JPH0289000A - Laminated x-ray fresnel zone plate - Google Patents
Laminated x-ray fresnel zone plateInfo
- Publication number
- JPH0289000A JPH0289000A JP63242170A JP24217088A JPH0289000A JP H0289000 A JPH0289000 A JP H0289000A JP 63242170 A JP63242170 A JP 63242170A JP 24217088 A JP24217088 A JP 24217088A JP H0289000 A JPH0289000 A JP H0289000A
- Authority
- JP
- Japan
- Prior art keywords
- ray
- laminated
- zone plate
- section
- fresnel zone
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000463 material Substances 0.000 claims abstract description 43
- 230000000903 blocking effect Effects 0.000 claims abstract description 31
- 238000010030 laminating Methods 0.000 claims description 2
- 238000009792 diffusion process Methods 0.000 abstract description 7
- 230000000052 comparative effect Effects 0.000 description 12
- 239000010931 gold Substances 0.000 description 6
- 238000010586 diagram Methods 0.000 description 5
- 239000012780 transparent material Substances 0.000 description 5
- 239000013078 crystal Substances 0.000 description 4
- 238000004544 sputter deposition Methods 0.000 description 4
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 3
- 229910002804 graphite Inorganic materials 0.000 description 3
- 239000010439 graphite Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 2
- 229910052737 gold Inorganic materials 0.000 description 2
- 229910008814 WSi2 Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 229910052790 beryllium Inorganic materials 0.000 description 1
- ATBAMAFKBVZNFJ-UHFFFAOYSA-N beryllium atom Chemical compound [Be] ATBAMAFKBVZNFJ-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 229910052762 osmium Inorganic materials 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 229910052702 rhenium Inorganic materials 0.000 description 1
- 230000006641 stabilisation Effects 0.000 description 1
- 238000011105 stabilization Methods 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
Abstract
Description
【発明の詳細な説明】
(産業上の利用分野)
この発明は積層型X線フレネルゾーンプレートに関する
ものである。DETAILED DESCRIPTION OF THE INVENTION (Field of Industrial Application) This invention relates to a laminated X-ray Fresnel zone plate.
(従来の技術)
従来の積層型X線フレネルゾーンプレートには種々の例
があるが、その第1の例は特公昭5849841号公報
に掲載され、それによれば、第3図に示されるように棒
状体2の周囲に、阻止材としてAu(金)を用いたX線
阻止部10と、透過材としてBe(ベリリウム)を用い
たX線透過部11とを同心円的に交互に積層して多層膜
を形成し、この多層膜の形成された棒状体2を、その軸
心に垂直な面で切断して薄片化したものである。また、
第2の例は特開昭62−81602号公報に掲載され、
それによれば、第4図に示されるように棒状体2の周囲
に、阻止材としてPbFx層を用いたX線阻止部10と
、透過材として810層を用いたX線透過部11とを同
心円的に交互に積層して多層膜を形成し、この多層膜の
形成された棒状体2を、その軸心に垂直な面で切断して
薄片化したものである。(Prior Art) There are various examples of conventional laminated X-ray Fresnel zone plates, but the first example is published in Japanese Patent Publication No. 5849841, and according to it, as shown in Around the rod-shaped body 2, an X-ray blocking section 10 using Au (gold) as a blocking material and an X-ray transmitting section 11 using Be (beryllium) as a transmitting material are laminated concentrically and alternately to form a multilayer structure. A film is formed, and the rod-shaped body 2 on which this multilayer film is formed is cut into thin pieces along a plane perpendicular to its axis. Also,
The second example is published in Japanese Patent Application Laid-Open No. 62-81602,
According to this, as shown in FIG. 4, an X-ray blocking section 10 using a PbFx layer as a blocking material and an X-ray transmitting section 11 using an 810 layer as a transmitting material are arranged in a concentric circle around the rod-shaped body 2. A multilayer film is formed by laminating the rods alternately, and the rod-shaped body 2 on which the multilayer film is formed is cut into thin pieces along a plane perpendicular to its axis.
