JPH03201527A - Stacking boat - Google Patents

Stacking boat

Info

Publication number
JPH03201527A
JPH03201527A JP1341235A JP34123589A JPH03201527A JP H03201527 A JPH03201527 A JP H03201527A JP 1341235 A JP1341235 A JP 1341235A JP 34123589 A JP34123589 A JP 34123589A JP H03201527 A JPH03201527 A JP H03201527A
Authority
JP
Japan
Prior art keywords
quartz
pipes
silicon carbide
semiconductor wafers
end sections
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1341235A
Other languages
Japanese (ja)
Other versions
JPH0831427B2 (en
Inventor
Mikinari Abe
阿部 幹成
Hidetoshi Asano
浅野 英利
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Coorstek KK
Original Assignee
Toshiba Ceramics Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Ceramics Co Ltd filed Critical Toshiba Ceramics Co Ltd
Priority to JP1341235A priority Critical patent/JPH0831427B2/en
Publication of JPH03201527A publication Critical patent/JPH03201527A/en
Publication of JPH0831427B2 publication Critical patent/JPH0831427B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)

Abstract

PURPOSE:To lengthen a lifetime, and to increase the number of semiconductor wafers loaded by forming a plurality of silica pipes, to which a plurality of trench sections for placing semiconductor wafers are formed, which are arranged in parallel and both end sections of which are opened and on the insides of which reinforcing bars, on which the films of silicon carbide are attached through chemical vapor deposition respectively and which are made of silicon carbide, are disposed, by connection by a plurality of quartz struts. CONSTITUTION:A stacking boat 10 is composed of two quartz pipes 11A, 11B, in which semiconductor wafers M are inserted and held in a plurality of trench sections 11a, 11b formed at opposed positions, and quartz struts 12A, 12B connecting the quartz pipes 11A, 11B at both end sections. Both end sections of the quartz pipes 11A, 11B are opened, and the insides have reinforcing bars 13A, 13B, on which the films of silicon carbide are attached through chemical vapor deposition extending and reinforcing the quartz pipes 11A, 11B up to sections near both end sections and which are made of silicon carbide. Accordingly, even when the heat treatment temperatures of the semiconductor wafers M exceed the softening point of quartz, deformation can be inhibited, the quartz struts can be removed from an intermediate section, a lifetime is lengthened, and the semiconductor wafers M loaded can be increased. The closing treatment of both end sections of the silica pipes is avoided simultaneously, thus facilitating manufacture.

Description

【発明の詳細な説明】 (11発明の目的 [産業上の利用分野] 本発明は、複数の石英パイプをパイプ状6しくは中実の
複数の石英支柱で互いに連結して形成されたスタッキン
グボートに関し、特に、石英パイプの内部にそれぞれ化
学蒸着によって炭化珪素の皮膜が付着された炭化珪素製
の補強棒が配置されてなるスタッキングボートに関する
ものである。
Detailed Description of the Invention (11) Object of the Invention [Industrial Application Field] The present invention relates to a stacking boat formed by connecting a plurality of quartz pipes to each other with a plurality of pipe-shaped or solid quartz supports. In particular, the present invention relates to a stacking boat in which reinforcing rods made of silicon carbide each having a silicon carbide film adhered thereto by chemical vapor deposition are arranged inside a quartz pipe.

[従来の技術] 従来、この種のスタッキングボートとしては、第2図に
示したスタッキングボート10のごとく、両端部の閉鎖
された2本の石英パイプ11A、11Bを両端部と中間
部とにおいてパイプ状の複数(ここでは3本)の石英支
柱12A、 128.12Cによって互いに結合せしめ
ることにより作成されてなるものが提案されていた。
[Prior Art] Conventionally, this type of stacking boat, like the stacking boat 10 shown in FIG. It has been proposed that the structure be made by connecting a plurality of (three in this case) shaped quartz pillars 12A, 128.12C to each other.

[解決すべき問題点] しかしながら、従来のスタッキングボート且では、半導
体ウェーハMの熱処理温度が昨今の技術革新に伴なって
石英の軟化点(すなわち1200℃)を超えるようにな
った結果、fit石英パイプ11A。
[Problems to be solved] However, in conventional stacking boats, as a result of recent technological innovations, the heat treatment temperature of semiconductor wafers has exceeded the softening point of quartz (i.e. 1200°C). Pipe 11A.

