JPH03143398A - Production of epsilon-poly-l-lysine - Google Patents

Production of epsilon-poly-l-lysine

Info

Publication number
JPH03143398A
JPH03143398A JP27773890A JP27773890A JPH03143398A JP H03143398 A JPH03143398 A JP H03143398A JP 27773890 A JP27773890 A JP 27773890A JP 27773890 A JP27773890 A JP 27773890A JP H03143398 A JPH03143398 A JP H03143398A
Authority
JP
Japan
Prior art keywords
strain
cysteine
lysine
aminoethyl
medium
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP27773890A
Other languages
Japanese (ja)
Other versions
JPH0378998B2 (en
Inventor
Jun Hiraki
純 平木
Yutaka Morita
裕 森田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JNC Corp
Original Assignee
Chisso Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP61192157A external-priority patent/JPS6349075A/en
Application filed by Chisso Corp filed Critical Chisso Corp
Priority to JP27773890A priority Critical patent/JPH03143398A/en
Publication of JPH03143398A publication Critical patent/JPH03143398A/en
Publication of JPH0378998B2 publication Critical patent/JPH0378998B2/ja
Granted legal-status Critical Current

Links

Abstract

PURPOSE:To obtain the title compound useful as article for toiletry, cosmetic, food additive, etc., by varying a specific strain belonging to the genus Streptomyces into a variant having resistance to analog substance of L-lysine and culturing the variant in a medium. CONSTITUTION:Streptomyces albulus subsp. lysinopolymerus strain is varied into a variant [preferably variant 11011A-1 strain (FERM BP-1109) having resistance to glycine added to S-aminoethyl-L-cystine of Streptomyces albulus subsp. lysinopolymerus No346-D strain] having resistance to analog substance (preferably substance to which S-aminoethyl-L cystine is added) of L-lysine. The prepared variant is cultured in a medium and the objective compound is collected from the formed substance.

Description

【発明の詳細な説明】 (産業上の利用分野〉 本発明はイプシロン−ポリ−ルーリシン(以下εPLと
略記する)の製造方法に関する。
DETAILED DESCRIPTION OF THE INVENTION (Industrial Field of Application) The present invention relates to a method for producing epsilon-poly-luricin (hereinafter abbreviated as εPL).

(従来の技術とその問題点) εPLは以下の構造式で表されるよう番こ、Lリシンの
ε位のアごノ基が、隣り合うI、−リシンのカルボン酸
とアミド結合で結合した高分子化合物である。
(Prior art and its problems) As shown in the structural formula below, εPL is a compound in which the agono group at the ε position of L-lysine is bonded to the carboxylic acid of the adjacent I-lysine through an amide bond. It is a high molecular compound.

+1J”−(CHz) t−coco +NH(CH2
) 4−C)ICO+n0当該物質は必須アミノ酸であ
る■、−リシンのポリマーであるので安全性が高くかつ
カチオン含量が高いので特異な物性を有する。従って、
それらの性質を利用してトイレタリー用品、化粧品、飼
料添加物、医薬、農薬、食品添加物、電子材料等の用途
が期待できる。
+1J”-(CHz) t-coco +NH(CH2
) 4-C) ICO+n0 The substance is a polymer of the essential amino acids ■, -lysine, so it is highly safe, and has a high cation content, so it has unique physical properties. Therefore,
Utilizing these properties, it can be expected to be used in toiletry products, cosmetics, feed additives, medicines, agricultural chemicals, food additives, electronic materials, etc.

従来、当該物質はストレプトマイセス属に属するεPL
産生菌であるストレプトマイセス・アルプラス・サブス
ピーシーズ・リジノボリメラス(Streptomyc
es albulus 5ubsp、 lysinop
olymerus)陥、346−D株(微工研菌寄第3
834号)を培地に培養して、得られる培養物から分離
精製して得られている(特公昭59−20359号〉。
Conventionally, the substance was εPL belonging to the genus Streptomyces.
The producing bacterium, Streptomyces alplus subsp.
es albulus 5ubsp, lysinop
olymerus), 346-D strain (Feikoken Bacterial Serial No. 3
No. 834) in a medium, and the resulting culture is separated and purified (Japanese Patent Publication No. 59-20359).

しかし、この先願の菌株では培養液11当りせいぜい0
.5g程度のεPLの生産性しかなく、従って生産コス
トが高く、当該物質の広範な利用が妨げられていた。
However, with the strain of this previous application, at most 0 per 11 culture solutions.
.. The productivity of εPL was only about 5 g, and therefore the production cost was high, preventing the wide use of this substance.

