JPH03146584A - Abradant for glass polishing - Google Patents
Abradant for glass polishingInfo
- Publication number
- JPH03146584A JPH03146584A JP1285435A JP28543589A JPH03146584A JP H03146584 A JPH03146584 A JP H03146584A JP 1285435 A JP1285435 A JP 1285435A JP 28543589 A JP28543589 A JP 28543589A JP H03146584 A JPH03146584 A JP H03146584A
- Authority
- JP
- Japan
- Prior art keywords
- polishing
- abradant
- abrasive
- glass substrate
- zirconium oxide
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000005498 polishing Methods 0.000 title claims abstract description 51
- 239000011521 glass Substances 0.000 title claims abstract description 28
- TWRXJAOTZQYOKJ-UHFFFAOYSA-L Magnesium chloride Chemical compound [Mg+2].[Cl-].[Cl-] TWRXJAOTZQYOKJ-UHFFFAOYSA-L 0.000 claims abstract description 12
- CSNNHWWHGAXBCP-UHFFFAOYSA-L Magnesium sulfate Chemical compound [Mg+2].[O-][S+2]([O-])([O-])[O-] CSNNHWWHGAXBCP-UHFFFAOYSA-L 0.000 claims abstract description 12
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 claims abstract description 9
- 229910001928 zirconium oxide Inorganic materials 0.000 claims abstract description 9
- 239000002002 slurry Substances 0.000 claims abstract description 8
- XFWJKVMFIVXPKK-UHFFFAOYSA-N calcium;oxido(oxo)alumane Chemical compound [Ca+2].[O-][Al]=O.[O-][Al]=O XFWJKVMFIVXPKK-UHFFFAOYSA-N 0.000 claims abstract description 7
- 229910001629 magnesium chloride Inorganic materials 0.000 claims abstract description 6
- 229910052943 magnesium sulfate Inorganic materials 0.000 claims abstract description 6
- 235000019341 magnesium sulphate Nutrition 0.000 claims abstract description 6
- 239000003082 abrasive agent Substances 0.000 claims description 24
- 239000007788 liquid Substances 0.000 claims description 4
- 239000000758 substrate Substances 0.000 abstract description 17
- 239000006061 abrasive grain Substances 0.000 abstract description 15
- 239000002244 precipitate Substances 0.000 abstract description 11
- 230000003287 optical effect Effects 0.000 abstract description 7
- 239000000463 material Substances 0.000 abstract description 6
- 239000011159 matrix material Substances 0.000 abstract description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract description 3
- 239000002612 dispersion medium Substances 0.000 abstract description 2
- 238000005299 abrasion Methods 0.000 abstract 2
- 239000004973 liquid crystal related substance Substances 0.000 abstract 1
- 238000002156 mixing Methods 0.000 abstract 1
- 238000000034 method Methods 0.000 description 6
- 230000000694 effects Effects 0.000 description 5
- 238000001556 precipitation Methods 0.000 description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 239000000654 additive Substances 0.000 description 3
- 229910000420 cerium oxide Inorganic materials 0.000 description 3
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- 230000003746 surface roughness Effects 0.000 description 3
- 230000007423 decrease Effects 0.000 description 2
- 239000004744 fabric Substances 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- 235000012239 silicon dioxide Nutrition 0.000 description 2
- 230000000996 additive effect Effects 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- JUNWLZAGQLJVLR-UHFFFAOYSA-J calcium diphosphate Chemical compound [Ca+2].[Ca+2].[O-]P([O-])(=O)OP([O-])([O-])=O JUNWLZAGQLJVLR-UHFFFAOYSA-J 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- 235000019821 dicalcium diphosphate Nutrition 0.000 description 1
- 229910000393 dicalcium diphosphate Inorganic materials 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 238000010828 elution Methods 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000010298 pulverizing process Methods 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 238000005070 sampling Methods 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 230000004580 weight loss Effects 0.000 description 1
Landscapes
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
Abstract
Description
【発明の詳細な説明】
〔発明の技術分野〕
本発明は研磨材に関し、特に、光ディスクや磁気ディス
ク用のガラス基板、アクティブマトリックス型ＬＣＤ、
液晶ＴＶ用カラーフィルター、時計ｅ電卓・カメラ用Ｌ
ＣＤあるいは太陽電池などのデイスプレィ用ガラス基板
、ＬＳＩフォトマスク用ガラス基板、あるいは光学用レ
ンズなどの各種ガラス材料の研磨に好適な研磨材に関す
る。DETAILED DESCRIPTION OF THE INVENTION [Technical Field of the Invention] The present invention relates to an abrasive material, and in particular, to a glass substrate for an optical disk or a magnetic disk, an active matrix type LCD,
Color filters for LCD TVs, L for watches, calculators, and cameras
The present invention relates to an abrasive material suitable for polishing various glass materials such as glass substrates for displays such as CDs or solar cells, glass substrates for LSI photomasks, and optical lenses.
