JPH0292603U - - Google Patents
Info
- Publication number
- JPH0292603U JPH0292603U JP94689U JP94689U JPH0292603U JP H0292603 U JPH0292603 U JP H0292603U JP 94689 U JP94689 U JP 94689U JP 94689 U JP94689 U JP 94689U JP H0292603 U JPH0292603 U JP H0292603U
- Authority
- JP
- Japan
- Prior art keywords
- light source
- chamber
- light
- housing
- lamp
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP94689U JPH0292603U (forum.php) | 1989-01-09 | 1989-01-09 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP94689U JPH0292603U (forum.php) | 1989-01-09 | 1989-01-09 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0292603U true JPH0292603U (forum.php) | 1990-07-23 |
Family
ID=31200407
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP94689U Pending JPH0292603U (forum.php) | 1989-01-09 | 1989-01-09 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0292603U (forum.php) |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6916585B2 (en) | 2000-07-16 | 2005-07-12 | Board Of Regents, The University Of Texas Systems | Method of varying template dimensions to achieve alignment during imprint lithography |
| US7122079B2 (en) | 2004-02-27 | 2006-10-17 | Molecular Imprints, Inc. | Composition for an etching mask comprising a silicon-containing material |
| JP2006331744A (ja) * | 2005-05-24 | 2006-12-07 | Honda Motor Co Ltd | 車両用ターンシグナルランプ |
| US7179396B2 (en) | 2003-03-25 | 2007-02-20 | Molecular Imprints, Inc. | Positive tone bi-layer imprint lithography method |
| US7396475B2 (en) | 2003-04-25 | 2008-07-08 | Molecular Imprints, Inc. | Method of forming stepped structures employing imprint lithography |
| US8850980B2 (en) | 2006-04-03 | 2014-10-07 | Canon Nanotechnologies, Inc. | Tessellated patterns in imprint lithography |
| US9223202B2 (en) | 2000-07-17 | 2015-12-29 | Board Of Regents, The University Of Texas System | Method of automatic fluid dispensing for imprint lithography processes |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59132501A (ja) * | 1983-01-19 | 1984-07-30 | 株式会社小糸製作所 | 車輌用灯具 |
| JPS6315682A (ja) * | 1986-07-04 | 1988-01-22 | Kokichi Wada | 磁石モ−タ− |
-
1989
- 1989-01-09 JP JP94689U patent/JPH0292603U/ja active Pending
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59132501A (ja) * | 1983-01-19 | 1984-07-30 | 株式会社小糸製作所 | 車輌用灯具 |
| JPS6315682A (ja) * | 1986-07-04 | 1988-01-22 | Kokichi Wada | 磁石モ−タ− |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6916585B2 (en) | 2000-07-16 | 2005-07-12 | Board Of Regents, The University Of Texas Systems | Method of varying template dimensions to achieve alignment during imprint lithography |
| US9223202B2 (en) | 2000-07-17 | 2015-12-29 | Board Of Regents, The University Of Texas System | Method of automatic fluid dispensing for imprint lithography processes |
| US7179396B2 (en) | 2003-03-25 | 2007-02-20 | Molecular Imprints, Inc. | Positive tone bi-layer imprint lithography method |
| US7396475B2 (en) | 2003-04-25 | 2008-07-08 | Molecular Imprints, Inc. | Method of forming stepped structures employing imprint lithography |
| US7122079B2 (en) | 2004-02-27 | 2006-10-17 | Molecular Imprints, Inc. | Composition for an etching mask comprising a silicon-containing material |
| JP2006331744A (ja) * | 2005-05-24 | 2006-12-07 | Honda Motor Co Ltd | 車両用ターンシグナルランプ |
| US8850980B2 (en) | 2006-04-03 | 2014-10-07 | Canon Nanotechnologies, Inc. | Tessellated patterns in imprint lithography |