JPH032243B2 - - Google Patents
Info
- Publication number
- JPH032243B2 JPH032243B2 JP58053137A JP5313783A JPH032243B2 JP H032243 B2 JPH032243 B2 JP H032243B2 JP 58053137 A JP58053137 A JP 58053137A JP 5313783 A JP5313783 A JP 5313783A JP H032243 B2 JPH032243 B2 JP H032243B2
- Authority
- JP
- Japan
- Prior art keywords
- sample
- unevenness
- densitometer
- smoothness
- measurement
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000005286 illumination Methods 0.000 claims description 13
- 238000005259 measurement Methods 0.000 description 18
- 238000010586 diagram Methods 0.000 description 5
- 238000000034 method Methods 0.000 description 4
- 239000003973 paint Substances 0.000 description 4
- 229910052736 halogen Inorganic materials 0.000 description 2
- 150000002367 halogens Chemical class 0.000 description 2
- 239000013307 optical fiber Substances 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 1
- 239000007888 film coating Substances 0.000 description 1
- 238000009501 film coating Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 238000006748 scratching Methods 0.000 description 1
- 230000002393 scratching effect Effects 0.000 description 1
- 239000007779 soft material Substances 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/30—Measuring arrangements characterised by the use of optical techniques for measuring roughness or irregularity of surfaces
- G01B11/306—Measuring arrangements characterised by the use of optical techniques for measuring roughness or irregularity of surfaces for measuring evenness
Description
【発明の詳細な説明】
本発明は紙、フイルム、塗膜等の表面の平滑性
を凹凸の大きさ（凹凸の波長）毎に評価すること
の出来る、表面の平滑性測定装置に関するもので
ある。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a surface smoothness measuring device that can evaluate the smoothness of the surface of paper, film, paint, etc. for each unevenness size (wavelength of unevenness). .
紙、フイルム、塗膜等の表面の平滑性を測定す
る一般的な方法としては、平滑な測定ヘツドと試
料表面のすき間の空気の漏洩の程度で評価する方
法（ベツク平滑度計、ガーレーデンソメーター）
平滑なガラス面に対する試料表面の接触面積を光
学的に測定する方法（チヤツプマン平滑度計）、
等がある。本来、平滑性の測定は目的に応じた凹
凸の大きさ（凹凸の波長）について行うことが望
ましいが、これらの方法では小さな凹凸から比較
的大きな凹凸まで全てを評価するため平滑性を用
途あるいは目的に応じた凹凸の大きさ毎に評価す
ることが出来なかつた。 A common method for measuring the surface smoothness of paper, film, paint films, etc. is to evaluate the degree of air leakage between the smooth measurement head and the sample surface (Beck smoothness meter, Gurley densometer). )
A method for optically measuring the contact area of a sample surface with a smooth glass surface (Chapman smoothness meter),
etc. Originally, it is desirable to measure smoothness based on the size of the unevenness (wavelength of the unevenness) depending on the purpose, but these methods evaluate everything from small unevenness to relatively large unevenness, so smoothness is measured depending on the purpose or purpose. It was not possible to evaluate the size of the unevenness according to the size of the unevenness.
このような表面の凹凸をその大きさ毎に評価す
る目的で、金属の研削面等の測定に使用される触
針粗さ計で表面の凹凸を測定し、その電気信号を
周波数解析する試みがなされている。 In order to evaluate these surface irregularities according to their size, an attempt was made to measure the surface irregularities with a stylus roughness meter used for measuring ground surfaces of metals, and to analyze the frequency of the electrical signal. being done.
この方法は触針の先で試料表面を引つ掻くこと
により表面の凹凸を検出しているため、紙、フイ
ルム、塗膜のような柔らかい材料の場合、表面に
変形を生じ真の値を得にくい欠点がある。 This method detects surface irregularities by scratching the sample surface with the tip of a stylus, so in the case of soft materials such as paper, film, and paint, the surface deforms and the true value cannot be obtained. There are some serious drawbacks.
本発明の表面の平滑性測定装置はこのような問
題点あるいは欠点を改良したものである。 The surface smoothness measuring device of the present invention solves these problems or drawbacks.
