JPH03159959A - Raw material of ceramics - Google Patents
Raw material of ceramicsInfo
- Publication number
- JPH03159959A JPH03159959A JP29847789A JP29847789A JPH03159959A JP H03159959 A JPH03159959 A JP H03159959A JP 29847789 A JP29847789 A JP 29847789A JP 29847789 A JP29847789 A JP 29847789A JP H03159959 A JPH03159959 A JP H03159959A
- Authority
- JP
- Japan
- Prior art keywords
- thermal expansion
- raw material
- coefficient
- amorphous
- quartz glass
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000002994 raw material Substances 0.000 title claims abstract description 21
- 239000000919 ceramic Substances 0.000 title claims description 27
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 26
- 229910021486 amorphous silicon dioxide Inorganic materials 0.000 claims abstract description 13
- 229910001416 lithium ion Inorganic materials 0.000 claims abstract description 6
- 150000002500 ions Chemical class 0.000 claims description 6
- 238000010304 firing Methods 0.000 claims description 3
- 229910052906 cristobalite Inorganic materials 0.000 abstract description 6
- 230000035939 shock Effects 0.000 abstract description 6
- 229910052681 coesite Inorganic materials 0.000 abstract description 5
- 229910052682 stishovite Inorganic materials 0.000 abstract description 5
- 229910052905 tridymite Inorganic materials 0.000 abstract description 5
- 238000001354 calcination Methods 0.000 abstract description 3
- 235000012239 silicon dioxide Nutrition 0.000 abstract description 3
- FUJCRWPEOMXPAD-UHFFFAOYSA-N Li2O Inorganic materials [Li+].[Li+].[O-2] FUJCRWPEOMXPAD-UHFFFAOYSA-N 0.000 abstract description 2
- XUCJHNOBJLKZNU-UHFFFAOYSA-M dilithium;hydroxide Chemical compound [Li+].[Li+].[OH-] XUCJHNOBJLKZNU-UHFFFAOYSA-M 0.000 abstract description 2
- 239000000377 silicon dioxide Substances 0.000 abstract description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 abstract 2
- 229910052593 corundum Inorganic materials 0.000 abstract 2
- 229910001845 yogo sapphire Inorganic materials 0.000 abstract 2
- 239000000126 substance Substances 0.000 description 10
- 239000000463 material Substances 0.000 description 4
- 239000002244 precipitate Substances 0.000 description 4
- 230000007423 decrease Effects 0.000 description 3
- 238000002474 experimental method Methods 0.000 description 3
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- 244000292604 Salvia columbariae Species 0.000 description 2
- 235000012377 Salvia columbariae var. columbariae Nutrition 0.000 description 2
- 235000001498 Salvia hispanica Nutrition 0.000 description 2
- 235000014167 chia Nutrition 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000003746 solid phase reaction Methods 0.000 description 2
- 238000010671 solid-state reaction Methods 0.000 description 2
- 229910000502 Li-aluminosilicate Inorganic materials 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 229910021417 amorphous silicon Inorganic materials 0.000 description 1
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 1
- 239000004327 boric acid Substances 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 229910021488 crystalline silicon dioxide Inorganic materials 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000005350 fused silica glass Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 229910052761 rare earth metal Inorganic materials 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 238000005245 sintering Methods 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
Landscapes
- Compositions Of Oxide Ceramics (AREA)
Abstract
Description
【発明の詳細な説明】
（産業上の利用分野）
この発明はセラミックス原料に関し、詳しくは熱膨張係
数な低Ｆさせるための技術手段に関する。DETAILED DESCRIPTION OF THE INVENTION (Industrial Application Field) The present invention relates to ceramic raw materials, and more particularly to technical means for lowering the coefficient of thermal expansion (F).