近年、光ディスクや磁気ディスク、アクティブマトリッ
クス型ＬＣＤ、液晶ＴＶ用カラーフィルターなどに用い
られるガラス基板、あるいは時計・電卓・カメラ用ＬＣ
Ｄあるいは太陽電池などのデイスプレィ用ガラス基板、
ＬＳＩフォトマスクに用いられるガラス基板の用途が増
大している。In recent years, glass substrates used in optical disks, magnetic disks, active matrix LCDs, color filters for LCD TVs, and LCs for watches, calculators, and cameras.
D or glass substrates for displays such as solar cells,
The use of glass substrates used in LSI photomasks is increasing.
このような用途に用いられるガラス基板は、高精度に表
面研磨することが要求される。Glass substrates used in such applications are required to have their surfaces polished with high precision.
従来、これらのガラス基板の表面研磨に用いられている
研磨材としては、酸化セリウム、酸化ジルコニウム、あ
るいは二酸化ケイ素系の研磨材が通常用いられており、
両面研磨機を用いてこれらの研磨材を循環使用して研磨
を行うのが一般的である。上述した研磨材のうちでも、
酸化セリウムは、酸化ジルコニウムや二酸化ケイ素に比
べて研磨能率が数倍すぐれているという利点があるが、
反面、研磨面の状態（たとえば表面粗さ、スクラッチ、
潜傷の状態）の点からいえば、従来の酸化セリウム系研
磨材は必ずしも充分満足のいくものではないという問題
がある。Conventionally, abrasives based on cerium oxide, zirconium oxide, or silicon dioxide have been used as abrasives to polish the surfaces of these glass substrates.
Generally, polishing is carried out using a double-sided polisher and using these abrasives in circulation. Among the abrasives mentioned above,
Cerium oxide has the advantage of having several times better polishing efficiency than zirconium oxide or silicon dioxide.
On the other hand, the condition of the polished surface (e.g. surface roughness, scratches,
There is a problem in that conventional cerium oxide abrasives are not always completely satisfactory in terms of the state of latent scratches.
ところで、ガラス研磨用の研磨材としては、砥粒を水な
どの液体に分散させてスラリーの状態で使用するのが一
般的である。しかし、このようなスラリー状の研磨材に
おいては、分散質である砥粒が容易に分離し沈殿すると
いう問題がある。上述したようなガラス研磨においては
、通常、研磨材は循環使用されるため、砥粒自身の粉砕
ならびに研磨対象物であるガラス表面からのアルカリ成
分の溶出に起因して、研磨液がアルカリ性となり、この
ため−旦砥粒が沈殿するとこの沈殿が非常に硬いものに
なってしまうという欠点がある。このような分離沈殿し
た砥粒は研磨パッド上に塗りつぶされて硬くなり、パッ
ドが目詰まり状態となって、研磨対象物の表面に傷を生
じさせる要因となる。また、配管や保存容器内でこのよ
うな硬い沈殿が起こると、研磨砥粒が有効に利用できな
いため、所定濃度のスラリー組成が維持できず、このた
め研磨能率が低下し、特に循環使用下での研磨能率は著
しく低下してしまう。さらに、分離し流動性を失った砥
粒が研磨機や配管内に付着すると、これを除去ないし洗
浄することは困難であり、また時間と労力を要する。Incidentally, as an abrasive material for glass polishing, abrasive grains are generally dispersed in a liquid such as water and used in the form of a slurry. However, such a slurry-like abrasive has a problem in that the abrasive particles, which are dispersoids, easily separate and precipitate. In the above-mentioned glass polishing, the abrasive is usually used repeatedly, so the polishing liquid becomes alkaline due to the pulverization of the abrasive particles themselves and the elution of alkaline components from the glass surface that is being polished. For this reason, there is a drawback that when the abrasive grains precipitate, the precipitate becomes very hard. Such separated and precipitated abrasive grains are coated on the polishing pad and become hard, clogging the pad and causing scratches on the surface of the object to be polished. In addition, if such hard precipitation occurs in piping or storage containers, the abrasive grains cannot be used effectively, making it impossible to maintain a slurry composition of a predetermined concentration, which reduces polishing efficiency, especially under cyclic use. The polishing efficiency will be significantly reduced. Furthermore, if the abrasive grains that have separated and lost their fluidity adhere to the inside of the polishing machine or piping, it is difficult to remove or clean them, and it takes time and effort.
