JPH0292879A - Ceramic porous body having smooth surface and production thereof - Google Patents
Ceramic porous body having smooth surface and production thereofInfo
- Publication number
- JPH0292879A JPH0292879A JP24614688A JP24614688A JPH0292879A JP H0292879 A JPH0292879 A JP H0292879A JP 24614688 A JP24614688 A JP 24614688A JP 24614688 A JP24614688 A JP 24614688A JP H0292879 A JPH0292879 A JP H0292879A
- Authority
- JP
- Japan
- Prior art keywords
- porous body
- ceramic
- ceramic porous
- smooth surface
- abrasive grains
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000919 ceramic Substances 0.000 title claims abstract description 48
- 238000004519 manufacturing process Methods 0.000 title claims description 5
- 239000006061 abrasive grain Substances 0.000 claims abstract description 18
- 239000011148 porous material Substances 0.000 claims abstract description 17
- 230000003746 surface roughness Effects 0.000 claims abstract description 14
- 238000000034 method Methods 0.000 claims abstract description 11
- 238000005498 polishing Methods 0.000 claims description 13
- 238000005299 abrasion Methods 0.000 abstract description 3
- 235000019592 roughness Nutrition 0.000 abstract 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 9
- 239000003463 adsorbent Substances 0.000 description 7
- 235000012431 wafers Nutrition 0.000 description 6
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 5
- 239000010432 diamond Substances 0.000 description 5
- 229910003460 diamond Inorganic materials 0.000 description 5
- 230000013011 mating Effects 0.000 description 5
- 229910052710 silicon Inorganic materials 0.000 description 5
- 239000010703 silicon Substances 0.000 description 5
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 4
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 4
- 239000000463 material Substances 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- 239000000843 powder Substances 0.000 description 3
- 238000001035 drying Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000004744 fabric Substances 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 230000002093 peripheral effect Effects 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 1
- 239000004677 Nylon Substances 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 239000002270 dispersing agent Substances 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 229910052602 gypsum Inorganic materials 0.000 description 1
- 239000010440 gypsum Substances 0.000 description 1
- 239000010687 lubricating oil Substances 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 150000001247 metal acetylides Chemical class 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 239000011225 non-oxide ceramic Substances 0.000 description 1
- 229910052575 non-oxide ceramic Inorganic materials 0.000 description 1
- 229920001778 nylon Polymers 0.000 description 1
- 239000003921 oil Substances 0.000 description 1
- 229910052574 oxide ceramic Inorganic materials 0.000 description 1
- 239000011224 oxide ceramic Substances 0.000 description 1
- SIWVEOZUMHYXCS-UHFFFAOYSA-N oxo(oxoyttriooxy)yttrium Chemical compound O=[Y]O[Y]=O SIWVEOZUMHYXCS-UHFFFAOYSA-N 0.000 description 1
- 229920000058 polyacrylate Polymers 0.000 description 1
- 229920002689 polyvinyl acetate Polymers 0.000 description 1
- 239000011118 polyvinyl acetate Substances 0.000 description 1
- 238000003672 processing method Methods 0.000 description 1
- 239000011819 refractory material Substances 0.000 description 1
- 239000011029 spinel Substances 0.000 description 1
- 229910052596 spinel Inorganic materials 0.000 description 1
- -1 unglazed pottery Substances 0.000 description 1
Landscapes
- Porous Artificial Stone Or Porous Ceramic Products (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、滑らかな表面を有するセラミックス多孔体と
その製造方法に関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a ceramic porous body having a smooth surface and a method for manufacturing the same.
〔従来の技術）
従来のセラミックス多孔体は、素焼の陶器、耐火物又は
研削砥石等のように多孔買セラミックスからなり、多孔
質材料の全体積部分が材料としての機能を発揮しており
、多孔体の表面に機能を求められるものは少なく、孔を
除くセラミックス部分の表面状態は凹凸の激しい粗いも
のであった。[Prior art] Conventional porous ceramic bodies are made of porous ceramics such as unglazed pottery, refractories, or grinding wheels, and the entire volume of the porous material functions as a material. Few functions were required on the surface of the body, and the surface condition of the ceramic parts, except for the pores, was extremely rough and uneven.
しかるに、近年、真空チャックの吸着体又は耐摩耗摺動
部品等としてセラミックス多孔体を使用したいという要
求がある。However, in recent years, there has been a demand for the use of porous ceramic bodies as adsorbents of vacuum chucks or wear-resistant sliding parts.