（従来の技術）
従来、低熱Ｗ張のセラミックスか種々知られている。こ
れら低熱膨張のセラミックスは、耐熱衝撃製品に用いら
れているか、近時技術革新か進むなかで従来の熱膨張係
数，耐熱ｖｋＩ撃性能で｛よ満足できない用途か広がり
つつある。(Prior Art) Various types of low-temperature W-strung ceramics have been known. These low thermal expansion ceramics are being used in thermal shock resistant products, and as technology advances in recent years, applications for which conventional thermal expansion coefficients and heat impact resistance are not satisfactory are expanding.
セラミックスの８ｗ張係数を低下させる方法として、例
えば特開昭５３−１４０３０９号，特開昭５ ７ −
５ ７ ４ ３ ０−ｑに開示された方法か知られてい
る。前者においてはホウ酸系原料やリン酸系原料を用い
ることによって緻密て高強度なりチアセラミックスを得
ており、また後者ではＹ，Ｌａ，Ｃｅ等の希土類元素を
添加することによって緻密なりチアセラミックスを得て
いる。As a method for lowering the 8W tensile coefficient of ceramics, for example, Japanese Patent Application Laid-open No. 140309/1983 and Japanese Patent Application Laid-open No. 53-140309,
5 7 4 3 0-q is known. In the former, dense and high-strength chia ceramics are obtained by using boric acid-based raw materials and phosphoric acid-based raw materials, and in the latter, dense and high-strength chia ceramics are obtained by adding rare earth elements such as Y, La, and Ce. It has gained.
しかしながら伺れの場合においても、得られる？ラミッ
ク・スの熱膨張係数，耐熱衝撃特性は十分とは言えない
ものてあった。However, even in this case, is it possible to obtain it? The thermal expansion coefficient and thermal shock resistance of Lamix were not satisfactory.
（課題を解決するための千段）
本発明のセラミックス原料はこのような課題を解決する
ために開発されたものであり，その要冒は、焼或時にＬ
ｉイオン， ＡＩイオンを供給する或分を有し、且っＳ
ｉＯ■或分として石英ガラス（溶融石英）等の非晶質Ｓ
１０２を含有することにある。(1000 Steps to Solving the Problem) The ceramic raw material of the present invention was developed to solve the above problem, and its main purpose is to reduce L during firing.
It has a certain amount of supplying i ions, AI ions, and S
Amorphous S such as quartz glass (fused silica) as iO■
102.
本発明者は、セラミックス原料中に種々の物質ないし成
分を含有させてセラミックスの熱膨張係数を低下させる
実験を行った。その際、焼或時にＬｉイオン， ＡＩイ
オンを供給する戒分な有する原料中に石英ガラス等の非
晶質ＳｉＯ２を含イ■ざせたところ、熱膨張係数か飛躍
的に低下することか認められた。本発明はこのような知
見に基づいてなされたものてある。The present inventor conducted an experiment to reduce the coefficient of thermal expansion of ceramics by incorporating various substances or components into ceramic raw materials. At that time, it was observed that when amorphous SiO2 such as quartz glass was impregnated into the raw material that supplies Li ions and AI ions during firing, the coefficient of thermal expansion decreased dramatically. Ta. The present invention has been made based on this knowledge.
通常、セラミックス原料中にある物質ないし成分を含有
させた場合、加或性か威り立ち、その含有物質，戒分の
熱膨張係数及び含有割合に応してセラミックスの熱膨張
係数か低下する。Normally, when a certain substance or component is included in a ceramic raw material, the coefficient of thermal expansion of the ceramic decreases depending on the contained substance, the coefficient of thermal expansion, and the content ratio of the substance or component.
