JPH03226563A - Color coating method - Google Patents
Color coating methodInfo
- Publication number
- JPH03226563A JPH03226563A JP1889490A JP1889490A JPH03226563A JP H03226563 A JPH03226563 A JP H03226563A JP 1889490 A JP1889490 A JP 1889490A JP 1889490 A JP1889490 A JP 1889490A JP H03226563 A JPH03226563 A JP H03226563A
- Authority
- JP
- Japan
- Prior art keywords
- base material
- vacuum
- color
- vapor deposition
- film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000000034 method Methods 0.000 title claims abstract description 22
- 238000009500 colour coating Methods 0.000 title claims description 12
- 239000000463 material Substances 0.000 claims abstract description 32
- 238000001771 vacuum deposition Methods 0.000 claims abstract description 7
- 230000001590 oxidative effect Effects 0.000 claims abstract description 5
- 238000000151 deposition Methods 0.000 claims abstract 3
- 239000000126 substance Substances 0.000 claims description 2
- 230000008021 deposition Effects 0.000 claims 1
- 238000007740 vapor deposition Methods 0.000 abstract description 8
- 229910052782 aluminium Inorganic materials 0.000 abstract description 7
- 229910052742 iron Inorganic materials 0.000 abstract description 6
- 239000010935 stainless steel Substances 0.000 abstract description 6
- 229910001220 stainless steel Inorganic materials 0.000 abstract description 6
- 238000000576 coating method Methods 0.000 abstract description 4
- 239000003086 colorant Substances 0.000 abstract description 4
- 238000010438 heat treatment Methods 0.000 abstract description 4
- 238000006243 chemical reaction Methods 0.000 abstract description 3
- 239000011248 coating agent Substances 0.000 abstract description 3
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 abstract description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 9
- 239000010408 film Substances 0.000 description 9
- 239000000758 substrate Substances 0.000 description 8
- 239000010409 thin film Substances 0.000 description 8
- 238000001704 evaporation Methods 0.000 description 6
- 230000008020 evaporation Effects 0.000 description 5
- 239000007789 gas Substances 0.000 description 5
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 238000004040 coloring Methods 0.000 description 3
- -1 for example Chemical compound 0.000 description 3
- 239000012535 impurity Substances 0.000 description 3
- 230000003647 oxidation Effects 0.000 description 3
- 238000007254 oxidation reaction Methods 0.000 description 3
- 239000010936 titanium Substances 0.000 description 3
- 229910000831 Steel Inorganic materials 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000010894 electron beam technology Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- 238000010422 painting Methods 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 239000004033 plastic Substances 0.000 description 2
- 229920003023 plastic Polymers 0.000 description 2
- 238000007747 plating Methods 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 239000010959 steel Substances 0.000 description 2
- 229910052719 titanium Inorganic materials 0.000 description 2
- 238000007738 vacuum evaporation Methods 0.000 description 2
- NGNBDVOYPDDBFK-UHFFFAOYSA-N 2-[2,4-di(pentan-2-yl)phenoxy]acetyl chloride Chemical compound CCCC(C)C1=CC=C(OCC(Cl)=O)C(C(C)CCC)=C1 NGNBDVOYPDDBFK-UHFFFAOYSA-N 0.000 description 1
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910052787 antimony Inorganic materials 0.000 description 1
- 238000005422 blasting Methods 0.000 description 1
- 150000001805 chlorine compounds Chemical class 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 239000003989 dielectric material Substances 0.000 description 1
- 229910001882 dioxygen Inorganic materials 0.000 description 1
- 238000005468 ion implantation Methods 0.000 description 1
- 229910052747 lanthanoid Inorganic materials 0.000 description 1
- 150000002602 lanthanoids Chemical class 0.000 description 1
- 229910052745 lead Inorganic materials 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 229910052748 manganese Inorganic materials 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 229910052723 transition metal Inorganic materials 0.000 description 1
- 150000003624 transition metals Chemical class 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
- 239000012808 vapor phase Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
Abstract
Description
【発明の詳細な説明】 〔産業上の利用分野］ 本発明は、＠色しようとする基材、例えば鋼。[Detailed description of the invention] [Industrial application field] The present invention applies to substrates to be colored, such as steel.
