JPH0316293Y2 - - Google Patents

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Publication number
JPH0316293Y2
JPH0316293Y2 JP1983008052U JP805283U JPH0316293Y2 JP H0316293 Y2 JPH0316293 Y2 JP H0316293Y2 JP 1983008052 U JP1983008052 U JP 1983008052U JP 805283 U JP805283 U JP 805283U JP H0316293 Y2 JPH0316293 Y2 JP H0316293Y2
Authority
JP
Japan
Prior art keywords
support plate
mirror
annular support
excitation tube
insulating ring
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP1983008052U
Other languages
Japanese (ja)
Other versions
JPS59115672U (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP805283U priority Critical patent/JPS59115672U/en
Publication of JPS59115672U publication Critical patent/JPS59115672U/en
Application granted granted Critical
Publication of JPH0316293Y2 publication Critical patent/JPH0316293Y2/ja
Granted legal-status Critical Current

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Description

【考案の詳細な説明】 本考案は、内部鏡方式の気体レーザ発振器に係
り、特にその共振ミラーの保持機構に関する。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to an internal mirror type gas laser oscillator, and particularly to a holding mechanism for its resonant mirror.

いわゆる内部鏡方式の気体レーザ発振器は、レ
ーザ気体を封入した励起チユーブの両端に、該チ
ユーブ内に臨む共振ミラーを保持して成つてお
り、レーザ気体に励起エネルギを与え、共振ミラ
ー間で反射させることによりレーザ光が得られ
る。この気体レーザは高出力になると、発生する
熱により共振ミラーが影響を受け、性能が劣化す
るため、従来から共振ミラーの強制冷却するため
の何らかの手段が講じられているが、ミラー部は
レーザ発振のための放電励起により高電圧となる
という性質上、絶縁材を介して冷却媒体を流す金
属製の冷却環を取り付けることによりミラーの冷
却を行なうのが普通であつた。第1図に従来例を
示す。
A so-called internal mirror type gas laser oscillator has a resonant mirror facing into the tube held at both ends of an excitation tube filled with laser gas, which applies excitation energy to the laser gas and reflects it between the resonant mirrors. By doing this, laser light can be obtained. When this gas laser reaches high output, the resonant mirror is affected by the heat generated and its performance deteriorates. Due to the nature of high voltage generated by discharge excitation, the mirror was usually cooled by installing a metal cooling ring that allowed a cooling medium to flow through an insulating material. FIG. 1 shows a conventional example.

同図において、10は励起チユーブ、20はこ
の励起チユーブの端部に支持機構11を介して支
持した共振ミラー保持機構である。支持機構11
の環状は板ばね12を、固定ねじ13により励起
チユーブ保持枠14に、固定ねじ15により保持
機構20の環状の支持板21にそれぞれ固定する
とともに、支持板21に螺合させた支持ねじ16
の先端を励起チユーブ保持枠14に当接させてな
つている。固定ねじ13、固定ねじ15および支
持ねじ16は、それぞれ円周方向に少なくとも三
本設けられている。
In the figure, 10 is an excitation tube, and 20 is a resonant mirror holding mechanism supported at the end of this excitation tube via a support mechanism 11. Support mechanism 11
The annular plate spring 12 is fixed to the excitation tube holding frame 14 with a fixing screw 13 and to the annular support plate 21 of the holding mechanism 20 with a fixing screw 15, and a support screw 16 screwed into the support plate 21.
The tip thereof is brought into contact with the excitation tube holding frame 14. At least three fixing screws 13, fixing screws 15, and support screws 16 are each provided in the circumferential direction.

