JPH03178035A - Production of substrate for magnetic recording medium - Google Patents

Production of substrate for magnetic recording medium

Info

Publication number
JPH03178035A
JPH03178035A JP31803289A JP31803289A JPH03178035A JP H03178035 A JPH03178035 A JP H03178035A JP 31803289 A JP31803289 A JP 31803289A JP 31803289 A JP31803289 A JP 31803289A JP H03178035 A JPH03178035 A JP H03178035A
Authority
JP
Japan
Prior art keywords
substrate
magnetic
magnetic recording
recording medium
photoresist
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP31803289A
Other languages
Japanese (ja)
Inventor
Tsutomu Naito
勉 内藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP31803289A priority Critical patent/JPH03178035A/en
Publication of JPH03178035A publication Critical patent/JPH03178035A/en
Pending legal-status Critical Current

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  • Magnetic Record Carriers (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)

Abstract

PURPOSE:To remove abnormal ruggedness from the surface of a substrate by providing grooves in circumferential direction on a photoresist applied on the substrate and etching the substrate to form a rugged pattern thereon. CONSTITUTION:Concentrical grooves are provided on a photoresist applied on the surface of a substrate for a magnetic recording medium, and then the substrate is etched to form a rugged pattern thereon. By masking the substrate with a photoresist and by etching, a rugged pattern can be designed and formed as desired, and therefore, different from a method of roughening by polishing with isolated abrasive particles, the roughness height or proportion of recessed area to projected area can be controlled. Thus, abnormal projections can be prevented, and a sticking problem can be solved by controlling the groove pitch or the proportion of recessed area to projected area.

Description

【発明の詳細な説明】 産業上の利用分野 本発明は、磁気ディスク装置の主要部分である磁気記録
媒体用基板の製造方法に関する。
DETAILED DESCRIPTION OF THE INVENTION Field of the Invention The present invention relates to a method of manufacturing a substrate for a magnetic recording medium, which is a main part of a magnetic disk drive.

従来の技術 一般にコンピュータの外部記憶装置である磁気ディスク
装置は、小型化、高容量化、データ読取り時間の短縮な
どの技術開発が積極的に行なわれ(1) (2) ている。磁気ディスク装置の小型化、高容量化を実現す
るために磁気ヘッドにおいては、高保磁力を有する磁気
記録媒体を飽和記録するために、高い飽和磁束密度を有
する金属磁性材料で磁気ギャップ近傍を形成する、いわ
ゆるメタル−イン−ギャップ磁気ヘッドが主流になりつ
つある。
2. Description of the Related Art In general, magnetic disk drives, which are external storage devices for computers, are being actively developed in technology such as miniaturization, higher capacity, and shorter data reading time (1) (2). In order to realize miniaturization and increase in capacity of magnetic disk devices, magnetic heads form the vicinity of the magnetic gap using metallic magnetic materials with high saturation magnetic flux density in order to perform saturation recording on magnetic recording media with high coercive force. , so-called metal-in-gap magnetic heads are becoming mainstream.

一方磁気記録媒体は、高保磁力化や薄膜化の技術が進み
、コバルト−ニッケルークロムなどの金属磁性材料をス
パッタリングなどの薄膜技術により形成した金属薄膜磁
気記録媒体が、現在主流である金属酸化物塗布磁気記録
媒体に代わろうとしている。金属薄膜磁気記録媒体は、
金属酸化物磁気塗布記録媒体に比べて、磁性膜形成後の
平面性が良いため、磁気ヘッドの浮上量を金属酸化物塗
布磁気記録媒体の1/2程度にすることが可能となり、
短波長での記録性能と再生出力が向上する。
On the other hand, with regard to magnetic recording media, technology for increasing coercive force and thinning the film has progressed, and metal thin film magnetic recording media, which are formed using thin film techniques such as sputtering from metal magnetic materials such as cobalt-nickel-chromium, are now mainstream. It is about to replace coated magnetic recording media. Metal thin film magnetic recording media are
Compared to metal oxide magnetic coating recording media, the flatness after forming the magnetic film is better, so the flying height of the magnetic head can be reduced to about 1/2 that of metal oxide coating magnetic recording media.
Recording performance and playback output at short wavelengths are improved.

