JPH03167417A - Method for measuring thickness of cover of hermetically covered optical fiber - Google Patents
Method for measuring thickness of cover of hermetically covered optical fiberInfo
- Publication number
- JPH03167417A JPH03167417A JP30463189A JP30463189A JPH03167417A JP H03167417 A JPH03167417 A JP H03167417A JP 30463189 A JP30463189 A JP 30463189A JP 30463189 A JP30463189 A JP 30463189A JP H03167417 A JPH03167417 A JP H03167417A
- Authority
- JP
- Japan
- Prior art keywords
- optical fiber
- cover
- thickness
- rays
- hermetic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000013307 optical fiber Substances 0.000 title claims abstract description 30
- 238000000034 method Methods 0.000 title claims description 11
- 238000010894 electron beam technology Methods 0.000 claims abstract description 11
- 239000011248 coating agent Substances 0.000 claims description 39
- 238000000576 coating method Methods 0.000 claims description 39
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 6
- 229910052799 carbon Inorganic materials 0.000 claims description 6
- 239000011521 glass Substances 0.000 claims 1
- 229910010272 inorganic material Inorganic materials 0.000 claims 1
- 239000011147 inorganic material Substances 0.000 claims 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract description 3
- 241000331231 Amorphocerini gen. n. 1 DAD-2008 Species 0.000 abstract 1
- 239000011347 resin Substances 0.000 description 6
- 229920005989 resin Polymers 0.000 description 6
- 238000005259 measurement Methods 0.000 description 4
- 230000000694 effects Effects 0.000 description 3
- 230000005540 biological transmission Effects 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 238000000691 measurement method Methods 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 description 1
- 230000003321 amplification Effects 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 238000009675 coating thickness measurement Methods 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 125000002534 ethynyl group Chemical group [H]C#C* 0.000 description 1
- 230000005284 excitation Effects 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000003199 nucleic acid amplification method Methods 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 238000009987 spinning Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000002230 thermal chemical vapour deposition Methods 0.000 description 1
Landscapes
- Length-Measuring Devices Using Wave Or Particle Radiation (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、ハーメチック被覆光ファイバのノ＼ーメチッ
ク被覆の厚さを測定する方法に関するものである。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a method for measuring the thickness of a hermetic coating of a hermetically coated optical fiber.
石英ガラス等からなる光ファイハの表面に炭素や炭化物
等の無機物からなるハーメチック被覆を設けると、外部
から光ファイバ内へＨ．○やＨ２が侵入するのを防ぐこ
とができ、これにより光ファイバの機械的および光学的
な長期信頼性が大幅に向上することが知られている。When a hermetic coating made of an inorganic substance such as carbon or carbide is provided on the surface of an optical fiber made of quartz glass or the like, H. It is known that the intrusion of ○ and H2 can be prevented, thereby greatly improving the long-term mechanical and optical reliability of the optical fiber.
このハーメチック被覆光ファイバは通常、光ファイハ母
材から光ファイバを紡糸した直後に、炭化水素等を含む
原料ガスを用いて熟ｃ Ｖ Ｄ法によリ光ファイバ表面
にハーメチック被覆を形威し、その上に樹脂被覆を施す
という方法で製造される。This hermetic coated optical fiber is usually produced by forming a hermetic coating on the surface of the optical fiber by a CVD method using a raw material gas containing hydrocarbons, etc., immediately after spinning the optical fiber from an optical fiber base material. It is manufactured by applying a resin coating on top of it.
このようにして製造されたハーメチック被覆光ファイバ
のＨ．○やＨ２の侵入防止性能に大きな影響を及ぼす因
子は、ハーメチンク被覆の厚さである。したがってハー
メチック被覆光ファイバの性能を評価するためにはハー
メチック被覆の厚さを測定する必要がある。H. of the hermetic coated optical fiber thus manufactured. A factor that has a large effect on the intrusion prevention performance of ○ and H2 is the thickness of the hermetink coating. Therefore, in order to evaluate the performance of a hermetic coated optical fiber, it is necessary to measure the thickness of the hermetic coat.
