JPH03116670A - Electric pin - Google Patents
Electric pinInfo
- Publication number
- JPH03116670A JPH03116670A JP1251747A JP25174789A JPH03116670A JP H03116670 A JPH03116670 A JP H03116670A JP 1251747 A JP1251747 A JP 1251747A JP 25174789 A JP25174789 A JP 25174789A JP H03116670 A JPH03116670 A JP H03116670A
- Authority
- JP
- Japan
- Prior art keywords
- pin
- thermal expansion
- ceramic substrate
- head part
- core material
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000011162 core material Substances 0.000 claims abstract description 14
- 239000000463 material Substances 0.000 claims abstract description 13
- 239000000919 ceramic Substances 0.000 abstract description 16
- 239000000758 substrate Substances 0.000 abstract description 15
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 abstract description 13
- 229910052802 copper Inorganic materials 0.000 abstract description 13
- 239000010949 copper Substances 0.000 abstract description 13
- 229910000679 solder Inorganic materials 0.000 abstract description 6
- 238000001816 cooling Methods 0.000 abstract description 4
- 238000007747 plating Methods 0.000 description 14
- 229910000833 kovar Inorganic materials 0.000 description 13
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 12
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 6
- 239000010931 gold Substances 0.000 description 6
- 229910052737 gold Inorganic materials 0.000 description 6
- 229910052759 nickel Inorganic materials 0.000 description 6
- 238000004519 manufacturing process Methods 0.000 description 5
- 238000010586 diagram Methods 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000005219 brazing Methods 0.000 description 2
- 238000005253 cladding Methods 0.000 description 2
- 238000005260 corrosion Methods 0.000 description 2
- 230000007797 corrosion Effects 0.000 description 2
- KZHJGOXRZJKJNY-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Si]=O.O=[Al]O[Al]=O.O=[Al]O[Al]=O.O=[Al]O[Al]=O KZHJGOXRZJKJNY-UHFFFAOYSA-N 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 229910052863 mullite Inorganic materials 0.000 description 2
- 239000004020 conductor Substances 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
Landscapes
- Coupling Device And Connection With Printed Circuit (AREA)
- Lead Frames For Integrated Circuits (AREA)
- Manufacturing Of Electrical Connectors (AREA)
- Multi-Conductor Connections (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は電気ピンに関し、特に例えばCPU(Cent
ral Processing Unit)を搭載する
セラミック基板にロウ材を介して接続され、CPUとメ
モリー等の外部回路素子との間を電気的に接続する場合
に好適な電気ピンに関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to electrical pins, particularly for example in CPU (Central
The present invention relates to an electrical pin that is connected to a ceramic substrate (processing unit) via a brazing material and is suitable for electrically connecting a CPU and an external circuit element such as a memory.
CPUとメモリー等の外部回路素子との間を電気的に接
続する電気ピンの材質として、特開昭57−18348
号公報に示されているように従来よりコバール(Kov
ar)が用いられていた。その理由はコバールの熱膨張
係数はセラミック基板のそれとほぼ同じであり、セラミ
ック基板上にコバールを材質とする電気ピンをロウ付け
したときに、電気ピンとセラミック基板との間に後述す
るクラック等の障害の発生を抑えることができるからで
ある。第6図はコバールを材質とする基材102を用い
る電気ピン100の例を示す図であり、この例では基材
102の表面にニッケルメッキ層104と金メツキ層1
06が形成されている。JP-A-57-18348 is used as a material for electrical pins that electrically connect between the CPU and external circuit elements such as memory.
As shown in the publication, Kov
ar) was used. The reason for this is that the coefficient of thermal expansion of Kovar is almost the same as that of a ceramic substrate, and when electrical pins made of Kovar are brazed onto a ceramic substrate, problems such as cracks (described later) may occur between the electrical pins and the ceramic substrate. This is because the occurrence of can be suppressed. FIG. 6 is a diagram showing an example of an electrical pin 100 using a base material 102 made of Kovar. In this example, the surface of the base material 102 is coated with a nickel plating layer 104 and a gold plating layer 1.
06 is formed.
ところが、コバールは導電率が低いために、それを使用
した電気ピンの抵抗による電圧降下が著しく、CPUに
対して十分な電圧を印加できなくなるばかりでなく、電
源供給部においては電気ピン自体の抵抗のために発熱体
となってしまうという問題が生じていた。However, due to Kovar's low conductivity, the voltage drop due to the resistance of the electrical pins using it is significant, and not only is it impossible to apply sufficient voltage to the CPU, but also the resistance of the electrical pins themselves in the power supply section Therefore, there was a problem in that it became a heating element.