そのような背景から最近は金属薄膜磁気記録媒体も開発
され、一部実用されつつある。
Against this background, metal thin film magnetic recording media have recently been developed, and some of them are being put into practical use.

第2図(a)は最近開発されている金属薄膜磁気記録媒
体の断面構成図である。図示のように基板11の表面に
ニッケルーリンなどの高硬度な非磁性膜12を10〜2
0μm程度形成した後、酸化アルミニウムなどの遊離砥
粒により平面性良く仕上げる。次に研磨テープなどの固
定砥粒や酸化アルミニウムなどの遊離砥粒により、基板
11の円周方向に前記工程の表面仕上げより粗い凹凸を
形成する。
FIG. 2(a) is a cross-sectional diagram of a recently developed metal thin film magnetic recording medium. As shown in the figure, a highly hard non-magnetic film 12 such as nickel-phosphorus is coated on the surface of the substrate 11 for 10 to 2 times.
After forming about 0 μm, it is finished with good flatness using free abrasive grains such as aluminum oxide. Next, by using fixed abrasive grains such as a polishing tape or free abrasive grains such as aluminum oxide, roughness is formed in the circumferential direction of the substrate 11 which is rougher than the surface finish in the previous step.

第2図(b)は、:i1離砥粒により加工した表面形状
を示す。加工面上にコバルト−ニッケルークロムなどの
磁性膜13と磁気ヘッドとの潤滑および磁性膜13の保
護を目的とした、保護膜14を0.03〜0.1μm程
度コーティングして、金属薄膜磁気記録媒体を構成して
いる。
FIG. 2(b) shows the surface shape processed using :i1 release abrasive grains. A protective film 14 of about 0.03 to 0.1 μm is coated on the machined surface to lubricate the magnetic film 13 such as cobalt-nickel-chromium and the magnetic head and to protect the magnetic film 13. It constitutes a recording medium.

発明が解決しようとする課題 上記のように研磨テープや遊離砥粒により基板表面の凹
凸加工を行なった場合、砥粒の大きさを分布により、第
2図(b)に示すように凹凸の高さをコントロールする
ことが難かしく、図のように異常な凹凸部が発生する。
Problems to be Solved by the Invention When the surface of a substrate is processed to have irregularities using an abrasive tape or free abrasive grains as described above, the height of the irregularities can be adjusted by changing the size of the abrasive grains as shown in Figure 2 (b). It is difficult to control the thickness, and abnormal unevenness occurs as shown in the figure.

そして高い凸部は0.1〜0.2μmもあるため媒体上
を浮上走行する磁気へラドと接触し最悪の場合、磁気ヘ
ッドが媒体へ衝突するいわゆるヘッドクラッシュの原因
となる。
Since the high convex portion is as large as 0.1 to 0.2 μm, it comes into contact with the magnetic head flying above the medium, and in the worst case, it causes a so-called head crash in which the magnetic head collides with the medium.

コンタクト・スタート・ストップ方式の磁気ディスク装
置では、媒体の回転停止時に媒体とヘッドの接触部が高
い凸部に限られ、その部分が激しく摩耗する。ここで保
護膜14は潤滑性能を有しているが、数百オングストロ
ームと薄いため摩耗が進行すると潤滑性能がなくなり、
ヘッドクラッシュが発生するなどの問題があった。
In a contact start/stop type magnetic disk drive, when the rotation of the medium stops, the contact area between the medium and the head is limited to a high convex portion, and this portion is subject to severe wear. Here, the protective film 14 has lubricating performance, but since it is thin at several hundred angstroms, it loses its lubricating performance as wear progresses.
There were problems such as head crashes.

本発明は上記問題の原因である異常な凹凸を除去する表
面粗さ加工法を提供することを目的とする。
An object of the present invention is to provide a surface roughening method for removing abnormal irregularities that cause the above-mentioned problems.

課題を解決するための手段 本発明は上記課題を解決するため、基板表面をポリッシ
ュした後にフォトレジストを塗布し、前記フォトレジス
トに円周方向の溝を設け、その後、エツチングにより磁
気記録媒体用基板表面に凹凸加工を行ない、その粗さを
高さと凹凸の面積をコントロールしてヘッドクラッシュ
の原因を除去するものである。
Means for Solving the Problems In order to solve the above problems, the present invention provides a magnetic recording medium substrate by polishing the surface of the substrate, applying a photoresist, providing circumferential grooves in the photoresist, and then etching the substrate. The surface is textured and the height and area of the texture are controlled to eliminate the cause of head crashes.

作用 上記手段のように磁気記録基板の表面に凹凸を形成する
とき、フォトレジストによるマスキングとエツチング手
法を用いると、粗さを「設計、加工できるため、遊離砥
粒の研磨による粗さ加工と異なり、凹凸の高さや面積の
割合がコントロールされ、その結果磁気ヘッドが異常凸
部に衝突したり、記録媒体の表面に強く密着することが
なくなる。
Effect When forming irregularities on the surface of a magnetic recording substrate as in the above method, using photoresist masking and etching techniques allows the roughness to be designed and processed, unlike roughness processing by polishing free abrasive grains. The height and area ratio of the unevenness are controlled, and as a result, the magnetic head does not collide with abnormal protrusions or strongly adhere to the surface of the recording medium.

実施例 以下に本発明の一実施例を第1図により説明する。Example An embodiment of the present invention will be described below with reference to FIG.

図示のように磁気ヘッドの強い機械的接触による軟いア
ルミニウムなどの表面研磨された基板lの変形を保護す
るため、厚さ10〜20μmで高硬度・非磁性なニッケ
ルーリン合金薄膜2を前記基板1の上;こ設ける。この
非磁性膜2上lこ本発明の効果をもつ凹凸を形成した後
、厚さ500〜1000オングストロームのコバルト−
ニッケルクロム合金などの磁性膜3を作り、その上に磁
性膜3の防錆保護および磁気ヘッドとの潤滑性を保つた
め数百オングストロームの保護膜4を成膜して多層構成
の磁気記録媒体を製作する。
As shown in the figure, in order to protect the substrate l whose surface has been polished, such as soft aluminum, from being deformed by the strong mechanical contact of the magnetic head, a highly hard and non-magnetic nickel-phosphorous alloy thin film 2 with a thickness of 10 to 20 μm is applied to the substrate. Above 1; this is provided. After forming the unevenness having the effect of the present invention on this non-magnetic film 2, a cobalt film having a thickness of 500 to 1000 angstroms is coated.
A magnetic film 3 made of nickel-chromium alloy or the like is made, and a protective film 4 of several hundred angstroms is formed on top of the magnetic film 3 to prevent rust and maintain lubricity with the magnetic head, thereby creating a multilayered magnetic recording medium. To manufacture.

第1図(b)は、非磁性膜2表面の粗さの測定データで
ある。
FIG. 1(b) shows measurement data of the roughness of the surface of the nonmagnetic film 2.

次に製造方法についてさらに詳しく説明する。Next, the manufacturing method will be explained in more detail.

ダイヤモンド旋盤や固定砥粒により表面仕上げをしたア
ルミニウムなどの基板1の表面にニッケルリンなどの高
硬度な非磁性膜2を10〜20μm程度形成する。次に
酸化アルミニウムなどの遊離砥粒により表面粗さ(R,
、x)を300オングストローム以下1′ニー仕上げる
。加工痕による磁気的異方性を考慮して円周方向に加工
痕が残るように仕上げる場合もある。つぎにスピナーな
どにより、非磁性膜2上に均一にフォトレジストを塗布
し、フォトレジストやレーザービームなどを利用して円
周方向に1μm程度のピッチで溝ができるように現像す
る。ついでエツチング液に浸漬し非磁性膜上に凹凸を作
る。エツチング液を用いる以外にアルゴンイオンなどを
利用したドライエッチングで溝を作る場合もある。次に
7オトレジストを酸素プラズマエツチング法などにより
除去し、そのf& mllバルー−ッケルークロム合金
などの磁性膜3と炭素などの潤滑性能を有する保護膜4
をスパッタ法などにより底膜して磁気記録媒体を製作す
る。
A highly hard nonmagnetic film 2 made of nickel phosphorous or the like is formed to a thickness of about 10 to 20 μm on the surface of a substrate 1 made of aluminum or the like whose surface has been finished using a diamond lathe or fixed abrasive. Next, surface roughness (R,
, x) to a 1' knee finish of 300 angstroms or less. In some cases, finishing is done so that machining marks remain in the circumferential direction, taking into account the magnetic anisotropy caused by the machining marks. Next, a photoresist is uniformly applied onto the nonmagnetic film 2 using a spinner or the like, and developed using a photoresist or a laser beam so that grooves are formed at a pitch of about 1 μm in the circumferential direction. Then, it is immersed in an etching solution to create irregularities on the nonmagnetic film. In addition to using an etching solution, the grooves may also be created by dry etching using argon ions or the like. Next, the photoresist 7 is removed by an oxygen plasma etching method, etc., and a magnetic film 3 made of f&ml chrome alloy or the like and a protective film 4 having lubricating properties made of carbon or the like are formed.
A magnetic recording medium is manufactured by forming a bottom film using a sputtering method or the like.

この方法で製作した媒体は、第1図(b)に示すように
異常な凸部の発生がなく、またコンタクト。
The media manufactured by this method has no abnormal protrusions and no contact, as shown in FIG. 1(b).

スタート、ストップ時の接触面積はほどよく大きいため
ヘッドクラッシュの発生がない。しかし接触面積が大き
過ぎるとヘッドと媒体との吸着が強くなり、円滑なコン
タクト、スタート、ストップ動作が得られず問題となる
が、本発明の製造方法によればフォトマスクの溝ピッチ
や四部、凸部の面積比を調整することができるので吸着
による問題を解決できる。
The contact area during starting and stopping is reasonably large, so head crashes do not occur. However, if the contact area is too large, the adhesion between the head and the medium will be strong and smooth contact, start, and stop operations will not be obtained, which poses a problem. However, according to the manufacturing method of the present invention, the groove pitch of the photomask, Since the area ratio of the convex portions can be adjusted, problems caused by adsorption can be solved.

発明の効果 一般に非磁性膜2の面をあらし、凹凸を形成することは
、ヘッド、媒体間の接触面積を適切に保ち、磁気ヘッド
のコンタクト、スタート、ストップ時に発生ずる問題を
解決する有力な手段である。
Effects of the Invention In general, roughening the surface of the nonmagnetic film 2 to form irregularities is an effective means of maintaining an appropriate contact area between the head and the medium and solving problems that occur when contacting, starting, and stopping the magnetic head. It is.

つまり凸部の先端面積が小さく、接触点が少ないと凝着
やヘッドクラッシュが起り易い。反対に磁性膜3の表面
が平滑すぎると接触面積が広くなり、ヘッドは強く媒体
表面に吸着されて円滑なヘッド走行が得られない。
In other words, if the tip area of the convex portion is small and there are few contact points, adhesion and head crushing are likely to occur. On the other hand, if the surface of the magnetic film 3 is too smooth, the contact area will be large and the head will be strongly attracted to the medium surface, making it impossible to achieve smooth head running.