真空チャックの吸着体としてのセラミックス多孔体は、
板状のもので、背部より真空吸引することにより、前面
に被吸着物等を吸着し、その搬送や研磨加工等に用いら
れる。The ceramic porous body used as the adsorbent for the vacuum chuck is
It is a plate-shaped product that attracts objects to be attracted to the front surface by vacuum suction from the back, and is used for transportation, polishing, etc.
又、耐摩耗摺動部品としてのセラミックス多孔体は、そ
の間気孔に潤滑油を含油させ、従前の焼結含油軸受等の
代替品として用いられる。Furthermore, the ceramic porous body used as a wear-resistant sliding component has its pores impregnated with lubricating oil, and is used as a substitute for conventional sintered oil-impregnated bearings.
（発明が解決しようとする課題）
しかしながら、上記従来のセラミックス多孔体において
は、孔以外のセラミックス部分の表面状態が粗いため、
真空チャックの吸着体として用いる場合には、被吸着物
の表面に傷をつけたり、その加工精度の低下をもたらし
、又、耐摩耗摺動部品として用いる場合には、摺動時に
相手材料を摩耗させてしまい、使用不可能であった。(Problem to be Solved by the Invention) However, in the conventional ceramic porous body described above, the surface condition of the ceramic portion other than the pores is rough;
When used as an adsorbent for a vacuum chuck, it may damage the surface of the object to be adsorbed or reduce its machining accuracy, and when used as a wear-resistant sliding part, it may wear out the mating material during sliding. It became unusable.
一方、セラミックス多孔体の表面状態を密にする方法と
しては、次の表面加工方法があるが、以下の理由で困難
であった。On the other hand, the following surface processing method is available as a method for making the surface condition of a porous ceramic body dense, but it is difficult for the following reasons.
一般に、セラミックスの表面加工は、緻密質、多孔質に
限らず、研削と研磨に分けられる。研削加工は、ダイヤ
モンド砥石によるグラインド加工であり、微小領域の観
点から見ると、セラミックス表面に砥石のダイヤモンド
を突っ込み、セラミックスを破壊しながら削り落とす。In general, surface processing of ceramics is divided into grinding and polishing, regardless of whether it is dense or porous. Grinding is a grinding process using a diamond whetstone, and from the perspective of a microscopic area, the diamond of the whetstone is thrust into the ceramic surface and the ceramic is ground down while being destroyed.
従って、グラインド加工は、被加工物の加工部分近傍に
多大なダメージを与える。多孔質セラミックスにおいて
は、緻密質セラミックスに比べ、孔という多くの欠陥を
もつため、このダメージが深部に及び、ダメージ部分の
除去が容易でない。Therefore, grinding causes great damage to the vicinity of the machined part of the workpiece. Porous ceramics have more defects called pores than dense ceramics, so this damage extends deeper and it is not easy to remove the damaged parts.
研削加工後、緻密質セラミックスに研磨加工を施すこと
によって平滑な表面が得られる。研磨加工は、遊離砥粒
を用いたボリシング加工であり、セラミックス表面のう
ち、最も突出する微小な部分を塑性変形させて除去する
ことによって達成され、ダメージ部分の除去として用い
られると共に、平滑面を造出する。ボリシング加工にお
いては、砥粒粒度を粗いものから細かいものまで数段階
に分け、粗い砥粒で能率良くグラインド加工によって発
生したダメージ部分を除去し、しかる後に微小な砥粒で
表面の平滑さを達成する。After grinding, a smooth surface can be obtained by polishing the dense ceramic. Polishing is a borishing process using free abrasive grains, and is achieved by plastically deforming and removing the most protruding minute part of the ceramic surface.It is used to remove damaged parts, and also to improve smooth surfaces. create. In the boring process, the abrasive grain size is divided into several stages from coarse to fine, and the coarse abrasive grains are used to efficiently remove damaged areas caused by grinding, and then the fine abrasive grains are used to achieve surface smoothness. do.