上述したような砥粒の沈殿の問題を解決する方法として
、研磨材主成分に第ニリン酸カルシウムを添加すること
によって、砥粒の沈殿を軟らかいもの（すなわち沈殿し
た砥粒を再分散させるのが容易なもの）にすることが提
案されている（特公昭５６−２９７１７号公報）。しか
しながら、本発明者の知見によれば、上述した方法は、
沈殿の硬さを緩和する点においては効果があるが、その
反面、研磨能率を低下させる傾向があり、必要な取代を
加工するための研磨時間が長くなるという問題がある。As a method to solve the problem of abrasive grain precipitation as described above, by adding calcium diphosphate to the main component of the abrasive material, it is possible to soften the abrasive grain precipitation (i.e., it is easy to redisperse the precipitated abrasive grains). (Japanese Patent Publication No. 56-29717). However, according to the findings of the present inventor, the above-mentioned method
Although it is effective in alleviating the hardness of the precipitate, it tends to reduce polishing efficiency and has the problem of prolonging the polishing time to process the required stock removal.
本発明は上述した従来技術が有する問題点に鑑みてなさ
れたものであり、砥粒の沈殿が軟らかく、しかも研磨能
率が安定かつ高く、研磨特性にすぐれたガラス研磨用研
磨材を提供することを目的としている。The present invention has been made in view of the problems of the prior art described above, and aims to provide an abrasive material for glass polishing that has soft abrasive grain precipitation, stable and high polishing efficiency, and excellent polishing properties. The purpose is
上述した目的を達成するために、本発明のガラス研磨用
研磨材は、酸化ジルコニウムを主成分とする研磨材にお
いて、改質成分として、アルミン酸カルシウム、硫酸マ
グネシウムおよび塩化マグネシウムからなる群より選ば
れた少なくとも１種を研磨材に対して０．１〜２０．０
重量％含有させてなることを特徴とするものである。In order to achieve the above-mentioned object, the abrasive material for glass polishing of the present invention is an abrasive material mainly composed of zirconium oxide, in which the modifying component is selected from the group consisting of calcium aluminate, magnesium sulfate, and magnesium chloride. 0.1 to 20.0 of at least one kind to the abrasive
It is characterized by containing % by weight.
本発明の研磨材は、通常、水などの分散媒に分散させて
スラリーの状態で使用されるが、本発明においてはこの
ようなスラリー状研磨材も本発明の範囲に含まれる。The abrasive material of the present invention is normally used in the form of a slurry by dispersing it in a dispersion medium such as water, but such a slurry abrasive material is also included within the scope of the present invention.
