JPH03211857A - Container for semiconductor wafer cassette - Google Patents

Container for semiconductor wafer cassette

Info

Publication number
JPH03211857A
JPH03211857A JP2007534A JP753490A JPH03211857A JP H03211857 A JPH03211857 A JP H03211857A JP 2007534 A JP2007534 A JP 2007534A JP 753490 A JP753490 A JP 753490A JP H03211857 A JPH03211857 A JP H03211857A
Authority
JP
Japan
Prior art keywords
storage container
container
pressure
semiconductor wafer
outside
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2007534A
Other languages
Japanese (ja)
Inventor
Takeshi Sekiguchi
猛 関口
Tatsuto Hamada
浜田 達人
Hiroshi Harada
博司 原田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shimizu Construction Co Ltd
Shimizu Corp
Original Assignee
Shimizu Construction Co Ltd
Shimizu Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shimizu Construction Co Ltd, Shimizu Corp filed Critical Shimizu Construction Co Ltd
Priority to JP2007534A priority Critical patent/JPH03211857A/en
Publication of JPH03211857A publication Critical patent/JPH03211857A/en
Pending legal-status Critical Current

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  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)

Abstract

PURPOSE:To make adjustment so as to prevent the occurrence of a differential pressure even when a differential pressure is produced between the inside and outside of the title container by a temperature difference, etc., between the inside and outside so that no contaminated air can be sucked into the container by providing a differential pressure adjusting means which adjusts the differential pressure between the inside and outside of the container. CONSTITUTION:In the case a differential pressure is produced between the inside and outside of this semiconductor wafer cassette container 10 when the container 10 is moved with cassettes for wafer inside, the inside pressure of the container 10 is maintained at a fixed level by means of an elastic deforming section 12 which makes elastic deformation in accordance with the differential pressure. Namely, when the inside pressure becomes higher than the pressure of the outside air, the section 12 deforms outward and the volume of the container 10 increases, resulting in a reduction in the inside pressure and a balanced state between the inside and outside pressures. Therefore, entrance of the outside air into the container 10 can be prevented and the cleanliness in the container 10 can be maintained regardless of the change in the inside pressure.

Description

【発明の詳細な説明】 「産業上の利用分野」 この発明は、超LSI、IC等の半導体製造分野におい
て使用される半導体ウェハカセット収納容器に関する。
DETAILED DESCRIPTION OF THE INVENTION "Field of Industrial Application" The present invention relates to a semiconductor wafer cassette storage container used in the field of semiconductor manufacturing such as VLSI and IC.

「従来の技術」 周知のように、半導体装置の製造工程、とりわけ半導体
ウェハ上に回路素子を形成ずろ萌工程、及び製造装置相
互間のウェハの移送時において塵埃は大数であり、作業
雰囲気における清浄度がそのまま製品歩留まりに結び付
く。
``Prior Art'' As is well known, a large amount of dust is generated in the manufacturing process of semiconductor devices, especially in the process of forming circuit elements on semiconductor wafers, and during the transfer of wafers between manufacturing equipment. Cleanliness is directly linked to product yield.

この半導体ウェハカセット収納容器1は、第8図に示す
ように、箱状のケース本体2と、このケース本体2を密
閉する着脱自在な底板3と、この底板3上に収納され、
所定枚数の半導体ウェハ4・・・を格納する半導体ウェ
ハカセット収納棚部5からなっている。また、前記ケー
ス本体2の上面には携帯用の把持部6が設けられている
As shown in FIG. 8, this semiconductor wafer cassette storage container 1 includes a box-shaped case body 2, a removable bottom plate 3 that seals the case body 2, and is stored on the bottom plate 3.
It consists of a semiconductor wafer cassette storage shelf 5 that stores a predetermined number of semiconductor wafers 4 . Further, a portable grip portion 6 is provided on the upper surface of the case body 2.

半導体ウェハカセット収納容器■の底板3は、ケース本
体2に設けられたラッチ機構(図示略)により、ケース
本体2から着脱自在に構成されている。半導体ウェハカ
セット収納容器1のケース本体2及び底板3は、移送時
にはこのラッチ機構により互いに固定されているが、必
要に応じて半導体ウェハカセット収納容器1内のウェハ
収納棚5は取り外される。
The bottom plate 3 of the semiconductor wafer cassette storage container (2) is configured to be detachable from the case body 2 by a latch mechanism (not shown) provided on the case body 2. The case body 2 and bottom plate 3 of the semiconductor wafer cassette storage container 1 are fixed to each other by this latch mechanism during transportation, but the wafer storage shelf 5 in the semiconductor wafer cassette storage container 1 can be removed if necessary.

