JPH0321988Y2 - - Google Patents

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Publication number
JPH0321988Y2
JPH0321988Y2 JP1982032151U JP3215182U JPH0321988Y2 JP H0321988 Y2 JPH0321988 Y2 JP H0321988Y2 JP 1982032151 U JP1982032151 U JP 1982032151U JP 3215182 U JP3215182 U JP 3215182U JP H0321988 Y2 JPH0321988 Y2 JP H0321988Y2
Authority
JP
Japan
Prior art keywords
thin film
card
metal thin
melting point
low melting
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP1982032151U
Other languages
Japanese (ja)
Other versions
JPS58136369U (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP3215182U priority Critical patent/JPS58136369U/en
Publication of JPS58136369U publication Critical patent/JPS58136369U/en
Application granted granted Critical
Publication of JPH0321988Y2 publication Critical patent/JPH0321988Y2/ja
Granted legal-status Critical Current

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Description

【考案の詳細な説明】 〔産業上の利用分野〕 本考案は、カードに関するものであり、更に詳
しくはレーザー記録用カードに関するものであ
る。
[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to a card, and more specifically to a laser recording card.

〔従来の技術〕[Conventional technology]

従来、カードに任意情報を記録するために光記
録材料として銀塩写真、ジアゾ写真、フリーラジ
カル写真等の材料を応用することが試みられてい
る。かかる記録材料を用いて任意情報を記録した
後、通常は透明プラスチツクフイルムを用いて被
覆しており、単なる保護のみならず偽造防止をも
兼ねている。特にカードが銀行キヤツシユカー
ド、身分証明証、クレジツトカード、機密を要す
る場所への入出をチエツクするための入門カード
等のIDカードにおいては偽造防止は非常に重要
である。
Conventionally, attempts have been made to apply materials such as silver halide photography, diazo photography, and free radical photography as optical recording materials in order to record arbitrary information on cards. After arbitrary information is recorded using such a recording material, it is usually covered with a transparent plastic film, which serves not only for mere protection but also for prevention of forgery. Preventing counterfeiting is particularly important for ID cards such as bank cash cards, identification cards, credit cards, and introductory cards for checking access to sensitive areas.

〔考案が解決しようとする課題〕[The problem that the idea aims to solve]

しかしながら上記従来のカードにおいては、現
像処理が必要な上、現像後に透明プラスチツクフ
イルムを用いて被覆する煩雑さが避けられず、
又、記録前に透明プラスチツクフイルムを被覆す
ると記録及び現像が困難になり、なおかつ、一旦
任意情報を記録したカードはその表面の透明プラ
スチツクフイルムを取り除く事は非常に面倒であ
つても不可能と言う程のものではなく、従つて偽
装防止は完全ではない等の欠点が免れ得ないもの
である。
However, the above-mentioned conventional cards require development processing, and the complexity of covering them with a transparent plastic film after development is unavoidable.
Furthermore, if the card is covered with a transparent plastic film before recording, it becomes difficult to record and develop the card, and furthermore, once arbitrary information has been recorded on the card, it is extremely troublesome and impossible to remove the transparent plastic film on the surface of the card. Therefore, the prevention of counterfeiting is not perfect, and other disadvantages cannot be avoided.

〔課題を解決するための手段〕[Means to solve the problem]

本考案者は、上記の問題点を解決せんがため各
種の材料を検討した結果、レーザー記録材料を予
め、透明プラスチツクフイルム等で被覆しておい
ても、機能性能を損なわず、しかも偽造を試みて
プラスチツクフイルムを剥がそうとすると記録層
そのものが損なわれ、偽造が不可能であることを
見出し、本考案に到達したものであつて、即ち、
本考案はカード基材表面に厚み100〜1000Åの低
融点金属薄膜層が設けられており、更に該金属薄
膜層表面には厚み10〜2000μmの透明合成樹脂保
護層が積層されていることを特徴とするものであ
る。
As a result of examining various materials to solve the above problems, the inventor of the present invention discovered that even if the laser recording material is coated with a transparent plastic film etc. in advance, the functional performance will not be impaired, and furthermore, in an attempt to counterfeit it. They discovered that if they tried to remove the plastic film, the recording layer itself would be damaged, making counterfeiting impossible.
The present invention is characterized in that a low melting point metal thin film layer with a thickness of 100 to 1000 Å is provided on the surface of the card base material, and a transparent synthetic resin protective layer with a thickness of 10 to 2000 μm is further laminated on the surface of the metal thin film layer. That is.

