JPH03129830A - Bump formation - Google Patents

Bump formation

Info

Publication number
JPH03129830A
JPH03129830A JP1266312A JP26631289A JPH03129830A JP H03129830 A JPH03129830 A JP H03129830A JP 1266312 A JP1266312 A JP 1266312A JP 26631289 A JP26631289 A JP 26631289A JP H03129830 A JPH03129830 A JP H03129830A
Authority
JP
Japan
Prior art keywords
bump
electrode
resin
alumi
metallic layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1266312A
Other languages
Japanese (ja)
Inventor
Yutaka Okuaki
奥秋 裕
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Oki Electric Industry Co Ltd
Original Assignee
Oki Electric Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Oki Electric Industry Co Ltd filed Critical Oki Electric Industry Co Ltd
Priority to JP1266312A priority Critical patent/JPH03129830A/en
Publication of JPH03129830A publication Critical patent/JPH03129830A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L24/10Bump connectors ; Manufacturing methods related thereto
    • H01L24/11Manufacturing methods
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/10Bump connectors; Manufacturing methods related thereto
    • H01L2224/11Manufacturing methods

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Wire Bonding (AREA)

Abstract

PURPOSE:To enhance the workability, productivity, reliability, etc., by a method wherein, after spraying a viscous resin containing flux constituent over an alumi-electrode by an ink-jet mechanism, a metal for making a ball bump is bonded onto the resin to be heated and melted down so that a bump may be formed on the alumi-electrode. CONSTITUTION:A protective film 13 is formed on an alumi-electrode 12 partly opened on a semiconductor substrate 11; a contact metallic layer 14 and a barrier metallic layer 15 are successively formed in the same width as that of the surface of the alumi- electrode 12; and then these elements are processed in the specified areas by a method such as etching process. At this time, a resist film 16 is formed on the contact metallic layer 14 and the barrier metallic layer 15 with the space between the areas C and D in the state of an opening part while a viscous resin 17 containing flux constituent is sprayed over the opening part between the areas C and D by the process such as ink-jetting process, etc., to bond-form a resin film 17. Then, a metallic ball 18 previously formed in specific shape enters the opening part to be processed at the melting down temperature thereof so that a knoll bump 19 may be formed. Through these procedures, both workability and productivity can be enhanced while enabling the bump 19 in excellent economic efficiency and high reliability to be formed without fail.

Description

【発明の詳細な説明】 (産業上の利用分野) 本発明は、TAB(Tape Automated B
onding)に用いられる半導体装置のバンプ形成方
法に関するものである。
DETAILED DESCRIPTION OF THE INVENTION (Industrial Application Field) The present invention is directed to TAB (Tape Automated B)
The present invention relates to a method for forming bumps on semiconductor devices used in semiconductor devices.

(従来の技術) 従来、このような分野の技術としては、例えば特開昭5
0−68053号に記載されるものがあった。
(Prior art) Conventionally, as a technology in this field, for example, Japanese Patent Application Laid-open No. 5
There was one described in No. 0-68053.

第2図はかかる従来のバンプ形成を説明する斜視図であ
る。
FIG. 2 is a perspective view illustrating such conventional bump formation.

この図に示すように、粘性物滴下装置Aとバンプを形成
すべき半導体チップBとを用意する。粘性物滴下装置A
は漏斗状になった粘性物収納部1を有しており、その上
部には開口部2、底部には流出口3が設けられている。
As shown in this figure, a viscous material dropping device A and a semiconductor chip B on which bumps are to be formed are prepared. Viscous material dropping device A
has a funnel-shaped viscous material storage section 1, with an opening 2 at the top and an outlet 3 at the bottom.

前記粘性物収納部1は水平移動できる支持体4に支持さ
れ、更に、この収納部1内には流出口3の中心に沿って
粘性物押出し棒5が設けられ、この押出し棒5はアーム
6に支持されて上下できるようになっている。半導体チ
ップBの上面には発光素子7が「日」の字状に配置され
、半導体チン18周辺部にはそれぞれ発光素子7と接続
する電極バッド8が配設されている。
The viscous material storage section 1 is supported by a horizontally movable support 4, and a viscous material pushing rod 5 is provided along the center of the outlet 3 within this storage section 1, and this pushing rod 5 is connected to an arm 6. It is supported by and can be raised and lowered. On the upper surface of the semiconductor chip B, the light emitting elements 7 are arranged in a "h" shape, and around the semiconductor chip 18, electrode pads 8 connected to the light emitting elements 7 are arranged.

