JPH0299962U - - Google Patents
Info
- Publication number
- JPH0299962U JPH0299962U JP1989006656U JP665689U JPH0299962U JP H0299962 U JPH0299962 U JP H0299962U JP 1989006656 U JP1989006656 U JP 1989006656U JP 665689 U JP665689 U JP 665689U JP H0299962 U JPH0299962 U JP H0299962U
- Authority
- JP
- Japan
- Prior art keywords
- magnetron cathode
- magnet
- sputtering device
- figures
- magnetic flux
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Physical Vapour Deposition (AREA)
- Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1989006656U JPH0299962U (enExample) | 1989-01-24 | 1989-01-24 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1989006656U JPH0299962U (enExample) | 1989-01-24 | 1989-01-24 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0299962U true JPH0299962U (enExample) | 1990-08-09 |
Family
ID=31211006
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1989006656U Pending JPH0299962U (enExample) | 1989-01-24 | 1989-01-24 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0299962U (enExample) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2011105280A1 (ja) * | 2010-02-24 | 2011-09-01 | 株式会社 アルバック | 磁気回路及びマグネトロンスパッタ装置 |
-
1989
- 1989-01-24 JP JP1989006656U patent/JPH0299962U/ja active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2011105280A1 (ja) * | 2010-02-24 | 2011-09-01 | 株式会社 アルバック | 磁気回路及びマグネトロンスパッタ装置 |