JPH0291364U - - Google Patents
Info
- Publication number
- JPH0291364U JPH0291364U JP79489U JP79489U JPH0291364U JP H0291364 U JPH0291364 U JP H0291364U JP 79489 U JP79489 U JP 79489U JP 79489 U JP79489 U JP 79489U JP H0291364 U JPH0291364 U JP H0291364U
- Authority
- JP
- Japan
- Prior art keywords
- semiconductor laser
- laser array
- laser beam
- paths
- array device
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000004065 semiconductor Substances 0.000 claims description 13
- 239000000463 material Substances 0.000 claims description 5
- 230000010355 oscillation Effects 0.000 claims description 5
- 238000005219 brazing Methods 0.000 claims description 4
- 239000000758 substrate Substances 0.000 claims description 3
- 238000000926 separation method Methods 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 4
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 1
- 229910020658 PbSn Inorganic materials 0.000 description 1
- 101150071746 Pbsn gene Proteins 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
Description
第1図、第2図は本考案の第1の実施例を示す
図で、第2図は第1図の平面図である。第3図及
び第4図は第2の実施例を示す図で、第4図は第
3図の側面図である。第5図は第3の実施例のレ
ーザアレイ装置を示す図である。第6図及び第7
図は第4の実施例を示す図で、第7図は通路、第
6図はそれを用いたレーザアレイ装置の図である
。第8図及び第9図、第10図は通路の断面図で
ある。第11図及び第12図は従来例を示す図で
ある。
1,201…ヒートシンク、2,202…ろう
材、3,23,203…GaAs基板、4,20
4…半導体レーザアレイ素子、5,25,55,
205…溝(通路)、6a,6b,6c,6d…
電極、7,33,72…Ti/Pt/Au金属層
、8,28,58,70,80,208…Si板
(通路用部材)、8f,8b…通路端面、9a,
9b,9c,9d…通路、10,30,210…
フオトダイオード、11a,11b,11c,1
1d…受光部、21…SiCヒートシンク、22
,34…PbSnろう材、31a,31b,31
c,31d…受光部、32a,32b,32c,
32d…Ti/Pt/Auパターン電極、36,
37a,37b,37c,37d…ワイヤーボン
デイング、59a,59b,59c,59d…通
路、78,81…SiO2膜、85…溝、204
a,204b,204c…レーザ発振領域、20
6a,206b,206c…半導体レーザ素子、
209a,209b,209c…通路、211a
,211b,211c…受光部、221b,22
2b,223b…後方出射光。
1 and 2 are diagrams showing a first embodiment of the present invention, and FIG. 2 is a plan view of FIG. 1. 3 and 4 are views showing the second embodiment, and FIG. 4 is a side view of FIG. 3. FIG. 5 is a diagram showing a laser array device of a third embodiment. Figures 6 and 7
The figures show the fourth embodiment, where FIG. 7 is a passageway and FIG. 6 is a diagram of a laser array device using the same. 8, 9, and 10 are cross-sectional views of the passage. FIGS. 11 and 12 are diagrams showing conventional examples. 1,201...Heat sink, 2,202...Brazing material, 3,23,203...GaAs substrate, 4,20
4... Semiconductor laser array element, 5, 25, 55,
205...Groove (passage), 6a, 6b, 6c, 6d...
Electrode, 7, 33, 72... Ti/Pt/Au metal layer, 8, 28, 58, 70, 80, 208... Si plate (passage member), 8f, 8b... Passage end surface, 9a,
9b, 9c, 9d...Aisle, 10, 30, 210...
Photodiode, 11a, 11b, 11c, 1
1d... Light receiving section, 21... SiC heat sink, 22
, 34...PbSn brazing material, 31a, 31b, 31
c, 31d...light receiving section, 32a, 32b, 32c,
32d...Ti/Pt/Au pattern electrode, 36,
37a, 37b, 37c, 37d... Wire bonding, 59a, 59b, 59c, 59d... Passage, 78, 81... SiO 2 film, 85... Groove, 204
a, 204b, 204c...laser oscillation region, 20
6a, 206b, 206c... semiconductor laser element,
209a, 209b, 209c...Passage, 211a
, 211b, 211c...light receiving section, 221b, 22
2b, 223b... Rear emitted light.
