JPH0321349A - Heating thermostatic tank - Google Patents
Heating thermostatic tankInfo
- Publication number
- JPH0321349A JPH0321349A JP15772689A JP15772689A JPH0321349A JP H0321349 A JPH0321349 A JP H0321349A JP 15772689 A JP15772689 A JP 15772689A JP 15772689 A JP15772689 A JP 15772689A JP H0321349 A JPH0321349 A JP H0321349A
- Authority
- JP
- Japan
- Prior art keywords
- chemical solution
- tank
- constant temperature
- bath
- nitrogen
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000010438 heat treatment Methods 0.000 title claims abstract description 16
- 239000000126 substance Substances 0.000 claims abstract description 25
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims abstract description 20
- 229910052757 nitrogen Inorganic materials 0.000 claims abstract description 10
- 238000003756 stirring Methods 0.000 claims abstract description 9
- 239000007788 liquid Substances 0.000 abstract description 12
- 239000007789 gas Substances 0.000 abstract 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 8
- 238000010586 diagram Methods 0.000 description 4
- 230000000694 effects Effects 0.000 description 2
- 239000011261 inert gas Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 230000002195 synergetic effect Effects 0.000 description 1
Landscapes
- Devices For Use In Laboratory Experiments (AREA)
- Feeding, Discharge, Calcimining, Fusing, And Gas-Generation Devices (AREA)
- Weting (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は半導体基板の液処理を行うために高温の薬液又
は純水を供給する加熱恒温槽に関する.〔従来の技術〕
従来、この種の加熱恒温槽は、加熱手段として槽の上面
より液中にヒーターを挿入してあるだけなので、内部の
薬液又は純水の熱対流が生じにくい構造となっていた.
〔発明が解決しようとする課題〕
上述した従来の加熱恒温槽は、槽の上面より挿入したヒ
ーターの表面に沿って、加熱された薬液又は純水が上昇
し、液面に滞留するため槽底部に熱が伝わりに<<、薬
液又は純水の温度を均一に制御できないという欠点があ
る.
〔課題を解決するための手段〕
本発明は、槽内に薬液を供給し、ヒーターにより加熱し
て一定温度に制御された前記薬液を送り出す加熱恒温槽
において、窒素を供給して薬液の撹拌を行なう送気管が
前記槽の内部に挿入されている加熱恒温槽である。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a heating constant temperature bath that supplies high temperature chemical solution or pure water for liquid processing of semiconductor substrates. [Prior art] Conventionally, this type of thermostatic chamber has a structure in which thermal convection of the internal chemical solution or pure water is difficult to occur because the heating means is simply a heater inserted into the liquid from the top of the bath. Ta. [Problems to be Solved by the Invention] In the conventional heating constant temperature bath described above, the heated chemical solution or pure water rises along the surface of the heater inserted from the top of the bath and stays on the liquid surface, so that the heated chemical solution or pure water rises at the bottom of the bath. The disadvantage is that the temperature of the chemical solution or pure water cannot be controlled uniformly because the heat is transferred to the liquid. [Means for Solving the Problems] The present invention provides a method for stirring the chemical solution by supplying nitrogen in a constant temperature heating tank that supplies a chemical solution into the tank and sends out the chemical solution that is heated by a heater and controlled to a constant temperature. This is a heating constant temperature bath in which an air pipe for carrying out the test is inserted inside the bath.
次に、本発明について図面を参照して説明する.第1゛
図は本発明の第1の実施例の系統図である.
加熱恒温槽1に給液口2より薬液を投入し、一定量貯め
た後、ヒーター3を温度検出器4にて設定温度に制御す
る.この時、送気管5より窒素を供給し、内部の薬液を
撹拌して薬液の温度を均一にし、送液口6より供給する
.
送気管5は、加熱恒温槽1の上面より槽内底部付近まで
配管し、窒素等の不活性気体を常時一定量供給し、配管
先端より送り出される気泡の上昇によって生ずる薬液又
は純水の昇降流により撹拌を行う.
第2図は本発明の第2の実施例の系統図である.
加熱恒温槽1に給液口2より薬液を投入し、定量貯めた
後、ヒーター3を温度検出器4にて設定温度に制御する
.この時送気管5より窒素を供給し、回転翼7の自転力
に変換する事により、内部の薬液を撹拌して薬液の温度
を均一にし、送液口6より供給する.
