JPH03229683A - Apparatus for evaporative concentration of waste photographic processing solution - Google Patents

Apparatus for evaporative concentration of waste photographic processing solution

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Publication number
JPH03229683A
JPH03229683A JP2272890A JP2272890A JPH03229683A JP H03229683 A JPH03229683 A JP H03229683A JP 2272890 A JP2272890 A JP 2272890A JP 2272890 A JP2272890 A JP 2272890A JP H03229683 A JPH03229683 A JP H03229683A
Authority
JP
Japan
Prior art keywords
waste liquid
liquid
photographic processing
column
temperature
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2272890A
Other languages
Japanese (ja)
Inventor
Masayuki Kurematsu
雅行 榑松
Nobutaka Goshima
伸隆 五嶋
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Konica Minolta Inc
Original Assignee
Konica Minolta Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Konica Minolta Inc filed Critical Konica Minolta Inc
Priority to JP2272890A priority Critical patent/JPH03229683A/en
Publication of JPH03229683A publication Critical patent/JPH03229683A/en
Pending legal-status Critical Current

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  • Heat Treatment Of Water, Waste Water Or Sewage (AREA)

Abstract

PURPOSE:To treat a waste photographic processing solution stably, certainly and efficiently by detecting that a concentrate or the evaporated steam therefrom reaches set temp. to control a heating means. CONSTITUTION:The piping circuit capable of heating and circulating the concentrate of an evaporative concn. column 1 is provided. A heater 31, a concentrate temp. detection means 33, a means 20 replenishing the column 11 with a waste solution and a means 13 detecting the liquid level in the column 11 are provided in the piping circuit and it is detected that the concentrate or the evaporated steam therefrom reaches set temp. to control the heater 31 by a control apparatus 50. By this constitution, a photographic processing solution is treated stably and certainly.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は写真処理廃液の蒸発濃縮処理装置に関するもの
であり、特に自動現像機による写真感光材料の現像処理
に伴い発生する写真処理廃液を業者の回収によらず自動
現像機内もしくはその近傍にて処理するのに適した写真
処理廃液の蒸発濃縮処理装置に関するものである。
DETAILED DESCRIPTION OF THE INVENTION [Industrial Application Field] The present invention relates to an evaporative concentration treatment device for photographic processing waste liquid, and in particular, the present invention relates to an evaporative concentration treatment device for photographic processing waste liquid, and in particular, it is used to collect photographic processing waste liquid generated from the development process of photographic light-sensitive materials using automatic processors. This invention relates to an apparatus for evaporating and concentrating photographic processing waste liquid, which is suitable for processing in or near an automatic processing machine without recovering it.

〔発明の背景〕[Background of the invention]

一般に、ハロゲン化銀写真感光材料の写真処理は、黒白
感光材料の場合には、現像、定着、水洗等、カラー感光
材料の場合には発色現像、漂白定着(又は漂白、定着)
、水洗、安定化等の機能の1つ又は2つ以上を有する処
理液を用いた行程を組合わせて行われている。
In general, photographic processing of silver halide photographic materials includes development, fixing, washing, etc. in the case of black and white materials, and color development, bleach-fixing (or bleaching and fixing) in the case of color materials.
A combination of processes using a treatment liquid having one or more functions such as , water washing, and stabilization is performed.

そして、多量の感光材料を処理する写真処理においては
、処理によって消費された成分を補充し方、処理によっ
て処理液中に溶出或は蒸発によって濃化する成分(例え
ば現像液における臭化物イオン、定着液における銀錯塩
のような)を除去して処理液成分を一定に保つことによ
って処理液の性能を一定に維持する手段か採られており
、上記補充のために補充液か処理液に補充され、写真処
理における濃厚化成分の除去のために処理液の一部か廃
棄されている。
In photographic processing in which a large amount of light-sensitive material is processed, it is important to consider how to replenish the components consumed during processing, and how to replenish components that are eluted into the processing solution or concentrated by evaporation during processing (for example, bromide ions in the developer, bromide ions in the fixer, etc.). A method is taken to maintain the performance of the processing solution at a constant level by removing substances such as silver complex salts (such as silver complex salts) and keeping the processing solution components constant. A portion of the processing solution is discarded to remove thickening components during photographic processing.

近年、補充液は水洗の補充液である水洗水を含めて公害
上や経済的理由から補充の量を大幅に減少させたノステ
ムに変わりつつあるか、写真処理廃液は自動現像機の処
理槽から廃液管によって導かれ、水洗水の廃液や自動現
像機の冷却水等で稀釈されて下水道等に廃棄されていた
In recent years, the amount of replenishment liquid, including washing water, which is a replenishment liquid for washing, has been drastically reduced due to pollution and economic reasons, or photographic processing waste liquid is removed from the processing tank of automatic processors. The liquid was led through a waste pipe, diluted with waste liquid from washing water, cooling water from automatic processing machines, etc., and disposed of in sewers, etc.

しかしながら、近年の公害規制の強化により、水洗水や
冷却水の下水道や河川への廃棄は可能であるか、これら
以外の写真処理液[例えは、現像液、定着液、発色現像
液、漂白定着液(又は漂白液、定着液)、安定液等]の
廃棄は、実質的に不可能となっている。このため、各写
真処理廃液は廃液を専門の廃液処理業者に回収料金を払
って回収してもらったり公害処理設備を設置したりして
いる。しかしなから、廃液処理業者に委託する方法は、
廃液を貯留しておくのにかなりのスペースか必要となる
し、またコスト的にも極めて高価であり、さらに公害処
理設備は初期投資(イニシャルコスト)か極めて大きく
、整備するのにかなり広大な場所を必要とする等の欠点
を有している。
However, due to stricter pollution regulations in recent years, it is now possible to dispose of washing water and cooling water into sewers or rivers, and it is not possible to dispose of washing water and cooling water into sewers or rivers. (or bleaching solution, fixing solution), stabilizer solution, etc.] has become virtually impossible to dispose of. For this reason, each type of photographic processing waste liquid is collected by a specialized waste liquid processing company for a collection fee, or by installing pollution treatment equipment. However, the method of outsourcing to a waste liquid treatment company is
A considerable amount of space is required to store the waste liquid, and it is also extremely expensive.Furthermore, the initial investment (initial cost) for pollution treatment equipment is extremely large, and it requires a fairly large space to maintain it. It has disadvantages such as requiring

