JPH0313328A - Transparent gas barrier film - Google Patents
Transparent gas barrier filmInfo
- Publication number
- JPH0313328A JPH0313328A JP15109689A JP15109689A JPH0313328A JP H0313328 A JPH0313328 A JP H0313328A JP 15109689 A JP15109689 A JP 15109689A JP 15109689 A JP15109689 A JP 15109689A JP H0313328 A JPH0313328 A JP H0313328A
- Authority
- JP
- Japan
- Prior art keywords
- gas barrier
- film
- barrier film
- simgxoy
- transparent gas
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000004888 barrier function Effects 0.000 title claims abstract description 19
- 239000002985 plastic film Substances 0.000 claims abstract description 8
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 claims abstract description 6
- 229920003023 plastic Polymers 0.000 claims abstract description 5
- 239000010408 film Substances 0.000 claims description 22
- 239000010409 thin film Substances 0.000 claims description 5
- 239000012528 membrane Substances 0.000 abstract 3
- 239000007789 gas Substances 0.000 description 15
- 239000000203 mixture Substances 0.000 description 7
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 6
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 6
- 238000000034 method Methods 0.000 description 6
- 229910052760 oxygen Inorganic materials 0.000 description 6
- 239000001301 oxygen Substances 0.000 description 6
- 238000007740 vapor deposition Methods 0.000 description 6
- 239000000463 material Substances 0.000 description 4
- 239000005022 packaging material Substances 0.000 description 4
- 230000035699 permeability Effects 0.000 description 4
- 229920006255 plastic film Polymers 0.000 description 4
- 229910052814 silicon oxide Inorganic materials 0.000 description 4
- 230000005540 biological transmission Effects 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 229920002799 BoPET Polymers 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- 229920000219 Ethylene vinyl alcohol Polymers 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 239000002216 antistatic agent Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 229910052681 coesite Inorganic materials 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 238000003851 corona treatment Methods 0.000 description 1
- 229910052906 cristobalite Inorganic materials 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 229940079593 drug Drugs 0.000 description 1
- 239000003814 drug Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005566 electron beam evaporation Methods 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 239000012776 electronic material Substances 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 235000013305 food Nutrition 0.000 description 1
- 229910052809 inorganic oxide Inorganic materials 0.000 description 1
- 238000007733 ion plating Methods 0.000 description 1
- 239000000314 lubricant Substances 0.000 description 1
- 239000000395 magnesium oxide Substances 0.000 description 1
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 1
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229920000620 organic polymer Polymers 0.000 description 1
- 238000009832 plasma treatment Methods 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910052682 stishovite Inorganic materials 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 238000010998 test method Methods 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
- 229910052905 tridymite Inorganic materials 0.000 description 1
Landscapes
- Laminated Bodies (AREA)
- Wrappers (AREA)
Abstract
Description
【発明の詳細な説明】
（産業上の利用分野）
本発明はガスバリア性、透明性にすぐれた包装材料用フ
ィルムに関する。DETAILED DESCRIPTION OF THE INVENTION (Field of Industrial Application) The present invention relates to a film for packaging materials that has excellent gas barrier properties and transparency.
（従来の技術）
食品、医薬品、電ｒ材料などに使用する包装材料は、中
身の変質を防ぐため気密性が７殼である。(Prior Art) Packaging materials used for foods, medicines, electronic materials, etc. are airtight to prevent deterioration of the contents.
そのために従来では、プラスチックフィルムにアルミニ
ウムを蒸着した包装材料が利用された。しかし、この場
合内容物が見えないと１う欠点がある。そこで塩化ビニ
ルデンやエチレンビニールアルコール共重合体をコート
又はラミネートしたフィルムが出されている。しかし、
これは耐熱性が乏しいため、内容物を殺菌するレトルト
処理ができない。Conventionally, packaging materials made of plastic film with aluminum vapor-deposited have been used for this purpose. However, in this case, one drawback is that the contents cannot be seen. Therefore, films coated or laminated with vinyldene chloride or ethylene vinyl alcohol copolymers have been developed. but,
Because it has poor heat resistance, it cannot be subjected to retort treatment to sterilize its contents.
