JPH03188277A - Vacuum process device - Google Patents

Vacuum process device

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Publication number
JPH03188277A
JPH03188277A JP32466989A JP32466989A JPH03188277A JP H03188277 A JPH03188277 A JP H03188277A JP 32466989 A JP32466989 A JP 32466989A JP 32466989 A JP32466989 A JP 32466989A JP H03188277 A JPH03188277 A JP H03188277A
Authority
JP
Japan
Prior art keywords
space
sample
chamber
volume
contg
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP32466989A
Other languages
Japanese (ja)
Inventor
Nozomi Ikuji
望 生地
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shimadzu Corp
Original Assignee
Shimadzu Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shimadzu Corp filed Critical Shimadzu Corp
Priority to JP32466989A priority Critical patent/JPH03188277A/en
Publication of JPH03188277A publication Critical patent/JPH03188277A/en
Pending legal-status Critical Current

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  • Physical Vapour Deposition (AREA)
  • Chemical Vapour Deposition (AREA)

Abstract

PURPOSE:To slowly evacuate a space and to prevent the whirling up of dust by introducing a gas into the space in a charging and discharging chamber separated by a flexible partition and contg. no samples to expand the space and reducing the volume of the space contg. a sample. CONSTITUTION:A sample 3 placed on a cart holder 1 is charged into a treating chamber S from a charging and discharging chamber 2 provided with a hatch 9 through a gate valve 8, treated in vacuum, transferred to the chamber 2 and discharged to the outside of the system through the hatch 9. In this vacuum process device, the chamber 2 is separated by the flexible partition 4 into the space X contg. the sample and the space A contg. no samples. Gas inlet and outlet lines 7X and 7A are independently connected to the spaces X and A. When the sample 3 is charged or discharged, the chamber 2 is evacuated, a gas is introduced into the space A to expand the partition 4, and the volume of the space X is reduced. Consequently, the chamber 2 is slowly evacuated or vented without deteriorating productivity, the whirling up of dust is minimized, and the product yield is improved.

Description

【発明の詳細な説明】 [産業上の利用分野コ 本発明は、プラズマ処理装置、蒸着装置等の真空プロセ
ス装置に関するものである。
DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to vacuum process equipment such as plasma processing equipment and vapor deposition equipment.

[従来の技術] 真空プロセス装置においては、処理室を常時真空に保持
しておくために、該処理室に隣接させて、大気・真空を
繰り返す搬出入室が設けられることが多い。このような
装置においては、搬出入室は処理室と連通される前に減
圧され、大気開放される前にベントされる。
[Prior Art] In a vacuum process apparatus, in order to maintain a processing chamber in a vacuum state at all times, a loading/unloading chamber is often provided adjacent to the processing chamber, which is repeatedly exposed to atmosphere and vacuum. In such an apparatus, the loading/unloading chamber is depressurized before being communicated with the processing chamber, and is vented before being opened to the atmosphere.

[発明が解決しようとする課題] ところで、ベント及び減圧を行うに際し、従来からダス
ト舞い上がりの問題がある。これを極力回避するために
は、ベント操作や減圧操作をできるだけ緩やかに行うべ
きであることは言うまでもない。しかし、ベント及び減
圧に時間をかけることは、そのまま生産性の低下に繋が
り、好ましくない。
[Problems to be Solved by the Invention] Incidentally, when performing venting and depressurization, there has been a conventional problem of dust flying up. In order to avoid this as much as possible, it goes without saying that venting operations and depressurization operations should be performed as gently as possible. However, taking a long time for venting and depressurization is not preferable because it directly leads to a decrease in productivity.

本発明は、このような課題に着目してなされたものであ
って、試料あるいは試料ホルダの搬出入に影響を与えず
、可能な限り試料が配設される空間の容積を減容できる
ようにし、これによりベント及び減圧を所要時間内で極
力緩やかに行うことができるように図った真空プロセス
装置を実現することを目的としている。
The present invention has been made with attention to such problems, and is intended to reduce the volume of the space in which the sample is placed as much as possible without affecting the loading and unloading of the sample or sample holder. The purpose of this invention is to realize a vacuum process apparatus that allows venting and depressurization to be performed as slowly as possible within the required time.

