JPH02875A - Production of protective layer of electrophotographic sensitive body - Google Patents
Production of protective layer of electrophotographic sensitive bodyInfo
- Publication number
- JPH02875A JPH02875A JP9826388A JP9826388A JPH02875A JP H02875 A JPH02875 A JP H02875A JP 9826388 A JP9826388 A JP 9826388A JP 9826388 A JP9826388 A JP 9826388A JP H02875 A JPH02875 A JP H02875A
- Authority
- JP
- Japan
- Prior art keywords
- protective layer
- layer
- tin oxide
- photoreceptor
- tin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000011241 protective layer Substances 0.000 title claims abstract description 42
- 238000004519 manufacturing process Methods 0.000 title claims description 6
- 239000010410 layer Substances 0.000 claims abstract description 53
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 claims abstract description 11
- 229910001887 tin oxide Inorganic materials 0.000 claims abstract description 11
- 239000002245 particle Substances 0.000 claims abstract description 9
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 9
- 229920000642 polymer Polymers 0.000 claims abstract description 7
- 229920005989 resin Polymers 0.000 claims abstract description 6
- 239000011347 resin Substances 0.000 claims abstract description 6
- 239000011230 binding agent Substances 0.000 claims abstract description 5
- 238000001035 drying Methods 0.000 claims abstract description 4
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims abstract description 4
- 108091008695 photoreceptors Proteins 0.000 claims description 33
- 150000001875 compounds Chemical class 0.000 claims description 12
- 239000000203 mixture Substances 0.000 claims description 4
- 150000003606 tin compounds Chemical class 0.000 claims description 3
- 239000002904 solvent Substances 0.000 abstract description 11
- 230000003595 spectral effect Effects 0.000 abstract description 9
- 238000002834 transmittance Methods 0.000 abstract description 9
- 230000035945 sensitivity Effects 0.000 abstract description 8
- 239000011248 coating agent Substances 0.000 abstract description 7
- 238000000576 coating method Methods 0.000 abstract description 7
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 abstract description 4
- 239000007788 liquid Substances 0.000 abstract description 3
- 238000000034 method Methods 0.000 description 17
- 239000011669 selenium Substances 0.000 description 13
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 12
- 239000000243 solution Substances 0.000 description 10
- 230000000052 comparative effect Effects 0.000 description 8
- 239000000463 material Substances 0.000 description 7
- 229910052751 metal Inorganic materials 0.000 description 7
- 239000002184 metal Substances 0.000 description 7
- 239000006185 dispersion Substances 0.000 description 6
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 4
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 4
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 4
- 229920001577 copolymer Polymers 0.000 description 4
- 239000010419 fine particle Substances 0.000 description 4
- 150000002739 metals Chemical class 0.000 description 4
- 229920000620 organic polymer Polymers 0.000 description 4
- 238000007740 vapor deposition Methods 0.000 description 4
- -1 γ-glycidoxypropyl Chemical group 0.000 description 4
- POILWHVDKZOXJZ-ARJAWSKDSA-M (z)-4-oxopent-2-en-2-olate Chemical compound C\C([O-])=C\C(C)=O POILWHVDKZOXJZ-ARJAWSKDSA-M 0.000 description 3
- XDLMVUHYZWKMMD-UHFFFAOYSA-N 3-trimethoxysilylpropyl 2-methylprop-2-enoate Chemical compound CO[Si](OC)(OC)CCCOC(=O)C(C)=C XDLMVUHYZWKMMD-UHFFFAOYSA-N 0.000 description 3
- 229910045601 alloy Inorganic materials 0.000 description 3