Claims (1)
して配列され、それぞれがレーザビームを前方と
後方に送出する半導体レーザアレイ素子と、上記
後方側のビームを互いに他の後方側のビームより
隔離して伝播させる互いに空間的に分離された複
数の通路と、該通路を経たレーザビームを受光す
る受光素子とを具備し、上記複数の通路は、該通
路に入るレーザビームに対して平行に設けられて
いることを特徴とする半導体レーザアレイ装置。 (2) 複数のレーザ発振領域が同一基板上に近接
して配列され、それぞれがレーザビームを前方と
後方に送出する半導体レーザアレイ素子と、上記
後方側のビームを互いに他の後方側ビームより隔
離して伝播させる互いに空間的に分離された複数
の通路と、該通路を経たレーザビームを受光する
受光素子と、一主面に上記発振領域間隔と同じ間
隔で電気的に分離された電極層が設けられたヒー
トシンクとを具備し、上記電極層に半導体レーザ
アレイ素子の発振領域側がそれぞれ相対して電気
的熱的に固着され、上記通路が電極層と電気的に
絶縁されて上記ヒートシンク上に固定されている
ことを特徴とする半導体レーザアレイ装置。 (3) 請求項1または2記載の半導体レーザアレ
イ装置において、通路内壁に反射膜が形成されて
いることを特徴とする半導体レーザアレイ装置。 (4) 請求項2または3記載の半導体レーザアレ
イ装置において、複数の通路の両端の通路の外側
に、前記通路に沿つて溝を設けたことを特徴とす
る半導体レーザアレイ装置。 (5) 請求項2,3,4記載の半導体レーザアレ
イ装置において、通路とヒートシンクを固着する
ろう材は、半導体レーザアレイ素子とヒートシン
クを固着するろう材よりも隔点が低い材質から成
ることを特徴とする半導体レーザアレイ装置。[Claims for Utility Model Registration] (1) A plurality of laser oscillation regions are arranged close to each other on the same substrate, and each includes a semiconductor laser array element that emits a laser beam forward and backward, and a semiconductor laser array element that emits the laser beam on the rear side. The plurality of paths include a plurality of spatially separated paths that propagate while being isolated from other rear beams, and a light-receiving element that receives the laser beam that has passed through the paths. A semiconductor laser array device characterized in that it is provided parallel to an entering laser beam. (2) A plurality of laser oscillation regions are arranged close to each other on the same substrate, and each has a semiconductor laser array element that emits a laser beam forward and backward, and the rear beams are isolated from each other from other rear beams. a plurality of paths spatially separated from each other to allow the laser beam to propagate; a light-receiving element that receives the laser beam that has passed through the paths; and an electrode layer electrically separated from each other by the same spacing as the oscillation region spacing on one principal surface. a heat sink provided therein, the oscillation region side of the semiconductor laser array element is electrically and thermally fixed to the electrode layer facing each other, and the passageway is electrically insulated from the electrode layer and fixed on the heat sink. A semiconductor laser array device characterized by: (3) The semiconductor laser array device according to claim 1 or 2, wherein a reflective film is formed on the inner wall of the passage. (4) A semiconductor laser array device according to claim 2 or 3, characterized in that grooves are provided along the passages on the outside of the passages at both ends of the plurality of passages. (5) In the semiconductor laser array device according to claims 2, 3, and 4, the brazing material for fixing the passage and the heat sink is made of a material with a lower separation point than the brazing material for fixing the semiconductor laser array element and the heat sink. Features of semiconductor laser array device.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP79489U JPH0291364U (en) | 1989-01-06 | 1989-01-06 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP79489U JPH0291364U (en) | 1989-01-06 | 1989-01-06 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH0291364U true JPH0291364U (en) | 1990-07-19 |
Family
ID=31200122
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP79489U Pending JPH0291364U (en) | 1989-01-06 | 1989-01-06 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0291364U (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPWO2019163276A1 (en) * | 2018-02-26 | 2021-02-04 | パナソニック株式会社 | Semiconductor light emitting device |
-
1989
- 1989-01-06 JP JP79489U patent/JPH0291364U/ja active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPWO2019163276A1 (en) * | 2018-02-26 | 2021-02-04 | パナソニック株式会社 | Semiconductor light emitting device |
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