JPH0318913Y2 - - Google Patents

Description

[Detailed Description of the Invention] The present invention relates to an Augier quantitative analysis device that can obtain high quantitative analysis accuracy.

When a sample is irradiated with an electron beam, Auger electrons with energy specific to the constituent materials of the sample are generated from the extreme surface layer of the sample, so if these Auger electrons are analyzed with an appropriate energy analyzer, such as a cylindrical mirror analyzer, Auger electron spectra can be obtained and sample analysis is possible. The Augier electronic analyzer, which is a device based on this, has attracted attention as an effective means of surface analysis and is rapidly becoming popular. When performing quantitative analysis using such an apparatus, a standard sample made of a known substance must be held in a sample holder together with the test sample, and the Auger electron spectrum from the standard sample must be compared with that from the test sample. Therefore, the accuracy of quantitative analysis is greatly influenced by the quality of the standard sample, but the surface of the sample is generally contaminated with carbon and oxygen, and it is very difficult to obtain a standard sample with a known surface concentration. Therefore, conventionally, an ion gun is placed above the sample, and an ion shower is applied to the surface of the standard sample to peel off the surface layer and expose the fresh sample inside. However,
When only the surface layer of a sample is removed by such ion beam bombardment, many substances (molecules) that are easy to jump out are scattered, and a large amount of substances that are difficult to jump out remain, and the composition of the fresh sample surface layer is standard. The composition will be different from that inside the sample. Therefore, an error occurs in the quantification of the standard sample, resulting in a decrease in the accuracy of quantitative analysis.

Therefore, the purpose of the present invention is to provide an Augier quantitative analyzer equipped with a standard sample forming means that can improve the accuracy of quantitative analysis. In an apparatus for quantitative analysis of the sample by analyzing the Auger electrons generated thereby, a standard sample film-formed substrate is placed on the sample holder at a position where electron beam irradiation is possible, and the substrate faces the substrate. A target made of a known substance is placed on the sample holder so that the sample does not face the test sample, and an ion source that generates an ion beam that irradiates the target is provided. The invention is characterized in that the scattered particles of are attached to the substrate as a standard sample film.

Embodiments of the present invention will be described below based on the drawings.
FIG. 1 is a perspective view of an embodiment of the present invention, in which 1 is a sample holder on which test samples 2a, 2b, and 2c are placed. A thin film forming substrate 3 is mounted on a holder separate from the test sample. A slope member 4 is provided between the test sample and the substrate for thin film formation so as to separate the two, the slope member 4a faces toward the substrate 3a, and an alloy target composed of a known substance is placed on top of the slope member 4. 5 is attached. Further, an ion source (not shown) is provided so as to face the inclined surface, thus the target 5, and the ion beam IB emitted from the source is projected onto the alloy target 5.

In such a configuration, when the ion beam IB from the ion source is projected onto the alloy target 5, particles forming the target material are scattered from the surface layer, as shown in an enlarged view in FIG. Some of the scattered particles adhere to the substrate 3 placed on the holder, forming a thin film 6. Then, this formed thin film 6 is used as a standard sample and irradiated with an electron beam EB to perform Auger analysis. In this case, the target 5 is continuously bombarded by the ion beam IB and is deeply excavated while scattering particles, so that all substances that are difficult to fly out are also scattered, forming a thin film 6. Therefore, the internal composition of this thin film is very similar to that of the target 5, and if this thin film is used as a standard sample, the accuracy of quantitative analysis can be significantly improved.

In addition, when sputtering the target 5 by ion beam irradiation, the test samples 2a, 2b, 2c
Since it is placed on the back side of the slope member 4, particles scattered from the target will not adhere to it.

[Brief explanation of drawings]

Fig. 1 is a perspective view showing one embodiment of the present invention;
The figure is an enlarged sectional view of the main part. DESCRIPTION OF SYMBOLS 1... Sample holder, 2a, 2b, 2c... Test sample, 3... Thin film formation target, 4... Slope member, 4a... Slanted surface, 5... Alloy target,
6...Thin film.

Claims (1)

[Scope of utility model registration request] In an apparatus that performs quantitative analysis of the sample by irradiating a test sample held in a sample holder with an electron beam and analyzing the Auger electrons generated thereby, a standard sample film-formed substrate; a target made of a known substance disposed on the sample holder so as to face the substrate but not the test sample;
An Auger quantitative analysis device, comprising: an ion source that generates an ion beam for irradiating the target, and particles scattered from the target due to ion beam irradiation are attached to the substrate as a standard sample film.