JPH03168259A - Metal substrate coated with polyetheramideimide resin and production thereof - Google Patents
Metal substrate coated with polyetheramideimide resin and production thereofInfo
- Publication number
- JPH03168259A JPH03168259A JP30984189A JP30984189A JPH03168259A JP H03168259 A JPH03168259 A JP H03168259A JP 30984189 A JP30984189 A JP 30984189A JP 30984189 A JP30984189 A JP 30984189A JP H03168259 A JPH03168259 A JP H03168259A
- Authority
- JP
- Japan
- Prior art keywords
- resin
- metal substrate
- solution
- imide resin
- polyetheramide
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 229920005989 resin Polymers 0.000 title claims abstract description 95
- 239000011347 resin Substances 0.000 title claims abstract description 95
- 229910052751 metal Inorganic materials 0.000 title claims abstract description 31
- 239000002184 metal Substances 0.000 title claims abstract description 31
- 239000000758 substrate Substances 0.000 title claims abstract description 25
- 238000004519 manufacturing process Methods 0.000 title claims description 6
- ARCGXLSVLAOJQL-UHFFFAOYSA-N trimellitic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C(C(O)=O)=C1 ARCGXLSVLAOJQL-UHFFFAOYSA-N 0.000 claims abstract description 11
- 229910052782 aluminium Inorganic materials 0.000 claims abstract description 10
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims abstract description 10
- 238000000576 coating method Methods 0.000 claims abstract description 9
- 239000011248 coating agent Substances 0.000 claims abstract description 8
- 239000003960 organic solvent Substances 0.000 claims abstract description 8
- 239000002253 acid Substances 0.000 claims abstract description 5
- HLBLWEWZXPIGSM-UHFFFAOYSA-N 4-Aminophenyl ether Chemical compound C1=CC(N)=CC=C1OC1=CC=C(N)C=C1 HLBLWEWZXPIGSM-UHFFFAOYSA-N 0.000 claims abstract description 4
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 40
- 239000000463 material Substances 0.000 claims description 38
- 229910052742 iron Inorganic materials 0.000 claims description 19
- USIUVYZYUHIAEV-UHFFFAOYSA-N diphenyl ether Chemical compound C=1C=CC=CC=1OC1=CC=CC=C1 USIUVYZYUHIAEV-UHFFFAOYSA-N 0.000 claims description 6
- 230000006866 deterioration Effects 0.000 abstract description 10
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 abstract description 7
- SRPWOOOHEPICQU-UHFFFAOYSA-N trimellitic anhydride Chemical compound OC(=O)C1=CC=C2C(=O)OC(=O)C2=C1 SRPWOOOHEPICQU-UHFFFAOYSA-N 0.000 abstract description 5
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 abstract description 4
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 abstract description 3
- 239000011737 fluorine Substances 0.000 abstract description 3
- 229910052731 fluorine Inorganic materials 0.000 abstract description 3
- 239000000243 solution Substances 0.000 description 33
- 239000004962 Polyamide-imide Substances 0.000 description 16
- 229920002312 polyamide-imide Polymers 0.000 description 16
- 239000004721 Polyphenylene oxide Substances 0.000 description 13
- 229920000570 polyether Polymers 0.000 description 13
- 238000000034 method Methods 0.000 description 12
- 238000006243 chemical reaction Methods 0.000 description 11
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 10
- 229920002614 Polyether block amide Polymers 0.000 description 10
- 238000002360 preparation method Methods 0.000 description 10
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 9
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 9
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 9
- 230000000052 comparative effect Effects 0.000 description 9
- 230000009102 absorption Effects 0.000 description 7
- 238000010521 absorption reaction Methods 0.000 description 7
- XUSNPFGLKGCWGN-UHFFFAOYSA-N 3-[4-(3-aminopropyl)piperazin-1-yl]propan-1-amine Chemical compound NCCCN1CCN(CCCN)CC1 XUSNPFGLKGCWGN-UHFFFAOYSA-N 0.000 description 6
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 6
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 6
- 238000000862 absorption spectrum Methods 0.000 description 5
- 238000010438 heat treatment Methods 0.000 description 5
- 235000011007 phosphoric acid Nutrition 0.000 description 5
- 229910000831 Steel Inorganic materials 0.000 description 4
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 4
- 125000003368 amide group Chemical group 0.000 description 4
- 125000005462 imide group Chemical group 0.000 description 4
- 229910052757 nitrogen Inorganic materials 0.000 description 4
- 229910052710 silicon Inorganic materials 0.000 description 4
- 239000010703 silicon Substances 0.000 description 4
- 239000002904 solvent Substances 0.000 description 4
- 239000010959 steel Substances 0.000 description 4
- 238000003756 stirring Methods 0.000 description 4
- HVLLSGMXQDNUAL-UHFFFAOYSA-N triphenyl phosphite Chemical compound C=1C=CC=CC=1OP(OC=1C=CC=CC=1)OC1=CC=CC=C1 HVLLSGMXQDNUAL-UHFFFAOYSA-N 0.000 description 4
- WFDIJRYMOXRFFG-UHFFFAOYSA-N Acetic anhydride Chemical compound CC(=O)OC(C)=O WFDIJRYMOXRFFG-UHFFFAOYSA-N 0.000 description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- 239000012298 atmosphere Substances 0.000 description 3
- 150000003949 imides Chemical class 0.000 description 3
- 239000004615 ingredient Substances 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 229910052759 nickel Inorganic materials 0.000 description 3
- 239000007787 solid Substances 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- ROSDSFDQCJNGOL-UHFFFAOYSA-N Dimethylamine Chemical compound CNC ROSDSFDQCJNGOL-UHFFFAOYSA-N 0.000 description 2
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 2
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- TZCXTZWJZNENPQ-UHFFFAOYSA-L barium sulfate Chemical compound [Ba+2].[O-]S([O-])(=O)=O TZCXTZWJZNENPQ-UHFFFAOYSA-L 0.000 description 2
- CJPIDIRJSIUWRJ-UHFFFAOYSA-N benzene-1,2,4-tricarbonyl chloride Chemical compound ClC(=O)C1=CC=C(C(Cl)=O)C(C(Cl)=O)=C1 CJPIDIRJSIUWRJ-UHFFFAOYSA-N 0.000 description 2
- 238000011088 calibration curve Methods 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 229910052804 chromium Inorganic materials 0.000 description 2
- 239000011651 chromium Substances 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 125000004427 diamine group Chemical group 0.000 description 2
- 229910001873 dinitrogen Inorganic materials 0.000 description 2
- 239000012153 distilled water Substances 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 239000010419 fine particle Substances 0.000 description 2
- 238000010528 free radical solution polymerization reaction Methods 0.000 description 2
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- -1 silicon nitrides Chemical class 0.000 description 2
