JPH03120550A - Recording material - Google Patents
Recording materialInfo
- Publication number
- JPH03120550A JPH03120550A JP25946989A JP25946989A JPH03120550A JP H03120550 A JPH03120550 A JP H03120550A JP 25946989 A JP25946989 A JP 25946989A JP 25946989 A JP25946989 A JP 25946989A JP H03120550 A JPH03120550 A JP H03120550A
- Authority
- JP
- Japan
- Prior art keywords
- unsaturated fatty
- fatty acid
- polymer
- acid derivative
- recording material
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000463 material Substances 0.000 title claims abstract description 13
- 235000021122 unsaturated fatty acids Nutrition 0.000 claims abstract description 18
- 229920000642 polymer Polymers 0.000 claims abstract description 17
- 150000004670 unsaturated fatty acids Chemical class 0.000 claims abstract description 17
- 125000003118 aryl group Chemical group 0.000 claims abstract description 9
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 claims abstract description 3
- 150000003863 ammonium salts Chemical group 0.000 claims abstract 2
- 229920001577 copolymer Polymers 0.000 abstract description 9
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 abstract description 6
- 125000001931 aliphatic group Chemical group 0.000 abstract description 6
- 229920001002 functional polymer Polymers 0.000 abstract description 5
- 238000006116 polymerization reaction Methods 0.000 abstract description 3
- 230000005855 radiation Effects 0.000 abstract description 3
- 230000009257 reactivity Effects 0.000 abstract description 3
- HDECRAPHCDXMIJ-UHFFFAOYSA-N 2-methylbenzenesulfonyl chloride Chemical compound CC1=CC=CC=C1S(Cl)(=O)=O HDECRAPHCDXMIJ-UHFFFAOYSA-N 0.000 abstract description 2
- 125000001302 tertiary amino group Chemical group 0.000 abstract description 2
- BDHFUVZGWQCTTF-UHFFFAOYSA-M sulfonate Chemical compound [O-]S(=O)=O BDHFUVZGWQCTTF-UHFFFAOYSA-M 0.000 abstract 2
- SAUITLHMZXFAAL-UHFFFAOYSA-N 1-(ethylamino)butane-1,1-diol Chemical compound OC(CCC)(NCC)O SAUITLHMZXFAAL-UHFFFAOYSA-N 0.000 abstract 1
- QGZKDVFQNNGYKY-UHFFFAOYSA-O ammonium group Chemical group [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 abstract 1
- 150000002500 ions Chemical class 0.000 abstract 1
- 239000002861 polymer material Substances 0.000 abstract 1
- 125000001453 quaternary ammonium group Chemical group 0.000 abstract 1
- -1 Aromatic sulfonic acid esters Chemical class 0.000 description 14
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 9
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 9
- 150000003839 salts Chemical group 0.000 description 9
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 6
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 6
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 6
- 229940053200 antiepileptics fatty acid derivative Drugs 0.000 description 5
- 150000001875 compounds Chemical class 0.000 description 5
- 125000000118 dimethyl group Chemical group [H]C([H])([H])* 0.000 description 5
- 229920001519 homopolymer Polymers 0.000 description 5
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 4
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 4
- 125000004177 diethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 4
- 239000000975 dye Substances 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 125000001424 substituent group Chemical group 0.000 description 4
- WBYWAXJHAXSJNI-VOTSOKGWSA-M .beta-Phenylacrylic acid Natural products [O-]C(=O)\C=C\C1=CC=CC=C1 WBYWAXJHAXSJNI-VOTSOKGWSA-M 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 3
- 150000001412 amines Chemical class 0.000 description 3
- 238000007796 conventional method Methods 0.000 description 3
- 150000002148 esters Chemical class 0.000 description 3
- 125000005843 halogen group Chemical group 0.000 description 3
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 239000000178 monomer Substances 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- 239000000049 pigment Substances 0.000 description 3
- 239000002994 raw material Substances 0.000 description 3
- 238000003786 synthesis reaction Methods 0.000 description 3
- 150000003512 tertiary amines Chemical class 0.000 description 3
- SOGAXMICEFXMKE-UHFFFAOYSA-N Butylmethacrylate Chemical compound CCCCOC(=O)C(C)=C SOGAXMICEFXMKE-UHFFFAOYSA-N 0.000 description 2
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 2
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- KYQCOXFCLRTKLS-UHFFFAOYSA-N Pyrazine Chemical compound C1=CN=CC=N1 KYQCOXFCLRTKLS-UHFFFAOYSA-N 0.000 description 2
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 239000005456 alcohol based solvent Substances 0.000 description 2
