JPH03124770A - Visible light-sensitive resin composition - Google Patents
Visible light-sensitive resin compositionInfo
- Publication number
- JPH03124770A JPH03124770A JP26338589A JP26338589A JPH03124770A JP H03124770 A JPH03124770 A JP H03124770A JP 26338589 A JP26338589 A JP 26338589A JP 26338589 A JP26338589 A JP 26338589A JP H03124770 A JPH03124770 A JP H03124770A
- Authority
- JP
- Japan
- Prior art keywords
- group
- visible light
- formula
- sensitive
- resin composition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000011342 resin composition Substances 0.000 title claims description 16
- -1 p-aminobenzylidene Chemical group 0.000 claims abstract description 18
- 125000005520 diaryliodonium group Chemical group 0.000 claims abstract description 7
- 125000002252 acyl group Chemical group 0.000 claims abstract description 5
- 125000004453 alkoxycarbonyl group Chemical group 0.000 claims abstract description 5
- 125000000656 azaniumyl group Chemical group [H][N+]([H])([H])[*] 0.000 claims abstract description 5
- 125000004093 cyano group Chemical group *C#N 0.000 claims abstract description 5
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims abstract description 4
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 3
- 150000001875 compounds Chemical class 0.000 claims description 8
- 239000000126 substance Substances 0.000 claims description 3
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 2
- 239000000463 material Substances 0.000 abstract description 14
- 229920000642 polymer Polymers 0.000 abstract description 11
- 230000035945 sensitivity Effects 0.000 abstract description 9
- 239000011347 resin Substances 0.000 abstract description 7
- 229920005989 resin Polymers 0.000 abstract description 7
- 238000007639 printing Methods 0.000 abstract description 3
- OZLBDYMWFAHSOQ-UHFFFAOYSA-N diphenyliodanium Chemical compound C=1C=CC=CC=1[I+]C1=CC=CC=C1 OZLBDYMWFAHSOQ-UHFFFAOYSA-N 0.000 abstract description 2
- 238000013329 compounding Methods 0.000 abstract 1
- 238000001459 lithography Methods 0.000 abstract 1
- 238000002360 preparation method Methods 0.000 abstract 1
- 239000000203 mixture Substances 0.000 description 12
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 6
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 6
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 6
- 239000002253 acid Substances 0.000 description 6
- 238000010438 heat treatment Methods 0.000 description 5
- 230000015572 biosynthetic process Effects 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 229920001577 copolymer Polymers 0.000 description 3
- 239000000178 monomer Substances 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- 230000003287 optical effect Effects 0.000 description 3
- 150000003839 salts Chemical class 0.000 description 3
- AZQWKYJCGOJGHM-UHFFFAOYSA-N 1,4-benzoquinone Chemical compound O=C1C=CC(=O)C=C1 AZQWKYJCGOJGHM-UHFFFAOYSA-N 0.000 description 2
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- VZCYOOQTPOCHFL-OWOJBTEDSA-N Fumaric acid Chemical compound OC(=O)\C=C\C(O)=O VZCYOOQTPOCHFL-OWOJBTEDSA-N 0.000 description 2
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 2