- 230000003746 surface roughness Effects 0.000 description 2
- BFKJFAAPBSQJPD-UHFFFAOYSA-N tetrafluoroethene Chemical group FC(F)=C(F)F BFKJFAAPBSQJPD-UHFFFAOYSA-N 0.000 description 2
- NJMOHBDCGXJLNJ-UHFFFAOYSA-N trimellitic anhydride chloride Chemical compound ClC(=O)C1=CC=C2C(=O)OC(=O)C2=C1 NJMOHBDCGXJLNJ-UHFFFAOYSA-N 0.000 description 2
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 2
- 229910052721 tungsten Inorganic materials 0.000 description 2
- 239000010937 tungsten Substances 0.000 description 2
- 239000011701 zinc Substances 0.000 description 2
- 229910052725 zinc Inorganic materials 0.000 description 2
- CYSGHNMQYZDMIA-UHFFFAOYSA-N 1,3-Dimethyl-2-imidazolidinon Chemical compound CN1CCN(C)C1=O CYSGHNMQYZDMIA-UHFFFAOYSA-N 0.000 description 1
- 229910052582 BN Inorganic materials 0.000 description 1
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- 229910001369 Brass Inorganic materials 0.000 description 1
- 229920000298 Cellophane Polymers 0.000 description 1
- 241000207199 Citrus Species 0.000 description 1
- 229910000599 Cr alloy Inorganic materials 0.000 description 1
- 229910000640 Fe alloy Inorganic materials 0.000 description 1
- 239000004606 Fillers/Extenders Substances 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- 229920000877 Melamine resin Polymers 0.000 description 1
- 229910001182 Mo alloy Inorganic materials 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 239000004695 Polyether sulfone Substances 0.000 description 1
- 239000004697 Polyetherimide Substances 0.000 description 1
- 241001428214 Polyides Species 0.000 description 1
- 239000006087 Silane Coupling Agent Substances 0.000 description 1
- 239000004963 Torlon Substances 0.000 description 1
- 229920003997 Torlon® Polymers 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- 239000006096 absorbing agent Substances 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 239000002390 adhesive tape Substances 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 239000010407 anodic oxide Substances 0.000 description 1
- 239000003963 antioxidant agent Substances 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 229910052810 boron oxide Inorganic materials 0.000 description 1
- 239000010951 brass Substances 0.000 description 1
- 239000006229 carbon black Substances 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 238000004587 chromatography analysis Methods 0.000 description 1
- KRVSOGSZCMJSLX-UHFFFAOYSA-L chromic acid Substances O[Cr](O)(=O)=O KRVSOGSZCMJSLX-UHFFFAOYSA-L 0.000 description 1
- 235000020971 citrus fruits Nutrition 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- 230000001186 cumulative effect Effects 0.000 description 1
- 230000018044 dehydration Effects 0.000 description 1
- 238000006297 dehydration reaction Methods 0.000 description 1
- RAABOESOVLLHRU-UHFFFAOYSA-N diazene Chemical compound N=N RAABOESOVLLHRU-UHFFFAOYSA-N 0.000 description 1
- 229910000071 diazene Inorganic materials 0.000 description 1
- 238000003618 dip coating Methods 0.000 description 1
- 239000002270 dispersing agent Substances 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 238000012674 dispersion polymerization Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000004070 electrodeposition Methods 0.000 description 1
- 239000003480 eluent Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- AWJWCTOOIBYHON-UHFFFAOYSA-N furo[3,4-b]pyrazine-5,7-dione Chemical compound C1=CN=C2C(=O)OC(=O)C2=N1 AWJWCTOOIBYHON-UHFFFAOYSA-N 0.000 description 1
- 238000005227 gel permeation chromatography Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 1
- 229920006015 heat resistant resin Polymers 0.000 description 1
- 239000003779 heat-resistant material Substances 0.000 description 1
- YAMHXTCMCPHKLN-UHFFFAOYSA-N imidazolidin-2-one Chemical compound O=C1NCCN1 YAMHXTCMCPHKLN-UHFFFAOYSA-N 0.000 description 1
- KQNPFQTWMSNSAP-UHFFFAOYSA-N isobutyric acid Chemical compound CC(C)C(O)=O KQNPFQTWMSNSAP-UHFFFAOYSA-N 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- 150000001247 metal acetylides Chemical class 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 239000010445 mica Substances 0.000 description 1
- 229910052618 mica group Inorganic materials 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- MOWNZPNSYMGTMD-UHFFFAOYSA-N oxidoboron Chemical class O=[B] MOWNZPNSYMGTMD-UHFFFAOYSA-N 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 239000002798 polar solvent Substances 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 238000012643 polycondensation polymerization Methods 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920006393 polyether sulfone Polymers 0.000 description 1
- 229920001601 polyetherimide Polymers 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 239000009719 polyimide resin Substances 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 1
- 239000004810 polytetrafluoroethylene Substances 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000012673 precipitation polymerization Methods 0.000 description 1
- 239000001294 propane Substances 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- 238000007761 roller coating Methods 0.000 description 1
- 102200082907 rs33918131 Human genes 0.000 description 1
- 229910021332 silicide Inorganic materials 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Chemical class [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 239000000454 talc Substances 0.000 description 1
- 229910052623 talc Inorganic materials 0.000 description 1
- 238000010998 test method Methods 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- ANRHNWWPFJCPAZ-UHFFFAOYSA-M thionine Chemical compound [Cl-].C1=CC(N)=CC2=[S+]C3=CC(N)=CC=C3N=C21 ANRHNWWPFJCPAZ-UHFFFAOYSA-M 0.000 description 1
- 239000004408 titanium dioxide Substances 0.000 description 1
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明はボリエ,−テルアξドイミド樹脂で被覆した金
属基材及びその製造法に関する。DETAILED DESCRIPTION OF THE INVENTION [Industrial Field of Application] The present invention relates to a metal substrate coated with a Bolier,-Telua ξ dimide resin and a method for producing the same.
従来、各種金属基材に対する耐熱塗料及び耐熱接着剤と
しては、ボリアξドイミド樹脂、ポリイミド樹脂、ボリ
アξノビスマレイミド樹脂などの耐熱性に優れたボリイ
ξド系樹脂が用いられている。中でもポリアミドイミド
樹脂は耐熱性、基材との密着性、溶媒溶解性、価格面の
バランスに優れており、耐熱材料として高い評価を得て
いる。BACKGROUND ART Conventionally, as heat-resistant paints and heat-resistant adhesives for various metal substrates, polyide-based resins with excellent heat resistance, such as boria-ξ-dimide resins, polyimide resins, and boria-ξ-nobismaleimide resins, have been used. Among them, polyamide-imide resin has an excellent balance of heat resistance, adhesion to substrates, solvent solubility, and price, and is highly evaluated as a heat-resistant material.