- 125000004432 carbon atom Chemical group C* 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 229930016911 cinnamic acid Natural products 0.000 description 2
- 235000013985 cinnamic acid Nutrition 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 230000032050 esterification Effects 0.000 description 2
- 238000005886 esterification reaction Methods 0.000 description 2
- 238000005755 formation reaction Methods 0.000 description 2
- 125000000524 functional group Chemical group 0.000 description 2
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 2
- 229910052753 mercury Inorganic materials 0.000 description 2
- WBYWAXJHAXSJNI-UHFFFAOYSA-N methyl p-hydroxycinnamate Natural products OC(=O)C=CC1=CC=CC=C1 WBYWAXJHAXSJNI-UHFFFAOYSA-N 0.000 description 2
- 239000012046 mixed solvent Substances 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 238000010526 radical polymerization reaction Methods 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 239000003381 stabilizer Substances 0.000 description 2
- JOXIMZWYDAKGHI-UHFFFAOYSA-M toluene-4-sulfonate Chemical compound CC1=CC=C(S([O-])(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-M 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- FEIQOMCWGDNMHM-KBXRYBNXSA-N (2e,4e)-5-phenylpenta-2,4-dienoic acid Chemical compound OC(=O)\C=C\C=C\C1=CC=CC=C1 FEIQOMCWGDNMHM-KBXRYBNXSA-N 0.000 description 1
- PMJHHCWVYXUKFD-SNAWJCMRSA-N (E)-1,3-pentadiene Chemical compound C\C=C\C=C PMJHHCWVYXUKFD-SNAWJCMRSA-N 0.000 description 1
- 229920002818 (Hydroxyethyl)methacrylate Polymers 0.000 description 1
- ULUZGMIUTMRARO-UHFFFAOYSA-N (carbamoylamino)urea Chemical compound NC(=O)NNC(N)=O ULUZGMIUTMRARO-UHFFFAOYSA-N 0.000 description 1
- CDUQMGQIHYISOP-RMKNXTFCSA-N (e)-2-cyano-3-phenylprop-2-enoic acid Chemical compound OC(=O)C(\C#N)=C\C1=CC=CC=C1 CDUQMGQIHYISOP-RMKNXTFCSA-N 0.000 description 1
- QWUWMCYKGHVNAV-UHFFFAOYSA-N 1,2-dihydrostilbene Chemical group C=1C=CC=CC=1CCC1=CC=CC=C1 QWUWMCYKGHVNAV-UHFFFAOYSA-N 0.000 description 1
- MFGALGYVFGDXIX-UHFFFAOYSA-N 2,3-Dimethylmaleic anhydride Chemical compound CC1=C(C)C(=O)OC1=O MFGALGYVFGDXIX-UHFFFAOYSA-N 0.000 description 1
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- VMRYMOMQCYSPHS-UHFFFAOYSA-N 2-(azepan-1-yl)ethanol Chemical compound OCCN1CCCCCC1 VMRYMOMQCYSPHS-UHFFFAOYSA-N 0.000 description 1
- IOCWNULEZRQWMS-UHFFFAOYSA-N 2-(diethylamino)ethyl 3-phenylprop-2-enoate Chemical compound CCN(CC)CCOC(=O)C=CC1=CC=CC=C1 IOCWNULEZRQWMS-UHFFFAOYSA-N 0.000 description 1
- LBLYYCQCTBFVLH-UHFFFAOYSA-N 2-Methylbenzenesulfonic acid Chemical compound CC1=CC=CC=C1S(O)(=O)=O LBLYYCQCTBFVLH-UHFFFAOYSA-N 0.000 description 1
- GGZYGFBQOCOKAE-UHFFFAOYSA-N 2-butoxy-n,n-diethylethanamine Chemical compound CCCCOCCN(CC)CC GGZYGFBQOCOKAE-UHFFFAOYSA-N 0.000 description 1
- VUIWJRYTWUGOOF-UHFFFAOYSA-N 2-ethenoxyethanol Chemical compound OCCOC=C VUIWJRYTWUGOOF-UHFFFAOYSA-N 0.000 description 1
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 1
- PQAMFDRRWURCFQ-UHFFFAOYSA-N 2-ethyl-1h-imidazole Chemical compound CCC1=NC=CN1 PQAMFDRRWURCFQ-UHFFFAOYSA-N 0.000 description 1
- MAABLZJEPOZZEJ-UHFFFAOYSA-N 2-thiophen-2-ylprop-2-enoic acid Chemical compound OC(=O)C(=C)C1=CC=CS1 MAABLZJEPOZZEJ-UHFFFAOYSA-N 0.000 description 1
- WKCYFSZDBICRKL-UHFFFAOYSA-N 3-(diethylamino)propan-1-ol Chemical compound CCN(CC)CCCO WKCYFSZDBICRKL-UHFFFAOYSA-N 0.000 description 1
- IWTYTFSSTWXZFU-UHFFFAOYSA-N 3-chloroprop-1-enylbenzene Chemical compound ClCC=CC1=CC=CC=C1 IWTYTFSSTWXZFU-UHFFFAOYSA-N 0.000 description 1
- WPXMLUUYWNHQOR-UHFFFAOYSA-N 3-naphthalen-1-ylprop-2-enoic acid Chemical compound C1=CC=C2C(C=CC(=O)O)=CC=CC2=C1 WPXMLUUYWNHQOR-UHFFFAOYSA-N 0.000 description 1
- JLBJTVDPSNHSKJ-UHFFFAOYSA-N 4-Methylstyrene Chemical compound CC1=CC=C(C=C)C=C1 JLBJTVDPSNHSKJ-UHFFFAOYSA-N 0.000 description 1
- ZPLCXHWYPWVJDL-UHFFFAOYSA-N 4-[(4-hydroxyphenyl)methyl]-1,3-oxazolidin-2-one Chemical compound C1=CC(O)=CC=C1CC1NC(=O)OC1 ZPLCXHWYPWVJDL-UHFFFAOYSA-N 0.000 description 1
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 1
- WBYWAXJHAXSJNI-SREVYHEPSA-N Cinnamic acid Chemical compound OC(=O)\C=C/C1=CC=CC=C1 WBYWAXJHAXSJNI-SREVYHEPSA-N 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- WOBHKFSMXKNTIM-UHFFFAOYSA-N Hydroxyethyl methacrylate Chemical compound CC(=C)C(=O)OCCO WOBHKFSMXKNTIM-UHFFFAOYSA-N 0.000 description 1
- PCNDJXKNXGMECE-UHFFFAOYSA-N Phenazine Natural products C1=CC=CC2=NC3=CC=CC=C3N=C21 PCNDJXKNXGMECE-UHFFFAOYSA-N 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical compound CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 description 1