？かしなからＬｉイオン， ＡＩイオンを供給する原料
中に石英カラス等の非晶質ＳｉＯ■を含有させた場合、
その熱膨張係数及び含有量から予想される値に比へて，
得られた焼或体（セラミックス〉の熱１膨張係数か飛躍
的に低下していた。即ち焼成体の熱膨張係数がＩ．ＯＸ
１０−’℃−１となるようなセラミックス原料に対し
て、熱膨張係数０．５Ｘ １０−’゜Ｃ−１の石英ガラ
ス等の非晶質Ｓｉ０２を２０％だけ含イ１させた場合、
加或性から予想されるセラミックスの熱膨張係数は０．
９Ｘ １０−’°Ｃ − １となるが、実際にはその熱
膨張係数は０．２Ｘ １０−””Ｃ − ’にまで低下
していた。? When amorphous SiO such as quartz glass is included in the raw material that supplies Li ions and AI ions from Kashina,
Compared to the value expected from its thermal expansion coefficient and content,
The thermal expansion coefficient of the obtained fired body (ceramics) was dramatically reduced.In other words, the thermal expansion coefficient of the fired body was I.OX.
When 20% of amorphous Si02 such as quartz glass with a thermal expansion coefficient of 0.5X 10-'°C-1 is added to a ceramic raw material with a temperature of 10-'°C-1,
The coefficient of thermal expansion of ceramics expected from additive properties is 0.
The thermal expansion coefficient was actually reduced to 0.2X 10-''C-'.
このことは、含イイさせた石英ガラス等の非晶質Ｓｉ０
２か自身の熱１＆張係数に基づいてセラミックスの熱膨
張係数を低下させたものとは考えられず、ノ『晶質Ｓｉ
Ｏ２（− 部或いは全体）か原料中のＬｉイオン， Ａ
Ｉイオンと反応して極低熱膨張物質（リチウムアルミノ
珪酸塩（ Ｘ Ｌｉ２Ｏ・Ｙ Ａｌ２０：ｌ−Ｚ Ｓｉ
Ｏ■））を析出し、その析出物の熱膨張係数に基づいて
セラミックスの熱膨張係数か低下したものと考え？れる
。This means that amorphous Si0 such as quartz glass containing
It cannot be considered that the coefficient of thermal expansion of ceramics is lowered based on the thermal coefficient and tensile coefficient of ``crystalline Si''.
O2 (- part or whole) or Li ions in the raw material, A
Reacts with I ions to form an extremely low thermal expansion material (lithium aluminosilicate (X Li2O・Y Al20:l-Z Si
Do you think that the coefficient of thermal expansion of ceramics decreases based on the coefficient of thermal expansion of the precipitate? It will be done.
但し新しく生或した極低熱膨張物質か何てあるか、或い
はその生或のメカニズムについては現段階では解ってい
ない。However, at this stage, it is not known whether there is a newly created extremely low thermal expansion material or the mechanism behind its creation.
本発明においては、原料中の石英ガラス等の非晶質Ｓｉ
Ｏ■か焼或時に他或分と固相反応して極低熱ｙｊｇ張物
質を析出するものと考えられるが、その固相反応の態様
としては、非晶質ＳｉＯ２の表層部が部分的に反応して
芯部か非晶質ＳｉＯ■のまま残存している場合、及び非
晶質Ｓｉ０２が芯の部分まで全体的に反応する場合か考
えられる。本発明はこれら伺れの場合も含むものである
。またこの他、非晶質ＳｉＯ２が焼歳時に一部若しくは
全体的に溶けた上反４５している＋＋｝能性もある。伺
れにしても、本発明においては石英ガラス等の非晶質Ｓ
ｉＯ２が部分的若しくは全体的に他或分と反応して極低
熱膨張物質を析出し、これに基づいてセラミックスの熱
膨張係数か低下し、従って耐熱衝ＩＪｌｌ特性が飛躍的
に向上する効果か生ずる。In the present invention, amorphous Si such as quartz glass in the raw material
It is thought that during O2 calcination, a solid state reaction with other parts occurs to precipitate an extremely low temperature yjg material, but the mode of this solid state reaction is that the surface layer of amorphous SiO2 partially It is conceivable that the core portion remains as amorphous SiO2 after the reaction, or that the amorphous SiO2 reacts entirely up to the core portion. The present invention includes these cases as well. In addition to this, there is also the possibility that the amorphous SiO2 is partly or completely melted during baking. However, in the present invention, amorphous S such as quartz glass
The effect is that iO2 partially or totally reacts with other substances to precipitate an extremely low thermal expansion substance, and based on this, the thermal expansion coefficient of the ceramic decreases, and therefore the heat shock resistance IJll characteristics improves dramatically. arise.