ステンレス鋼、セラミックス、ガラス、プラスチックス
などの表面に、普通の真空蒸着法により各種の所望の色
の被膜を容易に形成することができるカラーコーティン
グ方法に関する。The present invention relates to a color coating method that allows coatings of various desired colors to be easily formed on the surfaces of stainless steel, ceramics, glass, plastics, etc. by a common vacuum deposition method.
〔従来の技術１
イオンブレーティング法により、基材の表面に着色する
技術として特開昭５０−４４９３８号公報が開示されて
いる。イオンブレーティング法は金属などの元素を溶解
した原子にイオン化したＡｒ十などを衝突させ、蒸発原
子をイオン化して基材に衝突させ、気相冷却によって基
材上に薄膜を形成する方法であって、高周波放電領域を
形成することが必要であり、帯電させた被処理物を要す
るなど複雑な装置と工程を必要とする問題がある。[Prior Art 1 JP-A-50-44938 discloses a technique for coloring the surface of a substrate by an ion blating method. The ion blating method is a method in which atoms of dissolved elements such as metals are bombarded with ionized Ar, etc., and the evaporated atoms are ionized and collided with the substrate, and a thin film is formed on the substrate by vapor phase cooling. Therefore, it is necessary to form a high-frequency discharge region, and there is a problem in that it requires complicated equipment and processes, such as requiring a charged object to be processed.
〔発明が解決しようとする課題］
本発明は、簡易な装置によって成膜条件に変化を与える
だけで、着色しようとする基材、例えば、ステンレス鋼
の表面に所望の色の薄膜を形成することを目的とする。[Problems to be Solved by the Invention] The present invention is capable of forming a thin film of a desired color on the surface of a substrate to be colored, such as stainless steel, by simply changing the film forming conditions using a simple device. With the goal.
従来、例えばステンレス鋼の表面に、イオンブレーティ
ング、ＣＶＤ、真空蒸着などによりＴｉの被膜を形成す
る場合、従来の成膜技術では着色すると不良品とされて
おり、また、その着色は限られた色ではあるが再現性に
乏しいものであった。Conventionally, for example, when forming a Ti film on the surface of stainless steel by ion blating, CVD, vacuum evaporation, etc., it was considered a defective product if it became colored using conventional film formation techniques, and the coloring was limited. Although the color was good, the reproducibility was poor.
本発明者らは、各種の蒸着材料を用いることによって、
各種の任意の色合いのカラーコーティングをする技術を
開発した。By using various vapor deposition materials, the present inventors achieved
We have developed a technology for color coating in various arbitrary shades.
この技術は、基本的には真空蒸着法によるもので、イオ
ンブレーティング法とは異なり、高周波放電領域や被処
理物の帯電などを必要とせず、抵抗加熱又は電子ビーム
、スパッタ等によって蒸発する蒸着材料を用いるもので
ある。This technology is basically based on a vacuum evaporation method, and unlike the ion blating method, it does not require a high-frequency discharge region or charging of the object to be processed, and is a vapor deposition method that evaporates using resistance heating, electron beams, sputtering, etc. It uses materials.
本発明はこのような新規なカラーコーティング方法を提
供することを目的とするものである。The object of the present invention is to provide such a novel color coating method.
［課題を解決するための手段１
本発明は、酸化雰囲気中に基材を導入し、この基材表面
に被蒸着物を真空蒸着法により蒸着させる方法であって
、前記基材の表面に着色させたいと考える色に応しで、
ｉＪ材料を選択することを特徴とするカラーコーティン
グ方法である６本発明は基材の表面の被覆工程と被蒸着
物の所望の酸化度の酸化工程とを一工程で同時に行い、
蒸青源の種類及び酸化物の酸化の程度によって、固有の
色を有する薄膜を生成させるものである。[Means for Solving the Problems 1] The present invention is a method in which a base material is introduced into an oxidizing atmosphere and a substance to be deposited is deposited on the surface of the base material by a vacuum evaporation method, the method comprising: coloring the surface of the base material; Depending on the color you want,
6 The present invention, which is a color coating method characterized by selecting an iJ material, simultaneously performs a step of coating the surface of a base material and an oxidation step of a desired oxidation degree of the object to be deposited in one step,
A thin film having a unique color is produced depending on the type of vaporized blue source and the degree of oxidation of the oxide.