11Bが半導体ウェーハMの重量によってその熱処理に
際し外方へ彎曲してしまう欠点があり、また(il)石
英パイプ11A、11Bの中間部を連結する石英支柱1
2Gの近傍では熱ストレスが増大するため載置された半
導体ウェーハMにスリップが生じ易い欠、屯があり、ひ
いてはfiiil iit用寿命を延長できず、半導体
ウェーハの積載数を増加できない欠、屯があった。
There is a drawback that the quartz support 11B is bent outward during heat treatment due to the weight of the semiconductor wafer M, and (il) the quartz support 1 connecting the intermediate portions of the quartz pipes 11A and 11B is
In the vicinity of 2G, thermal stress increases, so there are gaps where the semiconductor wafers M placed there are likely to slip. there were.

ちなみに、従来のスタッキングボート功では、石英パイ
プ11A、 11Bの内部に石英ウールなどを介して炭
化珪素製の補強棒(図示せず)を刺入して補強すること
が提案されており、上記(11〜(iiilの欠点を除
去していたが、fivl製造に多大の時間および労力を
要する欠点があった。
Incidentally, in the conventional stacking boat technique, it has been proposed to reinforce the quartz pipes 11A and 11B by inserting reinforcing rods made of silicon carbide (not shown) through quartz wool, etc., and the above ( Although the drawbacks of No. 11 to (iii) were eliminated, there was a drawback that manufacturing fivl required a great deal of time and effort.

そこで、本発明は、これらの欠点を除去すべく、両端部
の開放された?I ffiの石英パイプの内部にそれぞ
れ化学蒸着によって炭化珪素の皮膜が付着された炭化珪
素製の補強棒を配置することにより石英パイプを両端部
のみで石英支柱によって連結可能としてなるスタッキン
グボートを提供せんとするものである。
Therefore, in order to eliminate these drawbacks, the present invention aims to eliminate these drawbacks. We provide a stacking boat in which the quartz pipes can be connected by quartz supports only at both ends by arranging reinforcing rods made of silicon carbide to which a silicon carbide film is attached by chemical vapor deposition inside each of the quartz pipes of Iffi. That is.

(2)発明の構成 E問題点の解決手段1 本発明により提供される問題点の解決手段は、「半導体
ウェーハを載置するための複数の溝部がそれぞれ形成さ
れかつ平行に配置されたIM Elの石英パイプを複数
の石英支柱で互いに連結して形成してなるスタッキング
ボートにおいて1石英パイプfllA、11B+の両端
部が開放されかつ内部にそれぞれ化学蒸着によって炭化
珪素の皮膜が付着された炭化珪素製の補強棒(+3A、
 13B+が配置されてなることを特徴とするスタッキ
ングボート」 である。
(2) Structure of the Invention E Means for Solving Problem 1 The means for solving the problem provided by the present invention is "IM El in which a plurality of grooves for placing semiconductor wafers are respectively formed and arranged in parallel. In a stacking boat formed by connecting quartz pipes with a plurality of quartz supports, each of the quartz pipes fl1A and 11B+ is open at both ends, and is made of silicon carbide with a silicon carbide film adhered to the inside by chemical vapor deposition. Reinforcement rod (+3A,
It is a stacking boat characterized by a 13B+ arrangement.

