JPH03110382A - Vacuum heat treating furnace - Google Patents
Vacuum heat treating furnaceInfo
- Publication number
- JPH03110382A JPH03110382A JP24608589A JP24608589A JPH03110382A JP H03110382 A JPH03110382 A JP H03110382A JP 24608589 A JP24608589 A JP 24608589A JP 24608589 A JP24608589 A JP 24608589A JP H03110382 A JPH03110382 A JP H03110382A
- Authority
- JP
- Japan
- Prior art keywords
- temperature
- heating
- workpiece
- vacuum heat
- heat treatment
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000010438 heat treatment Methods 0.000 claims abstract description 79
- 238000002360 preparation method Methods 0.000 claims description 10
- 238000001816 cooling Methods 0.000 claims description 9
- 239000000463 material Substances 0.000 abstract description 3
- 230000001105 regulatory effect Effects 0.000 abstract 5
- 230000001276 controlling effect Effects 0.000 abstract 2
- 238000010586 diagram Methods 0.000 description 3
- 238000005192 partition Methods 0.000 description 3
- 238000002791 soaking Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 2
- 239000011810 insulating material Substances 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- KPLQYGBQNPPQGA-UHFFFAOYSA-N cobalt samarium Chemical compound [Co].[Sm] KPLQYGBQNPPQGA-UHFFFAOYSA-N 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 235000013305 food Nutrition 0.000 description 1
- 239000000696 magnetic material Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 229910000938 samarium–cobalt magnet Inorganic materials 0.000 description 1
- 235000015170 shellfish Nutrition 0.000 description 1
- 238000005245 sintering Methods 0.000 description 1
Landscapes
- Powder Metallurgy (AREA)
Abstract
Description
【発明の詳細な説明】 ［産業上の利用分野］ 本発明は真空熱処理炉に関する。[Detailed description of the invention] [Industrial application field] The present invention relates to a vacuum heat treatment furnace.
従来の真空熱処理炉の加熱室においては、その縦断面及
び側断面を第４Ａ図、第４Ｂ図に示すように、加熱処理
されるワークピース（３）の上下左右の周囲にのみ抵抗
加熱によるヒータ（４）が設けられていた。同図におい
て真空熱処理炉（１）の加熱室（４）は真空排気系（８
）に接続されている。加熱室（２）には仕切壁（１０）
（ｔｏｏ）を介して準備室（■）及び冷却室（Ｌりが
続いており、それらの間にはそれぞれ開閉自在の仕切弁
［６） ｆ６°）が設けられている。ワークピース（３
）は準備室（１２）から仕切弁（６）を開いて加熱室（
ス）に入れられ、加熱処理後は仕切弁（６°）を開いて
冷却室＋１３）に送られる。In the heating chamber of a conventional vacuum heat treatment furnace, as shown in FIG. 4A and FIG. 4B in its vertical and side cross sections, heaters using resistance heating are installed only around the top, bottom, left and right of the workpiece (3) to be heat treated. (4) was provided. In the figure, the heating chamber (4) of the vacuum heat treatment furnace (1) is connected to the vacuum exhaust system (8
)It is connected to the. The heating chamber (2) has a partition wall (10)
A preparation room (■) and a cooling room (L) are connected via (too), and gate valves [6] f6°, which can be opened and closed, are provided between them. Workpiece (3
) opens the gate valve (6) from the preparation chamber (12) to access the heating chamber (
After the heat treatment, the gate valve (6°) is opened and the material is sent to the cooling room +13).
従来の真空熱処理炉は上記のような構成になっており、
ワークピース（３）が出入される方向に関してワークピ
ース（３）の周囲にのみヒータ（４）が設けられている
ので１次のような欠点があった。Conventional vacuum heat treatment furnaces have the configuration shown above.
Since the heater (4) is provided only around the workpiece (3) in the direction in which the workpiece (3) is taken in and out, there are the following drawbacks.
