JPH03154338A - Vapor cleaning drying device - Google Patents
Vapor cleaning drying deviceInfo
- Publication number
- JPH03154338A JPH03154338A JP29360989A JP29360989A JPH03154338A JP H03154338 A JPH03154338 A JP H03154338A JP 29360989 A JP29360989 A JP 29360989A JP 29360989 A JP29360989 A JP 29360989A JP H03154338 A JPH03154338 A JP H03154338A
- Authority
- JP
- Japan
- Prior art keywords
- medium
- cleaning
- steam
- drying
- heating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004140 cleaning Methods 0.000 title claims abstract description 36
- 238000001035 drying Methods 0.000 title claims abstract description 30
- 238000010438 heat treatment Methods 0.000 claims abstract description 37
- 238000001704 evaporation Methods 0.000 claims abstract description 24
- 230000008020 evaporation Effects 0.000 claims abstract description 22
- 238000003860 storage Methods 0.000 claims description 11
- 238000013020 steam cleaning Methods 0.000 claims description 9
- 238000005406 washing Methods 0.000 claims description 4
- 238000002485 combustion reaction Methods 0.000 abstract 1
- 238000005507 spraying Methods 0.000 abstract 1
- 239000000126 substance Substances 0.000 abstract 1
- 230000008016 vaporization Effects 0.000 abstract 1
- 238000009835 boiling Methods 0.000 description 3
- 238000001816 cooling Methods 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 239000002699 waste material Substances 0.000 description 2
- -1 IPA Chemical class 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 238000004880 explosion Methods 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 230000020169 heat generation Effects 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 229920002545 silicone oil Polymers 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
Landscapes
- Cleaning Or Drying Semiconductors (AREA)
Abstract
Description
【発明の詳細な説明】
[産業上の利用分野]
本発明は半導体製造工程等で利用される蒸気洗浄乾燥装
置、特にはフォトマスク、レチクル、半導体クエへ等の
被洗浄物を精密洗浄するために利用される蒸気洗浄乾燥
装置に関する。[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to a steam cleaning drying apparatus used in semiconductor manufacturing processes, particularly for precision cleaning of objects to be cleaned such as photomasks, reticles, semiconductor cubes, etc. The present invention relates to a steam cleaning drying device used for.
[従来の技術1
従来、この種の洗浄装置は、被洗浄物を洗浄乾燥するた
めの処理部の下部又は側部に設けられた貯留部に高揮発
性の媒体を貯留すると共に、この貯留部内の媒体を加熱
して蒸気を発生させることにより処理部内を蒸気雰囲気
としている。そして、処理部内が蒸気7囲気となった後
に、処理部内に被洗浄物を没入して、該被洗浄物の洗浄
乾燥を行うように構成されている。[Prior art 1] Conventionally, this type of cleaning apparatus stores a highly volatile medium in a storage section provided at the bottom or side of a processing section for washing and drying objects to be cleaned, and also stores a highly volatile medium in the storage section. By heating the medium to generate steam, a steam atmosphere is created in the processing section. After the inside of the processing section becomes a steam atmosphere, the object to be cleaned is immersed in the processing section, and the object to be cleaned is washed and dried.
[発明が解決しようとしている課題]
しかしながら、上述の従来例では、次のような欠点があ
った。[Problems to be Solved by the Invention] However, the above-mentioned conventional example has the following drawbacks.
(1)大量の高揮発性の媒体を貯留部で長時間貯留する
ことが必要となるため、媒体の純度が低下し易く、本来
目的としている精密洗浄を維持しにくい。(1) Since it is necessary to store a large amount of highly volatile medium in the storage section for a long time, the purity of the medium tends to decrease, making it difficult to maintain the precision cleaning that is originally intended.
(2)大量の蒸気を常に発生させることが必要となるた
め、大容量の加熱部を設けることが必要となる。(2) Since it is necessary to constantly generate a large amount of steam, it is necessary to provide a large-capacity heating section.
(3)蒸発または揮発した媒体を、一方では常に冷却、
凝縮して排液することが必要となるので、大量の媒体が
必要となる。(3) On the one hand, constantly cooling the evaporated or volatilized medium;
Since it is necessary to condense and drain, a large amount of medium is required.