- 239000000956 alloy Substances 0.000 description 3
- 239000003795 chemical substances by application Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 239000010408 film Substances 0.000 description 3
- 229920000515 polycarbonate Polymers 0.000 description 3
- 239000004417 polycarbonate Substances 0.000 description 3
- 239000002356 single layer Substances 0.000 description 3
- 238000001771 vacuum deposition Methods 0.000 description 3
- FKNIDKXOANSRCS-UHFFFAOYSA-N 2,3,4-trinitrofluoren-1-one Chemical compound C1=CC=C2C3=C([N+](=O)[O-])C([N+]([O-])=O)=C([N+]([O-])=O)C(=O)C3=CC2=C1 FKNIDKXOANSRCS-UHFFFAOYSA-N 0.000 description 2
- 229910017000 As2Se3 Inorganic materials 0.000 description 2
- 239000004952 Polyamide Substances 0.000 description 2
- BUGBHKTXTAQXES-UHFFFAOYSA-N Selenium Chemical compound [Se] BUGBHKTXTAQXES-UHFFFAOYSA-N 0.000 description 2
- 238000002441 X-ray diffraction Methods 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 2
- 238000000862 absorption spectrum Methods 0.000 description 2
- YRKCREAYFQTBPV-UHFFFAOYSA-N acetylacetone Chemical compound CC(=O)CC(C)=O YRKCREAYFQTBPV-UHFFFAOYSA-N 0.000 description 2
- 229910052785 arsenic Inorganic materials 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- 239000004020 conductor Substances 0.000 description 2
- 238000011109 contamination Methods 0.000 description 2
- 230000007062 hydrolysis Effects 0.000 description 2
- 238000006460 hydrolysis reaction Methods 0.000 description 2
- 229910044991 metal oxide Inorganic materials 0.000 description 2
- 150000004706 metal oxides Chemical class 0.000 description 2
- SGNLDVYVSFANHW-UHFFFAOYSA-N pentane-2,4-dione;zirconium Chemical compound [Zr].CC(=O)CC(C)=O SGNLDVYVSFANHW-UHFFFAOYSA-N 0.000 description 2
- 229920003227 poly(N-vinyl carbazole) Polymers 0.000 description 2
- 229920002647 polyamide Polymers 0.000 description 2
- 229920000728 polyester Polymers 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 229910052711 selenium Inorganic materials 0.000 description 2
- 229920002554 vinyl polymer Polymers 0.000 description 2
- 239000011787 zinc oxide Substances 0.000 description 2
- RYSXWUYLAWPLES-MTOQALJVSA-N (Z)-4-hydroxypent-3-en-2-one titanium Chemical compound [Ti].C\C(O)=C\C(C)=O.C\C(O)=C\C(C)=O.C\C(O)=C\C(C)=O.C\C(O)=C\C(C)=O RYSXWUYLAWPLES-MTOQALJVSA-N 0.000 description 1
- YOBOXHGSEJBUPB-MTOQALJVSA-N (z)-4-hydroxypent-3-en-2-one;zirconium Chemical compound [Zr].C\C(O)=C\C(C)=O.C\C(O)=C\C(C)=O.C\C(O)=C\C(C)=O.C\C(O)=C\C(C)=O YOBOXHGSEJBUPB-MTOQALJVSA-N 0.000 description 1
- 239000004925 Acrylic resin Substances 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
- SOGAXMICEFXMKE-UHFFFAOYSA-N Butylmethacrylate Chemical compound CCCCOC(=O)C(C)=C SOGAXMICEFXMKE-UHFFFAOYSA-N 0.000 description 1
- 239000001856 Ethyl cellulose Substances 0.000 description 1
- ZZSNKZQZMQGXPY-UHFFFAOYSA-N Ethyl cellulose Chemical compound CCOCC1OC(OC)C(OCC)C(OCC)C1OC1C(O)C(O)C(OC)C(CO)O1 ZZSNKZQZMQGXPY-UHFFFAOYSA-N 0.000 description 1
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- 239000002841 Lewis acid Substances 0.000 description 1
- 239000004640 Melamine resin Substances 0.000 description 1
- 229920000877 Melamine resin Polymers 0.000 description 1
- CNCOEDDPFOAUMB-UHFFFAOYSA-N N-Methylolacrylamide Chemical compound OCNC(=O)C=C CNCOEDDPFOAUMB-UHFFFAOYSA-N 0.000 description 1
- VCUFZILGIRCDQQ-KRWDZBQOSA-N N-[[(5S)-2-oxo-3-(2-oxo-3H-1,3-benzoxazol-6-yl)-1,3-oxazolidin-5-yl]methyl]-2-[[3-(trifluoromethoxy)phenyl]methylamino]pyrimidine-5-carboxamide Chemical group O=C1O[C@H](CN1C1=CC2=C(NC(O2)=O)C=C1)CNC(=O)C=1C=NC(=NC=1)NCC1=CC(=CC=C1)OC(F)(F)F VCUFZILGIRCDQQ-KRWDZBQOSA-N 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- 229920001328 Polyvinylidene chloride Polymers 0.000 description 1