しl二がって、このSMIFノステムにおいては、半導
体ウニバカセント収納容器内での処理中や作業員による
運搬中を問わず、を導体ウェハ4は外気と遮断され、そ
の表面は清浄な空気で覆われているため、クリーンルー
ム内の清浄度がクラスl000からクラスI Q 00
00程度のものであっても、製品の高い歩留上りを維持
4゛ろことかで)ろ。
Therefore, in this SMIF Nostem, the conductor wafer 4 is isolated from the outside air and its surface is covered with clean air, regardless of whether it is being processed in the semiconductor univaccent storage container or being transported by workers. Because of this, the cleanliness inside the clean room ranges from class 1000 to class IQ 00.
Even if the product is about 0.000, it is necessary to maintain a high yield rate of the product.

I−発明か解決しようとする課題」 ところで、1iij記半導体ウニバカセント収納容器よ
、収納容2にlのケース本体2と底板3との空隙をパツ
キンによ−・て密閉しているために収納容器i内の密閉
精度に限界があり、収納容器1の内圧の変化による外気
の侵入を完全に排除することか困%tであった。このた
めに、汚れた外気によ−)て゛1!′、導体ウェハ4に
塵が付着し、半導体ウェハ4の歩留上りが邑くなるとい
う問題があった。
By the way, regarding the semiconductor univaccent storage container described in 1iii.1, the storage container is difficult because the gap between the case body 2 and the bottom plate 3 is sealed with a gasket. There is a limit to the sealing accuracy within the storage container 1, and it is difficult to completely eliminate the intrusion of outside air due to changes in the internal pressure of the storage container 1. For this reason, dirty outside air -) ゛1! ', there was a problem in that dust adhered to the conductor wafer 4 and the yield rate of the semiconductor wafer 4 decreased.

この発明は、半導体ウニバカセント用収納容器lの内圧
がいかに変化しようとも容器l内に外気の侵入を阻止4
−ることかでき、しって容器l内のi/を原皮確保を図
ることのできる半導体ウェハカセット収納容41を如何
にして実現するかを問題にしている。
This invention prevents outside air from entering the container l no matter how much the internal pressure of the storage container l for the semiconductor univaccent changes.
The problem is how to realize a semiconductor wafer cassette storage container 41 that can be used to store a semiconductor wafer cassette and that can secure the raw material inside the container l.

[−課題を解決するための手段」 この発明の第1の態様として、半導体ウェハ用カセJl
・を収納ずろ密閉可能な半導体ウエノ\カセット収納容
器であって、半導体ウニへカセット収納容?:(の内部
と、外気との差圧を調整ずろ差圧調整丁1段が設けられ
ていることを特徴としている。
[-Means for Solving the Problems] As a first aspect of the present invention, a case Jl for semiconductor wafers is provided.
・Is it a sealable semiconductor Ueno/cassette storage container that can store cassettes for semiconductor Ueno? :(It is characterized by being equipped with one stage of differential pressure adjustment stage to adjust the differential pressure between the inside of the unit and the outside air.

また、本発明の第2の態様として、半導体ウェハ用カセ
ットを収納1−ろ密閉可能な半導体ウエハカセノ)・収
納容器であって、外気と連通ずる濾過手段が、1fJt
Jられていることを特徴としている。
Further, as a second aspect of the present invention, a semiconductor wafer cassette is stored in a sealable semiconductor wafer cassette storage container, the filtration means communicating with the outside air being 1fJt.
It is characterized by being marked with J.

1作用 1 この発明ては、半導体ウェハカセット収納容器に設けら
れた差圧調整手段が、収納容器の内部と外気との差圧に
応して弾性変形させられて収納容2にの内圧を一定に保
持することができる。
1 Effect 1 In the present invention, the differential pressure adjusting means provided in the semiconductor wafer cassette storage container is elastically deformed in response to the differential pressure between the inside of the storage container and the outside air, and keeps the internal pressure in the storage container 2 constant. can be held.

つまり、このような構造にあっては、収納容器の内圧の
方が外気の圧力よりも高くなると、この収納容器に設け
られた差圧調整手段が収納容器の外方に弾性変形させら
れて容器内の容積を拡大して収納容器の内圧を下げるよ
うに作用し、外気との圧力の均衡を図る。
In other words, with such a structure, when the internal pressure of the storage container becomes higher than the pressure of the outside air, the differential pressure adjustment means provided in the storage container is elastically deformed outward from the storage container, causing the container to collapse. It acts to reduce the internal pressure of the storage container by expanding its internal volume, thereby balancing the pressure with the outside air.