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- 150000001336 alkenes Chemical class 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 150000002148 esters Chemical group 0.000 description 2
- 239000003999 initiator Substances 0.000 description 2
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 2
- 229910052753 mercury Inorganic materials 0.000 description 2
- CERQOIWHTDAKMF-UHFFFAOYSA-M methacrylate group Chemical group C(C(=C)C)(=O)[O-] CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 2
- JRZJOMJEPLMPRA-UHFFFAOYSA-N olefin Natural products CCCCCCCC=C JRZJOMJEPLMPRA-UHFFFAOYSA-N 0.000 description 2
- QHGUPRQTQITEPO-UHFFFAOYSA-N oxan-2-yl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC1CCCCO1 QHGUPRQTQITEPO-UHFFFAOYSA-N 0.000 description 2
- QIWKUEJZZCOPFV-UHFFFAOYSA-N phenyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC1=CC=CC=C1 QIWKUEJZZCOPFV-UHFFFAOYSA-N 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- BTANRVKWQNVYAZ-SCSAIBSYSA-N (2R)-butan-2-ol Chemical compound CC[C@@H](C)O BTANRVKWQNVYAZ-SCSAIBSYSA-N 0.000 description 1
- AAFXQFIGKBLKMC-KQQUZDAGSA-N (e)-3-[4-[(e)-2-carboxyethenyl]phenyl]prop-2-enoic acid Chemical group OC(=O)\C=C\C1=CC=C(\C=C\C(O)=O)C=C1 AAFXQFIGKBLKMC-KQQUZDAGSA-N 0.000 description 1
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- JAHNSTQSQJOJLO-UHFFFAOYSA-N 2-(3-fluorophenyl)-1h-imidazole Chemical compound FC1=CC=CC(C=2NC=CN=2)=C1 JAHNSTQSQJOJLO-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- DMQXJIYNJDYSHM-UHFFFAOYSA-N 2-[(2-methylpropan-2-yl)oxy]-3-phenylprop-2-enoic acid Chemical compound CC(C)(C)OC(C(O)=O)=CC1=CC=CC=C1 DMQXJIYNJDYSHM-UHFFFAOYSA-N 0.000 description 1
- CPELXLSAUQHCOX-UHFFFAOYSA-M Bromide Chemical compound [Br-] CPELXLSAUQHCOX-UHFFFAOYSA-M 0.000 description 1
- BUDQDWGNQVEFAC-UHFFFAOYSA-N Dihydropyran Chemical compound C1COC=CC1 BUDQDWGNQVEFAC-UHFFFAOYSA-N 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- 206010034972 Photosensitivity reaction Diseases 0.000 description 1
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- UIZLQMLDSWKZGC-UHFFFAOYSA-N cadmium helium Chemical compound [He].[Cd] UIZLQMLDSWKZGC-UHFFFAOYSA-N 0.000 description 1
- 150000001735 carboxylic acids Chemical class 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 238000003776 cleavage reaction Methods 0.000 description 1
- 238000007334 copolymerization reaction Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical group [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 description 1
- 239000001530 fumaric acid Substances 0.000 description 1
- 125000000524 functional group Chemical group 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 239000000976 ink Substances 0.000 description 1
- MGFYSGNNHQQTJW-UHFFFAOYSA-N iodonium Chemical compound [IH2+] MGFYSGNNHQQTJW-UHFFFAOYSA-N 0.000 description 1
- 229920002521 macromolecule Polymers 0.000 description 1
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 1
- 239000011976 maleic acid Substances 0.000 description 1
- DZVCFNFOPIZQKX-LTHRDKTGSA-M merocyanine Chemical compound [Na+].O=C1N(CCCC)C(=O)N(CCCC)C(=O)C1=C\C=C\C=C/1N(CCCS([O-])(=O)=O)C2=CC=CC=C2O\1 DZVCFNFOPIZQKX-LTHRDKTGSA-M 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- LVHBHZANLOWSRM-UHFFFAOYSA-N methylenebutanedioic acid Natural products OC(=O)CC(=C)C(O)=O LVHBHZANLOWSRM-UHFFFAOYSA-N 0.000 description 1
