JPH0313718Y2 - - Google Patents

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Publication number
JPH0313718Y2
JPH0313718Y2 JP15657182U JP15657182U JPH0313718Y2 JP H0313718 Y2 JPH0313718 Y2 JP H0313718Y2 JP 15657182 U JP15657182 U JP 15657182U JP 15657182 U JP15657182 U JP 15657182U JP H0313718 Y2 JPH0313718 Y2 JP H0313718Y2
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JP
Japan
Prior art keywords
absorbance
hydrogen ion
solution
ion index
reaction cell
Prior art date
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Expired
Application number
JP15657182U
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Japanese (ja)
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JPS5960542U (en
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Priority to JP15657182U priority Critical patent/JPS5960542U/en
Publication of JPS5960542U publication Critical patent/JPS5960542U/en
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Description

【考案の詳細な説明】 本考案は、吸光度自動測定装置に関する。[Detailed explanation of the idea] The present invention relates to an automatic absorbance measuring device.

第1図は、先行技術の吸光度自動測定装置を示
す簡略化した構成図である。槽61内には、無電
解銅メツキに用いられるメツキ液62が貯えられ
ている。このメツキ液62中の銅イオン濃度を測
定するために、メツキ液62中に管路63が挿入
される。管路63には定量ポンプ64が介在さ
れ、この定量ポンプ64によつてメツキ液62の
一部が検液として吸光度セル65に供給される。
吸光度セル65には、吸光度検出部66が設けら
れる。吸光度検出部66では、2価の銅イオンに
よつて青色に呈色された検液の吸光度が測定され
る。測定された検液は、管路67から排出され
る。
FIG. 1 is a simplified block diagram of a prior art automatic absorbance measuring device. A plating solution 62 used for electroless copper plating is stored in the tank 61 . In order to measure the copper ion concentration in the plating solution 62, a pipe line 63 is inserted into the plating solution 62. A metering pump 64 is interposed in the conduit 63, and a portion of the plating liquid 62 is supplied to the absorbance cell 65 as a test liquid by the metering pump 64.
The absorbance cell 65 is provided with an absorbance detection section 66 . The absorbance detection section 66 measures the absorbance of the test solution colored blue by divalent copper ions. The measured test liquid is discharged from the pipe line 67.

このようにして測定された吸光度の値から銅イ
オンの定量が行なわれる。メツキ液62の組成が
変化して水素イオン指数が変化すると、2価の銅
イオンの呈色は変化する。実際には、無電解銅メ
ツキが行なわれる槽61におけるメツキ液62の
水素イオン指数の変化は、中心値の±0.5程度に
も及ぶので、このような先行技術による銅イオン
の定量では、正確な銅イオンの定量が困難であつ
た。
The amount of copper ion is determined from the absorbance value thus measured. When the composition of the plating liquid 62 changes and the hydrogen ion index changes, the coloration of divalent copper ions changes. In reality, changes in the hydrogen ion index of the plating solution 62 in the bath 61 where electroless copper plating is performed ranges as much as ±0.5 of the central value, so it is difficult to accurately quantify copper ions using such prior art techniques. It was difficult to quantify copper ions.

このため、検液の水素イオン指数を調整するた
めに、手操作によつて硫酸酸性溶液などが滴定さ
れたけれども煩雑な作業となり、吸光度の測定に
長時間を要した。
For this reason, in order to adjust the hydrogen ion index of the test solution, a sulfuric acid acidic solution or the like was manually titrated, but this was a complicated process and required a long time to measure the absorbance.

本考案の目的は、このような先行技術の問題点
を解決し、短時間に測定ができ、しかも正確な定
量が可能である吸光度自動測定装置を提供するこ
とである。
The purpose of the present invention is to solve the problems of the prior art and provide an automatic absorbance measurement device that can perform measurements in a short time and also allows accurate quantification.

以下、図面によつて本考案の実施例を説明す
る。第2図は、本考案の一実施例の吸光度自動測
定装置の構成を示す系統図である。吸光度自動測
定装置1は、検液の採取手段2と、検液が供給さ
れる反応セル3と、反応セル3に設けられた水素
イオン指数測定手段4と、水素イオン指数測定手
段4の測定値に応じて硫酸酸性溶液5を滴下して
水素イオン指数を調整する調整手段6と、前記反
応セル3内で水素イオン指数が調整された検液の
吸光度の測定をするための吸光度測定手段7とを
含む。
Embodiments of the present invention will be described below with reference to the drawings. FIG. 2 is a system diagram showing the configuration of an automatic absorbance measuring device according to an embodiment of the present invention. The automatic absorbance measuring device 1 includes a test solution collection means 2, a reaction cell 3 to which the test solution is supplied, a hydrogen ion index measurement means 4 provided in the reaction cell 3, and a measurement value of the hydrogen ion index measurement means 4. an adjusting means 6 for adjusting the hydrogen ion index by dropping a sulfuric acid acidic solution 5 according to the conditions; and an absorbance measuring means 7 for measuring the absorbance of the test solution whose hydrogen ion index has been adjusted in the reaction cell 3. including.