[課題を解決するための手段] 本発明は、かかる目的を達成するために、次のような手
段を講じたものである。
[Means for Solving the Problems] In order to achieve the above object, the present invention takes the following measures.

すなわち、本発明の真空プロセス装置は、搬出入室を有
する真空プロセス装置において、前記搬出入室を可撓性
隔壁によって試料が配設される空間と試料が配設されな
い空間とに分離し、各々の空間に独立にガス導出入系路
を接続したことを特徴とする。
That is, the vacuum process apparatus of the present invention is a vacuum process apparatus having a loading/unloading chamber, in which the loading/unloading chamber is separated by a flexible partition into a space in which a sample is placed and a space in which a sample is not placed, and each space is It is characterized in that a gas lead-in/output line is connected independently to the gas inlet/output line.

[作用] 可撓性隔壁によって分離される両空間に対して、試料が
配設される空間は緩やかにベント若しくは減圧する必要
があるが、試料が配設されない空間はその必要がない。
[Operation] With respect to both spaces separated by a flexible partition, the space where the sample is placed needs to be gently vented or depressurized, but the space where the sample is not placed does not need to be vented or depressurized gently.

このため、試料が配設される空間に対するベント若しく
は減圧が行われる前に可撓性隔壁を速やかに作動させて
該空間の容積を極力減容しておけば、ベント若しくは減
圧すべき容量が減少し、その結果、従来と同等の所要時
間内であっても、かかるベント操作及び減圧操作をより
緩やかに行うことが可能になる。
Therefore, if the flexible partition wall is quickly activated to reduce the volume of the space as much as possible before venting or depressurizing the space where the sample is placed, the volume that needs to be vented or depressurized can be reduced. However, as a result, it becomes possible to perform the venting operation and depressurization operation more slowly even within the same required time as in the past.

[実施例] 以下、本発明の実施例を図面を参照して説明する。[Example] Embodiments of the present invention will be described below with reference to the drawings.

く第1実施例〉 この真空プロセス装置は、第1図及び第2図に示すよう
に、平行平板、横型カートホルダ1を処理室Sに搬入し
又は該処理室Sから装置外に搬出するための搬出入室2
を有しており、真空処理を要する試料3がそのカートホ
ルダ1に取り付けられる。前記搬出入室2には、可撓性
隔壁たるフレキシブルチューブ4が拡縮可能に装着され
ており、このチューブ4により、搬出入室2を、試料3
が配設される空間X(チューブ外)と、試料3が配設さ
れない空間A(チューブ内)とに分離している。フレキ
シブルチューブ4は膨脂時に第2図中想像線に示す如く
試料3の近傍にまで垂下し、収縮時に同図実線に示す如
く搬出入室2の上壁2a側に縮退し得るように設けられ
ている。
1st Embodiment> As shown in FIGS. 1 and 2, this vacuum process apparatus is equipped with a parallel flat plate horizontal cart holder 1 for carrying it into a processing chamber S or carrying it out of the apparatus from the processing chamber S. loading/unloading room 2
A sample 3 requiring vacuum processing is attached to the cart holder 1. A flexible tube 4 serving as a flexible partition wall is attached to the loading/unloading chamber 2 so as to be expandable and retractable.
It is separated into a space X (outside the tube) where the sample 3 is placed and a space A (inside the tube) where the sample 3 is not placed. The flexible tube 4 is provided so that it can hang down to the vicinity of the sample 3 as shown by the imaginary line in FIG. 2 when it is expanded, and can retract toward the upper wall 2a of the loading/unloading chamber 2 when it is deflated as shown by the solid line in the same figure. There is.

そして、両空間ISAに、それぞれバルブ5.6を介し
て各一対のガス導出入系路7x、7Aを接続している。
A pair of gas inlet/output lines 7x and 7A are connected to both spaces ISA via valves 5.6, respectively.