本発明者の研究によれば、酸化ジルコニウム系研磨材に
おいて、上記のようなアルミン酸カルシウム、硫酸マグ
ネシウムまたは塩化マグネシウムを特定の全範囲添加す
ることによって、研磨砥粒の沈殿が軟らかくなるという
すぐれた効果が発現する。このため研磨パッド上での目
詰まりが解消され、また再分散が容易であるため研磨液
の組成ないし濃度を常に一定状態に保持することができ
、高い研磨能率を安定的に持続させることが可能となる
。さらに、研磨機や配管内での沈殿砥粒の付着が生じて
も、その洗浄は容易になり作業性は著しく向上する。ま
た、研磨能率が大幅に上昇するため研磨加工に要する時
間を短縮することができる。さらにまた、上述した改質
成分を用いた場合、酸化ジルコニウムが本来的に有する
比較的すぐれた研磨特性（研磨面の粗さ、スクラッチ、
潜傷の状態が良好であること）を損なうことがないので
、この点においても研磨材に要求される特性を調和的に
改良することができる。According to the research of the present inventor, adding calcium aluminate, magnesium sulfate, or magnesium chloride in a specific range to a zirconium oxide-based abrasive material has an excellent effect of softening the precipitate of abrasive grains. The effect appears. This eliminates clogging on the polishing pad, and because redispersion is easy, the composition or concentration of the polishing liquid can always be kept constant, making it possible to maintain high polishing efficiency in a stable manner. becomes. Furthermore, even if precipitated abrasive grains adhere to the polishing machine or inside the pipes, they can be easily cleaned and work efficiency is significantly improved. Furthermore, since the polishing efficiency is significantly increased, the time required for polishing can be shortened. Furthermore, when the above-mentioned modifying components are used, zirconium oxide inherently has relatively excellent polishing properties (roughness of the polished surface, scratches, etc.).
Since the condition of latent scratches is not impaired, the properties required of the abrasive can be harmoniously improved in this respect as well.
本発明の研磨材において、改質成分として添加する成分
は、アルミン酸カルシウム、硫酸マグネシウムまたは塩
化マグネシウムであるが、これらの成分を２種以上複合
的に添加することもできる。In the abrasive material of the present invention, the component added as a modifying component is calcium aluminate, magnesium sulfate, or magnesium chloride, but two or more of these components can also be added in combination.
これらの改質成分の添加量の好ましい範囲は、研磨材（
すなわち研磨材の主成分と改質成分との合計ｆｌ）に対
して０．１〜２０．０重量％であるが、さらに好ましく
は０．５〜１０，０重量％の範囲である。添加量が０．
１重量％未満では上述したような改質効果の発現は乏し
く、特に砥粒の沈殿が硬くなるので好ましくない。一方
、２０．０重量％を超えて添加すると、研磨能率が低下
するので望ましくない。The preferred range of the amount of these modifying components added is as follows:
That is, the amount is 0.1 to 20.0% by weight, more preferably 0.5 to 10.0% by weight, based on the total (fl) of the main component and modifying component of the abrasive. Addition amount is 0.
If the amount is less than 1% by weight, the above-mentioned modification effect will be insufficiently expressed, and the precipitation of the abrasive grains will become particularly hard, which is not preferable. On the other hand, if it is added in an amount exceeding 20.0% by weight, polishing efficiency decreases, which is not desirable.
上述した主成分ならびに改質成分の粒径は、用途や使用
目的に応じて適宜選択され得るが、通常のガラス基板を
対象とした場合、０，１〜１０．０μｍの範囲が望まし
い。The particle diameters of the above-mentioned main components and modifying components can be appropriately selected depending on the purpose and purpose of use, but when a normal glass substrate is used, a range of 0.1 to 10.0 μm is desirable.
本発明の研磨材による研磨対象となる材料は、主として
高精度研磨が要請されるガラス材である。The material to be polished by the abrasive of the present invention is mainly a glass material that requires high-precision polishing.
具体的には光ディスクや磁気ディスク用のガラス基板、
アクティブマトリックス型ＬＣＤ、液晶ＴＶ用カラーフ
ィルター、時計・電卓・カメラ用ＬＣＤあるいは太陽電
池などのデイスプレィ用ガラス基板、ＬＳＩフォトマス
ク用ガラス基板、あるいは光学用レンズなどの研磨にお
いてすぐれた効果を発揮する。Specifically, glass substrates for optical disks and magnetic disks,
It is highly effective in polishing active matrix LCDs, color filters for LCD TVs, glass substrates for displays such as watches, calculators, and cameras, and solar cells, glass substrates for LSI photomasks, and optical lenses.
以下、本発明を実施例ならびに比較例に基づいてさらに
具体的に説明する。Hereinafter, the present invention will be explained in more detail based on Examples and Comparative Examples.
実施例１
下記第１表に示すような各種添加剤を用意し、主成分と
しての酸化ジルコニウムに対して５重量％各々添加して
スラリー状の研磨材を調製した。Example 1 Various additives as shown in Table 1 below were prepared, and 5% by weight of each additive was added to zirconium oxide as the main component to prepare a slurry-like abrasive.