検液の採取手段2は、被測定溶液たとえば無電
解銅メツキ槽8内のメツキ液9から一定量の検液
を採取するために設けられる。採取手段2は、大
略的には、管路10と、管路10に介在されて検
液を採取する定量ポンプ11と、前記反応セルに
一定量の検液を供給するための定量採取器12
と、採取器12から反応セル3に検液を供給する
供給管路13とを含む。管路10の一端は前記メ
ツキ液9内に挿入され、無電解銅メツキ槽8と定
量ポンプ11との間の管路10の一部には、蛇管
部14が形成され、ポンプ15によつて供給され
る冷却水16が蛇管部14を冷却する。これによ
つて、メツキ液9は、ほぼ室温にされる。定量採
取器12は、前記管路10の他端が連通されるマ
イナス極としての下管部17と、下管部17の上
方の上管部18とから成る。下管部17の下端に
は計量弁19が設けられ、計量弁19には供給管
路13が連設されている。下管部17の上端69
は、前記上管部18の下端部付近に開口され、前
記上端69に対応して導電性材料から形成された
プラス電極20の下端が配置される。プラス電極
20は、上管部18の上端部を密栓した栓21に
釣支される。上管部18の下端部付近には、排液
管22が連設される。下管部17には、管路23
が連設される。管路23には、ポンプ24を介し
て純水25が供給される。
The test solution sampling means 2 is provided to collect a certain amount of test solution from a solution to be measured, such as a plating solution 9 in an electroless copper plating tank 8 . The sampling means 2 roughly includes a pipe line 10, a metering pump 11 that is interposed in the pipe line 10 to collect a test liquid, and a quantitative sampler 12 that supplies a fixed amount of test liquid to the reaction cell.
and a supply pipe line 13 for supplying the test liquid from the collector 12 to the reaction cell 3. One end of the pipe line 10 is inserted into the plating liquid 9, and a flexible pipe part 14 is formed in a part of the pipe line 10 between the electroless copper plating tank 8 and the metering pump 11. The supplied cooling water 16 cools the corrugated pipe section 14 . As a result, the plating solution 9 is brought to approximately room temperature. The quantitative sampler 12 consists of a lower tube section 17 serving as a negative electrode with which the other end of the tube 10 is communicated, and an upper tube section 18 above the lower tube section 17. A metering valve 19 is provided at the lower end of the lower pipe portion 17, and a supply pipe line 13 is connected to the metering valve 19. Upper end 69 of lower tube portion 17
is opened near the lower end of the upper tube portion 18, and a lower end of a positive electrode 20 made of a conductive material is disposed corresponding to the upper end 69. The positive electrode 20 is suspended in a plug 21 that is tightly sealed at the upper end of the upper tube portion 18 . A drain pipe 22 is connected to the vicinity of the lower end of the upper pipe portion 18 . A pipe line 23 is provided in the lower pipe part 17.
are set up consecutively. Pure water 25 is supplied to the pipe line 23 via a pump 24 .

メツキ液9は、予め定められた時間間隔たとえ
ば5分間毎に定量ポンプ11が駆動されて定量採
取器12に採取される。メツキ液9は、導電性で
あるので定量採取器12の下管部17に一定量が
入れられると、前記プラス電極20と電気的に導
通される。これによつて、定量ポンプ11の駆動
は停止されるとともに、定量採取器12には、所
定量のメツキ液9が検液として採取される。この
検液は、計量弁19が開かれ、供給管路13から
反応セル3に供給される。
The plating liquid 9 is collected into a quantitative sampler 12 by driving a metering pump 11 at predetermined time intervals, for example, every 5 minutes. Since the plating liquid 9 is electrically conductive, when a certain amount is put into the lower tube part 17 of the quantitative sampler 12, it is electrically connected to the positive electrode 20. As a result, the driving of the metering pump 11 is stopped, and a predetermined amount of the plating liquid 9 is collected as a test liquid in the metering sampler 12. This test liquid is supplied to the reaction cell 3 from the supply pipe line 13 with the metering valve 19 opened.

