JPH0321349A - Heating thermostatic tank - Google Patents

Heating thermostatic tank

Info

Publication number
JPH0321349A
JPH0321349A JP15772689A JP15772689A JPH0321349A JP H0321349 A JPH0321349 A JP H0321349A JP 15772689 A JP15772689 A JP 15772689A JP 15772689 A JP15772689 A JP 15772689A JP H0321349 A JPH0321349 A JP H0321349A
Authority
JP
Japan
Prior art keywords
chemical solution
tank
constant temperature
bath
nitrogen
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP15772689A
Other languages
Japanese (ja)
Other versions
JP2845492B2 (en
Inventor
Seiichi Kumagai
誠一 熊谷
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Kyushu Ltd
Original Assignee
NEC Kyushu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Kyushu Ltd filed Critical NEC Kyushu Ltd
Priority to JP15772689A priority Critical patent/JP2845492B2/en
Publication of JPH0321349A publication Critical patent/JPH0321349A/en
Application granted granted Critical
Publication of JP2845492B2 publication Critical patent/JP2845492B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Landscapes

  • Devices For Use In Laboratory Experiments (AREA)
  • Feeding, Discharge, Calcimining, Fusing, And Gas-Generation Devices (AREA)
  • Weting (AREA)
  • Cleaning Or Drying Semiconductors (AREA)

Abstract

PURPOSE:To uniformize the temp. of a chemical solution by supplying nitrogen in the chemical solution from the gas feed pipe inserted in a heating thermostatic tank from the upper surface thereof to stirr the chemical solution in the tank. CONSTITUTION:A chemical solution is supplied in a heating thermostatic tank 1 and heated by the heater 3 inserted in the tank 1 from the upper surface thereof to be controlled to constant temp. and subsequently sent out through a liquid feed port 6. At this time, a gas feed pipe 5 is inserted in the tank 1 and nitrogen is supplied by the gas feed pipe 5 to perform the stirring of the chemical solution. As a result, the temp. of the chemical solution can be made uniform.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は半導体基板の液処理を行うために高温の薬液又
は純水を供給する加熱恒温槽に関する.〔従来の技術〕 従来、この種の加熱恒温槽は、加熱手段として槽の上面
より液中にヒーターを挿入してあるだけなので、内部の
薬液又は純水の熱対流が生じにくい構造となっていた. 〔発明が解決しようとする課題〕 上述した従来の加熱恒温槽は、槽の上面より挿入したヒ
ーターの表面に沿って、加熱された薬液又は純水が上昇
し、液面に滞留するため槽底部に熱が伝わりに<<、薬
液又は純水の温度を均一に制御できないという欠点があ
る. 〔課題を解決するための手段〕 本発明は、槽内に薬液を供給し、ヒーターにより加熱し
て一定温度に制御された前記薬液を送り出す加熱恒温槽
において、窒素を供給して薬液の撹拌を行なう送気管が
前記槽の内部に挿入されている加熱恒温槽である。
DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a heating constant temperature bath that supplies high temperature chemical solution or pure water for liquid processing of semiconductor substrates. [Prior art] Conventionally, this type of thermostatic chamber has a structure in which thermal convection of the internal chemical solution or pure water is difficult to occur because the heating means is simply a heater inserted into the liquid from the top of the bath. Ta. [Problems to be Solved by the Invention] In the conventional heating constant temperature bath described above, the heated chemical solution or pure water rises along the surface of the heater inserted from the top of the bath and stays on the liquid surface, so that the heated chemical solution or pure water rises at the bottom of the bath. The disadvantage is that the temperature of the chemical solution or pure water cannot be controlled uniformly because the heat is transferred to the liquid. [Means for Solving the Problems] The present invention provides a method for stirring the chemical solution by supplying nitrogen in a constant temperature heating tank that supplies a chemical solution into the tank and sends out the chemical solution that is heated by a heater and controlled to a constant temperature. This is a heating constant temperature bath in which an air pipe for carrying out the test is inserted inside the bath.