しかしながら、多孔質セラミックスに対する研磨加工に
おいては、表面に存在する孔径とボリシング加工に用い
られる遊離砥粒径がほぼ同程度になることが多く、この
ような場合は、砥粒が表面の孔に嵌まり込んでクサビと
して機能し、多孔質セラミックスの表面部分を破壊して
しまう。又、表面に砥粒が到った多孔質セラミックスは
、それ自身が砥石のようになり、研磨機の研磨布あるい
は研磨定盤を著しく損耗させる。However, in polishing porous ceramics, the diameter of the pores existing on the surface and the diameter of the free abrasive grains used in the boring process are often approximately the same, and in such cases, the abrasive grains fit into the pores on the surface. It gets stuck and acts as a wedge, destroying the surface of the porous ceramic. In addition, porous ceramics with abrasive grains on the surface act like a grindstone, causing significant wear and tear on the polishing cloth or polishing surface plate of the polishing machine.
そこで、本発明は、真空チャックの吸着体又は耐摩耗摺
動部品等として使用し得る滑らかな表面を有するセラミ
ックス多孔体とその製造方法の提供を目的とする。SUMMARY OF THE INVENTION Therefore, an object of the present invention is to provide a porous ceramic body having a smooth surface that can be used as an adsorbent for a vacuum chuck or a wear-resistant sliding part, and a method for manufacturing the same.
前記課題を解決するため、本発明のセラミックス多孔体
は、孔を除くセラミックス部分の表面粗さを３μｍ以下
の滑らかな面としたものである。In order to solve the above problems, the ceramic porous body of the present invention has a smooth surface with a ceramic portion having a surface roughness of 3 μm or less, excluding the pores.
前記滑らかな面は、研磨面とすることが好ましい。Preferably, the smooth surface is a polished surface.
又、前記セラミックス多孔体の製造方法は、焼成された
セラミックス多孔体の表面をグラインド加工した後、孔
径より十分に小さな砥粒を用いて表面粗さ３μｍ以下に
研磨する方法である。The method for producing the porous ceramic body is a method in which the surface of the fired porous ceramic body is ground and then polished to a surface roughness of 3 μm or less using abrasive grains that are sufficiently smaller than the pore diameter.
前記焼成されたセラミックス多孔体は、孔径分布を予め
制御しておくことが好ましい。It is preferable that the pore size distribution of the fired ceramic porous body be controlled in advance.
上記手段によれば、孔を除くセラミックス部分の表面の
表面粗さが３μｍ以下（好ましくは１μｍ以下）となり
、これと接触又は摺動する相手部材に対して損傷又は摩
耗を与えることがない。表面粗さが３μｍを超えると、
相手部材に損傷又は摩耗を与える。According to the above means, the surface roughness of the surface of the ceramic portion excluding the holes is 3 μm or less (preferably 1 μm or less), and there is no damage or abrasion to the mating member that contacts or slides thereon. When the surface roughness exceeds 3 μm,
Damage or wear to the mating member.
又、孔径より十分に小さな砥粒を用いることにより、砥
粒が表面の孔に嵌まり込んでクサビとして機能すること
はない。Furthermore, by using abrasive grains that are sufficiently smaller than the hole diameter, the abrasive grains will not fit into the holes on the surface and function as a wedge.
砥粒径としては、孔径の数十分の−が望ましい。The abrasive grain size is preferably several tenths of the pore size.
〔実施例） 以下、本発明の詳細な説明する。〔Example) The present invention will be explained in detail below.
実施例１
平均粒径０，５μｍ５純度９９．９％のアルミナ粉末１
００部に、ストイキオメトリツクスピネル０．５部、イ
オン交換水２０部、分散剤としてポリアクリル酸アンモ
ニウム２部をボットミル中に入れ、−昼夜混合してスリ
ップを得た。Example 1 Alumina powder 1 with average particle size 0.5 μm5 purity 99.9%
00 parts, 0.5 parts of stoichiometric spinel, 20 parts of ion-exchanged water, and 2 parts of ammonium polyacrylate as a dispersant were placed in a bot mill and mixed day and night to obtain a slip.
予めイオン交換水で膨潤させておいたバルブチップ２０
部を上記スリップ中に投入し、更に数時間混合した。Valve tip 20 swollen with ion-exchanged water in advance
of the mixture was added to the slip and mixed for a further several hours.
このスリップを石膏板上に注ぎ、直径
１００ｍｍ、厚さ１０ｍｍの円板状の成形体を得た。こ
の成形体を乾燥した後、１５００℃で２時間空気中で焼
成した。This slip was poured onto a gypsum board to obtain a disc-shaped molded product with a diameter of 100 mm and a thickness of 10 mm. After drying this molded body, it was fired in air at 1500°C for 2 hours.