支持板21の軸部には水流路22を備えた金属
製水冷環23が取り付けられ、この金属製水冷環
23の内側に、絶縁材料から構成された絶縁環2
4が嵌合め込まれている。そしてこの絶縁環24
の内側にはさらに押えナツト25で金属製ミラー
保持環26が固定され、この金属製ミラー保持環
26にOリング27とミラー押え環28により、
励起チユーブ10内に臨む共振ミラー29が保持
されている。
A metal water cooling ring 23 having a water flow path 22 is attached to the shaft portion of the support plate 21, and an insulating ring 2 made of an insulating material is installed inside the metal water cooling ring 23.
4 is fitted. And this insulating ring 24
A metal mirror holding ring 26 is further fixed inside with a presser nut 25, and an O-ring 27 and a mirror holding ring 28 are attached to this metal mirror holding ring 26.
A resonant mirror 29 facing into the excitation tube 10 is held.

この従来の共振ミラー保持機構ではしかし、水
流路22を流れる冷却水の温度変化による各部材
の熱伸縮により、共振ミラー29の位置が大きく
変化し、このため両側の共振ミラー間の共振器長
が変化してレーザ出力の安定性が損なわれるとい
う問題があつた。また部品数が多いため冷却の効
率もあまり良くなく、さらに金属製水冷環23は
溶接等の加工が必要のため製作が困難で価格も高
くなり不利である。
However, in this conventional resonant mirror holding mechanism, the position of the resonant mirror 29 changes significantly due to thermal expansion and contraction of each member due to changes in the temperature of the cooling water flowing through the water flow path 22, and as a result, the resonator length between the resonant mirrors on both sides changes. There was a problem that the stability of the laser output was impaired due to changes in the laser output. In addition, the cooling efficiency is not very good due to the large number of parts, and the metal water cooling ring 23 requires processing such as welding, which is disadvantageous because it is difficult to manufacture and expensive.

本考案は、このような問題意識に基づいてなさ
れたもので、部品点数を少なくして共振器ミラー
の冷却効率を上げるとともに、冷却水の温度変動
があつても構造上共振器ミラーの位置変動が生じ
にくい保持構造を提供することを目的としてい
る。
The present invention was developed based on this awareness of the problem.It increases the cooling efficiency of the resonator mirror by reducing the number of parts, and also prevents the position of the resonator mirror from changing due to the structure even when the temperature of the cooling water changes. The purpose is to provide a holding structure that is unlikely to cause this.

本考案は、この目的を達するため、励起チユー
ブ側の端面を取付基準面とし、この取付基準面を
介して励起チユーブの両端部に支持された環状支
持板を設け、この環状支持板の取付基準面に、該
環状支持板の軸部に固定される絶縁環の当付面を
面接触させ、さらにこの絶縁環の内周段部に、共
振ミラーの励起チユーブ側端面に接触するミラー
当付面を形成し、この絶縁環のミラー当付面と、
環状支持板の取付基準面との当付面とを略同一平
面上に位置させたことを特徴としている。
In order to achieve this objective, the present invention uses the end face of the excitation tube as a mounting reference surface, and provides an annular support plate supported at both ends of the excitation tube via this mounting reference surface, and provides a mounting reference for this annular support plate. A contact surface of an insulating ring fixed to the shaft portion of the annular support plate is brought into surface contact with the surface, and a mirror contact surface contacting the excitation tube side end surface of the resonant mirror is further provided on the inner circumferential step of the insulating ring. The mirror abutment surface of this insulating ring and
It is characterized in that the attachment reference surface of the annular support plate and the abutting surface are located on substantially the same plane.