本発明の目的は、紙、フイルム、塗膜等の表面
の平滑性を凹凸の大きさ毎に測定出来る表面の平
滑性測定装置を提供することである。 SUMMARY OF THE INVENTION An object of the present invention is to provide a surface smoothness measuring device that can measure the smoothness of the surface of paper, film, paint, etc. for each size of unevenness.
本発明者らは、種々の平滑性測定方法を検計し
た結果、一定速度で移動する試料の表面を試料面
に対し10度以下の斜光で照明し、それにより生ず
る表面の凹凸に対応した影の濃淡を、試料面に対
し90度の位置に配置した濃度計で電気信号に変換
し、その信号波形を周波数解析し各波長成分毎の
振幅を得ることにより、従来の方法では測定出来
なかつた表面の平滑性の評価が可能であることを
見い出し、本発明を完成するに至つた。 As a result of testing various smoothness measurement methods, the present inventors discovered that the surface of a sample moving at a constant speed is illuminated with oblique light of 10 degrees or less to the sample surface, and a shadow corresponding to the unevenness of the surface caused by this illumination is obtained. By converting the shading into an electrical signal using a densitometer placed at 90 degrees to the sample surface, and frequency-analyzing the signal waveform to obtain the amplitude of each wavelength component, it is possible to perform measurements that were impossible using conventional methods. The inventors discovered that surface smoothness can be evaluated and completed the present invention.
すなわち、本発明は試料を試料面に対し10度以
下の斜光で照明するための照明装置と、試料を保
持し一定速度で移動させる試料台と、照明により
試料表面に生ずる試料の凹凸に起因する影の濃度
を試料面に対し90度の位置で測定するための濃度
計と、濃度計からの信号波形を解析する周波数解
析装置とを備えた、平滑性を凹凸の大きさ毎に評
価することが出来る、表面の平滑性測定装置に関
するものである。本発明における照明は、第２図
に示すように試料表面の凹凸に対応した影を生じ
させるために用いるものである。従つて、試料面
に対する角度が大きくなると、十分なコントラス
トを有する影を生じないため測定が不可能とな
る。斜光の角度について検討した結果、紙、フイ
ルム塗膜等の場合、十分なコントラストを得るた
めには、10度以下の角度で照明する必要のあるこ
とを見出した。 That is, the present invention provides an illumination device for illuminating a sample with oblique light of 10 degrees or less with respect to the sample surface, a sample stage for holding the sample and moving it at a constant speed, and an illumination device for illuminating the sample due to the unevenness of the sample that occurs on the sample surface due to the illumination. Equipped with a densitometer to measure the density of the shadow at a position of 90 degrees to the sample surface and a frequency analyzer to analyze the signal waveform from the densitometer, the smoothness can be evaluated for each size of unevenness. The present invention relates to a surface smoothness measuring device that can measure surface smoothness. Illumination in the present invention is used to create shadows corresponding to the unevenness of the sample surface, as shown in FIG. Therefore, if the angle with respect to the sample surface becomes large, a shadow with sufficient contrast will not be produced, making measurement impossible. As a result of examining the angle of oblique light, we found that in the case of paper, film coatings, etc., it is necessary to illuminate at an angle of 10 degrees or less in order to obtain sufficient contrast.
試料台の移動速度は、濃度計における測定スリ
ツトの大きさと、濃度計からの電気信号を取り込
み、周波数解析処理を行なう、周波数解析装置の
取り込み速度の影響を受ける。例えば、測定スリ
ツト＊が0.25mm×0.25mmで、信号取り込み速度が
１秒間に８回とすると、測定点に重なりを生じな
いための移動台の移動速度は、測定スリツト巾と
信号取り込み速度の積（0.25×８＝２mm／秒）と
なる。 The moving speed of the sample stage is influenced by the size of the measurement slit in the densitometer and the acquisition speed of the frequency analyzer that takes in the electrical signal from the densitometer and performs frequency analysis processing. For example, if the measurement slit* is 0.25 mm x 0.25 mm and the signal acquisition speed is 8 times per second, the moving speed of the moving table to avoid overlapping measurement points is the product of the measurement slit width and the signal acquisition speed. (0.25×8=2mm/sec).