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 1
- 125000003158 alcohol group Chemical group 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 239000003963 antioxidant agent Substances 0.000 description 1
- 150000008365 aromatic ketones Chemical class 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 230000003197 catalytic effect Effects 0.000 description 1
- 239000003518 caustics Substances 0.000 description 1
- 229940114081 cinnamate Drugs 0.000 description 1
- 150000001851 cinnamic acid derivatives Chemical group 0.000 description 1
- OOCCDEMITAIZTP-UHFFFAOYSA-N cinnamyl alcohol Chemical compound OCC=CC1=CC=CC=C1 OOCCDEMITAIZTP-UHFFFAOYSA-N 0.000 description 1
- FEIQOMCWGDNMHM-UHFFFAOYSA-N cinnamylideneacetic acid Natural products OC(=O)C=CC=CC1=CC=CC=C1 FEIQOMCWGDNMHM-UHFFFAOYSA-N 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- 238000001723 curing Methods 0.000 description 1
- HRKQOINLCJTGBK-UHFFFAOYSA-N dihydroxidosulfur Chemical compound OSO HRKQOINLCJTGBK-UHFFFAOYSA-N 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- 150000002009 diols Chemical class 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- BEFDCLMNVWHSGT-UHFFFAOYSA-N ethenylcyclopentane Chemical compound C=CC1CCCC1 BEFDCLMNVWHSGT-UHFFFAOYSA-N 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 238000001879 gelation Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 150000004820 halides Chemical class 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- PYGSKMBEVAICCR-UHFFFAOYSA-N hexa-1,5-diene Chemical group C=CCCC=C PYGSKMBEVAICCR-UHFFFAOYSA-N 0.000 description 1
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 239000012770 industrial material Substances 0.000 description 1
- 239000003999 initiator Substances 0.000 description 1
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 1
- 125000006178 methyl benzyl group Chemical group 0.000 description 1
- 125000000325 methylidene group Chemical group [H]C([H])=* 0.000 description 1
- MKPFJMOHYMWVHT-UHFFFAOYSA-N n,2,2-triethylbutan-1-amine Chemical compound CCNCC(CC)(CC)CC MKPFJMOHYMWVHT-UHFFFAOYSA-N 0.000 description 1
- RWIVICVCHVMHMU-UHFFFAOYSA-N n-aminoethylmorpholine Chemical compound NCCN1CCOCC1 RWIVICVCHVMHMU-UHFFFAOYSA-N 0.000 description 1
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 description 1
- 150000002978 peroxides Chemical class 0.000 description 1
- 238000000016 photochemical curing Methods 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 239000002798 polar solvent Substances 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 230000000379 polymerizing effect Effects 0.000 description 1
- 229920005862 polyol Polymers 0.000 description 1
- 150000003077 polyols Chemical class 0.000 description 1
- HJWLCRVIBGQPNF-UHFFFAOYSA-N prop-2-enylbenzene Chemical compound C=CCC1=CC=CC=C1 HJWLCRVIBGQPNF-UHFFFAOYSA-N 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- 150000004053 quinones Chemical class 0.000 description 1
- 239000011541 reaction mixture Substances 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 238000007127 saponification reaction Methods 0.000 description 1
- 238000007086 side reaction Methods 0.000 description 1
- 235000011121 sodium hydroxide Nutrition 0.000 description 1
- 239000004334 sorbic acid Substances 0.000 description 1
- 229940075582 sorbic acid Drugs 0.000 description 1
- 235000010199 sorbic acid Nutrition 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 125000000020 sulfo group Chemical group O=S(=O)([*])O[H] 0.000 description 1
- HXJUTPCZVOIRIF-UHFFFAOYSA-N sulfolane Chemical compound O=S1(=O)CCCC1 HXJUTPCZVOIRIF-UHFFFAOYSA-N 0.000 description 1
- 125000002130 sulfonic acid ester group Chemical group 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 125000002088 tosyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1C([H])([H])[H])S(*)(=O)=O 0.000 description 1
- IMFACGCPASFAPR-UHFFFAOYSA-N tributylamine Chemical compound CCCCN(CCCC)CCCC IMFACGCPASFAPR-UHFFFAOYSA-N 0.000 description 1
- VSRBKQFNFZQRBM-UHFFFAOYSA-N tuaminoheptane Chemical group CCCCCC(C)N VSRBKQFNFZQRBM-UHFFFAOYSA-N 0.000 description 1
- 125000005314 unsaturated fatty acid group Chemical class 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 229920003169 water-soluble polymer Polymers 0.000 description 1
Abstract
Description
【発明の詳細な説明】
(発明の分野)
本発明は記録材料、特に不飽和脂肪酸誘導体部分を側鎖
に持つ硬化性高分子を用いた記録材料に関する。DETAILED DESCRIPTION OF THE INVENTION (Field of the Invention) The present invention relates to a recording material, and particularly to a recording material using a curable polymer having an unsaturated fatty acid derivative moiety in its side chain.