そこで、粘性物収納部1内に半田粉末をフラックスで練
った導体ペースト9を投入し、バンプを形成すべき電極
パッド8上方に粘性物滴下装置Aの流出口3を合わせて
導体ペース−ト9を滴下し、バンプlOを形成する。
Therefore, a conductor paste 9 made by kneading solder powder with flux is put into the viscous material storage section 1, and the outlet 3 of the viscous material dripping device A is aligned above the electrode pad 8 on which a bump is to be formed. is dropped to form a bump IO.

以下、そのバンプの形成について第3図を参照しながら
説明する。
Hereinafter, the formation of the bump will be explained with reference to FIG.

(a)導体ペースト9を収納した粘性物収納部の底部流
出口部分に粘性物押出し棒5を設け、半導体チップB上
の電極パッド8の真上に位置を合わせ、(b)該粘性物
押出し棒5を一定距離降下させ、(c)適量の導体ペー
スト9を外部へ押出し、その直後、粘性物押出し棒5を
瞬間的に引き戻すことにより、 (d)流出口外部へ押出された導体ペースト9を、慣性
と自重により一定大の滴状で電極パッド8上に滴下する
(a) A viscous material extrusion rod 5 is provided at the bottom outlet portion of the viscous material storage section in which the conductive paste 9 is stored, and is positioned directly above the electrode pad 8 on the semiconductor chip B; (b) The viscous material extrusion rod By lowering the rod 5 a certain distance, (c) extruding an appropriate amount of conductor paste 9 to the outside, and immediately after that, by instantly pulling back the viscous material extrusion rod 5, (d) the conductor paste 9 extruded to the outside of the outlet. is dropped onto the electrode pad 8 in the form of droplets of a certain size due to inertia and its own weight.

(発明が解決しようとする課B) しかしながら、上記構成の装置は、上下動による機構で
あるため、導体ペーストが液垂する可能性がある。また
、導体ペースト中でアームが上下動を繰り返すので、ペ
ーストの粘度変化が激しく、安定した定量滴下が困難で
あるばかりでなく、導体ペーストを略自然落下的に滴下
するので、バンプ形成速度が遅いという問題があった。
(Problem B to be Solved by the Invention) However, since the device with the above configuration is a mechanism that moves up and down, there is a possibility that the conductive paste may drip. In addition, since the arm repeatedly moves up and down in the conductor paste, the viscosity of the paste changes rapidly, making it difficult to drop a constant amount of water.In addition, the conductor paste is dripped almost naturally, resulting in a slow bump formation speed. There was a problem.

本発明は、以上述べた導体ペーストの液垂れ、粘度変化
、バンプ形成速度が遅い等の問題点を除去し、インクジ
ェット方式によってフラックス成分を含んだ樹脂を付着
させ、金属ボールを各電極に一括供給することにより、
作業性、生産性、信鯨性等の向上を図ることができるバ
ンプ形成方法を提供することを目的とする。
The present invention eliminates the above-mentioned problems such as dripping of the conductor paste, changes in viscosity, and slow bump formation speed, and uses an inkjet method to adhere resin containing a flux component and supply metal balls to each electrode in bulk. By doing so,
It is an object of the present invention to provide a bump forming method that can improve workability, productivity, reliability, etc.

(課題を解決するための手段) 本発明は、上記目的を達成するために、バンプ形成方法
において、半導体素子の主表面に配置された外部引出し
電極へのバンプ形成方法において、前記外部引出し電極
上にコンタクト金属層とバリア金属層を形成し、前記金
属層の一部を開孔してレジスト膜を形成した電極上にフ
ラックス成分を含んだ粘着性のある樹脂を付着させ、金
属ボールを供給して前記樹脂に付着さ、せ、加熱によっ
て前記樹脂を溶融させてバンプを形成するようにしたも
のである。
(Means for Solving the Problems) In order to achieve the above object, the present invention provides a bump forming method for forming a bump on an external lead electrode disposed on the main surface of a semiconductor element. A contact metal layer and a barrier metal layer are formed on the electrode, a resist film is formed by opening a part of the metal layer, a sticky resin containing a flux component is adhered to the electrode, and a metal ball is supplied. The bumps are formed by attaching the bumps to the resin and melting the resin by heating.

(作用) 本発明によれば、上記したように、インクジェット方式
によってアルミ電極上にフラックス成分を含んだ粘着性
のある樹脂を吹き付け、その後、前記樹脂上にボール状
のバンプ組成金属を付着させ、これを加熱することによ
って溶融し、アルミ電極にバンプを形成することができ
る。
(Function) According to the present invention, as described above, a sticky resin containing a flux component is sprayed onto an aluminum electrode by an inkjet method, and then a ball-shaped bump composition metal is attached onto the resin, By heating this, it can be melted and a bump can be formed on the aluminum electrode.