前述の問題を回避するためには、電気ピンの材質として
高導電率の材質、例えば銅を用いることが考えられる。In order to avoid the above-mentioned problem, it is conceivable to use a material with high conductivity, such as copper, as the material of the electric pin.
この場合の問題を第7図を参照して説明する。銅のよう
な高導電率の材質は一般に熱膨張係数がセラミックのそ
れに比べてはるかに大きい。例えば、セラミックの一種
であるムライトの熱膨張係数は3.0 X 10−’/
”Cであるのに対し、銅の熱膨張係数は17 X 1
0 ”’/℃であり、ムライトの約6.7倍である。こ
のため、銅を材質とする電気ピン110をセラミック基
板122上にロウ付けすると、ロウ材の溶融後室源まで
冷却する間に銅112とセラミック基板122との熱膨
張係数の差によって引張応力118が発生し、ロウ12
0及びセラミック基板122にクラック124が発生す
る。The problem in this case will be explained with reference to FIG. High conductivity materials such as copper generally have a coefficient of thermal expansion much larger than that of ceramics. For example, the coefficient of thermal expansion of mullite, a type of ceramic, is 3.0 x 10-'/
``C, whereas the coefficient of thermal expansion of copper is 17 x 1
0''/°C, which is about 6.7 times that of mullite. Therefore, when the electric pin 110 made of copper is brazed onto the ceramic substrate 122, the temperature of the solder metal is lowered during cooling to the chamber source after melting. A tensile stress 118 is generated due to the difference in thermal expansion coefficient between the copper 112 and the ceramic substrate 122, and the wax 12
0 and the ceramic substrate 122 are cracked.
従って、本発明は導電率が高(、しかもロウ及びセラミ
ック基板にクラックを発生させない電気ピンを提供する
ことを目的とする。Therefore, it is an object of the present invention to provide an electrical pin that has high conductivity (and does not cause cracks in the wax or ceramic substrate).
本発明の電気ピンは、ほぼ全長にわたってほぼ同じ径に
形成されたピン部と該ピン部の少なくとも一端に前記径
より大きい径に形成されたヘッド部を有する電気ピンで
あって、特に、前記ピン部及び前記ヘッド部の芯材とし
て熱膨張係数の低い材質を用い、前記ヘッド部の先端部
を除く芯材の周囲に十分な厚さの高導電体層を被着して
形成するものである。The electrical pin of the present invention is an electrical pin having a pin portion formed to have substantially the same diameter over substantially the entire length, and a head portion formed at at least one end of the pin portion to have a diameter larger than the diameter, and particularly, A material with a low coefficient of thermal expansion is used as the core material of the head part and the head part, and a high conductive layer of sufficient thickness is applied around the core material except for the tip of the head part. .
以下、図面を参照して本発明の電気ピンの実施例を説明
する。Embodiments of the electrical pin of the present invention will be described below with reference to the drawings.
第1図は本発明による電気ピン10を基板26にロウ付
けした状態の断面図、第2図はニッケルメッキ層及び金
メツキ層を剥がした状態の電気ピンlOの底面図、第3
図乃至第5図は電気ピン10の製造工程を示す図である
。FIG. 1 is a cross-sectional view of the electrical pin 10 according to the present invention brazed to a substrate 26, FIG. 2 is a bottom view of the electrical pin 10 with the nickel plating layer and gold plating layer removed, and FIG.
5 through 5 are diagrams showing the manufacturing process of the electrical pin 10. As shown in FIG.
第1図において、本発明の電気ピンlOは熱膨張係数の
低いコバールからなる芯材16と導電率の高い銅からな
る高導電体層18を含んでいる。高導電体層18はヘッ
ド部14の先端部又は底面14aを除いたピン部12の
全長及びヘッド部14の全周囲にわたって形成されてい
る。尚、この実施例では耐腐食性の理由により電気ピン
10の全周囲に薄いニッケルメッキ20及び薄い金メツ
キ22が施されている。In FIG. 1, the electrical pin 10 of the present invention includes a core material 16 made of Kovar with a low coefficient of thermal expansion and a highly conductive layer 18 made of copper with high conductivity. The highly conductive layer 18 is formed over the entire length of the pin portion 12 excluding the tip or bottom surface 14a of the head portion 14 and the entire circumference of the head portion 14. In this embodiment, a thin nickel plating 20 and a thin gold plating 22 are applied all around the electrical pin 10 for corrosion resistance reasons.
第2図において、コバールからなる芯材16はヘッド部
14の先端部14aにおいてヘッド部14の外周とほぼ
同心円状に露出している。後述の製法によると、ヘッド
部14の先端部14aにおけるコバール芯材16°がピ
ン部12のコバール材より十分大面積であることに注目
されたい。In FIG. 2, a core material 16 made of Kovar is exposed at the tip 14a of the head portion 14 in a substantially concentric circle with the outer periphery of the head portion 14. It should be noted that according to the manufacturing method described below, the Kovar core material 16° at the tip 14a of the head portion 14 has a sufficiently larger area than the Kovar material of the pin portion 12.