焼成体は、直径８０ｍｍ、厚さ８ｍｍで、バルブチップ
が焼散除去されて、５０μｍの開気孔が分散したアルミ
ナセラミックス多孔体となった。The fired body had a diameter of 80 mm and a thickness of 8 mm, and the valve chip was burnt off to become an alumina ceramic porous body in which open pores of 50 μm were dispersed.
この焼成されたアルミナセラミックス多孔体を、通常の
ダイヤモンド研削盤を用い、直径７５ｍｍ、厚さ７ｍｍ
にグラインド加工した。This fired alumina ceramic porous body was ground to a diameter of 75 mm and a thickness of 7 mm using an ordinary diamond grinder.
Grind processed.
その後、平均粒径５μｍのダイヤモンド遊離砥粒を用い
て上記円板状のアルミナセラミックス多孔体の一面を研
磨加工（ボリシング加工）した。Thereafter, one surface of the disc-shaped alumina ceramic porous body was polished (bored) using free diamond abrasive grains having an average particle size of 5 μm.
このアルミナセラミックス多孔体のポリシング加工した
面の表面粗さを測定したところ、孔を除くセラミックス
部分の表面粗さは、Ｒ□８１μｍであった。When the surface roughness of the polished surface of this alumina ceramic porous body was measured, the surface roughness of the ceramic portion excluding the holes was R□81 μm.
上記円板状のアルミナセラミックス多孔体を、シリコン
ウェーハ研磨用真空チャックの吸着体として用い、シリ
コンウェーへの研磨を行ったところ、シリコンウェー八
に傷がつかず、加工精度の良好なウェーハが得られた。When the above disc-shaped alumina ceramic porous body was used as an adsorbent for a vacuum chuck for polishing silicon wafers to polish silicon wafers, wafers with good processing accuracy were obtained without any scratches on the silicon wafers. It was done.
比較のため、ボリシング加工を施さないアルミナセラミ
ックス多孔体を、上記真空チャックの吸着体として用い
、同様にシリコンウェーへの研磨を行ったところ、シリ
コンウェー八に傷がついて不良となった。この比較用ア
ルミナセラミックス多孔体の表面粗さを測定したところ
、Ｒ，、，３，５μｍであった。For comparison, when a silicon wafer was similarly polished using an alumina ceramic porous body that had not been subjected to the boring process as an adsorbent for the vacuum chuck, the silicon wafer was scratched and defective. The surface roughness of this comparison alumina ceramic porous body was measured and found to be R, 3.5 μm.
実施例２
平均粒径０．１μｍのジルコニア粉末
１００部、酸化イツトリウム６部、ポリ酢酸ビニル１部
、アセトン３０部をボットミル中に入れ、−昼夜混合し
た。Example 2 100 parts of zirconia powder having an average particle size of 0.1 μm, 6 parts of yttrium oxide, 1 part of polyvinyl acetate, and 30 parts of acetone were placed in a bot mill and mixed day and night.
アセトンを乾燥蒸発させた後、ナイロンメツシュを通し
造粒した。After drying and evaporating the acetone, the mixture was granulated through a nylon mesh.
この造粒粉に直径３０μｍのアクリル球５０部を混入し
、１．５トン／ＣＩｎ２の圧力でアイソスタティックプ
レスし、外径１００ｍｍ、内径６３ｍｍ、長さ１２５ｍ
ｍの円筒状の成形体を得た。この成形体を１４５０℃で
２時間空気中で焼成し、外径８０ｍｍ、内径５０ｍｍ、
長さ１００ｍｍの焼成体とした。50 parts of acrylic spheres with a diameter of 30 μm were mixed into this granulated powder, and was isostatically pressed at a pressure of 1.5 tons/CIn2 to obtain an outer diameter of 100 mm, an inner diameter of 63 mm, and a length of 125 m.
A cylindrical molded body of m was obtained. This molded body was fired in air at 1450°C for 2 hours, and the outer diameter was 80 mm, the inner diameter was 50 mm,
The fired body had a length of 100 mm.
