JPH0320402B2 - - Google Patents
Info
- Publication number
- JPH0320402B2 JPH0320402B2 JP56128406A JP12840681A JPH0320402B2 JP H0320402 B2 JPH0320402 B2 JP H0320402B2 JP 56128406 A JP56128406 A JP 56128406A JP 12840681 A JP12840681 A JP 12840681A JP H0320402 B2 JPH0320402 B2 JP H0320402B2
- Authority
- JP
- Japan
- Prior art keywords
- acid
- examples
- triazine
- bis
- group
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 150000001875 compounds Chemical class 0.000 claims description 25
- 239000000203 mixture Substances 0.000 claims description 22
- 230000000977 initiatory effect Effects 0.000 claims description 16
- 125000000217 alkyl group Chemical group 0.000 claims description 7
- 125000003118 aryl group Chemical group 0.000 claims description 6
- JIHQDMXYYFUGFV-UHFFFAOYSA-N 1,3,5-triazine Chemical class C1=NC=NC=N1 JIHQDMXYYFUGFV-UHFFFAOYSA-N 0.000 claims description 5
- 125000002496 methyl group Chemical class [H]C([H])([H])* 0.000 claims description 5
- 125000001424 substituent group Chemical group 0.000 claims description 5
- 150000001450 anions Chemical class 0.000 claims description 3
- 125000001624 naphthyl group Chemical group 0.000 claims description 3
- 125000003342 alkenyl group Chemical group 0.000 claims description 2
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 2
- 125000000587 piperidin-1-yl group Chemical group [H]C1([H])N(*)C([H])([H])C([H])([H])C([H])([H])C1([H])[H] 0.000 claims description 2
- -1 benzoin alkyl ether Chemical class 0.000 description 20
- 229920001577 copolymer Polymers 0.000 description 11
- 238000000034 method Methods 0.000 description 11
- 150000001735 carboxylic acids Chemical class 0.000 description 10
- 229920000642 polymer Polymers 0.000 description 10
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 9
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 8
- 239000000975 dye Substances 0.000 description 8
- 150000002148 esters Chemical class 0.000 description 7
- ANRHNWWPFJCPAZ-UHFFFAOYSA-M thionine Chemical compound [Cl-].C1=CC(N)=CC2=[S+]C3=CC(N)=CC=C3N=C21 ANRHNWWPFJCPAZ-UHFFFAOYSA-M 0.000 description 7
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 6
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 6
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 6
- 239000003086 colorant Substances 0.000 description 6
- 230000000052 comparative effect Effects 0.000 description 6
- WQGWDDDVZFFDIG-UHFFFAOYSA-N pyrogallol Chemical compound OC1=CC=CC(O)=C1O WQGWDDDVZFFDIG-UHFFFAOYSA-N 0.000 description 6
- 239000000243 solution Substances 0.000 description 6
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 6
- OEPOKWHJYJXUGD-UHFFFAOYSA-N 2-(3-phenylmethoxyphenyl)-1,3-thiazole-4-carbaldehyde Chemical compound O=CC1=CSC(C=2C=C(OCC=3C=CC=CC=3)C=CC=2)=N1 OEPOKWHJYJXUGD-UHFFFAOYSA-N 0.000 description 5
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 5
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 5
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 description 5
- 239000011230 binding agent Substances 0.000 description 5
- 239000000178 monomer Substances 0.000 description 5
- 230000035945 sensitivity Effects 0.000 description 5
- INQDDHNZXOAFFD-UHFFFAOYSA-N 2-[2-(2-prop-2-enoyloxyethoxy)ethoxy]ethyl prop-2-enoate Chemical compound C=CC(=O)OCCOCCOCCOC(=O)C=C INQDDHNZXOAFFD-UHFFFAOYSA-N 0.000 description 4
- TXBCBTDQIULDIA-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol Chemical compound OCC(CO)(CO)COCC(CO)(CO)CO TXBCBTDQIULDIA-UHFFFAOYSA-N 0.000 description 4
- KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical group C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 description 4
- VZCYOOQTPOCHFL-OWOJBTEDSA-N Fumaric acid Chemical compound OC(=O)\C=C\C(O)=O VZCYOOQTPOCHFL-OWOJBTEDSA-N 0.000 description 4
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 4
- 125000001931 aliphatic group Chemical group 0.000 description 4
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 4
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 4
- YCIMNLLNPGFGHC-UHFFFAOYSA-N catechol Chemical compound OC1=CC=CC=C1O YCIMNLLNPGFGHC-UHFFFAOYSA-N 0.000 description 4
- 239000010410 layer Substances 0.000 description 4
- 239000011976 maleic acid Substances 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- NWVVVBRKAWDGAB-UHFFFAOYSA-N p-methoxyphenol Chemical compound COC1=CC=C(O)C=C1 NWVVVBRKAWDGAB-UHFFFAOYSA-N 0.000 description 4
- 238000006068 polycondensation reaction Methods 0.000 description 4
- 239000002904 solvent Substances 0.000 description 4
- 239000011550 stock solution Substances 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 3
- PTJWCLYPVFJWMP-UHFFFAOYSA-N 2-[[3-hydroxy-2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol Chemical compound OCC(CO)(CO)COCC(CO)(CO)COCC(CO)(CO)CO PTJWCLYPVFJWMP-UHFFFAOYSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- WVDDGKGOMKODPV-UHFFFAOYSA-N Benzyl alcohol Chemical compound OCC1=CC=CC=C1 WVDDGKGOMKODPV-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- 239000004677 Nylon Substances 0.000 description 3
- 239000004952 Polyamide Substances 0.000 description 3
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical compound CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 description 3
- 239000000853 adhesive Substances 0.000 description 3
- 230000001070 adhesive effect Effects 0.000 description 3
- 150000001298 alcohols Chemical class 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 3
- ISAOCJYIOMOJEB-UHFFFAOYSA-N benzoin Chemical compound C=1C=CC=CC=1C(O)C(=O)C1=CC=CC=C1 ISAOCJYIOMOJEB-UHFFFAOYSA-N 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 3
- 239000003795 chemical substances by application Substances 0.000 description 3
- LDHQCZJRKDOVOX-NSCUHMNNSA-N crotonic acid Chemical compound C\C=C\C(O)=O LDHQCZJRKDOVOX-NSCUHMNNSA-N 0.000 description 3
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000011156 evaluation Methods 0.000 description 3
- 239000003112 inhibitor Substances 0.000 description 3
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 3
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 3
- 229910052753 mercury Inorganic materials 0.000 description 3
- LVHBHZANLOWSRM-UHFFFAOYSA-N methylenebutanedioic acid Natural products OC(=O)CC(=C)C(O)=O LVHBHZANLOWSRM-UHFFFAOYSA-N 0.000 description 3
- 229920001778 nylon Polymers 0.000 description 3
- 239000000049 pigment Substances 0.000 description 3
- 239000004014 plasticizer Substances 0.000 description 3
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 3
- 229920002647 polyamide Polymers 0.000 description 3
- 239000004926 polymethyl methacrylate Substances 0.000 description 3
- 229940079877 pyrogallol Drugs 0.000 description 3
- GHMLBKRAJCXXBS-UHFFFAOYSA-N resorcinol Chemical compound OC1=CC=CC(O)=C1 GHMLBKRAJCXXBS-UHFFFAOYSA-N 0.000 description 3
- 229960001755 resorcinol Drugs 0.000 description 3
- 238000012719 thermal polymerization Methods 0.000 description 3
- 229920002554 vinyl polymer Polymers 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- MYWOJODOMFBVCB-UHFFFAOYSA-N 1,2,6-trimethylphenanthrene Chemical compound CC1=CC=C2C3=CC(C)=CC=C3C=CC2=C1C MYWOJODOMFBVCB-UHFFFAOYSA-N 0.000 description 2
- URJAUSYMVIZTHC-UHFFFAOYSA-N 2,4,6-tris(tribromomethyl)-1,3,5-triazine Chemical compound BrC(Br)(Br)C1=NC(C(Br)(Br)Br)=NC(C(Br)(Br)Br)=N1 URJAUSYMVIZTHC-UHFFFAOYSA-N 0.000 description 2
- DXUMYHZTYVPBEZ-UHFFFAOYSA-N 2,4,6-tris(trichloromethyl)-1,3,5-triazine Chemical compound ClC(Cl)(Cl)C1=NC(C(Cl)(Cl)Cl)=NC(C(Cl)(Cl)Cl)=N1 DXUMYHZTYVPBEZ-UHFFFAOYSA-N 0.000 description 2
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 2
- JAHNSTQSQJOJLO-UHFFFAOYSA-N 2-(3-fluorophenyl)-1h-imidazole Chemical compound FC1=CC=CC(C=2NC=CN=2)=C1 JAHNSTQSQJOJLO-UHFFFAOYSA-N 0.000 description 2
- UKTRUOJPSJPVOZ-UHFFFAOYSA-N 2-(4-bromophenyl)-4,6-bis(trichloromethyl)-1,3,5-triazine Chemical compound ClC(Cl)(Cl)C1=NC(C(Cl)(Cl)Cl)=NC(C=2C=CC(Br)=CC=2)=N1 UKTRUOJPSJPVOZ-UHFFFAOYSA-N 0.000 description 2
- JWAZRIHNYRIHIV-UHFFFAOYSA-N 2-naphthol Chemical compound C1=CC=CC2=CC(O)=CC=C21 JWAZRIHNYRIHIV-UHFFFAOYSA-N 0.000 description 2
- HAZQZUFYRLFOLC-UHFFFAOYSA-N 2-phenyl-4,6-bis(trichloromethyl)-1,3,5-triazine Chemical compound ClC(Cl)(Cl)C1=NC(C(Cl)(Cl)Cl)=NC(C=2C=CC=CC=2)=N1 HAZQZUFYRLFOLC-UHFFFAOYSA-N 0.000 description 2
- KUDUQBURMYMBIJ-UHFFFAOYSA-N 2-prop-2-enoyloxyethyl prop-2-enoate Chemical compound C=CC(=O)OCCOC(=O)C=C KUDUQBURMYMBIJ-UHFFFAOYSA-N 0.000 description 2