＊Ａ／（Ｂ×Ｃ）＝（５mm×５mm）／（10×２）
Ａ：装置のスリツトの大きさ（５mm×５mm）
Ｂ：投影レンズ倍率（10倍）
Ｃ：測定レンズ倍率（２倍）
上記条件で行なえば、１秒間に２mmの移動で、
１秒間に８回のデータを取り込むことになるが、
この条件下で移動速度を増して３mm／秒とする
と、データ取り込む間隔が開くため、測定しない
部分が生じ正確な測定ができなくなる。また、移
動速度を２mm／秒より遅くすると、データ取り込
む間隔が重なり、同じような測定点のデータを取
り込むことになり好ましくない。従つて、試料台
を測定スリツト巾と信号取り込み速度に応じて設
定した一定速度で移動させることが必要になるの
である。 *A/(B×C)=(5mm×5mm)/(10×2) A: Size of device slit (5mm×5mm) B: Projection lens magnification (10x) C: Measurement lens magnification (2x) ) If carried out under the above conditions, the movement will be 2 mm per second,
Data will be captured 8 times per second,
If the moving speed is increased to 3 mm/sec under these conditions, the data acquisition interval will increase, resulting in portions not being measured and making accurate measurements impossible. Furthermore, if the moving speed is slower than 2 mm/sec, the data acquisition intervals overlap, and data from similar measurement points will be acquired, which is not preferable. Therefore, it is necessary to move the sample stage at a constant speed set according to the measurement slit width and signal acquisition speed.
本発明の照明装置は一定光量の収束した光を試
料面に対し10度以下の角度で照射するものであれ
ば良い。照明光源としてはハロゲンランプ、レー
ザー光源等を使用することが出来る。 The illumination device of the present invention may be one that irradiates a fixed amount of converged light onto the sample surface at an angle of 10 degrees or less. As the illumination light source, a halogen lamp, a laser light source, etc. can be used.
試料表面に生じた影の濃淡を測定する濃度計
は、微少面積当りの反射光量の濃度変化を連続的
にとらえることの出来るものであれば良い。 The densitometer for measuring the shade of the shadow produced on the sample surface may be any device that can continuously detect changes in the density of the amount of reflected light per minute area.
周波数解析装置としては高速フーリエ変換周波
数解析装置、オクターブフイルターによる周波数
解析装置等を使用すると良い。 As the frequency analysis device, it is preferable to use a fast Fourier transform frequency analysis device, a frequency analysis device using an octave filter, or the like.
解析結果の表示はCRT（陰極線管）、Ｘ−Ｙプ
ロツター、プリンター等に表示することが出来
る。 The analysis results can be displayed on a CRT (cathode ray tube), X-Y plotter, printer, etc.
さらに解析データーをコンピユーターに転送
し、演算等を行うことも可能である。 Furthermore, it is also possible to transfer the analysis data to a computer and perform calculations, etc.
本発明の一実施例を第１図ないし第３図に示
す。 An embodiment of the present invention is shown in FIGS. 1-3.
第１図は本測定装置のブロツク図である。一定
速度で試料を動かすための試料台２上に保持され
た試料３に対し、試料面に対し10度以下の角度24
で照明するために照明装置１がある。 FIG. 1 is a block diagram of this measuring device. For the sample 3 held on the sample stage 2 for moving the sample at a constant speed, the angle 24 is less than 10 degrees with respect to the sample surface.
There is a lighting device 1 for lighting the room.
この斜光照明により試料３上に生じた試料表面
の凹凸に基く影は、試料面に対し90度の位置に配
置した拡大レンズ、スリツト、光電子増倍管等か
ら成る濃度計４により、光の強弱が濃度変動電気
信号に変換される。この電気信号は周波数解析装
置５で高速フーリエ変換され、各周波数（波長）
毎の振幅データーが得られる。このデーターは直
接Ｘ−Ｙプロツター７へ表示すると同時に、パー
ソナルコンピユーター６で目的に応じた周波数
（波長）範囲のデーターの積算値をＸ−Ｙプロツ
ター７に表示する。 A densitometer 4 consisting of a magnifying lens, a slit, a photomultiplier tube, etc. placed at a position of 90 degrees with respect to the sample surface measures the intensity and weakness of the light. is converted into a concentration fluctuation electric signal. This electrical signal is subjected to fast Fourier transform in the frequency analyzer 5, and each frequency (wavelength) is
Amplitude data for each period can be obtained. This data is directly displayed on the X-Y plotter 7, and at the same time, the personal computer 6 displays on the X-Y plotter 7 an integrated value of data in a frequency (wavelength) range according to the purpose.
第２図には測定の原理を説明するために、紙に
斜光Ｅを当てたさい生ずる試料表面の凹凸に応じ
た影の様子Ａと、この試料表面の明暗を濃度計で
測定して得られる濃度変動電気信号Ｂと、Ｂの信
号を高速フーリエ変換して得られる周波数解析曲
線Ｃを示す。表面の平滑性の評価は各試料につい
て求めたＣに示す周波数解析曲線を比較するこ
と、およびＣの斜線部のような測定目的に応じた
凹凸の大きさの範囲相当の変動量の積算値で行
う。 In order to explain the principle of measurement, Figure 2 shows the appearance of shadows A that occur when oblique light E is applied to paper, depending on the unevenness of the sample surface, and the brightness and darkness of this sample surface obtained by measuring it with a densitometer. A concentration fluctuation electric signal B and a frequency analysis curve C obtained by performing fast Fourier transform on the signal B are shown. Surface smoothness can be evaluated by comparing the frequency analysis curves shown in C obtained for each sample, and by integrating the amount of variation corresponding to the range of the unevenness size depending on the measurement purpose, such as the shaded area in C. conduct.
第３図は第１図に示した照明装置１および濃度
計４の詳細な説明図である。すなわち、照明装置
２２は定電圧装置８と、光源ランプ９としてのハ
ロゲンランプ（24V、150W）と、強い光量で斜
光（試料表面に対し10度以下）を当てるための光
フアイバー１０で構成されている。 FIG. 3 is a detailed explanatory diagram of the illumination device 1 and the densitometer 4 shown in FIG. 1. That is, the illumination device 22 is composed of a constant voltage device 8, a halogen lamp (24V, 150W) as a light source lamp 9, and an optical fiber 10 for applying oblique light (10 degrees or less to the sample surface) with a strong light intensity. There is.
試料表面に生じた影の濃度を測定する濃度計２
３は測定レンズ（倍率２倍）１３と、投影レンズ
（倍率10倍）１４と、スリツト（５mm×５mm）１
５と、濃度調節用のNDフイルター１６と、反射
ミラー１７と、光電子増倍管（サイドオン型光電
子増倍管）１８と、前置増幅器１９と、濃度アン
プ２０から構成されている。測定レンズ１３の倍
率またはスリツトの大きさを変えることにより、
濃度測定スポツトの大きさを変化させることが出
来る。なお、測定スポツトの大きさは、対象とす
る凹凸の大小に応じて変えることが好ましい。試
料台１１は駆動モーター２１により、２mm／秒の
速度で移動し、試料表面の濃度が濃度計２３で連
続測定出来るようになつている。 Densitometer 2 that measures the density of the shadow formed on the sample surface
3 is a measurement lens (2x magnification) 13, a projection lens (10x magnification) 14, and a slit (5 mm x 5 mm) 1
5, an ND filter 16 for concentration adjustment, a reflection mirror 17, a photomultiplier tube (side-on type photomultiplier tube) 18, a preamplifier 19, and a concentration amplifier 20. By changing the magnification of the measuring lens 13 or the size of the slit,
The size of the concentration measurement spot can be varied. Note that the size of the measurement spot is preferably changed depending on the size of the target unevenness. The sample stage 11 is moved at a speed of 2 mm/sec by a drive motor 21, and the concentration on the sample surface can be continuously measured by a densitometer 23.