この円筒状の焼成体をグラインド加工した後、内周面を
粒径１μｍのダイヤモンドｔ１！１砥粒でボリシング加
工し、その表面粗さをＲ１１，ｘＯ９５μｍとした。After grinding this cylindrical fired body, the inner peripheral surface was subjected to boring with diamond t1!1 abrasive grains having a grain size of 1 μm, and the surface roughness was set to R11, xO 95 μm.
上記円筒状のセラミックス多孔体の開気孔にスピンドル
油な含浸させ、回転軸の軸受に使用したところ、セラミ
ックス多孔体の摩耗も、相手材の摩耗も少なく、軸受け
として良好に使用できた。When the open pores of the cylindrical porous ceramic body were impregnated with spindle oil and used in a bearing for a rotating shaft, there was little wear on the porous ceramic body and on the mating material, and it could be used successfully as a bearing.
比較のため、グラインド加工のみの円筒状のセラミック
ス多孔体を軸受として使用したところ、相手金属を摩耗
させてしまい使用不可能であった。この比較用セラミッ
クス多孔体の内周面の表面粗さは、Ｒ，、、，３，２μ
ｍであった。For comparison, when a cylindrical ceramic porous body that had only been ground was used as a bearing, it wore out the mating metal, making it unusable. The surface roughness of the inner peripheral surface of this ceramic porous body for comparison is R,..., 3,2μ
It was m.
なお、上記各実施例において、セラミックス多孔体の形
状を円板状又は円筒状とする場合について述べたが、こ
れに限定されるものではなく、方形板状、円柱状その他
の形状としてもよい。In each of the above embodiments, the case where the shape of the ceramic porous body is a disk shape or a cylinder shape has been described, but the shape is not limited to this, and it may be a rectangular plate shape, a cylindrical shape, or other shapes.
又、セラミックス多孔体は、アルミナ、ジルコニア等の
酸化物セラミックスに限らず、窒化物、炭化物等の非酸
化物セラミックスとしてもよい。Furthermore, the ceramic porous body is not limited to oxide ceramics such as alumina and zirconia, but may also be non-oxide ceramics such as nitrides and carbides.
以上のように本発明によれば、孔を除くセラミックス部
分の表面の表面粗さが３μｍ以下となり、これと接触又
は摺動する相手部材に対して損傷又は摩耗を与えること
がないので、真空チャックの吸着体又は耐摩耗摺動部品
その他の部材として使用することができ、ひいてはセラ
ミックス多孔体を新たな用途に用いることができる。As described above, according to the present invention, the surface roughness of the surface of the ceramic part excluding the holes is 3 μm or less, and there is no damage or abrasion to the other member that comes into contact with or slides on, so the vacuum chuck The ceramic porous body can be used as an adsorbent or a wear-resistant sliding part or other member, and the ceramic porous body can be used for new purposes.
又、孔径より小さな砥粒を用いることにより、砥粒が表
面の孔に嵌まり込んでクサビとして機能することがない
ので、グラインド加工面を破壊することがないと共に、
研磨機の研磨布や研磨定盤を損耗することがない。In addition, by using abrasive grains smaller than the hole diameter, the abrasive grains will not fit into the holes on the surface and function as a wedge, so the grinding surface will not be destroyed, and
There is no damage to the polishing cloth or polishing surface plate of the polishing machine.
Claims (2)
下の滑らかな面としたことを特徴とする滑らかな表面を
有するセラミックス多孔体。(1) A ceramic porous body having a smooth surface, characterized in that the surface roughness of the ceramic portion excluding the pores is a smooth surface of 3 μm or less.