(従来技術)
硬化性、高分子、特に放射線・光硬化性高分子としては
、各種の化合物が開発されている。特に、不飽和脂肪酸
誘導体を側鎖に持つものの検討例が多い。然し、これら
は、一般に油溶性が高く、現像時に、安全性が高くてか
つく、ハンドリングが容易なメタノール系混合溶剤が使
用出来ないという問題があり、改良が待たれていた。(Prior Art) Various compounds have been developed as curable polymers, especially radiation/photo-curable polymers. In particular, there are many examples of studies that have unsaturated fatty acid derivatives in their side chains. However, these generally have high oil solubility, and there is a problem in that a methanol-based mixed solvent, which is highly safe, difficult, and easy to handle, cannot be used during development, and an improvement has been awaited.
従来から、水溶性高分子としては、各種検討されており
、カルボキシ基、スルフォ基などもしくは四級塩などを
側鎖に持つものの例が多い。例えば特開昭49=984
90.49−111−991.49=9.95.89.
53−6394.59−79246等に詳しい。Various types of water-soluble polymers have been studied in the past, with many examples having carboxy groups, sulfo groups, or quaternary salts in their side chains. For example, JP-A-49=984
90.49-111-991.49=9.95.89.
53-6394.59-79246 etc. for details.
然し、これらの従来技術における製法によるものは、高
分子、特に不飽和脂肪酸誘導体の如く官能基を持つ高分
子の製法としては、いくつかの問題があった。例えば、
反応性が低い、官能基の導入率が上がらない、副反応が
おきやすい、ゲル化を生じやすい、原料が高価である等
である。However, these conventional production methods have some problems when it comes to producing polymers, especially polymers having functional groups such as unsaturated fatty acid derivatives. for example,
The reactivity is low, the introduction rate of functional groups is not increased, side reactions are likely to occur, gelation is likely to occur, and raw materials are expensive.
最近、不飽和脂肪酸誘導体と7ンモニユム塩部分を側鎖
に持つ、光硬化性高分子が記録材料用途に開発された。Recently, photocurable polymers having unsaturated fatty acid derivatives and heptadmonium salt moieties in their side chains have been developed for use in recording materials.
それは、り00メチルスチレンを高分子化して其の、活
性なハロゲン原子をβシンナモイルオキシエチルジエチ
ルアミンの如き、三級アミンと反応させて、四級塩を得
るものである。得られた、硬化性高分子はアルコール可
溶であり、光硬化後の現像液として、アルコール系溶剤
が使用できるとされている。It involves polymerizing methylstyrene and reacting its active halogen atoms with a tertiary amine such as β-cinnamoyloxyethyldiethylamine to obtain a quaternary salt. It is said that the obtained curable polymer is alcohol-soluble, and that an alcohol-based solvent can be used as a developer after photocuring.
この系は、アルコール系溶剤が使用できる点で安全性、
操作性等に非常に大きい利点を持つ。This system is safe because alcohol-based solvents can be used.
It has great advantages in terms of operability, etc.
然しながら、出発原料のクロロメチルスチレンが非常に
高価であり、工業材料としては、極めて使い難い欠点が
あった。 本発明者等は、これらのてんに着目して、新
規な材料を開発したものである。However, the starting material, chloromethylstyrene, is very expensive, making it extremely difficult to use as an industrial material. The present inventors focused their attention on these fibers and developed a new material.
(発明の目的)
本発明は、入手が容易で、安くかつ反応性の高い化合物
を巧みに用いる事による機能性高分子の製法とそれを用
いた記録材料を提供するものである(発明の構成)
本発明の目的は、側鎖に芳香族スルフォン酸エステル基
を有する単独若しくは共重合体と脂肪族性の7ミノ基を
有する不飽和脂肪酸誘導体を反応させることを特徴とす
る機能性高分子の製法を開発し、これを用いた記録材料
を開発する事により達成された。(Object of the Invention) The present invention provides a method for producing a functional polymer by cleverly using easily available, cheap, and highly reactive compounds, and a recording material using the same. ) The object of the present invention is to develop a functional polymer characterized by reacting a homopolymer or a copolymer having an aromatic sulfonic acid ester group in the side chain with an unsaturated fatty acid derivative having an aliphatic 7-mino group. This was achieved by developing a manufacturing method and developing recording materials using this method.
本発明において、芳香族とは、置換基をゆうしていても
よい7リールを示す、置換基はフルキル、ハロゲン、フ
ルコキシ、置換フルキル等から遍ばれる。好ましいのは
、入手と反応性の点から、ベンゼン若しくはトルエンで
ある。特に、トルエンスルフォン酸エステルが好ましい
。In the present invention, aromatic refers to 7-aryl which may have a substituent, and the substituents include furkyl, halogen, flukoxy, substituted furkyl and the like. From the viewpoint of availability and reactivity, benzene or toluene is preferred. Particularly preferred is toluene sulfonic acid ester.
主鎖とこのエステルの間には、7ミド、エステル、エー
テルあるいは芳香環等から選ばれた、炭素原子数20以
下の二価の基を有していてよい。Between the main chain and this ester, there may be a divalent group having 20 or less carbon atoms selected from 7-mide, ester, ether, aromatic ring, etc.