(4)大量の媒体を加熱するので、加熱を開始してから
蒸気が発生するまでの初期加熱時間が長くなる。(4) Since a large amount of medium is heated, the initial heating time from the start of heating to the generation of steam becomes long.
(5)段差のある被洗浄物には洗浄効果が少ない。(5) The cleaning effect is low on objects to be cleaned that have steps.
(6)可熱性媒体を使用する場合、発火、爆破の危険性
がある。(6) When using a heat-generating medium, there is a risk of ignition or explosion.
本発明はこのような事情に鑑みなされたもので、その目
的は、より少ない媒体の使用で、被洗浄物を超精密に効
率良く、且つ安全に洗浄乾燥することのできる蒸気洗浄
乾燥装置を提供することにある。The present invention was made in view of the above circumstances, and its purpose is to provide a steam cleaning/drying device that can clean and dry objects to be cleaned with high accuracy, efficiency, and safety using a smaller amount of media. It's about doing.
[課題を解決するための手段]
この目的を達成するため、本発明は、蒸気洗浄乾燥装置
において、媒体を貯留する貯留手段と、蒸発プレートに
滴下された媒体を蒸発させることにより蒸気を発生する
蒸気発生手段と、媒体を前記貯留手段から前記蒸気発生
手段へ所定量だけ供給する媒体供給手段と、被洗浄物を
収容する洗浄乾燥室を有する洗浄乾燥手段と、前記蒸気
発生手段で発生した蒸気で前記洗浄乾燥室内の被洗浄物
を洗浄及び乾燥するために前記蒸気発生手段で発生した
蒸気を前記洗浄乾燥室に導入する蒸気導入手段を備え、
前記蒸気発生手段は前記蒸発プレートを収容する蒸発室
と、前記蒸発プレートを前記蒸発室の外部から加熱する
加熱手段を有することを特徴としている。[Means for Solving the Problems] In order to achieve this object, the present invention provides a steam cleaning drying apparatus that includes a storage means for storing a medium, and a storage means for generating steam by evaporating the medium dropped on an evaporation plate. a steam generating means, a medium supply means for supplying a predetermined amount of medium from the storage means to the steam generating means, a cleaning drying means having a cleaning and drying chamber for accommodating an object to be cleaned, and steam generated by the steam generating means comprising a steam introducing means for introducing steam generated by the steam generating means into the cleaning and drying chamber in order to wash and dry the object to be cleaned in the cleaning and drying chamber;
The steam generating means is characterized in that it has an evaporation chamber that accommodates the evaporation plate, and a heating means that heats the evaporation plate from outside the evaporation chamber.
[実施例]
第1図は本発明に係わる蒸気洗浄乾燥装置の実施例の断
面を示している。この実施例は発生蒸気が比較的重い媒
体を使用する場合に特に有効であるが、特にこれを限る
わけではなく、洗浄用媒体はIPA等のアルコール類、
またはフロン等で良い、なお、この図では、洗浄乾燥室
13の両側に媒体供給部60と蒸気発生部70がそれぞ
れ設けられているが、蒸気導入管10を分岐することに
より、どちらか−組にしても良い。[Embodiment] FIG. 1 shows a cross section of an embodiment of a steam cleaning and drying apparatus according to the present invention. This embodiment is particularly effective when using a medium that generates relatively heavy steam, but is not limited to this, and the cleaning medium may include alcohols such as IPA,
In addition, in this figure, the medium supply section 60 and the steam generation section 70 are provided on both sides of the cleaning/drying chamber 13, but by branching the steam introduction pipe 10, it is possible to You can also do it.
本実施例では、蒸発室9.9′の周囲に加熱媒体溝り3
6,36°が設けられている。この加熱媒体溝り36.
36’ には、タンク50に貯留されている例えばシリ
コンオイル等の加熱媒体51が、バキュームタンク46
内の真空圧によって導入される。バキュームタンク46
は電磁バルブ43を介して加熱媒体溝り36.38°に
連通していると共に、電磁バルブ44を介して大気に開
放可能とされている。In this embodiment, a heating medium groove 3 is provided around the evaporation chamber 9.9'.