(実施例) 以下、本発明の実施例について図面を参照しながら詳細
に説明する。
(Example) Hereinafter, an example of the present invention will be described in detail with reference to the drawings.

第1図は本発明の実施例を示すバンプ形成工程断面図で
ある。
FIG. 1 is a cross-sectional view of a bump forming process showing an embodiment of the present invention.

まず、第1図(a)に示すように、半導体基板ll上に
設けられたアルミ電極12の一部を開孔した状態で保護
膜13を形成し、アルミ電極12の表面と同じ幅でコン
タクト金属層14及びバリア金属層15を順次形成し、
エツチング等の方法でこれらを所定のエリアに加工し、
図示した形状とする。
First, as shown in FIG. 1(a), a protective film 13 is formed with a hole formed in a part of the aluminum electrode 12 provided on the semiconductor substrate 11, and a contact is made with the same width as the surface of the aluminum electrode 12. sequentially forming a metal layer 14 and a barrier metal layer 15;
Process these into predetermined areas using methods such as etching,
Shape as shown.

ここで、前記コンタクト金属層14及びバリア金属層1
5に対してホトリソ技術等により、C,D間のエリアを
開孔した状態でレジスト膜16を形成する。続いて、上
記エリアC,D間の開孔部にインクジェット等の方法で
、フラックス〔松ヤニ(アビエチン酸)〕成分を含む粘
着性を持った樹脂17を吹き付け、付着形成する。
Here, the contact metal layer 14 and the barrier metal layer 1
5, a resist film 16 is formed with holes formed in the area between C and D by photolithography or the like. Subsequently, a sticky resin 17 containing a flux (pine tar (abietic acid)) component is sprayed onto the opening between the areas C and D using an inkjet method or the like to adhere thereto.

そこで、予め所定の形状に加工されたIn、 5nPb
、 Au  Sn、 Au  Si等の金属ボール18
をビンセ)ト等の治具によって前記開孔部分に投入する
か、半導体基板11の表面に前記金属ボール18を供給
して転がし、開孔部分に入れる。これにより、第1図(
a)に示した状態に前記樹脂17によって接着保持し、
バンプとなる素材として、アルミ電極12の上に取り付
ける。
Therefore, In, 5nPb, which was processed into a predetermined shape in advance,
, Au Sn, Au Si, etc. metal ball 18
The metal balls 18 are either supplied to the surface of the semiconductor substrate 11 and rolled to be placed into the openings. As a result, Figure 1 (
Adhesively maintain the state shown in a) with the resin 17,
It is attached on top of the aluminum electrode 12 as a material that will become a bump.

次に、第1図(b)に示すように、前記金属ボール18
をその溶融温度(例えば230°C前後)で処理し、円
丘状のバンプ19を形成する。
Next, as shown in FIG. 1(b), the metal ball 18
is processed at its melting temperature (for example, around 230° C.) to form a circular cone-shaped bump 19.

なお、保護膜13の開孔部であるC、 D間の距離を変
えることにより、金属層14.15の先端部及び断面部
をバンプ19の外部に露出させるか、内部に含めるか、
どちらの状態にも選定することができる。勿論、その個
数も限定されるものではない。
Note that by changing the distance between the openings C and D of the protective film 13, it is possible to determine whether the tip and cross section of the metal layer 14.15 are exposed to the outside of the bump 19 or included inside.
Either state can be selected. Of course, the number is not limited either.

また、前記金属ボール18についてもバンプ19の大き
さ(面積)や高さ等によって、種々の大きさを選定でき
ることは言うまでもない。
Furthermore, it goes without saying that various sizes of the metal balls 18 can be selected depending on the size (area), height, etc. of the bumps 19.

なお、前記樹脂17はフラックスとして作用し、加熱に
よって蒸発消滅するものである。更にその後、有機溶剤
等によってレジスト膜16が溶解除去すると同時に、フ
ラックスとしての前記樹脂17の残渣は、更に清浄に除
去される。
The resin 17 acts as a flux and evaporates and disappears when heated. Furthermore, after that, the resist film 16 is dissolved and removed using an organic solvent or the like, and at the same time, the residue of the resin 17 as a flux is removed even more cleanly.

以上の工程において、溶融時のみでなく、上記加熱処理
は不活性雰囲気で行うのが好適である。
In the above steps, it is preferable that the heat treatment is performed not only during melting but also in an inert atmosphere.

なお、本発明は上記実施例に限定されるものではなく、
本発明の趣旨に基づいて種々の変形が可能であり、これ
らを本発明の範囲から排除するものではない。
Note that the present invention is not limited to the above embodiments,
Various modifications are possible based on the spirit of the present invention, and these are not excluded from the scope of the present invention.