これを改善するものでプラスチックフィルムの少なくと
も片面に酸化ケイ素をコートした物（持分１ｆ１５３−
１２９５）、酸化アルミニウムをコートした物（特公昭
５Ｂ−２５３８０）等が知られている。To improve this, a plastic film coated with silicon oxide on at least one side (1f153-
1295), aluminum oxide coated material (Japanese Patent Publication No. 5B-25380), etc. are known.
（発明が解決しようとする課題）
しかし、このような酸化アルミニウムをコートしたフィ
ルムは上置なガスバリア性を示さない。(Problem to be Solved by the Invention) However, such a film coated with aluminum oxide does not exhibit superior gas barrier properties.
又酸化ケイ素をコートしたフィルムもレトルト後のガス
バリア性が低ドしたり、フィルムの取扱い方により酸化
ケイ素層にクラックが発生し署しくガスバリア性が低下
する。Also, films coated with silicon oxide have poor gas barrier properties after being retorted, and cracks may occur in the silicon oxide layer due to the way the film is handled, resulting in a significant decrease in gas barrier properties.
（課題を解決するためのｒ°段）
すなわち本発明は、透明プラスチックフィル１１の少な
くとも片面に、Ｓ ｉＭｇｘｏｙ （但し、０．０１≦
ｘ≦２．１≦ｙ≦４）で表わされる、波長５５０面の光
を６０％以」−透過する、厚さ５０Å〜２０００人の薄
膜を設けたことを特徴とする透明ガスバリアフィル１１
であり、さらに］１１ｊ記Ｓ ｉＭｇｘＯｙの薄膜が、
さらに酸化アルミニウムを、５ｉＡ（！ｚＭｇｘＯｙ（
但し、０．０１≦２≦５．０．０１≦ｘ≦２．１≦ｙ≦
９．５）で表わされるように添加されたことを特徴とす
る透明ガスバリアフィルムである。(r° stage for solving the problem) That is, the present invention provides SiMgxoy (however, 0.01≦
A transparent gas barrier film 11 characterized in that it is provided with a thin film having a thickness of 50 Å to 2,000, which transmits 60% or more of light with a wavelength of 550, expressed by x≦2.1≦y≦4)
and further] 11j. The thin film of SiMgxOy is
Furthermore, aluminum oxide was added at 5iA (!zMgxOy(
However, 0.01≦2≦5.0.01≦x≦2.1≦y≦
9.5) A transparent gas barrier film characterized by being added as shown in 9.5).
本発明でいう透明プラスチックフィルムとは、ｊｆ機重
重合体溶解又は溶融押出したもので必要に応じて長手方
向、幅方向に延伸したものである。The transparent plastic film referred to in the present invention is a film obtained by dissolving or melt-extruding a JF machine polymer and stretching it in the longitudinal direction and the width direction as necessary.
さらにこれらの有機重合体に公知の添加剤（例えば帯電
防１１：、剤、滑剤）が添加されててもよい。Furthermore, known additives (for example, antistatic agent, lubricant) may be added to these organic polymers.
このようなプラスチックフィルｌ、は本発明の膜形成に
先だち公知の表面処理（例えばコロナ処理、プラズマ処
理、アンカーコート処理）を行ってあってもよい。Such a plastic film 1 may be subjected to a known surface treatment (for example, corona treatment, plasma treatment, anchor coating treatment) prior to film formation of the present invention.
本発明のプラスチックフィルムの厚さは特に制限を受け
ないが、包装材料としての適性では３〜５００１ＩＩＩ
の範囲が好ましい。The thickness of the plastic film of the present invention is not particularly limited, but in terms of suitability as a packaging material, it is 3 to 5001 III.
A range of is preferred.
かかるプラスチック透明フィルムの少な（とも片面にＳ
ｉＭ ｇ ｘ Ｏ３’ ｓまたはＳ ｉ Ａ Ｑ ｚ
Ｍｇｘ０３’で表わされる無機酸化物の薄膜をＰ、Ｖ、
Ｄ法により形成する。There is a small amount of plastic transparent film (S on one side)
iM g x O3' s or S i A Q z
A thin film of an inorganic oxide represented by Mgx03' is made of P, V,
Formed by method D.