これらのガス導出入系路7X178は、バルブ5が開か
れると空間ISAを図外の真空ポンプと接続し、バルブ
6が開かれると空間X、Aを大気解放する。なお、第1
図において8は搬出入室2と処理室Sとを適宜連通又は
遮断する仕切弁であり、9は搬出入室2を開成するノ\
・ソチである。
These gas inlet/output lines 7X178 connect the space ISA to a vacuum pump (not shown) when the valve 5 is opened, and release the spaces X and A to the atmosphere when the valve 6 is opened. In addition, the first
In the figure, 8 is a gate valve that communicates or shuts off the loading/unloading chamber 2 and the processing chamber S as appropriate, and 9 is a gate valve that opens the loading/unloading chamber 2.
・Sochi.

このような構成により、処理を終えた試料3が処理室S
から搬出入室2に搬送されてくると、次のような手順に
よって試料3を装置外に取り出す。
With this configuration, the sample 3 that has been processed is transferred to the processing chamber S.
When the sample 3 is transported to the loading/unloading chamber 2, the sample 3 is taken out of the apparatus according to the following procedure.

先ず、ガス導出入系路7Aのバルブ6を開にして空間A
をベントし、これにより空間Xの容積を第2図中想像線
の如く減少させる。この時は緩やかにベントする必要は
ない。次に、減容された空間Xに対して導出入系路7X
のバルブ6を開き、空間Xをベントする。この時は緩や
かに行う必要がある。しかし、空間Xは事前に減容され
ているため、ベントにさほど時間がかかることはない。
First, open the valve 6 of the gas inlet/output line 7A to open the space A.
is vented, thereby reducing the volume of space X as shown by the imaginary line in FIG. There is no need to slowly vent at this time. Next, for the reduced space X, the inlet/outlet path 7X
Open valve 6 to vent space X. At this time, you need to do it slowly. However, since the volume of space X has been reduced in advance, venting does not take much time.

ベントが終わると、試料3を取り出し易くするため、ガ
ス導出入系路7xのバルブ6を開のまま、ガス導出入系
路7Aのバルブ5を開にしてフレキシブルチューブ4を
再び縮退させ、空間Aの体積を減容させる。この時は緩
やかにベントする必要はない。そして、最後にノ1ツチ
9を開け、試料3を取り出す。
When the venting is finished, in order to make it easier to take out the sample 3, the valve 6 of the gas lead-in/out system 7x is left open, and the valve 5 of the gas lead-in/out system 7A is opened to retract the flexible tube 4 again, and the space A is Reduce the volume of. There is no need to slowly vent at this time. Finally, open the nozzle 9 and take out the sample 3.

また、試料3を取り出した状態から、新たな試料3を次
のような手順によって処理室Sに送り込む。先ず、搬出
入室2内に試料3を挿入してハツチ9を閉め、ガス導出
入系路7Aのバルブ6を開にしたまま、ガス導出入系路
7Xのバルブ5を開にして空間Xを緩やかに排気する。
Further, from the state in which the sample 3 has been taken out, a new sample 3 is sent into the processing chamber S according to the following procedure. First, insert the sample 3 into the carry-in/out chamber 2, close the hatch 9, and open the valve 5 of the gas lead-in/out system 7X to gently open the space exhaust to.

この時、空間Aは空間Xの排気に伴って徐々に容積が増
大し、空間Xは徐々に減容されるため、排気にさほど時
間がかかることはない。空間Xが排気されたら、ガス導
出入系路7Aのバルブ5を開にし、空間Aを減容する。
At this time, the volume of the space A gradually increases as the space X is evacuated, and the volume of the space X is gradually reduced, so that the evacuation does not take much time. After the space X is evacuated, the valve 5 of the gas introduction/output system 7A is opened to reduce the volume of the space A.

この時は緩やかに排気する必要はない。そして、排気を
終えると、仕切弁8を開いて試料3を処理室Sに搬送す
る。
At this time, there is no need to slowly exhaust the air. When the exhaust is finished, the gate valve 8 is opened and the sample 3 is transported to the processing chamber S.

しかして、このようなものであると、ダストが舞い上が
り易い操作時(空間Xに対するベント若しくは減圧時)
には該空間Xは予め減容されているため、従来と同等の
所要時間内においてもより緩やかな排気を行うことがで
き、それ以外の操作ではフレキシブルチューブ4を急速
に作動させることで時間を浪費しないようにすることが
できる。
However, if this is the case, during operations where dust is likely to fly up (when venting or depressurizing space X)
Since the volume of the space You can avoid wasting money.