本発明者らは、εPLを著量に生産する株を得、これを
用いてεPLを多量に製造することを目的として研究を
重ね、以下に述べる発明に到達した。
The present inventors obtained a strain that produces a significant amount of εPL, conducted repeated research with the aim of producing a large amount of εPL using this strain, and arrived at the invention described below.

(問題点を解決するための手段) 本発明はストレプトマイセス・アルプラス・サブスピー
シーズ・リジノボリメラス(S trep tomyc
esalbulus 5ubsp、 Iysinopo
lymerus)菌株をL−リジンのアナログ物質に耐
性を有する変異株に変異処理し、得られた該変異株を培
地に培養し、培養液中にイプシロン−ポリ−ルーリジン
を生成蓄積せしめ、これを採取することを特徴とする8
PLの製造方法である。
(Means for Solving the Problems) The present invention is directed to Streptomyces alplus subsp.
esalbulus 5ubsp, Iysinopo
lymerus) strain into a mutant strain that is resistant to L-lysine analog substances, the resulting mutant strain is cultured in a medium, and epsilon-poly-lymerus is produced and accumulated in the culture solution, which is collected. 8.
This is a method for manufacturing PL.

L−リシンのアナログ物質は、S−アミノエチル−L−
システィン、または、このS−ア多ノエチルーL−シス
ティンにI、−スレオニン、グリシン、L−ホモセリン
およびI、−メチオニンの中から選ばれる一種または数
種の物質を添加したものが好ましい。
An analog substance of L-lysine is S-aminoethyl-L-
Preferably, cysteine or this S-atanoethyl-L-cysteine is added with one or more substances selected from I,-threonine, glycine, L-homoserine, and I,-methionine.

変異株は、ストレプトマイセス・アルプラス・サブスピ
ーシーズ・リジノボリメラスN[L346−り株のS−
アミノエチル−L−システィンにグリシンを添加したも
のに耐性をもつ変異株11011A−1株(微工研条寄
第1109号)が好ましい。
The mutant strain is Streptomyces alplus subsp. rhizinovolimerus N [L346-ri strain S-
A mutant strain 11011A-1 (Kikoken Jokyo No. 1109) that is resistant to aminoethyl-L-cysteine with glycine added is preferred.

以下に本発明の詳細な説明する。The present invention will be explained in detail below.

先ず、本発明の菌株の取得方法を述べる。Lリジンのア
ナログ物質に耐性を有する変異株、例えばS−アξノエ
チルーL−システィンのml性変異株は、例えば以下の
方法で取得する。
First, the method for obtaining the bacterial strain of the present invention will be described. A mutant strain having resistance to an analog substance of L-lysine, for example, an S-ξnoethyl-L-cysteine ml mutant strain is obtained, for example, by the following method.

ストレプトマイセス・アルプラス・サブスピーシーズ・
リジノボリメラスN1346−D株の胞子をトリス−マ
レイン酸緩衝−?& (p H9,0)に懸濁し、これ
にN−メチル−N−ニトロ−No −二トロソグアニジ
ンを添加する。
Streptomyces alplus subsp.
Tris-maleate buffered spores of Lysinovolimelas strain N1346-D? & (pH 9,0) and to this is added N-methyl-N-nitro-No-nitrosoguanidine.

これを振とう後、遠心分離機により胞子を集め、滅菌水
で洗浄し、培地に接種し、振とう培養して菌を生育させ
る。菌を含む培地(以下、培養液という)を希釈する。
After shaking this, the spores are collected using a centrifuge, washed with sterile water, inoculated into a medium, and cultured with shaking to grow the bacteria. Dilute the culture medium containing bacteria (hereinafter referred to as culture solution).

次に、S−アミノエチル−Lシスティン、あるいはこれ
にグリシン、I4−スレオニン、L−ホモセリン、L−
メチオニンのアミノ酸類から一種あるいは数種を選んで
前記培地と同じ組成の寒天培地に添加する。
Next, S-aminoethyl-L cysteine, or glycine, I4-threonine, L-homoserine, L-
One or more methionine amino acids are selected and added to an agar medium having the same composition as the above medium.

