JPH0291146U - - Google Patents
Info
- Publication number
- JPH0291146U JPH0291146U JP17021788U JP17021788U JPH0291146U JP H0291146 U JPH0291146 U JP H0291146U JP 17021788 U JP17021788 U JP 17021788U JP 17021788 U JP17021788 U JP 17021788U JP H0291146 U JPH0291146 U JP H0291146U
- Authority
- JP
- Japan
- Prior art keywords
- beam width
- width
- ion
- reciprocating
- rotating disk
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000010884 ion-beam technique Methods 0.000 claims description 3
- 238000001514 detection method Methods 0.000 claims description 2
- 238000005468 ion implantation Methods 0.000 claims 2
- 238000010586 diagram Methods 0.000 description 4
- 238000005259 measurement Methods 0.000 description 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17021788U JPH0291146U (zh) | 1988-12-29 | 1988-12-29 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17021788U JPH0291146U (zh) | 1988-12-29 | 1988-12-29 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0291146U true JPH0291146U (zh) | 1990-07-19 |
Family
ID=31460971
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP17021788U Pending JPH0291146U (zh) | 1988-12-29 | 1988-12-29 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0291146U (zh) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2000026950A1 (fr) * | 1998-10-30 | 2000-05-11 | Applied Materials Inc. | Procede et dispositif pour l'implantation ionique |
| JP2017199603A (ja) * | 2016-04-28 | 2017-11-02 | 日新イオン機器株式会社 | イオンビームエッチング装置 |
| WO2019089279A1 (en) * | 2017-11-03 | 2019-05-09 | Varian Semiconductor Equipment Associates, Inc. | Apparatus and techniques for beam mapping in ion beam system |
-
1988
- 1988-12-29 JP JP17021788U patent/JPH0291146U/ja active Pending
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2000026950A1 (fr) * | 1998-10-30 | 2000-05-11 | Applied Materials Inc. | Procede et dispositif pour l'implantation ionique |
| US6617594B1 (en) | 1998-10-30 | 2003-09-09 | Applied Materials, Inc. | Method and device for ion implanting |
| JP2017199603A (ja) * | 2016-04-28 | 2017-11-02 | 日新イオン機器株式会社 | イオンビームエッチング装置 |
| WO2019089279A1 (en) * | 2017-11-03 | 2019-05-09 | Varian Semiconductor Equipment Associates, Inc. | Apparatus and techniques for beam mapping in ion beam system |
| US10431421B2 (en) | 2017-11-03 | 2019-10-01 | Varian Semiconductor Equipment Associates, Inc | Apparatus and techniques for beam mapping in ion beam system |
| CN111263972A (zh) * | 2017-11-03 | 2020-06-09 | 瓦里安半导体设备公司 | 离子束系统中束映射的装置与技术 |
| JP2021501962A (ja) * | 2017-11-03 | 2021-01-21 | ヴァリアン セミコンダクター イクイップメント アソシエイツ インコーポレイテッド | イオンビームシステムにおけるビームマッピングのための装置と技術 |
| CN111263972B (zh) * | 2017-11-03 | 2023-01-06 | 瓦里安半导体设备公司 | 监测离子束的装置、控制离子束的装置及方法 |