[作用] 本発明にかかるスタッキングボートは、上述のE問題点
の解決手段]で明示したごとく、半導体ウェーハを載置
するための複数の溝部がそれぞれ形成されかつ平行に配
置された複数の石英パイプを複数の石英支柱で互いに連
結して形成されており、特に、石英パイプの両端部が開
放されかつ内部にそれぞれ化学蒸着によって炭化珪素の
皮膜が付着された炭化珪素製の補強棒が配置されてなる
ので、 (i)石英の軟化点を超える温度まで石英パイプを補強
する作用 をなし、ひいては (11)半導体ウェーへの熱処理温度が石英の軟化点を
超えてち変形を抑制する作用 をなし、また fiii)中間部に挿入される石英支柱を除去可能とす
る作用 をなし、結果的に fivl in用寿命を延長可能とし、かつ半導体ウェ
ーへの積載数を増加可能とする作用をなし、併せて fV1石英パイプの両端部の閉鎖処理を回避して製造容
易とする作用 をなす。
[Function] As specified in [Means for solving problem E above], the stacking boat according to the present invention includes a plurality of quartz pipes each having a plurality of grooves for placing semiconductor wafers and arranged in parallel. The quartz pipe is formed by connecting each other with a plurality of quartz supports, and in particular, both ends of the quartz pipe are open, and reinforcing rods made of silicon carbide each coated with a silicon carbide film by chemical vapor deposition are arranged inside. Therefore, (i) it acts to reinforce the quartz pipe until the temperature exceeds the softening point of quartz, and (11) it acts to suppress deformation when the heat treatment temperature for the semiconductor wafer exceeds the softening point of quartz. In addition, fiii) it has the effect of making it possible to remove the quartz pillar inserted in the intermediate part, and as a result, it has the effect of extending the life of the fivlin and increasing the number of semiconductor wafers that can be loaded on the semiconductor wafer. This serves to facilitate manufacturing by avoiding the process of closing both ends of the fV1 quartz pipe.

[実施例] 次に、本発明にかかるスタッキングボートについて、そ
の好ましい実施例を挙げ、添付図面を参照しつつ、具体
的に説明する。しかしながら、以下に説明する実施例は
、本発明の理解を容易化ないし促進イヒするために記載
されるものであって、本発明を限定するために記載され
るものではない。換言すれば、以下に説明される実施例
において開示される各要素は、本発明の精神ならびに技
術的範囲に属する全ての設計変更ならびに均等物置換を
含むちのである。
[Example] Next, the stacking boat according to the present invention will be specifically described with reference to the accompanying drawings, citing preferred examples thereof. However, the examples described below are described to facilitate or promote understanding of the present invention, and are not described to limit the present invention. In other words, each element disclosed in the embodiments described below includes all design changes and equivalent substitutions that fall within the spirit and technical scope of the invention.

ユ里住x皿史盈里と 第1図は、本発明のスタッキングボートの一実施例を示
すための部分断面斜視図である。
FIG. 1 is a partially sectional perspective view showing an embodiment of the stacking boat of the present invention.

1!施里少贋致上 まず、第1図を参照しつつ、本発明にがかるスタッキン
グボートの一実施例について、その構成を詳細に説明す
る。
1! DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS First, the structure of an embodiment of a stacking boat according to the present invention will be described in detail with reference to FIG.

lOは、本発明にかかるスタッキングボートであって、
互いに対向する位置にそれぞれ複数の溝部11a、 l
lbが形成されており半導体ウェーハMをそれらの溝部
11a、111)に挿入して保持するための2本の石英
パイプ11A、11Bと、石英パイプ11A。
IO is a stacking boat according to the present invention,
A plurality of groove portions 11a and 11a are provided at opposing positions, respectively.
Two quartz pipes 11A, 11B are formed with grooves 11A, 11B for inserting and holding the semiconductor wafer M into the grooves 11a, 111), and the quartz pipe 11A.

11Bを両端部において互いに連結するための石英支柱
12A、 12Bと、石英パイプ11A、11Bの内部
に対してそれぞれ配設され両端部近傍まで延長されてお
り石英パイプ11A、11Bを補強するための炭化珪素
製の補強棒13A、 13Bとを備えている。
Quartz pillars 12A and 12B are provided to connect the quartz pipes 11A and 11B to each other at both ends, and carbonized supports 12A and 12B are provided inside the quartz pipes 11A and 11B and extend to the vicinity of both ends to reinforce the quartz pipes 11A and 11B. It is equipped with silicon reinforcing rods 13A and 13B.

石英支柱12A、 12Bは、パイプ状であってもよく
、また中実であってもよいが、それぞれ両端部で石英パ
イプlIA、11Bに対し煽書されている。
The quartz posts 12A, 12B may be pipe-shaped or solid, but are curved at both ends to the quartz pipes IIA, 11B, respectively.