その際、寒天培地1 rd当り0.5〜10mg、好ま
しくは2mgの濃度になるようにS−ア多ノエチルL−
システィン、または同じ濃度になるようにSア〈ノエチ
ルーL−システィンと寒天培地1 ml当り0.2〜5
mg、好ましくは1mgの濃度になるように前記ア逅ノ
酸頻を加えたものを用いる。この寒天培地に、先の培養
希釈液を塗布する。この寒天ftf地を保温した後、:
!口二一として生育した菌株がS−アミノエチル−L−
システィン耐性変異株である。このとき、S−アミノエ
チル−■、−システィンのみを添加した寒天培地で生育
した菌株が耐性変異株81512株であり、S−アミノ
エチル−L−システィンにグリシンを添加した寒天培地
に生育した菌株が耐性変異株11011A1株(微工研
条寄第1109号)であり、さらに、S−アミノエチル
−L−システィンにL−スレオニンを添加した寒天培地
で生育した菌株が耐性変異株81502株である。
At that time, S-atanoethyl L-
Cystine, or SA〈noethyl-L-cysteine and agar medium 0.2 to 5 per ml to the same concentration.
The above-mentioned amine acid is added to a concentration of 1 mg, preferably 1 mg. The above culture dilution solution is applied to this agar medium. After keeping this agar ftf fabric warm:
! The strain grown as Kuchi Niichi is S-aminoethyl-L-
It is a cysteine-resistant mutant strain. At this time, the strain grown on the agar medium to which only S-aminoethyl-■,-cysteine was added was the resistant mutant strain 81512, and the strain grown on the agar medium to which glycine was added to S-aminoethyl-L-cysteine. is the resistant mutant strain 11011A1 (Feikoken Jokyo No. 1109), and the strain grown on an agar medium containing S-aminoethyl-L-cysteine and L-threonine is the resistant mutant strain 81502. .

また、プラスミド増幅性変異株は、例えば以下の方法で
取得する。ストレプトマイセス・アルプラス・サブスピ
ーシーズ・リジノボリメラス隘346−D株あるいは、
S−アミノエチル−L−システィン耐性変異株を培地に
接種し、振とう培養した後にクロラムフェニコールを添
加し、培養を続ける。遠心分離して菌体を集め、洗浄し
た後、寒天培地に菌を塗布する。静置培養した後、ブド
ウ球菌(Staphylococcus aureus
)を含む普通寒天培地を重筋し、さらに量合養し生成し
たブドウ球菌の生育阻止円の大きな株が、目的のブラズ
ξF増幅性cPL高生産株、すなわち、プラスごド増幅
性変異株50833株(微工研条寄第111O号)であ
る。これらの変異株のうち、lloIIAl株および5
0833株の菌学的性質を示すと次の通りである。
Moreover, a plasmid amplifiable mutant strain is obtained, for example, by the following method. Streptomyces alplus subsp. rhizinobolimelas strain 346-D, or
After the S-aminoethyl-L-cysteine resistant mutant strain is inoculated into a medium and cultured with shaking, chloramphenicol is added and the culture is continued. The bacteria are collected by centrifugation, washed, and then spread on an agar medium. After static culture, Staphylococcus aureus
), and the strain with a large staphylococcal growth inhibition zone is the target strain that produces high ξF-amplifying cPL, that is, the positive-amplifying mutant strain 50833. Stock (Feikoken Joyori No. 111O). Among these mutant strains, lloIIAl strain and 5
The mycological properties of strain 0833 are as follows.

(1)形態学的性質 シュークロース・硝酸塩寒天培地上で30℃、10日間
生育した11011A−1株および50833株の気菌
糸および基生菌糸を顕微鏡で観察した結果を次に示す。
(1) Morphological properties The results of microscopic observation of the aerial and basal hyphae of the 11011A-1 strain and the 50833 strain grown on a sucrose/nitrate agar medium at 30°C for 10 days are shown below.

■ 胞子猛威菌糸の分枝法および形態:単純分枝、閉鎖
らせん状(closed 5pira+)■ 胞子の数
二 数十個 ■ 胞子の表面構造および大きさ: 胞子は円ないし楕円形で大きさは約1.2〜1.5μで
あり、その表面構造はスバイニ(Spiny)である。
■ Branching method and morphology of spore-prone hyphae: simple branching, closed spiral (closed 5 pira+) ■ Number of spores: two to several dozen ■ Surface structure and size of spores: Spores are circular or oval in shape, and the size is approx. 1.2 to 1.5μ, and its surface structure is Spiny.

