JPH0315297B2 - - Google Patents
Info
- Publication number
- JPH0315297B2 JPH0315297B2 JP395879A JP395879A JPH0315297B2 JP H0315297 B2 JPH0315297 B2 JP H0315297B2 JP 395879 A JP395879 A JP 395879A JP 395879 A JP395879 A JP 395879A JP H0315297 B2 JPH0315297 B2 JP H0315297B2
- Authority
- JP
- Japan
- Prior art keywords
- anode
- vacuum
- chamber
- cathode
- heating means
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000010438 heat treatment Methods 0.000 claims description 12
- 230000002093 peripheral effect Effects 0.000 claims 1
- 239000012212 insulator Substances 0.000 description 7
- 238000007872 degassing Methods 0.000 description 4
- 238000010894 electron beam technology Methods 0.000 description 3
- 238000002048 anodisation reaction Methods 0.000 description 2
- 230000003116 impacting effect Effects 0.000 description 2
- 102000006391 Ion Pumps Human genes 0.000 description 1
- 108010083687 Ion Pumps Proteins 0.000 description 1
- 238000007743 anodising Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
Landscapes
- Electron Sources, Ion Sources (AREA)
Description
本発明は、電界放射電子銃の改良に関するもの
である。
電界放射電子銃は熱電子型電子銃に比較して、
輝度が103倍もあるという優れた特徴をもつてい
る。しかしながら、その実用化には、10-9トール
以下の高真空下におく必要がある。この高真空を
電子放射中に維持するためには電子衝撃により陽
極から放出されるガスを防ぐことが必須の条件と
なる。
従来、上述のガス放出を防ぐ一手段として、ヒ
ーター等の加熱手段によつて陽極を加熱して、脱
ガスを行なう昇温脱ガス法がある。しかしなが
ら、これによると陽極処理中にヒーター等の加熱
手段自体から大量にガスが放出され、これによる
真空低下を生起することになり、上述した高真空
状態を保つことができなくなる。
本発明は、かゝる点に着目してなされたもので
あり、ガス放出用加熱手段からのガス放出をなく
し、つねに高真空状態を保つことのできる電界放
射電子銃を提供するものである。
本発明を図により、詳細に説明する。電界放射
陰極６は耐真空の碍子１の導入端子２，２′に固
定されている。碍子１は摺動フランジ１５に接続
され、ベローズ３を介してフランジ４に接続して
いる。摺動フランジ１５は調整ネジ５により水平
移動する。この機構により、電界放射陰極６が第
１陽極７の開口１６にセンタリングされる。この
例では、第１陽極７はカツプ形状からなり、その
底に電子線が通過し得る開口を有する。開口１６
は口径0.2mm〜１mmφ程度あればよいが通常0.5mm
φ程度である。第１陽極７はリング状碍子１８に
固定されている。また第１陽極７の外側にはヒー
ター等の加熱手段８が巻きつけられ、導入碍子１
０のピン９から通電により、加熱される。第１陽
極７はリグ状碍子１８で固定され、熱絶縁されて
いる。このため第１陽極７は容易に高温にするこ
とができる。脱ガス処理には、300℃〜500℃が必
要である。第１陽極７の下方には、開口１７をも
つた第２陽極１１が設けられている。開口１６，
１７を通つた電子線はフランジ１２の下方に接続
される電子レンズにより集束、あるいは拡大され
る。この電子銃は排気口１３と排気口１４で排気
される２つのチヤンバー、すなわち上室１９と下
室２０に分離されている。真空的な接続は両チヤ
ンバーの電子線の通る開口のみである。この開口
１６では、上室１９と下室２０との真空差を２桁
に保つことが可能である。
下表は一例としてこの上室１９と下室２０の真
空度の関係を、開口１６の口径(d)をパラメータと
して示したものである。
例
The present invention relates to improvements in field emission electron guns. Compared to a thermionic electron gun, a field emission electron gun is
It has an excellent feature of being 10 3 times brighter. However, for its practical use, it is necessary to place it under a high vacuum of 10 -9 Torr or less. In order to maintain this high vacuum during electron emission, it is essential to prevent gas from being emitted from the anode due to electron bombardment. Conventionally, as a means for preventing the above-mentioned gas release, there is a temperature increasing degassing method in which the anode is heated with a heating means such as a heater to degas the anode. However, according to this method, a large amount of gas is released from the heating means itself such as a heater during anodization, and this causes a decrease in vacuum, making it impossible to maintain the above-mentioned high vacuum state. The present invention has been made with this in mind, and it is an object of the present invention to provide a field emission electron gun that can eliminate gas discharge from the gas discharge heating means and that can always maintain a high vacuum state. The present invention will be explained in detail with reference to the drawings. The field emission cathode 6 is fixed to the introduction terminals 2, 2' of the vacuum-proof insulator 1. The insulator 1 is connected to a sliding flange 15 and to a flange 4 via a bellows 3. The sliding flange 15 is horizontally moved by the adjustment screw 5. This mechanism centers the field emission cathode 6 in the opening 16 of the first anode 7. In this example, the first anode 7 is cup-shaped and has an opening at the bottom through which the electron beam can pass. opening 16
The diameter should be about 0.2mm to 1mmφ, but it is usually 0.5mm.