ハーメチック被覆の厚さは数百〜数千人と極めて薄いた
め、従来はハーメチック被覆光ファイバの断面を走査型
または透過型電子顕微鏡で観察するという方法でハーメ
チック被覆の厚さを測定していた。Since the thickness of the hermetic coating is extremely thin, ranging from several hundred to several thousand, conventionally the thickness of the hermetic coating has been measured by observing the cross section of the hermetic coated optical fiber using a scanning or transmission electron microscope.
しかし電子顕微鏡で観察するには、観察用の試料を作製
する必要がある。この試料作製には、まず樹脂被覆を除
去した短いハーメチック被覆光ファイバを液状の樹脂中
に埋め、樹脂を硬化させた後、光ファイバの軸線に垂直
な方向に薄く切断し、さらに切断した試料を試料ホルダ
に載せて、切断面にチャージアップ防止のためのカーボ
ンを蒸着させるという工程を経る必要がある。However, in order to observe with an electron microscope, it is necessary to prepare a sample for observation. To prepare this sample, first, a short hermetically coated optical fiber from which the resin coating has been removed is buried in liquid resin, the resin is cured, and then thinly cut in a direction perpendicular to the axis of the optical fiber. It is necessary to go through a process of placing the sample on a sample holder and depositing carbon on the cut surface to prevent charge-up.
このため従来の方法では、試料作製のために１日以上と
いうような極めて長い時間がかかり、工業的レベルでの
厚さ測定には不向きであり、簡便な測定方法の開発が望
まれていた。For this reason, the conventional method takes an extremely long time, such as one day or more, to prepare a sample, and is unsuitable for thickness measurement on an industrial level.Therefore, there has been a desire to develop a simple measuring method.
〔課題の解決手段とその作用）
本発明は、上記のような従来技術の問題点に鑑み、試料
作製が簡単で、短時間でハーメチック被覆光ファイバの
ハーメチック被覆厚を測定できる方法を提供するもので
ある．
図−１に本発明の測定方法の原理を示す。石英ガラス光
ファイバ２の表面にハーメチック被覆３を設けてなるハ
ーメチック被覆光ファイバｌに電子線４を照射すると、
ハーメチック被覆３の元素が励起されて特性Ｘ線５が放
出される。電子線励起領域を破線のようにハーメチック
被覆３の厚さより深くしておいて、特性Ｘ線５の強度を
検出器６で検出すると、特性Ｘ線の弛度Ｉは、次式に示
すように、ハーメチック被覆３の電子線照射部分３ａの
体積Ｖと、同部分３ａ中の特性Ｘ線を放出する元素の濃
度ｄの積に比例する。[Means for Solving the Problems and Their Effects] In view of the problems of the prior art as described above, the present invention provides a method for easily preparing a sample and capable of measuring the hermetic coating thickness of a hermetically coated optical fiber in a short time. It is. Figure 1 shows the principle of the measurement method of the present invention. When an electron beam 4 is irradiated onto a hermetic coated optical fiber l formed by providing a hermetic coating 3 on the surface of a quartz glass optical fiber 2,
The elements in the hermetic coating 3 are excited and characteristic X-rays 5 are emitted. When the electron beam excitation region is made deeper than the thickness of the hermetic coating 3 as shown by the broken line and the intensity of the characteristic X-rays 5 is detected by the detector 6, the sag I of the characteristic X-rays is calculated as shown in the following equation. , is proportional to the product of the volume V of the electron beam irradiated portion 3a of the hermetic coating 3 and the concentration d of the element that emits characteristic X-rays in the same portion 3a.
１ｏｅＶＸｄ ・ ・ ・ ・（１）ｄおよび電子
線のビーム径（照射面積）は一定と考えらるから、■は
次式に示すようにハーメチック被覆の厚さｔに比例する
ことになる。1oeVXd ・ ・ ・ ・ (1) Since d and the beam diameter (irradiation area) of the electron beam are considered to be constant, ■ is proportional to the thickness t of the hermetic coating as shown in the following equation.
