JPH03100352U - - Google Patents

Info

Publication number

JPH03100352U

JPH03100352U JP838490U JP838490U JPH03100352U JP H03100352 U JPH03100352 U JP H03100352U JP 838490 U JP838490 U JP 838490U JP 838490 U JP838490 U JP 838490U JP H03100352 U JPH03100352 U JP H03100352U

Authority

JP

Japan

Prior art keywords

ion

extraction electrode

generation chamber

etching apparatus

electrode

Prior art date

1990-01-31

Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)

Pending

Links

• Espacenet
• Global Dossier
• Discuss

• 238000000605 extraction Methods 0.000 claims description 8
• 238000000992 sputter etching Methods 0.000 claims description 4
• 238000010884 ion-beam technique Methods 0.000 claims description 3
• 150000002500 ions Chemical class 0.000 claims 5
• 238000005530 etching Methods 0.000 claims 1
• 230000002452 interceptive effect Effects 0.000 claims 1
• 238000010586 diagram Methods 0.000 description 1
• 238000000034 method Methods 0.000 description 1