さらに、具体的には、写真処理廃液の公害負荷を低減さ
せる公害処理方法としては、活性汚泥法(例えは、特公
昭51−12943号及び同昭51−7952号等)、
蒸発法(特開昭49−89437号及び同56−339
96号等)、電解酸化法(特開昭48−84462号、
同49119458号、特公昭53−43478号、特
開昭49−1194.57号等)、イオン交換法(特公
昭51−37704号、特開昭53−383号、特公昭
53−43271号等)、逆浸透法(特開昭50−22
463号等)化学的処理法(特開昭49−64257号
、特公昭57−37396号、特開昭53−12152
号、同4958833号、同53−63763号、特公
昭57−37395号等)等が知られているか、これら
は未だ充分ではない。
Furthermore, specifically, as a pollution treatment method for reducing the pollution load of photographic processing waste liquid, activated sludge method (for example, Japanese Patent Publication No. 51-12943 and No. 51-7952, etc.);
Evaporation method (JP-A-49-89437 and JP-A-56-339)
No. 96, etc.), electrolytic oxidation method (JP-A-48-84462,
49119458, JP 53-43478, JP 49-1194.57, etc.), ion exchange method (JP 51-37704, JP 53-383, JP 53-43271, etc.) , Reverse osmosis method (Japanese Unexamined Patent Publication No. 50-22
No. 463, etc.) Chemical treatment methods (JP-A-49-64257, JP-A-57-37396, JP-A-53-12152)
No. 4958833, No. 53-63763, Japanese Patent Publication No. 57-37395, etc.), but these are still insufficient.

方、水資源面からの制約、給排水コストの上昇、自動現
像機設備における簡易さと、自動現像機周辺の作業環境
上の点等から、近年、水洗に変わる安定化処理を用い、
自動現像機外に水洗の給排水のための配管を要しない自
動現像機(いわゆる無水洗自動現像機)による写真処理
か普及しつつある。このような処理では処理液の温度コ
ントロールするための冷却水も省略されたものか望まれ
ている。このような実質的に水洗水や冷却水を用いない
写真処理では自動現像機からの写真処理廃液がある場合
と比へて水によって稀釈されないためその公害負荷が極
めて大きく一方において廃液量か少ない特徴かある。
However, due to constraints from water resources, rising water supply and drainage costs, the simplicity of automatic processor equipment, and the work environment around automatic processors, in recent years stabilization treatments have been used instead of washing with water.
Photographic processing using automatic developing machines (so-called waterless automatic developing machines) that do not require piping for water supply and drainage outside the automatic developing machine is becoming popular. In such processing, it is desired that cooling water for controlling the temperature of the processing liquid be omitted. In this kind of photographic processing that does not substantially use rinsing water or cooling water, the pollution load is extremely large compared to the case where there is photographic processing waste liquid from automatic processing machines because it is not diluted with water.On the other hand, the amount of waste liquid is small. There is.

従って、この廃液量か少ないことにより、給廃液用の機
外の配管を省略でき、それにより従来の自動現像機の欠
点と考えられる配管を設置するために設置後は移動か困
難であり、足下スペースか狭く、設置時の配管工事に多
大の費用を要し、温水供給圧のエネルギー費を要する等
の欠点か解消され、オフイスマンンとして使用できるま
でコンパクト化、簡易化か達成されるという極めて太き
い利点か発揮される。
Therefore, due to the small amount of waste liquid, it is possible to omit the piping outside the machine for supplying and waste liquid, which is considered to be a disadvantage of conventional automatic processors, as it is difficult to move the pipes after installation. The disadvantages such as the small space, the high cost of piping work during installation, and the high energy cost of hot water supply pressure have been overcome, and the system has been made compact and simple enough to be used as an office space. The advantages will be demonstrated.

しかしなから、この反面、その廃液は極めて高い公害負
荷を何しており、河川はもとより下水道にさえ、その公
害規制に照らしてその廃液は全く不可能となってきてい
る。さらにこのような写真処理(多量の流水を用いて、
水洗を行わない処理)の廃液量は少ないとはいえ、例え
ば比較的小規模なカラー処理ラボでも、1日に1012
程度となる。
However, on the other hand, the waste liquid has an extremely high pollution load, and in light of pollution regulations, it has become completely impossible to drain the waste liquid into rivers or even sewers. Furthermore, such photo processing (using a large amount of running water,
Even though the amount of waste liquid from processing (processing without water washing) is small, for example, even in a relatively small-scale color processing laboratory, 1012
It will be about.

従って、一般には廃液回収業者によって回収され、二次
及び三次処理され無害化されているか、回収費の高騰に
より廃液引き取り価格は年々高くなるはかりでなく、ミ
ニラボ等では回収効率は悪いため、なかなか回収に来て
もらうことかできず、廃液か店に充満する等の問題を生
じている。
Therefore, in general, waste liquid is collected by a waste liquid collection company and rendered harmless through secondary and tertiary processing, or the price of waste liquid collection is increasing year by year due to rising collection costs. It is not possible to get people to come to the store, causing problems such as waste fluid filling the store.