反応セル3は、反応セル3内を撹拌するための
スターラ26上に載置されており、たとえばビー
カなどによつて実現される。反応セル3内には、
図示しないPH計のガラス電極27と、サーミス
タなどから成る温度検出器28とが挿入されてい
る。反応セル3には、管路29と管路30と管路
31とが、反応セル3の蓋32を貫通して開口さ
れている。反応セル3の底部近くには、排液管路
33が開口される。前記管路29には、定量ポン
プ34の駆動によつて反応セル3内に採取された
検液を安定化させるための添加剤溶液35が送液
される。
The reaction cell 3 is placed on a stirrer 26 for stirring the inside of the reaction cell 3, and is realized by, for example, a beaker. Inside the reaction cell 3,
A glass electrode 27 of a PH meter (not shown) and a temperature detector 28 consisting of a thermistor or the like are inserted. In the reaction cell 3, a conduit 29, a conduit 30, and a conduit 31 are opened through a lid 32 of the reaction cell 3. A drain pipe 33 is opened near the bottom of the reaction cell 3 . An additive solution 35 for stabilizing the test liquid collected in the reaction cell 3 is fed into the pipe line 29 by driving a metering pump 34 .

反応セル3内では、前記採取手段2によつて採
取された検液と、前記添加剤溶液35とがスター
ラ26の駆動によつてスターラピース44が回転
して撹拌され混合される。水素イオン指数測定手
段4は、前記PH計と温度検出器28とから成
る。添加剤溶液35が混合された検液の水素イオ
ン指数がガラス電極27によつて測定され、前記
温度検出器28によつて測定された検液温度に応
じて補正される。
In the reaction cell 3, the test liquid collected by the sampling means 2 and the additive solution 35 are stirred and mixed by driving the stirrer 26 to rotate the stirrer piece 44. The hydrogen ion index measuring means 4 includes the PH meter and a temperature detector 28. The hydrogen ion index of the test liquid mixed with the additive solution 35 is measured by the glass electrode 27, and corrected according to the temperature of the test liquid measured by the temperature detector 28.

メツキ液9の水素イオン指数は、たとえば12.5
程度であり、2価の銅イオンの青色の呈色が安定
する水素イオン指数は9.5である。測定された検
液の水素イオン指数に応じて、硫酸酸性溶液5を
加えて反応セル3内の検液の水素イオン指数をた
とえば9.5とする。このため水素イオン指数を調
整するための調整手段6が設けられる。調整手段
6は大略的には、硫酸酸性溶液5と、前記管路3
0と、硫酸酸性溶液5を送液する管路30に介在
される定量ポンプ36とを含む。定量ポンプ36
の上流側の管路30には流量測定部37が介在さ
れ、さらに流量測定部37の上流側の管路30に
は流量校正弁38が介在される。流量測定部37
と流量校正弁38との間の管路30には、分岐管
路39が設けられ、分岐管路39には流量校正弁
40が介在される。したがつて、定量ポンプ36
が駆動され、前記水素イオン指数測定手段4によ
つて得られた測定値に応じて、硫酸酸性溶液5が
反応セル3内に所定の水素イオン指数たとえば
9.5となるまで管路30を介して滴下される。
The hydrogen ion index of plating liquid 9 is, for example, 12.5.
The hydrogen ion index at which the blue coloration of divalent copper ions is stable is 9.5. Depending on the measured hydrogen ion index of the test solution, the sulfuric acid acidic solution 5 is added to set the hydrogen ion index of the test solution in the reaction cell 3 to, for example, 9.5. For this reason, adjustment means 6 for adjusting the hydrogen ion index is provided. The adjusting means 6 generally includes the sulfuric acid acid solution 5 and the pipe line 3.
0, and a metering pump 36 interposed in a conduit 30 for feeding the sulfuric acid acidic solution 5. Metering pump 36
A flow rate measuring section 37 is interposed in the conduit 30 on the upstream side of the flow rate measuring section 37, and a flow rate calibration valve 38 is interposed in the conduit 30 on the upstream side of the flow rate measuring section 37. Flow rate measuring section 37
A branch line 39 is provided in the line 30 between the flow rate calibration valve 38 and the flow rate calibration valve 38 . Therefore, the metering pump 36
is driven, and according to the measured value obtained by the hydrogen ion index measuring means 4, the sulfuric acid acidic solution 5 is introduced into the reaction cell 3 to a predetermined hydrogen ion index, e.g.
It is dripped via line 30 until it reaches 9.5.