〔作用〕[Effect]

本考案のカードは、基材表面に厚み100〜1000
Åの低融点金属薄膜層が設けられており、更に低
融点金属薄膜層表面には厚み10〜2000μmの透明
合成樹脂保護層が積層されているので、低融点金
属薄膜層を予め、透明合成樹脂保護層で被覆して
おいても、機能性能を損なわず、しかも偽造を試
みて透明合成樹脂保護層を剥がそうとすると記録
層である低融点金属薄膜層そのものが損なわれ、
偽造が不可能である。また低融点金属薄膜層の厚
みが100〜1000Åに限定されているので、レーザ
ー記録後の読取りが容易であり、更に透明合成樹
脂保護層の厚みが10〜2000μmに限定されている
ので、透明合成樹脂保護層の上からのレーザー記
録を可能にすることができる。
The card of this invention has a thickness of 100 to 1000 on the surface of the base material.
A low melting point metal thin film layer with a thickness of 100 μm is provided, and a transparent synthetic resin protective layer with a thickness of 10 to 2000 μm is laminated on the surface of the low melting point metal thin film layer. Even if it is coated with a protective layer, its functional performance will not be impaired, and if an attempt is made to forgery and the transparent synthetic resin protective layer is removed, the low melting point metal thin film layer itself, which is the recording layer, will be damaged.
Impossible to counterfeit. In addition, since the thickness of the low melting point metal thin film layer is limited to 100 to 1000 Å, it is easy to read after laser recording, and furthermore, the thickness of the transparent synthetic resin protective layer is limited to 10 to 2000 μm, so transparent synthetic resin Laser recording from above the resin protective layer can be made possible.

〔実施例〕〔Example〕

以下、図面を用いて本考案を更に詳しく説明す
ると、第1図は本考案のカードの一実施例の構成
を示す断面図である。第1図に示すカード1はカ
ード基材2の表面に低融点金属薄膜層3を有し、
更に低融点金属薄膜層3を有する基材の全面に透
明合成樹脂保護層4を有している。
Hereinafter, the present invention will be explained in more detail with reference to the drawings. FIG. 1 is a sectional view showing the structure of an embodiment of the card of the present invention. A card 1 shown in FIG. 1 has a low melting point metal thin film layer 3 on the surface of a card base material 2,
Further, a transparent synthetic resin protective layer 4 is provided on the entire surface of the base material having the low melting point metal thin film layer 3.

第2図は低融点金属薄膜層3をカード基材2の
全面に設けたカード5を示す断面図である。
FIG. 2 is a sectional view showing a card 5 in which a low melting point metal thin film layer 3 is provided on the entire surface of the card base material 2.

第3図は本考案の使用状態を示す正面図であつ
てカード6に低融点金属薄膜層3及び記録7を有
するものである。又、第3図は正面図であるので
明らかでないが、カード6の全面に透明合成樹脂
保護層を有する。カードにはこの他第3図に示す
ように磁気記録層8や写真、彫刻による画像9を
有してもよく、更に図示しないが、その他の文字
やインクプリントと称される浮出し文字等を設け
ても差し支えない。
FIG. 3 is a front view showing the state of use of the present invention, in which a card 6 has a low melting point metal thin film layer 3 and a record 7. Although it is not clear since FIG. 3 is a front view, the entire surface of the card 6 has a transparent synthetic resin protective layer. In addition, the card may have a magnetic recording layer 8 and a photographic or engraved image 9 as shown in FIG. There is no problem in setting it up.

第4図は第3図に用いたカードの記録前の状態
を示す。
FIG. 4 shows the state of the card used in FIG. 3 before recording.

以上のような構造のカードの各構成及び製造法
について以下説明する。
Each structure and manufacturing method of the card having the above structure will be explained below.