6.36° is provided. This heating medium groove 36.
36', a heating medium 51 such as silicone oil stored in a tank 50 is transferred to a vacuum tank 46'.
Introduced by vacuum pressure inside. vacuum tank 46
is connected to the heating medium groove 36.38° via an electromagnetic valve 43, and can be opened to the atmosphere via an electromagnetic valve 44.
コントローラ40は電磁バルブ43.44を閉状態とし
た状態で、電磁バルブ45を開とし、真空ポンプ42を
動作させることにより、バキュームタンク46内を所望
の真空状態とする。それ以外は、電磁バルブ45は閉状
態にされると共に、真空ポンプ42は停止している。The controller 40 closes the electromagnetic valves 43 and 44, opens the electromagnetic valve 45, and operates the vacuum pump 42 to bring the inside of the vacuum tank 46 into a desired vacuum state. Otherwise, the electromagnetic valve 45 is closed and the vacuum pump 42 is stopped.
また、加熱媒体溝り36.36″は電磁バルブ54を介
してタンク50内に連通している。タンク50内の加熱
媒体51はヒーター52により媒体貯留部41内の洗浄
媒体の沸点以上で発火点以下の所望の温度に加熱されて
いる。タンク50内の加熱媒体51の温度を検出してい
る温度検出器53の出力は、コントローラ40に送られ
、コントローラ40はこれに基づいてヒーター52の発
熱を制御し、加熱媒体51の温度を所望の温度に維持し
ている。Further, the heating medium groove 36.36'' communicates with the inside of the tank 50 via the electromagnetic valve 54.The heating medium 51 inside the tank 50 is ignited by the heater 52 at a temperature higher than the boiling point of the cleaning medium inside the medium storage section 41. The output of the temperature detector 53 that detects the temperature of the heating medium 51 in the tank 50 is sent to the controller 40, and the controller 40 adjusts the temperature of the heater 52 based on this. Heat generation is controlled to maintain the temperature of the heating medium 51 at a desired temperature.
ヒーター5,5゛は加熱媒体溝り38.36’に導入さ
れた加熱媒体の温度が所望温度以下となった場合に、こ
れを加熱するために設けられている。ヒーター5.5°
は加熱媒体溝り36゜36°内に設けられている温度検
出器37゜37°の出力に基づいてコントローラ40に
より制御される。媒体散布ノズル7.7°から蒸発プレ
ート6.6°に散布された洗浄媒体は、加熱媒体溜り3
6.36’内の加熱媒体が有する熱により蒸発される。The heaters 5, 5' are provided to heat the heating medium introduced into the heating medium grooves 38, 36' when the temperature falls below a desired temperature. Heater 5.5°
is controlled by a controller 40 based on the output of a temperature sensor 37°37° provided within the heating medium groove 36°36°. The cleaning medium sprayed from the medium spray nozzle 7.7° to the evaporation plate 6.6° is transferred to the heating medium reservoir 3.
6.36' is evaporated by the heat possessed by the heating medium.
この方法は、洗浄媒体が発火性の高いものである場合に
は、直接ヒーター等によって加熱する方法に比して、安
全性が高く好ましい。If the cleaning medium is highly flammable, this method is preferred because it is safer than a method of directly heating with a heater or the like.
蒸発プレート6.6°で蒸発した洗浄媒体は、蒸気導入
管10.10’を介して被洗浄物(例えば、フォトマス
ク、レチクル、半導体ウェハ)20の上方部分に向けて
噴出されるように、被洗浄物20を保持するホルダ24
の位置が、調整される。ホルダ24はロッド30を介し
て駆動機構35により上下動される。運動機構35はコ
ントローラ40により制御される。The cleaning medium evaporated at the evaporation plate 6.6° is ejected through the vapor introduction pipe 10.10' toward the upper part of the object to be cleaned (for example, a photomask, reticle, semiconductor wafer) 20. Holder 24 that holds the object to be cleaned 20
The position of is adjusted. The holder 24 is moved up and down by a drive mechanism 35 via a rod 30. The movement mechanism 35 is controlled by a controller 40.