したがって本発明のように、平面性をよく仕上げた非磁
性膜表面にフォトレジストを塗布し、このフォトレジス
トにコントロールされた円周方向の溝を設け、その後エ
ツチングにより凹凸加工を行うことにより異常な大きさ
の凹凸部の発生を防ぎ、高さを均一化するとともに、コ
ンタクト、スタート、ストップ時におけるヘッドの接触
面積を適切に設定することができる。また潤滑剤として
ペースト状または油状のものを使用したり、記録媒体を
使用する雰囲気の湿度が高いときは、媒体表面の凹凸の
面積割合とコンタクト、スタート。
Therefore, as in the present invention, a photoresist is applied to the surface of a non-magnetic film with a well-finished planarity, grooves are formed in the photoresist in a controlled circumferential direction, and then irregularities are processed by etching. It is possible to prevent the occurrence of irregularities in size, to make the height uniform, and to appropriately set the contact area of the head at the time of contact, start, and stop. In addition, if a paste or oil type lubricant is used, or if the atmosphere in which the recording medium is used is high in humidity, contact and start may occur depending on the area ratio of unevenness on the medium surface.

ストップ寿命の関係は深くなり、四部の総面積が凸部の
総面積より広いとき寿命は長くなる。
The relationship between stop life becomes deeper, and when the total area of the four parts is wider than the total area of the convex parts, the life becomes longer.

以上のように基板の表面を研磨したのち、フォトレジス
トを塗布し、前記フォトレジストに円周方向の溝を設け
、現像したのちエツチングして基板表面に凹凸を設計加
工することにより、記録密度の高い媒体上を磁気ヘッド
が狭小な間隙で走行するときの信頼性が飛躍的に向上す
る。
After polishing the surface of the substrate as described above, a photoresist is applied, circumferential grooves are formed in the photoresist, developed and etched to design and process irregularities on the substrate surface, thereby increasing the recording density. Reliability when a magnetic head runs over a high-quality medium with a narrow gap is dramatically improved.

【図面の簡単な説明】 第1図(a)は本発明の磁気記録媒体の一実施例の断面
構成図、第1図(b)は第1図(a)における非磁性膜
の表面粗さ形状図、第2図(a)は従来の磁気記録媒体
の断面構成図、第2図(b)は第2図(a)における非
磁性膜の表面粗さ形状図である。 1・・・・・・基板、2・・・・・・非磁性膜。
[BRIEF DESCRIPTION OF THE DRAWINGS] FIG. 1(a) is a cross-sectional diagram of an embodiment of the magnetic recording medium of the present invention, and FIG. 1(b) shows the surface roughness of the nonmagnetic film in FIG. 1(a). FIG. 2(a) is a cross-sectional diagram of a conventional magnetic recording medium, and FIG. 2(b) is a diagram of the surface roughness of the nonmagnetic film in FIG. 2(a). 1...Substrate, 2...Nonmagnetic film.

Claims (2)

【特許請求の範囲】[Claims] (1)基板の表面を研磨した後、フォトレジストを塗布
し、前記フォトレジストに円周方向の溝を設け、その後
、エッチングして前記溝による凹凸を前記基板の表面に
加工する磁気記録媒体用基板の製造方法。
(1) For magnetic recording media, after polishing the surface of the substrate, a photoresist is applied, circumferential grooves are provided in the photoresist, and then etching is performed to create irregularities due to the grooves on the surface of the substrate. Substrate manufacturing method.
(2)基板の凹部の総面積が凸部の総面積に比べて広い
ことを特徴とする請求項1記載の磁気記録媒体用基板の
製造方法。
(2) The method of manufacturing a substrate for a magnetic recording medium according to claim 1, wherein the total area of the concave portions of the substrate is larger than the total area of the convex portions.
JP31803289A 1989-12-07 1989-12-07 Production of substrate for magnetic recording medium Pending JPH03178035A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP31803289A JPH03178035A (en) 1989-12-07 1989-12-07 Production of substrate for magnetic recording medium

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP31803289A JPH03178035A (en) 1989-12-07 1989-12-07 Production of substrate for magnetic recording medium

Publications (1)

Publication Number Publication Date
JPH03178035A true JPH03178035A (en) 1991-08-02

Family

ID=18094736

Family Applications (1)

Application Number Title Priority Date Filing Date
JP31803289A Pending JPH03178035A (en) 1989-12-07 1989-12-07 Production of substrate for magnetic recording medium

Country Status (1)

Country Link
JP (1) JPH03178035A (en)

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