カード基材としては剛性を有し、かつ、熱融着
や各種の印刷等の加工に適したものであればいず
れでもよいが、通常、塩化ビニル樹脂、塩化ビニ
ル−酢酸ビニル共重合樹脂、塩化ビニリデン樹
脂、アクリル樹脂、スチレン樹脂、ビニルブチラ
ール樹脂、アセチルセルロース樹脂、スチレン−
ブタジエン共重合樹脂、ポリエチレン樹脂、フツ
素樹脂等の合成樹脂が使用でき、なかでも塩化ビ
ニル樹脂が加工の容易さの点で用いられる。この
他、紙、金属箔等、及び以上の各材料の複合体も
使用しうる。
Any card base material may be used as long as it has rigidity and is suitable for processing such as heat fusion and various types of printing, but usually vinyl chloride resin, vinyl chloride-vinyl acetate copolymer resin, chloride resin, etc. Vinylidene resin, acrylic resin, styrene resin, vinyl butyral resin, acetyl cellulose resin, styrene
Synthetic resins such as butadiene copolymer resin, polyethylene resin, and fluororesin can be used, and among them, vinyl chloride resin is used because of its ease of processing. In addition, paper, metal foil, etc., and composites of the above materials may also be used.

以上のカード基材に低融点金属薄膜層を設け
る。
A low melting point metal thin film layer is provided on the above card base material.

低融点金属薄膜層を構成する金属としては、
Te,Bi,In,Sn,Zn,Pb,Ge,Ga,Rh,Alな
どが使用でき、なかでもTe,Bi,Sn,In等の低
融点金属は記録に必要なエネルギー密度が少なく
ても記録でき好ましい。なお、上記の金属は単独
若しくは2種以上混合して用いてもよい。以上の
金属を用いて低融点金属薄膜層を形成するには真
空蒸着、スパツタリング、イオンプレーテイン
グ、プラズマ蒸着、電気めつき、無電解めつき等
の公知の方法により行える。
The metals constituting the low melting point metal thin film layer include:
Te, Bi, In, Sn, Zn, Pb, Ge, Ga, Rh, Al, etc. can be used, and among them, low melting point metals such as Te, Bi, Sn, and In can be used for recording even if the energy density required for recording is low. It's good to be able to do it. Note that the above metals may be used alone or in combination of two or more. A low melting point metal thin film layer using the above metals can be formed by known methods such as vacuum evaporation, sputtering, ion plating, plasma evaporation, electroplating, and electroless plating.

低融点金属薄膜層の厚みは100〜1000Å、好ま
しくは200〜500Åである。前記において100Å未
満では、レーザー光照射による記録部分と未記録
部分との光学濃度の差が極度に小さくなつて読取
りが困難となり、1000Åを越えると記録エネルギ
ー閾値も高くなり、記録部分のピツト形状が悪く
なり読取りが困難となり好ましくない。なお、以
上のようにして低融点金属薄膜層を設ける際にカ
ード基材の所望の部分にのみ設けたいときは適宜
なマスクを用いるとよい。
The thickness of the low melting point metal thin film layer is 100 to 1000 Å, preferably 200 to 500 Å. In the above, below 100 Å, the difference in optical density between the recorded area and the unrecorded area due to laser beam irradiation becomes extremely small, making it difficult to read, and when it exceeds 1000 Å, the recording energy threshold also becomes high and the pit shape of the recorded area changes. This is not desirable as it becomes difficult to read. Incidentally, when providing the low melting point metal thin film layer as described above, if it is desired to provide it only on a desired portion of the card base material, an appropriate mask may be used.

次に、低融点金属薄膜層の上に透明合成樹脂保
護層を設ける。
Next, a transparent synthetic resin protective layer is provided on the low melting point metal thin film layer.

透明合成樹脂保護層の厚みとしては10〜2000μ
m、好ましくは200〜1500μmである。10μm未満
では保護層としての強度に不足であり、また、
2000μmを越えるとレーザー光が低融点金属薄膜
層に到達しがたくなり、好ましくない。また、特
に1000〜1500μmでは透明合成樹脂保護膜の表面
に付着した指紋やゴミなどによるレーザー光への
妨害を免れる効果がある。
The thickness of the transparent synthetic resin protective layer is 10 to 2000μ.
m, preferably 200 to 1500 μm. If the thickness is less than 10 μm, the strength as a protective layer is insufficient, and
If it exceeds 2000 μm, it becomes difficult for the laser beam to reach the low melting point metal thin film layer, which is not preferable. In addition, especially in the range of 1000 to 1500 μm, there is an effect of avoiding interference with the laser light due to fingerprints, dust, etc. attached to the surface of the transparent synthetic resin protective film.