尚木発明者は石英ガラス等の非品質のＳｉＯ■のみ？ら
ず，結晶質のＳｉ０２の含有実験も併せて行った。しか
しながら本発明者か行った実験の範囲内ては良好な結果
は得られなかった。その理由は、結晶質のＳｉＯ■の場
合他或分との反応性か乏しく、十分に極低熱ｌｌ１張物
質を析出し得なかったことによるものと考えられる。即
ちセラミックス原料に含有させるＳｉ０２分としては、
石英ガラス等の非品質のＳｉＯ２か良好なのである。こ
れは非晶質ＳｉＯ２の場合、結晶構造をとっていないの
で焼或時に他或分との反応性か高く、極低熱膨張物質を
より析出させ易いこ・とによるものである。Is Naoki the only inventor of non-quality SiO■ such as quartz glass? In addition, an experiment containing crystalline Si02 was also conducted. However, good results were not obtained within the range of experiments conducted by the present inventor. The reason for this is thought to be that in the case of crystalline SiO2, the reactivity with some other substances is poor and it was not possible to sufficiently precipitate an extremely low-temperature material. That is, the Si02 content to be contained in the ceramic raw material is as follows:
Non-quality SiO2 such as quartz glass is good. This is because in the case of amorphous SiO2, since it does not have a crystalline structure, it is highly reactive with other substances during sintering, and it is easier to precipitate an extremely low thermal expansion substance.
本発明においては原料中に含有させる非晶質ＳｉＯｇの
酸を２〜５０重量％の範囲とするのが望ましい。その理
由は２重量％より少ないと石英ガラス等の非晶質ＳｉＯ
■を含有させた効果か薄く、逆に５０重量％を超えて含
有させるとクリストバライト，クオーツ等の熱膨張係数
の大きい物質が析出するようになるからである。In the present invention, it is desirable that the amount of the amorphous SiOg acid contained in the raw material is in the range of 2 to 50% by weight. The reason is that if it is less than 2% by weight, amorphous SiO such as quartz glass
This is because the effect of containing (2) is small; conversely, if the content exceeds 50% by weight, substances with large thermal expansion coefficients such as cristobalite and quartz will precipitate.
石英ガラス等の非晶質ＳｉＯ２か結晶化する場合、一般
にこのようなクリストハライト等の結晶な析出するか、
この結晶は熱膨張係数か高く、従ってこのような結晶の
析出を極力抑えることによって、セラミックス全体の熱
膨張係数を大きく低下させることかできるのである。When amorphous SiO2 such as quartz glass crystallizes, crystallization such as cristohalite generally precipitates or
These crystals have a high coefficient of thermal expansion, and therefore, by suppressing the precipitation of such crystals as much as possible, the coefficient of thermal expansion of the entire ceramic can be significantly lowered.
（実施例）
次に本発明の特徴を更に明確にずべ〈以下にその実施例
を詳述する。(Examples) Next, the features of the present invention will be explained more clearly. Examples thereof will be described in detail below.
第１表に示す種々組或てセラミックス原料を調合し、こ
れを同表に示す温度条件の下で焼或し、得られた焼威体
（セラミックス）の熱膨張係数測定，ｒＭ熱衝撃試験を
行った。結果を同表に併せて示してある。The various combinations or ceramic raw materials shown in Table 1 were prepared and fired under the temperature conditions shown in the table, and the thermal expansion coefficient and rM thermal shock test of the resulting fired bodies (ceramics) were conducted. went. The results are also shown in the same table.