補強棒13A、 13Bは、化学蒸着によって炭化珪素
の皮膜が付着された炭化珪素製の棒材によって形成され
ている。このため、本発明によれば、石英パイプlIA
、11Bの両端部を開放したまま放置しても、半導体ウ
ェーハMの熱処理に際して補強棒13A、 13Bから
不純物が飛散し半導体ウェーハMを汚染してしまうこと
を回避できる。補強棒13A13Bは、それぞれ両端部
が石英パイプ11A、11Bの両端部の一部をそれぞれ
内部へ折返すことによって脱落することが防止されてい
る。また、?i11強捧13A、13Bは、石英パイプ
11A、 11Bへの挿入ののち、石英パイプ11A、
 11Bの両端部に対しそれぞれ短かい固定用石英パイ
プを挿入し加熱軟化せしめて溶着することにより脱落す
ることが防止されてもよい。
The reinforcing rods 13A and 13B are formed of silicon carbide rods to which a silicon carbide film is attached by chemical vapor deposition. Therefore, according to the present invention, the quartz pipe lIA
, 11B are left open, it is possible to prevent impurities from scattering from the reinforcing rods 13A, 13B and contaminating the semiconductor wafer M during heat treatment of the semiconductor wafer M. Both ends of the reinforcing rods 13A and 13B are prevented from falling off by folding back a portion of both ends of the quartz pipes 11A and 11B inward, respectively. Also,? After inserting the i11 shafts 13A and 13B into the quartz pipes 11A and 11B,
It may be possible to prevent the pipe from falling off by inserting short quartz pipes for fixing into both ends of the pipe 11B, heating and softening them, and welding them.

補強棒13A、13Bの横断面形状は、半円形に這い形
状の場合を図示しているが、石英パイプ11A。
Although the reinforcing rods 13A and 13B have a semicircular cross-sectional shape in the figure, they are quartz pipes 11A.

11Bの内周面との間に熱膨張率の差に伴なう熱膨張を
吸収できるだけのスペースが確保されている限り、円形
、多角形あるいは矩形などの所望の形状であっても差し
支えない。
As long as a space sufficient to absorb the thermal expansion due to the difference in thermal expansion coefficient is secured between the inner circumferential surface of 11B and the inner circumferential surface of 11B, it may have any desired shape such as circular, polygonal, or rectangular.

工夫慶皿曵且B± 更に、第1図を全開しつつ、本発明にがかるスタッキン
グボートの一実施例について、その作用を詳細に説明す
る。
Further, with full reference to FIG. 1, the operation of an embodiment of the stacking boat according to the present invention will be explained in detail.

本発明にかかるスタッキングボート耗は、石英パイプ1
1A、11Bの内部に対しそれぞれ炭化珪素製の補強棒
13A、 13Bが配設されているので、半導体ウェー
ハMの熱処理温度が石英の軟化点を超えるような場合で
あっても、石英パイプ11A、 11Bを補強できる。
The stacking boat wear according to the present invention is the quartz pipe 1
Since reinforcing rods 13A and 13B made of silicon carbide are arranged inside the quartz pipes 1A and 11B, respectively, even if the heat treatment temperature of the semiconductor wafer M exceeds the softening point of quartz, the quartz pipes 11A and 11B 11B can be reinforced.

したがって、本発明にかかるスタッキングボー1−10
は、半導体ウェーハMの熱処理温度が石英の軟化点を超
えるような場合であっても、石英パイプ11A、lIB
が半導体ウェーハMの重量によって外方へ彎曲し変形す
ることを抑制でき、また中間部から石英支柱を除去でき
る。
Therefore, the stacking board 1-10 according to the present invention
Even if the heat treatment temperature of the semiconductor wafer M exceeds the softening point of quartz, the quartz pipes 11A and lIB
It is possible to suppress outward bending and deformation due to the weight of the semiconductor wafer M, and it is also possible to remove the quartz support from the intermediate portion.

結果的に、本発明にかかるスタッキングボート10は、
耐用寿命を延長でき、かつ半導体ウェーハMの積載数を
増加できる。
As a result, the stacking boat 10 according to the present invention has the following features:
The service life can be extended and the number of semiconductor wafers M loaded can be increased.