■ワークピース（３）を第５図のように示すと、ワーク
ピース（３）の矢印で示される出入方向に関してワーク
ピース（３）の前後方向の面の中心部（ａ）の昇温か他
の部分よりも遅い。第６図のように時間と温度の関係に
ついてヒータ（４）の規定温度を実線で、中心部ｆａ）
の温度を点線で示すと、上記の理由から、中心部ｆａｌ
の温度が規定温度に上がるまで待つために、規定温度の
保持時間Ｔ、、Ｔ□を長（とらなければならない。従っ
て全体の加熱時間Ｔが長くなり、生産性が悪い。■When the workpiece (3) is shown as shown in Fig. 5, the rise and fall of the center (a) of the front-rear surface of the workpiece (3) with respect to the direction of entry and exit indicated by the arrows of the workpiece (3) Slower than the parts. As shown in Figure 6, regarding the relationship between time and temperature, the specified temperature of the heater (4) is indicated by a solid line, and the central part fa)
If the temperature of
In order to wait until the temperature rises to the specified temperature, the holding time T, , T□ of the specified temperature must be long. Therefore, the entire heating time T becomes long, and productivity is poor.
■ワークピース（３）の材質、形状によっては、第７図
に示すように、熱処理に必要な規定温度に長時間保持し
ても中心部［ａ）の温度が規定温度に十分達しないこと
があり、中心部（ａ）と他のの部分（ｂ〜ｇなど）との
温度差が大きくなる。■Depending on the material and shape of the workpiece (3), as shown in Figure 7, the temperature at the center [a] may not fully reach the specified temperature even if the temperature is maintained at the specified temperature required for heat treatment for a long time. There is a large temperature difference between the center part (a) and other parts (b to g, etc.).
そのためワークピース（３）全体の均熱性が得られず、
ワークピースの不良率が高（なる。Therefore, uniformity of heat throughout the workpiece (3) cannot be achieved,
The defective rate of workpieces is high.
［発明が解決しようとする問題点］
本発明は以上のような問題に鑑みてなされ、ワークピー
スを均等に加熱することができる真空熱処理炉を提供す
ることを目的としている。[Problems to be Solved by the Invention] The present invention has been made in view of the above problems, and an object of the present invention is to provide a vacuum heat treatment furnace that can uniformly heat a workpiece.
〔問題点を解決するための手段Ｊ
上記目的は、加熱室内の被処理物を、該被処理物を出入
する軸方向の周囲から加熱する第１の加熱体が設けられ
ている真空熱処理炉において、前記被処理物を前記軸方
向の前後から加熱する第２の加熱体を設け、該第２の加
熱体は前記第１の加熱体とは別個に温度を制御できるよ
うにした真空熱処理炉、によって達成される。[Means for Solving the Problems J] The above purpose is to provide a vacuum heat treatment furnace equipped with a first heating body that heats the workpiece in the heating chamber from the periphery of the workpiece in the axial direction that enters and exits the workpiece. , a vacuum heat treatment furnace provided with a second heating body that heats the object to be processed from the front and back in the axial direction, the temperature of the second heating body being able to be controlled separately from the first heating body; achieved by.
あるいは、又、加熱室内の被処理物を、該被処理物を出
入する軸方向の周囲から加熱する第１の加熱体が設けら
れている真空熱処理炉において、前記被処理物を前記軸
方向の前後から加熱する第２の加熱体を設け、該第２の
加熱体は、前記被処理物の前記軸方向の前後面の中心部
の近傍に設けた温度センサーの検知温度に基いて温度制
御され、前記第１の加熱体は、前記被処理物の前記軸方
向の周囲で前記被処理物の近傍に設けた温度センサーの
検知温度に基いて温度制御されるようにした真空熱処理
炉、によって達成される。Alternatively, in a vacuum heat treatment furnace provided with a first heating body that heats the workpiece in the heating chamber from the periphery of the workpiece in the axial direction, the workpiece is heated in the axial direction. A second heating body that heats from the front and back is provided, and the temperature of the second heating body is controlled based on the temperature detected by a temperature sensor provided near the center of the front and rear surfaces of the object to be treated in the axial direction. , the first heating body is achieved by a vacuum heat treatment furnace whose temperature is controlled based on the temperature detected by a temperature sensor provided near the object to be processed around the object to be processed in the axial direction. be done.