一方、これらの問題を解決するために写真処理廃液の処
理をミニラボ等でも容易に行えることを目的として、写
真処理廃液を加熱して水分を蒸発乾固ないし固化するこ
とか研究されており、例えは、実開昭60−70841
号等に示されている。発明者等の研究では写真処理廃液
を蒸発処理した場合、亜硫酸ガス、硫化水素、アンモニ
アガス等の有害ないし極めて悪臭性のカスか発生する。
On the other hand, in order to solve these problems, research has been conducted on heating the photographic processing waste liquid to evaporate the water to dryness or solidify it, with the aim of making it easier to process the photographic processing waste liquid even in minilabs. 1986-70841
It is shown in the number etc. According to research conducted by the inventors, when photographic processing waste liquid is evaporated, harmful or extremely foul-smelling residue such as sulfur dioxide gas, hydrogen sulfide, and ammonia gas is generated.

これは写真処理液の定着液や漂白定着液としてよく用い
られるチオー硫酸アンモニウムや亜硫酸塩(アンモニウ
ム塩、ナトリウム塩又はカリウム塩)が高温のため分解
することによって発生することがわかった。更に蒸発処
理時には写真処理廃液中の水分等が蒸気となって気体化
することにより体積が膨張し、蒸発釜中の圧力か増大す
る。このためこの圧力によって蒸発処理装置から前記有
害ないし悪臭性のカスか装置外部へもれ出してしまい、
作i環境上極めて好ましくないことが起こる。
It has been found that this is caused by the decomposition of ammonium thiosulfate and sulfites (ammonium salt, sodium salt, or potassium salt), which are often used as fixing solutions and bleach-fixing solutions in photographic processing solutions, due to high temperatures. Furthermore, during the evaporation process, moisture and the like in the photographic processing waste liquid becomes vapor and gasifies, thereby expanding the volume and increasing the pressure in the evaporator. Therefore, due to this pressure, the harmful or malodorous scum leaks out of the evaporation treatment equipment to the outside of the equipment.
Something extremely undesirable happens in the production environment.

そこで、これらを解決するために実開昭60−7084
1号には蒸発処理装置の排気管部に活性炭等の排カス処
理部を設ける方法か開示されている。しかし、この方法
は写真処理廃液中の多量の水分による水蒸気により、排
カス処理部で結露又は凝結し、カス吸収処理剤を水分か
覆い、ガス吸収能力を瞬時に失わせてしまう重大な欠点
を何しており、未だ実用には供し得ないものであった。
Therefore, in order to solve these problems,
No. 1 discloses a method of providing an exhaust waste treatment section for activated carbon or the like in the exhaust pipe section of an evaporation treatment device. However, this method has the serious drawback that the water vapor from the large amount of water in the photographic processing waste liquid condenses or condenses in the waste waste treatment section, covering the waste absorption processing agent with moisture and instantly causing it to lose its gas absorption ability. However, it was not yet possible to put it into practical use.

これらの問題点を解決するために、この出願人等は写真
処理廃液を蒸発処理するに際し、蒸発によりて土しる蒸
気を凝縮させる冷却凝縮手段を設け、さらに凝縮によっ
て生しる凝縮水を処理するとともに非凝縮成分について
も処理して外部へ放出する写真処理廃液の処理方法及び
装置について先に提案した。
In order to solve these problems, the present applicant et al. installed a cooling condensing means to condense the vapor that forms due to evaporation when evaporating photographic processing waste liquid, and further processed the condensed water produced by the condensation. We have previously proposed a method and apparatus for treating photographic processing waste liquid, which also processes non-condensed components and discharges them to the outside.

しかしなから、上記提案によれば、次のような問題点か
あることを見い出した。すなわち、蒸発処理によって生
しる蒸気は冷却凝縮手段で凝縮されるが、冷却凝縮効率
が悪いと、凝縮されないで装置外部へ放出される蒸気の
比率が高くなり、たとえ活性炭で処理したとしても、悪
臭で有害なガスが装置外部へ放出される比率も高くなる
。さらに冷却凝縮手段によって凝縮された凝縮水も、た
とえ活性炭で処理したとしても、廃棄する時におったり
、公害負荷が高くそのまま下水等に排出できない場合も
ある。
However, according to the above proposal, the following problems were found. In other words, the steam produced by the evaporation process is condensed by the cooling condensing means, but if the cooling condensation efficiency is poor, the proportion of steam that is not condensed and released to the outside of the device increases, even if treated with activated carbon. The rate at which foul-smelling and harmful gases are released to the outside of the device also increases. Furthermore, even if the condensed water condensed by the cooling condensing means is treated with activated carbon, it may have to be disposed of, or the pollution load may be so high that it may not be possible to directly discharge it to a sewage system or the like.

さらに、ミニラボでは店のスペースが極めて限られてお
り、写真処理液を処理することにより発生する悪臭か特
に問題となる1、fかりてなく、廃液処理装置自体の設
置スペース)−問題となる。また、装置の値段やランニ
ングコス)・も重要な問題である従って、写真処理廃液
を、悪臭でを害なカスを発生することなく処理できるコ
ンパクトで安価でかつランニングコストが低い処理装置
が要望されている。
Furthermore, minilabs have extremely limited store space, and there is no particular problem with the bad odor generated by processing photographic processing solutions, which also poses problems in terms of installation space for the waste solution processing equipment itself. In addition, the price and running costs of the equipment are also important issues.Therefore, there is a demand for a compact, inexpensive, and low running cost processing equipment that can process photographic processing waste without producing foul odor or harmful residue. ing.

〔発明か解決しようとする課題〕[Invention or problem to be solved]

このような問題点を解決するために本出願人は特願昭6
2−69437号等を提案し、写真廃液によって発生す
る悪臭か少なく、かつ確実に処理すべき写真処理廃液を
供給可能になるようにした。そのために蒸発釜(分離蒸
発カラムに液面センサーを設す常に該カラムの写真処理
廃液の液面高さを検出し、原液の蒸発濃縮処理で液面が
低下した量だけずつ該廃液を供給補充するようにした。
In order to solve these problems, the applicant filed a patent application in 1983.
No. 2-69437, etc. were proposed, and it was possible to supply photographic processing waste liquid to be reliably processed with less bad odor generated by photographic waste liquid. For this purpose, a liquid level sensor is installed in the evaporation pot (separation evaporation column).The liquid level of the photographic processing waste liquid in the column is constantly detected, and the waste liquid is supplied and refilled in the amount that the liquid level drops during the evaporation concentration process of the stock solution. I decided to do so.