このため、図示装置によると生産性の低下を招くことな
く、製品の歩留りを有効に向上させることが可能になる
Therefore, according to the illustrated apparatus, it is possible to effectively improve the yield of products without causing a decrease in productivity.

く第2実施例〉 この実施例は、第3図及び第4図に示すように、平行平
板・縦型かつ両面電極型カートホルダ11を搬出入する
ための搬出入室12を有している。
Second Embodiment> As shown in FIGS. 3 and 4, this embodiment has a loading/unloading chamber 12 for loading/unloading a parallel plate, vertical, double-sided electrode type cart holder 11.

試料13はカートホルダ11の両側壁11aに対峙して
装着される。前記振出人室12内には、可撓性隔壁とし
て3つのフレキシブルチューブ14.15.16が拡縮
可能に装着されており、これらのチューブ14.15.
16によって、搬出入室12を、試料が配設される空間
Y(チューブ外)と、試料が配設されない空間B、C,
D (チューブ内)とに分離している。フレキシブルチ
ューブ14は膨脹時に第3図に示す如くカートホルダ1
1の側壁11aに沿ってそれらの対向空隙間に垂下し、
収縮時に第4図に示す如く搬出入12室の上壁12aに
張り付くようにして縮退し得るように設けられている。
The sample 13 is mounted facing both side walls 11a of the cart holder 11. Inside the drawer chamber 12, three flexible tubes 14, 15, 16 are installed as flexible partitions so that they can be expanded and contracted, and these tubes 14, 15, .
16, the loading/unloading chamber 12 is divided into a space Y (outside the tube) where the sample is placed, and spaces B, C, and C where the sample is not placed.
It is separated into D (inside the tube). When the flexible tube 14 is inflated, it is attached to the cart holder 1 as shown in FIG.
hanging along the side wall 11a of 1 into the opposing gap,
It is provided so that it can be retracted so as to stick to the upper wall 12a of the 12 loading/unloading chambers as shown in FIG. 4 when contracted.

また、左右のフレキシブルチューブ15.16は膨脹時
に第3図に示す如くカートホルダ11の側壁11aに沿
ってそれらの背面近傍にまで膨出し、収縮時に第4図に
示す如く搬出入室12の側壁12bに張り付くようにし
て縮退し得るように設けられている。
In addition, when the left and right flexible tubes 15 and 16 are inflated, they expand to the vicinity of their back surfaces along the side wall 11a of the cart holder 11, as shown in FIG. 3, and when they are deflated, as shown in FIG. It is provided so that it can degenerate by sticking to it.

そして、各々の空間YSB−Dに、それぞれバルブ18
.19を介して各一対のガス導出入系路17y 、17
s 、17c 、17oを接続している。
Then, a valve 18 is provided in each space YSB-D.
.. 19, each pair of gas lead-in/output lines 17y, 17
s, 17c, and 17o are connected.

これらのガス導出入系路17Y、17B〜17Dは、バ
ルブ18が開かれると空間Y、B−Dを図外の真空ポン
プと接続し、バルブ19が開かれると空間YSB−Dを
大気解放するようになっている。
These gas lead-in/output lines 17Y, 17B to 17D connect the spaces Y and BD with a vacuum pump (not shown) when the valve 18 is opened, and release the space YSB-D to the atmosphere when the valve 19 is opened. It looks like this.

次に、試料13を取り出す手順について説明する。先ず
、ガス導出入系路17B、17C,17、の各バルブ1
9を開にして空間B、CSDを第3図に示す如くベント
し、これにより空間Yの容積を減少させる。この時は緩
やかにベントする必要はない。次に、減容された空間Y
に対してガス導出入系路17Yのバルブ19を開き、空
間Yをベントする。この時は緩やかに行う必要がある。
Next, the procedure for taking out the sample 13 will be explained. First, each valve 1 of the gas lead-in/output system 17B, 17C, 17,
9 is opened to vent the spaces B and CSD as shown in FIG. 3, thereby reducing the volume of the space Y. There is no need to slowly vent at this time. Next, the reduced volume Y
The valve 19 of the gas lead-in/out system 17Y is opened to vent the space Y. At this time, you need to do it slowly.