芳香族スルフォン酸エステルは、トルエンスルフォニル
クロリドとアルコールとの反応により、容易に得られる
。アルコール部分としては、酢酸ビニルの単独又は共重
合体の鹸化によるもの、ヒドロキシ基を持つ(メタ)7
クリレートもしくは(メタ)アクリル7ミドの単独又は
共重合体、ヒドロキシメチルスチレンの単独又は共重合
体、ヒドロキシエチルビニルエーテルの単独又は共重合
体がある。原材料の点から、ヒドロキシ基を持つ種々の
(メタ)7クリレートが最も有利である。Aromatic sulfonic acid esters can be easily obtained by reacting toluenesulfonyl chloride with alcohol. The alcohol moiety is one obtained by saponification of vinyl acetate alone or a copolymer, and (meth)7 having a hydroxy group.
Examples include homopolymers or copolymers of acrylate or (meth)acrylic 7mide, homopolymers or copolymers of hydroxymethylstyrene, and homopolymers or copolymers of hydroxyethyl vinyl ether. From the point of view of raw materials, various (meth)7 acrylates with hydroxy groups are most advantageous.
別の製法として、芳香族スルフォン酸エステルをもつモ
ノマーを単独又は共重合させるものがある。例えば、ヒ
ドロキシ基をもつ、(メタ)アクリレート、スチレン、
アクリル7ミドなどからの芳香族スルフォン酸エステル
などは好都合にもちいられる。例えばトルエンスルフォ
ニルオキシエチル(メタ)7クリレート、トルエンスル
フオニオキシプロピル(メタ)アクリル7ミド、トルエ
ンスルフォニルオキシメチルスチレンなどは、本発明に
おいても、好都合にもちいられる。これらについては、
よく知られている。Another manufacturing method involves monopolymerizing or copolymerizing monomers having aromatic sulfonic acid esters. For example, (meth)acrylate, styrene, which has a hydroxy group,
Aromatic sulfonate esters such as those from acryl 7mide are conveniently employed. For example, toluenesulfonyloxyethyl (meth) 7-acrylate, toluenesulfonyloxypropyl (meth)acryl 7mide, toluenesulfonyloxymethylstyrene, etc. can be conveniently used in the present invention. Regarding these,
well known.
エステル化は常法に従って行われる。Esterification is carried out according to conventional methods.
またジオール、ポリオールの(メタ)7クリレートは市
販品が数多くあり、粘着性、耐光性、相溶性、硬度或い
はアルカリ溶解性等の観点から選ぶ事ができる。Furthermore, there are many commercially available (meth)7-acrylates of diols and polyols, which can be selected from the viewpoints of adhesiveness, light resistance, compatibility, hardness, alkali solubility, etc.
これらのモノマーについては、先の特許にも詳しい。共
重合させる、モノマーとしては、置換基をゆうしていて
もよい、スチレン、(メタ)7クリレート、アクリル7
ミドなどがある。例えば、スチレン、メチルメタアクリ
レート、ヒトOキシエチル(メタ)7クリレート、ヘキ
シル(メタ)アクリレート、(メタ)アクリル酸、アク
リル7ミド酢酸ビニル、セロソルブ(メタ)7クリレー
ト、ビニルトルエン、αシアノ4メトキシシンナモイル
オキシエチル(メタ)7クリレート、7クリロニトリル
などがある。These monomers are also detailed in earlier patents. Monomers to be copolymerized include styrene, (meth)7 acrylate, and acrylic 7, which may have substituents.
There are mido etc. For example, styrene, methyl methacrylate, human O-oxyethyl (meth) 7-acrylate, hexyl (meth) acrylate, (meth)acrylic acid, vinyl acrylic 7-midoacetate, cellosolve (meth) 7-acrylate, vinyltoluene, α-cyano 4-methoxycinnamate. Examples include moyloxyethyl (meth) 7-acrylate and 7-crylonitrile.
ラジカル重合等の手法については、底置に詳しい。例え
ば W−R−5orenson” Preparati
ve Methods of P。For more information on methods such as radical polymerization, see Bottom. For example, W-R-5orenson” Preparati
ve Methods of P.
lymer Chemistry″l J・Bran
drup″Polymer Handbo。lymer Chemistry"l J. Bran
drup″Polymer Handbo.
k″Wiley& 5ons など参照。See k″Wiley& 5ons etc.
単独又は共重合体は一般的には、ラジカル重合反応によ
りえられる。7ゾ化合物、過酸化物、レドックス系など
はこのましい一例である。Homopolymers or copolymers are generally obtained by radical polymerization reactions. Preferred examples include 7zo compounds, peroxides, and redox compounds.
脂肪族三級7ミノ基をゆうする不飽和脂肪酸誘導体につ
いて述べる。Unsaturated fatty acid derivatives having an aliphatic tertiary 7-mino group will be described.
脂肪族三級アミノ基としては、フルキルまたは7ラルキ
ルから選ばれたふたつと、少なくともひとつの不飽和脂
肪酸で置換したフルキルとからなる三級アミンをいう。The aliphatic tertiary amino group refers to a tertiary amine consisting of two selected from furkyl or 7ralkyl, and furkyl substituted with at least one unsaturated fatty acid.