- 229910001370 Se alloy Inorganic materials 0.000 description 1
- 239000006087 Silane Coupling Agent Substances 0.000 description 1
- 230000002159 abnormal effect Effects 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- 238000009825 accumulation Methods 0.000 description 1
- TUCNEACPLKLKNU-UHFFFAOYSA-N acetyl Chemical compound C[C]=O TUCNEACPLKLKNU-UHFFFAOYSA-N 0.000 description 1
- 239000012790 adhesive layer Substances 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 150000004703 alkoxides Chemical class 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 229910021417 amorphous silicon Inorganic materials 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 125000000751 azo group Chemical group [*]N=N[*] 0.000 description 1
- YHWCPXVTRSHPNY-UHFFFAOYSA-N butan-1-olate;titanium(4+) Chemical compound [Ti+4].CCCC[O-].CCCC[O-].CCCC[O-].CCCC[O-] YHWCPXVTRSHPNY-UHFFFAOYSA-N 0.000 description 1
- BSDOQSMQCZQLDV-UHFFFAOYSA-N butan-1-olate;zirconium(4+) Chemical compound [Zr+4].CCCC[O-].CCCC[O-].CCCC[O-].CCCC[O-] BSDOQSMQCZQLDV-UHFFFAOYSA-N 0.000 description 1
- CXKCTMHTOKXKQT-UHFFFAOYSA-N cadmium oxide Inorganic materials [Cd]=O CXKCTMHTOKXKQT-UHFFFAOYSA-N 0.000 description 1
- CFEAAQFZALKQPA-UHFFFAOYSA-N cadmium(2+);oxygen(2-) Chemical compound [O-2].[Cd+2] CFEAAQFZALKQPA-UHFFFAOYSA-N 0.000 description 1
- UHYPYGJEEGLRJD-UHFFFAOYSA-N cadmium(2+);selenium(2-) Chemical compound [Se-2].[Cd+2] UHYPYGJEEGLRJD-UHFFFAOYSA-N 0.000 description 1
- 229920001940 conductive polymer Polymers 0.000 description 1
- 238000007334 copolymerization reaction Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000012217 deletion Methods 0.000 description 1
- 230000037430 deletion Effects 0.000 description 1
- AUYOHNUMSAGWQZ-UHFFFAOYSA-L dihydroxy(oxo)tin Chemical compound O[Sn](O)=O AUYOHNUMSAGWQZ-UHFFFAOYSA-L 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 229920001249 ethyl cellulose Polymers 0.000 description 1
- 235000019325 ethyl cellulose Nutrition 0.000 description 1
- 230000005496 eutectics Effects 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 238000009472 formulation Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(III) oxide Inorganic materials [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 229910052809 inorganic oxide Inorganic materials 0.000 description 1
- 239000010954 inorganic particle Substances 0.000 description 1
- 229920000592 inorganic polymer Polymers 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 239000011229 interlayer Substances 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 150000007517 lewis acids Chemical class 0.000 description 1
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 1
- POPACFLNWGUDSR-UHFFFAOYSA-N methoxy(trimethyl)silane Chemical compound CO[Si](C)(C)C POPACFLNWGUDSR-UHFFFAOYSA-N 0.000 description 1
- HTEAGOMAXMOFFS-UHFFFAOYSA-N methyl 2-methylprop-2-enoate;prop-2-enoic acid Chemical compound OC(=O)C=C.COC(=O)C(C)=C HTEAGOMAXMOFFS-UHFFFAOYSA-N 0.000 description 1
- YBQJKVOFUMFBDE-UHFFFAOYSA-N methyl 2-methylprop-2-enoate;prop-2-enoic acid;styrene Chemical compound OC(=O)C=C.COC(=O)C(C)=C.C=CC1=CC=CC=C1 YBQJKVOFUMFBDE-UHFFFAOYSA-N 0.000 description 1
- 239000011259 mixed solution Substances 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- WRZYZGACMDFTQX-UHFFFAOYSA-N pentane-2,4-dione tin(2+) Chemical compound [Sn+2].C(C)(=O)CC(C)=O WRZYZGACMDFTQX-UHFFFAOYSA-N 0.000 description 1
- GCKZNUDNTDWGFM-UHFFFAOYSA-N pentane-2,4-dione;tin Chemical compound [Sn].CC(=O)CC(C)=O GCKZNUDNTDWGFM-UHFFFAOYSA-N 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 1