(発明が解決しようとする課題)
従来の積層型X線フレネルゾーンプレートに用いられる
阻止材及び透過材の材料には、それぞれ欠点があるため
、次のような問題点がある。(Problems to be Solved by the Invention) The materials for the blocking material and the transmitting material used in conventional laminated X-ray Fresnel zone plates each have their own drawbacks, resulting in the following problems.
(1)阻止材及び透過材に用いられている材料の硬度が
低いため、多層膜を周囲に形成した棒状体を薄片化する
際に、加工歪が発生して、多層膜の積層構造(同心円構
造)が歪むようになる。特に、上記第2の例ではそれが
顕著である。(1) Because the hardness of the materials used for the blocking material and the transmitting material is low, processing distortion occurs when thinning a rod-shaped body with a multilayer film formed around it. structure) becomes distorted. This is particularly noticeable in the second example.
(2)多層膜の積層数を増加すると、各層の表面(各層
の境界面)における凹凸が顕著になり、多層膜の積層構
造(同心円構造)に乱れが生じるようになる。(2) When the number of laminated layers of a multilayer film is increased, the unevenness on the surface of each layer (boundary surface between each layer) becomes noticeable, and the laminated structure (concentric circle structure) of the multilayer film becomes disordered.
(3)X線強度の大きい線源を用いた場合、ゾーンプレ
ートが発熱し、高温になるため、阻止材と透過材との間
で相互拡散が生じ、多層膜の積層構造(同心円構造)に
乱れが生じるようになる。(3) When a radiation source with high X-ray intensity is used, the zone plate generates heat and reaches a high temperature, which causes mutual diffusion between the blocking material and the transmitting material, resulting in the formation of a laminated structure (concentric structure) of the multilayer film. Disturbances begin to occur.
(4)第1の例では、阻止材としてAuを用い、透過材
としてBeを用いているが、これらの材料は、200°
Cで10分間の熱処理をすると、阻止材Auと透過材B
eとの間で相互拡散が生じ、多層膜の積層構造(同心円
構造)に乱れが生じるようになる。(4) In the first example, Au is used as the blocking material and Be is used as the transmitting material.
After heat treatment at C for 10 minutes, blocking material Au and transmitting material B
Mutual diffusion occurs with e, and the laminated structure (concentric structure) of the multilayer film becomes disordered.
この発明は、上記のような従来のもののもつ問題点を解
決して、阻止材及び透過材に用いられている材料の硬度
を高(して、多層膜を周囲に形成した棒状体を薄片化す
る際の加工歪の発生を抑制すると共に、多層膜の積層数
を増加させても、各層の表面(各層の境界面)における
凹凸を最小限に抑えて、多層膜の積層構造(同心円構造
)の乱れを生じなくし、更に、ゾーンプレートが高温(
200℃以上)になったとしても、阻止材と透過材との
間で相互拡散が生じることなく、多層膜の積層構造(同
心円構造)に乱れの生じない積層型X線フレネルゾーン
プレートを提供することを目的としている。This invention solves the problems of the conventional products as described above, increases the hardness of the materials used for the blocking material and the transmitting material, and makes it possible to thin a rod-shaped body with a multilayer film formed around it. In addition to suppressing the occurrence of processing distortion during processing, even when the number of laminated layers of multilayer films is increased, unevenness on the surface of each layer (interface between each layer) is minimized, and the laminated structure (concentric circle structure) of multilayer films is maintained. In addition, the zone plate is kept at a high temperature (
To provide a laminated X-ray Fresnel zone plate in which mutual diffusion does not occur between a blocking material and a transmitting material and the laminated structure (concentric structure) of a multilayer film is not disturbed even when the temperature exceeds 200°C. The purpose is to
(課題を解決するための手段)
上記目的を達成するために、この発明は、上記のような
構成をした積層型X線フレネルゾーンプレートにおいて
、X線阻止部を、従来の材料の代りに、高温度になって
もX線透過部に拡散しない硬度の高い材料で形成すると
共に、X線透過部も、従来の材料の代りに、高温度にな
ってもX線阻止部に拡散しない硬度の高い材料で形成し
たことを特徴とするものである。(Means for Solving the Problems) In order to achieve the above object, the present invention provides a laminated X-ray Fresnel zone plate having the above configuration, in which the X-ray blocking portion is made of a material instead of a conventional material. The X-ray transmitting part is made of a hard material that does not diffuse into the X-ray blocking part even at high temperatures, and the X-ray transmitting part is made of a hard material that does not diffuse into the It is characterized by being made of high quality material.