［作 用］
以上のように構成される真空熱処理炉においては、ワー
クピースが均等に加熱されるので、生産性が高くなる。[Function] In the vacuum heat treatment furnace configured as described above, the workpiece is heated evenly, so productivity is increased.
（実 施 例１ 次に実施例について図面を参照して説明する。(Implementation example 1 Next, embodiments will be described with reference to the drawings.
本実施例の概略縦断面図を第１図に示すが、同図におい
て第４Ａ、Ｂ図の従来例と共通の部分には同じ符号を付
した。A schematic vertical cross-sectional view of this embodiment is shown in FIG. 1, in which the same parts as in the conventional example shown in FIGS. 4A and 4B are given the same reference numerals.
第１図において、真空熱処理炉（１）は加熱室（２）、
及び加熱室（ス）に仕切壁ｆｔｏ） ｆｔｏ’）を介し
て続く準備室（亘）と冷却室（１３）とから構成される
。加熱室（２１は真空排気系（８）に接続されており、
内部にはワークピース（３）を周囲から加熱するように
抵抗加熱によるヒータ（４）が設けられ、その外側には
断熱材（１））が設けられている。（９）は真空熱処理
炉（１）の炉殻である。In FIG. 1, the vacuum heat treatment furnace (1) includes a heating chamber (2),
It consists of a preparation chamber (Wataru) and a cooling chamber (13) which are connected to the heating chamber (S) via a partition wall fto'). The heating chamber (21 is connected to the vacuum exhaust system (8),
A resistance heating heater (4) is provided inside to heat the workpiece (3) from the surrounding area, and a heat insulating material (1) is provided outside of the heater (4). (9) is the furnace shell of the vacuum heat treatment furnace (1).
加熱室（ス）と、準備室（１２）、冷却室（１３）との
間にはそれぞれ開閉自在の仕切弁（６１ｆ６°）が設け
られており、それらの加熱室（２）に面する側に断熱材
（７） （７°）を介して抵抗加熱によるパイプ型のヒ
ータ［５） （５’）が取り付けられている。ヒータ（
４）は電源（１４）に接続され、ヒータ（５）（５°）
はそれぞれ電源［１５） （１５°）に接続されており
、ワークピース（３）の側面に設けられた温度センサー
（１６）と、前後面に設けられた温度センサー［１７）
（１７°）とによって測定された温度に基いて、各ヒ
ータは別個に温度コントロールされる。A gate valve (61f6°) that can be opened and closed is provided between the heating chamber (S), the preparation chamber (12), and the cooling chamber (13), and the side facing the heating chamber (2) is provided with a gate valve (61f6°) that can be opened and closed. A pipe-shaped heater [5] (5') using resistance heating is attached to the heat insulating material (7) (7°). heater(
4) is connected to the power supply (14) and the heater (5) (5°)
are connected to a power source [15] (15°), respectively, and a temperature sensor (16) provided on the side of the workpiece (3) and a temperature sensor [17] provided on the front and back surfaces.
Each heater is individually temperature controlled based on the temperature measured by (17°).
温度制御の一例としてマスタースレーブ方式を採用した
ので、その回路図を第２図に示す。A master-slave system was adopted as an example of temperature control, and its circuit diagram is shown in FIG.