- QVEIBLDXZNGPHR-UHFFFAOYSA-N naphthalene-1,4-dione;diazide Chemical class [N-]=[N+]=[N-].[N-]=[N+]=[N-].C1=CC=C2C(=O)C=CC(=O)C2=C1 QVEIBLDXZNGPHR-UHFFFAOYSA-N 0.000 description 1
- 230000010355 oscillation Effects 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- 238000006303 photolysis reaction Methods 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 230000036211 photosensitivity Effects 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 239000002798 polar solvent Substances 0.000 description 1
- 125000003367 polycyclic group Chemical group 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- 238000011084 recovery Methods 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 230000007017 scission Effects 0.000 description 1
- 230000001235 sensitizing effect Effects 0.000 description 1
- GGCZERPQGJTIQP-UHFFFAOYSA-N sodium;9,10-dioxoanthracene-2-sulfonic acid Chemical compound [Na+].C1=CC=C2C(=O)C3=CC(S(=O)(=O)O)=CC=C3C(=O)C2=C1 GGCZERPQGJTIQP-UHFFFAOYSA-N 0.000 description 1
- 230000007928 solubilization Effects 0.000 description 1
- 238000005063 solubilization Methods 0.000 description 1
- PXQLVRUNWNTZOS-UHFFFAOYSA-N sulfanyl Chemical class [SH] PXQLVRUNWNTZOS-UHFFFAOYSA-N 0.000 description 1
- 150000003512 tertiary amines Chemical class 0.000 description 1
- 150000003918 triazines Chemical class 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Compositions Of Macromolecular Compounds (AREA)
Abstract
Description
【発明の詳細な説明】
産業上の利用分野
本発明は、優れた感光度を示す光可溶性樹脂組成物、さ
らに詳しく述べれば、光照射により強酸を発生しうる物
質と酸により容易に加水分解を起こしうる官能基を持つ
高分子物質を含有することを特徴とする感可視光樹脂組
成物に関するものである。DETAILED DESCRIPTION OF THE INVENTION Field of Industrial Application The present invention relates to a photo-soluble resin composition that exhibits excellent photosensitivity, and more specifically, to a photo-soluble resin composition that can generate a strong acid when irradiated with light and a substance that can be easily hydrolyzed by an acid. The present invention relates to a visible light-sensitive resin composition containing a polymeric substance having a functional group that can be activated.
従来の技術
感可視光樹脂組成物は、可視発振波長を持つし−ザを光
源とする諸技術に用いられる。レーザ光による記録は、
電子計算機により制御できるので、直接描画が可能とな
り、印刷製版、光ビデオディスク原版作製などに利用さ
れている。さらには、レーザ光の単色性に由来する高解
像性のホログラム記録も重要である。このような目的に
適した記録材料には、レーザ光に高感度で感光し、しか
も高い解像性を示すことが要求される。また、実際に使
用するに当たっては、長期にわたって保存安定性に優れ
ていることも必要となる。Conventional technology-sensitive visible light resin compositions are used in various technologies in which a laser having a visible oscillation wavelength is used as a light source. Recording by laser light is
Since it can be controlled by an electronic computer, direct drawing is possible, and it is used for printing plate making, optical video disk original plate production, etc. Furthermore, high-resolution hologram recording derived from the monochromaticity of laser light is also important. A recording material suitable for such purposes is required to be highly sensitive to laser light and to exhibit high resolution. Furthermore, in actual use, it is also necessary that the material has excellent storage stability over a long period of time.