(作用)
この発明の積層型X線フレネルゾーンプレートは、多層
膜を周囲に形成した棒状体を薄片化する際に、加工歪が
発生しなくなると共に、多層膜の積層数を増加させても
、各層の表面(各層の境界面)における凹凸が最小限に
抑えられ、更に、高温度になっても、X線阻止部とX線
透過部との間で相互拡散が生じなくなる。(Function) The laminated X-ray Fresnel zone plate of the present invention does not generate processing strain when thinning a rod-shaped body around which a multilayer film is formed, and even when the number of laminated multilayer films is increased. The unevenness on the surface of each layer (boundary surface between each layer) is minimized, and furthermore, even at high temperatures, mutual diffusion does not occur between the X-ray blocking part and the X-ray transmitting part.
(実施例)
以下、この発明の実施例について図面を参照しながら説
明する。(Example) Hereinafter, an example of the present invention will be described with reference to the drawings.
第1図はこの発明の実施例の作成に使用されるスパッタ
リング装置を上部よりみた概略構成図である。同図にお
いて、真空槽1内には、棒状体2が、回転導入機構(図
示せず)を介して、上部より鉛直方向(図面と垂直方向
)に吊り下げられている。また、カソード3には、阻止
材用ターゲット4と透過材用ターゲット5とが取り付け
られている。カソード3近傍の空間にはシャッタ6が配
設され、そのシャッタ6は、阻止材用ターゲット4と透
過材用ターゲット5のいずれか一方が使用されないとき
に、使用されないターゲットがスパッタリングされるの
を防止する役割を果たしている。7は水晶振動式膜厚モ
ニタ、8はArガス導入通路、9は真空排気通路である
。FIG. 1 is a schematic diagram of a sputtering apparatus used for producing an embodiment of the present invention, viewed from above. In the figure, a rod-shaped body 2 is suspended in a vertical direction (perpendicular to the drawing) from above in a vacuum chamber 1 via a rotation introduction mechanism (not shown). Furthermore, a blocking material target 4 and a transmitting material target 5 are attached to the cathode 3. A shutter 6 is disposed in the space near the cathode 3, and the shutter 6 prevents the unused target from being sputtered when either the blocking material target 4 or the transmitting material target 5 is not used. It plays a role. 7 is a crystal vibration type film thickness monitor, 8 is an Ar gas introduction passage, and 9 is a vacuum exhaust passage.
したがって、上記スパッタリング装置を使用する場合に
は、Arガスの導入されている真空槽1とカソード3と
の間に電位差をつけ、これらの間で放電を生じさせ、A
rガスを励起又は電離して、プラズマを発生させる。そ
して、プラズマ中のA「イオンを阻止材用ターゲット4
と透過材用ターゲット5とに交互に衝突させることによ
って、ターゲットをスパッタリングし、ターゲットの粒
子を回転中の棒状体2の周囲に付着させて積層し、棒状
体2の周囲に多層膜を形成する。このようにして多層膜
の形成された棒状体2は、その後、軸心に垂直な面で切
断されて、薄片化され、そして、積層型X線フレネルゾ
ーンプレートが形成されるようになる。Therefore, when using the above sputtering apparatus, a potential difference is created between the vacuum chamber 1 into which Ar gas is introduced and the cathode 3, and a discharge is generated between them.
The r gas is excited or ionized to generate plasma. Then, a target 4 for blocking material A "ions" in the plasma is used.
By alternately colliding with the transparent material target 5, the target is sputtered, and the particles of the target are attached and laminated around the rotating rod-shaped body 2, thereby forming a multilayer film around the rod-shaped body 2. . The rod-shaped body 2 on which the multilayer film has been formed in this manner is then cut along a plane perpendicular to the axis to form a thin section, thereby forming a laminated X-ray Fresnel zone plate.