測定手段7は、前記反応セル3で水素イオン指
数が調整された検液の吸光度の測定部41と、測
定部41に検液を供給する管路42と、管路42
に介在される定量ポンプ43とから成る。管路4
2は、反応セル3の底部近くに開口を有して検液
中に浸漬される。定量ポンプ43が駆動される
と、管路42を介して検液が測定部41に供給さ
れる。測定部41は、吸光度セル45と吸光度検
出部46とから成る。検液は、吸光度セル45に
供給され、吸光度検出部46によつて検液の吸光
度が測定された後、排液管47を介して排出され
る。
The measuring means 7 includes a measuring section 41 for measuring the absorbance of the test solution whose hydrogen ion index has been adjusted in the reaction cell 3, a conduit 42 for supplying the test solution to the measuring section 41, and a conduit 42.
and a metering pump 43 interposed between. Conduit 4
2 has an opening near the bottom of the reaction cell 3 and is immersed in the test liquid. When the metering pump 43 is driven, the test liquid is supplied to the measuring section 41 via the conduit 42 . The measurement section 41 includes an absorbance cell 45 and an absorbance detection section 46. The test liquid is supplied to the absorbance cell 45 , and after the absorbance of the test liquid is measured by the absorbance detector 46 , it is discharged through the drain pipe 47 .

前記定量ポンプ11,34,43は、図示しな
い制御装置によつて制御され、測定すべき時間間
隔に対応して駆動される。この制御装置は、前記
水素イオン指数測定手段の測定値に応じて定量ポ
ンプ36を駆動させる。検液の吸光度の測定が終
了する毎にポンプ48の駆動によつて、前記管路
31を介して洗浄水49が反応セル3内に満たさ
る。これによつて反応セル3が洗浄され、洗浄後
の洗浄水はポンプ50の駆動によつて排液管路3
3を介して排出される。また採取器12は、前記
純水25によつて洗浄される。
The metering pumps 11, 34, 43 are controlled by a control device (not shown) and are driven in accordance with the time intervals to be measured. This control device drives the metering pump 36 in accordance with the measured value of the hydrogen ion index measuring means. Every time the measurement of the absorbance of the test liquid is completed, the reaction cell 3 is filled with washing water 49 via the pipe line 31 by driving the pump 48 . As a result, the reaction cell 3 is cleaned, and the cleaning water after cleaning is pumped to the drain pipe 3 by driving the pump 50.
3. Further, the collector 12 is washed with the pure water 25.

なお、水素イオン指数測定手段4のPH計の校
正を行なうために、管路31の反応セル3近くに
分岐管路51が連設される。分岐管路51には、
ポンプ52が介在される。ポンプ52の上流側で
分岐管路51は、一対の管路53,54に分岐さ
れる。一方の管路53には校正液弁55を介して
たとえば水素イオン指数7の緩衝液56が供給さ
れ、他方の管路54には校正液弁57を介してた
とえば水素イオン指数9の緩衝液58が供給され
る。したがつてポンプ52が駆動され、校正液弁
55が開かれ、校正液弁57が閉じられて管路5
1,31を介して反応セル3に緩衝液56が送液
される。これによつて、PH計がたとえばPH7
に校正される。次に校正液弁57が開かれ、校正
液弁55が閉じられて管路51,31を介して反
応セル3に緩衝液58が送液され、PH計がたと
えばPH9に校正される。
In addition, in order to calibrate the pH meter of the hydrogen ion index measuring means 4, a branch pipe 51 is connected to the pipe 31 near the reaction cell 3. In the branch pipe 51,
A pump 52 is interposed. On the upstream side of the pump 52, the branch line 51 branches into a pair of lines 53 and 54. A buffer solution 56 with a hydrogen ion index of 7, for example, is supplied to one pipe 53 via a calibration solution valve 55, and a buffer solution 58 with a hydrogen ion index of 9, for example, is supplied to the other pipeline 54 via a calibration solution valve 57. is supplied. Therefore, the pump 52 is driven, the calibration liquid valve 55 is opened, the calibration liquid valve 57 is closed, and the pipe line 5 is
A buffer solution 56 is sent to the reaction cell 3 via 1 and 31. This allows the PH meter to read, for example, PH7.
Calibrated to. Next, the calibration liquid valve 57 is opened, the calibration liquid valve 55 is closed, and the buffer solution 58 is sent to the reaction cell 3 through the pipes 51 and 31, so that the pH meter is calibrated to, for example, PH9.

このように煩雑な操作をすることなく、短時間
に吸光度が測定でき、しかも、水素イオン指数が
いつも一定とされるのでメツキ液9の組成に拘わ
らずに正しく2価の銅イオン量が求められる。
In this way, absorbance can be measured in a short time without complicated operations, and since the hydrogen ion index is always constant, the amount of divalent copper ions can be determined correctly regardless of the composition of the plating solution 9. .