感光性樹脂はレリーフ画像形成に特徴を持つので、この
点を生かした記録材料に宵月であるが、従来の感光性樹
脂の多くはフォトレジスト材料、インキ、塗料、フェス
、印刷製版材料などに利用されており、それらの感光波
長は紫外線領域にとどまっていた。可視レーザ光に感光
する樹脂としては、これまでに、光重合型、光架橋型の
材料が提案されている。例えば、特開昭52−1346
92号においては、多環キノンと3級アミンからなる光
重合組成物、特開昭54−151024号においては、
メロシアニンとトリアジン誘導体を光重合開始剤とする
組成物、特開昭54−155重合組成物、特開昭60−
22129号においては、p−フェニレンジアクリル酸
残基とビリリウム塩などの増感剤とからなる光架橋性高
分子が示されている。これらは、可視光に対して比較的
高い感度で感光するものであるが、いわゆるネガ型に属
し、解像性に劣るという難点を有する。Photosensitive resins have the characteristic of forming relief images, so they can be used as recording materials that take advantage of this feature, but many conventional photosensitive resins can be used for photoresist materials, inks, paints, festivals, printing plate materials, etc. The wavelengths of light they are sensitive to remain in the ultraviolet range. Photopolymerizable and photocrosslinkable materials have been proposed as resins sensitive to visible laser light. For example, JP-A-52-1346
No. 92 discloses a photopolymerizable composition comprising a polycyclic quinone and a tertiary amine, and JP-A-54-151024 discloses
Composition using merocyanine and triazine derivative as a photopolymerization initiator, JP-A-155-1989 polymerization composition, JP-A-1989-1999-
No. 22129 discloses a photocrosslinkable polymer comprising a p-phenylene diacrylic acid residue and a sensitizer such as a biryllium salt. Although these are sensitive to visible light with relatively high sensitivity, they belong to the so-called negative type and have the disadvantage of poor resolution.
これに対して、光可溶性樹脂組成物(ポジ型)は解像性
が非常に優れており、その代表例としての0−ナフトキ
ノンジアジド類が実用に供せられていることは周知の通
りである。しかしながら、この感光物は光学的な増感を
行うことは知られておらず、可視光領域ではきわめて低
感度であるという問題点を存している。そこで近年、0
−ナフトキノンジアジド類を使用しない高感度光可溶性
樹脂組成物の提案がなされている。特開昭57−176
035号では、メタクリレート側鎖にオレフィンを導入
したポリマーとメルカプト酸と反応開始剤からなる組成
物、特開59−45439号では、光照射で発生した酸
を触媒として加水分解を起こすポリ−p−t−ブトキシ
カルボキシルスチレンからなる組成物、特開昭61−1
67945号では、光照射で発生した酸を触媒として加
水分解を起こすシリルエーテル基を持つ化合物からなる
組成物などが示されている。しかしながら、いずれも長
波長光に感するものではなく、レーザ用感光材料や銀塩
代替材料などとして利用するにはなお一層高い感度が望
まれていた。On the other hand, it is well known that photo-soluble resin compositions (positive type) have extremely excellent resolution, and 0-naphthoquinone diazides, which are representative examples thereof, are in practical use. . However, this photosensitive material is not known to be optically sensitized and has the problem of extremely low sensitivity in the visible light region. Therefore, in recent years, 0
- Highly sensitive photo-soluble resin compositions that do not use naphthoquinone diazides have been proposed. Japanese Patent Publication No. 57-176
No. 035 discloses a composition comprising a polymer having an olefin introduced into the methacrylate side chain, mercapto acid, and a reaction initiator, and JP-A No. 59-45439 discloses a composition comprising a polymer having an olefin introduced into the methacrylate side chain, and JP-A No. 59-45439 discloses a poly-p- Composition consisting of t-butoxycarboxylstyrene, JP-A-61-1
No. 67945 discloses a composition comprising a compound having a silyl ether group that undergoes hydrolysis using an acid generated by light irradiation as a catalyst. However, none of them are sensitive to long wavelength light, and even higher sensitivity has been desired for use as photosensitive materials for lasers, silver salt substitute materials, and the like.
−GOORCI)
(式中、Rは2−テトラヒドロフリル基または2−ジヒ
ドロピラニル基を示す)
で表される構造単位を少なくとも一つ有する分子@to
oo 〜1ooooooの範囲にある高分子化合物1部
と、(B)一般式
発明が解決しようとする問題点゛
本発明は、可視光に感光して可溶化する樹脂組成物に関
するものであって、しかも感光速度及び解像性に優れた
特性を併せ持つ感光材料を提供する事を目的としてなさ
れたものである。-GOORCI) (wherein, R represents a 2-tetrahydrofuryl group or a 2-dihydropyranyl group)
1 part of a polymer compound in the range of oo to 1ooooooo and (B) general formula Problems to be solved by the invention ゛The present invention relates to a resin composition that is solubilized by being exposed to visible light, Furthermore, the invention was made with the aim of providing a photosensitive material that has both excellent photosensitive speed and resolution.