しかし、液面高さを検出して、その減少に見合う廃液だ
け供給して、濃縮液乃至蒸発蒸気の温度を管理しないで
a縮液自体を高温にするようなことかあると処理廃液の
濃縮中に悪臭を出すカスが発生するようなことになる。
However, if the liquid level height is detected and only the waste liquid corresponding to the decrease is supplied, and the temperature of the concentrated liquid or evaporated steam is not controlled, the condensed liquid itself may be heated to a high temperature. This will result in the formation of foul-smelling scum inside.

本発明はこのような問題点を解決してできるだけ低い加
熱温度で写真処理廃液を蒸発濃縮させて定量ずつ該廃液
を濃縮カラムに補給しながら効率良く悪臭を発すること
なく濃縮を行う写真処理廃液の蒸発濃縮装置を提供する
ことを課題目的にする。
The present invention solves these problems by evaporating and concentrating the photographic processing waste liquid at the lowest possible heating temperature and replenishing the waste liquid in quantitative quantities to the concentration column, thereby efficiently concentrating the photographic processing waste liquid without emitting any bad odor. The purpose of the project is to provide an evaporative concentration device.

〔課題を解決するための手段〕[Means to solve the problem]

この目的は、系内に一定量の写真処理廃液を入れ該廃液
を蒸発させて減少したことを液面高さによって検出し、
減少量に見合う写真処理廃液を供給し液面高さを維持し
ながら濃縮していくバッチ方式の写真処理廃液の蒸発濃
縮装置において、蒸発濃縮カラムと該カラムの濃縮液の
加熱循環を可能にする配管回路と該配管回路中に設けた
加熱器と該濃縮液の温度検出手段と、該カラムへの廃液
補給手段と該カラム内の液面検出手段とを有し該濃縮液
又はその蒸発蒸気が設定温度に達したことを検出して加
熱手段を制御するようにしたことを特徴とする写真処理
廃液の蒸発濃縮装置によって達成される。
The purpose of this is to put a certain amount of photographic processing waste liquid into the system, evaporate the waste liquid, and detect the decrease by the liquid level height.
In a batch-type photographic processing waste liquid evaporation concentration device that supplies photographic processing waste liquid corresponding to the amount of reduction and concentrates it while maintaining the liquid level, it is possible to heat and circulate the concentrated liquid in the evaporation concentration column and the column. It has a piping circuit, a heater provided in the piping circuit, a means for detecting the temperature of the concentrated liquid, a means for supplying waste liquid to the column, and a means for detecting the liquid level in the column. This is achieved by an apparatus for evaporating and concentrating photographic processing waste liquid, which is characterized in that the heating means is controlled by detecting that the set temperature has been reached.

〔実施例〕〔Example〕

本発明の実施例を第1図の配管図、第2図(a)。 An embodiment of the present invention is shown in the piping diagram in FIG. 1 and in FIG. 2(a).

(b )、(c )、(d )の各側断面図、第2図(
e)の上面図、第3図のフローチャートによって説明す
る。
(b), (c), (d) side sectional views, Fig. 2 (
This will be explained with reference to the top view of e) and the flowchart of FIG.

本発明の写真処理廃液の蒸発濃縮装置lは分離カラム装
置lO1廃液供給装置20、加熱装置30、冷却装置4
0及び制御装置50で構成されていて、分離カラム装置
10は、蒸発濃縮カラム(V−3) 11と同一液面で
連通ずる供給廃液の滞留部12か設けられている。該滞
留部の連通管12Aの先端は第1図に示すように細めら
れて上方に曲けられ前記濃縮カラム11内の液中に沈め
られ該カラム11の液面近くに生ずる浮遊物が該滞留部
に逆流してこないようにしである。また、該滞留部12
は該カラム11の内部にあってもよく外部であってもよ
い。そして、蒸発濃縮カラムはスラッジ回収容器(V−
4) 15と接続パイプ14で連結されていて、該容器
は載置台16上にはね状クソンヨンを介して載置される
。そして廃液か濃縮されたスラッジは該容器内に順次落
下してゆき、該スラッジかたまり、所定重量に達すると
マイクロスイッチ(MS−1) 19によって検出可能
にしである。そして該載置台上のベッセル(16a)に
液もれか生しるとそれの検出用液面センサー(LC−5
) 18か設けられている。更に蒸発濃縮カラム(V−
3) 11内の滞留部12に廃液レベル検出用液面セン
サー(LC−1) 13か設けられている。
The photographic processing waste liquid evaporation concentration device 1 of the present invention includes a separation column device 1O1 a waste liquid supply device 20, a heating device 30, a cooling device 4
0 and a control device 50, the separation column device 10 is provided with a retention section 12 for the supplied waste liquid that communicates with the evaporation concentration column (V-3) 11 at the same liquid level. The tip of the communicating tube 12A of the retention section is narrowed and bent upward as shown in FIG. This is to prevent it from flowing back into the room. In addition, the retention section 12
may be located inside or outside the column 11. Then, the evaporation concentration column is connected to the sludge collection container (V-
4) The container is connected to the container 15 by a connecting pipe 14, and the container is placed on the mounting table 16 via a spring-like spring. The waste liquid or concentrated sludge gradually falls into the container, and when the sludge mass reaches a predetermined weight, it becomes detectable by a microswitch (MS-1) 19. If a liquid leaks in the vessel (16a) on the mounting table, the liquid level sensor (LC-5) detects it.
) 18 are provided. Furthermore, an evaporation concentration column (V-
3) A liquid level sensor (LC-1) 13 for detecting the level of waste liquid is provided in the retention part 12 in the liquid storage unit 11.