■ 鞭毛胞子、菌核および胞子のうの有無存在が認めら
れない。
■ The presence or absence of flagellated spores, sclerotia, and sporangia is not observed.

■ 胞子柄の着生位置: 気菌糸」二 (2)各種培地上における生育状態 下記の各種培地上における性状はそれぞれ30℃で10
〜14日間培養後の観察結果である。
■ Spore stalk settlement position: Aerial mycelium 2 (2) Growth status on various media The properties on the following various media are 10% at 30°C.
These are the observation results after culturing for ~14 days.

口) 50833株(微工研条寄第1 0号) 生理的性質 1011A 1株および50833株の生理 的性質は次の通りである。mouth) 50833 stocks (Feikoken Joyori 1st No. 0) physiological properties 1011A Physiology of 1 strain and 50833 strain The properties are as follows.

■ 生育温度範囲 約15〜40℃。■ Growth temperature range Approximately 15-40℃.

生育最適温度: 30’C付近。Optimum temperature for growth: Around 30'C.

■ ゼラチンの液化、でん粉の加水分解および脱脂牛乳
のペプトン化; すべて陽性 ■ 脱脂牛乳の凝固: 陰性 ■ メラニン様色素の生成 チロシン寒天培地上では褐色の色素を生成する。
■ Liquefaction of gelatin, hydrolysis of starch and peptonization of skimmed milk; all positive ■ Coagulation of skimmed milk: negative ■ Formation of melanin-like pigment On tyrosine agar medium, brown pigment is produced.

■ 細胞壁組成 細胞壁組!y、戒分中のジアミノピメリン酸の型につい
てベラカー(Becker)らの方法〔アプライド・マ
イクロバイオロジー第13巻第236頁(1965年)
参照〕により分析した結果、L、  L型であった。
■ Cell wall composition Cell wall composition! Regarding the type of diaminopimelic acid in y, the method of Becker et al. [Applied Microbiology Vol. 13, p. 236 (1965)
As a result of the analysis conducted by [Reference], it was found to be type L.

(4)各種炭素源の同化性(ブリドハム・ゴツトリーブ
寒天培地上〉 L−アラビノース D−キシロース D−グルコース        + D−フラクトース       + L−ラムノース D−ガラクトース       + シュークロース ラフィノース D−マンニトール       + iミーイノシトール      −1 サリシン 註〉+;同化する、 −二同化しない。
(4) Assimilation of various carbon sources (on Bridham-Gottlieb agar medium) L-arabinose D-xylose D-glucose + D-fructose + L-rhamnose D-galactose + sucrose raffinose D-mannitol + i-inositol -1 Salicin's Note〉+;Assimilate, -do not assimilate.

以上記述したように、変異株の菌学的性質は原菌株であ
るストジブI・マイセス・アルプラス・サブスピーシー
ズ・リジノボリメラスfk346−D株の菌学的性質と
類似している。
As described above, the mycological properties of the mutant strain are similar to those of the original strain, Stojib I. Myces alplus subsp. rhizinovolimerus fk346-D.

次にこれらの方法で得られた変異株を用いて本発明方法
によりεPLを製造する。なお、文中の%は特に記さな
いかぎり重量(g)/容量(mffi)%を示す。
Next, εPL is produced by the method of the present invention using the mutant strains obtained by these methods. Note that % in the text indicates weight (g)/volume (mffi)% unless otherwise specified.

まず、得られた変異株を培地に接種して培養し、培養液
から生成蓄積したεPLを分離・精製する。
First, the obtained mutant strain is inoculated into a medium and cultured, and the produced and accumulated εPL is separated and purified from the culture solution.

培地は炭素源、窒素源、無機塩、ビタミンが含まれてい
れば、いかなるものでもよいが、好ましくは炭素源とし
てブドウ@5%、あるいはグリセリン5%を含み、窒素
源として硫酸アンモニウム、■ あるいはL−リシンあるいはペプトンを含むものが良い
。培養途中で炭素源、窒素源を逐次添加してもよい。p
)lは培養初期はpH4,0になるまで下がるにまかせ
、その後水酸化ナトリウム水溶液等のアルカリでpH4
,0を維持するようにしても良い。培養液から遠心分離
機あるいはフィルターで菌体を除いた後、濾過液を精製
・脱色し、これを濃縮する。濃縮液からアセトン、エタ
ノール等の有機溶媒でεPLを晶析する。
The medium may be any medium as long as it contains a carbon source, a nitrogen source, inorganic salts, and vitamins, but preferably contains grapes @ 5% or glycerin 5% as a carbon source, and ammonium sulfate, ■ or L as a nitrogen source. -It is better to use lysine or peptone. A carbon source and a nitrogen source may be added sequentially during the cultivation. p
)L is allowed to drop to pH 4.0 at the initial stage of culture, and then raised to pH 4 with an alkali such as sodium hydroxide aqueous solution.
, 0 may be maintained. After removing bacterial cells from the culture solution using a centrifuge or filter, the filtrate is purified and decolorized, and then concentrated. εPL is crystallized from the concentrated solution using an organic solvent such as acetone or ethanol.