第2図はこの発明の実施例を示す説明図で、棒状体2に
直径18μmの八〇(金)線を用い、阻止材用ターゲッ
ト4の材料としてW S i tを用い、透過材用ター
ゲット5の材料としてC(グラファイト)を用い、真空
槽1内の圧力を5X10−3T。FIG. 2 is an explanatory diagram showing an embodiment of the present invention, in which the rod-shaped body 2 is made of 80 (gold) wire with a diameter of 18 μm, W S i t is used as the material of the blocking material target 4, and the transparent material target is C (graphite) was used as the material of 5, and the pressure in the vacuum chamber 1 was 5X10-3T.
rr、棒状体2の回転数を20rpmの条件にて作成し
たときの積層型X線フレネルゾーンプレートである。第
2図において、棒状体2の周囲には、阻止材W S i
2よりなるX線阻止部】0と透過材C(グラファイト
)よりなるX線透過部11とが同心円的に交互に積層さ
れ、多層膜が形成されている。This is a laminated type X-ray Fresnel zone plate created under the condition that the rotation speed of the rod-shaped body 2 is 20 rpm. In FIG. 2, around the rod-shaped body 2, there is a blocking material W Si
[X-ray blocking section made of 2] X-ray blocking section 11 made of transparent material C (graphite) and X-ray transmitting section 11 made of transparent material C (graphite) are laminated concentrically and alternately to form a multilayer film.
次に、この発明の実施例の積層型X線フレネルゾーンプ
レートと比較するために、次のような比較例を作成した
。Next, in order to compare with the laminated X-ray Fresnel zone plate of the embodiment of this invention, the following comparative example was prepared.
〔第1の比較例〕
阻止材用ターゲット4の材料としてW S + 2の代
りに、Wを用い、その他はこの発明の実施例の作成条件
と同じにして、積層型X線フレネルゾーンプレート(以
下、第1の比較例という)を作成した。[First Comparative Example] A laminated X-ray Fresnel zone plate ( Hereinafter, a first comparative example) was created.
〔第2の比較例〕
阻止材用ターゲット4の材料としてWSi、の代りに、
比較的軟らかいAuPd合金を用い、その他はこの発明
の実施例の作成条件と同じにして、積層型X線フレネル
ゾーンプレート(以下、第2の比較例という)を作成し
た。[Second Comparative Example] Instead of WSi as the material of the blocker target 4,
A laminated X-ray Fresnel zone plate (hereinafter referred to as a second comparative example) was manufactured using a relatively soft AuPd alloy and under the same conditions as in the example of the present invention.
そこで、この発明の実施例の積層型X線フレネルゾーン
プレートと、第1の比較例とを比較してみると、この発
明の実施例の積層型X線フレネルゾーンプレートでは、
第1の比較例に比べて、薄片化する際の加工歪の発生が
みられないと共に、多層膜の積層数を増加させても、各
層の表面(各層の境界面)における凹凸がなく、多層膜
を構成する各層の乱れが少なかった。この理由を調べる
ために、積層型X線フレネルゾーンプレートを走査型電
子顕微鏡で観察してみると、第1の比較例では、Wより
なるX線阻止部において、結晶粒が大きく成長していた
のに対し、この発明の実施例の積層型X線フレネルゾー
ンプレートでは、WSi2よりなるX線阻止部10にお
いて、結晶粒が観察されなかった。これはSiの添加に
より、結晶粒が微細化し、表面の平坦化に寄与しためと
思われる。更に、この発明の実施例の積層型X線フレネ
ルゾーンプレートを真空中、500℃で10分間の熱処
理をしたところ、X線阻止部とX線透過部との間で相互
拡散がなく、多層膜を積層構造(同心円構造)に乱れが
起こらず、熱的に安定することが確められた。Therefore, when comparing the laminated X-ray Fresnel zone plate according to the embodiment of this invention and the first comparative example, it is found that the laminated X-ray Fresnel zone plate according to the embodiment of this invention has the following characteristics:
Compared to the first comparative example, there is no processing strain during thinning, and even when the number of laminated multilayer films is increased, there is no unevenness on the surface of each layer (boundary surface between each layer), and the multilayer There was little disturbance in each layer composing the film. To investigate the reason for this, we observed the laminated X-ray Fresnel zone plate with a scanning electron microscope and found that in the first comparative example, crystal grains had grown large in the X-ray blocking section made of W. On the other hand, in the laminated X-ray Fresnel zone plate of the example of the present invention, no crystal grains were observed in the X-ray blocking section 10 made of WSi2. This seems to be because the addition of Si makes the crystal grains finer and contributes to the flattening of the surface. Furthermore, when the laminated X-ray Fresnel zone plate of the embodiment of the present invention was heat-treated in vacuum at 500°C for 10 minutes, there was no mutual diffusion between the X-ray blocking part and the X-ray transmitting part, and the multilayer film It was confirmed that the laminated structure (concentric structure) was not disturbed and was thermally stable.