問題点を解決するための手段
本発明者らは、高感度、高解像性を有し、保存安定性の
良い感可視光樹脂組成物を得るべく鋭意研究を重ねた結
果、本発明を成すに至ったものである。Means for Solving the Problems The present inventors have completed the present invention as a result of intensive research to obtain a visible light-sensitive resin composition that has high sensitivity, high resolution, and good storage stability. This is what led to this.
すなわち、本発明は、(A)一般式
(式中、R,、R1は低級アルキル基を示し、Xは水素
原子、フェニル基、アシル基、シアノ基、アンモニオ基
またはアルコキシカルボニル基から選ばれた残基であり
、Yはアシル基、シアノ基、アンモニオ基またはアルコ
キシカルボニル基から選ばれた残基であり、nは0また
は1である)で表されるp−アミノベンジリデン誘導体
o、03〜0.3部と、(C)ジアリールヨードニウム
塩0.02〜0.3部、からなることを特徴とする感可
視光樹脂組成物に関するものである。That is, the present invention provides a compound of the general formula (A) (wherein R, R1 represents a lower alkyl group, and X is selected from a hydrogen atom, a phenyl group, an acyl group, a cyano group, an ammonio group, or an alkoxycarbonyl group) p-aminobenzylidene derivative o, 03-0 .3 parts and (C) diaryliodonium salt 0.02 to 0.3 parts.
本発明の光可溶性樹脂組成物を構成するエステル残基を
少なくとも一つ有する高分子化合物としては、アクリル
酸、メタクリル酸、イタコン酸、マレイン酸、フマル酸
などのエステル結合が切断さする特徴を持つものである
。具体的には、これらカルボン酸の2−テトラヒドロフ
リルエステル及び2−ジヒドロピラニルエステルをあげ
ることが出来る。本発明に用いられる高分子化合物とし
ては、これらの単量体のみによる重合体のほかに、(メ
タ)アクリルエステル、(メタ)アクリルアミド、置換
(メタ)アクリルアミド、スチレンなどのビニル系単量
体を共重合させたものが用いられる。これらの共重合性
単量体の種類と共重合比を選択することによって、目的
とする感光性樹脂組成物の特性を調整することができる
。Examples of the polymer compound having at least one ester residue constituting the photo-soluble resin composition of the present invention include acrylic acid, methacrylic acid, itaconic acid, maleic acid, and fumaric acid, which have the characteristic of cleavage of ester bonds. It is something. Specifically, 2-tetrahydrofuryl ester and 2-dihydropyranyl ester of these carboxylic acids can be mentioned. In addition to polymers made only of these monomers, the polymer compounds used in the present invention include polymers containing vinyl monomers such as (meth)acrylic ester, (meth)acrylamide, substituted (meth)acrylamide, and styrene. A copolymerized product is used. By selecting the type and copolymerization ratio of these copolymerizable monomers, the desired characteristics of the photosensitive resin composition can be adjusted.
成分Bであるジアリールヨードニウム塩は光照射によっ
て酸を発生する性質を持つ。本発明で用いられる化合物
としては、Macromolecules、10.13
07(1977)に記載の化合物、例えば、ジフェニル
ヨードニウム、ジトリルヨードニウム、フェニル(p−
アニリル)ヨニウム、などのヨードニウムのクロリド、
プロミドあるいはホウフッ化塩、ヘキサフルオロホスフ
ェート塩、ヘキサフルオロアルセネート塩をあげること
ができる。Component B, diaryliodonium salt, has the property of generating acid when irradiated with light. Compounds used in the present invention include Macromolecules, 10.13
07 (1977), such as diphenyliodonium, ditolyliodonium, phenyl (p-
chlorides of iodonium, such as anilyl) ionium,
Mention may be made of bromide or borofluoride salts, hexafluorophosphate salts, and hexafluoroarsenate salts.
