JPH03122532U - - Google Patents
Info
- Publication number
- JPH03122532U JPH03122532U JP3091490U JP3091490U JPH03122532U JP H03122532 U JPH03122532 U JP H03122532U JP 3091490 U JP3091490 U JP 3091490U JP 3091490 U JP3091490 U JP 3091490U JP H03122532 U JPH03122532 U JP H03122532U
- Authority
- JP
- Japan
- Prior art keywords
- air supply
- reaction tube
- exhaust
- boat
- pipe
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000010438 heat treatment Methods 0.000 claims description 3
- 238000010586 diagram Methods 0.000 description 2
Landscapes
- Furnace Details (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3091490U JPH03122532U (US20030199744A1-20031023-C00003.png) | 1990-03-26 | 1990-03-26 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3091490U JPH03122532U (US20030199744A1-20031023-C00003.png) | 1990-03-26 | 1990-03-26 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH03122532U true JPH03122532U (US20030199744A1-20031023-C00003.png) | 1991-12-13 |
Family
ID=31533636
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3091490U Pending JPH03122532U (US20030199744A1-20031023-C00003.png) | 1990-03-26 | 1990-03-26 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH03122532U (US20030199744A1-20031023-C00003.png) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH1012559A (ja) * | 1996-06-07 | 1998-01-16 | Samsung Electron Co Ltd | 半導体製造用化学気相蒸着装置 |
| US6953739B2 (en) | 1997-04-22 | 2005-10-11 | Samsung Electronics Co., Ltd. | Method for manufacturing a semiconductor device having hemispherical grains at very low atmospheric pressure using first, second, and third vacuum pumps |
-
1990
- 1990-03-26 JP JP3091490U patent/JPH03122532U/ja active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH1012559A (ja) * | 1996-06-07 | 1998-01-16 | Samsung Electron Co Ltd | 半導体製造用化学気相蒸着装置 |
| US6953739B2 (en) | 1997-04-22 | 2005-10-11 | Samsung Electronics Co., Ltd. | Method for manufacturing a semiconductor device having hemispherical grains at very low atmospheric pressure using first, second, and third vacuum pumps |