次に、この実施例の動作を説明する。コントローラ40
が出口側のエアーオペレーションバルブ(空気圧によっ
て開閉が切換えられるバルブ)4.4′を閉じた状態で
入口側のエアーオペレーションバルブ1.1′を開くと
、媒体貯留部41.41°から洗浄媒体が媒体供給部6
0゜60°内にガス留り2.2′の圧力が媒体貯留部4
1.41°の圧力と等しくなるまで供給される。この後
、コントローラ40はバルブ1,1゛を閉じ状態とする
。一方、コントローラ4oは上部シャッタ31が開いて
いる状態で、駆動機構35によりホルダ24を図示位置
から上昇させ、被洗浄物20をホルダ24に保持させた
後、図示位置に降下させる。この状態では洗浄乾燥室1
3を形成している内筒33の底部の開口は、ロッド30
と一体的なシャッタ59により遮閉される。Next, the operation of this embodiment will be explained. controller 40
When the air operation valve 4.4' on the outlet side is closed and the air operation valve 1.1' on the inlet side is opened, the cleaning medium is discharged from the medium reservoir 41.41°. Medium supply section 6
The pressure of the gas reservoir 2.2' within 0°60° is the pressure of the medium storage part 4.
It is supplied until the pressure equals 1.41°. After this, the controller 40 closes the valves 1 and 1'. On the other hand, with the upper shutter 31 open, the controller 4o uses the drive mechanism 35 to raise the holder 24 from the illustrated position, holds the object 20 to be cleaned in the holder 24, and then lowers it to the illustrated position. In this state, washing drying chamber 1
The opening at the bottom of the inner cylinder 33 forming the rod 30
It is shut off by a shutter 59 that is integrated with.
この後、シャッター31が閉じられると、コントローラ
40はエアーオペレーションバルブ4゜4°に開指令を
出し、バルブ4.4°を開いて、ノズル7.7°から媒
体供給部60.60’内の洗浄媒体全量を蒸発室9.9
′内の蒸発プレート6.6°上に摘下もしくは散布させ
、これが終了するのに見合う所定時間後にバルブ4.4
°を閉じる。そして、この後、コントローラ40は蒸発
室9,9゛に滞留した洗浄媒体を、その沸点以上発火点
以下に加熱するために、電磁バルブ43゜54を開いて
、バキュームタンク46の真空圧を加熱媒体溜り36.
36’を介してタンク50内の加熱媒体5貫に作用させ
る。これにより、洗浄媒体の沸点以上、発火点以下の所
望の温度に加熱されている加熱媒体は加熱媒体溜り36
.36’に導入され、その熱で蒸発室9,9゛内の洗浄
媒体を徐々に昇温し、蒸気状態とする。After this, when the shutter 31 is closed, the controller 40 issues an opening command to the air operation valve 4°4°, opens the valve 4.4°, and supplies air from the nozzle 7.7° to the medium supply section 60.60'. Transfer the entire amount of cleaning medium to the evaporation chamber 9.9
After a predetermined time period corresponding to the completion of this operation, the valve 4.4 is
Close °. After this, the controller 40 opens the electromagnetic valves 43 and 54 to heat the cleaning medium stagnant in the evaporation chambers 9 and 9 to a temperature above the boiling point and below the ignition point, thereby increasing the vacuum pressure in the vacuum tank 46. Media reservoir 36.
It acts on five heating mediums in the tank 50 via 36'. As a result, the heating medium heated to a desired temperature above the boiling point and below the ignition point of the cleaning medium is stored in the heating medium reservoir 36.
.. 36', and the heat gradually raises the temperature of the cleaning medium in the evaporation chambers 9, 9' to bring it into a vapor state.