- VVBLNCFGVYUYGU-UHFFFAOYSA-N 4,4'-Bis(dimethylamino)benzophenone Chemical compound C1=CC(N(C)C)=CC=C1C(=O)C1=CC=C(N(C)C)C=C1 VVBLNCFGVYUYGU-UHFFFAOYSA-N 0.000 description 2
- IRIAEXORFWYRCZ-UHFFFAOYSA-N Butylbenzyl phthalate Chemical compound CCCCOC(=O)C1=CC=CC=C1C(=O)OCC1=CC=CC=C1 IRIAEXORFWYRCZ-UHFFFAOYSA-N 0.000 description 2
- SOGAXMICEFXMKE-UHFFFAOYSA-N Butylmethacrylate Chemical compound CCCCOC(=O)C(C)=C SOGAXMICEFXMKE-UHFFFAOYSA-N 0.000 description 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- 239000004641 Diallyl-phthalate Substances 0.000 description 2
- BRLQWZUYTZBJKN-UHFFFAOYSA-N Epichlorohydrin Chemical compound ClCC1CO1 BRLQWZUYTZBJKN-UHFFFAOYSA-N 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- IMROMDMJAWUWLK-UHFFFAOYSA-N Ethenol Chemical compound OC=C IMROMDMJAWUWLK-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- 239000004793 Polystyrene Substances 0.000 description 2
- 239000004372 Polyvinyl alcohol Substances 0.000 description 2
- AUNGANRZJHBGPY-SCRDCRAPSA-N Riboflavin Chemical compound OC[C@@H](O)[C@@H](O)[C@@H](O)CN1C=2C=C(C)C(C)=CC=2N=C2C1=NC(=O)NC2=O AUNGANRZJHBGPY-SCRDCRAPSA-N 0.000 description 2
- 244000028419 Styrax benzoin Species 0.000 description 2
- 235000000126 Styrax benzoin Nutrition 0.000 description 2
- 235000008411 Sumatra benzointree Nutrition 0.000 description 2
- KKEYFWRCBNTPAC-UHFFFAOYSA-N Terephthalic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C=C1 KKEYFWRCBNTPAC-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- FZWLAAWBMGSTSO-UHFFFAOYSA-N Thiazole Chemical compound C1=CSC=N1 FZWLAAWBMGSTSO-UHFFFAOYSA-N 0.000 description 2
- HVVWZTWDBSEWIH-UHFFFAOYSA-N [2-(hydroxymethyl)-3-prop-2-enoyloxy-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(CO)(COC(=O)C=C)COC(=O)C=C HVVWZTWDBSEWIH-UHFFFAOYSA-N 0.000 description 2
- 238000012644 addition polymerization Methods 0.000 description 2
- WNLRTRBMVRJNCN-UHFFFAOYSA-N adipic acid Chemical compound OC(=O)CCCCC(O)=O WNLRTRBMVRJNCN-UHFFFAOYSA-N 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 229960002130 benzoin Drugs 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- QUDWYFHPNIMBFC-UHFFFAOYSA-N bis(prop-2-enyl) benzene-1,2-dicarboxylate Chemical compound C=CCOC(=O)C1=CC=CC=C1C(=O)OCC=C QUDWYFHPNIMBFC-UHFFFAOYSA-N 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- 238000010908 decantation Methods 0.000 description 2
- 150000004985 diamines Chemical class 0.000 description 2
- DOIRQSBPFJWKBE-UHFFFAOYSA-N dibutyl phthalate Chemical compound CCCCOC(=O)C1=CC=CC=C1C(=O)OCCCC DOIRQSBPFJWKBE-UHFFFAOYSA-N 0.000 description 2
- 238000005886 esterification reaction Methods 0.000 description 2
- FKRCODPIKNYEAC-UHFFFAOYSA-N ethyl propionate Chemical compound CCOC(=O)CC FKRCODPIKNYEAC-UHFFFAOYSA-N 0.000 description 2
- 239000001530 fumaric acid Substances 0.000 description 2
- 125000000524 functional group Chemical group 0.000 description 2
- 235000011187 glycerol Nutrition 0.000 description 2
- 235000019382 gum benzoic Nutrition 0.000 description 2
- 150000002440 hydroxy compounds Chemical class 0.000 description 2
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 2
- 239000003999 initiator Substances 0.000 description 2
- QQVIHTHCMHWDBS-UHFFFAOYSA-N isophthalic acid Chemical compound OC(=O)C1=CC=CC(C(O)=O)=C1 QQVIHTHCMHWDBS-UHFFFAOYSA-N 0.000 description 2
- 235000015073 liquid stocks Nutrition 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 125000001434 methanylylidene group Chemical group [H]C#[*] 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical compound OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 description 2
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 2
- 229920000728 polyester Polymers 0.000 description 2
- 229920000570 polyether Polymers 0.000 description 2
- 229920002223 polystyrene Polymers 0.000 description 2
- 229920002451 polyvinyl alcohol Polymers 0.000 description 2
- CYIDZMCFTVVTJO-UHFFFAOYSA-N pyromellitic acid Chemical compound OC(=O)C1=CC(C(O)=O)=C(C(O)=O)C=C1C(O)=O CYIDZMCFTVVTJO-UHFFFAOYSA-N 0.000 description 2
- 150000003254 radicals Chemical class 0.000 description 2
- CXMXRPHRNRROMY-UHFFFAOYSA-N sebacic acid Chemical compound OC(=O)CCCCCCCCC(O)=O CXMXRPHRNRROMY-UHFFFAOYSA-N 0.000 description 2
- VZGDMQKNWNREIO-UHFFFAOYSA-N tetrachloromethane Chemical compound ClC(Cl)(Cl)Cl VZGDMQKNWNREIO-UHFFFAOYSA-N 0.000 description 2
- LDHQCZJRKDOVOX-UHFFFAOYSA-N trans-crotonic acid Natural products CC=CC(O)=O LDHQCZJRKDOVOX-UHFFFAOYSA-N 0.000 description 2
- ARCGXLSVLAOJQL-UHFFFAOYSA-N trimellitic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C(C(O)=O)=C1 ARCGXLSVLAOJQL-UHFFFAOYSA-N 0.000 description 2
- 229910052724 xenon Inorganic materials 0.000 description 2
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 2
- LGPAKRMZNPYPMG-UHFFFAOYSA-N (3-hydroxy-2-prop-2-enoyloxypropyl) prop-2-enoate Chemical compound C=CC(=O)OC(CO)COC(=O)C=C LGPAKRMZNPYPMG-UHFFFAOYSA-N 0.000 description 1
- JMMVHMOAIMOMOF-UHFFFAOYSA-N (4-prop-2-enoyloxyphenyl) prop-2-enoate Chemical compound C=CC(=O)OC1=CC=C(OC(=O)C=C)C=C1 JMMVHMOAIMOMOF-UHFFFAOYSA-N 0.000 description 1
- FGTUGLXGCCYKPJ-SPIKMXEPSA-N (Z)-but-2-enedioic acid 2-[2-(2-hydroxyethoxy)ethoxy]ethanol Chemical compound OC(=O)\C=C/C(O)=O.OC(=O)\C=C/C(O)=O.OCCOCCOCCO FGTUGLXGCCYKPJ-SPIKMXEPSA-N 0.000 description 1
- BZCOSCNPHJNQBP-UPHRSURJSA-N (z)-2,3-dihydroxybut-2-enedioic acid Chemical compound OC(=O)C(\O)=C(\O)C(O)=O BZCOSCNPHJNQBP-UPHRSURJSA-N 0.000 description 1
- SORHAFXJCOXOIC-CCAGOZQPSA-N (z)-4-[2-[(z)-3-carboxyprop-2-enoyl]oxyethoxy]-4-oxobut-2-enoic acid Chemical compound OC(=O)\C=C/C(=O)OCCOC(=O)\C=C/C(O)=O SORHAFXJCOXOIC-CCAGOZQPSA-N 0.000 description 1
- UOCLXMDMGBRAIB-UHFFFAOYSA-N 1,1,1-trichloroethane Chemical compound CC(Cl)(Cl)Cl UOCLXMDMGBRAIB-UHFFFAOYSA-N 0.000 description 1
- ZXHDVRATSGZISC-UHFFFAOYSA-N 1,2-bis(ethenoxy)ethane Chemical compound C=COCCOC=C ZXHDVRATSGZISC-UHFFFAOYSA-N 0.000 description 1
- KOMNUTZXSVSERR-UHFFFAOYSA-N 1,3,5-tris(prop-2-enyl)-1,3,5-triazinane-2,4,6-trione Chemical compound C=CCN1C(=O)N(CC=C)C(=O)N(CC=C)C1=O KOMNUTZXSVSERR-UHFFFAOYSA-N 0.000 description 1
- HSOOIVBINKDISP-UHFFFAOYSA-N 1-(2-methylprop-2-enoyloxy)butyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC(CCC)OC(=O)C(C)=C HSOOIVBINKDISP-UHFFFAOYSA-N 0.000 description 1
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- PIPBVABVQJZSAB-UHFFFAOYSA-N bis(ethenyl) benzene-1,2-dicarboxylate Chemical compound C=COC(=O)C1=CC=CC=C1C(=O)OC=C PIPBVABVQJZSAB-UHFFFAOYSA-N 0.000 description 1
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- AOESAXAWXYJFNC-UHFFFAOYSA-N bis(prop-2-enyl) propanedioate Chemical compound C=CCOC(=O)CC(=O)OCC=C AOESAXAWXYJFNC-UHFFFAOYSA-N 0.000 description 1
- BMRWNKZVCUKKSR-UHFFFAOYSA-N butane-1,2-diol Chemical compound CCC(O)CO BMRWNKZVCUKKSR-UHFFFAOYSA-N 0.000 description 1
- AYDUQZRVHZUTQK-UHFFFAOYSA-N butane-1,2-diol 2-methylidenebutanedioic acid Chemical compound C(C(=C)CC(=O)O)(=O)O.C(C(=C)CC(=O)O)(=O)O.C(C(CC)O)O AYDUQZRVHZUTQK-UHFFFAOYSA-N 0.000 description 1
- UIZLQMLDSWKZGC-UHFFFAOYSA-N cadmium helium Chemical compound [He].[Cd] UIZLQMLDSWKZGC-UHFFFAOYSA-N 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000006229 carbon black Substances 0.000 description 1
- BVKZGUZCCUSVTD-UHFFFAOYSA-N carbonic acid Chemical class OC(O)=O BVKZGUZCCUSVTD-UHFFFAOYSA-N 0.000 description 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 1
- 229920002678 cellulose Polymers 0.000 description 1
- 239000001913 cellulose Substances 0.000 description 1
- 229920002301 cellulose acetate Polymers 0.000 description 1
- 229920006217 cellulose acetate butyrate Polymers 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 239000011247 coating layer Substances 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- IFDVQVHZEKPUSC-UHFFFAOYSA-N cyclohex-3-ene-1,2-dicarboxylic acid Chemical compound OC(=O)C1CCC=CC1C(O)=O IFDVQVHZEKPUSC-UHFFFAOYSA-N 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 125000004386 diacrylate group Chemical group 0.000 description 1
- JBSLOWBPDRZSMB-FPLPWBNLSA-N dibutyl (z)-but-2-enedioate Chemical compound CCCCOC(=O)\C=C/C(=O)OCCCC JBSLOWBPDRZSMB-FPLPWBNLSA-N 0.000 description 1
- 229940100539 dibutyl adipate Drugs 0.000 description 1
- 150000001991 dicarboxylic acids Chemical class 0.000 description 1
- PUFGCEQWYLJYNJ-UHFFFAOYSA-N didodecyl benzene-1,2-dicarboxylate Chemical compound CCCCCCCCCCCCOC(=O)C1=CC=CC=C1C(=O)OCCCCCCCCCCCC PUFGCEQWYLJYNJ-UHFFFAOYSA-N 0.000 description 1