この実施例では、窒素の気泡による撹拌に加え、回転翼
7による撹拌機構を備えているため、相乗効果により、
更に均一な温度分布が得られる利点がある.
〔発明の効果〕
以上説明したように本発明は、加熱恒温槽上面より挿入
した送気管より窒素を供給し、内部の薬液又は純水を撹
拌することにより、薬液又は純水の温度を均一にできる
効果がある.Next, the present invention will be explained with reference to the drawings. Figure 1 is a system diagram of the first embodiment of the present invention. A chemical solution is introduced into a heating constant temperature bath 1 through a liquid supply port 2, and after a certain amount has been stored, a heater 3 is controlled to a set temperature using a temperature detector 4. At this time, nitrogen is supplied from the air supply pipe 5, the chemical solution inside is stirred to make the temperature of the chemical solution uniform, and then nitrogen is supplied from the liquid supply port 6. The air supply pipe 5 is piped from the top surface of the heating constant temperature bath 1 to near the bottom of the bath, and constantly supplies a constant amount of inert gas such as nitrogen, and the rising and falling flow of chemical liquid or pure water is generated by the rise of air bubbles sent out from the tip of the pipe. Stir by stirring. FIG. 2 is a system diagram of the second embodiment of the present invention. A chemical solution is introduced into a heating constant temperature bath 1 through a liquid supply port 2, and after a fixed amount is stored, a heater 3 is controlled to a set temperature using a temperature detector 4. At this time, nitrogen is supplied from the air supply pipe 5 and converted into the rotational force of the rotary blade 7, thereby stirring the internal chemical solution to make the temperature of the solution uniform, and then supplying it from the liquid supply port 6. In this embodiment, in addition to the stirring mechanism using nitrogen bubbles, a stirring mechanism using rotary blades 7 is provided, so the synergistic effect allows
Another advantage is that a uniform temperature distribution can be obtained. [Effects of the Invention] As explained above, the present invention supplies nitrogen from the air pipe inserted from the top surface of the heating constant temperature chamber and stirs the chemical solution or pure water inside, thereby making the temperature of the chemical solution or pure water uniform. There is an effect that can be achieved.
【図面の簡単な説明】
第1図は本発明の第1の実施例の加熱恒温槽の系統図、
第2図は本発明の第2の実施例の系統図である.
1・・・加熱恒温槽、2・・・給液口、3・・・ヒータ
ー4・・・温度検出器、5・・・送気管、6・・・送液
口、7・・・回転翼.[BRIEF DESCRIPTION OF THE DRAWINGS] FIG. 1 is a system diagram of a heating constant temperature oven according to the first embodiment of the present invention;
FIG. 2 is a system diagram of the second embodiment of the present invention. 1...Heating constant temperature bath, 2...Liquid supply port, 3...Heater 4...Temperature detector, 5...Air supply pipe, 6...Liquid supply port, 7...Rotary blade ..
Claims (1)
に制御された前記薬液を送り出す加熱恒温槽において、
窒素を供給して薬液の撹拌を行なう送気管が前記槽の内
部に挿入されていることを特徴とする加熱恒温槽。In a heating constant temperature tank that supplies a chemical solution into the tank and sends out the chemical solution that is heated by a heater and controlled to a constant temperature,
1. A heating constant temperature bath, characterized in that an air supply pipe for supplying nitrogen and stirring a chemical solution is inserted inside the bath.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15772689A JP2845492B2 (en) | 1989-06-19 | 1989-06-19 | Heating oven |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15772689A JP2845492B2 (en) | 1989-06-19 | 1989-06-19 | Heating oven |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH0321349A true JPH0321349A (en) | 1991-01-30 |
JP2845492B2 JP2845492B2 (en) | 1999-01-13 |
Family
ID=15656025
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP15772689A Expired - Lifetime JP2845492B2 (en) | 1989-06-19 | 1989-06-19 | Heating oven |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2845492B2 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0681679U (en) * | 1993-04-28 | 1994-11-22 | 株式会社カイジョー | Indirect heating type steam cleaning device |
-
1989
- 1989-06-19 JP JP15772689A patent/JP2845492B2/en not_active Expired - Lifetime
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0681679U (en) * | 1993-04-28 | 1994-11-22 | 株式会社カイジョー | Indirect heating type steam cleaning device |
Also Published As
Publication number | Publication date |
---|---|
JP2845492B2 (en) | 1999-01-13 |
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