透明合成樹脂保護層は本考案では低融点金属薄
膜層の保護及び透明合成樹脂保護層の上からのレ
ーザー記録を主眼とするので低融点金属薄膜層の
表面のみを覆えばこと足りるが、通常のカードで
は全面に設けるため、本考案においても全面に設
けても差し支えない。透明合成樹脂保護層は公知
の透明合成樹脂塗料を用いて塗布、印刷して乾燥
するか、または透明合成樹脂フイルム若しくは透
明合成樹脂板を接着若しくは熱融着することによ
り設けることができる。透明合成樹脂フイルム若
しくは板としては、カード基材として前記した合
成樹脂のフイルム若しくはシートを用いることが
でき、熱融着の条件は、100〜300℃、40〜400
Kg/cm2である。
In the present invention, the transparent synthetic resin protective layer focuses on protecting the low melting point metal thin film layer and laser recording from above the transparent synthetic resin protective layer, so it is sufficient to cover only the surface of the low melting point metal thin film layer. Since it is provided on the entire surface, it may be provided on the entire surface in the present invention as well. The transparent synthetic resin protective layer can be provided by applying, printing and drying using a known transparent synthetic resin paint, or by gluing or heat-sealing a transparent synthetic resin film or a transparent synthetic resin plate. As the transparent synthetic resin film or plate, the synthetic resin film or sheet described above as the card base material can be used, and the heat fusion conditions are 100 to 300°C, 40 to 400°C.
Kg/ cm2 .

なお基材上に低融点金属薄膜層及び透明合成樹
脂保護層を部分的に設けるには、以上の説明とは
逆に透明合成樹脂保護層上に予め低融点金属薄膜
層を設けておき、接着剤を介してカード基材に貼
付する熱融着する、或いは更に剥離性基体に透明
合成樹脂保護層及び低融点金属薄膜層を設け、更
に所望により接着剤を塗布しておいてカード基材
上に転写する等の方法によつてもよい。
Note that in order to partially provide a low melting point metal thin film layer and a transparent synthetic resin protective layer on a base material, contrary to the above explanation, a low melting point metal thin film layer is previously provided on the transparent synthetic resin protective layer, and adhesive A transparent synthetic resin protective layer and a low melting point metal thin film layer are provided on a removable substrate, and an adhesive is further applied as desired, and the adhesive is applied to the card substrate. It is also possible to use a method such as transferring the image to a computer.

本考案のカードの記録はレーザービーム等によ
り行える。
Recording on the card of the present invention can be performed using a laser beam or the like.

具体例 厚み0.4mmの白色の塩化ビニル樹脂シートの表
面にTeを厚み500Åになるように蒸着した。更に
蒸着面に厚み0.4mmの透明塩化ビニルシートを重
ね合わせた後、プレス機を用いて150℃、120Kg/
cm2の条件で30分間加熱・加圧して一体化させ、裁
断してカード状とした。
Specific Example: Te was deposited to a thickness of 500 Å on the surface of a white vinyl chloride resin sheet with a thickness of 0.4 mm. Furthermore, after superimposing a transparent vinyl chloride sheet with a thickness of 0.4 mm on the vapor deposition surface, using a press machine, it was heated at 150℃ and 120Kg/
They were heated and pressurized for 30 minutes under conditions of cm 2 to integrate them, and then cut into cards.

得られたカードの透明シート側からHe−Neレ
ーザー(2mW)を集光し100msecのパルス光を
変調して照射したところ10μの径のスポツトが生
じており、以上のようにして記録したカードの記
録部に0.5mWのHe−Neレーザーを集光させ、そ
の反射光をビームスプリツターを介してフオトダ
イオードーで読みとることができた。
When a He-Ne laser (2mW) was focused from the transparent sheet side of the obtained card and a 100msec pulsed light was modulated and irradiated, a spot with a diameter of 10μ was generated. A 0.5mW He-Ne laser was focused on the recording section, and the reflected light could be read by a photodiode via a beam splitter.