ｌｃ＋１：ｔ ・・・・（２）
したがって特性Ｘ線の強度■を検出すれば、ハーメチン
ク被覆の厚さｔを測定できることになる。lc+1:t (2) Therefore, by detecting the characteristic X-ray intensity ■, the thickness t of the hermetink coating can be measured.
この方法は、樹脂被覆を剥いだハーメチック被覆光ファ
イバを薄くスライスせずにそのままの状態で、ハーメチ
ック被覆厚の測定が行えるため、測定試料の作製が極め
て簡単である。In this method, the hermetic coating thickness can be measured without slicing the hermetically coated optical fiber from which the resin coating has been removed, so that the preparation of the measurement sample is extremely simple.
以下、本発明の実施例を説明する．
アセチレンを原料に用いた熱ＣＶＤ法で、力一ボンをハ
ーメチック被覆とする、ハーメチック被覆厚の異なる４
種類のハーメチック被覆光ファイバを各３ｋｍ製造した
。これらをハーメチック被覆厚の薄い方から順に試料Ｎ
ｆＬＢ−Ｅとする。また比較のためハーメチック被覆な
しの光ファイバを３ｋｍ製造した。これを試料１１＆ｌ
Ａとする。これら５本の光ファイバの片端からそれぞれ
本発明の測定方法に使用する試料と、従来の透過型電子
顕微鏡による測定に使用する試料を採取した。Examples of the present invention will be described below. Using a thermal CVD method using acetylene as a raw material, four different hermetic coating thicknesses are applied.
3 km of each type of hermetic coated optical fiber was manufactured. Sample N
Let it be fLB-E. For comparison, 3 km of optical fiber without hermetic coating was manufactured. Sample 11&l
Let it be A. A sample used for the measurement method of the present invention and a sample used for measurement using a conventional transmission electron microscope were collected from one end of each of these five optical fibers.
まず従来の方法でハーメチック被覆の厚さを測定した結
果は次のとおりであった。First, the thickness of the hermetic coating was measured using a conventional method, and the results were as follows.
表−ｌ
一方、本発明用の試料については、樹脂被覆を剥ぎ、ハ
ーメチック被覆表面をアルコールで拭いて清浄にしたの
ち、各々に対しビーム径が２０μｍの電子線を照射し、
深さ約ｌμｍまでの元素を励起した。同時にカーボンの
特性Ｘ線としてκα線（Ｋ殻から出るα線〉を選び、こ
れの検出強度を測定した。その結果は次のとおりであっ
た。Table 1 On the other hand, for the samples for the present invention, after removing the resin coating and cleaning the hermetic coating surface with alcohol, each sample was irradiated with an electron beam with a beam diameter of 20 μm.
Elements were excited to a depth of approximately 1 μm. At the same time, κα rays (α rays emitted from the K shell) were selected as the characteristic X-rays of carbon, and the detection intensity of these was measured.The results were as follows.
表−２
これらの測定結果をグラフに示すと図−２のとおりであ
る。図−２から明らかなように、カーボンからなるハー
メチック被覆の厚さと、特性Ｘ線Ｋα線の検出強度は比
例関係にあるから、特性Ｘ線の強度を測定することによ
り、ハーメチック被覆の厚さを測定することができる。Table 2 The results of these measurements are shown in a graph as shown in Figure 2. As is clear from Figure 2, there is a proportional relationship between the thickness of the hermetic coating made of carbon and the detected intensity of characteristic X-rays, Kα rays, so by measuring the intensity of characteristic can be measured.
なお以上の実施例はハーメチック被覆がカーボンの場合
について説明したが、ハーメチック被覆が例えばＳｉＣ
の場合はＳｔまたはＣのどちらかの特性Ｘ線を検出する
ことによって厚さ測定が可能である。またハーメチック
被覆が絶縁体である場合には、チャージアンプ防止のた
めハーメチック被覆表面にハーメチック被覆の構成元素
とは異なる導電体例えば金などを蒸着させるとよい。Although the above embodiments have been described with reference to the case where the hermetic coating is carbon, the hermetic coating may be SiC, for example.