- ZBCBWPMODOFKDW-UHFFFAOYSA-N diethanolamine Chemical compound OCCNCCO ZBCBWPMODOFKDW-UHFFFAOYSA-N 0.000 description 1
- 239000000539 dimer Substances 0.000 description 1
- NVLHKSGUMYMKRR-UHFFFAOYSA-N dodeca-2,10-dienediamide Chemical compound NC(=O)C=CCCCCCCC=CC(N)=O NVLHKSGUMYMKRR-UHFFFAOYSA-N 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- YQGOJNYOYNNSMM-UHFFFAOYSA-N eosin Chemical compound [Na+].OC(=O)C1=CC=CC=C1C1=C2C=C(Br)C(=O)C(Br)=C2OC2=C(Br)C(O)=C(Br)C=C21 YQGOJNYOYNNSMM-UHFFFAOYSA-N 0.000 description 1
- IINNWAYUJNWZRM-UHFFFAOYSA-L erythrosin B Chemical compound [Na+].[Na+].[O-]C(=O)C1=CC=CC=C1C1=C2C=C(I)C(=O)C(I)=C2OC2=C(I)C([O-])=C(I)C=C21 IINNWAYUJNWZRM-UHFFFAOYSA-L 0.000 description 1
- DAOJMFXILKTYRL-UHFFFAOYSA-N ethane-1,2-diol;2-methylidenebutanedioic acid Chemical compound OCCO.OC(=O)CC(=C)C(O)=O.OC(=O)CC(=C)C(O)=O DAOJMFXILKTYRL-UHFFFAOYSA-N 0.000 description 1
- IQIJRJNHZYUQSD-UHFFFAOYSA-N ethenyl(phenyl)diazene Chemical compound C=CN=NC1=CC=CC=C1 IQIJRJNHZYUQSD-UHFFFAOYSA-N 0.000 description 1
- CEIPQQODRKXDSB-UHFFFAOYSA-N ethyl 3-(6-hydroxynaphthalen-2-yl)-1H-indazole-5-carboximidate dihydrochloride Chemical compound Cl.Cl.C1=C(O)C=CC2=CC(C3=NNC4=CC=C(C=C43)C(=N)OCC)=CC=C21 CEIPQQODRKXDSB-UHFFFAOYSA-N 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- STVZJERGLQHEKB-UHFFFAOYSA-N ethylene glycol dimethacrylate Substances CC(=C)C(=O)OCCOC(=O)C(C)=C STVZJERGLQHEKB-UHFFFAOYSA-N 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000009499 grossing Methods 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- MNWFXJYAOYHMED-UHFFFAOYSA-M heptanoate Chemical compound CCCCCCC([O-])=O MNWFXJYAOYHMED-UHFFFAOYSA-M 0.000 description 1
- FUZZWVXGSFPDMH-UHFFFAOYSA-M hexanoate Chemical compound CCCCCC([O-])=O FUZZWVXGSFPDMH-UHFFFAOYSA-M 0.000 description 1
- 229910000041 hydrogen chloride Inorganic materials 0.000 description 1
- IXCSERBJSXMMFS-UHFFFAOYSA-N hydrogen chloride Substances Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 description 1
- 230000003301 hydrolyzing effect Effects 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- QNXSIUBBGPHDDE-UHFFFAOYSA-N indan-1-one Chemical compound C1=CC=C2C(=O)CCC2=C1 QNXSIUBBGPHDDE-UHFFFAOYSA-N 0.000 description 1
- 239000000976 ink Substances 0.000 description 1
- 229910001412 inorganic anion Inorganic materials 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 229910052743 krypton Inorganic materials 0.000 description 1
- DNNSSWSSYDEUBZ-UHFFFAOYSA-N krypton atom Chemical compound [Kr] DNNSSWSSYDEUBZ-UHFFFAOYSA-N 0.000 description 1
- 238000010147 laser engraving Methods 0.000 description 1
- 208000013469 light sensitivity Diseases 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- 150000002689 maleic acids Chemical class 0.000 description 1
- DZVCFNFOPIZQKX-LTHRDKTGSA-M merocyanine Chemical class [Na+].O=C1N(CCCC)C(=O)N(CCCC)C(=O)C1=C\C=C\C=C/1N(CCCS([O-])(=O)=O)C2=CC=CC=C2O\1 DZVCFNFOPIZQKX-LTHRDKTGSA-M 0.000 description 1
- 150000002734 metacrylic acid derivatives Chemical class 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910001507 metal halide Inorganic materials 0.000 description 1
- 150000005309 metal halides Chemical class 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- FQPSGWSUVKBHSU-UHFFFAOYSA-N methacrylamide Chemical class CC(=C)C(N)=O FQPSGWSUVKBHSU-UHFFFAOYSA-N 0.000 description 1
- 229940117841 methacrylic acid copolymer Drugs 0.000 description 1
- 229920003145 methacrylic acid copolymer Polymers 0.000 description 1
- 125000005395 methacrylic acid group Chemical group 0.000 description 1
- SLCVBVWXLSEKPL-UHFFFAOYSA-N neopentyl glycol Chemical compound OCC(C)(C)CO SLCVBVWXLSEKPL-UHFFFAOYSA-N 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 150000002891 organic anions Chemical class 0.000 description 1
- 229920000620 organic polymer Polymers 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
- 238000006303 photolysis reaction Methods 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 230000036211 photosensitivity Effects 0.000 description 1
- IEQIEDJGQAUEQZ-UHFFFAOYSA-N phthalocyanine Chemical compound N1C(N=C2C3=CC=CC=C3C(N=C3C4=CC=CC=C4C(=N4)N3)=N2)=C(C=CC=C2)C2=C1N=C1C2=CC=CC=C2C4=N1 IEQIEDJGQAUEQZ-UHFFFAOYSA-N 0.000 description 1
- 229920002755 poly(epichlorohydrin) Polymers 0.000 description 1
- 229920002037 poly(vinyl butyral) polymer Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 230000000379 polymerizing effect Effects 0.000 description 1
- 229920000098 polyolefin Polymers 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 229920002689 polyvinyl acetate Polymers 0.000 description 1
- 239000011118 polyvinyl acetate Substances 0.000 description 1
- 229920000036 polyvinylpyrrolidone Polymers 0.000 description 1
- 239000001267 polyvinylpyrrolidone Substances 0.000 description 1
- 235000013855 polyvinylpyrrolidone Nutrition 0.000 description 1
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 238000009877 rendering Methods 0.000 description 1
- 229960002477 riboflavin Drugs 0.000 description 1
- 235000019192 riboflavin Nutrition 0.000 description 1
- 239000002151 riboflavin Substances 0.000 description 1
- AZJPTIGZZTZIDR-UHFFFAOYSA-L rose bengal Chemical compound [K+].[K+].[O-]C(=O)C1=C(Cl)C(Cl)=C(Cl)C(Cl)=C1C1=C2C=C(I)C(=O)C(I)=C2OC2=C(I)C([O-])=C(I)C=C21 AZJPTIGZZTZIDR-UHFFFAOYSA-L 0.000 description 1
- 229940081623 rose bengal Drugs 0.000 description 1
- 229930187593 rose bengal Natural products 0.000 description 1
- STRXNPAVPKGJQR-UHFFFAOYSA-N rose bengal A Natural products O1C(=O)C(C(=CC=C2Cl)Cl)=C2C21C1=CC(I)=C(O)C(I)=C1OC1=C(I)C(O)=C(I)C=C21 STRXNPAVPKGJQR-UHFFFAOYSA-N 0.000 description 1
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 1
- 229910052911 sodium silicate Inorganic materials 0.000 description 1
- 239000000600 sorbitol Substances 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- LRBQNJMCXXYXIU-NRMVVENXSA-N tannic acid Chemical compound OC1=C(O)C(O)=CC(C(=O)OC=2C(=C(O)C=C(C=2)C(=O)OC[C@@H]2[C@H]([C@H](OC(=O)C=3C=C(OC(=O)C=4C=C(O)C(O)=C(O)C=4)C(O)=C(O)C=3)[C@@H](OC(=O)C=3C=C(OC(=O)C=4C=C(O)C(O)=C(O)C=4)C(O)=C(O)C=3)[C@@H](OC(=O)C=3C=C(OC(=O)C=4C=C(O)C(O)=C(O)C=4)C(O)=C(O)C=3)O2)OC(=O)C=2C=C(OC(=O)C=3C=C(O)C(O)=C(O)C=3)C(O)=C(O)C=2)O)=C1 LRBQNJMCXXYXIU-NRMVVENXSA-N 0.000 description 1
- 229940033123 tannic acid Drugs 0.000 description 1
- 235000015523 tannic acid Nutrition 0.000 description 1
- 229920002258 tannic acid Polymers 0.000 description 1
- PUGUQINMNYINPK-UHFFFAOYSA-N tert-butyl 4-(2-chloroacetyl)piperazine-1-carboxylate Chemical compound CC(C)(C)OC(=O)N1CCN(C(=O)CCl)CC1 PUGUQINMNYINPK-UHFFFAOYSA-N 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- BSYVTEYKTMYBMK-UHFFFAOYSA-N tetrahydrofurfuryl alcohol Chemical compound OCC1CCCO1 BSYVTEYKTMYBMK-UHFFFAOYSA-N 0.000 description 1
- UFDHBDMSHIXOKF-UHFFFAOYSA-N tetrahydrophthalic acid Natural products OC(=O)C1=C(C(O)=O)CCCC1 UFDHBDMSHIXOKF-UHFFFAOYSA-N 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- URAYPUMNDPQOKB-UHFFFAOYSA-N triacetin Chemical compound CC(=O)OCC(OC(C)=O)COC(C)=O URAYPUMNDPQOKB-UHFFFAOYSA-N 0.000 description 1
- 229960002622 triacetin Drugs 0.000 description 1
- 150000003918 triazines Chemical class 0.000 description 1
- UBOXGVDOUJQMTN-UHFFFAOYSA-N trichloroethylene Natural products ClCC(Cl)Cl UBOXGVDOUJQMTN-UHFFFAOYSA-N 0.000 description 1
- 125000003866 trichloromethyl group Chemical group ClC(Cl)(Cl)* 0.000 description 1
- ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 description 1
- 239000013638 trimer Substances 0.000 description 1
- QXJQHYBHAIHNGG-UHFFFAOYSA-N trimethylolethane Chemical compound OCC(C)(CO)CO QXJQHYBHAIHNGG-UHFFFAOYSA-N 0.000 description 1
- AAAQKTZKLRYKHR-UHFFFAOYSA-N triphenylmethane Chemical compound C1=CC=CC=C1C(C=1C=CC=CC=1)C1=CC=CC=C1 AAAQKTZKLRYKHR-UHFFFAOYSA-N 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 229920003169 water-soluble polymer Polymers 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
Landscapes
- Polymerisation Methods In General (AREA)
Description
本発明は光重合性組成物に関するものである。
特に可視領域の光源に対し高感度を示す光重合性
組成物に関するものである。
従来、光重合系利用の画像形成法は多数知られ
ており、例えば付加重合可能なエチレン性二重結
合を含む化合物と光重合開始剤、さらに所望によ
り用いられる有機高分子結合剤、熱重合禁止剤、
着色剤、可塑剤等からなる光重合性組成物を調整
し、この光重合性組成物を無溶媒または溶液とな
し支持体上に塗布して光重合性組成物の層を設け
た感光材料を作成し所望画像を像露光して露光部
分を重合硬化させ未露光部分を溶解除去すること
により硬化レリーフ画像を形成する方法や上述感
光材料が少なくとも一方が透明である2枚の支持
体間に光重合性組成物層を設けたものであり透明
支持体側より像露光し光による接着強度の変化を
惹起させた後支持体を剥離することにより画像を
形成する方法その他光重合性組成物層の光による