次に、この発明の実施例の積層型X線フレネルゾーンプ
レートと、第2の比較例とを、走査型電子顕微鏡で観察
することによって比較してみると、第2の比較例では、
積層構造(同心円構造)の乱が観察されたのに対し、こ
の発明の実施例の積層型X線フレネルゾーンプレートで
は、そのようなことは全くなかった。Next, when comparing the laminated X-ray Fresnel zone plate of the embodiment of the present invention and a second comparative example by observing them with a scanning electron microscope, it was found that in the second comparative example,
While disturbances in the laminated structure (concentric circular structure) were observed, such was not observed at all in the laminated X-ray Fresnel zone plate of the embodiment of the present invention.
なお、上記この発明の実施例の代りに、X線阻止部に用
いられるX線阻止率の高い阻止材として、Hf5Ta、
W、 Re、 Os、 Ir5Pi及びAuのうちの
1M以上の元素又はその化合物に、B、C,N、0、S
Iのうちの1種以上の元素を添加した材料を用い、X線
透過部に用いられるX線透過率の高い透過材として、B
e、 B、 Cのうちの1種以上の元素又はこれらの元
素の他にN及び0を加えた元素の中から相互に組み合せ
てできた化合物よりなる材料を用いて、数種の積層型X
線フレネルゾーンプレートを作成し、そしてこれらと上
記第1の比較例及び第2の比較例と比較してみたが、上
記この発明の実施例の場合と同様の結果になることがわ
かった。In addition, instead of the above-mentioned embodiment of the present invention, Hf5Ta, Hf5Ta,
B, C, N, 0, S to 1M or more elements of W, Re, Os, Ir5Pi and Au or their compounds
As a transparent material with high X-ray transmittance used in the X-ray transmitting part, B
Several types of laminated X
Line Fresnel zone plates were prepared and compared with the above-mentioned first comparative example and second comparative example, and it was found that the results were similar to those of the above-mentioned embodiment of the present invention.
ところで、上記この発明の実施例を作成するための装置
として、スパッタリング装置が使用されているが、この
装置に限られることなく、真空蒸着装置、CVD装置等
の成膜装置であってもよい。Incidentally, although a sputtering apparatus is used as an apparatus for producing the above embodiments of the present invention, the present invention is not limited to this apparatus, and may be a film forming apparatus such as a vacuum evaporation apparatus or a CVD apparatus.
(発明の効果)
この発明によれば、多層膜を周囲に形成した棒状体を薄
片化する際の加工歪の発生が抑制されるると共に、多層
膜の積層数を増加させても、各層の表面(各層の境界面
)における凹凸を最小限に抑えられ、多層膜の積層構造
(同心円構造)の乱れが生じなくなり、更に、ゾーンプ
レートを高温(200℃以上)にしても、X線阻止部と
X線透過部との間で相互拡散が生じず、多層膜の積層構
造(同心円構造)が安定化する等の効果が奏される。(Effects of the Invention) According to the present invention, the occurrence of processing strain when thinning a rod-shaped body around which a multilayer film is formed is suppressed, and even if the number of laminated multilayer films is increased, the surface of each layer is The unevenness at the interface between each layer can be minimized, and the laminated structure (concentric structure) of the multilayer film will not be disturbed. Mutual diffusion with the X-ray transparent portion does not occur, and effects such as stabilization of the laminated structure (concentric structure) of the multilayer film are produced.