［作用１
本発明は、酸イヒ・ｉの減圧雰囲気中において基材上に
薄膜を生じさせるべき元素の蒸着材料９例えばチタン、
アルミニウム、鉄、ニッケル、アルミニウムと鉄、アル
ミニウムと酸イし鉄などを加熱蒸発させることによって
、各種の異なる酸化物、窒化物などの薄膜を生成させる
。合金の場合、蒸着材料は複数を設けるとよい。[Function 1] The present invention provides a vapor deposition material 9 of an element to be formed on a substrate in a reduced pressure atmosphere of acid chloride, for example, titanium,
By heating and evaporating aluminum, iron, nickel, aluminum and iron, aluminum and oxidized iron, etc., thin films of various different oxides and nitrides are generated. In the case of an alloy, it is preferable to provide a plurality of evaporation materials.
また、不純物をイオン注入又はドーピングの手法によっ
て薄膜の内部に含ませることによって、半導体の中に準
位を設定し、これを利用した色を発色させることも可能
である。この場合、添加不純物としては、Ｃｒ、Ｆｅ、
Ｃｏ、Ｃｕ、Ｍｎ、Ｎｉ、Ｕ、Ｓｂ、Ｓｅ、Ｃｄ、Ａｕ
、Ａｇ、Ｐｔ、Ｚｎ、Ｓｎ、Ａｌ、Ｍｇ、Ｐｂ、Ｖ、Ｚ
ｒ、Ｐｄ又はこれらの酸化物若しくは塩化物を単一又は
複数を用いる。このような不純物は基本成分となる金属
の蒸着材料と同−又は異なる１以上の蒸着材料を用いる
。Furthermore, by incorporating impurities into the thin film by ion implantation or doping, it is possible to set a level in the semiconductor and generate a color using this level. In this case, the added impurities include Cr, Fe,
Co, Cu, Mn, Ni, U, Sb, Se, Cd, Au
, Ag, Pt, Zn, Sn, Al, Mg, Pb, V, Z
One or more of r, Pd, or their oxides or chlorides are used. For such impurities, one or more evaporation materials that are the same as or different from the evaporation material of the metal serving as the basic component are used.
また、誘電体、例えば、ガラス質薄膜中に遷移金属、例
えば、Ｃｏ、Ｃｕ、ランタノイドなどを捕捉させ、放射
線を加えて金属をイオン化させ、発光させる技術を応用
することもできる。It is also possible to apply a technique in which a transition metal such as Co, Cu, lanthanide, etc. is captured in a dielectric material such as a glassy thin film, and radiation is applied to ionize the metal to emit light.
このようにしで、生成したコーティングは安定であり、
塗装、めっきなどの結合力の弱い比較的厚い被膜ではな
く基材と一体化した強固で極めて薄い膜である。In this way, the resulting coating is stable and
It is a strong and extremely thin film that is integrated with the base material, rather than a relatively thick film with weak bonding strength such as painting or plating.
本発明方法は従来のイオンブレーティングのように高周
波放電領域を形成したり被処理物に帯電させる必要がな
く、抵抗加熱、電子ビーム又はスパッタにより蒸着材料
を加熱して蒸発させた蒸発粒子を雰囲気中に通すだけで
よく、簡易な装置で簡単に実現することができる。The method of the present invention does not require the formation of a high-frequency discharge region or the charging of a workpiece as in conventional ion blating, and the evaporated particles are heated by resistance heating, an electron beam, or sputtering, and the evaporated particles are evaporated into an atmosphere. All you have to do is pass it through, and it can be easily achieved with a simple device.
本発明のカラーコーティングする基材には鋼。The base material to be color coated in the present invention is steel.
ステンレス鋼等金属のほか、セラミックス、ガラス、プ
ラスチックス等を用いることができ、これらに各種の色
の７ｉ膜を生成させる。In addition to metals such as stainless steel, ceramics, glass, plastics, etc. can be used, and 7i films of various colors are produced on these.
［実施例］
次に、実施例によって、本発明のカラーコーティング方
法における蒸発材料依存性について具体的に説明する。[Example] Next, the dependence on evaporation material in the color coating method of the present invention will be specifically explained using Examples.
ステンレス鋼を基材とし、第１図に示す真空蒸着装置内
においてカラーコーティングを行った。Stainless steel was used as a base material, and color coating was performed in a vacuum evaporation apparatus shown in FIG.