このようにして得られた各種研磨材を用いてガラスディ
スクの研磨効果を調べた。結果を併せて第１表に示す。Using the various abrasives thus obtained, the effectiveness of polishing glass disks was investigated. The results are also shown in Table 1.
研磨方法としては、アルミディスク基板の研磨に使用さ
れるテスト装置を用い、以下のような条件で行った。研
磨効果の評価方法も下記に示す。The polishing method was carried out using a test device used for polishing aluminum disk substrates under the following conditions. A method for evaluating the polishing effect is also shown below.
く研磨条件〉
使用ガラス材： ５１／４”ガラスサブストレートポ
リシングマシン二″ 両面研磨機（９Ｂ−５Ｐ）ポリレ
ンズクロス： ５ｕｒｆｉｎ２００（合成スウエード
クロス）
スラリー砥粒率： Ｚ ｒ Ｏ２１００ｇ／ １スラ
リー供給率二 １５０ｃｃ／分
ポリシング圧カニ ７０ｇ／ｃｄ
下定盤回転数： ６０ｒｐｍ
く研磨効果の評価方法〉
研磨能率：
研磨前と研磨後の重量減により換算し、１分間当たりの
研磨能率を算出した。Polishing conditions> Glass material used: 51/4" glass substrate polishing machine 2" Double-sided polishing machine (9B-5P) Polylens cloth: 5urfin200 (synthetic suede cloth) Slurry abrasive ratio: ZrO2100g/1 slurry supply Rate 2 150 cc/min Polishing pressure crab 70 g/cd Lower surface plate rotation speed: 60 rpm Method for evaluating polishing efficiency Polishing efficiency: The polishing efficiency per minute was calculated based on the weight loss before polishing and after polishing.
面粗度： ＴＡＬＹＳＴＥＰによる測定によって評価した。Surface roughness: Evaluation was made by measurement using TALYSTEP.
表中において、Ｒａ、ＲｙおよびＲｔｍは各々、Ｒａ：
中心線からの形状の変位量の算術平均値で与えられる。In the table, Ra, Ry and Rtm each represent Ra:
It is given as the arithmetic mean value of the amount of displacement of the shape from the center line.
普通いくつかの連続する基準長さしの平均値として決定
される。It is usually determined as the average value of several consecutive reference lengths.
Ｒｙ：基準長さ内の最高山頂から最深谷底までの高さを
表わす。Ry: represents the height from the highest peak to the deepest valley bottom within the standard length.
Ｒｔｍ：各サンプリング長さにおけるＲｙ値の平均値で
ある。Rtm: Average value of Ry values at each sampling length.
沈殿の硬さニ
スラリ−を静置して下方に沈殿した砥粒の硬さを５段階
で評価した。この場合、「１」が最も軟らかい沈殿であ
り、「５」は最も硬い沈殿であることを示す。Hardness of Precipitate The hardness of the abrasive grains that precipitated downward after the Nislurry was left standing was evaluated on a five-point scale. In this case, "1" indicates the softest precipitate and "5" indicates the hardest precipitate.
上記第１表に示すように、アルミン酸カルシウム、硫酸
マグネシウムおよび塩化マグネシウムを添加した研磨材
は、沈殿が軟らかく、しかも研磨能率が高いことが分か
る。また本発明の研磨材は、研磨能率は高いが、面粗度
の点においてもまったく問題がな（良好な研磨特性を示
し、スクラッチの問題も生じなかった。As shown in Table 1 above, it can be seen that the abrasives containing calcium aluminate, magnesium sulfate, and magnesium chloride have soft precipitates and high polishing efficiency. Furthermore, although the abrasive material of the present invention has high polishing efficiency, there were no problems at all in terms of surface roughness (it exhibited good polishing properties and did not cause any problems with scratches).