(発明の効果) 以上、詳細に説明したように、本発明によれば、インク
ジェット方式によって金属電極上にフランクス成分を含
んだ粘着性のある樹脂を吹き付け、その後、前記樹脂上
にボール状のバンプ組成金属を付着させ、これを加熱す
ることによって溶融し、金属電極にバンプを形成するこ
とができる。
(Effects of the Invention) As described above in detail, according to the present invention, a sticky resin containing a Franks component is sprayed onto a metal electrode by an inkjet method, and then a ball-shaped bump is formed on the resin. A composition metal can be deposited and melted by heating to form a bump on the metal electrode.

従って、バンプ形成における作業性、生産性が向上し、
経済的に優れ、かつ信転性の高いバンプを確実に形成す
ることができる。
Therefore, workability and productivity in bump formation are improved,
It is possible to reliably form bumps that are economically superior and have high reliability.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明の実施例を示すバンプ形成工程断面図、
第2図は従来のバンプ形成を説明する斜視図、第3図は
そのバンプ形成状態を説明する図である。 11・・・半導体基板、12・・・アルミ電橋、13・
・・保護膜、14・・・コンタクト金属層、15・・・
バリア金属層、16・・・レジスト膜、17・・・フラ
ンクス成分を含んだ粘着性のある樹脂、18・・・金属
ボール、19・・・バンプ。
FIG. 1 is a sectional view of a bump forming process showing an embodiment of the present invention;
FIG. 2 is a perspective view illustrating conventional bump formation, and FIG. 3 is a diagram illustrating the bump formation state. 11... Semiconductor substrate, 12... Aluminum electric bridge, 13.
...Protective film, 14... Contact metal layer, 15...
Barrier metal layer, 16... Resist film, 17... Adhesive resin containing Franks component, 18... Metal ball, 19... Bump.

Claims (1)

【特許請求の範囲】  半導体素子の主表面に配置された外部引出し電極への
バンプ形成方法において、 (a)前記外部引出し電極上にコンタクト金属層とバリ
ア金属層を形成し、 (b)更に前記金属層の一部を開孔してレジスト膜を形
成した電極上にフラックス成分を含んだ粘着性のある樹
脂を付着させ、 (c)金属ボールを供給して前記樹脂に付着させ、(d
)加熱によって前記樹脂を溶融させてバンプを形成する
ことを特徴とするバンプ形成方法。
[Claims] A method for forming bumps on external lead-out electrodes arranged on the main surface of a semiconductor device, comprising: (a) forming a contact metal layer and a barrier metal layer on the external lead-out electrodes; (b) further comprising the steps of: Adhering a sticky resin containing a flux component onto the electrode with a resist film formed by opening a part of the metal layer, (c) supplying a metal ball and adhering it to the resin, (d)
) A bump forming method, which comprises forming bumps by melting the resin by heating.
JP1266312A 1989-10-16 1989-10-16 Bump formation Pending JPH03129830A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1266312A JPH03129830A (en) 1989-10-16 1989-10-16 Bump formation

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1266312A JPH03129830A (en) 1989-10-16 1989-10-16 Bump formation

Publications (1)

Publication Number Publication Date
JPH03129830A true JPH03129830A (en) 1991-06-03

Family

ID=17429179

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1266312A Pending JPH03129830A (en) 1989-10-16 1989-10-16 Bump formation

Country Status (1)

Country Link
JP (1) JPH03129830A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6904673B1 (en) 2002-09-24 2005-06-14 International Business Machines Corporation Control of flux by ink stop line in chip joining
JP2006253485A (en) * 2005-03-11 2006-09-21 Hitachi Metals Ltd Coating method of paste for mounting packaging sphere, its coating method, and bump forming method
JP2007250849A (en) * 2006-03-16 2007-09-27 Casio Comput Co Ltd Method of manufacturing semiconductor device
JP2009253088A (en) * 2008-04-08 2009-10-29 Hitachi Plant Technologies Ltd Flux forming device

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6904673B1 (en) 2002-09-24 2005-06-14 International Business Machines Corporation Control of flux by ink stop line in chip joining
JP2006253485A (en) * 2005-03-11 2006-09-21 Hitachi Metals Ltd Coating method of paste for mounting packaging sphere, its coating method, and bump forming method
JP2007250849A (en) * 2006-03-16 2007-09-27 Casio Comput Co Ltd Method of manufacturing semiconductor device
JP2009253088A (en) * 2008-04-08 2009-10-29 Hitachi Plant Technologies Ltd Flux forming device

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