上述の実施例において、硫酸酸性溶液5が用い
られたけれども、本考案の他の実施例において
は、水酸化ナトリウム溶液などの塩基性溶液が用
いられてもよい。
Although in the embodiments described above, a sulfuric acid acidic solution 5 was used, in other embodiments of the invention a basic solution such as a sodium hydroxide solution may be used.

上述の実施例において、メツキ液9に含まれる
2価の銅イオンの吸光度の測定が行なわれたけれ
ども、本考案の他の実施例では、2価の銅イオン
に限ることはなく、水素イオン指数の変化に伴い
呈色される色が変化する検液に関連して実施され
てもよい。
In the above embodiment, the absorbance of divalent copper ions contained in the plating solution 9 was measured, but in other embodiments of the present invention, the absorbance is not limited to divalent copper ions, and the hydrogen ion index is measured. It may also be carried out in connection with a test liquid whose color changes as the color changes.

以上のように本考案によれば、検液の水素イオ
ン指数に拘らずに正確な吸光度の測定が行なえ、
しかも短時間に測定が行なえるので定期的な吸光
度の自動測定が可能である。
As described above, according to the present invention, accurate absorbance measurement can be performed regardless of the hydrogen ion index of the test solution.
Moreover, since the measurement can be carried out in a short time, periodic automatic measurement of absorbance is possible.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は先行技術の構成図、第2図は本考案の
一実施例の構成を示す系統図である。 1……吸光度自動測定装置、2……採取手段、
3……反応セル、4……水素イオン指数測定手
段、5……硫酸酸性溶液、6……調整手段、7…
…吸光度測定手段、9……メツキ液、10,2
3,29,30,31,42……管路、11,3
4,36,43,48……定量ポンプ、12……
定量採取器、13……供給管路、14……蛇管
部、15,24,48,52……ポンプ、22,
47……排液管、26……スターラ、27……ガ
ラス電極、28……温度検出器、45……吸光度
セル、46……吸光度検出部。
FIG. 1 is a configuration diagram of the prior art, and FIG. 2 is a system diagram showing the configuration of an embodiment of the present invention. 1... Automatic absorbance measurement device, 2... Collection means,
3... Reaction cell, 4... Hydrogen ion index measuring means, 5... Sulfuric acid acidic solution, 6... Adjustment means, 7...
... Absorbance measuring means, 9... Plating liquid, 10,2
3, 29, 30, 31, 42... pipe, 11, 3
4, 36, 43, 48... metering pump, 12...
Quantitative sampling device, 13... Supply pipe line, 14... Serpentine pipe section, 15, 24, 48, 52... Pump, 22,
47... Drain pipe, 26... Stirrer, 27... Glass electrode, 28... Temperature detector, 45... Absorbance cell, 46... Absorbance detection section.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 被測定溶液から一定量の検液を採取する採取手
段と、採取手段から検液が供給される反応セル
と、反応セルに設けられ水素イオン指数を測定す
るための水素イオン指数測定手段と、水素イオン
指数測定手段の測定値に応じて酸性または塩基性
溶液を滴下して水素イオン指数を調整する調整手
段と、前記反応セルで水素イオン指数が調整され
た検液の吸光度を測定するための吸光度測定手段
とを含むことを特徴とする吸光度自動測定装置。
A collection means for collecting a certain amount of test solution from the solution to be measured, a reaction cell to which the test solution is supplied from the collection means, a hydrogen ion index measuring means provided in the reaction cell for measuring the hydrogen ion index, an adjusting means for adjusting the hydrogen ion index by dropping an acidic or basic solution according to the measured value of the ion index measuring means; and an absorbance for measuring the absorbance of the test solution whose hydrogen ion index has been adjusted in the reaction cell. 1. An automatic absorbance measuring device comprising: a measuring means.
JP15657182U 1982-10-15 1982-10-15 Absorbance automatic measuring device Granted JPS5960542U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15657182U JPS5960542U (en) 1982-10-15 1982-10-15 Absorbance automatic measuring device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15657182U JPS5960542U (en) 1982-10-15 1982-10-15 Absorbance automatic measuring device

Publications (2)

Publication Number Publication Date
JPS5960542U JPS5960542U (en) 1984-04-20
JPH0313718Y2 true JPH0313718Y2 (en) 1991-03-28

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Family Applications (1)

Application Number Title Priority Date Filing Date
JP15657182U Granted JPS5960542U (en) 1982-10-15 1982-10-15 Absorbance automatic measuring device

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JP (1) JPS5960542U (en)

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Publication number Publication date
JPS5960542U (en) 1984-04-20

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