実施例２
実施例１と同じ研磨条件で、今度は添加剤（改質成分）
の添加量を変化させたものを種々調製して、研磨能率と
改質成分の添加量との関係を調べた。結果を第１図に示
す。第１図に示すように、改質成分の添加量が研磨材に
対して０．１〜２０．０重量％の範囲においては、いず
れの改質成分であっても良好な研磨能率が得られ、特に
０．５〜１０．０重量％の範囲ですぐれた効果があるこ
とが分かる。また、添加量が少ないと砥粒の沈殿が硬く
なり、添加量が多いと研磨能率が低下する傾向が見られ
ることが分かる。Example 2 Same polishing conditions as Example 1, but this time with additives (modifying components)
Various types were prepared with varying amounts of addition, and the relationship between polishing efficiency and the amount of modifying components added was investigated. The results are shown in Figure 1. As shown in Figure 1, when the amount of the modifying component added is in the range of 0.1 to 20.0% by weight based on the abrasive material, good polishing efficiency can be obtained regardless of the modifying component. In particular, it can be seen that an excellent effect is obtained in the range of 0.5 to 10.0% by weight. It can also be seen that when the amount added is small, the abrasive grains precipitate hard, and when the amount added is large, the polishing efficiency tends to decrease.
４、4,
第１図は、 改質成分の添加量と研磨能率との関 係を示すグラフである。 Figure 1 shows Relationship between the amount of modifying component added and polishing efficiency It is a graph showing the relationship.
Claims (1)
改質成分として、アルミン酸カルシウム、硫酸マグネシ
ウムおよび塩化マグネシウムからなる群より選ばれた少
なくとも１種を研磨材に対して０．１〜２０．０重量％
含有させてなることを特徴とする、ガラス研磨用研磨材
。 ２、前記研磨材が、液体に分散されてスラリーを構成し
ている、請求項１に記載のガラス研磨用研磨材。[Claims] 1. In an abrasive material containing zirconium oxide as a main component,
As a modifying component, at least one selected from the group consisting of calcium aluminate, magnesium sulfate, and magnesium chloride is contained in an amount of 0.1 to 20.0% by weight based on the abrasive material.
An abrasive for glass polishing, characterized by containing: 2. The abrasive material for glass polishing according to claim 1, wherein the abrasive material is dispersed in a liquid to form a slurry.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1285435A JP2783329B2 (en) | 1989-11-01 | 1989-11-01 | Abrasive for glass polishing |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1285435A JP2783329B2 (en) | 1989-11-01 | 1989-11-01 | Abrasive for glass polishing |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH03146584A true JPH03146584A (en) | 1991-06-21 |
| JP2783329B2 JP2783329B2 (en) | 1998-08-06 |
Family
ID=17691487
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1285435A Expired - Lifetime JP2783329B2 (en) | 1989-11-01 | 1989-11-01 | Abrasive for glass polishing |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2783329B2 (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1994002562A1 (en) * | 1992-07-28 | 1994-02-03 | Minnesota Mining And Manufacturing Company | Abrasive grain, method of making same and abrasive products |
| US5352254A (en) * | 1992-07-28 | 1994-10-04 | Minnesota Mining And Manufacturing Company | Abrasive grain, method of making same and abrasive products |
| JP2006525930A (en) * | 2003-05-20 | 2006-11-16 | アイトゲネシッシェ テヒニッシェ ホーホシューレ チューリッヒ | Metal supply system for nanoparticle production |
| CN100396750C (en) * | 2002-03-22 | 2008-06-25 | 三井金属鉱业株式会社 | Cerium-based abrasive material and method for preparation thereof |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5967999B2 (en) * | 2011-03-31 | 2016-08-10 | Hoya株式会社 | Manufacturing method of glass substrate for magnetic disk |
| SG188775A1 (en) | 2011-09-30 | 2013-04-30 | Hoya Corp | Manufacturing method of glass substrate for magnetic disk, magnetic disk, and magnetic data recording/reproducing device |
-
1989
- 1989-11-01 JP JP1285435A patent/JP2783329B2/en not_active Expired - Lifetime
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1994002562A1 (en) * | 1992-07-28 | 1994-02-03 | Minnesota Mining And Manufacturing Company | Abrasive grain, method of making same and abrasive products |
| US5352254A (en) * | 1992-07-28 | 1994-10-04 | Minnesota Mining And Manufacturing Company | Abrasive grain, method of making same and abrasive products |
| CN100396750C (en) * | 2002-03-22 | 2008-06-25 | 三井金属鉱业株式会社 | Cerium-based abrasive material and method for preparation thereof |
| JP2006525930A (en) * | 2003-05-20 | 2006-11-16 | アイトゲネシッシェ テヒニッシェ ホーホシューレ チューリッヒ | Metal supply system for nanoparticle production |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2783329B2 (en) | 1998-08-06 |
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