JPH031960U - - Google Patents
Info
- Publication number
- JPH031960U JPH031960U JP6342389U JP6342389U JPH031960U JP H031960 U JPH031960 U JP H031960U JP 6342389 U JP6342389 U JP 6342389U JP 6342389 U JP6342389 U JP 6342389U JP H031960 U JPH031960 U JP H031960U
- Authority
- JP
- Japan
- Prior art keywords
- plate
- rotating
- angle
- main unit
- shaped body
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000008602 contraction Effects 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
- Drying Of Semiconductors (AREA)
Description
第１図は本考案の一実施例が適用されたスパツ
タリング装置の概略構成図、第２Ａ図〜第２Ｃ図
は本考案の一実施例の動作を説明するための図で
ある。
１……架台、５……蓋体、８……ブラケツト、
１０……メインフレーム、１４……サブフレーム
、２０……第１エアシリンダ、２２……シリンダ
ロツド、３０……第２シリンダ、３２……シリン
ダロツド。
FIG. 1 is a schematic diagram of a sputtering apparatus to which an embodiment of the present invention is applied, and FIGS. 2A to 2C are diagrams for explaining the operation of the embodiment of the present invention. 1... Frame, 5... Lid body, 8... Bracket,
10...Main frame, 14...Subframe, 20...First air cylinder, 22...Cylinder rod, 30...Second cylinder, 32...Cylinder rod.
Claims (1)
角度回動させるための回動装置であつて、 一端が前記本体装置に回動自在に連結されたサ
ブフレームと、このサブフレームに装着され前記
板状体を第１の角度に回動させるための第１伸縮
機構と、この第１シリンダの装着された前記サブ
フレームを回動させて前記板状体を第１の角度よ
りも大きな第２の角度に回動させるための第２伸
縮機構とを備えた板状体の回動装置。[Claims for Utility Model Registration] A rotating device for rotating a plate-shaped body rotatably attached to a main unit by a predetermined angle, the sub-end having one end rotatably connected to the main unit. a frame; a first telescoping mechanism attached to the subframe for rotating the plate-like body at a first angle; A rotation device for a plate-shaped body, comprising a second expansion and contraction mechanism for rotating the plate to a second angle larger than the first angle.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6342389U JPH031960U (en) | 1989-05-30 | 1989-05-30 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6342389U JPH031960U (en) | 1989-05-30 | 1989-05-30 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH031960U true JPH031960U (en) | 1991-01-10 |
Family
ID=31593459
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP6342389U Pending JPH031960U (en) | 1989-05-30 | 1989-05-30 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH031960U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2000055894A1 (en) * | 1999-03-17 | 2000-09-21 | Hitachi, Ltd. | Plasma processing apparatus and method of maintaining the same |
-
1989
- 1989-05-30 JP JP6342389U patent/JPH031960U/ja active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2000055894A1 (en) * | 1999-03-17 | 2000-09-21 | Hitachi, Ltd. | Plasma processing apparatus and method of maintaining the same |
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