廃液供給装置20は廃液タンク2Iと、その液面レヘル
センサー(LC−3) 28と該廃液タンク(V−5)
 21から、流出供給用の耐熱塩化ビニールパイプ(以
下耐熱塩ヒバイブという) 22.24により、廃液供
給ポンプ(P−1) 23を介して前記滞留部12に廃
液を供給する配管と、蒸発濃縮カラムに廃液供給ポンプ
(P−2) 25を介して耐熱塩ビパイプ22,26.
27により廃液を供給する配管とよりなる。
The waste liquid supply device 20 includes a waste liquid tank 2I, its liquid level health sensor (LC-3) 28, and the waste liquid tank (V-5).
21 is a heat-resistant vinyl chloride pipe for outflow supply (hereinafter referred to as heat-resistant salt Hibaib); 22.24 is a waste liquid supply pump (P-1); a pipe that supplies waste liquid to the retention section 12 via 23; and an evaporation concentration column. and heat-resistant PVC pipes 22, 26. through a waste liquid supply pump (P-2) 25.
27 is a pipe for supplying waste liquid.

濃縮カラム(V−3) 11内の濃縮液の加熱装置30
は濃縮カラム11から配管された耐熱塩ヒバイブ34に
よって濃縮液かヒータ32を設けた加熱器3H+循環パ
イプ中に入り加熱され、更に前記耐熱塩ビパイプ27を
通して再び濃縮カラム(V−3) 11に戻されて循環
するようにしである。そして加熱濃縮液の温度は加熱器
31の循環パイプ中に設けられた温度センサー(TC−
1) 33によって検出される。また7 濃縮液の循環はエアポンプ(P−4)←によって行iわ
れる。勿論、前記温度センサーは前記蒸発濃縮カラム中
に設けてもよい。
Heating device 30 for the concentrated liquid in the concentration column (V-3) 11
The concentrated liquid enters the heater 3H + circulation pipe equipped with a heater 32 and is heated by the heat-resistant salt Hibive 34 piped from the concentration column 11, and is further returned to the concentration column (V-3) 11 through the heat-resistant PVC pipe 27. This is done so that it can be circulated. The temperature of the heated concentrate is determined by a temperature sensor (TC-
1) Detected by 33. 7. Circulation of the concentrated liquid is performed by an air pump (P-4). Of course, the temperature sensor may be provided in the evaporative concentration column.

つざに冷却装置40について説明する。水道水は水! 
(V−1) 41に溜められ、パイプ42を通ってパル
j (SV−1) 48ヲ介シテ冷却塔(V−2) 4
61:供給されて、冷水シャワーか浴びせられる。冷水
塔底部には液面計(LC−2) 45が設けられ供給水
の所定の高低差か検出されるようにしである。更に水供
給レヘルセンサー(LC−4) 43、冷却塔液もれセ
ン却 サー(LC−8) 44か設けられ、冷+塔底部からは
排水パイプ48を通じ排出ポンプ(P−3) 47によ
って排水が行えるようにしである。
First, the cooling device 40 will be explained. Tap water is water!
(V-1) 41 and passes through the pipe 42 to the pulverizer (SV-1) 48 to the cooling tower (V-2) 4
61: Provided with a cold shower. A liquid level gauge (LC-2) 45 is provided at the bottom of the cooling water tower to detect a predetermined difference in height of the supplied water. Furthermore, a water supply level sensor (LC-4) 43 and a cooling tower liquid leakage sensor (LC-8) 44 are installed, and water is drained from the bottom of the cooling tower through a drainage pipe 48 by a discharge pump (P-3) 47. This is so that you can do it.

一方冷却塔(V−2) 46には蒸気濃縮カラム(V−
3)11からの過熱蒸気か、耐熱塩ヒバイブを通って冷
却塔(V−2) 46の下部に入り凝縮されるようにし
である。凝縮されなかった蒸気は耐熱塩ヒバイブ36を
通ってエアポンプ(P−4) 37に入り耐熱塩ヒバイ
ブ38.27を通り蒸発濃縮カラム11に再び入るよう
にしである。
On the other hand, the cooling tower (V-2) 46 has a vapor concentration column (V-
3) The superheated steam from 11 passes through the heat-resistant salt Hibaib and enters the lower part of the cooling tower (V-2) 46 to be condensed. The uncondensed vapor passes through the heat-resistant salt hibibe 36, enters the air pump (P-4) 37, passes through the heat-resistant salt hibibe 38, 27, and enters the evaporation concentration column 11 again.

各液面計センサーによる液面情報及び温度センサーによ
る情報は第1図の点線で示すように制御装置500制御
盤(DC5) 51に送られ、写真処理廃液の蒸発濃縮
装置全体の運転制御がなされる。なお、制御盤51の要
部はファン52によって空冷されている。
The liquid level information from each liquid level sensor and the information from the temperature sensor are sent to the control device 500 control panel (DC5) 51 as shown by the dotted line in Figure 1, and the operation of the entire photographic processing waste liquid evaporation concentration device is controlled. Ru. Note that the main parts of the control panel 51 are air-cooled by a fan 52.

以上本発明の装置の構成を示したか、次に該装置の作動
を第3図のフローチャートを用いて説明する。
Having described the configuration of the apparatus of the present invention above, the operation of the apparatus will now be explained using the flowchart of FIG.

以下各ステップ(以下St、と書く)について概略をの
へる。
An outline of each step (hereinafter referred to as St) will be given below.

初期化された状態で、ファンP−5がONされると制御
盤51の要部の空冷か始まる。そしてst、1にて重量
センサー(MS−1(W))のチエツクが行われ、Ye
s(以下Yという)のときはスラッジ回収容器か満杯に
なっているのに回収されてないからブザーが鳴り該容器
数り出し可能ランプが点灯している。取り出し終われは
、また既に取出してあれは、No、(以下Nという)で
ありブザーも鳴らす、ランプも点灯せず、次のSL、2
に移る。
When the fan P-5 is turned on in the initialized state, air cooling of the main parts of the control panel 51 starts. Then, the weight sensor (MS-1 (W)) is checked at st, 1, and the
s (hereinafter referred to as Y), the sludge collection container is full but has not been collected, so the buzzer sounds and the container count lamp is lit. If the extraction is finished, or if it has already been extracted, it will be No (hereinafter referred to as N), the buzzer will sound, the lamp will not light, and the next SL, 2.
Move to.