再び第1図に戻って、電気ピン10をセラミック基板2
6にロウ付けすると、溶融したロウ24はヘッド部14
の底面14a及び外周部に付着する。ヘッド部14の底
面14aにおいては前述のようにコバールが露出して薄
いニッケルメッキ層及び金メツキ層を介してロウ24と
接触しており、また、ヘッド部14全体の熱膨張係数は
ヘッド部I4がコバール層と銅層で形成されているため
に銅自体の熱膨張係数よりはるかに低いので、ロウ24
が冷却する間に発生する引張応力が小さく、クラックが
発生する危険は著しく少ない。また、電気ピン10を流
れる電流の大部分は低導電率のコバールからなる芯材1
6よりも高導電率の銅層I8を流れるので、低抵抗とな
り、電圧降下が小さく、CPUに対して十分な電圧を印
加でき、且つ電気ピン自体が発熱体にならない。Returning to FIG. 1 again, connect the electrical pin 10 to the ceramic substrate 2.
6, the molten wax 24 is soldered to the head portion 14.
It adheres to the bottom surface 14a and the outer periphery. As mentioned above, Kovar is exposed on the bottom surface 14a of the head portion 14 and is in contact with the wax 24 through the thin nickel plating layer and gold plating layer, and the thermal expansion coefficient of the entire head portion 14 is equal to the head portion I4. Because it is formed of a Kovar layer and a copper layer, its coefficient of thermal expansion is much lower than that of copper itself, so Low 24
The tensile stress generated during cooling is small, and the risk of cracking is significantly reduced. Further, most of the current flowing through the electric pin 10 is caused by the core material 1 made of Kovar having low conductivity.
Since the current flows through the copper layer I8, which has a higher conductivity than 6, the resistance is low, the voltage drop is small, a sufficient voltage can be applied to the CPU, and the electrical pin itself does not become a heating element.
次に、第3図乃至第5図を参照して本発明の電気ピン1
0の製造方法を説明する。即ち、コバール30の周囲に
銅32を従来方法でクラッドして、形成された第3図に
示す如きロッド棒40を所定の長さに切断する。この切
断されたロッド棒40を第4図に示す如く治具50.5
2で固定し、周知のヘッダー加工する。例えば、ロッド
棒40の端部40aをハンマー54によって殴打する。Next, referring to FIGS. 3 to 5, the electric pin 1 of the present invention will be described.
The manufacturing method of 0 will be explained. That is, copper 32 is clad around the Kovar 30 in a conventional manner, and the formed rod 40 as shown in FIG. 3 is cut to a predetermined length. This cut rod 40 is held in a jig 50.5 as shown in FIG.
2 and process the header as well. For example, the end 40a of the rod 40 is struck with a hammer 54.
ハンマー54は予めヘッド部の形状に対応した凹型を形
成している(図示せず)ので、殴打された後の電気ピン
のヘッド部が第5図に示すように所定の形状に形成され
る。Since the hammer 54 is pre-formed with a concave shape (not shown) corresponding to the shape of the head, the head of the electric pin after being struck is formed into a predetermined shape as shown in FIG.
ロッド棒40の両端のヘッド部の形成は別工程で行って
もよいし、同時に行ってもよい。また必要に応じ、ロッ
ド棒40の片端のみヘッド部を形成し、他端は単に半球
状、円錐状、または角錐状等の形状に形成してもよい。The formation of the head portions at both ends of the rod 40 may be performed in separate steps or may be performed simultaneously. Further, if necessary, only one end of the rod 40 may be formed with a head portion, and the other end may be simply formed into a hemispherical, conical, or pyramidal shape.
以上のように形成された電気ピンの耐腐食性を改善する
ために、薄いニッケルメッキ及び薄い金メツキを施すこ
とにより本発明の電気ピンが完成する。In order to improve the corrosion resistance of the electrical pin formed as described above, the electrical pin of the present invention is completed by applying thin nickel plating and thin gold plating.
尚、コバールの周囲に銅層を形成する方法はクラッドに
限らず、メツキ等他の方法でもよいが、高導電体層を十
分な厚さに形成し得る点でクラッドが好ましい。また、
メツキの場合には第3図に示す長いロッド棒40の状態
では困難であり、所定長に切断後又はヘッダー加工後に
行うこととなる。Note that the method for forming the copper layer around Kovar is not limited to cladding, and other methods such as plating may be used, but cladding is preferable because it allows the formation of a highly conductive layer with a sufficient thickness. Also,
In the case of plating, it is difficult to use the long rod 40 shown in FIG. 3, and it must be done after cutting it to a predetermined length or processing the header.
その場合にはヘッド部先端にも高導電体且つ高熱膨張係
数の層が形成されるので、前述した目的から好ましくな
い。In that case, a layer of high conductivity and high coefficient of thermal expansion is also formed at the tip of the head portion, which is not preferable for the above-mentioned purpose.
本発明の電気ピンによれば、少なくともヘッド部の先端
中央部において熱膨張係数の低い材質が実質的に露出し
ており、またヘッド部は低熱膨張係数の中心部と高熱膨
張係数の外周部の2つの部分で構成されているので全体
(平均)の熱膨張係数が低くなり、ロウ付は後ロウが冷
却する間にロウ及びセラミック基板のクラック発生が効
果的に防止できる。According to the electrical pin of the present invention, the material with a low coefficient of thermal expansion is substantially exposed at least in the central part of the tip of the head part, and the head part has a center part with a low coefficient of thermal expansion and an outer peripheral part with a high coefficient of thermal expansion. Since it is composed of two parts, the overall (average) coefficient of thermal expansion is low, and cracks in the solder and ceramic substrate can be effectively prevented during brazing while the solder is cooling.
また、本発明の電気ピンはヘッド部を含め全体として十
分な厚さの高導電体層で覆っているので、それを流れる
電流は低導電率の芯材中よりも外側の高導電体層中を流
れるため、電気ピンが低抵抗となり、電圧降下が小さ(
、例えばCPUに対して十分な電圧を印加できるばかり
でなく、電気ピン自体が発熱体になることはない。In addition, since the electric pin of the present invention is covered with a sufficiently thick high conductive layer as a whole including the head, the current flowing through it is in the outer high conductive layer rather than in the low conductive core material. , the electrical pin has low resistance and the voltage drop is small (
For example, not only can sufficient voltage be applied to the CPU, but the electrical pins themselves do not become heat generating elements.
さらに、本発明の電気ピンは周知の技術を利用している
ため容易に製造できる。Additionally, the electrical pin of the present invention utilizes well-known technology and is therefore easy to manufacture.
第1図は本発明の電気ピンをセラミック基板にロウ付け
した状態の断面図、
第2図は本発明の電気ピンのニッケルメッキ層及び金メ
ツキ層を剥がした状態の底面図、第3図乃至第5図は本
発明の電気ピンの製造工程を示す斜視図、
第6図及び第7図は従来の電気ピンの断面図及び電気ピ
ンの問題点を示す説明図である。
10 、、、。
電気ピン
12 、、、。
ピン部
14 、、、。
ヘッド部
1B 、、、。
芯材
18 、、、。
高導電体層
FIG、1
Fl6.6
Fl6.2
Fl、G
FIG、3
FIG、4
FIG、 5Figure 1 is a cross-sectional view of the electrical pin of the present invention brazed to a ceramic substrate, Figure 2 is a bottom view of the electrical pin of the present invention with the nickel plating layer and gold plating layer removed, and Figures 3 to 3. FIG. 5 is a perspective view showing the manufacturing process of the electric pin of the present invention, and FIGS. 6 and 7 are cross-sectional views of the conventional electric pin and explanatory diagrams showing the problems of the electric pin. 10... Electrical pin 12... Pin part 14... Head part 1B... Core material 18... High conductor layer FIG, 1 Fl6.6 Fl6.2 Fl, G FIG, 3 FIG, 4 FIG, 5
Claims (1)
と、該ピン部の少なくとも一端に前記径より大きい径に
形成されたヘッド部を有する電気ピンにおいて、 前記ピン部及び前記ヘッド部の芯材を低熱膨張係数の材
料で形成し、前記ヘッド部の先端部を除く前記芯材の周
囲に十分な厚さの高導電体層を被着して形成することを
特徴とする電気ピン。(1) An electric pin having a pin portion formed to have substantially the same diameter over almost the entire length, and a head portion formed at at least one end of the pin portion to have a diameter larger than the diameter, the core of the pin portion and the head portion. An electrical pin, characterized in that the core material is made of a material with a low coefficient of thermal expansion, and a sufficiently thick high conductive layer is applied around the core material except for the tip of the head portion.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1251747A JPH03116670A (en) | 1989-09-29 | 1989-09-29 | Electric pin |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1251747A JPH03116670A (en) | 1989-09-29 | 1989-09-29 | Electric pin |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH03116670A true JPH03116670A (en) | 1991-05-17 |
Family
ID=17227326
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1251747A Pending JPH03116670A (en) | 1989-09-29 | 1989-09-29 | Electric pin |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH03116670A (en) |
-
1989
- 1989-09-29 JP JP1251747A patent/JPH03116670A/en active Pending
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