JPH03241756A - Apparatus and method of mounting semiconductor integrated circuit - Google Patents
Apparatus and method of mounting semiconductor integrated circuitInfo
- Publication number
- JPH03241756A JPH03241756A JP3859390A JP3859390A JPH03241756A JP H03241756 A JPH03241756 A JP H03241756A JP 3859390 A JP3859390 A JP 3859390A JP 3859390 A JP3859390 A JP 3859390A JP H03241756 A JPH03241756 A JP H03241756A
- Authority
- JP
- Japan
- Prior art keywords
- solder
- heat
- integrated circuit
- semiconductor integrated
- electrode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000000034 method Methods 0.000 title claims abstract description 13
- 239000004065 semiconductor Substances 0.000 title claims description 13
- 229910000679 solder Inorganic materials 0.000 claims abstract description 51
- 229920002120 photoresistant polymer Polymers 0.000 claims abstract description 9
- 230000004907 flux Effects 0.000 abstract description 4
- 238000007599 discharging Methods 0.000 abstract 1
- 239000000758 substrate Substances 0.000 abstract 1
- 239000002245 particle Substances 0.000 description 5
- 239000006071 cream Substances 0.000 description 4
- 230000004888 barrier function Effects 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 238000007747 plating Methods 0.000 description 3
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 2
- 229910052737 gold Inorganic materials 0.000 description 2
- 239000010931 gold Substances 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 238000005476 soldering Methods 0.000 description 2
- 238000001771 vacuum deposition Methods 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/30—Assembling printed circuits with electric components, e.g. with resistor
- H05K3/32—Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits
- H05K3/34—Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits by soldering
- H05K3/3457—Solder materials or compositions; Methods of application thereof
Abstract
Description
【発明の詳細な説明】
産業上の利用分野
本発明は、コンピューターを始めとした一般電気製品の
実装基板上の電極に半田バンプ等を形成する半導体集積
回路の実装装置および実装方法に関する。DETAILED DESCRIPTION OF THE INVENTION Field of the Invention The present invention relates to a semiconductor integrated circuit mounting apparatus and method for forming solder bumps and the like on electrodes on mounting boards of general electrical appliances such as computers.
従来の技術
高密度実装方法として裸のICチップを実装基板上にの
せるには、ICチップの外部電極としてアルミニウムC
1,e )電極と、実装基板の電極を接続させるため、
実装基板上またはICチップ上の少なくとも一方の電極
にバンプと呼ぶ粒状の接続物が必要である。従来は、こ
のバンプとして鉛や錫を真空蒸着法管たはメツキ法で形
成し、熱処理して粒状にしたり、またはクリーム半田を
電極上3・\ノ
に印刷し、その後熱処理して高さが約30〜50μmの
粒状のバンプを形成し、それを用いていた。Conventional technology In order to place a bare IC chip on a mounting board as a high-density mounting method, aluminum C was used as the external electrode of the IC chip.
1, e) To connect the electrode and the electrode of the mounting board,
A granular connection called a bump is required on at least one electrode on the mounting board or the IC chip. Conventionally, lead or tin was formed as the bump using a vacuum evaporation method or plating method, and then heat-treated to form particles, or cream solder was printed on the electrode and then heat-treated to increase the height. A granular bump of about 30 to 50 μm was formed and used.
発明が解決しようとする課題
このような従来の真空蒸着法普たはメツキ法によるバン
プ形成法では、高さが約3o〜50μmのバンプを形成
するのに時間がかかり、生産性が良くない。Problems to be Solved by the Invention In the conventional bump forming method using the vacuum evaporation method or the plating method, it takes time to form a bump with a height of about 3 to 50 μm, and the productivity is not good.
一方5クリーム半田を印刷する方法は、印刷のため一度
に多数の電極が厚く印刷できるが、後の熱処理でクリー
ム半田中のフラックス等のためはじけ、小さな半田粒が
発生し、その付近に飛散し、電極間でショートすること
がある。On the other hand, with the method of printing 5 cream solder, many electrodes can be thickly printed at once, but during the subsequent heat treatment, the cream solder may burst due to flux, etc., generating small solder particles and scattering around them. , a short may occur between the electrodes.
本発明は上記課題を解決するもので、溶融した半田を滴
下させる半導体集積回路の実装装置および実装方法を提
供することを目的とする。The present invention has been made to solve the above-mentioned problems, and an object of the present invention is to provide a semiconductor integrated circuit mounting apparatus and a mounting method in which molten solder is dropped.
