Industries Co., Ltd. Coating fluid for forming low-permittivity silica-based coating film and substrate with low-permittivity coating film
WO2000018847A1 (en) * 1998-09-25 2000-04-06 Catalysts & Chemicals Industries Co., Ltd. Coating fluid for forming low-permittivity silica-based coating film and substrate with low-permittivity coating film
US20140065418A1 (en) * 2012-09-04 2014-03-06 Hitachi Metals, Ltd. Insulated wire and coil using the same

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