併せて、本発明にかかるスタッキングボーNOは、石英
パイプl IA、 l IBの内部に配設された炭化珪
素製の補強棒13A、13Bに対し化学蒸着によって炭
化珪素の皮膜が付着されているので、半導体ウェーハM
の熱処理に際し補強棒13A、13Bから不純物が飛散
して半導体ウェーハMを汚染することを抑制でき、ひい
ては石英パイプ11A、lIBの両端部の閉鎖処理を回
避して製造容易とできる。
In addition, in the stacking bow NO according to the present invention, a silicon carbide film is attached by chemical vapor deposition to silicon carbide reinforcing rods 13A and 13B disposed inside the quartz pipes IIA and IIB. , semiconductor wafer M
During the heat treatment, it is possible to prevent impurities from scattering from the reinforcing rods 13A and 13B and contaminating the semiconductor wafer M, and furthermore, it is possible to avoid the closing treatment of both ends of the quartz pipes 11A and 11B, thereby facilitating manufacturing.

工え肚量上 なお、上述においては、補強棒13A、13Bが石英パ
イプ11A、11Bの内部に挿入されている場合につい
てのみ説明したが、本発明は、これに限定されるちので
はなく、補強棒が石英パイプに加え石英支柱の内部にも
挿入される場合を包摂している。
For the sake of effort, in the above description, only the case where the reinforcing rods 13A and 13B are inserted into the quartz pipes 11A and 11B has been described, but the present invention is not limited to this, and the reinforcing rods This includes the case where the quartz pipe is inserted inside the quartz support as well as the quartz pipe.

(3)発明の効果 上述より明らかなように、本発明にがかるスタッキング
ボートは、上述の[問題点の解決手段]で明示したごと
く、半導体ウェーハを載置するための複数の溝部がそれ
ぞれ形成されかつ平行に配置された複数の石英パイプを
複数の石英支柱で互いに連結して形成されており、特に
、石英パイプの両端部が開放されかつ内部にそれぞれ化
学蒸着によって炭化珪素の皮膜が付着された炭化珪素製
の補強棒が配置されてなるので、 (i1石英の軟化点を超える温度まで石英パイプを補強
できる効果 を有し、ひいては fii)半導体ウェーハの熱処理温度が石英の軟化点を
超えてち変形を抑制可能とできる効果 を有し、また (iiil中間部に挿入される石英支柱を除去可能とで
きる効果 を有し、結果的に fivl耐用寿命を延長可能とでき、かつ半導体ウェー
への積載数を増加可能とできる効果 を有し、併せて (V1石英パイプの両端部の閉鎖処理を回避して製造容
易とできる効果 を有する。
(3) Effects of the Invention As is clear from the above, the stacking boat according to the present invention has a plurality of grooves each formed for placing semiconductor wafers, as specified in the above-mentioned [Means for solving problems]. It is formed by connecting a plurality of quartz pipes arranged in parallel to each other with a plurality of quartz supports, and in particular, both ends of the quartz pipe are open and a silicon carbide film is deposited inside each by chemical vapor deposition. Since reinforcing rods made of silicon carbide are arranged, (i1) it has the effect of reinforcing the quartz pipe up to a temperature exceeding the softening point of quartz, and (fii) it has the effect of reinforcing the quartz pipe until the temperature of the heat treatment of the semiconductor wafer exceeds the softening point of quartz. It has the effect of being able to suppress deformation, and also has the effect of making it possible to remove the quartz pillar inserted in the middle part, and as a result, the service life of fivl can be extended, and it is possible to load the semiconductor wafer. It has the effect of increasing the number of V1 quartz pipes, and also has the effect of making manufacturing easier by avoiding the process of closing both ends of the V1 quartz pipe.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明にがかるスクッキングボートの一実施例
を示すための部分断面斜視図、第2図は従来例を示すた
めの斜視図である。 10・・・ 11A、11B 11a、 l 1b 12A、12B 13A、13B ・・・スクッキングボート ・石英パイプ ・・・溝部 ・・・石英支柱 ・・・補強棒
FIG. 1 is a partially sectional perspective view showing an embodiment of a skooking boat according to the present invention, and FIG. 2 is a perspective view showing a conventional example. 10... 11A, 11B 11a, l 1b 12A, 12B 13A, 13B ...Scooking boat/quartz pipe...groove section...quartz support column...reinforcement rod