ここでは廃液タンク(V−5) 21内のレベルセンサ
ー(LC−3) 28かNであれはブザーか鳴り、廃液
タンク空の表示ランプか点灯する。しかし廃液タンクか
空でなけれはYであり、冷却装置40のバルブ(SV−
1) 48を開いて水槽41からの水を冷却塔に入れる
。そしてSL、3に移りレベルセンサー(LC4)43
かNであれはブザーか鳴り水道水ランプが点灯し続ける
。そしてLC−4かYになれば、水道水ランプか消え、
エアポンプ(P−4) 37が作動し、S[,4に移る
Here, if the level sensor (LC-3) in the waste liquid tank (V-5) 21 is 28 or N, the buzzer will sound and the waste liquid tank empty indicator lamp will light up. However, if the waste liquid tank is empty, it is Y, and the valve of the cooling device 40 (SV-
1) Open 48 and let water from water tank 41 into the cooling tower. Then move on to SL, 3, level sensor (LC4) 43
If it is N or N, the buzzer will sound and the tap water lamp will continue to light up. And when it becomes LC-4 or Y, the tap water lamp goes out.
Air pump (P-4) 37 operates and moves to S[,4.

SL、4ではレベルセンサー(LC−2) 45が(動
きNてあれは、排水ポンプ(P−3) 47がOFF、
Yであれは該ポンプ(P−3) 47かONになる。そ
してSt、5に移りレベルセンサー(LC−3) 28
がYならS[,6に移り、Nならは後述するようにS 
L、13の終わる段階まで飛ぶ。
At SL, 4, level sensor (LC-2) 45 (moves N), drain pump (P-3) 47 is OFF,
If it is Y, the pump (P-3) 47 will be turned ON. Then move on to St, 5, level sensor (LC-3) 28
If is Y, move to S[,6; if N, move to S[,6 as described later.
Jump to the end of L, 13.

さてSt、6ではレベルセンサー(LC−4)かNなら
ば、後述するようにブザーか鳴り水道水ランプか点灯し
ヒーター32、バルブ(SV−1) 48、エアポンプ
(P−4) 37、廃液供給ポンプ(P−1) 23、
同CP−2) 25、エアポンプ(P−4) 37のい
ずれもそれぞれOFFにする。しかし、(LC−4)か
YであれはSL、7に進む。そこで液もれ検出センサー
(LC5)18によってスラッジ回収容器載置台16ま
わりの液もれの有無か検出され、NであれはSt、8に
進み液もれ検出センサー(LC−6) 47Aによって
各ポンプベースまわりの液もれが検出され、Nであれば
SL、9に進みパイプ38のレベルセンサー(LC7)
39のレベルが検出されNであればSt、lOに進み、
そこで冷却塔の液もれセンサー(LC−8) 44によ
って液もれか検出され、NであれはS t、11に進む
。S t、7 、S t、3 、S t、9 、S t
、ioに於いてそれぞれYであれはブザーか鳴り、異常
ランプが点灯し、前述の各機能のヒーター バルブ(S
V−1) 及び各ポンプP−4,P−1,P−2,P−
3かいずれもOFFになる。
Now, in St, 6, if the level sensor (LC-4) is N, the buzzer will sound and the tap water lamp will light up as described later, heater 32, valve (SV-1) 48, air pump (P-4) 37, waste liquid. Supply pump (P-1) 23,
Turn off both CP-2) 25 and air pump (P-4) 37. However, if it is (LC-4) or Y, proceed to SL and 7. Then, the liquid leak detection sensor (LC5) 18 detects whether there is a liquid leak around the sludge collection container mounting table 16, and if it is N, the process goes to St, 8, and the liquid leak detection sensor (LC-6) 47A detects each liquid leak. If a liquid leak around the pump base is detected and it is N, go to SL, proceed to 9 and check the level sensor (LC7) of pipe 38.
If the level of 39 is detected and is N, proceed to St, 1O,
There, a liquid leak is detected by the liquid leak sensor (LC-8) 44 of the cooling tower, and if it is N, the process proceeds to S t, 11. S t,7 , S t,3 , S t,9 , S t
, io, respectively, the buzzer sounds, the abnormality lamp lights up, and the heater valve (S
V-1) and each pump P-4, P-1, P-2, P-
All three will be turned off.

S t、llにおいて蒸発濃縮カラム11と連通ずる供
給廃液の滞留部12に設けられたレベルセンサー(LC
−1) 13かNならば廃液供給ポンプ(P−2) 2
5を作動させYならは、該ポンプ(P−2) 25をO
FFにし、ヒーター32をON L S t 、 l 
2に移る。
A level sensor (LC
-1) If 13 or N, waste liquid supply pump (P-2) 2
If 5 is activated, turn the pump (P-2) 25 to O.
Turn on the FF and turn on the heater 32.
Move on to 2.

S L、12にて、温度センサー(TC−1)が65°
C以下てあればSt、4にかえる。そしてSt、4〜1
1を再び繰り返す。TC−1か65°Cを超えていれは
前お供給ポンプ(P−1) 23をONL、60秒中l
O秒間動かし前記滞留部12に廃液を供給する。そして
S t−13に移行する。
Temperature sensor (TC-1) is 65° at SL, 12
If it is below C, change to St, 4. and St, 4-1
Repeat step 1 again. If the temperature exceeds TC-1 or 65°C, turn the supply pump (P-1) 23 ONL for 60 seconds.
The waste liquid is supplied to the retention section 12 by moving for 0 seconds. Then, the process moves to St-13.