成分Cであるp−ジアルキルアミノベンジリデン誘導体
はジアリールヨードニウム塩の光分解を増感する機能を
有する。一般式(II)で表される化合物を以下に例示
する。Component C, a p-dialkylaminobenzylidene derivative, has the function of sensitizing the photodecomposition of diaryliodonium salts. Examples of compounds represented by general formula (II) are shown below.
本発明の光可溶性樹脂組成物に含有される成分Bのジア
リールヨードニウム塩の量は、高分子化合物ニジアリー
ルヨードニウム塩の重量比でに〇、03からt:o、3
までの範囲をとることがる。The amount of the diaryliodonium salt of component B contained in the photosoluble resin composition of the present invention is determined by the weight ratio of the polymer compound diaryliodonium salt from 0.03 to t:o.3.
It can range up to.
本発明の光可溶性樹脂組成物には、所望に応じて公知の
バインダー、顔料、可塑剤などの添加剤を加えてもよい
。If desired, known additives such as binders, pigments, and plasticizers may be added to the photosoluble resin composition of the present invention.
本発明の感光性組成物に適した光源としては、高圧水銀
灯、超高圧水銀灯、高圧キャノン灯、ハロゲンランプの
他、ヘリウム−カドミウムレーザ、アルゴンレーザが利
用できる。これらの光源を用いて所定時間露光した後、
樹脂組成物を暗所で加熱する。加熱温度は60〜150
℃、好ましくは、80〜130℃である。これ以下であ
れば、画像形成に要する時間は著しく長くなるし、これ
以上にしても画像形成の時間を短縮することができない
。加熱時間は加熱温度に依存するが、1〜20分、好ま
しくは、2〜10分である。また、加熱を水蒸気で飽和
した状態で行うと、画像形成に必要な露光時間を短縮す
ることが可能となり、さらに、本発明の光記録材料の感
度を向上させることが出来る。加熱後、水、アルコール
などの極性溶媒を含有する溶媒で現像することによって
、露光部が可溶化し、高解像性画像が形成される。As light sources suitable for the photosensitive composition of the present invention, in addition to high-pressure mercury lamps, ultra-high-pressure mercury lamps, high-pressure cannon lamps, and halogen lamps, helium-cadmium lasers and argon lasers can be used. After exposure for a predetermined time using these light sources,
Heat the resin composition in the dark. Heating temperature is 60-150
℃, preferably 80 to 130℃. If it is less than this, the time required for image formation becomes extremely long, and even if it is more than this, the time required for image formation cannot be shortened. The heating time depends on the heating temperature, but is 1 to 20 minutes, preferably 2 to 10 minutes. Further, when heating is performed in a state saturated with water vapor, it is possible to shorten the exposure time required for image formation, and furthermore, it is possible to improve the sensitivity of the optical recording material of the present invention. After heating, the exposed area is solubilized by developing with a solvent containing a polar solvent such as water or alcohol, and a high-resolution image is formed.
発明の効果
本発明の感可視光可溶性樹脂組成物は、従来の可−祝勝
光性樹脂よりも優れた感度を有しているので、平版や凸
版用製版材料、各種レリーフの作製、ホログラムの作製
など幅広い分野に応用できる。Effects of the Invention The sensitive and visible light-soluble resin composition of the present invention has a sensitivity superior to that of conventional photosensitive resins, so it can be used in the production of plate-making materials for planography and letterpress, the production of various reliefs, and the production of holograms. It can be applied to a wide range of fields.
以下、実施例をもって本発明をさらに詳細に説明するが
、本発明は、これに限定されるものではない。EXAMPLES Hereinafter, the present invention will be explained in more detail with reference to Examples, but the present invention is not limited thereto.