各ヒータ（４） Ｆ５１ （５°）は、先ずマスタープ
ログラム温度調整計（１８）からの指示に従って各電源
（１４（Ｉｓ） Ｆ＋５’ｌ によって加熱されるが、
温度センサー（１６）から人力される温度し、と、温度
センサー（１７から人力される温度し２との温度差を一
方のスレーブ側の偏差温度調整計（１９）において演算
し、ｔ２＞ ｔ＋であれば電源（Ｉｓ）の出力をしぼり
、仁、〉ｔｌであれば出力を増すように電源（１５）の
出力を調整してｔｌとｔ２の温度差を縮めるように作動
し、温度し２を制御する。同様に、他方のスレーブ側の
偏差温度調整計（１９°）において電源 （１５°）の
出力を調整して温度 Ｌ２°を制御する。Each heater (4) F51 (5°) is first heated by each power supply (14 (Is) F+5'l) according to instructions from the master program temperature controller (18).
The temperature difference between the temperature manually input from the temperature sensor (16) and the temperature manually input from the temperature sensor (17) is calculated in the deviation temperature controller (19) on one slave side, and when t2>t+ If it is, the output of the power source (Is) is throttled, and if it is >tl, the output of the power source (15) is adjusted to increase the output, and the temperature difference between tl and t2 is reduced, and the temperature is increased to 2. Similarly, the temperature L2° is controlled by adjusting the output of the power supply (15°) in the deviation temperature controller (19°) on the other slave side.
以上のような方法によって各ヒータ（４） （５） ｆ
５°）の完熱量を別個に制御できるのでワークピース（
３）の（ａｌ 部の温度上昇が早くなり、全体の温度差
が非常に少なくなる。By the method described above, each heater (4) (5) f
The amount of heat completed (5°) can be controlled separately, so the workpiece (
3) (The temperature rise in the al part becomes faster, and the overall temperature difference becomes very small.
サマリウムコバルト系磁性材料の圧粉成形体を焼結する
ために、本実施例装置の仕切弁（６）を開いて準備室（
貝）から加熱室（？）へ移送し、具体的なワークピース
として多数並べた。真空加熱処理を行った後、仕切弁（
６′）を開いて冷却室（脛）へ移送した。加熱処理をし
ている間、従来の真空熱処理炉によればワークピースの
温度むらは±５℃〜±１０℃であったが本実施例によれ
ば±１°Ｃ〜±３℃に抑えられた。In order to sinter a powder compact of samarium cobalt-based magnetic material, the gate valve (6) of the apparatus of this embodiment is opened and the preparation chamber (
They were transferred from shellfish to a heating chamber (?) and arranged in large numbers as concrete workpieces. After vacuum heat treatment, the gate valve (
6') was opened and transferred to the cooling room (shin). During the heat treatment, the temperature variation of the workpiece was ±5°C to ±10°C using a conventional vacuum heat treatment furnace, but according to this embodiment, it was suppressed to ±1°C to ±3°C. Ta.
従来の真空熱処理炉では第３Ａ図に示すように均熱ゾー
ンが狭かったが１本実施例によれば第３Ｂ図に模式的に
示すように炉の均熱ゾーンが広がり、焼結に利用可能な
有効領域（ワーキングゾーン）が従来に比較して約３０
％増加した。In conventional vacuum heat treatment furnaces, the soaking zone was narrow as shown in Figure 3A, but according to this embodiment, the soaking zone of the furnace is widened, as schematically shown in Figure 3B, and can be used for sintering. The effective area (working zone) is approximately 30 times larger than before.
% increase.
以上本発明の実施例について説明したが、勿論本発明は
これに限定されることな（、本発明の技術的思想に基き
、種々の変形が可能である。Although the embodiments of the present invention have been described above, the present invention is of course not limited to these (and various modifications can be made based on the technical idea of the present invention).
例λば実施例では仕切弁に取り付けたヒータはバイブ型
ヒータであるが、面状ヒータや他のものでも良い。For example, in the embodiment, the heater attached to the gate valve is a vibrator type heater, but it may be a planar heater or other heater.
実施例の真空熱処理炉では加熱室の前後にそれぞれ、準
備室と冷却室が続いているが、準備室はなくても良いし
、さらに冷却室もな（でも良い。In the vacuum heat treatment furnace of the embodiment, a preparation chamber and a cooling chamber are provided before and after the heating chamber, but the preparation chamber may not be provided, and a cooling chamber may also not be provided.