- 229920002037 poly(vinyl butyral) polymer Polymers 0.000 description 1
- 229920006122 polyamide resin Polymers 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920001225 polyester resin Polymers 0.000 description 1
- 239000004645 polyester resin Substances 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 229920005596 polymer binder Polymers 0.000 description 1
- 239000002491 polymer binding agent Substances 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 229920005990 polystyrene resin Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 229920002689 polyvinyl acetate Polymers 0.000 description 1
- 239000011118 polyvinyl acetate Substances 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 239000005033 polyvinylidene chloride Substances 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 229920002050 silicone resin Polymers 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 229910052714 tellurium Inorganic materials 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- OBROYCQXICMORW-UHFFFAOYSA-N tripropoxyalumane Chemical compound [Al+3].CCC[O-].CCC[O-].CCC[O-] OBROYCQXICMORW-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G5/00—Recording members for original recording by exposure, e.g. to light, to heat, to electrons; Manufacture thereof; Selection of materials therefor
- G03G5/14—Inert intermediate or cover layers for charge-receiving layers
- G03G5/147—Cover layers
- G03G5/14704—Cover layers comprising inorganic material
Landscapes
- Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photoreceptors In Electrophotography (AREA)
Abstract
Description
【発明の詳細な説明】
[技術分野]
本発明は導電性支持体上に感光層、中間層及び表面保護
層を順次積層した電子写真感光体に関する。DETAILED DESCRIPTION OF THE INVENTION [Technical Field] The present invention relates to an electrophotographic photoreceptor in which a photosensitive layer, an intermediate layer, and a surface protective layer are sequentially laminated on a conductive support.
[従来技術]
従来、電子写真用感光体としては、導電性支持体上にセ
レンないしセレン合金を主体とする感光層を設けたもの
、酸化亜鉛、酸化カドミウムなどの無機光導電飼料をバ
インダー中に分散させたもの、ポリ−N−ビニルカルバ
ゾールとトリニトロフルオレノンあるいはアゾ顔料など
の有機光導電材料を用いたもの及び非晶質シリコンを用
いたもの等が一般に知られている。[Prior Art] Conventionally, photoreceptors for electrophotography have been prepared by providing a photosensitive layer mainly made of selenium or a selenium alloy on a conductive support, or by disposing an inorganic photoconductive feed such as zinc oxide or cadmium oxide in a binder. Generally known are those using dispersed materials, those using organic photoconductive materials such as poly-N-vinylcarbazole and trinitrofluorenone or azo pigments, and those using amorphous silicon.
現在、最も高感度な電子写真用感光体としては、Se系
、特に5e−As系(As2Se3)感光体が知られて
いるが、このものは次のような問題点を包含する。At present, Se-based photoreceptors, particularly 5e-As-based (As2Se3) photoreceptors, are known as the most sensitive electrophotographic photoreceptors, but these include the following problems.
■ 感光体表面のSe層がむき出しになっているため、
実使用中ペーパージャム等で簡単にキズが発生しやすい
。■ Because the Se layer on the surface of the photoreceptor is exposed,
It is easily scratched by paper jams, etc. during actual use.
■ 複写機内(現像剤、クリーニング部材等)或いは使
用環境中に存在する特殊な化学物質等の吸着・汚染によ
り、地汚れ、画像流れ等の異常画像が発生する。- Abnormal images such as background smudges and image deletion occur due to adsorption and contamination of special chemicals, etc., present in the copying machine (developer, cleaning member, etc.) or in the usage environment.
■ 同様に実使用中、紙、クリーニング部、現像部等に
より摩擦を受けSe層が摩耗し、コピー上にSeが付希
・排出される心配がある。(2) Similarly, during actual use, there is a risk that the Se layer will be worn out due to friction from the paper, the cleaning section, the developing section, etc., and that Se will be diluted and discharged onto the copy.
