JPH0310528U

JPH0310528U -

Info

Publication number: JPH0310528U
Application number: JP7007089U
Authority: JP
Priority date: 1989-06-15
Filing date: 1989-06-15
Publication date: 1991-01-31
Anticipated expiration: 2004-06-15
Also published as: JPH0627952Y2

Description

[Brief explanation of the drawing]

第１図は本考案の一例に係るウエハトレイの縦
断面図。第２図は本考案の一例に係るサセプタの
縦断面図。第３図は本考案の一例に係るトレイ受
台の縦断面図。第４図はサセプタにウエハトレイ
を戴置したものの縦断面図。第５図はウエハトレ
イをトレイ受台に戴置したものの縦断面図。第６
図は気相成長装置の一例を示す平面図。第７図は
同じものの縦断面図。第８図は実施例に係るトレ
イ受台の平面図。第９図は同じトレイ受台の正面
図。第１０図はフオークの平面図。第１１図は第
１０図の−断面図。第１２図は従来例に係る
ウエハトレイ、サセプタの嵌合状態を示す縦断面
図。１……ウエハトレイ、２……ウエハ戴置部、３
……裏板部、４……周縁、５……内傾斜周面、６
……サセプタ、７……上面部、８……外傾斜周面
、９……サセプタ指示シヤフト、１０……円筒周
面、１１……ウエハ、１２……トレイ受台、１３
……上面部、１４……下面部、１５……外傾斜周
面、１６……取付柄部、１７……穴、１９……ト
レイ受台ベース板、２１……垂直壁、２３……カ
セツト、２５，２６……ゲートバルブ、２７……
直線導入機、２８……搬送装置、Ｆ……ロードロ
ツク室、Ｇ……成長室、Ｈ……ゲートバルブ、ｓ
……サセプタとウエハトレイの間隙、ｔ……トレ
イ受台とトレイの間隙。 FIG. 1 is a longitudinal sectional view of a wafer tray according to an example of the present invention. FIG. 2 is a longitudinal sectional view of a susceptor according to an example of the present invention. FIG. 3 is a longitudinal sectional view of a tray holder according to an example of the present invention. FIG. 4 is a longitudinal cross-sectional view of a susceptor with a wafer tray mounted thereon. FIG. 5 is a longitudinal sectional view of a wafer tray placed on a tray holder. 6th
The figure is a plan view showing an example of a vapor phase growth apparatus. FIG. 7 is a longitudinal sectional view of the same thing. FIG. 8 is a plan view of the tray holder according to the embodiment. FIG. 9 is a front view of the same tray holder. Figure 10 is a plan view of the fork. FIG. 11 is a cross-sectional view of FIG. 10. FIG. 12 is a longitudinal cross-sectional view showing the fitted state of a wafer tray and a susceptor according to a conventional example. 1...Wafer tray, 2...Wafer placement part, 3
... Back plate part, 4 ... Peripheral edge, 5 ... Inner sloped peripheral surface, 6
... Susceptor, 7 ... Upper surface part, 8 ... Outer inclined peripheral surface, 9 ... Susceptor indication shaft, 10 ... Cylindrical peripheral surface, 11 ... Wafer, 12 ... Tray pedestal, 13
...Top surface part, 14...Bottom surface part, 15...Outer inclined peripheral surface, 16...Mounting handle part, 17...Hole, 19...Tray pedestal base plate, 21...Vertical wall, 23...Cassette , 25, 26...gate valve, 27...
Linear introduction machine, 28...Transfer device, F...Load lock chamber, G...Growth chamber, H...Gate valve, s
...Gap between susceptor and wafer tray, t...Gap between tray pedestal and tray.

Claims

[Scope of claims for utility model registration] (1) Wafer mounting section 2 on which the wafer is to be mounted
is drilled, and a hole for inserting into the susceptor is drilled in the lower surface, leaving the periphery 4, so that the periphery connecting the flat back plate 3 in the center of the hole and the bottom of the periphery 4 is narrower at the top and wider at the bottom. a wafer tray 1 having an inclined inner circumferential surface 5; a susceptor 6 having a flat upper surface 7 and an outer inclined circumferential surface 8 formed on at least an upper part of the side circumference and narrow at the top and wide at the bottom; The shape of the wafer tray and susceptor is characterized in that when the wafer tray 1 is placed on the susceptor 6, the two come into contact through the inner and outer inclined peripheral surfaces 5 and 8. (2) A flat upper surface part 13, a lower surface part 14, a mounting handle part 16, and an outer inclined peripheral surface 15 which is a peripheral surface connecting the upper surface part 13 and the lower surface part 14 and is inclined so as to be narrower at the top and wider at the bottom. The tray pedestal 12 has a wafer mounting portion 2 on the top surface of which a wafer is to be placed, and a hole for inserting the wafer into the tray pedestal 12 is bored in the bottom surface leaving the periphery 4. The wafer tray 1 has an inner sloped peripheral surface 5 which is narrower at the top and wider at the bottom.
2, the wafer tray 1 is guided by the inner and outer inclined peripheral surfaces 5, 15, and the bottom of the peripheral edge 4 of the wafer tray 1 is placed on the tray support part 31 and the mounting handle part 1.
The shape of the wafer tray/tray pedestal is characterized by being in contact with the wafer tray/tray holder.