(発明の効果) 本発明によれば、ストレプトマイセス・アルプラス・サ
ブスピーシーズ・リジノボリメラス菌株をL−リシンの
アナログ物質に耐性を有する変異株に変異処理し、該変
異株を培養することによって公知の菌株を用いるよりも
、生産性が改良され著量にεPLを産生ずることができ
るので、εPLの生産コストを従来に比べて大幅に引き
下げることができる。
(Effects of the Invention) According to the present invention, a Streptomyces alplus subsp. lysinovolimeras strain is mutated into a mutant strain having resistance to an analog substance of L-lysine, and the mutant strain is cultured. Since the productivity is improved and a significant amount of εPL can be produced than using the same strain, the production cost of εPL can be significantly reduced compared to the conventional method.

(実施例〉 以下、本発明を実施例につき詳細に述べる。(Example> Hereinafter, the present invention will be described in detail with reference to examples.

実施例I S−ア多ノエチルーL−システィン耐性株の取得: ストレプトマイセス・アルプラス・ザブスピーシーズ・
リジノボリメラス(Streptomyces alb
ulus 5ubsp、 lysinopolymer
us) t’h 346− D株の胞子l白金耳量をト
リス−マレイン酸緩衝液(p H9,0)5mlに懸濁
し、これにN−メチル−N−ニド0−N” −ニトロソ
グアニジンを1.5nw/m#の濃度になるように添加
した。これを、30分間、30℃で振とうした後、遠心
分離機により胞子を集め、滅菌水で洗浄し、ブドウI7
!5%、硫酸アンモニウム1%、酵母エキス0.5%、
リン酸二水素−カリウム・7水塩0.136%、リン酸
−水素二ナトリウム・12水塩0.158%、硫酸マグ
ネシウム・7水塩0.05%、硫酸亜鉛・7水塩0.0
04%、硫酸第一鉄・7水塩0.003%、pH6,8
の培地(以下第1培地と呼ぶ)5mA!に接種し、−昼
夜30℃で振とう培養し、菌を生育させた。
Example I Obtaining a S-atanoethyl-L-cysteine resistant strain: Streptomyces alplus xabsp.
Streptomyces alb
ulus 5ubsp, lysinopolymer
A platinum loop of spores of the t'h 346-D strain was suspended in 5 ml of Tris-maleic acid buffer (pH 9,0), and N-methyl-N-nido0-N''-nitrosoguanidine was added to this. The spores were added to a concentration of 1.5 nw/m#. After shaking at 30°C for 30 minutes, the spores were collected using a centrifuge and washed with sterile water.
! 5%, ammonium sulfate 1%, yeast extract 0.5%,
Potassium dihydrogen phosphate heptahydrate 0.136%, disodium hydrogen phosphate heptahydrate 0.158%, magnesium sulfate heptahydrate 0.05%, zinc sulfate heptahydrate 0.0
04%, ferrous sulfate heptahydrate 0.003%, pH 6.8
medium (hereinafter referred to as the first medium) 5mA! The bacteria were inoculated and cultured with shaking at 30°C day and night to grow the bacteria.