以下図示実施例について本考案を説明する。第
2図において、励起チユーブ10、支持機構1
1、励起チユーブ保持枠14は第1図の従来例と
同一の構成要素であり、本考案のミラー保持機構
を符合30で示している。支持機構11の構造は
従来例と異なり、環状の支持板31と励起チユー
ブ保持枠14にそれぞれ両端を固定した引張ばね
32により、環状支持板31を励起チユーブ保持
枠14側に引き、この引張力に抗する支持棒33
を励起チユーブ保持枠14に支持してなつてい
る。引張ばね32および支持棒33は円周方向に
少なくとも三個設けられている。環状支持板31
の励起チユーブ10側の端面は、取付基準面31
aを構成している。
The invention will now be described with reference to the illustrated embodiments. In FIG. 2, an excitation tube 10, a support mechanism 1
1. The excitation tube holding frame 14 is the same component as the conventional example shown in FIG. 1, and the mirror holding mechanism of the present invention is indicated by the reference numeral 30. The structure of the support mechanism 11 is different from the conventional example, in which a tension spring 32 whose both ends are fixed to an annular support plate 31 and an excitation tube holding frame 14 pulls the annular support plate 31 toward the excitation tube holding frame 14, and this tensile force is applied. Support rod 33 that resists
is supported by an excitation tube holding frame 14. At least three tension springs 32 and support rods 33 are provided in the circumferential direction. Annular support plate 31
The end surface on the excitation tube 10 side is the mounting reference surface 31
It constitutes a.

環状支持板31の軸部には段部34が形成され
ており、環状支持板31の軸部に嵌めた、絶縁材
料からなる絶縁環35はOリング36,37によ
り上記段部34との間に水流路38を形成してい
る。この水流路38は環状支持板31に穿設した
水導入口39および水排出口40にそれぞれ連通
している。41はホース接続口である。
A step portion 34 is formed on the shaft portion of the annular support plate 31, and an insulating ring 35 made of an insulating material and fitted onto the shaft portion of the annular support plate 31 is connected to the step portion 34 by O-rings 36, 37. A water flow path 38 is formed in. The water flow path 38 communicates with a water inlet 39 and a water outlet 40 provided in the annular support plate 31, respectively. 41 is a hose connection port.

絶縁環35はフランジ42を有しており、その
外面は環状支持板31の取付基準面31aと面接
触する支持板当付面43を構成し、ボルト44に
より支持板31に固定されている。またこの絶縁
環35の内周部は外側から階段状に径が縮小して
おり、最も小径の部分に至る段部がミラー当付面
45を構成している。重要な点はこの支持板当付
面43とミラー当付面45が同一平面に位置して
いることである。共振ミラー446はその励起チ
ユーブ10側の端部外周がこのミラー当付面45
に当接し、Oリング47およびミラー押え環48
により固定されている。
The insulating ring 35 has a flange 42 , the outer surface of which constitutes a support plate abutment surface 43 that makes surface contact with the mounting reference surface 31 a of the annular support plate 31 , and is fixed to the support plate 31 with bolts 44 . Further, the diameter of the inner peripheral portion of this insulating ring 35 decreases in a stepwise manner from the outside, and the stepped portion reaching the smallest diameter portion constitutes the mirror abutting surface 45. The important point is that the support plate abutting surface 43 and the mirror abutting surface 45 are located on the same plane. The outer periphery of the end of the resonant mirror 446 on the excitation tube 10 side is the mirror abutment surface 45.
O-ring 47 and mirror retaining ring 48
Fixed by

上記構成の本ミラー保持機構によれば、水導入
口39、水流路38、水排出口40を流れる冷却
水の温度の変化等により、環状支持板31や絶縁
環35に熱伸縮が生じたとしても共振ミラー46
の位置、つまりミラー当付面45の位置が変化す
ることは極めて少ない。なぜなら、環状支持板3
1および絶縁環35が熱伸縮する場合、その伸縮
は常に取付基準面31a(支持板当付面43)に
基準に生じ、しかもこの取付基準面31aの位置
は、該取付基準面31aから熱的に絶縁された状
態にある支持棒33によつて決定されているから
である。したがつて環状支持板31や絶縁環35
が熱伸縮しても、この取付基準面31a(支持板
当付面43)は移動せず、この支持板当付面43
と同一平面内にあるミラー当付面45、つまり共
振ミラー46も移動しない。支持棒33は環状支
持板31の位置に微調整を可能とするため、軸方
向位置を調節可能にするのが好ましい。
According to this mirror holding mechanism configured as described above, thermal expansion and contraction occurs in the annular support plate 31 and the insulating ring 35 due to changes in the temperature of the cooling water flowing through the water inlet 39, the water flow path 38, and the water outlet 40. Also resonant mirror 46
The position of the mirror abutting surface 45, that is, the position of the mirror abutting surface 45 rarely changes. Because the annular support plate 3
1 and the insulating ring 35, the expansion and contraction always occurs with reference to the mounting reference surface 31a (support plate contact surface 43), and the position of this mounting reference surface 31a is thermally separated from the mounting reference surface 31a. This is because the support rod 33 is insulated. Therefore, the annular support plate 31 and the insulating ring 35
Even if it expands and contracts due to heat, this mounting reference surface 31a (support plate abutting surface 43) does not move, and this support plate abutting surface 43
The mirror abutting surface 45, that is, the resonant mirror 46, which is in the same plane as the mirror 46, does not move either. Since the support rod 33 allows fine adjustment of the position of the annular support plate 31, it is preferable that the axial position of the support rod 33 is adjustable.