一方、近年、一般産業機械器具部品、電気・電子部品、
離型用金型などにおいては高温の雰囲気下で長時間使用
する用途が増加しており、これに伴って耐熱樹脂被覆金
属基材に要求される耐熱性も高度化している。特に、耐
熱性の一つの指標である耐劣化性(熱処理後の密着性)
についても要求される熱処理温度が高くなっている。し
かし、従来のポリアミドイミド樹脂被覆金属基材は熱処
理温度が200゜C付近の中位の耐劣化性が要求される
用途には有用な材料であったが、熱処理温度が300゜
C付近の高度な耐劣化性が要求される用途には適用でき
ない問題があった。On the other hand, in recent years, general industrial machinery parts, electric/electronic parts,
Release molds and the like are increasingly used in high-temperature atmospheres for long periods of time, and along with this, the heat resistance required of heat-resistant resin-coated metal substrates is also becoming more sophisticated. In particular, deterioration resistance (adhesion after heat treatment) is an indicator of heat resistance.
The heat treatment temperatures required are also increasing. However, conventional polyamide-imide resin-coated metal substrates have been useful materials for applications requiring moderate deterioration resistance at heat treatment temperatures of around 200°C, but at high heat treatment temperatures of around 300°C. There was a problem that it could not be applied to applications that required high deterioration resistance.
本発明は、上記従来技術の問題点を解消し、特に耐劣化
性に優れたポリヱーテルアごドイミド樹脂で被覆した金
属基材及びその製造法を提供することを目的とする。It is an object of the present invention to solve the problems of the prior art described above, and to provide a metal substrate coated with a polyester ago doimide resin which has particularly excellent resistance to deterioration, and a method for producing the same.
本発明は、トリメリット酸又はその反応性酸誘導体と4
,4′−ジアミノジフェニルエーテル又は4.4′−ジ
イソシアネートジフェニルエーテルとを反応させて得ら
れる、数平均分子量(分子量既知のボリスチレンを検量
線とするゲルパーミエイションクロマトグラフィー法に
より求めた)が26,000以上であるポリエーテルア
ミドイミド樹脂を有機溶媒に溶解した溶液を金属基材表
面に塗布、焼付けてなるポリエーテルア短ドイ壽ド樹脂
被覆金属基材及びその製造法に関する。The present invention provides trimellitic acid or its reactive acid derivatives and 4
, 4'-diaminodiphenyl ether or 4,4'-diisocyanate diphenyl ether, the number average molecular weight (determined by gel permeation chromatography using boristyrene of known molecular weight as a calibration curve) is 26,000. The present invention relates to a metal substrate coated with a polyether amide-imide resin, which is obtained by applying and baking a solution of the polyether amide-imide resin dissolved in an organic solvent onto the surface of the metal substrate, and a method for producing the same.
本発明におけるトリメリット酸の反応性酸誘導体として
は、例えば、トリメリット酸無水物、トリメリット酸無
水物モノクロライド、1. 4−ジカルボキシ−3−
N,N−ジメチル力ルバモイルベンゼン,1 4−ジ
カルボキシ−3−カルボフェノキシベンゼン、1.4−
ジカルボメトキシ−3−カルボキシベンゼン、トリメリ
ット酸とアンモニア、ジメチルアξン、トリエチルアミ
ンなどからなるアンモニウム塩類などが用いられる。特
にトリメリント酸無水物、トリメリット酸無水物モノク
ロライドが好ましい。Examples of the reactive acid derivative of trimellitic acid in the present invention include trimellitic anhydride, trimellitic anhydride monochloride, 1. 4-dicarboxy-3-
N,N-dimethylrubamoylbenzene, 1 4-dicarboxy-3-carbophenoxybenzene, 1.4-
Ammonium salts such as dicarbomethoxy-3-carboxybenzene, trimellitic acid and ammonia, dimethylamine, triethylamine, etc. are used. Particularly preferred are trimellitic anhydride and trimellitic anhydride monochloride.
本発明のポリエーテルアミドイξド樹脂を製造するには
、トリメリット酸又はその反応性酸誘導体と4.4′−
ジアミノジフェニルエーテル又は4,4゛−ジイソシア
ネートジフェニルエーテルとはほぼ当モルで使用して反
応させるのが好ましい。この反応は、溶液重合法(例え
ば、特公昭44−19274号公報、特公昭49−40
77号公報、特公昭42−15637号公報、特開昭5
7−14622号公報)、沈殿重合法(例えば、特公昭
54−44719号公報)、非水分散重合法(例えば、
USP4,427.822)、溶融重合法(特公昭40
−8910号公報)等の既知の製造法により縮重合させ
て得ることができる。コスト面を考慮すると、トリメリ
ット酸無水物と4.4′−ジアミノジフヱニルエーテル
とをリン酸などの脱水触媒の存在下で縮重合させる溶液
重合法が好ましい。To produce the polyetheramide ξ-do resin of the present invention, trimellitic acid or its reactive acid derivative and 4.4'-
Diaminodiphenyl ether or 4,4'-diisocyanate diphenyl ether is preferably used in approximately equimolar amounts for the reaction. This reaction can be carried out using a solution polymerization method (for example, Japanese Patent Publication No. 44-19274, Japanese Patent Publication No. 49-40
Publication No. 77, Japanese Patent Publication No. 15637/1977, Japanese Patent Application Publication No. 1977
7-14622), precipitation polymerization method (for example, Japanese Patent Publication No. 54-44719), non-aqueous dispersion polymerization method (for example,
USP 4,427.822), melt polymerization method (Special Publication No. 40
It can be obtained by condensation polymerization using a known production method such as JP-A-8910). In consideration of cost, a solution polymerization method in which trimellitic anhydride and 4,4'-diaminodiphenyl ether are condensed and polymerized in the presence of a dehydration catalyst such as phosphoric acid is preferred.
本発明のポリエーテルアミドイミド樹脂は、例えば、下
記の一般式(1)、(II)、(III)などの結合様
弐を含む樹脂である。The polyetheramide-imide resin of the present invention is, for example, a resin containing a bond structure such as the following general formula (1), (II), or (III).