トナー附着性の変化を利用した画像作成方法等が
ある。か様な方法に応用される光重合性組成物の
光重合開始剤としては従来、ベンゾイン、ベンゾ
インアルキルエーテル、ベンゾフエノン、アント
ラキノン、ベンジル、あるいはミヒラーケトンな
どが用いられてきた。しかしながら、これらの光
重合開始剤は400nm以下の紫外線領域の光源に対
する光重合開始能力に比較し、400nm以上の可視
光線領域の光源に対するそれは顕著に低く、従つ
てそれらを含む光重合性組成物の応用範囲を著し
く限定してきた。
可視光線に感応する光重合系に関しては従来い
くつかの提案がなされてきた。古くは米国特許第
2850445号によればある種の光還元性染料、例え
ばローズベンガル、エオシン、エリスロシン、リ
ボフラビン等が効果的な可視光感応性を有してい
ると報告している。その后改良技術として染料と
脂肪族アミンの複合開始系(特公昭44−20189)、
ヘキサアリールビイミダゾールとラジカル発生剤
および染料の系(特公昭45−37377)、ヘキサアリ
ールビイミダゾールとp−ジアルキルアミノベン
ジリデンケトンの系(特開昭47−2528、特開昭54
−155292)ヘキサアリールビイミダゾールとイン
ダノンの系(特開昭54−155292)、環状シス−α
−ジカルボニル化合物と染料の系(特開昭48−
84183)、置換トリアジンとメロシアニン色素の系
(特開昭54−151024)などの提案がなされてきた。
これら技術は確かに可視光線に対し有効ではある
が、未だその感光速度は充分満足すべきものでは
なくさらに改良技術が望まれていた。
本発明者らは、上記従来技術の問題点を改良す
べく鋭意検討した結果、特定の組合せから成る光
重合開始系を使用することによつて所期の目的が
達成されることを見い出し、本発明を完成するに
到つた。
すなわち、本発明の要旨は、エチレン性不飽和
二重結合を少なくとも1個有する付加重合可能な
化合物および光重合開始系からなる光重合性組成
物において、該光重合開始系が、(a)一般式
〔式中、R1およびR2はアルキル基を示し、環
Aおよび環Bは置換基を有していてもよいベンゼ
ン環またはナフタリン環を示し、X-は陰イオン
を示し、nは0または1を示す。〕で表わされる
シアニン染料、および(b)一般式
〔式中、R3,R4およびR5は置換基を有してい
てもよいアルキル基またはアリール基、或いは、
アルケニル基、ピペリジノ基、−NR2、−OR、−
SR(ここでRは水素原子、アルキル基を示す。)
を示し、それらのうち少なくとも1つはモノ、ジ
またはトリハロゲン置換メチル基を示す。〕で表
わされるs−トリアジン誘導体を含有することを
特徴とする光重合性組成物に存する。
以下、本発明について詳細に説明する。
本発明の光重合性組成物における第1の必須成
分である光重合開始系について説明する。光重合
開始系は活性光線の照射によりラジカルを発生し
後述のエチレン性不飽和結合を有する化合物の付
加重合反応をもたらすものである。本発明の光重
合開始系は2種類の成分の組合せより成つており
その第1の成分(a)は前記一般式()で表わされ
るシアニン染料である。感度を考慮した場合、前
記一般式()において、環Aおよび環Bの少な
くとも一方が、アルキル基等の置換基で置換され
ていてもよいナフタリン環であるのが好ましい。
具体的には、例えば、1,1−ビス(3−メチ
ル−2−ベンゾチアゾール)メチンシアニン、
1,1−ビス(3−エチル−2−ベンゾチアゾー
ル)メチンシアニン、1−(3−メチル−2−α
−ナフトチアゾール)−1−(3−メチル−2−ベ
ンゾチアゾール)メチンシアニン、1−(3−エ
チル−2−α−ナフトチアゾール)−1−(3−エ
チル−2−ベンゾチアゾール)メチンシアニン、
1−(3−エチル−2−β−ナフトチアゾール)−
1−(3−エチル−2−ベンゾチアゾール)メチ
ンシアニン、1,1−ビス(3−メチル−2−α
−ナフトチアゾール)メチンシアニン、1,1−
ビス(3−エチル−2−α−ナフトチアゾール)
メチンシアニン、1−(3−エチル−2−α−ナ
フトチアゾール)−1−(3−エチル−2−β−ナ
フトチアゾール)メチンシアニン、1,1−ビス
(3−メチル−2−β−ナフトチアゾール)メチ
ンシアニン、1,1−ビス(3−エチル−2−β
−ナフトチアゾール)メチンシアニン、1,3−
ビス(3−メチル−2−ベンゾチアゾール)トリ
メチンシアニン、1−(3−メチル−2−β−ナ
フトチアゾール)−3−(3−メチル−2−ベンゾ
チアゾール)トリメチンシアニン、1,3−ビス
(3−メチル−2−β−ナフトチアゾール)トリ
メチンシアニン等が挙げられる。
特に好適なものとしては、1,1−ビス(3−
エチル−2−α−ナフトチアゾール)メチンシア
ニン、1,1−ビス(3−メチル−2−β−ナフ
トチアゾール)メチンシアニン等が挙げられる。
前記一般式()における対アニオンX-とし
ては、例えば、C-、Br-、I-などのハロゲン
陰イオン、CO4 -、BF4 -、PF6 -など無機陰イ
オン、CH3SO4 -、
The present invention relates to photopolymerizable compositions.
In particular, the present invention relates to a photopolymerizable composition that exhibits high sensitivity to light sources in the visible region. Conventionally, many image forming methods using photopolymerization systems have been known. agent,
A photosensitive material is prepared by preparing a photopolymerizable composition consisting of a colorant, a plasticizer, etc., and applying the photopolymerizable composition without a solvent or as a solution onto a support to provide a layer of the photopolymerizable composition. A method in which a cured relief image is formed by imagewise exposing a desired image, polymerizing and curing the exposed portion, and dissolving and removing the unexposed portion; A method in which a polymerizable composition layer is provided, and an image is formed by imagewise exposure from the side of the transparent support to induce a change in adhesive strength due to light, and then peeling off the support. There are image creation methods that utilize changes in toner adhesion due to Conventionally, benzoin, benzoin alkyl ether, benzophenone, anthraquinone, benzyl, Michler's ketone, etc. have been used as photopolymerization initiators for photopolymerizable compositions applied to such methods. However, the ability of these photoinitiators to initiate photopolymerization against a light source in the visible light region of 400 nm or more is significantly lower than that with a light source in the ultraviolet region of 400 nm or less, and therefore, the ability of photopolymerization initiators containing them to initiate photopolymerization is significantly lower. The scope of application has been severely limited. Several proposals have been made regarding photopolymerization systems sensitive to visible light. Formerly US Patent No.
No. 2850445 reports that certain photoreducible dyes, such as rose bengal, eosin, erythrosin, riboflavin, etc., have effective visible light sensitivity. Later, as an improved technology, a composite initiation system of dye and aliphatic amine (Special Publication No. 44-20189),
A system of hexaarylbiimidazole, a radical generator and a dye (Japanese Patent Publication No. 45-37377), a system of hexaarylbiimidazole and p-dialkylaminobenzylidene ketone (Japanese Patent Publications No. 47-2528, No. 54)
-155292) Hexaarylbiimidazole and indanone system (JP-A-155292), cyclic cis-α
- Dicarbonyl compound and dye system (Unexamined Japanese Patent Publication No. 1973-
84183) and a system of substituted triazine and merocyanine dyes (Japanese Patent Application Laid-Open No. 151024-1983).
Although these techniques are certainly effective for visible light, their photosensitivity is still not fully satisfactory, and further improved techniques have been desired. As a result of intensive studies aimed at improving the problems of the above-mentioned prior art, the present inventors discovered that the intended purpose could be achieved by using a photopolymerization initiation system consisting of a specific combination. He has completed his invention. That is, the gist of the present invention is to provide a photopolymerizable composition comprising an addition-polymerizable compound having at least one ethylenically unsaturated double bond and a photopolymerization initiation system, wherein the photopolymerization initiation system comprises (a) a general formula [In the formula, R 1 and R 2 represent an alkyl group, Ring A and Ring B represent a benzene ring or a naphthalene ring which may have a substituent, X - represents an anion, and n is 0 or 1 is shown. ], and (b) general formula [In the formula, R 3 , R 4 and R 5 are an alkyl group or an aryl group which may have a substituent, or
Alkenyl group, piperidino group, -NR 2 , -OR, -
SR (Here, R represents a hydrogen atom or an alkyl group.)
, at least one of which represents a mono-, di- or trihalogen-substituted methyl group. ] A photopolymerizable composition comprising an s-triazine derivative represented by the following. The present invention will be explained in detail below. The photopolymerization initiation system, which is the first essential component in the photopolymerizable composition of the present invention, will be explained. The photopolymerization initiation system generates radicals by irradiation with actinic rays and brings about an addition polymerization reaction of a compound having an ethylenically unsaturated bond, which will be described later. The photopolymerization initiation system of the present invention consists of a combination of two types of components, the first component (a) of which is a cyanine dye represented by the above general formula (). When sensitivity is considered, it is preferable that at least one of ring A and ring B in the general formula () is a naphthalene ring which may be substituted with a substituent such as an alkyl group. Specifically, for example, 1,1-bis(3-methyl-2-benzothiazole) methinecyanine,
1,1-bis(3-ethyl-2-benzothiazole)methincyanine, 1-(3-methyl-2-α
-naphthothiazole)-1-(3-methyl-2-benzothiazole) methine cyanine, 1-(3-ethyl-2-α-naphthothiazole)-1-(3-ethyl-2-benzothiazole) methine cyanine,
1-(3-ethyl-2-β-naphthothiazole)-
1-(3-ethyl-2-benzothiazole) methinecyanine, 1,1-bis(3-methyl-2-α
-naphthothiazole) methinecyanine, 1,1-
Bis(3-ethyl-2-α-naphthothiazole)
Methinecyanine, 1-(3-ethyl-2-α-naphthothiazole)-1-(3-ethyl-2-β-naphthothiazole)methyncyanine, 1,1-bis(3-methyl-2-β-naphthothiazole) Methinecyanine, 1,1-bis(3-ethyl-2-β
-naphthothiazole) methinecyanine, 1,3-
Bis(3-methyl-2-benzothiazole) trimethine cyanine, 1-(3-methyl-2-β-naphthothiazole)-3-(3-methyl-2-benzothiazole) trimethine cyanine, 1,3- Examples include bis(3-methyl-2-β-naphthothiazole) trimethine cyanine. Particularly preferred is 1,1-bis(3-
Examples include ethyl-2-α-naphthothiazole) methinecyanine and 1,1-bis(3-methyl-2-β-naphthothiazole)methyncyanine. Examples of the counter anion X - in the general formula () include halogen anions such as C - , Br - , and I - , inorganic anions such as CO 4 - , BF 4 - , and PF 6 - , and CH 3 SO 4 -. ,
【式】
CH3COO-などの有機陰イオンが挙げられるがこ
れらはいずれも好適に使用できる。
本発明に用いられるシアニン染料は、例えばJ.