〔実施例〕〔Example〕

次に、本発明について図面を参照して説明する.第1゛
図は本発明の第1の実施例の系統図である. 加熱恒温槽1に給液口2より薬液を投入し、一定量貯め
た後、ヒーター3を温度検出器4にて設定温度に制御す
る.この時、送気管5より窒素を供給し、内部の薬液を
撹拌して薬液の温度を均一にし、送液口6より供給する
. 送気管5は、加熱恒温槽1の上面より槽内底部付近まで
配管し、窒素等の不活性気体を常時一定量供給し、配管
先端より送り出される気泡の上昇によって生ずる薬液又
は純水の昇降流により撹拌を行う. 第2図は本発明の第2の実施例の系統図である. 加熱恒温槽1に給液口2より薬液を投入し、定量貯めた
後、ヒーター3を温度検出器4にて設定温度に制御する
.この時送気管5より窒素を供給し、回転翼7の自転力
に変換する事により、内部の薬液を撹拌して薬液の温度
を均一にし、送液口6より供給する. この実施例では、窒素の気泡による撹拌に加え、回転翼
7による撹拌機構を備えているため、相乗効果により、
更に均一な温度分布が得られる利点がある. 〔発明の効果〕 以上説明したように本発明は、加熱恒温槽上面より挿入
した送気管より窒素を供給し、内部の薬液又は純水を撹
拌することにより、薬液又は純水の温度を均一にできる
効果がある.
Next, the present invention will be explained with reference to the drawings. Figure 1 is a system diagram of the first embodiment of the present invention. A chemical solution is introduced into a heating constant temperature bath 1 through a liquid supply port 2, and after a certain amount has been stored, a heater 3 is controlled to a set temperature using a temperature detector 4. At this time, nitrogen is supplied from the air supply pipe 5, the chemical solution inside is stirred to make the temperature of the chemical solution uniform, and then nitrogen is supplied from the liquid supply port 6. The air supply pipe 5 is piped from the top surface of the heating constant temperature bath 1 to near the bottom of the bath, and constantly supplies a constant amount of inert gas such as nitrogen, and the rising and falling flow of chemical liquid or pure water is generated by the rise of air bubbles sent out from the tip of the pipe. Stir by stirring. FIG. 2 is a system diagram of the second embodiment of the present invention. A chemical solution is introduced into a heating constant temperature bath 1 through a liquid supply port 2, and after a fixed amount is stored, a heater 3 is controlled to a set temperature using a temperature detector 4. At this time, nitrogen is supplied from the air supply pipe 5 and converted into the rotational force of the rotary blade 7, thereby stirring the internal chemical solution to make the temperature of the solution uniform, and then supplying it from the liquid supply port 6. In this embodiment, in addition to the stirring mechanism using nitrogen bubbles, a stirring mechanism using rotary blades 7 is provided, so the synergistic effect allows
Another advantage is that a uniform temperature distribution can be obtained. [Effects of the Invention] As explained above, the present invention supplies nitrogen from the air pipe inserted from the top surface of the heating constant temperature chamber and stirs the chemical solution or pure water inside, thereby making the temperature of the chemical solution or pure water uniform. There is an effect that can be achieved.

【図面の簡単な説明】 第1図は本発明の第1の実施例の加熱恒温槽の系統図、
第2図は本発明の第2の実施例の系統図である. 1・・・加熱恒温槽、2・・・給液口、3・・・ヒータ
ー4・・・温度検出器、5・・・送気管、6・・・送液
口、7・・・回転翼.
[BRIEF DESCRIPTION OF THE DRAWINGS] FIG. 1 is a system diagram of a heating constant temperature oven according to the first embodiment of the present invention;
FIG. 2 is a system diagram of the second embodiment of the present invention. 1...Heating constant temperature bath, 2...Liquid supply port, 3...Heater 4...Temperature detector, 5...Air supply pipe, 6...Liquid supply port, 7...Rotary blade ..

Claims (1)

【特許請求の範囲】[Claims] 槽内に薬液を供給し、ヒーターにより加熱して一定温度
に制御された前記薬液を送り出す加熱恒温槽において、
窒素を供給して薬液の撹拌を行なう送気管が前記槽の内
部に挿入されていることを特徴とする加熱恒温槽。
In a heating constant temperature tank that supplies a chemical solution into the tank and sends out the chemical solution that is heated by a heater and controlled to a constant temperature,
1. A heating constant temperature bath, characterized in that an air supply pipe for supplying nitrogen and stirring a chemical solution is inserted inside the bath.
JP15772689A 1989-06-19 1989-06-19 Heating oven Expired - Lifetime JP2845492B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15772689A JP2845492B2 (en) 1989-06-19 1989-06-19 Heating oven

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15772689A JP2845492B2 (en) 1989-06-19 1989-06-19 Heating oven

Publications (2)

Publication Number Publication Date
JPH0321349A true JPH0321349A (en) 1991-01-30
JP2845492B2 JP2845492B2 (en) 1999-01-13

Family

ID=15656025

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15772689A Expired - Lifetime JP2845492B2 (en) 1989-06-19 1989-06-19 Heating oven

Country Status (1)

Country Link
JP (1) JP2845492B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0681679U (en) * 1993-04-28 1994-11-22 株式会社カイジョー Indirect heating type steam cleaning device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0681679U (en) * 1993-04-28 1994-11-22 株式会社カイジョー Indirect heating type steam cleaning device

Also Published As

Publication number Publication date
JP2845492B2 (en) 1999-01-13

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