(1) C式中、Rは一〇−0似ζ江 を示す〕。(1) In formula C, R represents 10-0 similar zeta].
本発明におけるポリエーテルア旦ドイミド樹脂としては
、数平均分子量が26.000以上のものを用いる。2
6,000未満では耐劣化性に劣る。特に好ましくは、
30,000〜7 0,0 0 0の範囲である。7
0.0 0 0を超えると、溶液の粘度が高くなり、取
り扱い及び塗工作業が困難となる。As the polyether adimide resin in the present invention, one having a number average molecular weight of 26,000 or more is used. 2
If it is less than 6,000, the deterioration resistance is poor. Particularly preferably,
It is in the range of 30,000 to 70,000. 7
When it exceeds 0.0 0 0, the viscosity of the solution increases, making handling and coating operations difficult.
本明細書において数平均分子量は、分子量既知のボリス
チレンを検量線とするゲルパー5エイシジンクロマトグ
ラフィー法により求めたものである。具体的には、以下
の条件で測定した。In this specification, the number average molecular weight is determined by Gelper 5 Acidine chromatography using boristyrene of known molecular weight as a calibration curve. Specifically, the measurement was performed under the following conditions.
装置:日立655A型
カラム:日立化或工業社製Gelpak GL − S
3 0 0MDT−S (3 0 0mmX 8+n
+++φ)2本溶離液:テトラヒドロフラン/ジメチル
ホルムアミド=1/1 (容量)、
H3PO4(0.06モル/ l )/ L i B
r−HzO(0.03モル/E)
流量 :1戚/分
検出器:UV (270nm)
本発明のポリエーテルア≧ドイミド樹脂は、有機溶媒に
溶解した溶液として金属基材表面に塗布される。ここで
有機溶媒としては、N−メチルピロリドン、ジメチルホ
ルムアミド、ジメチルアセトアごド、1.3−ジメチル
−2−イミダゾリジノン、1,3−ジメチル−3.4,
5.6−テトラヒドロ−2(IH)一ピリミジノンなど
の含窒素系極性溶媒を用いることが好ましい。Equipment: Hitachi 655A column: Gelpak GL-S manufactured by Hitachi Chemical Co., Ltd.
300MDT-S (300mmX 8+n
+++φ) 2 eluents: Tetrahydrofuran/dimethylformamide = 1/1 (volume), H3PO4 (0.06 mol/l)/L i B
r-HzO (0.03 mol/E) Flow rate: 1 relative/min Detector: UV (270 nm) The polyether a≧dimide resin of the present invention is applied to the surface of a metal substrate as a solution dissolved in an organic solvent. Here, the organic solvents include N-methylpyrrolidone, dimethylformamide, dimethylacetate, 1,3-dimethyl-2-imidazolidinone, 1,3-dimethyl-3.4,
It is preferable to use a nitrogen-containing polar solvent such as 5.6-tetrahydro-2(IH)-pyrimidinone.
上記のように、本発明においては、本発明のポリエーテ
ルアξドイミド樹脂を有機溶媒に溶解した溶液を金属基
材に塗布するが、この溶液は上記した有機溶媒中で合威
して得たポリエーテルアミドイミド樹脂溶液をそのまま
用いてもよいし、実質的に合或溶媒を含まない固形のポ
リエーテルアミドイミド樹脂を上記した有機溶媒に溶解
させた}容}夜を用いてもよい。As described above, in the present invention, a solution in which the polyether ξ dimide resin of the present invention is dissolved in an organic solvent is applied to a metal substrate. The amide-imide resin solution may be used as it is, or a solution obtained by dissolving a solid polyether amide-imide resin substantially free of a solvent in the above-mentioned organic solvent may be used.
本発明におけるポリエーテルアξドイミド樹脂溶液には
必要に応して下記の物質を、好ましくは溶液中のポリエ
ーテルア旦ドイ稟ト′樹脂に対して0. 1〜200重
量%の範囲で用いることができる。In the present invention, the following substances are added to the polyether amide resin solution as necessary, preferably at 0.000% relative to the polyether amide resin in the solution. It can be used in a range of 1 to 200% by weight.
これらの物質は一種又は二種以上用いられる。具体的に
は、例えば、金属、金属酸化物、金属窒化物、金属炭化
物、金属ケイ素化物、ホウ素、ホウ素酸化物、ホウ素窒
化物、ケイ素、ケイ素酸化物、ケイ素窒化物、ケイ素炭
化物等の無代微粒子体、γ−アミノプロビルトリエトキ
シシラン、グリシドキシブロビルトリエトキシシラン等
のシランカップリング剤、メラミン樹脂、フェノール樹
脂、エポキシ樹脂、ボリスルホン樹脂、ポリエーテルス
ルホン樹脂、弗素樹脂等の改質材、ベンガラ、二酸化チ
タン、カーボンブラック、硫酸バリウム、マイカ、タル
ク、黄鉛、シアニンブルー等の有機、無機又は体質顔料
、界面活性剤等の分散剤、レベリング剤、沈降防止剤、
酸化防止剤、紫外線吸収剤などが用いられる。特に、平
均粒子径が0.1〜10μmである弗素樹脂の粉末又は
水性分散体を併用することにより非粘着性、耐摩耗性を
付与することができる。弗素樹脂としては、例えば、ポ
リテトラフルオロエチレン、テトラフルオロエチレンと
テトラフルオロエチレン以外の他の弗素含有モノエチレ
ン系不飽和単量体との共重合体などが挙げられる。One or more of these substances may be used. Specifically, for example, metals, metal oxides, metal nitrides, metal carbides, metal silicides, boron, boron oxides, boron nitrides, silicon, silicon oxides, silicon nitrides, silicon carbides, etc. Modification of fine particles, silane coupling agents such as γ-aminoprobyltriethoxysilane and glycidoxybrobyltriethoxysilane, melamine resins, phenol resins, epoxy resins, borissulfone resins, polyethersulfone resins, fluorine resins, etc. materials, organic, inorganic or extender pigments such as red iron, titanium dioxide, carbon black, barium sulfate, mica, talc, yellow lead, cyanine blue, dispersants such as surfactants, leveling agents, anti-settling agents,
Antioxidants, ultraviolet absorbers, etc. are used. In particular, non-adhesion and abrasion resistance can be imparted by using a fluororesin powder or aqueous dispersion having an average particle size of 0.1 to 10 μm. Examples of the fluororesin include polytetrafluoroethylene, a copolymer of tetrafluoroethylene and a fluorine-containing monoethylenically unsaturated monomer other than tetrafluoroethylene, and the like.