D.Kendall et al,J.chem.Soc.,1503,(1949)
および、Brooker et al,J.Am.Chem.Soc.,57,
547(1935)などに記載されている方法に準じて、
対応する2−メチルベンゾ(ナフト)チアゾー
ル、2−メルカプトベンゾ(ナフト)チアゾール
を原料に用いて合成できる。
第2の成分(b)は前記一般式()で表わされる
少なくとも1つのモノ、ジ、トリハロゲン置換メ
チル基がs−トリアジン環に結合したs−トリア
ジン誘導体であり、例えば、若林ら著、Bull.
Chem.Soc.Japan,42,2924,(1969)、米国特許
3987037号明細書、F.C.Schaefer et al,J.Org.
Chem.,29,1527,(1964)記載の化合物があげ
られる。具体的には、2,4,6−トリス(トリ
クロルメチル)−s−トリアジン、2−メチル−
4,6−ビス(トリクロルメチル)−s−トリア
ジン、2−フエニル−4,6−ビス(トリクロル
メチル)−s−トリアジン、2−(p−クロルフエ
ニル)−4,6−ビス(トリクロルメチル)−s−
トリアジン、2−(2,4−ジクロルフエニル)−
4,6−ビス(トリクロルメチル)−s−トリア
ジン、2−(p−ブロムフエニル)−4,6−ビス
(トリクロルメチル)−s−トリアジン、2−(p
−トリル)−4,6−ビス(トリクロルメチル)−
s−トリアジン、2−(p−メトキシフエニル)−
4,6−ビス(トリクロルメチル)−s−トリア
ジン、2−n−プロピル−4,6−ビス(トリク
ロルメチル)−s−トリアジン、2−(α,α,β
−トリクロルエチル)−4,6−ビス(トリクロ
ルメチル)−s−トリアジン、2−スチリル−4,
6−ビス(トリクロルメチル)−s−トリアジン、
2,4,6−トリス(ジクロルメチル)−s−ト
リアジン、2,4,6−トリス(モノクロルメチ
ル)−s−トリアジン、2−(p−メトキシスチリ
ル)−4,6−ビス(トリクロルメチル)−s−ト
リアジン、2,4,6−トリス(トリブロムメチ
ル)−s−トリアジン、2−メチル−4,6−ビ
ス(トリブロムメチル)−s−トリアジン、2,
4,6−トリス(ジブロムメチル)−s−トリア
ジン、2−メトキシ−4,6−ビス(トリブロム
メチル)−s−トリアジン、2−アミノ−4,6
−ビス(トリブロムメチル)−s−トリアジン、
2−ピペリジノ−4,6−ビス(トリブロムメチ
ル)−s−トリアジン、等があげられる。特に好
適には、2,4,6−トリス(トリクロルメチ
ル)−s−トリアジン、2−フエニル−4,6−
ビス(トリクロルメチル)−s−トリアジン、2
−メチル−4,6−ビス(トリクロルメチル)−
s−トリアジン、2,4,6−トリス(トリブロ
ムメチル)−s−トリアジン等があげられる。こ
れらは、上記文献に従つて、対応するニトリル化
合物を臭化アルミニウムと塩化水素の存在下で反
応させるか、対応するイミデートを経由して合成
することができる。
本発明の光重合開始系は前述の(a),(b)二成分の
組合せによりはじめて顕著な効果を発揮し得る
が、その使用割合は重量比で1:10ないし10:1
の範囲、好ましくは1:4ないし4:1までの範
囲である。また本発明の光重合性組成物に含まれ
る光重合開始系は、エチレン性不飽和二重結合を
少なくとも1個有する付加重合可能な化合物に対
して重量比率で0.1%ないし30%であり、好まし
くは0.5%ないし20%の範囲である。
次に本発明の光重合性組成物の第2の必須成分
であるエチレン性不飽和二重結合を少なくとも1
個有する付加重合可能な化合物について説明す
る。
該化合物は、光重合性組成物が活性光線の照射
を受けた場合、第1の必須成分である光重合開始
系の光分解生成物の作用により付加重合すること
により硬化し実質的に不溶化をもたらすようなエ
チレン性不飽和二重結合を有する単量体、また
は、側鎖みしくは主鎖にエチレン性不飽和二重結
合を有する重合体である。なお、本発明における
単量体の意味するところは、所謂高分子物質に相
対する概念であつて、従つて、狭義の単量体以外
に二量体、三量体、オリゴマーをも包含するもの
である。
エチレン性不飽和結合を有する単量体としては
例えば不飽和カルボン酸、不飽和カルボン酸と脂
肪族ポリヒドロキシ化合物とのエステル、不飽和
カルボン酸と芳香族ポリヒドロキシ化合物とのエ
ステル、不飽和カルボン酸と多価カルボン酸及び
前述の脂肪族ポリヒドロキシ化合物、芳香族ポリ
ヒドロキシ化合物等の多価ヒドロキシ化合物との
エステル化反応により得られるエステル等が挙げ
られる。
不飽和カルボン酸の具体例としてはアクリル
酸、メタクリル酸、イタコン酸、クロトン酸、マ
レイン酸などがある。
脂肪族ポリヒドロキシ化合物としては例えばエ
チレングリコール、ジエチレングリコール、トリ
エチレングリコール、テトラエチレングリコー
ル、ネオペンチルグリコール、プロピレングリコ
ール、1,2−ブタンジオール等の二価アルコー
ル類、トリメチロールエタン、トリメチロールプ
ロパン、グリセロール等の三価アルコール、ペン
タエリスリトール、トリペンタエリスリトール等
の四価以上のアルコール類、ジヒドロキシマレイ
ン酸等の多価ヒドロキシカルボン酸類がある。
芳香族ポリヒドロキシ化合物としてはハイドロ
キノン、レゾルシン、カテコール、ピロガロール
等がある。
多価カルボン酸としては、フタル酸、イソフタ
ル酸、テレフタル酸、テトラクロルフタル酸、ト
リメリツト酸、ピロメリツト酸、ベンゾフエノン
ジカルボン酸、マレイン酸、フマル酸、マロン
酸、グルタール酸、アジピン酸、セバシン酸、テ
トラヒドロフタル酸等がある。
脂肪族ポリヒドロキシ化合物と不飽和カルボン
酸とのエステルの具体例としては、エチレングリ
コールジアクリレート、トリエチレングリコール
ジアクリレート、テトラメチレングリコールジア
クリレート、トリメチロールプロパントリアクリ
レート、トリメチロールエタントリアクリレー
ト、ペンタエリスリトールジアクリレート、ペン
タエリスリトールトリアクリレート、ペンタエリ
スリトールテトラアクリレート、ジペンタエリス
リトールテトラアクリレート、ジペンタエリスリ
トールペンタアクリレート、ジペンタエリスリト
ールヘキサアクリレート、トリペンタエリスリト
ールオクタアクリレート、グリセロールジアクリ
レート等のアクリル酸エステル、トリエチレング
リコールジメタクリレート、テトラメチレングリ
コールジメタクリレート、トリメチロールプロパ
ントリメタクリレート、トリメチロールエタント
リメタクリレート、ペンタエリスリトールジメタ
クリレート、ペンタエリスリトールトリメタクリ
レート、ペンタエリスリトールテトラアクリレー
ト、ジペンタエリスリトールジメタクリレート、
ジペンタエリスリトールトリメタクリレート、ジ
ペンタエリスリトールテトラメタクリレート、ト
リペンタエリスリトールオクタメタクリレート、
エチレングリコールジメタクリレート、1,2−
ブタンジオールジメタクリレート、ソルビト−ル
テトラメタクリレート等のメタクリル酸エステ
ル、エチレングリコールジイタコネート、プロピ
レングリコールジイタコネート、1,2−ブタン
ジオールジイタコネート、テトメチレングリコー
ルジイタコネート、ペンタエリスリトールトリイ
タコネート等のイタコン酸エステル、エチレング
リコールジクロトネート、ジエチレングリコール
ジクロトネート、ペンタエリスリトールテトラク
ロトネート等のクロトン酸エステル、エチレング
リコールジマレエート、トリエチレングリコール
ジマレエート、ペンタエリスリトールジマレエー
ト等のマレイン酸エステルがある。
芳香族ポリヒドロキシ化合物と不飽和カルボン
酸とのエステルとしては、ハイドロキノンジアク
リレート、ハイドロキノンジメタクリレート、レ
ゾルシンジアクリレート、レゾルシンジメタクリ
レート、ピロガロールトリアクリレート等が挙げ
られる。
不飽和カルボン酸と多価カルボン酸及び多価ヒ
ドロキシ化合物とのエステル化反応により得られ
るエステルとしては必ずしも単一物では無いが代
表的な具体例を表1に記す。表中のZはアクリロ
イル基またはメタクリロイル基を示す。[Formula] Examples include organic anions such as CH 3 COO - , and any of these can be suitably used. The cyanine dye used in the present invention is, for example, J.
D.Kendall et al, J.chem.Soc., 1503, (1949)
and Brooker et al, J.Am.Chem.Soc., 57 ,
547 (1935), etc.,
It can be synthesized using the corresponding 2-methylbenzo(naphtho)thiazole and 2-mercaptobenzo(naphtho)thiazole as raw materials. The second component (b) is an s-triazine derivative in which at least one mono-, di-, or trihalogen-substituted methyl group represented by the general formula () is bonded to an s-triazine ring. .
Chem.Soc.Japan, 42 , 2924, (1969), US Patent
No. 3987037, FCSchaefer et al, J.Org.