第1図はこの発明の実施例の作成に使用されるスパッタ
リング装置を上部よりみた概略構成図、第2図はこの発
明の実施例の積層型X線フレネルゾーンプレートの構成
を示す説明図である。第3図及び第4図は従来の積層型
X線フレネルゾーンプレートの構成を示す説明図である
。
図中、
2・・・・・棒状体
10・・・・・X線阻止部
11・・・・・X線透過部
特許出願人 日本真空技術株式会社
第2図
第38
第4関FIG. 1 is a schematic configuration diagram of a sputtering device used for producing an embodiment of this invention, viewed from above, and FIG. 2 is an explanatory diagram showing the configuration of a laminated X-ray Fresnel zone plate of an embodiment of this invention. . FIGS. 3 and 4 are explanatory diagrams showing the structure of a conventional laminated X-ray Fresnel zone plate. In the figure, 2... Rod-shaped body 10... X-ray blocking section 11... X-ray transmitting section Patent applicant Japan Vacuum Technology Co., Ltd. Figure 2 Figure 38 Fourth section
Claims (1)
に交互に積層して多層膜を形成し、この多層膜の形成さ
れた棒状体を、その軸心に垂直な面で切断して薄片化し
た積層型X線フレネルゾーンプレートにおいて、上記X
線阻止部を、高温度になっても上記X線透過部に拡散し
ない硬度の高い材料で形成すると共に、上記X線透過部
も、高温度になっても上記X線阻止部に拡散しない硬度
の高い材料で形成したことを特徴とする積層型X線フレ
ネルゾーンプレート。A multilayer film is formed by alternately laminating X-ray blocking parts and X-ray transmitting parts concentrically around a rod-shaped body, and the rod-shaped body on which this multilayer film is formed is aligned in a plane perpendicular to its axis. In the laminated X-ray Fresnel zone plate cut into thin pieces, the above-mentioned X
The ray blocking portion is formed of a material with high hardness that does not diffuse into the X-ray transmitting portion even when the temperature becomes high, and the X-ray transmitting portion also has such hardness that it does not diffuse into the X-ray blocking portion even when the temperature becomes high. A laminated X-ray Fresnel zone plate characterized by being made of a material with high viscosity.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP63242170A JPH0289000A (en) | 1988-09-27 | 1988-09-27 | Laminated x-ray fresnel zone plate |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP63242170A JPH0289000A (en) | 1988-09-27 | 1988-09-27 | Laminated x-ray fresnel zone plate |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH0289000A true JPH0289000A (en) | 1990-03-29 |
Family
ID=17085363
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP63242170A Pending JPH0289000A (en) | 1988-09-27 | 1988-09-27 | Laminated x-ray fresnel zone plate |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0289000A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH08262197A (en) * | 1995-03-23 | 1996-10-11 | Agency Of Ind Science & Technol | X-ray spectroscopic focusing element |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6388503A (en) * | 1986-10-01 | 1988-04-19 | Canon Inc | Reflection mirror consisting of multi-layered film for soft x-ray and vacuum ultraviolet ray |
JPS63161403A (en) * | 1986-12-25 | 1988-07-05 | Canon Inc | Multilayered film reflection mirror for x ray and vacuum ultraviolet ray |
-
1988
- 1988-09-27 JP JP63242170A patent/JPH0289000A/en active Pending
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6388503A (en) * | 1986-10-01 | 1988-04-19 | Canon Inc | Reflection mirror consisting of multi-layered film for soft x-ray and vacuum ultraviolet ray |
JPS63161403A (en) * | 1986-12-25 | 1988-07-05 | Canon Inc | Multilayered film reflection mirror for x ray and vacuum ultraviolet ray |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH08262197A (en) * | 1995-03-23 | 1996-10-11 | Agency Of Ind Science & Technol | X-ray spectroscopic focusing element |
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