その場合は、ヒータは仕切弁ではなく、入口扉及び出口
扉に取り付けられる。In that case, the heater is attached to the inlet and outlet doors rather than the gate valve.
〔発明の効果］
本発明は以上のような構成であるので、以下のような効
果を有する。[Effects of the Invention] Since the present invention has the above configuration, it has the following effects.
加熱室内の均熱ゾーンが広がるのでワーキングゾーンを
太き（とることができ、生産性が増大する。さらにワー
キングゾーンの均熱性が良く成るので製品不良率が低く
なる。Since the uniform heating zone in the heating chamber is expanded, the working zone can be made thicker, increasing productivity.Furthermore, since the uniform heating of the working zone is improved, the product defect rate is reduced.
加熱サイクルの時間が短くなるので生産性が高（なり、
又、加熱時間が短くなるので電気使用料が減少する。The heating cycle time is shortened, resulting in high productivity.
Also, since the heating time is shortened, electricity usage costs are reduced.
第１図は本発明の実施例にかかる真空熱処理炉の主要部
分の概略縦断面図、第２図は実施例の温度制御法を説明
するマスタースレーブ方式の回路図、第３Ａ図及び第３
Ｂ図は、従来例と本発明の実施例とにおける均熱ゾーン
を示す模式図、第４Ａ図及び第４Ｂ図は従来の真空熱処
理炉の主要部分の概略縦断面図及び側断面図、第５図は
ワークピースの斜視図、第６図は従来例のヒータの規定
温度と、ワークピースの前後方向の中心部ｆａ）との温
度上昇を示すグラフ、及び第７図は従来例においてワー
クピースの部分によって温度上昇に差があることを示す
グラフである。
なお、図において、
（１）・・・・・・・・・・・・・・・・・真空熱処理
炉（２）・・・・・・・・・・・・・・・・・加 熱
室（３）・・・・・・・・・・・・・・・・・ワー
クピース（４］ （５１（５°）・・・・・・・・・・
ヒ − タロ）（６°）・・・・・・・・・・・・
・仕 切 弁■）・・・・・・・・・・・・・・・
・準 備 室Ｕ）・・・・・・・・・・・・・・・
・冷 却 室１４１ （１５） （Ｉｓｏ）・・・
・・・・電 源１６） ｆ１７） （１７°）・
・・・・・・温度センサー化 理 人
飯 阪 泰 雄
第１
図
・・・・・・・・真空熱処理炉
２
・・・・・・・・・準備室
４・５・５′・・・・ヒータ
６・６′・・・・・・仕切弁
１６・１７・１７−・・・・温度センサー１８・・・・
・・・・マスタープログラム温度調整ｚ土１９・１９′
・・・・・偏矛温度調整：を第３Ａ図
第３Ｂ図
第５
図
↑
第６図
第７
図FIG. 1 is a schematic longitudinal sectional view of the main parts of a vacuum heat treatment furnace according to an embodiment of the present invention, FIG. 2 is a master-slave circuit diagram explaining the temperature control method of the embodiment, and FIGS. 3A and 3
Figure B is a schematic diagram showing the soaking zones in the conventional example and the embodiment of the present invention, Figures 4A and 4B are schematic longitudinal sectional views and side sectional views of the main parts of the conventional vacuum heat treatment furnace, and Figure 5 The figure is a perspective view of the workpiece, FIG. 6 is a graph showing the temperature rise between the specified temperature of the heater in the conventional example and the center part fa) of the workpiece in the front-rear direction, and FIG. 7 is a graph showing the temperature rise of the workpiece in the conventional example. It is a graph showing that there are differences in temperature rise depending on the part. In addition, in the figure, (1)・・・・・・・・・・・・・・・Vacuum heat treatment furnace (2)・・・・・・・・・・・・・・・・・・Heating Chamber (3)... Workpiece (4) (51 (5°)...