実施例1〜3
メタクリル酸26.3gに塩化メチレン50m1.p−
)ルエンスルホン酸ピリジン塩0.8gを加えて撹はん
し、塩化メチレン30 m lで希釈した3、4−ジヒ
ドロピラン32.Ofを滴下し、約2時間室温で撹はん
した。反応液を常法により処理した後、減圧蒸留するこ
とによりメタクリル酸テトラヒドロピラニル39.3E
を得た。得られたエステル2.4gをメタクリル酸フェ
ニル0゜6gとともにベンゼン15m1中でラジカル重
合させ、共重合体2.6gを得た。この共重合体を−ト
と表1に示した増感剤10重量%を添加し、陽極酸化し
たアルミ板上にスピン塗布した。80℃で10分間プリ
ベークした後、ステップ・タブレット(イーストマンコ
ダック社製)を通してキセノン灯で20秒露光した。こ
れを125℃、10分間ポストベークした後、メタノー
ルで現像した。可溶化段数をまきめで表1に示す。Examples 1 to 3 26.3 g of methacrylic acid and 50 ml of methylene chloride. p-
) 3,4-dihydropyran 32.) Added 0.8 g of pyridine luenesulfonic acid salt, stirred, and diluted with 30 ml of methylene chloride. Of was added dropwise, and the mixture was stirred at room temperature for about 2 hours. After treating the reaction solution in a conventional manner, it was distilled under reduced pressure to obtain tetrahydropyranyl methacrylate 39.3E.
I got it. 2.4 g of the obtained ester was radically polymerized with 0.6 g of phenyl methacrylate in 15 ml of benzene to obtain 2.6 g of a copolymer. This copolymer was added with 10% by weight of the sensitizer shown in Table 1, and spin-coated onto an anodized aluminum plate. After prebaking at 80° C. for 10 minutes, it was exposed to xenon light for 20 seconds through a Step Tablet (manufactured by Eastman Kodak). This was post-baked at 125° C. for 10 minutes and then developed with methanol. Table 1 shows the number of solubilization stages in detail.
実施例4
実施例1で得たメタクリル酸テトラヒドロピラニルエス
テルとメタクリル酸フェニルの共重合体0.5gを実施
例1で用いた増感剤o、05gとジフェニルヨードニウ
ムヘキサフルオロフォスフェート0.1(とともにジグ
ライムに溶解した。その溶液をガラス板上に膜厚約1方
でガラス板上に膜厚的1μmにスピン塗布し、80℃で
10分間プリベークを行った。これをアルゴンレーザの
488nmの輝線を用い、第1図のような光学系で交差
角22°で露光した後、100℃で10分間ポストベー
クしたものをl−ブタノール:メタノール=1:1の混
合液で現像した。さらに、ヘキ表1 各種増感剤を用い
たときの感度
=31673.Mw/Mn=6.45)を合成し、溶媒
としてベンゼン、沈澱剤としてヘキサンを用いて沈澱法
により10のフラクションに分別した。Example 4 0.5 g of the copolymer of tetrahydropyranyl methacrylate and phenyl methacrylate obtained in Example 1 was mixed with 0.5 g of the sensitizer o used in Example 1 and 0.1 g of diphenyliodonium hexafluorophosphate ( The solution was spin-coated onto a glass plate to a film thickness of about 1 μm, and prebaked at 80°C for 10 minutes. After exposure with an optical system as shown in Figure 1 at an intersection angle of 22°, the product was post-baked at 100°C for 10 minutes and developed with a mixture of l-butanol:methanol = 1:1. 1 (sensitivity using various sensitizers=31673.Mw/Mn=6.45) was synthesized and fractionated into 10 fractions by a precipitation method using benzene as a solvent and hexane as a precipitant.