ド加工した後、孔径より十分に小さな砥粒を用いて表面
粗さ３μｍ以下に研磨することを特徴とする滑らかな表
面を有するセラミックス多孔体の製造方法。(2) Production of a ceramic porous body with a smooth surface characterized by grinding the surface of the fired ceramic porous body and then polishing it to a surface roughness of 3 μm or less using abrasive grains that are sufficiently smaller than the pore diameter. Method.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63246146A JP2736900B2 (en) | 1988-09-30 | 1988-09-30 | Porous ceramic body and manufacturing method thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63246146A JP2736900B2 (en) | 1988-09-30 | 1988-09-30 | Porous ceramic body and manufacturing method thereof |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0292879A true JPH0292879A (en) | 1990-04-03 |
| JP2736900B2 JP2736900B2 (en) | 1998-04-02 |
Family
ID=17144170
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP63246146A Expired - Fee Related JP2736900B2 (en) | 1988-09-30 | 1988-09-30 | Porous ceramic body and manufacturing method thereof |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2736900B2 (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007099584A (en) * | 2005-10-07 | 2007-04-19 | Nitsukatoo:Kk | Porous electroconductive zirconia-based sintered compact and vacuum chuck member made of the same |
| JP2008100892A (en) * | 2006-10-20 | 2008-05-01 | Nitsukatoo:Kk | Member for vacuum chuck composed of porous alumina sintered compact, and its production method |
| JP2017178665A (en) * | 2016-03-30 | 2017-10-05 | 京セラ株式会社 | Porous ceramic, gas dispersion sheet and member for absorption |
| JPWO2021220943A1 (en) * | 2020-04-27 | 2021-11-04 |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62283885A (en) * | 1986-05-31 | 1987-12-09 | イビデン株式会社 | Porous refractory formed body for burning functional parts |
-
1988
- 1988-09-30 JP JP63246146A patent/JP2736900B2/en not_active Expired - Fee Related
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62283885A (en) * | 1986-05-31 | 1987-12-09 | イビデン株式会社 | Porous refractory formed body for burning functional parts |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007099584A (en) * | 2005-10-07 | 2007-04-19 | Nitsukatoo:Kk | Porous electroconductive zirconia-based sintered compact and vacuum chuck member made of the same |
| JP2008100892A (en) * | 2006-10-20 | 2008-05-01 | Nitsukatoo:Kk | Member for vacuum chuck composed of porous alumina sintered compact, and its production method |
| JP2017178665A (en) * | 2016-03-30 | 2017-10-05 | 京セラ株式会社 | Porous ceramic, gas dispersion sheet and member for absorption |
| JPWO2021220943A1 (en) * | 2020-04-27 | 2021-11-04 | ||
| WO2021220943A1 (en) * | 2020-04-27 | 2021-11-04 | 京セラ株式会社 | Air-permeable member, member for semiconductor production device, plug, and adsorption member |
| TWI785577B (en) * | 2020-04-27 | 2022-12-01 | 日商京瓷股份有限公司 | Air-permeable member, member for semiconductor manufacturing apparatus, plug and sucking member |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2736900B2 (en) | 1998-04-02 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP5539339B2 (en) | High porosity vitrified superabrasive product and manufacturing method | |
| JP2017170554A (en) | Vitrified grindstone for low pressure lapping for lapping machine and polishing method using the same | |
| JPH0292879A (en) | Ceramic porous body having smooth surface and production thereof | |
| JP2003181764A (en) | Method for manufacturing porous vitrified grinding stone and pore forming agent | |
| JP2003321270A (en) | Alumina ceramics superior in wearing resistance and corrosion resistance and method for manufacturing its molding | |
| JP2002166355A (en) | Polishing compact and polishing surface plate using the same | |
| JP2015199138A (en) | Grindstone, polishing device, polishing method and method for producing ceramic member | |
| JPH0571533B2 (en) | ||
| JP2003117806A (en) | Mirror-polishing method for polycrystalline ceramics | |
| JP3380703B2 (en) | Manufacturing method of ceramic ball | |
| Indge | Lapping, honing, and polishing | |
| JPS59166464A (en) | Polishing surface plate and method of manufacturing it | |
| JPH01304174A (en) | Polishing fluid and method of polishing hard disc base plate | |
| JPH02238905A (en) | Manufacture of ceramic product | |
| JPH05293762A (en) | Precision grinding polishing wheel | |
| JP2001038640A (en) | Centerless grinding wheel and regenerating method and grinding method therefor | |
| TW202339868A (en) | Ceramic bond grinding tool | |
| JPS58132447A (en) | Method of machining molded ceramic piece | |
| JP2002047068A (en) | Sintered silicon nitride and cutting tool using it and their manufacturing methods | |
| JPH0818316B2 (en) | Method for processing outer surface of β-alumina tube formed body or calcined body and polishing tool used therefor | |
| JP6178216B2 (en) | Grinding / lapping / polishing method and apparatus thereof | |
| JPH0890427A (en) | Duplex surface grinding wheel | |
| CN117260493A (en) | Two-stage chemical mechanical grinding processing method for aluminum oxide ceramic part | |
| JPH0596462A (en) | Working method for ceramic part | |
| JP2001198800A (en) | Method for machining plate glass surface |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |