JPH0314049Y2 - - Google Patents
Info
- Publication number
- JPH0314049Y2 JPH0314049Y2 JP1987146578U JP14657887U JPH0314049Y2 JP H0314049 Y2 JPH0314049 Y2 JP H0314049Y2 JP 1987146578 U JP1987146578 U JP 1987146578U JP 14657887 U JP14657887 U JP 14657887U JP H0314049 Y2 JPH0314049 Y2 JP H0314049Y2
- Authority
- JP
- Japan
- Prior art keywords
- adhesive
- ultraviolet
- pellets
- semiconductor
- inert gas
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000000853 adhesive Substances 0.000 claims description 35
- 230000001070 adhesive effect Effects 0.000 claims description 35
- 239000011261 inert gas Substances 0.000 claims description 12
- 239000012790 adhesive layer Substances 0.000 claims description 7
- 239000010410 layer Substances 0.000 claims description 4
- 230000001678 irradiating effect Effects 0.000 claims description 2
- 239000008188 pellet Substances 0.000 description 25
- 239000004065 semiconductor Substances 0.000 description 21
- 239000007789 gas Substances 0.000 description 5
- 230000007423 decrease Effects 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 238000009281 ultraviolet germicidal irradiation Methods 0.000 description 3
- 238000007796 conventional method Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 1
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
Description
【考案の詳細な説明】
産業上の利用分野
本考案は紫外線硬化型接着剤に紫外線を照射し
て硬化させる紫外線照射装置に関する。[Detailed Description of the Invention] Industrial Application Field The present invention relates to an ultraviolet irradiation device that irradiates ultraviolet rays to cure an ultraviolet curable adhesive.
従来の技術
半導体装置の製造過程で、半導体ウエハ内に多
数個一括形成した半導体素子を個々の素子領域毎
に分割した得た半導体ペレツトが用いられる。2. Description of the Related Art In the process of manufacturing semiconductor devices, semiconductor pellets obtained by dividing a large number of semiconductor elements formed on a semiconductor wafer into individual element regions are used.
この分割作業は第5図に示すように粘着層を形
成した塩化ビニル等の可撓性シート1に半導体ウ
エハ2を貼り付け、半導体素子の区画部をダイシ
ングソウなどを用いて切断し、個々の半導体ペレ
ツトに分割する。次にこのシート1をリング状フ
レーム(図示せず)に取り付け、シート1を延伸
して、半導体ペレツト間を拡げ半導体ペレツトの
取り出しを容易にする。この状態で半導体ペレツ
トをマウント工程に供給し、個々のペレツトがシ
ートから取り出され、リードフレーム等の基板に
供給される。このペレツトの取り出しには一般的
に真空吸着コレレツトが用いられるが、粘着性が
強いとシートからの引き剥りがうまくゆかず、生
産性が低下するという問題があるため、種々の対
策が実施されている。 As shown in FIG. 5, this dividing operation involves attaching a semiconductor wafer 2 to a flexible sheet 1 made of vinyl chloride or the like on which an adhesive layer is formed, cutting the partitioned parts of the semiconductor elements using a dicing saw, etc. Split into semiconductor pellets. Next, this sheet 1 is attached to a ring-shaped frame (not shown), and the sheet 1 is stretched to widen the space between the semiconductor pellets and facilitate the removal of the semiconductor pellets. In this state, the semiconductor pellets are supplied to a mounting process, and individual pellets are taken out from the sheet and supplied to a substrate such as a lead frame. Vacuum suction collectors are generally used to remove these pellets, but if the pellets are too sticky, it will be difficult to peel them off from the sheet, reducing productivity, so various countermeasures have been taken. ing.
その一つの方法として粘着層として紫外線硬化
型接着剤を用いた方法がある。紫外線硬化型接着
剤は紫外線照射状態では接着力が強く、従つてペ
レツト分割作業やリング状フレームへの取付作業
時にペレツトがワークから剥落することがなく、
紫外線照射後は接着剤が硬化すると共に接着力が
急激に低下するためペレツトの取り出しが容易で
ある。 One method is to use an ultraviolet curing adhesive as an adhesive layer. Ultraviolet curing adhesive has strong adhesion when exposed to ultraviolet light, so pellets do not fall off from the workpiece when dividing pellets or attaching them to a ring-shaped frame.
After irradiation with ultraviolet rays, the adhesive hardens and its adhesive strength rapidly decreases, making it easy to remove the pellets.
考案が解決しようとする問題点
しかしながら、紫外線硬化型接着剤を用いたシ
ートは硬化後の接着力にばらつきがあり、半導体
ペレツトの取り出しに失敗することがあり、シー
ト裏面から取り出し予定の半導体ペレツトを針に
て突き上げ剥離を補助する付加装置が必要であつ
た。Problems that the invention aims to solve: However, sheets using ultraviolet curable adhesives have uneven adhesive strength after curing, which can lead to failures in removing semiconductor pellets from the back of the sheet. An additional device was required to assist in pushing up and peeling off with a needle.
問題点を解決するための手段
本考案は、上記問題点に鑑み提案されたもの
で、一方の面に紫外線硬化型接着剤の層を介して
多数のワークを互いに離隔しワーク間に接着剤層
を露呈させて貼り付けた透明部材のワーク貼付け
面を覆いかつワークと対向して多数の不活性ガス
吐出口を開口したカバーと、透明部材の他の面側
に配置され接着剤層に紫外線を照射し硬化させる
紫外線ランプとを具備したことを特徴とする。Means for Solving the Problems The present invention was proposed in view of the above-mentioned problems, and involves separating a number of workpieces from each other with a layer of ultraviolet curing adhesive on one side, and layering an adhesive layer between the workpieces. A cover is placed on the other side of the transparent member to cover the surface of the transparent member to which the work is attached, and which has a number of inert gas discharge ports facing the work. It is characterized by comprising an ultraviolet lamp for irradiating and curing.
作 用
ワークの配列間隔が微小であつてもワークと対
向した不活性ガス吐出口から吐出されたガスがワ
ーク間の空気を追い出して不活性ガスを充満し、
カバーによつて囲まれた内部を与圧状態に保ち外
気を完全に遮断し、紫外線照射による接着剤の硬
化を良好にできる。Effect Even if the distance between the workpieces is small, the gas discharged from the inert gas outlet facing the workpieces will drive out the air between the workpieces and fill the workpieces with inert gas.
The interior surrounded by the cover is kept in a pressurized state, completely blocking outside air, and the adhesive can be cured well by ultraviolet irradiation.
実施例
以下に本考案の実施例を第1図から説明する。
図において、3は透明シート(透明部材)で、上
記に紫外線硬化型接着剤4(例えば商品名UE−
10:日東電工製)の層が形成され、半導体ペレツ
ト(ワーク)5が整列状態で貼り付けられてい
る。この半導体ペレツト5は透明シート3に貼着
した半導体ウエハをダイシング法あるいはスクラ
イブ法により個々のペレツトに分割した後に、透
明シート3を放射方向に延伸して取り出し易いよ
うに間隔をあけている。6は透明シート3の周縁
部を保持したリング状のフレームを示す。7は紫
外線ランプ8を収容したハウジングで、上面に開
口部7aを設けている。9は紫外線ランプ8と開
口部7a間に配置されたシヤツタで、開口部7a
を覆うように配置された透明部材3への紫外線照
射時間を制御する。10は開口部7a上に配置さ
れた不活性ガスN2供給用ノズル(不活性ガス吐
出口)で、半導体ペレツト5と対向し、カバー1
2で囲み、このカバー12によつて半導体ペレツ
ト5の貼付け面を覆つている。Embodiment An embodiment of the present invention will be described below with reference to FIG.
In the figure, 3 is a transparent sheet (transparent member), and an ultraviolet curing adhesive 4 (for example, the product name UE-
10: Nitto Denko) layer is formed, and semiconductor pellets (work) 5 are pasted in an aligned state. The semiconductor pellets 5 are obtained by dividing a semiconductor wafer attached to a transparent sheet 3 into individual pellets by dicing or scribing, and then stretching the transparent sheet 3 in the radial direction to leave intervals so that they can be easily taken out. Reference numeral 6 indicates a ring-shaped frame that holds the peripheral edge of the transparent sheet 3. A housing 7 houses an ultraviolet lamp 8, and has an opening 7a on its top surface. 9 is a shutter placed between the ultraviolet lamp 8 and the opening 7a;
The ultraviolet irradiation time to the transparent member 3 arranged so as to cover is controlled. Reference numeral 10 denotes an inert gas N 2 supply nozzle (inert gas discharge port) disposed above the opening 7a, facing the semiconductor pellet 5, and facing the cover 1.
2, and this cover 12 covers the surface to which the semiconductor pellet 5 is attached.
以下、この動作を説明する。先ずシヤツタ9を
閉じ、開口部7aの上に透明シート3を配置す
る。次に、ノズル10より窒素ガス等の不活性ガ
スを吹きつけ、半導体ペレツト間の空気を追い出
しつつ、シヤツタ9を開き、透明シート3を介し
て紫外線硬化型接着剤4に紫外線を一定時間照射
する。 This operation will be explained below. First, the shutter 9 is closed and the transparent sheet 3 is placed over the opening 7a. Next, an inert gas such as nitrogen gas is blown from the nozzle 10 to expel the air between the semiconductor pellets, and the shutter 9 is opened to irradiate the ultraviolet curing adhesive 4 with ultraviolet rays for a certain period of time through the transparent sheet 3. .
半導体ペレツト5は厚さが例えば350μ〜500μ
に対してダイシング溝は数10μmであるため、ダ
イシング溝部分は巾が狭くかつ深い谷が形成さ
れ、外部から溝に対して斜めに不活性ガスを吹き
付けても谷の開口部で渦流ができ、ガスが溝の内
部まで十分に入らず、吹き付けガスが外気を巻き
込むと溝の底部、即ち接着剤層の露出部を外気か
ら完全に遮断することはできない。 The thickness of the semiconductor pellet 5 is, for example, 350μ to 500μ.
On the other hand, the dicing groove is several tens of micrometers wide, so the width of the dicing groove is narrow and deep valleys are formed, and even if inert gas is blown diagonally against the groove from the outside, a vortex is created at the opening of the valley. If the gas does not enter the groove sufficiently and the blown gas entrains outside air, the bottom of the groove, that is, the exposed portion of the adhesive layer, cannot be completely shielded from the outside air.
これに対してペレツト5に対向したノズル10
から吐出された不活性ガスはペレツト5,5間に
スムーズに吹き付けられ、空気を完全に追い出
し、接着剤4の露出部を覆い、しかもペレツトの
貼付け部分をカバー12で覆つているためカバー
12内は与圧状態となり、外気の流入がなく、少
量の不活性ガスで接着剤4の露出部を紫外線照射
の間、外気から遮断できる。 On the other hand, the nozzle 10 facing the pellet 5
The inert gas discharged from the inert gas is smoothly blown between the pellets 5, 5, completely expelling the air, and covering the exposed part of the adhesive 4. Moreover, since the part where the pellets are attached is covered with the cover 12, the inside of the cover 12 is covered. is in a pressurized state, there is no inflow of outside air, and the exposed portion of the adhesive 4 can be shielded from outside air during ultraviolet irradiation using a small amount of inert gas.
そして、シヤツタ9を閉じ、ノズル10からの
ガスN2の供給を停止し、透明シート3を取り出
し作業を完了する。 Then, the shutter 9 is closed, the supply of gas N 2 from the nozzle 10 is stopped, and the transparent sheet 3 is taken out to complete the work.
従来方法と本考案による装置を用いた方法によ
る接着剤の残留接着力を第2図に示す。紫外線未
照射状態での接着力を100としたとき、従来方法
では紫外線照射後1秒で、接着力が50〜30で10秒
以上照射しても20程度でそれ以上の時間照射して
接着力低下はわずかであつた。 FIG. 2 shows the residual adhesive strength of the adhesive obtained by the conventional method and the method using the apparatus according to the present invention. When the adhesive strength without UV irradiation is set as 100, in the conventional method, the adhesive strength is 50 to 30 in 1 second after UV irradiation, and even if it is irradiated for more than 10 seconds, it is around 20 and the adhesive strength is increased after irradiation for a longer time. The decrease was slight.
これに対して本考案装置では、紫外線照射後1
秒で接着力20〜10で、10秒照射で10程度に収束し
ており、短時間で大巾に接着力が低下することが
確認された。 On the other hand, with the device of the present invention, after irradiation with ultraviolet rays,
The adhesive strength was 20 to 10 in seconds, converging to about 10 after 10 seconds of irradiation, and it was confirmed that the adhesive strength decreased significantly in a short period of time.
本考案者は、紫外線硬化型接着剤は紫外線照射
時に接着剤が空気中の酸素と接触しているかどう
かにより、接着力低下の大きさが影響を受けるこ
とを見出し、第3図に示すように、接着剤4の半
導体ペレツト5,5間に露出した部分4aの接着
力が低下しないとペレツト5の接着面周縁が接着
力の強い層4aによつて保持され、接着面下面4
bの接着力は十分低下しても、全体的に接着力が
残留することを見出し本考案装置を創出するに至
つたものである。 The present inventor discovered that the degree of decrease in adhesive strength of UV-curable adhesives is affected by whether or not the adhesive comes into contact with oxygen in the air during UV irradiation, and as shown in Figure 3. If the adhesive strength of the exposed portion 4a between the semiconductor pellets 5, 5 of the adhesive 4 does not decrease, the periphery of the adhesive surface of the pellet 5 will be held by the layer 4a with strong adhesive strength, and the lower surface 4 of the adhesive surface 4 will be held.
It was discovered that even if the adhesive force of b was sufficiently reduced, the adhesive force remained as a whole, which led to the creation of the device of the present invention.
第4図は本考案の他の実施例を示す。図中、第
1図と同一符号は同一物を示し説明を省略する。
第1図装置と相異するのは、ノズル10に吸着パ
ツド11を付加したことのみである。吸着パツド
はノズル外周に複数取り付けられ、透明シート3
を保持したフレーム6を吸着する。カバー12は
ノズル10から吹き出されるガスN2の拡散を最
小限にするもので、カバー12下端と透明シート
3との間隔を小さく設定することにより外気の周
り込みを完全に遮断することができる。 FIG. 4 shows another embodiment of the invention. In the figure, the same reference numerals as in FIG. 1 indicate the same parts, and the explanation will be omitted.
The only difference from the apparatus shown in FIG. 1 is that a suction pad 11 is added to the nozzle 10. A plurality of suction pads are attached to the outer periphery of the nozzle, and a transparent sheet 3
The frame 6 holding the is adsorbed. The cover 12 is intended to minimize the diffusion of gas N 2 blown out from the nozzle 10, and by setting a small distance between the lower end of the cover 12 and the transparent sheet 3, it is possible to completely block outside air from entering. .
この装置は第1図装置に比べ、また透明シート
3の搬送中に不活性ガスを供給することにより、
透明シートを開口部7a上に配置後、直ちに紫外
線照射でき、作業時間を短縮できる。 Compared to the device shown in FIG. 1, this device also provides a
After placing the transparent sheet over the opening 7a, the ultraviolet rays can be irradiated immediately, reducing the working time.
尚、本考案は上記実施例にのみ限定されること
なく、例えばワークは半導体ペレツトだけでな
く、任意の部材に適用できる。また透明部材も、
プラスチツク材やガラスなど紫外線を透過するも
のであれば何でも用いることができ、またシート
状のものに限定されるものではない。 It should be noted that the present invention is not limited to the above-mentioned embodiments, and can be applied to any other member in addition to the semiconductor pellet. Also, transparent members
Any material that transmits ultraviolet rays, such as plastic or glass, can be used, and is not limited to sheet materials.