本発明に用いる金属基材としては、例えば、純鉄、鋼及
び炭素、ケイ素、タングステン、ニッケル、クロム、マ
ンガン、モリブデンと鉄との合金等の鉄基材、アルごニ
ウム及び鋼、マグネシウム、マンガン、ケイ素、亜鉛、
クロムとアル藁ニウムとの合金等のアルミニウム基材、
鋼及び黄銅等の銅基材、ニッケル基材、モリブデン基材
、タングステン基材及びこれらの亜鉛、クロム、アルミ
ニウム、銅、ニッケル等の各種めっき品、クロム酸系、
リン酸系などの化或皮膜及び陽極酸化皮膜を形威させた
表面処理品、表面研摩品などを用いることが好ましい。Examples of metal base materials used in the present invention include pure iron, steel and carbon, silicon, tungsten, nickel, chromium, manganese, iron base materials such as alloys of molybdenum and iron, argonium and steel, magnesium, manganese, etc. , silicon, zinc,
Aluminum base materials such as alloys of chromium and aluminum,
Copper-based materials such as steel and brass, nickel-based materials, molybdenum-based materials, tungsten-based materials, and various plated products of these materials such as zinc, chromium, aluminum, copper, and nickel, chromic acid-based materials,
It is preferable to use a surface-treated product with a phosphoric acid-based chemical coating or an anodic oxide coating, a surface-polished product, or the like.
アル柔ニウム基材、鉄基材が好ましく用いられる。特に
、価格面で優れている鉄基材を用いることが好ましい。Aluminum base materials and iron base materials are preferably used. In particular, it is preferable to use an iron base material, which is superior in terms of cost.
本発明になるポリエーテルアミドイミド樹脂被覆金属基
材は、上記したポリエーテルアミドイミド樹脂溶液を金
属基材表面に塗布、焼付けて得られる。塗布方法として
は、例えば刷毛塗り、スプレー塗装、浸漬塗装、ローラ
ー塗装、電着塗装などの通常使用される方法が用いられ
る。The polyetheramide-imide resin-coated metal base material of the present invention is obtained by applying the above-mentioned polyetheramide-imide resin solution onto the surface of the metal base material and baking it. As the coating method, commonly used methods such as brush coating, spray coating, dip coating, roller coating, and electrodeposition coating are used.
焼付け方法としては、80〜1 5 0 ’Cで予備乾
燥した後に、空気雰囲気又は非酸素雰囲気下で200〜
400″Cで所望の時間焼付けする方法が好ましい。非
酸素雰囲気下での焼付けは、ポリエーテルア≧ドイミド
樹脂の熱酸化劣化を抑制し、耐熱性、密着性、機械強度
を向上させる。金属基材表面に塗布、焼付けされるポリ
エーテルアミドイξド樹脂溶液の乾燥膜厚は、目的に応
じて任意に調整されるが、通常0. 1〜100μmの
範囲が好ましく用いられる。As for the baking method, after pre-drying at 80-150'C, drying at 200-1500 C in air atmosphere or non-oxygen atmosphere.
A method of baking at 400"C for a desired time is preferable. Baking in a non-oxygen atmosphere suppresses thermal oxidative deterioration of polyethera≧dimide resin and improves heat resistance, adhesion, and mechanical strength. Metal substrate surface The dry film thickness of the polyether amide ξ-dos resin solution to be applied and baked can be arbitrarily adjusted depending on the purpose, but is usually preferably in the range of 0.1 to 100 μm.
以下、本発明を実施例及び比較例によりさらに詳しく説
明するが、本発明はこれに限定されるものではない。EXAMPLES Hereinafter, the present invention will be explained in more detail with reference to Examples and Comparative Examples, but the present invention is not limited thereto.
実施例1
(1)ポリエーテルアミドイミド樹脂溶液の調製−l立
去 モル
トリメリット酸クロライド 128.1 0.608
4 4′−ジア旦ノジフェ 121.8 0.608
ニルエーテル
トリエチルア≧ン 123.1 1.21
6N−メチルビロリドン 7 5 0. 0トリメ
リット酸クロライド(以下、TMA−CLと略記する)
とトリエチルアミンを除く上記成分を温度計、掻き混ぜ
機、窒素導入管及び水分定量器を付けた四つ口フラスコ
に入れ、窒素気流中で掻き混ぜながら−5゜Cに保った
,4.4’ −ジアミノジフヱニルエーテル(以下、D
DEと略記する)が完全に溶解した後、TMA−CLを
仕込み、完全に溶解させた。これにトリエチルアミンを
滴下した。反応系内の温度は、約25゛Cに上昇した。Example 1 (1) Preparation of polyetheramide-imide resin solution-l Removal Mol trimellitic acid chloride 128.1 0.608
4 4'-Zia Dannojife 121.8 0.608
Nyl ether triethylane 123.1 1.21
6N-methylpyrrolidone 7 5 0. 0 trimellitic acid chloride (hereinafter abbreviated as TMA-CL)
and the above ingredients except triethylamine were placed in a four-necked flask equipped with a thermometer, stirrer, nitrogen inlet tube, and moisture meter, and kept at -5°C while stirring in a nitrogen stream.4.4' -Diaminodiphenyl ether (hereinafter referred to as D
After completely dissolving TMA-CL (abbreviated as DE), TMA-CL was added and completely dissolved. Triethylamine was added dropwise to this. The temperature within the reaction system rose to about 25°C.
次いで30℃に昇温し、同温で5時間反応を進めた。こ
れに、無水酢酸310gとビリジン155gを掻き混ぜ
ながら加え、室温で24時間放置した。得られた溶液を
ジメチルホルムアミドで樹脂分濃度を約8重量%に希釈
したものをメタノール中に投入し、沈殿した微粒子状の
固形樹脂を回収した。この固形樹脂を水及びメタノール
で十分に煮沸洗浄した後、80゜Cで10時間減圧乾燥
して粉末のポリエーテルアミドイミド樹脂を得た。Then, the temperature was raised to 30°C, and the reaction was continued at the same temperature for 5 hours. To this, 310 g of acetic anhydride and 155 g of pyridine were added while stirring, and the mixture was left at room temperature for 24 hours. The obtained solution was diluted with dimethylformamide to a resin concentration of about 8% by weight, and the solution was poured into methanol, and the precipitated solid resin in the form of fine particles was recovered. This solid resin was sufficiently boiled and washed with water and methanol, and then dried under reduced pressure at 80°C for 10 hours to obtain a powdered polyetheramide-imide resin.