しかし、空間Yは事前に減容されているため、ベントに
さほど時間がかかることはない。ベントが終わると、試
料13を取り出し易くするため、ガス導出入系路17y
のバルブ19を開のまま、ガス導出入系路17B 、1
7c 、17Dのノくルブ18を開にしてフレキシブル
チューブ14.15.16を縮退させる。この時は緩や
かにベントする必要はない。そして、ベントが終わると
ノトソチを開け、試料を取り出す。
However, since the volume of space Y has been reduced in advance, venting does not take much time. After venting, in order to make it easier to take out the sample 13, the gas inlet/outlet line 17y is opened.
While the valve 19 of the gas lead-in/output system 17B, 1
Open the knobs 18 of 7c and 17D to retract the flexible tubes 14, 15, and 16. There is no need to slowly vent at this time. After venting, open the vent and take out the sample.

また、試料13を送り込む手順は次のようになる。先ず
、ガス導出入系路17B−17゜、17Dのバルブ19
を開にしたまま、ガス導出入系路17Yのバルブ18を
開にして空間Yを緩やかに排気する。この時、空間B−
Dは空間Yの排気に伴って徐々に容積が増大し、空間Y
は徐々に減容するため、排気にさほど時間がかかること
はない。
Further, the procedure for sending the sample 13 is as follows. First, the valves 19 of the gas inlet/output lines 17B-17° and 17D
The valve 18 of the gas lead-in/output line 17Y is opened to slowly exhaust the space Y. At this time, space B-
The volume of D gradually increases as space Y is evacuated, and D gradually increases in volume as space Y is evacuated.
Since the volume of the gas gradually decreases, it does not take much time to exhaust the gas.

空間Yが排気されたら、ガス導出入系路17B、17C
,17Dのバルブ18を開にし、空間B1C5Dを減容
する。この時に緩やかに排気する必要はない。そして、
排気を終えると、仕切弁を開いて試料を処理室に搬送す
る。
After the space Y is evacuated, the gas introduction/output lines 17B and 17C
, 17D are opened to reduce the volume of the space B1C5D. There is no need to slowly exhaust the air at this time. and,
When the exhaust is finished, the gate valve is opened and the sample is transported to the processing chamber.

しかして、このようなものであると、ダストが舞い上が
り易い操作時(空間Yに対するベント若しくは減圧時)
には該空間Yは予め減容されているため、従来と同等の
所要時間内においてもより緩やかな排気を行うことがで
き、それ以外の操作はフレキシブルチューブ14.15
.16を急速に作動させることで時間を浪費しないよう
にすることができる。このため、図示装置によると生産
性の低下を招くことなく、製品の歩留りを有効に向上さ
せることが可能になる。
However, if this is the case, during operations where dust is likely to fly up (when venting or depressurizing space Y)
Since the volume of the space Y has been reduced in advance, it is possible to perform a gentler evacuation even within the same amount of time as before, and other operations are performed using the flexible tube 14.15.
.. 16 can be activated quickly to avoid wasting time. Therefore, according to the illustrated apparatus, it is possible to effectively improve the yield of products without causing a decrease in productivity.

以上、本発明の各実施例について説明したが、各部の構
成は図示例に限定されるものではなく、本発明の趣旨を
逸脱しない範囲で種々変形が可能である。例えば、第5
図に示すように、搬出入室21を可撓性隔壁たるベロー
22により試料が配設される空間Zと試料が配設されな
い空間Eとに分離してもよい。また、ガス導出入系路は
排気とベントを兼ねたものにすることもできる。
Although each embodiment of the present invention has been described above, the configuration of each part is not limited to the illustrated example, and various modifications can be made without departing from the spirit of the present invention. For example, the fifth
As shown in the figure, the loading/unloading chamber 21 may be separated by a bellows 22, which is a flexible partition, into a space Z where a sample is placed and a space E where a sample is not placed. Furthermore, the gas lead-in/out line can also be used for both exhaust and venting.