絶縁環35の支持板当付面43とミラー当付面
45は、以上のように同一面に位置させるのであ
るが、幾何学的な同一面でなくともよいのは明ら
かであり、上記効果が得られる範囲でほぼ同一面
とすればよい。また上記実施例では絶縁環35を
水冷する場合を示したが、この他、空冷、大容量
ヒートシンク等による冷却も可能であり、本考案
は冷却方法を問わない。
Although the support plate abutment surface 43 and the mirror abutment surface 45 of the insulating ring 35 are positioned on the same plane as described above, it is clear that they do not need to be on the same geometric plane, and the above effect can be achieved. The surface may be approximately the same as much as possible. Furthermore, although the above embodiment shows the case where the insulating ring 35 is water-cooled, cooling by air cooling, a large-capacity heat sink, etc. is also possible, and the present invention is not limited to any cooling method.

以上のように本考案のミラー保持機構は、共振
ミラーまたはその周辺が熱せられても構造上ミラ
ーの移動は生じ難く、ミラー面の位置変化を最限
少に押えることができる。したがつて共振ミラー
の移動に伴なう出力変化が小さくなり、安定した
出力が得られる。また従来装置に比べて部品点数
が少なくなるから、ミラー迄の熱伝達効率が良く
なり大きな冷却効果を得ることが可能となる。さ
らに加工の困難な金属製冷却環がないため、コス
トも安くなり、製造上有利となる。
As described above, in the mirror holding mechanism of the present invention, even if the resonant mirror or its surroundings are heated, the mirror is unlikely to move due to its structure, and changes in the position of the mirror surface can be minimized. Therefore, changes in output due to movement of the resonant mirror are reduced, and stable output can be obtained. Furthermore, since the number of parts is reduced compared to conventional devices, the heat transfer efficiency up to the mirror is improved and a large cooling effect can be obtained. Furthermore, since there is no metal cooling ring that is difficult to process, costs are reduced, which is advantageous in terms of manufacturing.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は従来の共振ミラー保持機構を示す縦断
面図、第2図は本考案の実施例を示す第1図と同
様の縦断面図である。 10……励起チユーブ、11……支持機構、1
4……励起チユーブ保持枠、31……環状支持
板、31a……取付基準面、32……引張ばね、
33……支持棒、35……絶縁環、38……水流
路、39……水導入口、40……水排出口、43
……支持板当付面(当付面)、45……ミラー当
付面、46……共振ミラー、48……ミラー押え
環。
FIG. 1 is a longitudinal sectional view showing a conventional resonant mirror holding mechanism, and FIG. 2 is a longitudinal sectional view similar to FIG. 1 showing an embodiment of the present invention. 10...excitation tube, 11...support mechanism, 1
4...Excitation tube holding frame, 31...Annular support plate, 31a...Mounting reference surface, 32...Tension spring,
33...Support rod, 35...Insulating ring, 38...Water flow path, 39...Water inlet, 40...Water outlet, 43
...Support plate abutting surface (abutting surface), 45...Mirror abutting surface, 46...Resonance mirror, 48...Mirror holding ring.