反応器ｌ内に基材２を導入し、排気管４から真空ポンプ
で吸引し反応器内を４ｘｌＯ−’Ｔｏｒｒの酸化性雰囲
気の真空とし、蒸着材料を変えて試験を行った。The substrate 2 was introduced into the reactor 1, and suction was carried out by a vacuum pump through the exhaust pipe 4 to create a vacuum of oxidizing atmosphere of 4xlO-'Torr in the reactor, and tests were conducted with different vapor deposition materials.
成膜条件は次の通りである。The film forming conditions are as follows.
基材温度 二室温
蒸着材料：Ｔｉ、Ｎｉ、Ａｊ２、Ｆｅ、ＡＩ２＋Ｆｅ、
Ａｊ２＋Ｆｅ２Ｏ３
ガスの種類：酸素
ガスの流量：１５ＳＣＣＭ
成膜速度 二４〜２０人／ ｓ ｅ ｃ膜厚 ：
４０００人
反応槽内初期圧カニ１０”−６Ｔｏｒｒガス圧力 ：４
．０ＸＩＯ’Ｔｏｒｒ
以上の条件の下でガス圧力を変化させて成膜を行ったと
ころ第１表に示す結果を得た。Base material temperature Two room temperature evaporation materials: Ti, Ni, Aj2, Fe, AI2+Fe,
Aj2+Fe2O3 Gas type: Oxygen gas flow rate: 15SCCM Film forming rate 24-20 people/sec Film thickness:
Initial pressure in reaction tank for 4000 people: 10"-6 Torr gas pressure: 4
．． Film formation was performed by changing the gas pressure under conditions of 0XIO'Torr or higher, and the results shown in Table 1 were obtained.
［発明の効果］
本発明によれば、基材の表面に所望の色の美麗なカラー
コーティングを再現性よ（実現することができる。また
、単色に限らず、模様、連続的に変化する配色、あるい
は干渉色を発色させることができる。[Effects of the Invention] According to the present invention, it is possible to reproducibly realize a beautiful color coating of a desired color on the surface of a substrate. Alternatively, interference colors can be developed.
本発明のカラーコーティングは、塗装やめっきとは異な
り、基材表面に強固に生成した薄膜によるもので、剥離
を生じないから、工業的規模における連続的なカラーコ
ーティングが可能となるなどの優れた効果を奏する。Unlike painting or plating, the color coating of the present invention is a thin film firmly formed on the surface of the base material and does not peel off, making it possible to perform continuous color coating on an industrial scale. be effective.
本発明は、イオンブレーティングのような複雑な装置を
要しないから、工業的規模における連続的なカラーコテ
ィングが可能となるなどの優れた効果を奏する。Since the present invention does not require a complicated device such as ion blasting, it has excellent effects such as enabling continuous color coating on an industrial scale.
第１図は本発明の実施に用いる装置の模式的縦断面図で
ある。
ｌ−・・反応器
２・・・基材
３・・−７蒸着材料
４・・・排気管
５・・−ガス導入管
６・・・真空計
７・・−ガス流量計
８−・−膜厚測定計
出
願
人
川崎
代
理
人FIG. 1 is a schematic longitudinal cross-sectional view of an apparatus used for carrying out the present invention. l-...Reactor 2...Base material 3...-7 Vapor deposition material 4...Exhaust pipe 5...-Gas introduction pipe 6...Vacuum gauge 7...-Gas flow meter 8--Membrane Thickness meter applicant Kawasaki attorney
Claims (1)
物を真空蒸着法により蒸着させるに際し、前記基材の表
面に着色させる色に応じて、蒸着材料を選択することを
特徴とするカラーコーティング方法。1. When introducing a base material into an oxidizing atmosphere and depositing a substance to be deposited on the surface of the base material by a vacuum evaporation method, a deposition material is selected depending on the color to be colored on the surface of the base material. Color coating method.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1889490A JPH03226563A (en) | 1990-01-31 | 1990-01-31 | Color coating method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1889490A JPH03226563A (en) | 1990-01-31 | 1990-01-31 | Color coating method |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH03226563A true JPH03226563A (en) | 1991-10-07 |
Family
ID=11984281
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1889490A Pending JPH03226563A (en) | 1990-01-31 | 1990-01-31 | Color coating method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH03226563A (en) |
-
1990
- 1990-01-31 JP JP1889490A patent/JPH03226563A/en active Pending
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