It is about φ. The first anode 7 is fixed to a ring-shaped insulator 18. Further, a heating means 8 such as a heater is wound around the outside of the first anode 7, and the introduced insulator 1
It is heated by applying electricity from pin 9 of 0. The first anode 7 is fixed with a rig-shaped insulator 18 and is thermally insulated. Therefore, the first anode 7 can be easily heated to a high temperature. Degassing treatment requires a temperature of 300°C to 500°C. A second anode 11 having an opening 17 is provided below the first anode 7 . opening 16,
The electron beam passing through 17 is focused or expanded by an electron lens connected below the flange 12. This electron gun is separated into two chambers, an upper chamber 19 and a lower chamber 20, which are evacuated by an exhaust port 13 and an exhaust port 14. The only vacuum connection is the opening in both chambers through which the electron beam passes. This opening 16 allows the vacuum difference between the upper chamber 19 and the lower chamber 20 to be maintained in two digits. The table below shows, as an example, the relationship between the degree of vacuum between the upper chamber 19 and the lower chamber 20 using the diameter (d) of the opening 16 as a parameter. example
【表】
この例から、前述したように上室と下室との真
空差を２桁に保つことが可能であることがわか
る。なお、本例は、上室１９と下室２０とをそれ
ぞれほヾ同程度の真空排気容量を持つ真空ポンプ
（例えば、イオンポンプ等）によつて真空排気し
た場合について示したものであるが、上室１９を
さらに強力な真空ポンプを用いて真空排気すれ
ば、上室と下室の真空差をさらに大にすることが
可能である。また、第１陽極７をカツプ形状にし
ているのは、第１陽極７で散乱した電子が昇温脱
ガス処理をしていない上室１９の内壁を衝撃しそ
れによる真空低下を防ぐためであり、前記散乱し
た電子をカツプ形状内にとじこめるようにしたも
のである。
以上のように、本発明によれば、第１陽極を真
空の分離壁とした構成により、陽極処理中にヒー
ター等の陽極加熱手段から大量に放出するガスに
よる真空低下を防ぐことができる。例えば、下室
の真空度が10-6トール（Torr）になつても、上
室は10-8トールに保つことが可能である。導入碍
子１０は高電圧に耐えるように作られ第１陽極７
の加熱処理後は、通常のバトラー型電子銃とな
る。
本願発明のようにカツプ形状の陽極の外周に陽
極加熱手段を設けることにより、陽極加熱手段は
陰極を含むチヤンバーの外部にありながら、すな
わち陰極を含むチヤンバーが陽極加熱手段からの
放出ガスによつて真空低下を生起させない状態
で、陽極を加熱して脱ガスを行なうことが可能と
なり、陽極の処理を完全なものとすることができ
る。この結果、電子放射中に陽極から生じるガス
放出が著しく減少し、高真空状態を保つて安定な
電子放射が可能となる。また、陽極を衝撃した放
射電子のうち約半数の電子はその周囲に散乱する
が、陽極をカツプ形状とすることによつて、散乱
した電子は高温脱ガス処理をした陽極内に閉じ込
めることが可能で、脱ガス処理された陽極以外の
外部部材を衝撃する散乱電子を著しく減少させ、
陽極処理に効果を向上させることができるもので
ある。[Table] This example shows that it is possible to maintain the vacuum difference between the upper chamber and the lower chamber within two digits as described above. Note that this example shows a case where the upper chamber 19 and the lower chamber 20 are evacuated by vacuum pumps (for example, ion pumps, etc.) each having approximately the same evacuation capacity. If the upper chamber 19 is evacuated using a more powerful vacuum pump, it is possible to further increase the vacuum difference between the upper chamber and the lower chamber. The reason why the first anode 7 is shaped into a cup is to prevent electrons scattered by the first anode 7 from impacting the inner wall of the upper chamber 19 which has not been subjected to heating and degassing treatment, thereby preventing a decrease in vacuum. , the scattered electrons are confined within a cup shape. As described above, according to the present invention, by using the first anode as a vacuum separation wall, it is possible to prevent a decrease in vacuum due to a large amount of gas released from an anode heating means such as a heater during anodization. For example, even if the vacuum level in the lower chamber is 10 -6 Torr, it is possible to maintain the upper chamber at 10 -8 Torr. The introduced insulator 10 is made to withstand high voltage, and the first anode 7
After the heat treatment, it becomes a normal Butler type electron gun. By providing the anode heating means on the outer periphery of the cup-shaped anode as in the present invention, the anode heating means is located outside the chamber containing the cathode. The anode can be heated and degassed without causing a vacuum drop, and the anode can be completely processed. As a result, gas emission from the anode during electron emission is significantly reduced, making it possible to maintain a high vacuum state and perform stable electron emission. In addition, approximately half of the emitted electrons that impact the anode are scattered around the anode, but by making the anode cup-shaped, the scattered electrons can be confined within the anode, which has been subjected to high-temperature degassing treatment. This significantly reduces scattered electrons impacting external components other than the degassed anode,
This can improve the effect of anodizing.