課題を解決するための手段
本発明は上記目的を達成するために、上部に空気圧を加
えるためのパイプの付いた耐熱容器に半田を入れ、その
耐熱容器の外周にまいたヒータにより半田を溶融し、耐
熱容器の下部に連続して設けた極細径のノズルから一定
量の半田を塗出するようにしたものである。Means for Solving the Problems In order to achieve the above object, the present invention includes a method in which solder is placed in a heat-resistant container equipped with a pipe for applying air pressure at the top, and the solder is melted by a heater sprinkled around the outer periphery of the heat-resistant container. , a certain amount of solder is applied from an ultra-thin diameter nozzle that is continuously provided at the bottom of a heat-resistant container.
作用
本発明は上記した溝底によシ、溶融半田表面に上部パイ
プから精密な加圧が行われ、その結果下部極細径のノズ
ルから一定量の半田が滴下される。In the present invention, precise pressure is applied to the surface of the molten solder from the upper pipe at the bottom of the groove as described above, and as a result, a certain amount of solder is dripped from the lower nozzle having an extremely small diameter.
その時実装基板の電極以外のところを7オトレジストで
hhっておくと、その電極上に滴下された一定量の半田
は均一な高さのバンプとなる。At that time, if the parts of the mounting board other than the electrodes are covered with 7-hole resist, a certain amount of solder dropped onto the electrodes will form bumps of uniform height.
実施例
以下本発明の一実施例について、第1図〜第6図を参照
しながら説明する。EXAMPLE Hereinafter, an example of the present invention will be described with reference to FIGS. 1 to 6.
1ず第1図において、実装基板1の上に電極2が真空蒸
着、フォトリン工程等によシ形成され。1. First, in FIG. 1, an electrode 2 is formed on a mounting board 1 by vacuum evaporation, a photorin process, or the like.
さらにその電極2の周りには、厚さが約30〜50μm
のフォトレジスト3が7オトリンエ程により設けられて
いる。このいわゆる実装基板1全体を示したのが第2図
である。この電極2の上にはフラックスを塗布しておく
。Furthermore, the area around the electrode 2 has a thickness of approximately 30 to 50 μm.
A photoresist 3 of 7 is applied by seven etching steps. FIG. 2 shows the entire so-called mounting board 1. Flux is applied onto this electrode 2.
一方、半田4を入れた耐熱容器6をその周囲の5 ・\
−7
ヒータ6で約250’Cに加熱溶融し、上部に設けたパ
イプ7よう空気を調整して送り、その圧力によって耐熱
容器5の下部に設けた直径約40/1mの極細径のノズ
ル8より、溶融半田4を正確に一定量ずつ、前述の7ラ
ツクスを塗布した実装基板1上の電極2の上に順次滴下
して行く。そして第1図に示すような半田バンプ9を形
成して行く。On the other hand, place the heat-resistant container 6 containing the solder 4 in the surrounding area 5 ・\
-7 Melt by heating to about 250'C with a heater 6, adjust and send air through a pipe 7 installed at the top, and the pressure will cause an ultra-thin nozzle 8 with a diameter of about 40/1 m installed at the bottom of the heat-resistant container 5. Then, a certain amount of the molten solder 4 is sequentially dropped onto the electrode 2 on the mounting board 1 coated with the aforementioned 7 lux. Then, solder bumps 9 as shown in FIG. 1 are formed.
これは通常のデイスペンサーと同じ動作である。This is the same operation as a normal dispenser.
フォトレジスト3の厚みと電極2の大きさから半田塗出
量を調整し、滴下した時点よシすぐに粒状の半田バンプ
9ができ、その高さはフォトレジスト3から約60μ1
位にする。極細ノズル8をフォトレジスト3の上部60
fimの所を水平に移動させ、各電極2の全数に半田バ
ンプ9を形成し、その後この上にフラックスを塗布する
。The amount of solder applied is adjusted based on the thickness of the photoresist 3 and the size of the electrode 2, and granular solder bumps 9 are formed immediately after dropping, and the height is about 60μ1 from the photoresist 3.
rank. The ultra-fine nozzle 8 is placed on the top 60 of the photoresist 3.
The fim is moved horizontally to form solder bumps 9 on all of the electrodes 2, and then flux is applied thereon.
一方、第3図に前述の実装基板に搭載するICチップ1
oの外観図を示す。その表面に外部電極用としてムe電
極11があり、このムe電極11の表面に実装基板1上
の半田バンプ9との半田付は性と半田くわれ防止用にク
ロム、銅、金等の金6・\−ノ
属を後述の第5図に示すようなバリア金属12として各
1μm前後の膜厚に蒸着やメツキで付けている。これを
第4図に示すように先程の実装基板1の所定の位置上に
下向きに重ね、正確に位置合わせをした後、上よシ治具
にて加熱加圧し接合する。この接合された状態を第5図
に示す。実装基板1の上の電極2には粒状の半田バンプ
9があり、この上面には下向きにしたI(3チツプ10
がある。On the other hand, FIG. 3 shows the IC chip 1 mounted on the aforementioned mounting board.