Hi-Taro) (6°)・・・・・・・・・・・・
・Partition valve■)・・・・・・・・・・・・・・・
・Preparation room U)・・・・・・・・・・・・・・・
・Cooling chamber 141 (15) (Iso)...
...Power supply 16) f17) (17°)
・・・・・・Temperature sensorization Yasushi Saka, Human Food 1 Figure ・・・・・・Vacuum heat treatment furnace 2 ・・・・・・Preparation room 4, 5, 5'...・Heater 6, 6'...Gate valve 16, 17, 17-...Temperature sensor 18...
...Master program temperature adjustment z Sat 19/19'
・・・・・・Blade temperature adjustment: Figure 3A, Figure 3B, Figure 5 ↑ Figure 6, Figure 7
Claims (4)
方向の周囲から加熱する第１の加熱体が設けられている
真空熱処理炉において、前記被処理物を前記軸方向の前
後から加熱する第２の加熱体を設け、該第２の加熱体は
前記第１の加熱体とは別個に温度を制御できるようにし
たことを特徴とする真空熱処理炉。(1) In a vacuum heat treatment furnace provided with a first heating body that heats the workpiece in the heating chamber from the periphery of the workpiece in the axial direction, the workpiece is heated before and after the workpiece in the axial direction. 1. A vacuum heat treatment furnace, characterized in that a second heating element is provided which heats the furnace, and the temperature of the second heating element can be controlled separately from that of the first heating element.
入口扉及び出口扉に取り付けられた請求項（１）に記載
の真空熱処理炉。(2) The vacuum heat treatment furnace according to claim (1), wherein the second heating body is attached to the inlet door and outlet door for the object to be processed of the heating chamber.
室に続く準備室又は冷却室との間に設けられた仕切弁で
ある請求項（１）又は（２）に記載の真空熱処理炉。(3) The vacuum heat treatment according to claim (1) or (2), wherein the inlet door and the outlet door are gate valves provided between the heating chamber and a preparation chamber or a cooling chamber following the heating chamber. Furnace.
方向の周囲から加熱する第１の加熱体が設けられている
真空熱処理炉において、前記被処理物を前記軸方向の前
後から加熱する第２の加熱体を設け、該第２の加熱体は
、前記被処理物の前記軸方向の前後面の中心部の近傍に
設けた温度センサーの検知温度に基いて温度制御され、
前記第１の加熱体は、前記被処理物の前記軸方向の周囲
で前記被処理物の近傍に設けた温度センサーの検知温度
に基いて温度制御されることを特徴とする真空熱処理炉
。(4) In a vacuum heat treatment furnace provided with a first heating body that heats the workpiece in the heating chamber from the periphery of the workpiece in the axial direction, the workpiece is heated before and after the workpiece in the axial direction. A second heating body is provided which heats the object, and the temperature of the second heating body is controlled based on the temperature detected by a temperature sensor provided near the center of the front and rear surfaces of the object to be treated in the axial direction.