S t、13において前記温度センサー(TC−1) 
33により、85°Cを超すようだと供給廃液もなくな
り、蒸発濃縮カラム11も過熱されて来ることになり直
ちにヒーター32、供給ポンプ(P−1) 23をOF
Fにする。そして、85°Cに達しなければSt、4に
戻し、以1st、4〜13を繰返させる。さて85°C
に達した場合は更に進み、供給ポンプ(P−2) 25
をON L 、廃液供給タンク(V−5) 21の底部
に残った廃液を汲み上げて0〜180秒の間の任意の設
定時間たけ作動させ濃縮液を薄めた後、前記供給ポンプ
(P−2) 25をOFFにして、S t、14に移る
At S t, 13 the temperature sensor (TC-1)
33, if the temperature exceeds 85°C, the supplied waste liquid will run out and the evaporative concentration column 11 will also be overheated, so immediately turn off the heater 32 and supply pump (P-1) 23.
Make it F. If the temperature does not reach 85°C, return to St, 4, and repeat steps 4 to 13. Now 85°C
If it reaches , proceed further and supply pump (P-2) 25
ON L, the waste liquid remaining at the bottom of the waste liquid supply tank (V-5) 21 is pumped up and operated for an arbitrary set time between 0 and 180 seconds to dilute the concentrated liquid, and then the waste liquid remaining at the bottom of the waste liquid supply tank (P-2 ) Turn off 25 and move to St, 14.

尚、本実施例では蒸発濃縮カラム(V−3) 11内の
液面低下検出時の濃縮液の温度か65°Cを超えたとき
に処理廃液を前記滞留部に供給するようにし、85°C
を超えると蒸発濃縮動作終了と判断し、濃縮液の加熱循
環配管回路内に廃液及び/又は水を供給して配管内の濃
縮液をうすめて濃縮液温度が40°Cに下がるまで続け
て該濃縮液か配管回路内でかたまらないようにさせたり
して該蒸発濃縮装置を制御している。
In this embodiment, the treated waste liquid is supplied to the retention section when the temperature of the concentrated liquid at the time of detecting a drop in the liquid level in the evaporative concentration column (V-3) 11 exceeds 65°C. C
When the temperature exceeds 40°C, it is judged that the evaporation concentration operation has ended, and the waste liquid and/or water is supplied into the heating circulation piping circuit for the concentrated liquid to dilute the concentrated liquid in the piping, and the process continues until the temperature of the concentrated liquid drops to 40°C. The evaporative concentrator is controlled by preventing the concentrated liquid from accumulating in the piping circuit.

しかし設定温度はこれ等に限定されるものでなく悪臭を
発生しないだめの最高温度の設定は95°Cまでは可能
である。そしてこれを超すようになるとわずかではある
か悪臭の発生もでてくるようになる。95°C以下であ
れは実用上充分しのげる領域といえる。
However, the set temperature is not limited to these, and it is possible to set the maximum temperature up to 95°C without generating a bad odor. When this exceeds this level, a slight but foul odor begins to appear. A temperature below 95°C can be said to be a range that can be sufficiently overcome in practical terms.

S t、14においてはレベルセンサー(LC−2)の
設定値H,Lに応してNの場合は排水ポンプ(P−3)
47をOFFにし、Yの場合は該ポンプをONにして排
水する。
In S t, 14, depending on the setting values H and L of the level sensor (LC-2), if N, the drain pump (P-3)
47 is turned off, and in the case of Y, the pump is turned on to drain water.

そしてSt、15に進み温度センサー(TC−1) 3
3が40°C以上であれば、40°C以下になるまで循
環を統プる。
Then proceed to St, 15 and temperature sensor (TC-1) 3
If 3 is above 40°C, the circulation will be controlled until it becomes below 40°C.

そしてSL、15において、温度センサー(TC−1)
33の検出温度が40°C以下になることを検出すると
ハルツ(SV−1) 48、エアポンプ(P−4) 3
7、排水ポンプ(P−3) 47をOFFにし、廃液供
給ポンプ(P−2) 25をONにし、タイマーを0〜
240秒の間の任意の所定設定時間たけ作動させパイプ
27 、3438内の濃縮された廃液は薄められてパイ
プ内に詰まってしまう現像をなくせるようにした後、該
ポンプ(P−2) 25をOFFにさせる。そして、同
時に制御盤51の空冷ファン(P−5) 52もOFF
にし、i了7ザーを鳴らし、スラッジ回収容器の取出し
可能ランプを点灯して一連のプロセスを終了する。
And at SL, 15, temperature sensor (TC-1)
When the detection temperature of 33 is detected to be 40°C or less, Harutz (SV-1) 48, Air pump (P-4) 3
7. Turn off the drain pump (P-3) 47, turn on the waste liquid supply pump (P-2) 25, and set the timer to 0~
The pump (P-2) 25 is operated for an arbitrary predetermined time period of 240 seconds to dilute the concentrated waste liquid in the pipes 27 and 3438 to eliminate developer clogging the pipes. Turn off. At the same time, the air cooling fan (P-5) 52 of the control panel 51 is also turned off.
7, and the sludge collection container's ejectable lamp is lit to complete the series of processes.

なお、温度検出手段としては、熱電対、熱膨張式(カス
、液)センサー、光センサー等が用いられ、まf−1濃
縮液、蒸気温度を温度検出手段で直接検出するようにす
ることか最も好ましいか、濃縮液、蒸気か存在する容器
、パイプ等の壁温度を検出することも有効であり本発明
はそれを金色する。
In addition, as the temperature detection means, a thermocouple, thermal expansion type (dregs, liquid) sensor, optical sensor, etc. are used, and the temperature of the f-1 concentrated liquid and steam can be directly detected by the temperature detection means. Most preferably, it is also effective to detect the wall temperature of the container, pipe, etc. in which the concentrate, vapor, etc. is present, and the present invention does this.