フルキルまたは7ラルキルは置換基として、不飽和脂肪
酸誘導体、不飽和結合などを有していてよい。ジメチル
7ミノ、ジエチル7ミノ、ジブチル7ミノ、メチルベン
ジル7ミノ、エチルプOパルギル7ミノ、ジアリル7ミ
ノ、アリルエチル7ミノ、ジベンジル7ミノ、N−ヒド
ロキシプロピノルエチル7ミノ、N−7クリロキシエチ
ル7ミノ、ジヒドロキシエチル7ミノ、モルフォリノ、
ピペラジノ等は三級アミン残基として好ましい。Furkyl or 7ralkyl may have an unsaturated fatty acid derivative, an unsaturated bond, etc. as a substituent. Dimethyl 7mino, diethyl 7mino, dibutyl 7mino, methylbenzyl 7mino, ethylpargyl 7mino, diallyl 7mino, allylethyl 7mino, dibenzyl 7mino, N-hydroxypropynoethyl 7mino, N-7 clyloxyethyl 7mino, dihydroxyethyl 7mino, morpholino,
Piperazino and the like are preferred as the tertiary amine residue.
不飽和脂肪酸としては、ベータナフチルアクリル酸、ア
クリル酸、メタアクリル酸、桂皮酸、チエニルアクリル
酸、フリル7クリル酸、ρ−エトキシカルボニル桂皮酸
、アルファシアノ桂皮酸、ソルビン酸、りOトン酸、ジ
メチル無水マレイン酸、無水マレイン酸、シンナミリデ
ン酢酸、シフチエニルペンタジェン酸などがある。Examples of unsaturated fatty acids include beta-naphthyl acrylic acid, acrylic acid, methacrylic acid, cinnamic acid, thienyl acrylic acid, furyl-7-acrylic acid, ρ-ethoxycarbonyl cinnamic acid, alpha-cyanocinnamic acid, sorbic acid, phosphoric acid, Examples include dimethyl maleic anhydride, maleic anhydride, cinnamylidene acetic acid, and siftienyl pentadiene acid.
脂肪族三級7ミノ基と不飽和脂肪酸との結合は炭素原子
数12泉下の、エーテル、エステル、7ミド、ウレイド
、ウレア等を有していてよい、二価の基が好ましい。四
級塩形成反応を妨げない範囲において、ハロゲン原子、
ヒトOキシ基、ジフルキル7ミノ7リール基などを有し
ていてよい。The bond between the aliphatic tertiary 7-mino group and the unsaturated fatty acid is preferably a divalent group having 12 carbon atoms and which may have ether, ester, 7-mide, ureido, urea, etc. Halogen atoms, as long as they do not interfere with the quaternary salt formation reaction.
It may have a human Ooxy group, a difurkyl7mino7lyl group, etc.
原料の入手の点からは、不飽和脂肪酸のハライド好まし
くはりOライドと、上述の7ミン残基をもつ、アルコー
ル、チオアルコールまたはアミンとの反応がこのましい
。From the viewpoint of availability of raw materials, it is preferable to react a halide, preferably an O-lide, of an unsaturated fatty acid with an alcohol, thioalcohol or amine having the above-mentioned heptamine residue.
ジエチル7ミノエタノール、ジメチル7ミノエタノール
、ジヒドロキシエチルブチル7ミン、N−ヒトOキシエ
チルモルフォリン、エチル7リルミン、ジエチルプロパ
ノールアミン、ジメチル7ミノメチルベンジルアルコー
ル、ジエチル7ミノメチルシンナミルアルコール、7ミ
ノエチルイミダゾール、ビスヒトOキシエチルピラジン
、7ミノエチルピOリドン、ヒトOキシエチルビOリド
ン、ヒドロキシエチルへキサメチレンイミンなど。Diethyl 7-minoethanol, dimethyl 7-minoethanol, dihydroxyethylbutyl 7-mine, N-human O-oxyethylmorpholine, ethyl 7-rilmine, diethylpropanolamine, dimethyl 7-minomethylbenzyl alcohol, diethyl 7-minomethylcinnamyl alcohol, 7-mino Ethylimidazole, bis-H-oxyethyl pyrazine, 7-minoethylpy-O-lidone, human-O-oxyethyl bi-O-lidone, hydroxyethylhexamethyleneimine, etc.
7ミノプロビルジエチルアミン、アミノエチルモルフォ
リン、7ミノエチルジブチル7ミン、トリエチルジエチ
ルアミン、ジメチルアミノメチル7二リン、7ミノブチ
ルジエタノールアミンなどは、好ましい一例である。Preferred examples include 7-minopropyldiethylamine, aminoethylmorpholine, 7-minoethyldibutyl-7mine, triethyldiethylamine, dimethylaminomethyl-7diphosphorus, and 7-minobutyldiethanolamine.
叉そのさいに、アミン化合物例えば、トリエチルアミン
、ジェタノールアミン、トリブチルアミン、シンナミル
ジメタ7リルアミン、エチル7リルミン、ジアリル7ミ
ノエチルシンナメート、ジクロチルブチルアミン、ジア
リルシンナミルアミン、ジクロチルシンナミルアミン、
ジエチルブチキシエチルアミンなどを併用する事もでき
る。In this case, amine compounds such as triethylamine, jetanolamine, tributylamine, cinnamyldimeth7lylamine, ethyl7lylmine, diallyl7minoethylcinnamate, dicrotylbutylamine, diallylcinnamylamine, dicrotylcinnamylamine,
It is also possible to use diethylbutoxyethylamine etc. in combination.
これらは、さらに四級塩形成反応を妨げない範囲におい
て、ハロゲン原子、ヒトOキシ基、ジフルキル7ミノ7
リール基などを有していてよい。These include halogen atoms, human Ooxy groups, difurkyl 7mino 7
It may have a lyl group or the like.