（以下余白）
尚、第１表において予想熱膨張係数とは、石英ガラスを
含有させた場合に、その石英ガラスの熱膨張係数（
０．５Ｘ］０−”゜ｃ−’）とその添加量とにノ．（づ
いて、加成性により焼戒体（セラミックス）の熱膨張係
数が下がるとした場合の予想熱膨張係数を意味している
。(Left below) In Table 1, the expected coefficient of thermal expansion refers to the coefficient of thermal expansion of quartz glass (
0.5 are doing.
この結果から、セラミックス熱膨張係数は予悲される伯
より飛躍的に低下しており、従ってまた耐熱衝撃性能も
飛躍的に向上していることか解る。From this result, it can be seen that the coefficient of thermal expansion of the ceramic is dramatically lower than expected, and therefore the thermal shock resistance is also dramatically improved.
以Ｌ本発明の実施例を詳述したか、本発明はその主旨を
逸脱しない範囲において、当業渚の知識に基づき様々な
変更を加えた態様で構成・実施可能である。Although the embodiments of the present invention have been described in detail below, the present invention can be constructed and implemented with various modifications based on the knowledge of those skilled in the art without departing from the spirit thereof.
Claims (4)
を有し、且つＳｉＯ＿２成分として石英ガラス等の非晶
質ＳｉＯ＿２を含有することを特徴とするセラミックス
原料。(1) A ceramic raw material characterized by having a component that supplies Li ions and Al ions during firing, and containing amorphous SiO_2 such as quartz glass as the SiO_2 component.
分として含有し、且つＳｉＯ＿２成分の少なくとも一部
として石英ガラス等の非晶質ＳｉＯ＿２を含有すること
を特徴とする請求項（１）に記載のセラミックス原料。(2) The ceramic raw material according to claim (1), which contains SiO_2, Al_2O_3, and Li_2O as main components, and also contains amorphous SiO_2 such as quartz glass as at least a part of the SiO_2 component.
夫々重量比でＳｉＯ＿２：５０〜８５％，Ａｌ＿２Ｏ＿
３：５〜２５％，Ｌｉ＿２Ｏ：２〜２０％であることを
特徴とする請求項（１）又は（２）に記載のセラミック
ス原料。(3) The amounts of SiO_2, Al_2O_3, and Li_2O are respectively SiO_2:50-85% and Al_2O_
3:5 to 25% and Li_2O: 2 to 20%, the ceramic raw material according to claim (1) or (2).
２〜５０％の範囲で含有することを特徴とする請求項（
１）乃至（３）の何れかに記載のセラミックス原料。(4) A claim characterized in that the amorphous SiO_2 such as the quartz glass is contained in a range of 2 to 50% by weight.
The ceramic raw material according to any one of 1) to (3).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP29847789A JPH03159959A (en) | 1989-11-16 | 1989-11-16 | Raw material of ceramics |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP29847789A JPH03159959A (en) | 1989-11-16 | 1989-11-16 | Raw material of ceramics |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH03159959A true JPH03159959A (en) | 1991-07-09 |
Family
ID=17860207
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP29847789A Pending JPH03159959A (en) | 1989-11-16 | 1989-11-16 | Raw material of ceramics |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH03159959A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NL1008578C2 (en) * | 1998-03-13 | 1999-09-14 | Adriaan Cornelis Christiaan Hu | Ceramic material, semi-finished product and method of manufacturing it. |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63215559A (en) * | 1987-02-27 | 1988-09-08 | 日本碍子株式会社 | Ceramic substrate |
| JPH01246177A (en) * | 1988-03-26 | 1989-10-02 | Inax Corp | Super thermal shock-resistant ceramic material |
-
1989
- 1989-11-16 JP JP29847789A patent/JPH03159959A/en active Pending
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63215559A (en) * | 1987-02-27 | 1988-09-08 | 日本碍子株式会社 | Ceramic substrate |
| JPH01246177A (en) * | 1988-03-26 | 1989-10-02 | Inax Corp | Super thermal shock-resistant ceramic material |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NL1008578C2 (en) * | 1998-03-13 | 1999-09-14 | Adriaan Cornelis Christiaan Hu | Ceramic material, semi-finished product and method of manufacturing it. |
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