媒体蒸気は蒸気導入管to、to’ を通って被洗浄物
20に噴射され、洗浄乾燥室13を満たす。洗浄乾燥室
13の開口部32よりも上方に達っした分の蒸気は、開
口部32からあふれ、外筒34によって形成されている
蒸気捕捉室15に流れ込む。排気管18は不図示の排気
ポンプによって常に排気されており、捕捉室15内の余
剰蒸気は、冷却管16で凝縮されながら排気管18から
排気される。The medium vapor is injected onto the object to be cleaned 20 through the steam introduction pipes to, to' and fills the cleaning and drying chamber 13. The steam reaching above the opening 32 of the cleaning/drying chamber 13 overflows from the opening 32 and flows into the steam trapping chamber 15 formed by the outer cylinder 34 . The exhaust pipe 18 is constantly exhausted by an exhaust pump (not shown), and excess steam in the capture chamber 15 is exhausted from the exhaust pipe 18 while being condensed in the cooling pipe 16.
コントローラ40は蒸発室9.9°内の洗浄媒体が完全
に蒸発して洗浄乾燥が終了するのに見合った時間経過後
に、電磁バルブ44を開いてバキュームタンク46を大
気に開放し、加熱媒体溜り36.36°内の加熱媒体を
タンク50内に戻し、その後、バルブ43,44.54
を閉じると同時に、バルブ45を開け、再び真空ポンプ
42によりバキュームタンク46内を所望の真空圧とす
る。一方、これと平行して、コントローラ40は駆動機
構35によりロッド30を半工程分だけ上昇させ、内筒
33の下部開口を開き、洗浄乾燥室13に満たされてい
る蒸気及び廃液を外筒34内に排気、排液させる。外筒
34の底部には冷却手段17が設けられ、これによって
凝縮された蒸気及び廃液は排出管19を介して装置外部
に排出される。The controller 40 opens the electromagnetic valve 44 to open the vacuum tank 46 to the atmosphere after a period of time sufficient for the cleaning medium in the evaporation chamber 9.9° to completely evaporate and the cleaning and drying process is completed, and then opens the vacuum tank 46 to the atmosphere and removes the heating medium reservoir. The heating medium within 36.36° is returned to the tank 50 and then the valves 43, 44.54
At the same time as closing, the valve 45 is opened, and the vacuum tank 46 is brought to a desired vacuum pressure again by the vacuum pump 42. Meanwhile, in parallel with this, the controller 40 uses the drive mechanism 35 to raise the rod 30 by a half-stroke, opens the lower opening of the inner cylinder 33, and drains the steam and waste liquid filling the cleaning/drying chamber 13 into the outer cylinder 33. Exhaust and drain fluid inside. A cooling means 17 is provided at the bottom of the outer cylinder 34, and the condensed steam and waste liquid are discharged to the outside of the apparatus through a discharge pipe 19.
この後、シャッター31が開かれると、コントローラ4
0は駆動機構35によりロッド30を全行程上昇させ、
ホルダー24から被洗浄物20を取り外すことを可能に
する。ここで新たな被洗浄物20がホルダー24にセッ
トされると、上述の動作が再び繰り返される。After this, when the shutter 31 is opened, the controller 4
0, the rod 30 is raised all the way by the drive mechanism 35,
The object to be cleaned 20 can be removed from the holder 24. When a new object 20 to be cleaned is set in the holder 24, the above-described operation is repeated again.
[発明の効果]
以上説明したように、本発明によれば、大量の高揮発性
媒体を長時間貯留加熱する必要がなくなるので、洗浄用
の高揮発性媒体を常に高純度に保つことができ、より精
密な洗浄乾燥を可能とすると共に、媒体の発火等の危険
性も小さくできる。[Effects of the Invention] As explained above, according to the present invention, there is no need to store and heat a large amount of highly volatile medium for a long period of time, so it is possible to always maintain high purity of the highly volatile medium for cleaning. This enables more precise cleaning and drying, and also reduces the risk of medium ignition.
また、媒体の長時間の貯留がないため、貯留部を高価な
石英ガラスにする必要がなく、安価なステンレス製でも
析出物を最小限にすることができるため、製作コストを
低減できる。更に、本発明によれば、媒体蒸発室は小さ
くてすみ、加熱容量も小さくできるので、加熱時間も短
縮され、効率的な洗浄が達成される。Furthermore, since the medium is not stored for a long time, the storage part does not need to be made of expensive quartz glass, and even if it is made of inexpensive stainless steel, precipitates can be minimized, so manufacturing costs can be reduced. Furthermore, according to the present invention, the medium evaporation chamber can be made small and the heating capacity can also be made small, so that the heating time can be shortened and efficient cleaning can be achieved.