芳香族スルフォン酸エステルとアミンの反応で塩を形成
し、対イオン部分は、厳密には、芳香族スルフオランと
なるが、便宜上本明細書中では、芳香族スルフォン酸と
して記述した。A salt is formed by the reaction of an aromatic sulfonic acid ester and an amine, and the counterion part is strictly an aromatic sulforane, but for convenience, it is described as an aromatic sulfonic acid in this specification.
7ミド化、エステル化にさいしては、塩基を触媒に用い
ることがのぞましい。苛性ソーダ、苛性加盟、ピリジン
、トリエチルアミン等はこのましい。また、7セトニト
リル、ジメチル7セト7ミド、スルフオラン、りOOベ
ンゼンなどの極性溶剤の使用もこのましい。7 In mididation and esterification, it is preferable to use a base as a catalyst. Caustic soda, caustic acid, pyridine, triethylamine and the like are preferred. It is also preferable to use polar solvents such as 7cetonitrile, dimethyl 7cetomide, sulfolane, and OO benzene.
本発明の機能性高分子は重合ユニットあたり一つ重上の
不飽和脂肪酸誘導体と四級塩の部分を持つのでそれを用
いた記録材料は、放射線・光・熱などにより、硬化しや
すい特徴がある。Since the functional polymer of the present invention has one unsaturated fatty acid derivative and a quaternary salt moiety per polymerization unit, recording materials using it are easily cured by radiation, light, heat, etc. be.
特に、媒染効果、染料分散性、硬化速度に優れ然も親水
性なので、アルカリ水処理、アルコール、含水溶剤処理
などを利用した画像形成に好都合に利用できる利点をも
つ。そのような用途での使用例はすでにくわしい、J−
Kosar″Light 5ensitive S
ystems”角田”感光性樹脂”特開平1=1059
44等。In particular, it has excellent mordant effect, dye dispersibility, and curing speed, and is hydrophilic, so it has the advantage that it can be conveniently used for image formation using alkaline water treatment, alcohol, water-containing solvent treatment, etc. Examples of use in such applications are already detailed.
Kosar"Light 5ensistive S
systems “Kakuda” Photosensitive resin” Japanese Patent Application Publication No. 1999-1059
44th grade.
増感剤としては、不飽和脂肪酸誘導体の架橋、重合を促
進する化合物が好都合にもちいられる。As the sensitizer, compounds that promote crosslinking and polymerization of unsaturated fatty acid derivatives are conveniently used.
これらはよくしられており、たとえば、特開昭57−1
79836,62−143044、USP463289
9.4634657.4647952.4670374
.4701402.4716095.4753865に
記述されている。These are well known, for example, JP-A-57-1
79836, 62-143044, USP463289
9.4634657.4647952.4670374
.. 4701402.4716095.4753865.
芳香族ケトン、ニトロ、キノン、またはアミンやシアニ
ンボレートまたはこれらの組合せなどは代表例であり、
1ないし10%用いられる。Representative examples include aromatic ketones, nitro, quinones, amines, cyanine borates, or combinations thereof.
1 to 10% is used.
記録材料として用いる時には、常法に従い、各種の添加
剤、例えば、界面活性剤、可塑剤、染料、顔料、安定化
剤、酸化防止剤、増感剤、現像助剤などが、適宜用いら
れる。When used as a recording material, various additives such as surfactants, plasticizers, dyes, pigments, stabilizers, antioxidants, sensitizers, and development aids are appropriately used in accordance with conventional methods.
例えば、染料、顔料については、特公昭61−3687
2、USP4806451.4427758などに、開
始剤、安定化剤などについては、特開昭64−4805
9.特開平1−31147、LISP4822719.
4816379などに詳しい。また此等及び先に引用し
た、特許や底置には、種々の形態、添加剤、用い方、支
持体、塗布方法などに詳しい。For example, for dyes and pigments, Japanese Patent Publication No. 61-3687
2, USP 4806451.4427758, etc., and JP-A-64-4805 regarding initiators, stabilizers, etc.
9. JP-A-1-31147, LISP4822719.
4816379 etc. are detailed. Further, these and the patents and publications cited above provide detailed information on various forms, additives, usage, supports, coating methods, etc.
特に、本発明の高分子は、染料・顔料の分散性が良好で
ある。In particular, the polymer of the present invention has good dispersibility of dyes and pigments.
支持体には、目的により、ガラス、エポキシ、アルミ、
PET、ポリイミドなどが用いられ、その材質、形状を
問わない。Depending on the purpose, the support may be glass, epoxy, aluminum,
PET, polyimide, etc. are used, and the material and shape are not limited.
以下に実施例をあげ、本発明を詳しく述べる。The present invention will be described in detail with reference to Examples below.
合成例 1.2
MEK18Qml、ヒトOキシエチル7クリレートのト
シレート 0・1モル、ブチルメタアクリレート0・1
モル(合成例1) および触媒量の7ゾビスイソブチロ
ニトリルを用いて、定法にしたがい窒素ガスを通じなが
ら65度ないし78度に6・5時間掻き混ぜて共重合体
をえた。コンバージョンはほぼ80%であった。これと
同様な操作を、ヒドロキシエチルメタアクリレートのト
シレート0.08モルとメチルメタアクリレート0.0
2モルを(合成例2)用いて行りた。Synthesis example 1.2 MEK18Qml, tosylate of human O-oxyethyl 7-acrylate 0.1 mol, butyl methacrylate 0.1
Mol (synthesis example 1) and a catalytic amount of 7zobisisobutyronitrile were stirred at 65 to 78 degrees for 6.5 hours while passing nitrogen gas according to a conventional method to obtain a copolymer. Conversion was approximately 80%. A similar operation was carried out with 0.08 mol of tosylate of hydroxyethyl methacrylate and 0.0 mol of methyl methacrylate.