The vacuum heat treatment furnace is characterized in that the temperature of the first heating body is controlled based on the temperature detected by a temperature sensor provided near the object to be processed around the object in the axial direction.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP24608589A JP2954607B2 (en) | 1989-09-21 | 1989-09-21 | In-line vacuum heat treatment furnace |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP24608589A JP2954607B2 (en) | 1989-09-21 | 1989-09-21 | In-line vacuum heat treatment furnace |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH03110382A true JPH03110382A (en) | 1991-05-10 |
| JP2954607B2 JP2954607B2 (en) | 1999-09-27 |
Family
ID=17143266
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP24608589A Expired - Fee Related JP2954607B2 (en) | 1989-09-21 | 1989-09-21 | In-line vacuum heat treatment furnace |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2954607B2 (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100616256B1 (en) * | 2004-09-24 | 2006-08-31 | (주)써모텍 | Electric furnace comprising dark wall heater |
| JP2007084870A (en) * | 2005-09-21 | 2007-04-05 | Ishikawajima Harima Heavy Ind Co Ltd | Carburizing treatment apparatus and method |
| CN103924046A (en) * | 2014-05-06 | 2014-07-16 | 佛山市南海矽钢铁芯制造有限公司 | Vacuum annealing furnace |
| CN109144149A (en) * | 2018-10-25 | 2019-01-04 | 北京黎明航发动力科技有限公司 | A kind of vacuum heat treatment furnace automatic control system and experimental method |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103937944B (en) * | 2014-05-06 | 2016-05-18 | 佛山市南海矽钢铁芯制造有限公司 | A kind of vacuum annealing furnace |
-
1989
- 1989-09-21 JP JP24608589A patent/JP2954607B2/en not_active Expired - Fee Related
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100616256B1 (en) * | 2004-09-24 | 2006-08-31 | (주)써모텍 | Electric furnace comprising dark wall heater |
| JP2007084870A (en) * | 2005-09-21 | 2007-04-05 | Ishikawajima Harima Heavy Ind Co Ltd | Carburizing treatment apparatus and method |
| US8764915B2 (en) | 2005-09-21 | 2014-07-01 | Ishikawajima-Harima Heavy Industries Co., Ltd. | Carburizing treatment apparatus and method |
| CN103924046A (en) * | 2014-05-06 | 2014-07-16 | 佛山市南海矽钢铁芯制造有限公司 | Vacuum annealing furnace |
| CN103924046B (en) * | 2014-05-06 | 2016-05-18 | 佛山市南海矽钢铁芯制造有限公司 | Vacuum annealing furnace |
| CN109144149A (en) * | 2018-10-25 | 2019-01-04 | 北京黎明航发动力科技有限公司 | A kind of vacuum heat treatment furnace automatic control system and experimental method |
| CN109144149B (en) * | 2018-10-25 | 2023-09-19 | 北京黎明航发动力科技有限公司 | Automatic control system and experimental method for vacuum heat treatment furnace |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2954607B2 (en) | 1999-09-27 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| TW457617B (en) | Heat-treating method and heat-treating reactor | |
| KR100282464B1 (en) | Temperature control method and apparatus of heat treatment apparatus | |
| US20080181826A1 (en) | Sterilizing tunnel for pharmaceutical containers | |
| JP4880864B2 (en) | Method for heat treating a substrate | |
| US5291514A (en) | Heater autotone control apparatus and method | |
| KR20160120762A (en) | Sintering furnace for components made of sintered material, in particular dental components | |
| JPH03110382A (en) | Vacuum heat treating furnace | |
| US3311694A (en) | Diffusion furnace utilizing high speed recovery | |
| ES489039A1 (en) | Method of and an apparatus for continuous heat treatment of separated elongated metallic material | |
| CN206169161U (en) | Furnace temperature automatic regulating system's forge furnace | |
| GB1580932A (en) | Induction-heated temperature equalization furnace or zone | |
| JP2913778B2 (en) | Vacuum furnace | |
| JP3466673B2 (en) | Vacuum furnace with movable heat reflector | |
| KR20210067404A (en) | Dental furnace | |
| JPH0452215A (en) | Vacuum furnace and method for uniformizing temperature in vacuum furnace | |
| JP2867629B2 (en) | Vacuum furnace | |
| CN207197259U (en) | A kind of high temperature pusher electric kiln that there is height to combine heating bar | |
| JPH0419990A (en) | Method and device for heating | |
| JPS6041965Y2 (en) | Infrared heating sterilizer | |
| JP2946649B2 (en) | Vacuum furnace and temperature uniforming method in vacuum furnace | |
| JPH02309188A (en) | Heating and melting furnace for disposal or the like | |
| JP3837103B2 (en) | Electric furnace temperature control method and electric furnace | |
| JPS62247020A (en) | Heat treatment of metal by fluidized bed furnace | |
| JPS59180707A (en) | Program-controlled heat treatment device | |
| PL72346B2 (en) |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20080716 Year of fee payment: 9 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20090716 Year of fee payment: 10 |
|
| LAPS | Cancellation because of no payment of annual fees |