また、これとは逆に、収納容器の内圧の方が外気の圧力
よりも低くなると、この収納容器に設置Jられた差圧調
整手段が収納容器の内方に弾性変形さU”られて容器内
の容積を縮小して収納容器の内圧を維持ずろように作用
して外気との圧力の均衡を図る。
Conversely, when the internal pressure of the storage container becomes lower than the pressure of the outside air, the differential pressure adjustment means installed in the storage container is elastically deformed inward, causing the container to The internal volume of the storage container is reduced to maintain the internal pressure of the storage container, thereby balancing the pressure with the outside air.

このようにして、vり記収納容器内と外気との温度差等
によって内外に差圧が発生してら、差圧調整手段によっ
て内外に差圧が生しない様に、IAI整され、収納容器
外部の汚れた空気を吸引しないようにセる。
In this way, even if a differential pressure is generated between the inside and outside of the storage container due to a temperature difference between the inside of the storage container and the outside air, the IAI is adjusted by the differential pressure adjusting means so that the pressure difference does not occur between the inside and outside, and the outside of the storage container is adjusted. Be careful not to inhale dirty air.

さらに、収納容器に濾過手段を設けた場合は、収納容器
の内圧と外気の圧力との差圧によって生じる気流を濾過
手段によって濾過するlこめ、仮に差圧によって外気が
吸収されてし容器本体と底板との間の接合部から吸収さ
れる前に収納容器に設けられたi1#1手段によって塵
埃を除去し、吸引しないようにする。したがって、収納
容器内の清浄度に何等影響を与えることがないため、収
納容器内に収納された半導体ウェハが、汚染された外気
に触れることなく収納される。
Furthermore, if the storage container is provided with a filtration means, the airflow generated by the pressure difference between the internal pressure of the storage container and the pressure of the outside air is filtered by the filtration means, and if the outside air is absorbed by the pressure difference and the The i1#1 means installed in the storage container removes dust before it is absorbed from the joint with the bottom plate to prevent it from being sucked. Therefore, since the cleanliness inside the storage container is not affected in any way, the semiconductor wafers stored in the storage container are stored without coming into contact with contaminated outside air.

(一実施例」 以ド、この発明の実施例について図面を参照して説明す
る。
(One Embodiment) Hereinafter, an embodiment of the present invention will be described with reference to the drawings.

第1図ないし第4図は、本発明の半導体ウェハカセット
収納容器の第1の実施例を示す図である。
1 to 4 are diagrams showing a first embodiment of the semiconductor wafer cassette storage container of the present invention.

第1図ないし第4図において、符号Iはクリーンルーム
内に設置された半導体ウェハカセット収納容器である。
In FIGS. 1 to 4, reference numeral I designates a semiconductor wafer cassette storage container installed in a clean room.

この半導体ウェハカセット収納容器1の構成は、前記S
MIFンステムか取り付けられた半導体ウェハカセット
収納容器とほぼ同一である。
The structure of this semiconductor wafer cassette storage container 1 is as follows.
It is almost the same as a semiconductor wafer cassette storage container with an MIF system attached.

従って、同一の構成要素については同一の符号を付し、
その説明を省略する。
Therefore, the same components are given the same reference numerals,
The explanation will be omitted.

ここで、半導体ウェハカセット収納容器lOは、前記の
如く箱状のケース本体2と、このケース本体2を密閉す
る着脱自在な底板3と、この底板3上に収納され、所定
枚数の半導体ウェハ4を格納する゛ト導体つェハカセッ
ト収納棚部5とからなっている。この半導体ウエハカセ
Jト収納容2310の底板3は、ケース本体2との間に
密閉部材11を介してねし結合されてケース本体2から
着脱口71:に構成されている。
Here, the semiconductor wafer cassette storage container IO includes a box-shaped case body 2 as described above, a removable bottom plate 3 that seals the case body 2, and a predetermined number of semiconductor wafers stored on the bottom plate 3. It consists of a conductor wafer cassette storage shelf 5 for storing conductor wafers and cassettes. The bottom plate 3 of the semiconductor wafer cassette storage container 2310 is threadedly coupled to the case body 2 via the sealing member 11, and is configured as an attachment/detachment opening 71 from the case body 2.