ここで言うＰ、Ｖ、Ｄ法とはスバンタ法、イオンプレイ
テング法、蒸着法である。好ましくはコスト而より蒸着
法がよい。蒸着法の中でも電子ビーム蒸着がもっとも適
している。蒸着材としては、混合をそのまま材料として
もよいが、それぞれの酸化物の混合又は酸化物と金属と
の混合でもよい。The P, V, and D methods mentioned here are the Svanta method, the ion plating method, and the vapor deposition method. Preferably, the vapor deposition method is better in terms of cost. Among the vapor deposition methods, electron beam vapor deposition is the most suitable. The vapor deposition material may be a mixture as it is, or may be a mixture of each oxide or a mixture of an oxide and a metal.
ガスバリア層としての膜厚は５０Å〜２０００人であり
好ましくは、３００Å〜８００人である。The thickness of the gas barrier layer is 50 Å to 2000 Å, preferably 300 Å to 800 Å.
ガスバリア層の組成は、酸化ケイ素に酸化マグネシウム
を３自させることにより機械的強度が向にし膜の耐クラ
ツク性（機械的強度）があかり、さらにこの組成に、酸
化アルミニウムを含有させることで耐酸、耐アルカリ、
耐水性が向１−シ、共にレトルト性にもすぐれたものと
なる。The composition of the gas barrier layer has silicon oxide mixed with magnesium oxide, which increases mechanical strength, and the film's crack resistance (mechanical strength).Furthermore, by including aluminum oxide in this composition, acid resistance and Alkali resistance,
It has excellent water resistance and retortability.
（実施例）
表１に示す混合比の蒸着材を電子ビーム蒸着法で膜形成
を行った。蒸着材の個々なＳｉＯ２゜ＭｇＯ，Ａ Ｑ２
０Ｓｌで直径約５龍の粒状である。(Example) A film was formed using the evaporation materials having the mixing ratio shown in Table 1 by electron beam evaporation. Individual SiO2゜MgO,A Q2 of vapor deposition material
It is 0Sl and has a granular shape with a diameter of about 5 dragons.
基板フィルムとしては東洋紡和製ＰＥＴフィルムＥ−５
１００の１２ＩＪＪ厚のものを使用した。ガスバリア層
の膜厚は６００人とした。比較のためにガスバリア層の
ないフィルム及びＳ ｉ ０２ 単一・組成からなる他
は同様のガスバリアフィルムを測定した。ガスバリアフ
ィルムは以下に示すレトルト処理及び機械強度テスト後
に酸素透過率を測定し評価を杼った。以下にテスト方法
及び酸素透過率測定方法を示す。The substrate film is PET film E-5 manufactured by Toyobo Wa.
100 12IJJ thickness was used. The thickness of the gas barrier layer was 600. For comparison, a film without a gas barrier layer and a gas barrier film having a single composition of S i 02 but having the same composition were measured. The gas barrier film was evaluated by measuring the oxygen permeability after the retort treatment and mechanical strength test shown below. The test method and oxygen permeability measurement method are shown below.
−レトルト処理
ガスバリアフィルムを１２５℃の水蒸気に３０分間さら
した後取り出し、２４１Ｉ￥間後に酸素透過率の測定を
１１う。- The retort-treated gas barrier film was exposed to water vapor at 125° C. for 30 minutes, then taken out, and the oxygen permeability was measured after 241 I yen.
・機械強度
ガスバリアフィルムを１５０ ｍ−幅で長さ２００暖霞
の形に裁断する。このフィルムの１５０．型側ヲステン
レス製の棒で補強してそれを５ｋｇ＋ＴＸの力で５分間
テンシａンをかける。テンションを開放した後酸素透過
率のδ−１定を行う。- Mechanical strength gas barrier film is cut into a shape of 150 m width and 200 m long. 150. of this film. Reinforce the mold side with a stainless steel rod and apply tension for 5 minutes with a force of 5 kg + TX. After releasing the tension, the oxygen permeability is determined by δ-1.