In this case, the thickness can be measured by detecting either St or C characteristic X-rays. Further, when the hermetic coating is an insulator, a conductive material such as gold, which is different from the constituent elements of the hermetic coating, may be deposited on the surface of the hermetic coating to prevent charge amplification.
以上説明したように本発明によれば、ハーメチック被覆
光ファイバに電子線を照射し、ハーメチック被覆から放
出される特性Ｘ線の強度を検出することによりハーメチ
ック被覆の厚さを測定できるので、測定試料の作製がき
わめて簡単であり、ハーメチック被覆厚の測定を短時間
で行うことができる。したがってこの方法はハーメチッ
ク被覆光ファイバの工業的レベルでの評価手段として極
めて有用である。As explained above, according to the present invention, the thickness of the hermetic coating can be measured by irradiating the hermetic coating optical fiber with an electron beam and detecting the intensity of characteristic X-rays emitted from the hermetic coating. It is extremely easy to manufacture, and the hermetic coating thickness can be measured in a short time. Therefore, this method is extremely useful as a means for evaluating hermetic coated optical fibers at an industrial level.
図−１は本発明に係るハーメチック被覆光ファイバのハ
ーメチック被覆厚測定法の原理を示す説明図、図−２は
ハーメチック被覆光ファイバのハーメチック被覆の厚さ
と特性Ｘ線の検出強度との関係を示すグラフである。
１：ハーメチンク被覆光ファイハFigure 1 is an explanatory diagram showing the principle of the hermetic coating thickness measurement method for a hermetic coated optical fiber according to the present invention, and Figure 2 shows the relationship between the hermetic coating thickness of the hermetically coated optical fiber and the detected intensity of characteristic X-rays. It is a graph. 1: Hermetink coated optical fiber
Claims (1)
物からなるハーメチック被覆を設けてなるハーメチック
被覆光ファイバの、ハーメチック被覆の厚さを測定する
方法において、ハーメチック被覆光ファイバに電子線を
照射し、それによってハーメチック被覆から放出される
特性Ｘ線の強度を検出することによりハーメチック被覆
の厚さを測定することを特徴とするハーメチック被覆光
ファイバの被覆厚測定法。1. In a method for measuring the thickness of a hermetic coating of a hermetic coating made of an inorganic material such as carbon or carbide on the surface of a glass optical fiber, the hermetic coating is irradiated with an electron beam. A method for measuring the coating thickness of a hermetic coated optical fiber, characterized in that the thickness of the hermetic coating is measured by detecting the intensity of characteristic X-rays emitted from the hermetic coating.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP30463189A JPH03167417A (en) | 1989-11-27 | 1989-11-27 | Method for measuring thickness of cover of hermetically covered optical fiber |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP30463189A JPH03167417A (en) | 1989-11-27 | 1989-11-27 | Method for measuring thickness of cover of hermetically covered optical fiber |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH03167417A true JPH03167417A (en) | 1991-07-19 |
Family
ID=17935360
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP30463189A Pending JPH03167417A (en) | 1989-11-27 | 1989-11-27 | Method for measuring thickness of cover of hermetically covered optical fiber |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH03167417A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2009109246A (en) * | 2007-10-26 | 2009-05-21 | Sharp Corp | Film thickness measuring method |
| JP2010107277A (en) * | 2008-10-29 | 2010-05-13 | Nippon Paper-Pak Co Ltd | Method for measuring film thickness of organic thin film |
-
1989
- 1989-11-27 JP JP30463189A patent/JPH03167417A/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2009109246A (en) * | 2007-10-26 | 2009-05-21 | Sharp Corp | Film thickness measuring method |
| JP2010107277A (en) * | 2008-10-29 | 2010-05-13 | Nippon Paper-Pak Co Ltd | Method for measuring film thickness of organic thin film |
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