効 果
以上のように、本考案によれば紫外線硬化型接
着剤の紫外線照射時間を短縮でき、残留接着力も
小さく、またそのばらつきを小さくでき、ワーク
の取り出しが容易となる。Effects As described above, according to the present invention, the ultraviolet irradiation time of the ultraviolet curable adhesive can be shortened, the residual adhesive strength can be reduced, and the variation thereof can be reduced, and the workpiece can be easily removed.
第1図は本考案の実施例を示す側断面図、第2
図は接着剤の硬化曲線図、第3図はワークを接着
した透明部材の部分拡大側断面図、第4図は本考
案の他の実施例を示す側断面図、第5図は透明シ
ートに貼り付けた半導体ウエハを示す斜視図であ
る。
3……透明部材、4……紫外線硬化型接着剤、
5……ワーク、N2……不活性ガス、8……紫外
線ランプ。
Fig. 1 is a side sectional view showing an embodiment of the present invention;
The figure is a curing curve diagram of the adhesive, Figure 3 is a partially enlarged side sectional view of a transparent member to which a workpiece is adhered, Figure 4 is a side sectional view showing another embodiment of the present invention, and Figure 5 is a transparent sheet. FIG. 3 is a perspective view showing the attached semiconductor wafer. 3... Transparent member, 4... Ultraviolet curing adhesive,
5...Work, N2 ...Inert gas, 8...Ultraviolet lamp.
Claims (1)
数のワークを互いに離隔しワーク間に接着剤層を
露呈させて貼り付けた透明部材のワーク貼付け面
を覆いかつワークと対向して多数の不活性ガス吐
出口を開口したカバーと、透明部材の他の面側に
配置され接着剤層に紫外線を照射し硬化させる紫
外線ランプとを具備したことを特徴とする紫外線
照射装置。 A large number of workpieces are separated from each other through a layer of ultraviolet curable adhesive on one surface, and the adhesive layer is exposed between the workpieces. An ultraviolet irradiation device comprising: a cover having an inert gas discharge port; and an ultraviolet lamp disposed on the other side of the transparent member for irradiating ultraviolet rays onto an adhesive layer and curing the adhesive layer.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1987146578U JPH0314049Y2 (en) | 1987-09-25 | 1987-09-25 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1987146578U JPH0314049Y2 (en) | 1987-09-25 | 1987-09-25 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6450433U JPS6450433U (en) | 1989-03-29 |
JPH0314049Y2 true JPH0314049Y2 (en) | 1991-03-28 |
Family
ID=31416197
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1987146578U Expired JPH0314049Y2 (en) | 1987-09-25 | 1987-09-25 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0314049Y2 (en) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH062269Y2 (en) * | 1988-09-14 | 1994-01-19 | ウシオ電機株式会社 | Adhesive sheet processing equipment |
TWI264599B (en) * | 2004-06-30 | 2006-10-21 | Chi Mei Optoelectronics Corp | Ultraviolet curing apparatus for assembling substrates |
JP4798754B2 (en) * | 2005-05-24 | 2011-10-19 | リンテック株式会社 | Energy beam irradiation apparatus and method |
JP6041065B2 (en) * | 2016-05-16 | 2016-12-07 | 株式会社東京精密 | Work dividing device |
JP6376363B2 (en) * | 2016-11-10 | 2018-08-22 | 株式会社東京精密 | Work dividing device |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5850164A (en) * | 1981-09-19 | 1983-03-24 | Nippon Steel Corp | Continuous casting installation |
-
1987
- 1987-09-25 JP JP1987146578U patent/JPH0314049Y2/ja not_active Expired
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5850164A (en) * | 1981-09-19 | 1983-03-24 | Nippon Steel Corp | Continuous casting installation |
Also Published As
Publication number | Publication date |
---|---|
JPS6450433U (en) | 1989-03-29 |
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