その培養液をMS溶液(I戒は硫酸マグネシラム・7水
塩0.05%、塩化ナトリウム0.5%、ツイーン80
0.05%)で500倍に希釈する。次いで、この希釈
培養液を、寒天培地1 ml当り2にの濃度になるよう
にS−アミノエチル−L−システィン、またはこの濃度
になるようにS−アミノエチルし一システィンおよび寒
天培地l ml当り1■の濃度になるようにグリシンま
たはL−スレオニンを添加した前述の第1培地と同じ組
成の寒天培地に塗布した。この寒天培地を、30’Cで
48時間保温し、コロニーとして生育させ、S−アミノ
エチル−Lシスティン耐性変異株を得た。
The culture solution was mixed with MS solution (I precept is magnesium sulfate heptahydrate 0.05%, sodium chloride 0.5%, Tween 80
0.05%) and dilute 500 times. Next, this diluted culture solution was mixed with S-aminoethyl-L-cysteine at a concentration of 2 per ml of agar medium, or S-aminoethyl-L-cysteine at a concentration of 2 per ml of agar medium and 1 cysteine per ml of agar medium. The mixture was coated on an agar medium having the same composition as the first medium described above, to which glycine or L-threonine was added at a concentration of 1. This agar medium was incubated at 30'C for 48 hours to grow as a colony to obtain an S-aminoethyl-L cysteine resistant mutant strain.

このうち、S−ア逅ノエチルーL−システィンのみ添加
した寒天培地中の1株が81512株である。S−アミ
ノエチル−L−システィンにグリシンを添加した寒天培
地中の1株が1101.1 A1株(微工研条寄第11
09号)である。Sアミノエチル−L−システィンに■
、−スレオニンを添加した寒天培地中の1株が8150
2株である。
Among these, one strain, strain 81512, is in the agar medium to which only S-A-adinoethyl-L-cysteine has been added. One strain in the agar medium containing S-aminoethyl-L-cysteine and glycine was 1101.1 A1 strain (Feikokenjoyori No. 11).
No. 09). ■ To S-aminoethyl-L-cysteine
, - one strain in an agar medium supplemented with threonine is 8150
There are 2 stocks.

εP Lの生産: 前記第1培地と同し組成の培地5−にS−アミノエチル
−L−システィン耐性株81512株を1白金耳量接種
し、30℃で8日間振とう培養した。培養終了後、培養
液中のεPLの濃度をイツアキ(rtzhaki)の方
法で測定した。
Production of εPL: One platinum loop of S-aminoethyl-L-cysteine resistant strain 81512 was inoculated into medium 5-, which had the same composition as the first medium, and cultured with shaking at 30°C for 8 days. After completion of the culture, the concentration of εPL in the culture solution was measured by the method of Rtzhaki.

その結果を表1に示す。The results are shown in Table 1.

実施例2および3 S−アミノエチル−L−システィン耐性変異株8151
2株の代わりに、S−ア尖ノエチルーLシスティン→−
グリシン耐性変異株1 ]、 Ol ]、 A1株(微
工研条寄第1109号)(実施例2)、S〜75ノエチ
ル−し一システィン+L−スレオニン耐性変異株815
02株(実施例3)を用いた以外は、実施例1と同様の
方法で培養し、cl)Lの濃度を同様の方法で測定した
Examples 2 and 3 S-aminoethyl-L-cysteine resistant mutant strain 8151
Instead of 2 stocks, S-Apical noethyl-L cysteine →-
Glycine-resistant mutant strain 1], Ol], A1 strain (Feikoken Jokyo No. 1109) (Example 2), S~75 Noethyl-cysteine + L-threonine-resistant mutant strain 815
The cells were cultured in the same manner as in Example 1, except that the 02 strain (Example 3) was used, and the concentration of cl)L was measured in the same manner.

その結果を表1に示す。The results are shown in Table 1.

実施例4 プラスごド増幅性変異株の取得: 実施例1で得られたS−ア飽ノエチルーL−システィン
耐性変異株を、実施例1に記載した第1培地と同し組成
の培地5 mlに接種する。
Example 4 Obtaining a positive amplification mutant strain: The S-A-saturated-L-cysteine resistant mutant strain obtained in Example 1 was added to 5 ml of a medium having the same composition as the first medium described in Example 1. to be inoculated.

これを30℃2日間振とう培養した後に、クロラムフェ
ニコールを培養液11V当り50から500■、好まし
くは100■の濃度になるように添加し、さらに5から
10時間好ましくは8時間培養を続ける。
After culturing this with shaking at 30°C for 2 days, chloramphenicol was added at a concentration of 50 to 500, preferably 100, per 11 V of the culture solution, and the culture was continued for an additional 5 to 10 hours, preferably 8 hours. continue.

遠心分離して菌体を集め、滅菌水あるいは生理食塩水で
洗浄した後、第1培地と同し1IJ1戒の培地に寒天1
.7%を加えた寒天培地に菌を塗布する。
After centrifuging and collecting the bacterial cells and washing them with sterile water or physiological saline, add 1 part of agar to the same 1 IJ 1 medium as the first medium.
.. Bacteria are spread on an agar medium supplemented with 7%.