以上のことから、本発明の表面の平滑性測定装
置は試料の平滑性を試料表面の凹凸の大きさ（凹
凸の波長）毎に評価することの出来る装置である
ことが明らかである。 From the above, it is clear that the surface smoothness measuring device of the present invention is a device that can evaluate the smoothness of a sample for each size of unevenness (wavelength of the unevenness) on the sample surface.
第１図は本発明の一実施例のブロツク図、第２
図は測定原理の説明図、第３図は第１図の照明装
置と濃度計の詳細なブロツク図である。
１，２２……照明装置、２，１１……試料台、
３，１２……試料、４，２３……濃度計、５……
周波数解析装置、６……パーソナルコンピユータ
ー、７……Ｘ−Ｙプロツター、８……定電圧装
置、９……光源ランプ、１０……光フアイバー、
１３……測定レンズ、１４……投影レンズ、１５
……スリツト、１６……フイルター、１７……ミ
ラー、１８……光電子増倍管、１９……前置増幅
器、２０……濃度アンプ、２１……モーター、Ａ
……試料上の影、Ｂ……濃度変動電気信号、Ｃ…
…周波数解析曲線、Ｄ……変動量の積算値、Ｅ…
…斜光、２４……斜光角度。
FIG. 1 is a block diagram of one embodiment of the present invention, and FIG.
The figure is an explanatory diagram of the measurement principle, and FIG. 3 is a detailed block diagram of the illumination device and densitometer shown in FIG. 1. 1, 22...Illumination device, 2, 11...Sample stage,
3,12...Sample, 4,23...Concentration meter, 5...
Frequency analyzer, 6... Personal computer, 7... X-Y plotter, 8... Constant voltage device, 9... Light source lamp, 10... Optical fiber,
13...Measurement lens, 14...Projection lens, 15
...slit, 16 ... filter, 17 ... mirror, 18 ... photomultiplier tube, 19 ... preamplifier, 20 ... concentration amplifier, 21 ... motor, A
...Shadow on the sample, B...Concentration fluctuation electric signal, C...
...Frequency analysis curve, D... integrated value of fluctuation amount, E...
...oblique light, 24...oblique light angle.
Claims (1)
照明するための照明装置と、試料を保持し一定速
度で移動させる試料台と、照明により試料表面に
生ずる試料の凹凸に起因する影の濃度を試料面に
対し90度の位置で測定するための濃度計と、濃度
計からの信号波形を解析する周波数解析装置とを
備えた表面の平滑性測定装置。1. An illumination device that illuminates the surface of the sample with oblique light of 10 degrees or less relative to the sample surface, a sample stage that holds the sample and moves it at a constant speed, and a system that eliminates shadows caused by unevenness of the sample caused by the illumination. A surface smoothness measuring device equipped with a densitometer to measure the concentration at 90 degrees to the sample surface and a frequency analyzer to analyze the signal waveform from the densitometer.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5313783A JPS59178305A (en) | 1983-03-28 | 1983-03-28 | Surface smoothness measuring apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5313783A JPS59178305A (en) | 1983-03-28 | 1983-03-28 | Surface smoothness measuring apparatus |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS59178305A JPS59178305A (en) | 1984-10-09 |
| JPH032243B2 true JPH032243B2 (en) | 1991-01-14 |
Family
ID=12934432
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP5313783A Granted JPS59178305A (en) | 1983-03-28 | 1983-03-28 | Surface smoothness measuring apparatus |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS59178305A (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02271211A (en) * | 1989-04-13 | 1990-11-06 | Nissan Motor Co Ltd | Evaluating method of painting sharpness |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5897608A (en) * | 1981-12-05 | 1983-06-10 | Nippon Paint Co Ltd | Method and device for surface property |
-
1983
- 1983-03-28 JP JP5313783A patent/JPS59178305A/en active Granted
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5897608A (en) * | 1981-12-05 | 1983-06-10 | Nippon Paint Co Ltd | Method and device for surface property |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS59178305A (en) | 1984-10-09 |
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