JPH0290847U - - Google Patents

Info

Publication number
JPH0290847U
JPH0290847U JP17143288U JP17143288U JPH0290847U JP H0290847 U JPH0290847 U JP H0290847U JP 17143288 U JP17143288 U JP 17143288U JP 17143288 U JP17143288 U JP 17143288U JP H0290847 U JPH0290847 U JP H0290847U
Authority
JP
Japan
Prior art keywords
plate
exposing
hot water
pouring
hot liquid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP17143288U
Other languages
English (en)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP17143288U priority Critical patent/JPH0290847U/ja
Priority to GB8924488A priority patent/GB2224362B/en
Priority to CA 2001852 priority patent/CA2001852A1/en
Priority to DE19893936502 priority patent/DE3936502A1/de
Publication of JPH0290847U publication Critical patent/JPH0290847U/ja
Priority to US07/821,840 priority patent/US5286609A/en
Pending legal-status Critical Current

Links

Description

【図面の簡単な説明】
第1図は、本発明装置の一実施例を示す概略機
構説明図である。 符号は;1……搬送手段、1a,1b……搬送
ローラー、2……熱水注掛手段、2a……供給管
、2b……ノズル、3……乾燥手段、3a……熱
源ランプ、4……露光手段、4a……露光ランプ
、5……現像機。

Claims (1)

    【実用新案登録請求の範囲】
  1. PS版を横方向に搬送せしめる搬送手段を設け
    るとともに、当該搬送手段にて搬送されるPS版
    面に熱水または熱液を注ぎ掛けるための熱水・熱
    液注掛手段、PS版面に残存する水分を除去する
    ための乾燥手段、PS版に全面露光を与えるため
    の露光手段およびアルカリ現像液による現像手段
    をPS版の投入口側から順に配設せしめたことを
    特徴とする画像反転現像装置。
JP17143288U 1988-11-01 1988-12-30 Pending JPH0290847U (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP17143288U JPH0290847U (ja) 1988-12-30 1988-12-30
GB8924488A GB2224362B (en) 1988-11-01 1989-10-31 A process and apparatus for forming a negative resist pattern with a resist containing a diazoquinone sensitiser
CA 2001852 CA2001852A1 (en) 1988-11-01 1989-10-31 Process and apparatus for the formation of negative resist pattern
DE19893936502 DE3936502A1 (de) 1988-11-01 1989-11-02 Verfahren und vorrichtung zur herstellung negativer resistmuster
US07/821,840 US5286609A (en) 1988-11-01 1992-01-14 Process for the formation of a negative resist pattern from a composition comprising a diazoquinone compound and an imidazole and having as a heat step the use of a hot water containing spray

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17143288U JPH0290847U (ja) 1988-12-30 1988-12-30

Publications (1)

Publication Number Publication Date
JPH0290847U true JPH0290847U (ja) 1990-07-18

Family

ID=31463258

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17143288U Pending JPH0290847U (ja) 1988-11-01 1988-12-30

Country Status (1)

Country Link
JP (1) JPH0290847U (ja)

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