図は、本発明の一実施例を示す図である。図に
おいて、
６……電界放射陰極、７……第１陰極、８……
ヒーター、９……ピン、１０……導入碍子、１１
……第２陽極、１３，１４……排気口、１６，１
７……開口、１９……上室、２０……下室。
The figure is a diagram showing an embodiment of the present invention. In the figure, 6... field emission cathode, 7... first cathode, 8...
Heater, 9...Pin, 10...Introduction insulator, 11
...Second anode, 13,14...Exhaust port, 16,1
7...Opening, 19...Upper chamber, 20...Lower chamber.
Claims (1)
たカツプ形状の陽極と、前記陽極のなすカツプ形
状の外周側面にあつて前記陽極を加熱し得る陽極
加熱手段とを具備し、かつ前記陰極を含むチヤン
バーと、該チヤンバーとは前記陽極を介して隣る
前記陽極加熱手段を含むチヤンバーとを、それぞ
れ独立させ、各チヤンバーに独立の真空排気手段
を設けたことを特徴とする電界放射電子銃。1 comprising a field emission cathode, a cup-shaped anode disposed facing the cathode, and an anode heating means capable of heating the anode, located on the outer peripheral side of the cup-shaped anode, and A field emission electron characterized in that a chamber containing a cathode and a chamber containing the anode heating means adjacent to the chamber via the anode are made independent, and each chamber is provided with an independent evacuation means. gun.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP395879A JPS551062A (en) | 1979-01-19 | 1979-01-19 | Electric field-radiation electronic gun |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP395879A JPS551062A (en) | 1979-01-19 | 1979-01-19 | Electric field-radiation electronic gun |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS551062A JPS551062A (en) | 1980-01-07 |
| JPH0315297B2 true JPH0315297B2 (en) | 1991-02-28 |
Family
ID=11571601
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP395879A Granted JPS551062A (en) | 1979-01-19 | 1979-01-19 | Electric field-radiation electronic gun |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS551062A (en) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS57130672U (en) * | 1981-02-09 | 1982-08-14 | ||
| JPS63120683U (en) * | 1987-01-30 | 1988-08-04 | ||
| WO2000016372A1 (en) * | 1998-09-11 | 2000-03-23 | Japan Science And Technology Corporation | High energy electron diffraction apparatus |
| WO2010146833A1 (en) | 2009-06-16 | 2010-12-23 | 株式会社日立ハイテクノロジーズ | Charged particle radiation device |
| JP7068117B2 (en) | 2018-09-18 | 2022-05-16 | 株式会社日立ハイテク | Charged particle beam device |
-
1979
- 1979-01-19 JP JP395879A patent/JPS551062A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS551062A (en) | 1980-01-07 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US20160260573A1 (en) | X-ray tube having non-evaporable getter | |
| US20080283745A1 (en) | Emitter chamber, charged partical apparatus and method for operating same | |
| JPH03505386A (en) | Enclosed high-brightness electron beam source and system | |
| US3389288A (en) | Gettering device including a getter metal and a gas releasing material | |
| JPH0315297B2 (en) | ||
| JP2020047407A (en) | Charged particle beam device | |
| US2341483A (en) | Getter for electron discharge tubes | |
| US4009409A (en) | Fast warmup cathode and method of making same | |
| US2988657A (en) | Ion pump | |
| US4002735A (en) | Method of sensitizing electron emissive surfaces of antimony base layers with alkali metal vapors | |
| US4295072A (en) | Field emission electron gun with anode heater and plural exhausts | |
| US3846006A (en) | Method of manufacturing of x-ray tube having thoriated tungsten filament | |
| US3588593A (en) | Method of operating an ion-getter vacuum pump with gun and grid structure arranged for optimum ionization and sublimation | |
| US2242644A (en) | Luminescent screen | |
| US3388955A (en) | Process for producing within electron tubes,in particular television picture tubes,a thin metallic film capable of sorbing their residual gases | |
| JPH0715352B2 (en) | Vacuum heating device | |
| US4231627A (en) | Electron beam tube | |
| US2129015A (en) | Braun tube | |
| US3331988A (en) | Triggered vacuum gap device with rare earth trigger electrode gas storage means and titanium reservoir | |
| US4018489A (en) | Method for extending cathode life in vidicon tubes | |
| US2622218A (en) | Secondary-emission electron discharge device | |
| US2807517A (en) | Method of manufacturing pickup tubes | |
| US3244933A (en) | Device of the kind comprising a highpower klystron with getter ion pump connected thereto | |
| US1843728A (en) | Photo-electric tube | |
| US1917044A (en) | Process for manufacturing highly emissive cathodes |