8日間30℃で静置培養した後、ブドウ球菌(Stap
hylococcus aureus)を含む普通寒天
培地を重層し、さらに1夜培養し生成したブドウ球菌の
生育阻止円の大きな株がプラスミド増幅性εPT、高生
産株である。この中の1株が、50833株(微工研条
寄第1110号)である。
After static culture at 30°C for 8 days, Staphylococcus (Stap
hylococcus aureus) and cultured overnight, the strain with a large staphylococcal growth inhibition zone is a plasmid-amplifiable εPT, high-producing strain. One of these strains is strain 50833 (Feikoken Joyori No. 1110).

εPLの生産: 得られたプラス多ド増幅性変異株50833株を用いた
以外は、実施例1と同様の方法で培養し、εPLの濃度
も同様の方法で測定した。
Production of εPL: Cultivation was performed in the same manner as in Example 1, except that the obtained plus multidomain amplification mutant strain 50833 was used, and the concentration of εPL was measured in the same manner.

その結果を表1に示す。The results are shown in Table 1.

比較例1 S−アごノエチルーL−システィン耐性変異株8151
2株の代わりに、ストレプトマイセス・アルプラス・サ
ブスピーシーズ・リジノポリメラスNa346−D株を
用いた以外は、実施例Iと同様の方法で培養し、εPL
の濃度を同様の方法で測定した。
Comparative Example 1 S-agonoethyl-L-cysteine resistant mutant strain 8151
εPL
The concentration of was measured in a similar manner.

その結果を表1に示す。The results are shown in Table 1.

表1 番号   εPL生産性 実施例1    0.67 2    0.88 3    0.72 4    1.80 比較例1    0.20 (g/ e ) 実施例5 実施例1に記載した第1培地と同じ組成の培地1.51
に0.05容量%のポリオキシアルキレングリコール誘
導体消泡剤を加え、S−ア旦ノエチルL−システィン耐
性変異株11011A−1株を前培養した培養液50m
j!を接種し、600rpm 、通気量26/a+in
、、30℃で培養した。
Table 1 Number εPL Productivity Example 1 0.67 2 0.88 3 0.72 4 1.80 Comparative Example 1 0.20 (g/e) Example 5 Same composition as the first medium described in Example 1 Medium 1.51
0.05% by volume of a polyoxyalkylene glycol derivative antifoaming agent was added to 50 m of a culture solution prepared by pre-cultivating the S-adenoethyl L-cysteine resistant mutant strain 11011A-1.
j! inoculated, 600 rpm, air flow rate 26/a+in.
, cultured at 30°C.

24時間後に、ブドウ糖5%、硫酸アンモニウム1%を
無菌的に添加した。p H低下後、p Hが4.0以下
にならないように6N水酸化す1〜リウムをp)(コン
トローラーで自動的に連続制御しながら加えた。培養後
、遠心分離機で菌体を除去し培養液中のεPLをアニオ
ン交換樹脂IRA−402、カチオン交換樹脂IRC−
50、活性炭カルポラフィン50wで精製して表2に示
す結果を得た。
After 24 hours, 5% glucose and 1% ammonium sulfate were added aseptically. After the pH was lowered, 6N sodium hydroxide was added to prevent the pH from falling below 4.0 (with automatic and continuous control using the controller). After culturing, remove the bacterial cells using a centrifuge. εPL in the culture solution was treated with anion exchange resin IRA-402 and cation exchange resin IRC-
50 and purified with activated carbon Carporafine 50w to obtain the results shown in Table 2.

比較例2 S−アミノエチル−L−システィン耐性変異株1101
1A−1株の代わりに、ストレプトマイセス・アルプラ
ス・サブスピーシーズ・リジノボリメラスNCl346
−D株を用いた以外は実施例5と同様の方法で培養し、
同様に精製して表2に示す結果を得た。
Comparative Example 2 S-aminoethyl-L-cysteine resistant mutant strain 1101
1A-1 strain, Streptomyces alplus subsp. rhizinovolimerus NCl346
- Cultured in the same manner as in Example 5 except for using the D strain,
The product was purified in the same manner and the results shown in Table 2 were obtained.