ケース本体2の側面には、差圧調整手段としての弾性変
形部12が設けられ、この弾性変形部I2の外面には、
この弾性変形部12をrQうようにケーシング13が設
けられている。
An elastically deformable portion 12 is provided on the side surface of the case body 2 as a differential pressure adjusting means, and the outer surface of this elastically deformable portion I2 is provided with:
A casing 13 is provided so as to cover this elastically deformable portion 12 rQ.

次に、この発明による゛1′−導体ウエバカセット収納
容器の作用について第4図を参照して説明する。
Next, the operation of the 1'-conductor wafer cassette storage container according to the present invention will be explained with reference to FIG.

まず、この収納容器10内にウェハ用カセットを収納し
た状態で、収納容器10を移動きり−ろ。
First, with the wafer cassette stored in the storage container 10, move the storage container 10.

このとき、たとえば、あるクリーンルーム内から他のク
リーンルームへ移動さ什ろと′4″ると、この移動の間
に外部の温度差等によって収納容器10内外に差圧が生
じても、収納容器10に設けられた弾性変形部!2が、
収納容器IOの内部と外気との差圧に応じて弾性変形さ
せられて収納容器10の内圧を一定に保持4−ろことか
できる。
At this time, for example, when moving from one clean room to another clean room, even if a pressure difference occurs between the inside and outside of the storage container 10 due to an external temperature difference during this movement, the storage container 10 The elastic deformation part!2 provided in
It is elastically deformed in accordance with the pressure difference between the inside of the storage container IO and the outside air, so that the internal pressure of the storage container 10 can be maintained constant.

つまり、このような構造にあっては、収納容器10の内
圧の方が外気の圧力よりら高くなると、この収納容器1
0に設けられた弾性変形部12が、第4図の鎖線1て示
4−ように収納容器10の外方に弾性変形させられて容
器10内の容積を拡大して収納容Z+IO内の内圧を下
げるように作用し、外気との圧力の均衡を図る。
In other words, in such a structure, when the internal pressure of the storage container 10 becomes higher than the pressure of the outside air, the storage container 1
The elastic deformation section 12 provided at the storage container 10 is elastically deformed outward of the storage container 10 as shown by the chain line 1 in FIG. It acts to lower the pressure and balance the pressure with the outside air.

そして、これとは逆に、収納容器lOの内圧の方が外気
の圧力よりも低くなると、この収納容器10に設けられ
た弾性変形部12が、第4図の鎖線11で示すように収
納容器lOの内方に弾性変形さUられて収納容器10内
の容積を縮小して収納容2(10の内圧を維持するよう
に作用して外気との工カの均衡を図る。
Conversely, when the internal pressure of the storage container 10 becomes lower than the pressure of the outside air, the elastic deformation section 12 provided in the storage container 10 deforms the storage container 10 as shown by the chain line 11 in FIG. 10 is elastically deformed inward to reduce the volume inside the storage container 10 and maintain the internal pressure of the storage container 2 (10) to balance the pressure with the outside air.

このようにして、前記収納容器lO内と外気との温度差
等によって内外に差圧が発生してら、差圧調整手段とし
て設けられた弾性変形部!2によって内外に差圧が生じ
ないように調整され、収納容器IO外部の汚れた空気を
吸引しないようにする。
In this way, when a pressure difference is generated between the inside and outside due to the temperature difference between the inside of the storage container IO and the outside air, the elastic deformation section provided as a pressure difference adjustment means! 2, the pressure is adjusted so that no differential pressure is generated between the inside and outside, and the dirty air outside the storage container IO is not sucked.

このような作用によって、収納容2510内への外気の
吸引を防止することができるので、収納4″へきウェハ
を外気て汚染することなく半導体の事情まりを向上させ
ることができる。
Such an action can prevent outside air from being drawn into the storage container 2510, thereby improving the quality of the semiconductors without contaminating the wafers in the storage 4'' with outside air.

次に、本発明の半導体ウェハカセット収納容器の第2の
実施例について第5図ないし第7図を参照しながら説明
する。なお、rrlJ記実施例と同一の構成となる箇所
には)(通の符号を付してその説明を省略する。
Next, a second embodiment of the semiconductor wafer cassette storage container of the present invention will be described with reference to FIGS. 5 to 7. Incidentally, parts having the same configuration as in the embodiment described in rrlJ are given the reference numerals (")" and their explanations will be omitted.

