JPH031960U - - Google Patents
Info
- Publication number
- JPH031960U JPH031960U JP6342389U JP6342389U JPH031960U JP H031960 U JPH031960 U JP H031960U JP 6342389 U JP6342389 U JP 6342389U JP 6342389 U JP6342389 U JP 6342389U JP H031960 U JPH031960 U JP H031960U
- Authority
- JP
- Japan
- Prior art keywords
- plate
- rotating
- angle
- main unit
- shaped body
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000008602 contraction Effects 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
- Drying Of Semiconductors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6342389U JPH031960U (en:Method) | 1989-05-30 | 1989-05-30 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6342389U JPH031960U (en:Method) | 1989-05-30 | 1989-05-30 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH031960U true JPH031960U (en:Method) | 1991-01-10 |
Family
ID=31593459
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP6342389U Pending JPH031960U (en:Method) | 1989-05-30 | 1989-05-30 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH031960U (en:Method) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2000055894A1 (fr) * | 1999-03-17 | 2000-09-21 | Hitachi, Ltd. | Appareil de traitement au plasma et son procede d'entretien |
-
1989
- 1989-05-30 JP JP6342389U patent/JPH031960U/ja active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2000055894A1 (fr) * | 1999-03-17 | 2000-09-21 | Hitachi, Ltd. | Appareil de traitement au plasma et son procede d'entretien |