Chem., 29 , 1527, (1964). Specifically, 2,4,6-tris(trichloromethyl)-s-triazine, 2-methyl-
4,6-bis(trichloromethyl)-s-triazine, 2-phenyl-4,6-bis(trichloromethyl)-s-triazine, 2-(p-chlorophenyl)-4,6-bis(trichloromethyl)- s-
Triazine, 2-(2,4-dichlorophenyl)-
4,6-bis(trichloromethyl)-s-triazine, 2-(p-bromphenyl)-4,6-bis(trichloromethyl)-s-triazine, 2-(p-bromphenyl)-4,6-bis(trichloromethyl)-s-triazine
-tolyl)-4,6-bis(trichloromethyl)-
s-triazine, 2-(p-methoxyphenyl)-
4,6-bis(trichloromethyl)-s-triazine, 2-n-propyl-4,6-bis(trichloromethyl)-s-triazine, 2-(α,α,β
-trichloroethyl)-4,6-bis(trichloromethyl)-s-triazine, 2-styryl-4,
6-bis(trichloromethyl)-s-triazine,
2,4,6-tris(dichloromethyl)-s-triazine, 2,4,6-tris(monochloromethyl)-s-triazine, 2-(p-methoxystyryl)-4,6-bis(trichloromethyl)- s-triazine, 2,4,6-tris(tribromomethyl)-s-triazine, 2-methyl-4,6-bis(tribromomethyl)-s-triazine, 2,
4,6-tris(dibromomethyl)-s-triazine, 2-methoxy-4,6-bis(tribromomethyl)-s-triazine, 2-amino-4,6
-bis(tribromomethyl)-s-triazine,
Examples include 2-piperidino-4,6-bis(tribromomethyl)-s-triazine. Particularly preferred are 2,4,6-tris(trichloromethyl)-s-triazine, 2-phenyl-4,6-
Bis(trichloromethyl)-s-triazine, 2
-Methyl-4,6-bis(trichloromethyl)-
Examples include s-triazine, 2,4,6-tris(tribromomethyl)-s-triazine, and the like. These can be synthesized by reacting the corresponding nitrile compound with aluminum bromide in the presence of hydrogen chloride or via the corresponding imidate, according to the above-mentioned literature. The photopolymerization initiation system of the present invention can only exhibit remarkable effects by combining the two components (a) and (b) described above, and the ratio of their use is 1:10 to 10:1 by weight.
preferably from 1:4 to 4:1. The photopolymerization initiation system contained in the photopolymerizable composition of the present invention is preferably 0.1% to 30% by weight of the addition polymerizable compound having at least one ethylenically unsaturated double bond. ranges from 0.5% to 20%. Next, at least one ethylenically unsaturated double bond, which is the second essential component of the photopolymerizable composition of the present invention, is added.
The addition-polymerizable compound possessed by the compound will be explained. When the photopolymerizable composition is irradiated with actinic rays, the compound undergoes addition polymerization due to the action of the photodecomposition product of the photopolymerization initiation system, which is the first essential component, thereby curing and substantially rendering it insolubilized. It is a monomer having an ethylenically unsaturated double bond such as the one that gives rise to the formation of a compound, or a polymer having an ethylenically unsaturated double bond in its side chain or main chain. In addition, what is meant by monomer in the present invention is a concept that is opposed to a so-called polymer substance, and therefore includes dimers, trimers, and oligomers in addition to monomers in the narrow sense. It is. Examples of monomers having ethylenically unsaturated bonds include unsaturated carboxylic acids, esters of unsaturated carboxylic acids and aliphatic polyhydroxy compounds, esters of unsaturated carboxylic acids and aromatic polyhydroxy compounds, and unsaturated carboxylic acids. Examples include esters obtained by an esterification reaction between a polyhydric carboxylic acid and a polyhydric hydroxy compound such as the aforementioned aliphatic polyhydroxy compound or aromatic polyhydroxy compound. Specific examples of unsaturated carboxylic acids include acrylic acid, methacrylic acid, itaconic acid, crotonic acid, and maleic acid. Examples of aliphatic polyhydroxy compounds include dihydric alcohols such as ethylene glycol, diethylene glycol, triethylene glycol, tetraethylene glycol, neopentyl glycol, propylene glycol, and 1,2-butanediol, trimethylolethane, trimethylolpropane, and glycerol. These include trihydric alcohols such as, tetrahydric or higher alcohols such as pentaerythritol and tripentaerythritol, and polyhydric hydroxycarboxylic acids such as dihydroxymaleic acid. Examples of aromatic polyhydroxy compounds include hydroquinone, resorcinol, catechol, and pyrogallol. Examples of polycarboxylic acids include phthalic acid, isophthalic acid, terephthalic acid, tetrachlorophthalic acid, trimellitic acid, pyromellitic acid, benzophenone dicarboxylic acid, maleic acid, fumaric acid, malonic acid, glutaric acid, adipic acid, and sebacic acid. , tetrahydrophthalic acid, etc. Specific examples of esters of aliphatic polyhydroxy compounds and unsaturated carboxylic acids include ethylene glycol diacrylate, triethylene glycol diacrylate, tetramethylene glycol diacrylate, trimethylolpropane triacrylate, trimethylolethane triacrylate, and pentaerythritol. Acrylic acid esters such as diacrylate, pentaerythritol triacrylate, pentaerythritol tetraacrylate, dipentaerythritol tetraacrylate, dipentaerythritol pentaacrylate, dipentaerythritol hexaacrylate, tripentaerythritol octaacrylate, glycerol diacrylate, triethylene glycol diacrylate, etc. Methacrylate, tetramethylene glycol dimethacrylate, trimethylolpropane trimethacrylate, trimethylolethane trimethacrylate, pentaerythritol dimethacrylate, pentaerythritol trimethacrylate, pentaerythritol tetraacrylate, dipentaerythritol dimethacrylate,
dipentaerythritol trimethacrylate, dipentaerythritol tetramethacrylate, tripentaerythritol octamethacrylate,
Ethylene glycol dimethacrylate, 1,2-
Methacrylic acid esters such as butanediol dimethacrylate and sorbitol tetramethacrylate, ethylene glycol diitaconate, propylene glycol diitaconate, 1,2-butanediol diitaconate, tettomethylene glycol diitaconate, pentaerythritol triitaconate Itaconic acid esters such as ethylene glycol dicrotonate, diethylene glycol dicrotonate, crotonic acid esters such as pentaerythritol tetracrotonate, maleic acids such as ethylene glycol dimaleate, triethylene glycol dimaleate, pentaerythritol dimaleate, etc. There is an ester. Examples of esters of aromatic polyhydroxy compounds and unsaturated carboxylic acids include hydroquinone diacrylate, hydroquinone dimethacrylate, resorcin diacrylate, resorcin dimethacrylate, and pyrogallol triacrylate. The ester obtained by the esterification reaction of an unsaturated carboxylic acid with a polyhydric carboxylic acid and a polyhydric hydroxy compound is not necessarily a single product, but typical examples are shown in Table 1. Z in the table represents an acryloyl group or a methacryloyl group.
【表】
その他本発明に用いられるエチレン性不飽和二
重結合を有する化合物の例としてはアクリルアミ
ド、エチレンビスアクリルアミド、ヘキサメチレ
ンビスアクリルアミド等のアクリルアミド類、エ
チレンビスメタクリルアミド、ヘキサメチレンビ
スメタクリルアミド等のメタクリルアミド類、フ
タル酸ジアリル、マロン酸ジアリル、フマル酸ジ
アリル、トリアリルイソシアヌレート等のアリル
エステル類、ジビニルアジベート、ジビニルフタ
レート、エチレングリコールジビニルエーテル等
のビニール含有化合物が挙げられる。
主鎖にエチレン性不飽和結合を有する重合体は
例えば不飽和二価カルボン酸とジヒドロキシ化合
物との重縮合反応により得られるポリエステル、
不飽和二価カルボン酸とジアミンとの重縮合反応
により得られるポリアミド等がある。本発明で使
用するこれら重合体は、通常、10000〜100000の
分子量を有する。不飽和二価カルボン酸としては
マレイン酸、フマール酸などが挙げられる。側鎖
にエチレン性不飽和結合を有する重合体は側鎖に
不飽和結合をもつ二価カルボン酸例えばイタコン
酸、α−メチルイタコン酸、γ−メチルイタコン
酸、プロピリデンコハク酸、α−エチリデングル
タン酸、エチリデンマロン酸、プロピリデンマロ
ン酸等とジヒドロキシ化合物との重縮合反応によ
り得られるポリエステル、ジアミンとの重縮合反
応により得られるポリアミド等がある。また側鎖
にヒドロキシ基やハロゲン化メチル基の如き反応
活性を有する官能基をもつ重合体と(メタ)アク
リル酸、クロトン酸の様な不飽和カルボン酸との
高分子反応により得られるポリマーも好適に使用
し得る。前記の反応活性を有する官能基をもつ重
合体としてはポリビニルアルコール、ビニルアル
コールと酢酸ビニルとの共重合体、ビニルアルコ
ールとアクリロニトリル、スチレン、塩化ビニ
ル、塩化ビニリデン等との共重合体、ポリエピク
ロルヒドリン、2−ヒドロキシエチルメタクリレ
ートとアクリロニトリル、メチルメタクリレー
ト、ブチルメタクリレート、スチレン、塩化ビニ
リデン、酢酸ビニル等との共重合体、エピクロル
ヒドリンと2,2−ビス(4−ヒドロキシフエニ
ル)−プロパンとの反応により得られるポリエー
テル、ポリ(4−ヒドロキシスチレン)、ポリ
(N−メチロールアクリルアミド)などが挙げら
れる。
以上記載したエチレン性不飽和二重結合を少な
くとも1個有する付加重合可能な化合物の内、ア
クリル酸エステル類またはメタクリル酸エステル
類の単量体が特に好適に使用できる。
本発明の光重合性組成物は前記した光重合開始
系とエチレン性不飽和結合を有する化合物とを必
須成分として含有するが、本組成物の改質、光硬
化後の物性改善の為に結合剤として有機高分子物
質を更に添加することができる。結合剤は相溶
性、皮膜形成性、現像性、接着性等改善目的に応
じて適宜選択すればよい。具体的には例えば水系