・酸素透過率
酸素透過率測定装置（モダンコントロールズ社’ｌ！
０Ｘ−ＴＲＡＮｌｏｏ）を使用して測定した。・Oxygen transmission rate Oxygen transmission rate measuring device (Modern Controls Inc.'l!
0X-TRANloo).
実施例と比較例とのテスト結果を表２に示す。Table 2 shows the test results for Examples and Comparative Examples.
以下余白
表２
数値の？ｌｉ位は
ｃｃ／／／ｄａＹ／ａｔｍ
なお、これら実施例１〜４のフィルムは、５５０Ｉ虐の
波長光の透過ヰ（はいずれも７０％以上であった。Below is the margin table 2. Numerical value? The li position is cc///daY/atm. The films of Examples 1 to 4 had a transmittance of 550I wavelength light of 70% or more.
（発明の効果）
本発明により、透明性に優れ１１つ耐レトルト性、機械
強度が優れたガスバリアフィルムが得らレル。(Effects of the Invention) According to the present invention, a gas barrier film with excellent transparency, retort resistance, and mechanical strength can be obtained.
Claims (2)
ＳｉＭｇｘＯｙ（但し、０．０１≦ｘ≦２、１≦ｙ≦４
）で表わされる、波長５５０ｎｍの光を６０％以上透過
する、厚さ５０Å〜２０００Åの薄膜を設けたことを特
徴とする透明ガスバリアフィルム。(1) On at least one side of the transparent plastic film,
SiMgxOy (however, 0.01≦x≦2, 1≦y≦4
) A transparent gas barrier film characterized by being provided with a thin film having a thickness of 50 Å to 2000 Å and transmitting 60% or more of light with a wavelength of 550 nm.
を、ＳｉＡｌｚＭｇｘＯｙ（但し、０．０１≦ｚ≦５、
０．０１≦ｘ≦２、１≦ｙ≦９．５）で表わされるよう
に添加されたことを特徴とする透明ガスバリアフィルム
。(2) The thin film of claim (1) further contains aluminum oxide, SiAlzMgxOy (0.01≦z≦5,
0.01≦x≦2, 1≦y≦9.5).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15109689A JPH0313328A (en) | 1989-06-13 | 1989-06-13 | Transparent gas barrier film |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15109689A JPH0313328A (en) | 1989-06-13 | 1989-06-13 | Transparent gas barrier film |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0313328A true JPH0313328A (en) | 1991-01-22 |
Family
ID=15511250
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP15109689A Pending JPH0313328A (en) | 1989-06-13 | 1989-06-13 | Transparent gas barrier film |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0313328A (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5162300A (en) * | 1990-04-11 | 1992-11-10 | Hoechst Aktiengesellschaft | Process for producing a high-temperature superconductor |
| FR2712310A1 (en) * | 1993-11-09 | 1995-05-19 | Pechiney Recherche | Transparent barrier coating for flexible polymeric packaging film |
| JP2005147086A (en) * | 2003-11-19 | 2005-06-09 | Fuji Heavy Ind Ltd | Blade of horizontal axis wind mill |
| KR100554957B1 (en) * | 2003-12-19 | 2006-03-03 | 한국조폐공사 | A Printed Matter Identifiable on Counterfeit and Forgery |
-
1989
- 1989-06-13 JP JP15109689A patent/JPH0313328A/en active Pending
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5162300A (en) * | 1990-04-11 | 1992-11-10 | Hoechst Aktiengesellschaft | Process for producing a high-temperature superconductor |
| FR2712310A1 (en) * | 1993-11-09 | 1995-05-19 | Pechiney Recherche | Transparent barrier coating for flexible polymeric packaging film |
| JP2005147086A (en) * | 2003-11-19 | 2005-06-09 | Fuji Heavy Ind Ltd | Blade of horizontal axis wind mill |
| KR100554957B1 (en) * | 2003-12-19 | 2006-03-03 | 한국조폐공사 | A Printed Matter Identifiable on Counterfeit and Forgery |
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