Claims (1)

【実用新案登録請求の範囲】 (1) レーザ気体を封入した励起チユーブの両端に
該励起チユーブ内に臨む共振ミラーを取り付け
る共振ミラー保持機構において、 上記励起チユーブ側の端面を取付基準面と
し、この取付基準面を介して該励起チユーブの
両端部に支持された環状の支持板と;この環状
支持板の取付基準面に面接触する当付面を有
し、該環状支持板の軸部に固定される絶縁環
と;この絶縁環の内周段部に形成されたミラー
当付面と;このミラー当付面にその励起チユー
ブ側の端面外周が当接する共振ミラーと;この
共振ミラーを絶縁環に固定するミラー押え環と
を設け、さらに上記絶縁環の当付面とミラー当
付面とを略同一平面上に位置させたことを特徴
とするレーザ発振器の共振ミラー保持機構。 (2) 実用新案登録請求の範囲第1項において、環
状支持板は、ばね手段によつて励起チユーブ側
に付勢され、励起チユーブ側からは、環状支持
板の取付基準面に当接して該環状支持板の位置
を決定する三個以上の支持棒が突出されている
レーザ発振器の共振ミラー保持機構。 (3) 実用新案登録請求の範囲第1項または第2項
において、環状支持板には、一連の冷却媒体の
導入口、冷却流路および排出口が設けられてい
るレーザ発振器の共振ミラー保持機構。
[Claims for Utility Model Registration] (1) In a resonant mirror holding mechanism in which a resonant mirror facing into the excitation tube is attached to both ends of an excitation tube filled with laser gas, the end face on the side of the excitation tube is used as a mounting reference surface, and this an annular support plate supported at both ends of the excitation tube via a mounting reference surface; a contact surface that makes surface contact with the mounting reference surface of the annular support plate; and fixed to the shaft of the annular support plate; an insulating ring; a mirror abutting surface formed on the inner stepped portion of the insulating ring; a resonant mirror, the outer periphery of the excitation tube side end surface of which is in contact with the mirror abutting surface; 1. A resonant mirror holding mechanism for a laser oscillator, characterized in that a mirror holding ring is provided to fix the mirror to the insulating ring, and the abutting surface of the insulating ring and the mirror abutting surface are located on substantially the same plane. (2) In claim 1 of the utility model registration claim, the annular support plate is biased toward the excitation tube by a spring means, and from the excitation tube side, the annular support plate abuts against the mounting reference surface of the annular support plate and is applied. A resonant mirror holding mechanism for a laser oscillator in which three or more support rods are protruded to determine the position of an annular support plate. (3) In claim 1 or 2 of the utility model registration claim, there is provided a resonant mirror holding mechanism for a laser oscillator, in which the annular support plate is provided with a series of cooling medium inlets, cooling channels, and exhaust ports. .
JP805283U 1983-01-24 1983-01-24 Resonant mirror holding mechanism of laser oscillator Granted JPS59115672U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP805283U JPS59115672U (en) 1983-01-24 1983-01-24 Resonant mirror holding mechanism of laser oscillator

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP805283U JPS59115672U (en) 1983-01-24 1983-01-24 Resonant mirror holding mechanism of laser oscillator

Publications (2)

Publication Number Publication Date
JPS59115672U JPS59115672U (en) 1984-08-04
JPH0316293Y2 true JPH0316293Y2 (en) 1991-04-08

Family

ID=30139559

Family Applications (1)

Application Number Title Priority Date Filing Date
JP805283U Granted JPS59115672U (en) 1983-01-24 1983-01-24 Resonant mirror holding mechanism of laser oscillator

Country Status (1)

Country Link
JP (1) JPS59115672U (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0311901Y2 (en) * 1985-04-27 1991-03-20

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS448530Y1 (en) * 1965-03-08 1969-04-04

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS448530Y1 (en) * 1965-03-08 1969-04-04

Also Published As

Publication number Publication date
JPS59115672U (en) 1984-08-04

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