[発明の効果] 本発明は、以上のような構成であるから、生産性を低下
させることなく、試料が配設される空間に対するスロー
排気及びスローベントの時間を比較的多くとってダスト
舞い上がりを極力低減することが可能になり、これによ
り製品の歩留りを有効に向上させた真空プロセス装置を
提供することができる。
[Effects of the Invention] Since the present invention has the above-described configuration, it is possible to take a relatively long time for slow exhaust and slow venting of the space where the sample is placed, and to prevent dust from flying up, without reducing productivity. This makes it possible to reduce as much as possible, thereby providing a vacuum process device that effectively improves product yield.

【図面の簡単な説明】[Brief explanation of drawings]

第1図及び第2図は本発明の一実施例を示し、第1図は
装置全体の模式図、第2図は搬出入室の原理図である。 第3図及び第4図は本発明の他の実施例をそれぞれ異な
る状態において示す原理図である。第5図はさらに他の
実施例の搬出入室を示す原理図である。 2.12.21・・・搬出入室 3.13・・・試料 7A 、7x 、17B 、17c 、17D 、17
y・・・ガス導出入系路 4.14.15.16・・・可撓性隔壁(フレキシブル
チューブ) 22・・・可撓性隔壁(ベロー)
FIGS. 1 and 2 show an embodiment of the present invention, with FIG. 1 being a schematic diagram of the entire apparatus, and FIG. 2 being a principle diagram of the loading/unloading chamber. FIGS. 3 and 4 are principle diagrams showing other embodiments of the present invention in different states. FIG. 5 is a principle diagram showing a loading/unloading chamber of still another embodiment. 2.12.21... Loading/unloading room 3.13... Samples 7A, 7x, 17B, 17c, 17D, 17
y... Gas lead-in/output system path 4.14.15.16... Flexible partition wall (flexible tube) 22... Flexible partition wall (bellows)

Claims (1)

【特許請求の範囲】[Claims] 搬出入室を有する真空プロセス装置において、前記搬出
入室を可撓性隔壁によって試料が配設される空間と試料
が配設されない空間とに分離し、各々の空間に独立にガ
ス導出入系路を接続したことを特徴とする真空プロセス
装置。
In a vacuum process apparatus having a loading/unloading chamber, the loading/unloading chamber is separated by a flexible partition into a space where a sample is placed and a space where a sample is not placed, and a gas lead-in/out system is connected to each space independently. Vacuum process equipment characterized by:
JP32466989A 1989-12-14 1989-12-14 Vacuum process device Pending JPH03188277A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP32466989A JPH03188277A (en) 1989-12-14 1989-12-14 Vacuum process device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP32466989A JPH03188277A (en) 1989-12-14 1989-12-14 Vacuum process device

Publications (1)

Publication Number Publication Date
JPH03188277A true JPH03188277A (en) 1991-08-16

Family

ID=18168410

Family Applications (1)

Application Number Title Priority Date Filing Date
JP32466989A Pending JPH03188277A (en) 1989-12-14 1989-12-14 Vacuum process device

Country Status (1)

Country Link
JP (1) JPH03188277A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2000011237A1 (en) * 1998-08-19 2000-03-02 Shibaura Mechatronics Corporation Drive mechanism for vacuum device and vacuum device
JP2006156762A (en) * 2004-11-30 2006-06-15 Sumitomo Eaton Noba Kk Wafer treatment apparatus and method therefor, and ion implanter

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2000011237A1 (en) * 1998-08-19 2000-03-02 Shibaura Mechatronics Corporation Drive mechanism for vacuum device and vacuum device
EP1029942A1 (en) * 1998-08-19 2000-08-23 Shibaura Mechatronics Corporation Drive mechanism for vacuum device and vacuum device
US6337003B1 (en) 1998-08-19 2002-01-08 Shibaura Mechatronics Corporation Vacuum apparatus and driving mechanism therefor
EP1029942A4 (en) * 1998-08-19 2004-11-10 Shibaura Mechatronics Corp Drive mechanism for vacuum device and vacuum device
JP2006156762A (en) * 2004-11-30 2006-06-15 Sumitomo Eaton Noba Kk Wafer treatment apparatus and method therefor, and ion implanter

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