回収率の多かった4つのフラクションについて、実施例
1と同様な組成で増感剤とジフェニルヨードニウム・ヘ
キサフルオロフォスフェートと混合して感光性組成物と
し、それぞれについて実施例4と同様にしてホログラム
を得た。それぞれのフラクションの重量平均分子量、分
散度、露光エネルギー並びに回折効率を表2にまとめて
示す。The four fractions with high recovery rates were mixed with a sensitizer and diphenyliodonium hexafluorophosphate in the same composition as in Example 1 to form a photosensitive composition, and holograms were produced in the same manner as in Example 4 for each fraction. Obtained. Table 2 summarizes the weight average molecular weight, dispersity, exposure energy, and diffraction efficiency of each fraction.
表2 ホログラム形成における分子量の効果サンでリン
スすることによりホログラムを得た。Table 2 Effect of Molecular Weight on Hologram Formation Holograms were obtained by rinsing with sun.
このホログラムの回折効率は、露光エネルギー120
m J / c m″のときに最大で、17.5%であ
った。The diffraction efficiency of this hologram is
The maximum value was 17.5% when mJ/cm''.
実施例5〜8Examples 5-8
第1図は本発明においてホログラム作製に使用される装
置の1例を略式に示した説明図である。
1:レーザ発振器
2:コリメータ
3−:反射ミラー
4:ビームスプリッタ−
5:感光材
6:レーザビームFIG. 1 is an explanatory diagram schematically showing an example of an apparatus used for producing a hologram in the present invention. 1: Laser oscillator 2: Collimator 3: Reflection mirror 4: Beam splitter 5: Photosensitive material 6: Laser beam
Claims (1)
ドロピラニル基を示す) で表される構造単位を少なくとも一つ有する分子量10
00〜1000000の範囲にある高分子化合物1部と
、 (B)一般式 ▲数式、化学式、表等があります▼ (式中、R_1、R_2は低級アルキル基を示し、Xは
水素原子、フェニル基、アシル基、シアノ基、アンモニ
オ基またはアルコキシカルボニル基から選ばれた残基で
あり、Yはアシル基、シアノ基、アンモニオ基またはア
ルコキシカルボニル基から選ばれた残基であり、nは0
または1である)で表されるp−アミノベンジリデン誘
導体0.03〜0.3部と、 (C)ジアリールヨードニウム塩0.02〜0.3部、
からなることを特徴とする感可視光樹脂組成物。[Scope of Claims] (A) A compound having a molecular weight of 10 having at least one structural unit represented by the general formula -COOR (wherein R represents a 2-tetrahydrofuryl group or a 2-dihydropyranyl group)
(B) General formula ▲ Numerical formula, chemical formula, table, etc. ▼ (In the formula, R_1 and R_2 represent a lower alkyl group, and X represents a hydrogen atom or a phenyl group.) , an acyl group, a cyano group, an ammonio group, or an alkoxycarbonyl group, Y is a residue selected from an acyl group, a cyano group, an ammonio group, or an alkoxycarbonyl group, and n is 0
or 1) 0.03 to 0.3 parts of a p-aminobenzylidene derivative represented by (C) 0.02 to 0.3 parts of a diaryliodonium salt,
A visible light-sensitive resin composition comprising:
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1263385A JPH0668055B2 (en) | 1989-10-09 | 1989-10-09 | Visible light resin composition |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1263385A JPH0668055B2 (en) | 1989-10-09 | 1989-10-09 | Visible light resin composition |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH03124770A true JPH03124770A (en) | 1991-05-28 |
JPH0668055B2 JPH0668055B2 (en) | 1994-08-31 |
Family
ID=17388755
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1263385A Expired - Lifetime JPH0668055B2 (en) | 1989-10-09 | 1989-10-09 | Visible light resin composition |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0668055B2 (en) |
-
1989
- 1989-10-09 JP JP1263385A patent/JPH0668055B2/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
JPH0668055B2 (en) | 1994-08-31 |
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