このポリエーテルアミドイミド樹脂の数平均分子量は、
46,000であり、赤外吸収スペクトルには1780
cm−’にイミド基の、1660cm−’に75ド基の
特性吸収が顕著に認められた。The number average molecular weight of this polyetheramideimide resin is
46,000, and the infrared absorption spectrum has 1780
Characteristic absorptions of an imide group at cm-' and a 75-do group at 1660 cm-' were clearly observed.
この粉末のポリエーテルアミドイミド樹脂20gをN−
メチルピロリドン80gに溶解して樹脂濃度20重量%
のボリエーテルアミドイミド樹脂溶液を得た。20g of this powdered polyetheramideimide resin was
Dissolved in 80g of methylpyrrolidone to give a resin concentration of 20% by weight.
A polyether amide-imide resin solution was obtained.
(2)ポリエーテルア5ドイミド樹脂被覆鉄基材の調製
JIS R6252 (研摩紙)#240で研摩した
表面粗度(Ra)が0. 4〜0.5μmの機械構造用
炭素fjI鋼材(JIS G4051、S10C、寸法
:50X150X1.6圏)の研摩表面に上記(1)の
ポリエーテルア旦ドイミド樹脂溶液を乾燥膜厚が約30
μmになるように塗布し、80℃で1時間、250゜C
で0.5時間、380゜Cでl5分焼付けてポリエーテ
ルアミドイミド樹脂被覆鉄基材を得た。(2) Preparation of polyether a5-dimide resin-coated iron base material Polished with JIS R6252 (abrasive paper) #240 to have a surface roughness (Ra) of 0. The polyether adimide resin solution of (1) above was applied to the polished surface of a 4-0.5 μm carbon fjI steel material for mechanical structures (JIS G4051, S10C, dimensions: 50 x 150 x 1.6 area) to a dry film thickness of about 30 μm.
Coat to a thickness of μm and heat at 80°C for 1 hour at 250°C.
The product was baked at 380° C. for 0.5 hours and 15 minutes at 380° C. to obtain a polyetheramide-imide resin-coated iron base material.
比較例1
(1)ポリエーテルアミドイミド柑脂溶液の調製実施例
1の(1)のDDE 1 2 1.8 g(0.6 0
8モル)を4.4′−ジアξノジフェニルメタン(以
下、DAMと略記する)120.5g (0.608モ
ル)に変えた以外は、実施例lの(1)と全く同様にし
て反応を行い、粉末のポリアミドイミド樹脂を得た.こ
のボリア累ドイξド樹脂の数平均分子量は34000で
あり、赤外吸収スペクトルには1780cm−’にイミ
ド基の、1660c111−’にアミド基の吸収が顕著
に認められた。Comparative Example 1 (1) Preparation of polyetheramide imide citrus solution DDE 1 2 1.8 g (0.6 0
The reaction was carried out in exactly the same manner as in (1) of Example 1, except that 120.5 g (0.608 mol) of 4.4'-diaξnodiphenylmethane (hereinafter abbreviated as DAM) was used. A powdered polyamide-imide resin was obtained. The number average molecular weight of this boria cumulative ξ-do resin was 34,000, and in the infrared absorption spectrum, absorption of an imide group at 1780 cm-' and absorption of an amide group at 1660 cm-' were clearly observed.
この粉末のポリアミドイミド樹脂20gをN−メチルピ
ロリドン80gに溶解して樹脂濃度20重量%のボリア
ミドイミド樹脂溶液を得た。20 g of this powdered polyamide-imide resin was dissolved in 80 g of N-methylpyrrolidone to obtain a polyamide-imide resin solution having a resin concentration of 20% by weight.
(2)ポリアミドイミド樹脂被覆鉄基材の調製樹脂溶液
を上凪(1)の樹脂溶液とした以外は実施例1の(2)
と全く同様に操作を行って、ポリアミドイミド樹脂被覆
鉄基材を得た。(2) Preparation of polyamide-imide resin-coated iron base material (2) of Example 1 except that the resin solution was that of Kaminagi (1).
The same procedure as above was carried out to obtain a polyamide-imide resin-coated iron base material.
比較例2
(1)ポリアミドイミド樹脂溶液の調製実施例1の(1
)のDDE 1 2 1.8 g(0.6 0 8モル
)を2.2−ビス〔(4−アξノフェノキシ)フェニル
〕プロパン(以下、BAPPと略記する)249.6g
(0.608モル)に変えた以外は、実施例1の(1)
と全く同様にして反応を行い、粉末のポリアミドイミド
樹脂を得た。このポリアミドイξド樹脂の数平均分子量
は、36000であり、赤外吸収スペクトルには1 7
8 0c+r’にイミド基の、1660Cll−’に
アミド基の吸収が顕著に認められた。Comparative Example 2 (1) Preparation of polyamide-imide resin solution Example 1 (1)
) of DDE 1 2 1.8 g (0.6 0 8 mol) was mixed with 249.6 g of 2.2-bis[(4-anophenoxy)phenyl]propane (hereinafter abbreviated as BAPP).
(1) of Example 1 except that it was changed to (0.608 mol)
The reaction was carried out in exactly the same manner as above to obtain a powdered polyamideimide resin. The number average molecular weight of this polyamide ξ-do resin is 36,000, and the infrared absorption spectrum shows 17
Significant absorption of an imide group at 80c+r' and an amide group at 1660Cll-' were observed.
この粉末のポリア嵩ドイミド樹脂20gをNーメチルビ
ロリドン80gに溶解して樹脂濃度20重量%のポリア
ミドイミド樹脂溶液を得た.(2)ポリアミドイミド樹
脂被覆鉄基材の調製樹脂溶液を上記(1)の樹脂溶液と
した以外は実施例Iの(2)と全く同様にして操作を行
ってポリアミドイミド樹脂被覆鉄基材を得た。20 g of this powdered polyamide-imide resin was dissolved in 80 g of N-methylpyrrolidone to obtain a polyamide-imide resin solution with a resin concentration of 20% by weight. (2) Preparation of polyamide-imide resin-coated iron base material A polyamide-imide resin-coated iron base material was prepared in the same manner as in (2) of Example I except that the resin solution in (1) above was used. Obtained.