An external view of o is shown. There is a mu-e electrode 11 on the surface of the mu-e electrode 11 as an external electrode, and the surface of this mu-e electrode 11 is coated with chromium, copper, gold, etc. for soldering with the solder bumps 9 on the mounting board 1 to prevent soldering. Gold 6.\- is applied as a barrier metal 12 as shown in FIG. 5, which will be described later, by vapor deposition or plating to a film thickness of about 1 μm. As shown in FIG. 4, this is stacked downward at a predetermined position on the mounting board 1, and after accurate positioning, is heated and pressed using a top-up jig to join. This joined state is shown in FIG. There are granular solder bumps 9 on the electrodes 2 on the mounting board 1, and on the upper surface there are I (3 chips 10) facing downward.
There is.
粒状の半田バンプ9は、実装基板1の電極2と、ICチ
ップ10のムe電極11に接するバリア金属12とを接
合している。The granular solder bumps 9 join the electrodes 2 of the mounting board 1 and the barrier metal 12 in contact with the mu electrodes 11 of the IC chip 10.
この後、フラックスを除去するための溶剤で洗浄し−I
CICチップ10上保護するため樹脂コーティングをす
る。After this, wash with a solvent to remove the flux-I
A resin coating is applied to the CIC chip 10 to protect it.
なお、この実施例では実装基板1上の電極2の上にバン
プ9を形成する場合について述べたが、逆にICチップ
10上の電極にバンプ9を設ける場合にも適用できる。Although this embodiment describes the case where the bumps 9 are formed on the electrodes 2 on the mounting board 1, the present invention can also be applied to the case where the bumps 9 are formed on the electrodes on the IC chip 10.
この場合には、ICチップ10の電極11には実装基板
1上の電極2に用いたようなバリア金属等を用いる。In this case, a barrier metal or the like used for the electrode 2 on the mounting board 1 is used for the electrode 11 of the IC chip 10.
7ページ
発明の効果
以上の実施例から明らかなように本発明によれば、実装
基板とICチップを接続する半田バンプを、溶融した半
田をデイスペンサ一方式でノズルより、周りにフォトレ
ジストを形成した電極上に滴下させることにより形成す
ると、簡単な設備で速く、しかもデイスペンサ一方式の
ため塗出量が安定して釦り、したがって一定高さの半田
バンプが形成できる。Page 7 Effects of the Invention As is clear from the above embodiments, according to the present invention, a photoresist is formed around the solder bumps connecting the mounting board and the IC chip by applying molten solder through a nozzle using a dispenser. Forming the solder bump by dropping it onto the electrode is quick and requires simple equipment, and because it uses a single dispenser, the amount of solder applied is stable and it is possible to form solder bumps of a constant height.
しかもクリーム半田を印刷してリフローする場合のよう
な不要の半田ボールと呼ばれる。電極間をショートする
小さな多くの小粒の発生もない。Moreover, they are called unnecessary solder balls, such as when printing cream solder and reflowing it. There is also no generation of many small particles that short-circuit between the electrodes.
また従来のように、半田を付けた後の不活性ガス中での
りフローによる半田溶融による粒状形成ではなく、塗出
と同時に粒状になり一工程が省ける利点もある。Furthermore, instead of forming particles by melting the solder in an inert gas atmosphere after applying the solder as in the conventional method, the particles are formed at the same time as application, which has the advantage of saving one step.
第1図は本発明の半導体集積回路の実装装置の概略断面
図、第2図は実装基板の斜視図、第3図は実装基板に搭
載するICチップの斜視図、第4図は実装基板にICチ
ップをのせる状態を示す斜視図、第5図は実装基板とI
Cチップとを接合させた状態を示す拡大断面図である。
1・・・・・・実装基板、2・・・・・・電極、3・・
・・・・フォトレジスト、4・・・・・・半田、5・・
・・・・耐熱容器、6・・・・・・ヒータ、7・・・・
・・パイプ、8・・・・・・極細径のノズル、9・・・
・・半田バンプ。FIG. 1 is a schematic cross-sectional view of a semiconductor integrated circuit mounting apparatus according to the present invention, FIG. 2 is a perspective view of a mounting board, FIG. 3 is a perspective view of an IC chip mounted on a mounting board, and FIG. 4 is a perspective view of an IC chip mounted on a mounting board. A perspective view showing the state in which the IC chip is placed, Figure 5 shows the mounting board and I
FIG. 3 is an enlarged cross-sectional view showing a state in which a C chip is joined. 1... Mounting board, 2... Electrode, 3...