本発明の実施例における半導体ウェハカセット収納容器
15では、前記発明の実施例におけろ半導体ウェハカセ
ット収納容器10とほぼ同一の構成となっており、前記
発明の差圧調整手段としての弾性変形部12の代わりに
濾過手段としてのフィルタ16を設けた箇所で相違する
The semiconductor wafer cassette storage container 15 in the embodiment of the present invention has almost the same configuration as the semiconductor wafer cassette storage container 10 in the embodiment of the invention, and includes an elastic deformation portion as the differential pressure adjusting means of the invention. The difference is that a filter 16 as a filtering means is provided instead of 12.

前記フィルタ!6は、汚染物質を除去するためのらので
、高清浄度を要求される場合にも十分対応し得るものと
する。
Said filter! No. 6 is for removing contaminants, so it can be used even in cases where high cleanliness is required.

このように、収納容器15に濾過手段を設けた場合には
、収納容器15の内圧と外気の圧力との差圧によって生
じろ気流をフィルタ16によって濾過するため、仮に差
圧によって外気が吸収されてらケース本体2と底板3と
の間の接合部から吸収されろiiiに収納容器15に設
けられたフィルタ16によって塵埃を除去し、吸引しな
いようにする。
In this way, when the storage container 15 is provided with a filtration means, the filter 16 filters the air flow generated by the pressure difference between the internal pressure of the storage container 15 and the pressure of the outside air. Dust that is absorbed from the joint between the case body 2 and the bottom plate 3 is removed by a filter 16 provided in the storage container 15 to prevent it from being sucked.

つまり、第7図に示すように、収納容器I5の内圧の方
が外圧よりも高くなると図中鎖線rで示すような気流か
収納容器!5内から外気に向って発生し、これとは逆に
収納容Rl 5の内圧の方が外圧よりも低くなると図中
鎖線■で示すような気流か外気から収納容器10内に向
って発生する。
In other words, as shown in FIG. 7, when the internal pressure of the storage container I5 becomes higher than the external pressure, the airflow as shown by the dashed line r in the drawing occurs in the storage container! Conversely, when the internal pressure of the storage capacity Rl 5 is lower than the external pressure, an air flow as shown by the chain line ■ in the figure is generated from the outside air toward the inside of the storage container 10. .

そして、これら気流l、Hのいずれにおいてし、フィル
ター16を通過する段階で塵埃が除去される。
Dust is removed in either of these air flows 1 and H when they pass through the filter 16.

したがって、収納容器!5内に外気が流入するようなこ
とがあっても、その清浄度に同等影響を与えることがな
いため、収納容器I5内に収納された半導体ウェハがt
F染された外気に触れることなく収納される。
Hence the storage container! Even if outside air were to flow into the storage container I5, it would not have the same effect on the cleanliness of the storage container I5.
It is stored without being exposed to F-dyed outside air.

「発明の効果」 以上詳細に説明したように、この発明によれば、゛ド導
体つェハ用カセットを収納する密閉可能な半導体ウェハ
カセット収納容器であって、半導体つ」−バカセット収
納容器の内部と、外気との差圧を調整する差圧調整手段
が設けられている構成としたのて、この収納容器内と外
気との温度差等によって内外に差圧が発生しても、差圧
調整手段によって内外に差圧が生しないようにa、−1
整され、収納容器外部が汚れた空気を吸引しないように
する。
``Effects of the Invention'' As explained in detail above, according to the present invention, there is provided a sealable semiconductor wafer cassette storage container for storing a semiconductor wafer cassette. Since the structure is equipped with a differential pressure adjustment means for adjusting the differential pressure between the inside of the storage container and the outside air, even if a difference in pressure occurs between the inside and outside due to a temperature difference between the inside of the storage container and the outside air, the difference will be maintained. a, -1 so that differential pressure does not occur between the inside and outside by the pressure adjustment means.
to prevent the outside of the storage container from sucking in dirty air.