実施例2、3及び比較例3、4
(1)ポリエーテルアごドイミド樹脂溶液の調製ノ
ーL±五 モル
トリメリット酸無水物 261.1 1.359
(以下、TMAと略記する)
DDE 269.5 1.34
6リン酸水溶液 9.4 0.080
7(リン酸含有量85%)
1.3−ジメチル−2− 2160.0イミダゾリ
ジノン
上記戒分を温度計、掻き混ぜ機、窒素導入管及び水分定
量器を付けた四つロフラスコに撹拌しながら入れ、窒素
ガスを通しながら160゜Cに昇温した。徐々に温度を
上げ、留出する水を系外に除去しなから215゜Cに昇
温し、同温度で反応を進めた。反応終点を数平均分子量
で管理し、数平均分子量が21000、25000、3
0000及び36000である4種類のポリエーテルア
ξドイミド樹脂溶液を、得た。また、溶媒を除去した粉
末のポリエーテルアミドイミド樹脂の赤外吸収スペクト
ルにはいずれも1780cm−’にイξド基の、166
0cm=にアミド基の吸収が認められた。Examples 2 and 3 and Comparative Examples 3 and 4 (1) Preparation of polyether agodoimide resin solution
-L±5 Mol trimellitic anhydride 261.1 1.359
(hereinafter abbreviated as TMA) DDE 269.5 1.34
6 phosphoric acid aqueous solution 9.4 0.080
7 (phosphoric acid content 85%) 1.3-dimethyl-2- 2160.0 imidazolidinone Stir the above ingredients in a four-lobe flask equipped with a thermometer, stirrer, nitrogen inlet tube and moisture meter. The temperature was raised to 160°C while passing nitrogen gas. The temperature was gradually raised to 215°C without removing distilled water from the system, and the reaction was continued at the same temperature. The reaction end point is controlled by the number average molecular weight, and the number average molecular weight is 21000, 25000, 3
Four types of polyether axidimide resin solutions of 0,000 and 36,000 were obtained. In addition, the infrared absorption spectrum of the powdered polyether amide imide resin from which the solvent has been removed shows that the 166
Absorption of amide groups was observed at 0 cm=.
(2)ポリエーテルアミドイミド樹脂被覆鉄基材の調製
樹脂溶液を上記(1)の4種類の樹脂溶液にした以外は
、実施例1の(2)と全く同様にして操作を行って、第
1表に示した4種類のポリエーテルアミドイくド樹脂被
覆鉄基材を得た。(2) Preparation of iron base material coated with polyetheramide-imide resin. Four types of polyether amide resin-coated iron substrates shown in Table 1 were obtained.
第 1 表
実施例4
(1)ポリエーテルアくドイミド樹脂溶液の調製−l立
左 モル
TM.A 261.1 1.3
59DDE
亜リン酸トリフエニル 8.8 0.0284
N−メチルビロリドン 2160.0上記戒分を温
度計、掻き混ぜ機、窒素導入管及び水分定量器を付けた
四つロフラスコに撹拌しながら入れ、窒素ガスを通しな
から1 6 0 ’Cに昇温した。徐々に温度を上げ、
留出する水を系外に除去しながら200℃に昇温し、同
温度で反応を進めた。数平均分子量を測定し、数平均分
子量がtsoooになったところで温度を185゜Cに
下げ、予め調製した亜リン酸トリフェニルの10重量%
N−メチルピロリドン溶液2 6 4. 4 gを1.
5時間間隔で6回に分けて加えて反応を進めた。数平均
分子量が30000になったところで反応を中止し、ポ
リエーテルアミドイξド樹脂溶液を得た.この溶液から
溶媒を除去した粉末のポリエーテルアミドイミド樹脂の
赤外吸収スペクトルには1780CI−’にイミド基の
、1660cm−’にアミド基の吸収が認め、られた。Table 1 Example 4 (1) Preparation of polyether aqueous diimide resin solution - 1 mol TM. A 261.1 1.3
59DDE Triphenyl phosphite 8.8 0.0284
N-Methylpyrrolidone 2160.0 Put the above ingredients into a four-bottle flask equipped with a thermometer, a stirrer, a nitrogen inlet tube, and a moisture meter while stirring, and raise the temperature to 160'C while passing nitrogen gas. did. Gradually raise the temperature,
The temperature was raised to 200° C. while removing distilled water from the system, and the reaction proceeded at the same temperature. The number average molecular weight was measured, and when the number average molecular weight reached tsooo, the temperature was lowered to 185°C, and 10% by weight of triphenyl phosphite prepared in advance was added.
N-methylpyrrolidone solution 2 6 4. 4g to 1.
The reaction was carried out by adding the mixture in 6 portions at 5 hour intervals. The reaction was stopped when the number average molecular weight reached 30,000, and a polyetheramide ξ-dos resin solution was obtained. In the infrared absorption spectrum of the powdered polyether amide imide resin obtained by removing the solvent from this solution, absorption of an imide group at 1780 CI-' and an absorption of an amide group at 1660 CI-' were observed.
(2)ポリエーテルアミドイミド樹脂被覆鉄基材の調製
樹脂溶液を上記(1)の樹脂溶液にした以外は実施例l
の(2)と全く同様にして操作を行ってポリエーテルア
逅ドイミド樹脂被覆鉄基材を得た。(2) Preparation of polyetheramide-imide resin-coated iron base material Example 1 except that the resin solution in (1) above was used.
The same procedure as in (2) above was carried out to obtain a polyether-imide resin-coated iron base material.
比較例5
トーロン4000T (アモコ社製商品名、数平均分子
量24000のポリエーテルアミドイξド樹脂)25g
@N−メチルビロリドン75gに溶解してポリエーテル
アξドイミド樹脂溶液を得た。この樹脂溶液を用いて実
施例1の(2)と全く同様にして操作を行ってポリエー
テルアミドイミド樹脂被覆鉄基材を得た。Comparative Example 5 Torlon 4000T (trade name manufactured by Amoco, polyether amide ξ-do resin with a number average molecular weight of 24000) 25 g
It was dissolved in 75 g of @N-methylpyrrolidone to obtain a polyether axidimide resin solution. Using this resin solution, the same procedure as in Example 1 (2) was carried out to obtain a polyetheramide-imide resin-coated iron base material.
実施例5
JIS R6252 (研摩紙)#240で研摩した
表面粗度(Ra)が0.4〜0. 5μmのアルミニウ
ム板(JIS H4000、A1050P,寸法:
50X1 50X1.6mm)の研摩表面に実施例1の
(1)のポリエーテルアミドイミド樹脂溶液を、乾燥膜
厚が約30μmになるように塗布し、80゜Cで1時間
、250゜Cで0. 5時間、380″Cで15分焼付
けてポリエーテルアミドイミド樹脂被覆アルミニウム基
材を得た。Example 5 Surface roughness (Ra) polished with JIS R6252 (abrasive paper) #240 was 0.4 to 0. 5μm aluminum plate (JIS H4000, A1050P, dimensions:
The polyetheramide-imide resin solution of (1) in Example 1 was applied to the polished surface of a 50X1 50X1.6 mm so that the dry film thickness was about 30 μm, and the mixture was heated at 80°C for 1 hour and at 250°C for 0. .. After baking for 5 hours and 15 minutes at 380''C, a polyetheramide-imide resin-coated aluminum substrate was obtained.