現像性改善には(メタ)アクリル酸共重合体、イ
タコン酸共重合体、部分エステル化マレイン酸共
重合体、側鎖にカルボキシル基を有する酸性セル
ロース変性物、ポリエチレンオキシド、ポリビニ
ルピロリドン等があり、皮膜強度、接着性の改善
にはエピクロロヒドリンとビスフエノールAとの
ポリエーテル、可溶性ナイロン、ポリメチルメタ
クリレートの様なポリメタクリル酸アルキルやポ
リアクリル酸アルキル、メタクリル酸アルキルと
アクリロニトリル、アクリル酸、メタクリル酸、
塩化ビニル、塩化ビニリデン、スチレン等との共
重合体、アクリロニトリルと塩化ビニル、塩化ビ
ニリデンとの共重合体、塩化ビニリデン、塩素化
ポリオレフイン、塩化ビニルと酢酸ビニルとの共
重合体、ポリ酢酸ビニル、アクリロニトリルとス
チレンとの共重合体、アクリロニトリルとブタジ
エン、スチレンとの共重合体、ポリビニルアルキ
ルエーテル、ポリビニルアルキルケトン、ポリス
チレン、ポリアミド、ポリウレタン、ポリエチレ
ンテレフタレートイソフタレート、アセチルセル
ローズポリビニルブチラール等を挙げることがで
きる。これらの結合剤はエチレン結合を有する化
合物に対し重量比率で500%以下、好ましくは200
%以下の範囲で添加混合することができる。
本発明の光重合性組成物は必要に応じ更に熱重
合防止剤、着色剤、可塑剤、表面保護剤、平滑
剤、塗布助剤等添加することができる。
熱重合防止剤としては例えばハイドロキノン、
p−メトキシフエノール、ピロガロール、カテコ
ール、2,6−ジ−t−ブチル−p−クレゾー
ル、β−ナフトールなどがあり、着色剤としては
例えばフタロシアニン系顔料、アゾ系顔料、カー
ボンブラツク、酸化チタンなどの顔料、トリフエ
ニルメタン系染料、アゾ系染料、アントラキノン
系染料がある。これら熱重合防止剤や着色剤の添
加量はエチレン性不飽和二重結合を有する化合物
の結合剤との合計重量に対し熱重合防止剤が0.01
%ないし3%、着色剤0.001%ないし10%が好ま
しい。可塑剤としては例えばジオクチルフタレー
ト、ジドデシルフタレート、ジブチルフタレー
ト、ブチルベンジルフタレート、トリエチレング
リコールジカプリレート、ジメチルグリコールフ
タレート、トリクレジルホスフエート、ジオクチ
ルアジペート、ジブチルアジペート、ジブチルセ
バケート、ジブチルマレエート、トリアセチルグ
リセリン等がありエチレン性不飽和二重結合基を
有する化合物と結合剤との合計重量に対し5%以
下添加することができる。
本発明の光重合性組成物は無溶剤にて感光材料
を形成するかまたは適当な溶剤に溶解して溶液と
なしこれを支持体上に塗布、乾燥して感光材料を
調整する。溶剤としては例えばメチルエチルケト
ン、アセトン、シクロヘキサノン、酢酸エチル、
酢酸ブチル、酢酸アミル、プロピオン酸エチル、
トルエン、キシレン、ベンゼン、モノクロロベン
ゼン、クロロホルム、四塩化炭素、トリクロロエ
チレン、トリクロロエタン、ジメチルホルムアミ
ド、メチルセロソルブ、エチルセロソルブ、テト
ラヒドロフラン、ペントキソン、メタノール、エ
タノール、プロパノール等がある。
本発明の光重合性組成物を用いて感光材料を調
整する際に適用される支持体としては例えばアル
ミニウム、マグネシウム、銅、亜鉛、クロム、ニ
ツケル、鉄等の金属またはそれらを主成分とした
合金のシート、上質紙、アート紙、剥離紙の様な
紙類、ガラス、セラミツクスの如き無機シート、
ポリエチレンテレフタレート、ポリエチレン、ポ
リメチルメタクリレート、塩化ビニル、塩化ビニ
ル−塩化ビニリデン共重合体、ポリスチレン、6
−ナイロン、6,6−ナイロン、セルロースジア
セテート、セルローストリアセテート、セルロー
スアセテートブチレートの様なポリマーシートな
どがある。これらの支持体は感光層の両側に適用
する場合もあり、また接着強度を調節する為に表
面処理を施してもよい。
また本発明の光重合性組成物はさらに酸素によ
る感度低下や保存安定性の劣化等の悪影響を防止
する為の公知技術、例えば、感光層上に剥離可能
な透明カバーシートを設けたり酸素透過性の小さ
いロウ状物質、水溶性、又はアルカリ水溶性ポリ
マー等による被覆層を設けることもできる。
本発明の組成物に適用し得る露光光源としては
カーボンアーク、高圧水銀燈、キセノンランプ、
メタルハライドランプ、螢光ランプ、タングステ
ンランプ、アルゴンイオンレーザー、ヘリウムカ
ドミウムレーザー、クリプトンレーザー等180nm
以上の紫外線、可視光線を含む汎用の光源を好適
に使用し得る。
本発明の光重合性組成物は広範囲な応用分野に
有用であつて例えば平版、凹版、凸版、レーザー
製版用の印刷版等の作成、プリント配線やICの
作成の為のフオトレジスト、レリーフ像や画像複
製などの画像形成、光硬化のインク、塗料、接着
剤等に利用できるが特に可視光線の光源を用いる
応用分野に有効である。
以下、本発明を実施例ならびに比較例により具
体的に説明するが、本発明はこれら実施例に限定
されるものではない。
なお、光重合開始系の成分は次の略号により記
載した。
式中、Meはメチル基を示し、Etはエチル基を
示す。
実施例1〜9、比較例1〜6
ポリメチルメタクリレートBR−83(三菱レイ
ヨン社製)を常法により8mol%部分加水分解し
て得たメチルメタクリレート/メタクリル酸共重
合体(結合剤)2.9gおよびペンタエリスリトール
トリアクリレート(大阪有機化学工業社製)
6.8g、p−メトキシフエノール18mgをメチルエ
チルケトン80gに溶解し感光液原液を調製した。
この感光液原液に表に示す光重合開始系の各成
分を0.25gずつ添加し、室温で不溶分がある場合
はこれをデカントで除去した。得られた感光液
を、砂目立てかつ陽極酸化を施したアルミニウム
シート上にホワラーを用い乾燥膜厚20mg/dm2
となる様に塗布し、次いで60℃、3分間乾燥し
た。この表面に更にポリビニルアルコールGL−
05(日本合成社製)6重量%水溶液をホワラーを
用いて乾燥膜厚20mg/dm2となるよう塗布し試
料を作成した。得られた試料に、ステツプタブレ
ツト(イーストマンコダツク社製)を重ねキセノ
ンランプ光源から干渉フイルタ−KL−49および
シヤープカツトフイルタ−Y−47(共に東芝ガラ
ス社製)の両者を通して得られる490mm前後の波
長の光線(光強度2mw/cm2)を60秒間照射した。
次いでブチルセロソルブ9重量%、ケイ酸ナトリ
ウム1重量%を含む水溶液を用いて未露光部を溶
解除去し得られた光硬化画像の段数により感度を
測定した。結果を表2に示す。[Table] Examples of other compounds having ethylenically unsaturated double bonds that can be used in the present invention include acrylamides such as acrylamide, ethylenebisacrylamide, hexamethylenebisacrylamide, ethylenebismethacrylamide, hexamethylenebismethacrylamide, etc. Examples include allyl esters such as methacrylamides, diallyl phthalate, diallyl malonate, diallyl fumarate, and triallylisocyanurate, and vinyl-containing compounds such as divinyl adibate, divinyl phthalate, and ethylene glycol divinyl ether. Polymers having ethylenically unsaturated bonds in the main chain include, for example, polyesters obtained by a polycondensation reaction of unsaturated dihydric carboxylic acids and dihydroxy compounds;
Examples include polyamides obtained by a polycondensation reaction of unsaturated dihydric carboxylic acids and diamines. These polymers used in the present invention usually have a molecular weight of 10,000 to 100,000. Examples of unsaturated dihydric carboxylic acids include maleic acid and fumaric acid. Polymers having ethylenically unsaturated bonds in their side chains include dicarboxylic acids having unsaturated bonds in their side chains, such as itaconic acid, α-methyl itaconic acid, γ-methyl itaconic acid, propylidenesuccinic acid, and α-ethylidene glycol. Examples include polyester obtained by a polycondensation reaction of tannic acid, ethylidenemalonic acid, propylidenemalonic acid, etc. with a dihydroxy compound, and polyamide obtained by a polycondensation reaction of a diamine. Also suitable are polymers obtained by a polymer reaction between a polymer having a reactive functional group such as a hydroxyl group or a halogenated methyl group in its side chain and an unsaturated carboxylic acid such as (meth)acrylic acid or crotonic acid. It can be used for Examples of polymers having functional groups having reactive activity include polyvinyl alcohol, copolymers of vinyl alcohol and vinyl acetate, copolymers of vinyl alcohol and acrylonitrile, styrene, vinyl chloride, vinylidene chloride, etc., polyepichlorohydrin, Copolymers of 2-hydroxyethyl methacrylate and acrylonitrile, methyl methacrylate, butyl methacrylate, styrene, vinylidene chloride, vinyl acetate, etc., obtained by reaction of epichlorohydrin and 2,2-bis(4-hydroxyphenyl)-propane Examples include polyether, poly(4-hydroxystyrene), poly(N-methylolacrylamide), and the like. Among the addition-polymerizable compounds having at least one ethylenically unsaturated double bond described above, monomers of acrylic esters or methacrylic esters can be particularly preferably used. The photopolymerizable composition of the present invention contains the above-described photopolymerization initiation system and a compound having an ethylenically unsaturated bond as essential components. An organic polymer substance can be further added as an agent. The binder may be appropriately selected depending on the purpose of improving compatibility, film-forming properties, developability, adhesion, etc. Specifically, for example, to improve water-based developability, (meth)acrylic acid copolymers, itaconic acid copolymers, partially esterified maleic acid copolymers, acidic cellulose modified products having carboxyl groups in side chains, polyethylene oxide, Polyvinylpyrrolidone, etc. are used, and to improve film strength and adhesion, polyethers of epichlorohydrin and bisphenol A, soluble nylon, polyalkyl methacrylates such as polymethyl methacrylate, polyalkyl acrylates, and alkyl methacrylates are used. and acrylonitrile, acrylic acid, methacrylic acid,
Copolymers of vinyl chloride, vinylidene chloride, styrene, etc., copolymers of acrylonitrile and vinyl chloride, vinylidene chloride, vinylidene chloride, chlorinated polyolefins, copolymers of vinyl chloride and vinyl acetate, polyvinyl acetate, acrylonitrile and styrene copolymers, acrylonitrile and butadiene, styrene copolymers, polyvinyl alkyl ethers, polyvinyl alkyl ketones, polystyrene, polyamides, polyurethanes, polyethylene terephthalate isophthalate, acetyl cellulose polyvinyl butyral, and the like. The weight ratio of these binders to the compound having an ethylene bond is 500% or less, preferably 200%.
% or less. The photopolymerizable composition of the present invention may further contain thermal polymerization inhibitors, colorants, plasticizers, surface protectants, smoothing agents, coating aids, etc., as required. Examples of thermal polymerization inhibitors include hydroquinone,
Examples of colorants include p-methoxyphenol, pyrogallol, catechol, 2,6-di-t-butyl-p-cresol, and β-naphthol. Examples of colorants include phthalocyanine pigments, azo pigments, carbon black, and titanium oxide. There are pigments, triphenylmethane dyes, azo dyes, and anthraquinone dyes. The addition amount of these thermal polymerization inhibitors and coloring agents is 0.01% of the total weight of the compound having an ethylenically unsaturated double bond and the binder.