また、半導体ウェハ用カセントを収納ずろ密閉可能な半
導体つJ−バカセット収納容器であって、外気と連通ケ
ろ濾過手段が設けられている構成としたので、収納容器
の内圧と外気の圧力との差圧によって生じる気流を濾過
手段によって濾過ケろため、仮に差圧によって外気が吸
収されてら容器本体と底板との間に設けられた濾過手段
によって塵埃を除去し、吸引しない。したがって、収納
容器内の清浄度に同等影響を与えることがないため、収
納容器内に収納された半導体ウェハか汚染された外気に
触れることなく収納されろ。
In addition, the semiconductor wafer storage container is capable of storing and sealing the semiconductor wafer cassette, and is equipped with a membrane filtration means that communicates with the outside air, so that the internal pressure of the storage container and the pressure of the outside air are Since the air flow generated by the pressure difference is filtered by the filtering means, even if outside air is absorbed by the pressure difference, the dust is removed by the filtering means provided between the container body and the bottom plate and is not sucked. Therefore, since the cleanliness inside the storage container is not affected to the same extent, the semiconductor wafers stored in the storage container can be stored without coming into contact with contaminated outside air.

1図面の説明」図面、Z 、’;i!iiな:w’−’
;L第1図ないし第4図は本発明の第1の実施例を示す
図であり、第1図は本発明の半導体ウェハカセット収納
容器の斜視図、第2図は正面図、第3図は側面図、第4
図は差[E調整手段付近の拡大断面図である。第5図な
いし第7図は本発明の第2の実施例を示す図であり、第
5図は正面図、第6図は側面図、第7図は濾過手段付近
の拡大断面図である。
1 Description of the drawing "Drawing, Z,';i! ii: w'-'
;L Figures 1 to 4 are views showing a first embodiment of the present invention, in which Figure 1 is a perspective view of the semiconductor wafer cassette storage container of the present invention, Figure 2 is a front view, and Figure 3 is a perspective view of the semiconductor wafer cassette storage container of the present invention. is a side view, 4th
The figure is an enlarged sectional view of the vicinity of the difference [E adjustment means]. 5 to 7 are diagrams showing a second embodiment of the present invention, in which FIG. 5 is a front view, FIG. 6 is a side view, and FIG. 7 is an enlarged sectional view of the vicinity of the filtering means.

第8図は従来の半導体ウェハカセット収納容器の一例を
示す斜視図である。
FIG. 8 is a perspective view showing an example of a conventional semiconductor wafer cassette storage container.

!、l0115 ・・・ ・・半導体ウエハカセット収
納容器、 2 ・ ・・ケース本体、3 ・・・・・底板、4  
・ 半導体ウェハ、 11 ・ ・密閉部(オ、 12 ・・・・・・弾性変形部(差圧調整手段)、ケー
シング、 把持部。
! , l0115 ... Semiconductor wafer cassette storage container, 2 ... Case body, 3 ... Bottom plate, 4
・Semiconductor wafer, 11. Sealing part (E, 12... Elastic deformation part (differential pressure adjustment means), casing, gripping part.

Claims (1)

【特許請求の範囲】 1)半導体ウェハ用カセットを収納する密閉可能な半導
体ウェハカセット収納容器であって、半導体ウェハカセ
ット収納容器の内部と、外気との差圧を調整する差圧調
整手段が設けられていることを特徴とする半導体ウェハ
カセット収納容器。 2)半導体ウェハ用カセットを収納する密閉可能な半導
体ウェハカセット収納容器であって、外気と連通する濾
過手段が設けられていることを特徴とする半導体ウェハ
カセット収納容器。
[Scope of Claims] 1) A sealable semiconductor wafer cassette storage container for storing semiconductor wafer cassettes, which is provided with differential pressure adjusting means for adjusting the differential pressure between the inside of the semiconductor wafer cassette storage container and outside air. A semiconductor wafer cassette storage container characterized by: 2) A semiconductor wafer cassette storage container that is a sealable semiconductor wafer cassette storage container for storing semiconductor wafer cassettes, and is characterized in that it is provided with a filtration means that communicates with the outside air.
JP2007534A 1990-01-17 1990-01-17 Container for semiconductor wafer cassette Pending JPH03211857A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2007534A JPH03211857A (en) 1990-01-17 1990-01-17 Container for semiconductor wafer cassette

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2007534A JPH03211857A (en) 1990-01-17 1990-01-17 Container for semiconductor wafer cassette

Publications (1)

Publication Number Publication Date
JPH03211857A true JPH03211857A (en) 1991-09-17

Family

ID=11668453

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2007534A Pending JPH03211857A (en) 1990-01-17 1990-01-17 Container for semiconductor wafer cassette

Country Status (1)

Country Link
JP (1) JPH03211857A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7850009B2 (en) 2006-12-29 2010-12-14 Industrial Technology Research Institute Clean container having elastic positioning structure

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7850009B2 (en) 2006-12-29 2010-12-14 Industrial Technology Research Institute Clean container having elastic positioning structure

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