比較例6
樹脂溶液を比較例1、(1)の樹脂溶液とした以外は、
実施例5と全く同様にして、ポリアミドイミド樹脂被覆
アルミニウム基材を得た。Comparative Example 6 Except for using the resin solution of Comparative Example 1 (1) as the resin solution,
In exactly the same manner as in Example 5, a polyamide-imide resin-coated aluminum base material was obtained.
実施例1〜5及び比較例1〜6で得た樹脂被覆鉄基材及
び樹脂被覆アルミニウム基材について、被覆樹脂の加熱
減量と樹脂被覆基材の密着性と耐劣化性を評価した。結
果を第2表にまとめた。The resin-coated iron base materials and resin-coated aluminum base materials obtained in Examples 1 to 5 and Comparative Examples 1 to 6 were evaluated for heat loss of the coating resin and adhesion and deterioration resistance of the resin coated base materials. The results are summarized in Table 2.
加熱減量は、ガラス板に樹脂溶液を乾燥膜厚が約30μ
mになるように塗布し、80゜Cで1時間、250″C
で0. 5時間、380゜Cで15分間焼付けて得たフ
ィルムについてセイコー電子社製、高温型示差熱熱重量
同時測定装置TG/DTA320型を用い、試料lO■
、雰囲気空気で測定した。The heating loss is approximately 30μ when the resin solution is dried on a glass plate.
250″C for 1 hour at 80°C.
So 0. The film obtained by baking at 380°C for 15 minutes for 5 hours was measured using a high-temperature differential thermogravimetric simultaneous measurement device TG/DTA320 manufactured by Seiko Electronics Co., Ltd.
, measured in atmospheric air.
密着性はごばん目試験方法を用い、JIS D202
0に準して行った。片刃かみそりで鉄素地に達するl
mmのこ:ばん目100個(IOXIO)を作り、セロ
ハン粘着テープによる剥離試験後の完全に剥がれないご
ばん目の残率で評価した。Adhesion was determined using the square test method, JIS D202.
0. Reaching the iron substrate with a single-edged razor
100 mm saws (IOXIO) were prepared and evaluated based on the percentage of remaining squares that were not completely peeled off after a peel test using cellophane adhesive tape.
耐劣化性は樹脂被覆基材を3 0 0 ”Cで熱処理し
た後の密着性で評価した。密着性は上記方法と同〔発明
の効果〕
以上の結果から明らかなように、本発明になる特定のジ
アミン骨格を有する高分子量のポリエーテルアミドイ旦
ド樹脂を金属基材に被覆したポリエーテルアミドイミド
樹脂被覆金属基材は、特定のジアミン骨格を有する低分
子量のポリエーテルアミドイミド樹脂又は他のジアミン
骨格を有するポリアミドイミド樹脂を金属基材に被覆し
た比較例のポリアミドイミド樹脂被覆金属基材に比べて
耐劣化性が著しく優れており、例えば一般産業機械器具
部品、電気・電子部品、離型用金型、厨房器具類などの
幅広い用途を有するものである。Deterioration resistance was evaluated by adhesion after heat treating the resin-coated base material at 300"C.Adhesion was the same as the above method [Effects of the invention] As is clear from the above results, the present invention is effective. Polyetheramide-imide resin-coated metal substrates are coated with high-molecular-weight polyetheramide-imide resins having a specific diamine skeleton or other resins. It has significantly superior deterioration resistance compared to the comparative polyamide-imide resin-coated metal base material in which the metal base material is coated with a polyamide-imide resin having a diamine skeleton. It has a wide range of uses, including molds for molds and kitchen utensils.
Claims (1)
−ジアミノジフェニルエーテル又は4,4′−ジイソシ
アネートジフェニルエーテルとを反応させて得られる、
数平均分子量が26000以上であるポリエーテルアミ
ドイミド樹脂を有機溶媒に溶解した溶液を金属基材表面
に塗布、焼付けてなるポリエーテルアミドイミド樹脂被
覆金属基材。 2、金属基材がアルミニウム基材又は鉄基材である請求
項2記載のポリエーテルアミドイミド樹脂被覆金属基材
。 3、請求項1記載の溶液を金属基材表面に塗布焼付ける
ポリエーテルアミドイミド樹脂被覆金属基材の製造法。[Claims] 1. trimellitic acid or its reactive acid derivative and 4,4'
- obtained by reacting with diaminodiphenyl ether or 4,4'-diisocyanate diphenyl ether,
A metal substrate coated with a polyetheramide-imide resin, which is obtained by applying a solution of a polyetheramide-imide resin having a number average molecular weight of 26,000 or more dissolved in an organic solvent to the surface of the metal substrate and baking it. 2. The polyetheramide-imide resin-coated metal base material according to claim 2, wherein the metal base material is an aluminum base material or an iron base material. 3. A method for producing a polyetheramide-imide resin-coated metal substrate, which comprises coating and baking the solution according to claim 1 on the surface of the metal substrate.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP30984189A JPH03168259A (en) | 1989-11-29 | 1989-11-29 | Metal substrate coated with polyetheramideimide resin and production thereof |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP30984189A JPH03168259A (en) | 1989-11-29 | 1989-11-29 | Metal substrate coated with polyetheramideimide resin and production thereof |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH03168259A true JPH03168259A (en) | 1991-07-22 |
Family
ID=17997922
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP30984189A Pending JPH03168259A (en) | 1989-11-29 | 1989-11-29 | Metal substrate coated with polyetheramideimide resin and production thereof |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH03168259A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20050070290A (en) * | 2003-12-30 | 2005-07-07 | 주식회사 코오롱 | Polyamideimide vanish improved thermal resistance and folding endurance |
WO2022255166A1 (en) * | 2021-05-31 | 2022-12-08 | Jfeスチール株式会社 | Chemical substance for forming solid lubricant coating film, oil well pipe, and screw-threaded joint for oil well pipes |
-
1989
- 1989-11-29 JP JP30984189A patent/JPH03168259A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20050070290A (en) * | 2003-12-30 | 2005-07-07 | 주식회사 코오롱 | Polyamideimide vanish improved thermal resistance and folding endurance |
WO2022255166A1 (en) * | 2021-05-31 | 2022-12-08 | Jfeスチール株式会社 | Chemical substance for forming solid lubricant coating film, oil well pipe, and screw-threaded joint for oil well pipes |
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