...Photoresist, 4...Solder, 5...
... Heat-resistant container, 6 ... Heater, 7 ...
...Pipe, 8...Extremely small diameter nozzle, 9...
...Solder bump.
Claims (3)
器と、その耐熱容器の上部に連続して設けたその耐熱容
器内の半田表面に空気圧力を加えるためのパイプと、前
記耐熱容器の下部に連続して設けた一定量の半田を塗出
するための極細径のノズルとからなる半導体集積回路の
実装装置。(1) A heat-resistant container equipped with a heater on the outer periphery for containing solder, a pipe provided continuously at the top of the heat-resistant container for applying air pressure to the solder surface in the heat-resistant container, and a pipe for applying air pressure to the solder surface in the heat-resistant container; A semiconductor integrated circuit mounting device consisting of an ultra-thin diameter nozzle continuously provided at the bottom for dispensing a certain amount of solder.
工程と、請求項1記載の半導体集積回路の実装装置を用
いて前記実装基板の電極上に半田を滴下させる工程と、
その半田が滴下された実装基板の電極を半導体集積回路
を有するチップ上の電極に重ね合せ熱圧着する工程とか
らなる半導体集積回路の実装方法。(2) a step of providing a photoresist around the electrodes of the mounting board; and a step of dropping solder onto the electrodes of the mounting board using the semiconductor integrated circuit mounting apparatus according to claim 1;
A method for mounting a semiconductor integrated circuit comprising the steps of superimposing and thermocompression bonding an electrode of a mounting board onto which the solder has been dropped onto an electrode on a chip having a semiconductor integrated circuit.
フォトレジストを設ける工程と、請求項1記載の半導体
集積回路の実装装置を用いて前記半導体集積回路を有す
るチップ上の電極上に半田を滴下させる工程と、その半
田が滴下された半導体集積回路を有するチップ上の電極
を実装基板の電極に重ね合せ熱圧着する工程とからなる
半導体集積回路の実装方法。(3) providing a photoresist around the electrodes on the chip having the semiconductor integrated circuit, and applying solder onto the electrodes on the chip having the semiconductor integrated circuit using the semiconductor integrated circuit mounting apparatus according to claim 1; A method for mounting a semiconductor integrated circuit comprising the steps of dropping the solder, and stacking and thermocompressing an electrode on a chip having a semiconductor integrated circuit onto which the solder has been dropped onto an electrode of a mounting board.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3859390A JPH03241756A (en) | 1990-02-20 | 1990-02-20 | Apparatus and method of mounting semiconductor integrated circuit |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3859390A JPH03241756A (en) | 1990-02-20 | 1990-02-20 | Apparatus and method of mounting semiconductor integrated circuit |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH03241756A true JPH03241756A (en) | 1991-10-28 |
Family
ID=12529597
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3859390A Pending JPH03241756A (en) | 1990-02-20 | 1990-02-20 | Apparatus and method of mounting semiconductor integrated circuit |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH03241756A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100376929B1 (en) * | 2000-06-12 | 2003-03-26 | 에드호텍(주) | Method and apparatus for directly attaching engineering balls to a chip or printed circuit board with high efficiency |
JP2006278976A (en) * | 2005-03-30 | 2006-10-12 | Fujitsu Ltd | Semiconductor device and its manufacturing method |
US7614541B2 (en) * | 2003-03-10 | 2009-11-10 | Hitachi Metals, Ltd. | Method and apparatus for placing conductive balls |
JP2013520011A (en) * | 2010-02-16 | 2013-05-30 | インターナショナル・ビジネス・マシーンズ・コーポレーション | Direct IMS (injection molding solder) without using a mask to form solder bumps on the substrate |
-
1990
- 1990-02-20 JP JP3859390A patent/JPH03241756A/en active Pending
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100376929B1 (en) * | 2000-06-12 | 2003-03-26 | 에드호텍(주) | Method and apparatus for directly attaching engineering balls to a chip or printed circuit board with high efficiency |
US7614541B2 (en) * | 2003-03-10 | 2009-11-10 | Hitachi Metals, Ltd. | Method and apparatus for placing conductive balls |
JP2006278976A (en) * | 2005-03-30 | 2006-10-12 | Fujitsu Ltd | Semiconductor device and its manufacturing method |
JP2013520011A (en) * | 2010-02-16 | 2013-05-30 | インターナショナル・ビジネス・マシーンズ・コーポレーション | Direct IMS (injection molding solder) without using a mask to form solder bumps on the substrate |
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