Claims (1)

【特許請求の範囲】[Claims] 半導体ウェーハを載置するための複数の溝部がそれぞれ
形成されかつ平行に配置された複数の石英パイプを複数
の石英支柱で互いに連結して形成してなるスタッキング
ボートにおいて、石英パイプ(11A、11B)の両端
部が開放されかつ内部にそれぞれ化学蒸着によって炭化
珪素の皮膜が付着された炭化珪素製の補強棒(13A、
13B)が配置されてなることを特徴とするスタッキン
グボート。
In a stacking boat formed by connecting a plurality of quartz pipes each having a plurality of grooves for placing semiconductor wafers and arranged in parallel to each other with a plurality of quartz supports, the quartz pipes (11A, 11B) A reinforcing rod made of silicon carbide (13A,
13B) is arranged.
JP1341235A 1989-12-28 1989-12-28 Stacking boat Expired - Fee Related JPH0831427B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1341235A JPH0831427B2 (en) 1989-12-28 1989-12-28 Stacking boat

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1341235A JPH0831427B2 (en) 1989-12-28 1989-12-28 Stacking boat

Publications (2)

Publication Number Publication Date
JPH03201527A true JPH03201527A (en) 1991-09-03
JPH0831427B2 JPH0831427B2 (en) 1996-03-27

Family

ID=18344434

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1341235A Expired - Fee Related JPH0831427B2 (en) 1989-12-28 1989-12-28 Stacking boat

Country Status (1)

Country Link
JP (1) JPH0831427B2 (en)

Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS583224A (en) * 1981-06-29 1983-01-10 Seiko Epson Corp Quartz jig for manufacturing semiconductor device
JPS5918434U (en) * 1982-07-27 1984-02-04 株式会社東芝 Heating support stand for semiconductor substrates
JPS5999851U (en) * 1982-12-25 1984-07-05 株式会社デンソー Vehicle wiper arm holding structure
JPS59189622A (en) * 1983-04-13 1984-10-27 Toshiba Ceramics Co Ltd Diffusion furnace process tube for semiconductor
JPS60138914A (en) * 1983-12-26 1985-07-23 Toshiba Ceramics Co Ltd Manufacture of semiconductor diffusion furnace tube
JPS60189930A (en) * 1984-03-12 1985-09-27 Toshiba Ceramics Co Ltd Wafer holding device
JPS61125013A (en) * 1984-11-16 1986-06-12 ヘレウス・クアルツシユメルツエ・ゲゼルシヤフト・ミツト・ベシユレンクタ−・ハフツング Heat treating furnace for semiconductor material
JPS6221001U (en) * 1985-07-22 1987-02-07
JPS63225591A (en) * 1987-03-12 1988-09-20 住友金属工業株式会社 Manufacture of silicon carbide-coated graphite material

Patent Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS583224A (en) * 1981-06-29 1983-01-10 Seiko Epson Corp Quartz jig for manufacturing semiconductor device
JPS5918434U (en) * 1982-07-27 1984-02-04 株式会社東芝 Heating support stand for semiconductor substrates
JPS5999851U (en) * 1982-12-25 1984-07-05 株式会社デンソー Vehicle wiper arm holding structure
JPS59189622A (en) * 1983-04-13 1984-10-27 Toshiba Ceramics Co Ltd Diffusion furnace process tube for semiconductor
JPS60138914A (en) * 1983-12-26 1985-07-23 Toshiba Ceramics Co Ltd Manufacture of semiconductor diffusion furnace tube
JPS60189930A (en) * 1984-03-12 1985-09-27 Toshiba Ceramics Co Ltd Wafer holding device
JPS61125013A (en) * 1984-11-16 1986-06-12 ヘレウス・クアルツシユメルツエ・ゲゼルシヤフト・ミツト・ベシユレンクタ−・ハフツング Heat treating furnace for semiconductor material
JPS6221001U (en) * 1985-07-22 1987-02-07
JPS63225591A (en) * 1987-03-12 1988-09-20 住友金属工業株式会社 Manufacture of silicon carbide-coated graphite material

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