JPH0316004U - - Google Patents
Info
- Publication number
- JPH0316004U JPH0316004U JP7556689U JP7556689U JPH0316004U JP H0316004 U JPH0316004 U JP H0316004U JP 7556689 U JP7556689 U JP 7556689U JP 7556689 U JP7556689 U JP 7556689U JP H0316004 U JPH0316004 U JP H0316004U
- Authority
- JP
- Japan
- Prior art keywords
- sensor
- magnetic
- receiving coil
- insulating
- coil
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000005284 excitation Effects 0.000 claims description 5
- 230000004907 flux Effects 0.000 claims description 2
- 239000012141 concentrate Substances 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 5
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 239000010979 ruby Substances 0.000 description 1
- 229910001750 ruby Inorganic materials 0.000 description 1
- 229910000859 α-Fe Inorganic materials 0.000 description 1
Landscapes
- Measurement Of Length, Angles, Or The Like Using Electric Or Magnetic Means (AREA)
- Transmission And Conversion Of Sensor Element Output (AREA)
Description
第１図は本考案に係る渦電流式膜厚センサのセ
ンサ部分の一実施例を示す断面図、第２図は第１
図のセンサの遮蔽板の組立斜視図、第３図は第１
図に示す渦電流式膜厚センサの信号処理回路の一
実施例を示すブロツク図、第４図は第１図のセン
サの遮蔽板に誘導される渦電流を示す図、第５図
は第４図の遮蔽板による磁束分布を示す図、第６
図は第１図のセンサを平板に当接した状態を示す
図、第７図は丸棒に対するセンサの位置関係を示
す図、第８図は第７図のセンサの出力電圧の変化
を示す図、第９図及び第１０図は丸棒の表面に施
された皮膜の測定を示す図、第１１図は渦電流式
膜厚センサの原理を示す図、第１２図は第１１図
のコイルの特性を示す図である。
１……センサ、２……アクテイブヘツド、３…
…ダミーヘツド、４……ヘツド治具、５，１０…
…フエライトコア、６，１１……アクテイブ受信
コイル、７，１２……ダミー励磁コイル、８，１
３……遮蔽板、９，１４……絶縁スリツト、１５
……ルビー、２０……信号処理回路、３５……銅
板、４０，４１，４３……丸棒、３６，４２，４
４……皮膜。
FIG. 1 is a sectional view showing an embodiment of the sensor portion of the eddy current type film thickness sensor according to the present invention, and FIG.
Figure 3 is an assembled perspective view of the sensor shield plate shown in Figure 1.
A block diagram showing an example of the signal processing circuit of the eddy current type film thickness sensor shown in the figure. Figure 6 showing the magnetic flux distribution due to the shielding plate in Figure 6.
The figure shows the sensor in Fig. 1 in contact with a flat plate, Fig. 7 shows the positional relationship of the sensor with respect to the round bar, and Fig. 8 shows the change in the output voltage of the sensor in Fig. 7. , Fig. 9 and Fig. 10 are diagrams showing the measurement of the coating applied to the surface of the round bar, Fig. 11 is a diagram showing the principle of the eddy current type film thickness sensor, and Fig. 12 is a diagram showing the measurement of the coating applied to the surface of the round bar. FIG. 3 is a diagram showing characteristics. 1...sensor, 2...active head, 3...
...Dummy head, 4...Head jig, 5, 10...
...Ferrite core, 6,11...Active receiving coil, 7,12...Dummy excitation coil, 8,1
3... Shielding plate, 9, 14... Insulating slit, 15
... Ruby, 20 ... Signal processing circuit, 35 ... Copper plate, 40, 41, 43 ... Round bar, 36, 42, 4
4... Film.
Claims (1)
個の有底円筒体状の遮蔽板の夫々に励磁コイルと
受信コイルとを収納したアクテイブヘツドとダミ
ーヘツドとを、各絶縁スリツトを外方に向けて同
一軸線上に対称に結合し、且つ前記各励磁コイル
及び各受信コイルを夫々差動結合し、前記各絶縁
スリツト部に磁束が集中する不均一高周波磁界を
形成するセンサと、前記励磁コイルに高周波励磁
電流を印加し、前記受信コイルの出力信号を差動
増幅回路により検出する信号処理回路とを備え、
前記センサのアクテイブヘツドの絶縁スリツト部
を非磁性且つ導電性部材で形成された被測定対称
物表面に当接し、当該表面に施されている非磁性
且つ非導電性皮膜の膜厚を測定することを特徴と
する渦電流式膜厚センサ。 2. Insulating slits are formed at the diameter of the bottom surface.
An active head and a dummy head each housing an excitation coil and a receiving coil in each of the bottomed cylindrical shielding plates are symmetrically coupled on the same axis with each insulating slit facing outward, and each of the above-mentioned A sensor that differentially couples an excitation coil and each receiving coil to form a nonuniform high-frequency magnetic field in which magnetic flux concentrates in each of the insulating slits, and applies a high-frequency excitation current to the excitation coil to generate an output signal of the receiving coil. and a signal processing circuit that detects the signal using a differential amplifier circuit.
The insulating slit portion of the active head of the sensor is brought into contact with the surface of the object to be measured made of a non-magnetic and conductive member, and the thickness of the non-magnetic and non-conductive film applied to the surface is measured. An eddy current film thickness sensor featuring:
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7556689U JPH0645844Y2 (en) | 1989-06-29 | 1989-06-29 | Eddy current film thickness sensor |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7556689U JPH0645844Y2 (en) | 1989-06-29 | 1989-06-29 | Eddy current film thickness sensor |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0316004U true JPH0316004U (en) | 1991-02-18 |
| JPH0645844Y2 JPH0645844Y2 (en) | 1994-11-24 |
Family
ID=31616250
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP7556689U Expired - Lifetime JPH0645844Y2 (en) | 1989-06-29 | 1989-06-29 | Eddy current film thickness sensor |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0645844Y2 (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001343205A (en) * | 2000-03-28 | 2001-12-14 | Toshiba Corp | Eddy current loss measuring sensor, apparatus and method for measurement of film thickness as well as recording medium |
| JP2008304471A (en) * | 2000-03-28 | 2008-12-18 | Toshiba Corp | Film thickness measuring device, film thickness measuring method, and recording medium |
-
1989
- 1989-06-29 JP JP7556689U patent/JPH0645844Y2/en not_active Expired - Lifetime
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001343205A (en) * | 2000-03-28 | 2001-12-14 | Toshiba Corp | Eddy current loss measuring sensor, apparatus and method for measurement of film thickness as well as recording medium |
| JP2008304471A (en) * | 2000-03-28 | 2008-12-18 | Toshiba Corp | Film thickness measuring device, film thickness measuring method, and recording medium |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0645844Y2 (en) | 1994-11-24 |
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