また、本発明は、濃縮液の加熱循環系及び/又は蒸発濃
縮カラムにエアを吹き込むことか好ましく、概エア流量
は0.5〜IOH/kca(lの範囲が好ましい。本発
明の設定温度は上記エア流量により異なるか一般には5
0〜95°Cの範囲で設定される。
Further, in the present invention, it is preferable to blow air into the heated circulation system and/or evaporative concentration column of the concentrated liquid, and the approximate air flow rate is preferably in the range of 0.5 to IOH/kca (l).The set temperature of the present invention is It may vary depending on the air flow rate mentioned above, but generally it is 5.
It is set in the range of 0 to 95°C.

〔発明の効果〕〔Effect of the invention〕

本発明により、蒸発濃縮カラム内の濃縮廃液の温度を悪
臭を発生させない程度の設定温度に制御しなから写真処
理廃液の濃縮をコンパクトな蒸発濃縮装置によって行う
ことかできるようになり、大ラボ、ミニラボをとわす、
今まで問題となっていた写真処理廃液の処分か安定確実
に効率よく、公害問題を起こすことなくしかも熟練を要
することもなく、簡単に安心して取扱えるようになった
According to the present invention, it is now possible to concentrate photographic processing waste liquid using a compact evaporative concentration device without controlling the temperature of the concentrated waste liquid in the evaporative concentration column to a set temperature that does not generate bad odors. Skip the mini lab,
The disposal of photographic processing waste liquid, which has been a problem up until now, can now be handled easily and safely without causing any pollution problems, without causing any pollution problems, and without requiring any skill.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明の一実施例の配管図。 第2図(a )、(b )、(c )、(d )は本発
明の1実施例の各側断面図、第2図(e)は本発明の1
実施例の上面図。 第3図は本発明の1実施例のフローチャート。 10・・・分離カラム装置 12・・滞留部 (LC−1) 15・・・スラッジ回収容器 20・・・廃液供給装置 23.25・・・廃液供給ポンプ 31・・・加熱器 1) 40・・・冷却装置 l・・・蒸発濃縮装置 11・・・蒸発濃縮カラム 13・・・レベルセンサー 14・・・接続パイプ 16・・・載置台 21・・・廃液タンク(V−5) 30・・・加熱装置 33・・・温度センサー(TC 37・・・エアポンプ(P−4) 50・・・制御装置
FIG. 1 is a piping diagram of one embodiment of the present invention. FIGS. 2(a), (b), (c), and (d) are side sectional views of one embodiment of the present invention, and FIG. 2(e) is an embodiment of the present invention.
The top view of an example. FIG. 3 is a flowchart of one embodiment of the present invention. 10... Separation column device 12... Retention part (LC-1) 15... Sludge collection container 20... Waste liquid supply device 23.25... Waste liquid supply pump 31... Heater 1) 40. ... Cooling device l ... Evaporation concentration device 11 ... Evaporation concentration column 13 ... Level sensor 14 ... Connection pipe 16 ... Mounting table 21 ... Waste liquid tank (V-5) 30 ...・Heating device 33... Temperature sensor (TC 37... Air pump (P-4) 50... Control device

Claims (2)

【特許請求の範囲】[Claims] (1)系内に一定量の写真処理廃液を入れ該廃液を蒸発
させて減少したことを液面高さによって検出し、減少量
に見合う写真処理廃液を供給し液面高さを維持しながら
濃縮していくバッチ方式の写真処理廃液の蒸発濃縮装置
において、蒸発濃縮カラムと該カラムの濃縮液の加熱循
環を可能にする配管回路と該配管回路中に設けた加熱器
と該濃縮液の温度検出手段と、該カラムへの廃液補給手
段と該カラム内の液面検出手段とを有し該濃縮液又はそ
の蒸発蒸気が設定温度に達したことを検出して加熱手段
を制御するようにしたことを特徴とする写真処理廃液の
蒸発濃縮装置。
(1) A certain amount of photographic processing waste liquid is put into the system, the waste liquid is evaporated, a decrease in the liquid level is detected by the liquid level height, and photographic processing waste liquid corresponding to the reduction amount is supplied while maintaining the liquid level height. In a batch-type evaporative concentration device for photographic processing waste liquid that is concentrated, an evaporative concentration column, a piping circuit that enables heating circulation of the concentrated liquid in the column, a heater installed in the piping circuit, and the temperature of the concentrated liquid It has a detection means, a means for supplying waste liquid to the column, and a liquid level detection means in the column, and the heating means is controlled by detecting that the concentrated liquid or its evaporated vapor has reached a set temperature. An apparatus for evaporating and concentrating photographic processing waste liquid, which is characterized by:
(2)前記設定温度は処理廃液供給のときを示す濃縮液
の温度及び/又は該濃縮液の蒸発濃縮作動の終了温度で
あることを特徴とする請求項1記載の写真処理廃液の蒸
発濃縮装置。
(2) The apparatus for evaporating and concentrating photographic processing waste liquid according to claim 1, characterized in that the set temperature is the temperature of the concentrate indicating the time of supplying the processing waste liquid and/or the end temperature of the evaporation and concentration operation of the concentrate. .
JP2272890A 1990-01-31 1990-01-31 Apparatus for evaporative concentration of waste photographic processing solution Pending JPH03229683A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2272890A JPH03229683A (en) 1990-01-31 1990-01-31 Apparatus for evaporative concentration of waste photographic processing solution

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2272890A JPH03229683A (en) 1990-01-31 1990-01-31 Apparatus for evaporative concentration of waste photographic processing solution

Publications (1)

Publication Number Publication Date
JPH03229683A true JPH03229683A (en) 1991-10-11

Family

ID=12090815

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2272890A Pending JPH03229683A (en) 1990-01-31 1990-01-31 Apparatus for evaporative concentration of waste photographic processing solution

Country Status (1)

Country Link
JP (1) JPH03229683A (en)

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