JPH03115663U - - Google Patents
Info
- Publication number
- JPH03115663U JPH03115663U JP2303190U JP2303190U JPH03115663U JP H03115663 U JPH03115663 U JP H03115663U JP 2303190 U JP2303190 U JP 2303190U JP 2303190 U JP2303190 U JP 2303190U JP H03115663 U JPH03115663 U JP H03115663U
- Authority
- JP
- Japan
- Prior art keywords
- mass flow
- flow controller
- thin film
- forming
- cvd apparatus
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000010409 thin film Substances 0.000 claims 2
- 238000010586 diagram Methods 0.000 description 2
- 238000010926 purge Methods 0.000 description 1
Landscapes
- Chemical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2303190U JPH03115663U (cs) | 1990-03-07 | 1990-03-07 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2303190U JPH03115663U (cs) | 1990-03-07 | 1990-03-07 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH03115663U true JPH03115663U (cs) | 1991-11-29 |
Family
ID=31526033
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2303190U Pending JPH03115663U (cs) | 1990-03-07 | 1990-03-07 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH03115663U (cs) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2022208621A1 (ja) * | 2021-03-29 | 2022-10-06 | 株式会社日立ハイテク | ガス供給制御装置 |
| US12442455B2 (en) | 2021-02-08 | 2025-10-14 | Hitachi High-Tech Corporation | Gas supply apparatus, vacuum processing apparatus, and gas supply method |
-
1990
- 1990-03-07 JP JP2303190U patent/JPH03115663U/ja active Pending
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US12442455B2 (en) | 2021-02-08 | 2025-10-14 | Hitachi High-Tech Corporation | Gas supply apparatus, vacuum processing apparatus, and gas supply method |
| WO2022208621A1 (ja) * | 2021-03-29 | 2022-10-06 | 株式会社日立ハイテク | ガス供給制御装置 |
| JPWO2022208621A1 (cs) * | 2021-03-29 | 2022-10-06 |
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