第1図は本発明に係る蒸気洗浄乾燥装置の一実施例を示
す断面図である。
9・・蒸発室、 10・・蒸気導入管、20・・被洗
浄物、36・・加熱媒体溝り、60・・媒体供給部FIG. 1 is a sectional view showing an embodiment of the steam cleaning and drying apparatus according to the present invention. 9. Evaporation chamber, 10. Steam introduction pipe, 20. Object to be cleaned, 36. Heating medium groove, 60. Medium supply section
Claims (3)
された媒体を蒸発させることにより蒸気を発生する蒸気
発生手段と、媒体を前記貯留手段から前記蒸気発生手段
へ所定量だけ供給する媒体供給手段と、被洗浄物を収容
する洗浄乾燥室を有する洗浄乾燥手段と、前記蒸気発生
手段で発生した蒸気で前記洗浄乾燥室内の被洗浄物を洗
浄及び乾燥するために前記蒸気発生手段で発生した蒸気
を前記洗浄乾燥室に導入する蒸気導入手段を備え、前記
蒸気発生手段は前記蒸発プレートを収容する蒸発室と、
前記蒸発プレートを前記蒸発室の外部から加熱する加熱
手段を有していることを特徴とする蒸気洗浄乾燥装置。(1) A storage means for storing a medium, a steam generation means for generating steam by evaporating the medium dropped on an evaporation plate, and a medium supply for supplying a predetermined amount of the medium from the storage means to the steam generation means. a cleaning/drying means having a cleaning/drying chamber for accommodating an object to be cleaned; and a cleaning/drying means having a cleaning/drying chamber for accommodating an object to be cleaned; comprising a steam introduction means for introducing steam into the cleaning and drying chamber, the steam generation means having an evaporation chamber that accommodates the evaporation plate;
A steam cleaning/drying apparatus comprising a heating means for heating the evaporation plate from outside the evaporation chamber.
媒体を前記蒸発室の周囲に供給する請求項1記載の蒸気
洗浄乾燥装置。(2) The steam cleaning and drying apparatus according to claim 1, wherein the heating means supplies a heating medium heated to a desired temperature around the evaporation chamber.
可能なシャッタを備えた被洗浄物の出入口と、この出入
口を通して被洗浄物を搬出入する鉛直方向搬送手段を有
する請求項2記載の蒸気洗浄乾燥装置。(3) The washing/drying means has an entrance/exit for the object to be cleaned having an openable/closable shutter on the upper surface of the washing/drying chamber, and a vertical conveyance means for carrying in/out the object to be cleaned through this entrance/exit. Steam cleaning drying equipment.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP29360989A JPH03154338A (en) | 1989-11-10 | 1989-11-10 | Vapor cleaning drying device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP29360989A JPH03154338A (en) | 1989-11-10 | 1989-11-10 | Vapor cleaning drying device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH03154338A true JPH03154338A (en) | 1991-07-02 |
Family
ID=17796929
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP29360989A Pending JPH03154338A (en) | 1989-11-10 | 1989-11-10 | Vapor cleaning drying device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH03154338A (en) |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62106630A (en) * | 1985-11-05 | 1987-05-18 | Hitachi Ltd | Processing device |
JPS62260324A (en) * | 1986-05-07 | 1987-11-12 | Sigma Gijutsu Kogyo Kk | Substrate drying apparatus |
JPS63182818A (en) * | 1987-01-26 | 1988-07-28 | Hitachi Ltd | Drying device |
-
1989
- 1989-11-10 JP JP29360989A patent/JPH03154338A/en active Pending
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62106630A (en) * | 1985-11-05 | 1987-05-18 | Hitachi Ltd | Processing device |
JPS62260324A (en) * | 1986-05-07 | 1987-11-12 | Sigma Gijutsu Kogyo Kk | Substrate drying apparatus |
JPS63182818A (en) * | 1987-01-26 | 1988-07-28 | Hitachi Ltd | Drying device |
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