表2 番号    収N (g)  純度(%)実施例5  
4..77  99.9 比較例2  0.56  97.8
Table 2 Number Yield N (g) Purity (%) Example 5
4. .. 77 99.9 Comparative example 2 0.56 97.8

Claims (3)

【特許請求の範囲】[Claims] (1)ストレプトマイセス・アルブラス・サブスピーシ
ーズ・リジノポリメラス(Streptomycesa
lbulussubsp.lysinopolymer
us)菌株をL−リシンのアナログ物質に耐性を有する
変異株に変異処理し、得られた該変異株を培地に培養し
、培養液中にイプシロン−ポリ−L−リシンを生成蓄積
せしめ、これを採取することを特徴とするイプシロン−
ポリ−L−リシンの製造方法。
(1) Streptomyces albulus subsp. lysinopolymerus (Streptomyces
lbulussubsp. lysinopolymers
us) A bacterial strain is mutated into a mutant strain that is resistant to an analog substance of L-lysine, the resulting mutant strain is cultured in a medium, and epsilon-poly-L-lysine is produced and accumulated in the culture medium. Epsilon, which is characterized by collecting
Method for producing poly-L-lysine.
(2)L−リシンのアナログ物質が、S−アミノエチル
−L−システイン、または、このS−アミノエチル−L
−システインにL−スレオニン、グリシン、L−ホモセ
リン、およびL−メチオニンの中から選ばれる一種また
は二種以上の物質を添加したものである特許請求の範囲
第1項記載の製造方法。
(2) The analog substance of L-lysine is S-aminoethyl-L-cysteine or this S-aminoethyl-L-cysteine.
- The manufacturing method according to claim 1, wherein one or more substances selected from L-threonine, glycine, L-homoserine, and L-methionine are added to cysteine.
(3)変異株が、ストレプトマイセス・アルブラス・サ
ブスピーシーズ・リジノポリメラス(Streptom
ycesalbulussubsp.lysinopo
lymerus)No.346−D株のS−アミノエチ
ル−L−システインにグリシンを添加したものに耐性を
持つ変異株11011A−1株(微工研条寄第1109
号)である特許請求の範囲第1項記載の製造方法。
(3) The mutant strain is Streptomyces albulus subsp.
ycesalbulussubsp. lysinopo
lymerus) No. 11011A-1 strain, a mutant strain resistant to glycine added to S-aminoethyl-L-cysteine of strain 346-D (Feikoken Joyori No. 1109)
2. The manufacturing method according to claim 1, which is
JP27773890A 1986-08-19 1990-10-18 Production of epsilon-poly-l-lysine Granted JPH03143398A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP27773890A JPH03143398A (en) 1986-08-19 1990-10-18 Production of epsilon-poly-l-lysine

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP61192157A JPS6349075A (en) 1986-08-19 1986-08-19 Microbial strain capable of producing large amount of epsilon-poly-l-lysine and use of said strain
JP27773890A JPH03143398A (en) 1986-08-19 1990-10-18 Production of epsilon-poly-l-lysine

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP61192157A Division JPS6349075A (en) 1986-08-19 1986-08-19 Microbial strain capable of producing large amount of epsilon-poly-l-lysine and use of said strain

Publications (2)

Publication Number Publication Date
JPH03143398A true JPH03143398A (en) 1991-06-18
JPH0378998B2 JPH0378998B2 (en) 1991-12-17

Family

ID=26507143

Family Applications (1)

Application Number Title Priority Date Filing Date
JP27773890A Granted JPH03143398A (en) 1986-08-19 1990-10-18 Production of epsilon-poly-l-lysine

Country Status (1)

Country Link
JP (1) JPH03143398A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002330797A (en) * 2001-05-08 2002-11-19 Chisso Corp METHOD FOR PRODUCING epsi-POLY-L-LYSINE
JP2006028408A (en) * 2004-07-20 2006-02-02 Okayama Prefecture Epsilon-poly-l-lysine-alcoholic ester and method for producing the same
JP2010279283A (en) * 2009-06-04 2010-12-16 Kao Corp Highly alkali protease-producing microorganism

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002330797A (en) * 2001-05-08 2002-11-19 Chisso Corp METHOD FOR PRODUCING epsi-POLY-L-LYSINE
JP2006028408A (en) * 2004-07-20 2006-02-02 Okayama Prefecture Epsilon-poly-l-lysine-alcoholic ester and method for producing the same
JP2010279283A (en) * 2009-06-04 2010-12-16 Kao Corp Highly alkali protease-producing microorganism

Also Published As

Publication number Publication date
JPH0378998B2 (en) 1991-12-17

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