The experiment was carried out using 2 mol (Synthesis Example 2).
こうして、トシルエステルを持つ共重合体を得たそれぞ
れを、重合体1及び2とよぶ。The thus obtained copolymers having tosyl esters are referred to as polymers 1 and 2, respectively.
DMFl 0m lに、49の重合体1を秤りとり溶解
し、ジメチル7ミノエチルシンナメイト0・01モルを
加えて、60度に50分間保持した。49 Polymer 1 was weighed and dissolved in 0 ml of DMFL, 0.01 mole of dimethyl 7minoethyl cinnamate was added, and the mixture was maintained at 60 degrees for 50 minutes.
生じた四級塩ポリマーを酢酸エチル/ヘキサンから沈澱
させ分離した。C例】)
上と同様な操作を、゛ジエチル7ミノプ0ビルシンナム
7ミドを用いて行った。(例2)重合体2を用いて、上
と同様な操作を行い四級塩ポリマーをえた。(例3,4
)
実施例 1〜4
例1から4で得られた、側鎖に、桂皮酸誘導体部分と四
級塩部分を持つポリマーのそれぞれに、8パーセントの
増感剤(N−メチルベンゾイルメチレンナフトチアプリ
ン)を加え、DMFに溶解した。これを、電解処理した
アルミ版に、乾燥後の厚みが2ミクロンになるように、
dip−c。The resulting quaternary salt polymer was precipitated from ethyl acetate/hexane and isolated. Example C) The same operation as above was carried out using diethyl 7 minopovircinnam 7 mido. (Example 2) Using Polymer 2, the same operation as above was carried out to obtain a quaternary salt polymer. (Example 3, 4
) Examples 1 to 4 Each of the polymers obtained in Examples 1 to 4 having a cinnamic acid derivative moiety and a quaternary salt moiety in the side chain was treated with 8% of a sensitizer (N-methylbenzoyl methylene naphthothiapurin). ) was added and dissolved in DMF. Place this on an electrolytically treated aluminum plate so that the thickness after drying is 2 microns.
dip-c.
atした。400W高圧水銀ランプを用いて30cmの
距離から、2分間照射した。露光部分は、溶剤(メタノ
ール・酢酸エチル混合)でリンスしてもはがれなかった
。It was at. Irradiation was performed for 2 minutes from a distance of 30 cm using a 400W high-pressure mercury lamp. The exposed area did not come off even after rinsing with a solvent (methanol/ethyl acetate mixture).
実施例 5
上の例3でDMF中で反応させたままの、反応混合物に
% Os 3r’のNメチルベンゾイルメチレンナフ
トチアゾリンを加えた。 これを、電解処理したアルミ
版に、乾燥後の厚みが2ミクロンになるように、dip
−coatL、上とどうように水銀ランプを用いて30
cmの距離から、2分間照射した。露光部分は、酢酸エ
チル・メタノールの6;4混合溶剤でリンスしてもとれ
ず、強固に硬化している事が判明した。更にこの画像は
、ブロモチモールブルーを用いて染色すると、より鮮明
な画像をあたえた。Example 5 % Os 3r' of N-methylbenzoylmethylenenaphthothiazoline was added to the reaction mixture as reacted in Example 3 above in DMF. Dip this onto an electrolytically treated aluminum plate so that the thickness after drying is 2 microns.
-coatL, above and how to use mercury lamp 30
Irradiation was carried out for 2 minutes from a distance of 1 cm. The exposed areas were not removed even after rinsing with a 6:4 mixed solvent of ethyl acetate and methanol, and it was found that they were strongly cured. Furthermore, this image gave a clearer image when stained with bromothymol blue.
Claims (1)
肪酸誘導体部分とアンモニュウム塩部分骨格を持つ、硬
化性重合体を用いた事を特徴とする記録材料A recording material characterized by using a curable polymer having aromatic sulfonic acid as a counterion in the side chain, an unsaturated fatty acid derivative portion, and an ammonium salt partial skeleton.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP25946989A JPH03120550A (en) | 1989-10-04 | 1989-10-04 | Recording material |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP25946989A JPH03120550A (en) | 1989-10-04 | 1989-10-04 | Recording material |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH03120550A true JPH03120550A (en) | 1991-05-22 |
Family
ID=17334510
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP25946989A Pending JPH03120550A (en) | 1989-10-04 | 1989-10-04 | Recording material |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH03120550A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2351498A (en) * | 1999-06-26 | 2001-01-03 | Hyundai Electronics Ind | Benzenesulphonyloxyalkyl (meth)acrylate polymers |
-
1989
- 1989-10-04 JP JP25946989A patent/JPH03120550A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2351498A (en) * | 1999-06-26 | 2001-01-03 | Hyundai Electronics Ind | Benzenesulphonyloxyalkyl (meth)acrylate polymers |
GB2351498B (en) * | 1999-06-26 | 2004-09-08 | Hyundai Electronics Ind | Organic anti-reflective polymer and preparation thereof |
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