% to 3%, colorant 0.001% to 10% is preferred. Examples of plasticizers include dioctyl phthalate, didodecyl phthalate, dibutyl phthalate, butylbenzyl phthalate, triethylene glycol dicaprylate, dimethyl glycol phthalate, tricresyl phosphate, dioctyl adipate, dibutyl adipate, dibutyl sebacate, dibutyl maleate, Triacetylglycerin and the like can be added in an amount of 5% or less based on the total weight of the compound having an ethylenically unsaturated double bond group and the binder. The photopolymerizable composition of the present invention can be used to form a photosensitive material in the absence of a solvent, or can be dissolved in a suitable solvent to form a solution, which is coated on a support and dried to prepare a photosensitive material. Examples of solvents include methyl ethyl ketone, acetone, cyclohexanone, ethyl acetate,
Butyl acetate, amyl acetate, ethyl propionate,
Examples include toluene, xylene, benzene, monochlorobenzene, chloroform, carbon tetrachloride, trichloroethylene, trichloroethane, dimethylformamide, methyl cellosolve, ethyl cellosolve, tetrahydrofuran, pentoxone, methanol, ethanol, propanol, and the like. Examples of the support used when preparing a photosensitive material using the photopolymerizable composition of the present invention include metals such as aluminum, magnesium, copper, zinc, chromium, nickel, and iron, or alloys containing these as main components. sheets, high-quality paper, art paper, paper such as release paper, glass, inorganic sheets such as ceramics,
Polyethylene terephthalate, polyethylene, polymethyl methacrylate, vinyl chloride, vinyl chloride-vinylidene chloride copolymer, polystyrene, 6
- Polymer sheets such as nylon, 6,6-nylon, cellulose diacetate, cellulose triacetate, cellulose acetate butyrate, etc. These supports may be applied to both sides of the photosensitive layer, and may be surface-treated to adjust the adhesive strength. In addition, the photopolymerizable composition of the present invention can be further processed using known techniques to prevent negative effects such as decreased sensitivity and storage stability due to oxygen, such as providing a removable transparent cover sheet on the photosensitive layer or providing oxygen permeability. It is also possible to provide a coating layer made of a waxy substance having a small amount of water, a water-soluble or alkali water-soluble polymer, or the like. Exposure light sources that can be applied to the composition of the present invention include carbon arc, high pressure mercury lamp, xenon lamp,
180nm metal halide lamp, fluorescent lamp, tungsten lamp, argon ion laser, helium cadmium laser, krypton laser, etc.
General-purpose light sources including the above-mentioned ultraviolet rays and visible rays can be suitably used. The photopolymerizable composition of the present invention is useful in a wide range of application fields, such as the production of printing plates for planography, intaglio, letterpress, and laser engraving, photoresists for production of printed wiring and ICs, relief images, etc. It can be used for image formation such as image duplication, photocurable ink, paint, adhesive, etc., and is particularly effective in application fields that use a visible light source. EXAMPLES The present invention will be specifically explained below using Examples and Comparative Examples, but the present invention is not limited to these Examples. The components of the photopolymerization initiation system are indicated by the following abbreviations. In the formula, Me represents a methyl group and Et represents an ethyl group. Examples 1 to 9, Comparative Examples 1 to 6 2.9 g of methyl methacrylate/methacrylic acid copolymer (binder) obtained by partially hydrolyzing 8 mol% polymethyl methacrylate BR-83 (manufactured by Mitsubishi Rayon Co., Ltd.) using a conventional method. and pentaerythritol triacrylate (manufactured by Osaka Organic Chemical Industry Co., Ltd.)
A photosensitive solution stock solution was prepared by dissolving 6.8 g of p-methoxyphenol and 18 mg of p-methoxyphenol in 80 g of methyl ethyl ketone. To this photosensitive liquid stock solution, 0.25 g of each component of the photopolymerization initiation system shown in the table was added, and if there was any insoluble matter at room temperature, this was removed by decantation. The resulting photosensitive solution was applied to a grained and anodized aluminum sheet using a whirler to give a dry film thickness of 20 mg/dm 2
It was coated so that the coating was applied and then dried at 60°C for 3 minutes. This surface is further coated with polyvinyl alcohol GL-
A sample was prepared by applying a 6% by weight aqueous solution of 05 (manufactured by Nippon Gosei Co., Ltd.) using a whirler to a dry film thickness of 20 mg/dm 2 . A step tablet (manufactured by Eastman Kodak Co., Ltd.) was placed on the obtained sample, and a 490 mm beam was obtained from a xenon lamp light source through both an interference filter KL-49 and a sharp cut filter Y-47 (both manufactured by Toshiba Glass Co., Ltd.). Light beams of different wavelengths (light intensity 2 mw/cm 2 ) were irradiated for 60 seconds.
Next, the unexposed areas were dissolved and removed using an aqueous solution containing 9% by weight of butyl cellosolve and 1% by weight of sodium silicate, and the sensitivity was measured by the number of stages of the resulting photocured image. The results are shown in Table 2.
【表】
実施例10〜19、比較例7〜12
実施例1において露光条件として436nmの波長
の光線を用いた以外は同実施例の方法により評価
した。結果を表3に示す。[Table] Examples 10 to 19, Comparative Examples 7 to 12 Evaluations were made according to the method of Example 1 except that a light beam with a wavelength of 436 nm was used as the exposure condition. The results are shown in Table 3.
【表】【table】
【表】
実施例20,21、比較例13,14
実施例1において露光条件として600nmの波長
の光線を用い露光時間を2倍とした以外は同実施
例の方法により評価した。結果を表4に示す。[Table] Examples 20, 21, Comparative Examples 13, 14 Evaluation was carried out according to the method of Example 1, except that the exposure condition was to use a light beam with a wavelength of 600 nm and the exposure time was doubled. The results are shown in Table 4.
【表】
実施例22〜25、比較例15〜18
実施例1において露光条件として1mの距離を
おいて3KWの高圧水銀燈を10秒間照射した以外
は同実施例の方法により評価した。結果を表4に
示す。[Table] Examples 22 to 25, Comparative Examples 15 to 18 Evaluation was performed according to the method of Example 1, except that the exposure condition was irradiation with a 3KW high-pressure mercury lamp for 10 seconds at a distance of 1 m. The results are shown in Table 4.
【表】
実施例26,27、比較例19,20
ジアリルフタレートプレポリマー ダツプKタ
イプ(大阪曹達社製)9.7g、p−メトキシフエノ
ール18mgをメチルエチルケトン80gに溶解し感光
液原液を調製した。この感光液原液に表5に示す
光重合開始系の各成分を0.25gずつ添加し、室温
で不溶分がある場合は、これをデカントで除去し
た。得られた感光液を、砂目立てかつ陽極酸化を
施したアルミニウムシート上にホワラーを用い乾
燥膜厚20mg/dm2となる様に塗布し、次いで60
℃、3分間乾燥した。得られた試料にステツプタ
ブレツト(イーストマンコダツク社製)を重ね、
焼枠を真空に引いて3KW高圧水銀燈を光源とし
て8分間露光した。次いでベンジルアルコール
35g、テトラヒドロフルフリルアルコール20g、
85%リン酸4g、グリセリン2g、水28gよりなる液
体で未露光部を溶解除去し得られた光硬化画像の
段数により感度を測定した。結果を表5に示す。[Table] Examples 26 and 27, Comparative Examples 19 and 20 A photosensitive liquid stock solution was prepared by dissolving 9.7 g of diallyl phthalate prepolymer Dap K type (manufactured by Osaka Soda Co., Ltd.) and 18 mg of p-methoxyphenol in 80 g of methyl ethyl ketone. To this photosensitive solution stock solution, 0.25 g of each component of the photopolymerization initiation system shown in Table 5 was added, and if there was any insoluble matter at room temperature, this was removed by decantation. The resulting photosensitive solution was applied onto a grained and anodized aluminum sheet using a whirler to give a dry film thickness of 20 mg/dm 2 .
℃ for 3 minutes. A step tablet (manufactured by Eastman Kodak Co., Ltd.) was placed on the obtained sample,
The baking frame was evacuated and exposed for 8 minutes using a 3KW high-pressure mercury lamp as the light source. Then benzyl alcohol
35g, tetrahydrofurfuryl alcohol 20g,
Sensitivity was measured by the number of steps in the photocured image obtained by dissolving and removing the unexposed areas with a liquid consisting of 4 g of 85% phosphoric acid, 2 g of glycerin, and 28 g of water. The results are shown in Table 5.
Claims (1)
有する付加重合可能な化合物および光重合開始系
からなる光重合性組成物において、該光重合開始
系が、(a)一般式 〔式中、R1およびR2はアルキル基を示し、環
Aおよび環Bは置換基を有していてもよいベンゼ
ン環またはナフタリン環を示し、X-は陰イオン
を示し、nは0または1を示す。〕で表わされる
シアニン染料、および(b)一般式 〔式中、R3,R4およびR5は置換基を有してい
てもよいアルキル基またはアリール基、或いは、
アルケニル基、ピペリジノ基、−NR2、−OR、−
SR(ここでRは水素原子、アルキル基を示す。)
を示し、それらのうち少なくとも1つはモノ、ジ
またはトリハロゲン置換メチル基を示す。〕で表
わされるs−トリアジン誘導体を含有することを
特徴とする光重合性組成物。[Scope of Claims] 1. A photopolymerizable composition comprising an addition polymerizable compound having at least one ethylenically unsaturated double bond and a photopolymerization initiation system, wherein the photopolymerization initiation system has (a) the general formula [In the formula, R 1 and R 2 represent an alkyl group, Ring A and Ring B represent a benzene ring or a naphthalene ring which may have a substituent, X - represents an anion, and n is 0 or 1 is shown. ], and (b) general formula [In the formula, R 3 , R 4 and R 5 are an alkyl group or an aryl group which may have a substituent, or
Alkenyl group, piperidino group, -NR 2 , -OR, -
SR (Here, R represents a hydrogen atom or an alkyl group.)
, at least one of which represents a mono-, di- or trihalogen-substituted methyl group. A photopolymerizable composition comprising an s-triazine derivative represented by the following.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12840681A JPS5829803A (en) | 1981-08-17 | 1981-08-17 | Photopolymerizable composition |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12840681A JPS5829803A (en) | 1981-08-17 | 1981-08-17 | Photopolymerizable composition |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5829803A JPS5829803A (en) | 1983-02-22 |
JPH0320402B2 true JPH0320402B2 (en) | 1991-03-19 |
Family
ID=14983993
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP12840681A Granted JPS5829803A (en) | 1981-08-17 | 1981-08-17 | Photopolymerizable composition |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5829803A (en) |
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Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS54151024A (en) * | 1978-05-18 | 1979-11-27 | Fuji Photo Film Co Ltd | Photopolymerizable composition |
-
1981
- 1981-08-17 JP JP12840681A patent/JPS5829803A/en active Granted
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS54151024A (en) * | 1978-05-18 | 1979-11-27 | Fuji Photo Film Co Ltd | Photopolymerizable composition |
Also Published As
Publication number | Publication date |
---|---|
JPS5829803A (en) | 1983-02-22 |
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