又、以上のようなカードの透明シートのみを剥
がそうとしたところ、Teの蒸着層が破壊されて
しまい偽造は不可能であつた。
Furthermore, when attempting to peel off only the transparent sheet of such a card, the Te vapor-deposited layer was destroyed, making counterfeiting impossible.

〔考案の効果〕[Effect of idea]

本考案のカードは、基材表面に厚み100〜1000
Åの低融点金属薄膜層が設けられており、更に低
融点金属薄膜層表面には厚み10〜2000μmの透明
合成樹脂保護層が積層されているので、低融点金
属薄膜層を予め、透明合成樹脂保護層で被覆して
おいても、機能性能を損なわず、しかも偽造を試
みて透明合成樹脂保護層を剥がそうとすると記録
層である低融点金属薄膜層そのものが損なわれ、
偽造が不可能である。また低融点金属薄膜層の厚
みが100〜1000Åに限定されているので、レーザ
ー記録後の読取りが容易であり、更に透明合成樹
脂保護層の厚みが10〜2000μmに限定されている
ので、透明合成樹脂保護層の上からのレーザー記
録を可能にすることができる。
The card of this invention has a thickness of 100 to 1000 on the surface of the base material.
A low melting point metal thin film layer with a thickness of 100 μm is provided, and a transparent synthetic resin protective layer with a thickness of 10 to 2000 μm is laminated on the surface of the low melting point metal thin film layer. Even if it is coated with a protective layer, its functional performance will not be impaired, and if an attempt is made to forgery and the transparent synthetic resin protective layer is removed, the low melting point metal thin film layer itself, which is the recording layer, will be damaged.
Impossible to counterfeit. In addition, since the thickness of the low melting point metal thin film layer is limited to 100 to 1000 Å, it is easy to read after laser recording, and furthermore, the thickness of the transparent synthetic resin protective layer is limited to 10 to 2000 μm, so transparent synthetic resin Laser recording from above the resin protective layer can be made possible.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図及び第2図は本考案のカードの一実施例
の断面図、第3図は本考案の実施態様を示す正面
図、第4図は第3図のカードの記録前の状態を示
す正面図である。 1……カード、2……カード基材、3……低融
点金属薄膜層、4……透明合成樹脂保護層、7…
…記録。
1 and 2 are cross-sectional views of an embodiment of the card of the present invention, FIG. 3 is a front view showing an embodiment of the present invention, and FIG. 4 is a state of the card of FIG. 3 before recording. It is a front view. DESCRIPTION OF SYMBOLS 1...Card, 2...Card base material, 3...Low melting point metal thin film layer, 4...Transparent synthetic resin protective layer, 7...
…record.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] カード基材表面に厚み100〜1000Åの低融点金
属薄膜層が設けられており、更に該金属薄膜層表
面には厚み10〜2000μmの透明合成樹脂保護層が
積層されていることを特徴とするレーザー記録用
カード。
A laser characterized in that a low melting point metal thin film layer with a thickness of 100 to 1000 Å is provided on the surface of the card base material, and a transparent synthetic resin protective layer with a thickness of 10 to 2000 μm is further laminated on the surface of the metal thin film layer. Recording card.
JP3215182U 1982-03-08 1982-03-08 card Granted JPS58136369U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3215182U JPS58136369U (en) 1982-03-08 1982-03-08 card

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3215182U JPS58136369U (en) 1982-03-08 1982-03-08 card

Publications (2)

Publication Number Publication Date
JPS58136369U JPS58136369U (en) 1983-09-13
JPH0321988Y2 true JPH0321988Y2 (en) 1991-05-14

Family

ID=30043784

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3215182U Granted JPS58136369U (en) 1982-03-08 1982-03-08 card

Country Status (1)

Country Link
JP (1) JPS58136369U (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07107756B2 (en) * 1987-02-12 1995-11-15 凸版印刷株式会社 Light card
JPH0737187B2 (en) * 1988-06-16 1995-04-26 本州製紙株式会社 Thermal recording

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5623798Y2 (en) * 1976-10-21 1981-06-04
JPS5470399U (en) * 1977-10-28 1979-05-18

Also Published As

Publication number Publication date
JPS58136369U (en) 1983-09-13

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