■ 特に5e−As系感光体の場合、蒸着直後では表面
抵抗が十分に大きくなく、そのままでは帯電電位が不足
する場合がある。(2) Particularly in the case of a 5e-As photoreceptor, the surface resistance is not sufficiently large immediately after vapor deposition, and the charging potential may be insufficient if left as is.
このような欠点を解消する方法として感光体表面に保護
層を設ける技術か知られている。具体的には感光層の表
面に有機フィルムを設ける方法(特公昭3g−1544
13) 、無機酸化物を設ける方法(特公昭43−14
517 ) 、接着層を設けた後絶縁層を積層する方法
(特公昭43−27594 )、或いはプラズマCVD
法・先CVD法等によって、a−9i:H層、a−3i
:N:H層、a−3i:O:H層等を積層する方法(特
開昭57−17911159、特開昭59−51114
37)が開示されている。As a method for solving these drawbacks, a technique is known in which a protective layer is provided on the surface of the photoreceptor. Specifically, a method of providing an organic film on the surface of a photosensitive layer (Japanese Patent Publication No. 3G-1544)
13) Method of providing inorganic oxide (Japanese Patent Publication No. 43-14
517), a method of laminating an insulating layer after providing an adhesive layer (Japanese Patent Publication No. 43-27594), or plasma CVD
a-9i:H layer, a-3i
:N:H layer, a-3i:O:H layer, etc. method (JP-A-57-17911159, JP-A-59-51114)
37) has been disclosed.
しかしながら、保護層が電子写真的に高抵抗(to”Ω
・cm以上)になると、残留電位の増大、くり返し時の
蓄積等が問題となり、実用上好ましくない。However, the protective layer has a high electrophotographic resistance (to”Ω
・cm or more), problems such as an increase in residual potential and accumulation upon repeated use occur, which is not preferred in practice.
上記欠点を補う技術として保護層を光導電層とする方法
(特公昭48−38427 特公昭43−16198
、特公昭49−10258 、U S P 2901
348 >、保護層中に色素やルイス酸に代表される移
動材を添加する方法(特公昭44−834、特開昭53
−133444) 、或いは金属や金属酸化物微粒子の
添加により保護層の抵抗を制御する方法(特開昭53−
3338)等が提案されている。A method of using a photoconductive layer as a protective layer as a technique to compensate for the above drawbacks (Japanese Patent Publication No. 48-38427, Japanese Patent Publication No. 43-16198)
, Special Publication No. 49-10258, USP 2901
348 >, a method of adding a transfer agent such as a dye or a Lewis acid into the protective layer (Japanese Patent Publication No. 44-834, Japanese Patent Application Laid-open No. 1987-53)
-133444), or a method of controlling the resistance of a protective layer by adding metal or metal oxide fine particles (Japanese Patent Application Laid-open No. 1983-133-
3338) etc. have been proposed.
しかし、このような場合には保護層による光の吸収が生
じ、感光層へ到達する光量が減少するため、結果として
感光体の感度か低下するという問題が生じる(所謂フィ
ルター効果)。However, in such a case, light is absorbed by the protective layer and the amount of light reaching the photosensitive layer is reduced, resulting in a problem that the sensitivity of the photoreceptor is reduced (so-called filter effect).
また、特開昭57−30848に提案されているように
、平均粒径0.3μm以下の金属酸化物を抵抗制御剤と
して保護層中に分散させることにより光に対し実質的に
透明とする方法もあるが、実際には0.3μm以上の粒
子も多く存在するため、可視光の吸収、散乱が生じ、感
光体の感度が低下する。また、微粒子分散系保護層を持
つ感光体特有の問題として解像度の低下という減少も生
じ易い。さらに微粒子の樹脂中への均一分散とという製
造技術上の課題が存在しコストアップにもつながる。史
に従来より通常分散方法としてボールミル等が用いられ
ているが、微細分散を行う過程において、メディア材お
よび容器等のケズレによる汚染がさけられずこれも製造
技術上の課題になっている。Furthermore, as proposed in JP-A No. 57-30848, there is a method of making the protective layer substantially transparent to light by dispersing a metal oxide with an average particle size of 0.3 μm or less as a resistance control agent in the protective layer. However, in reality, there are many particles with a diameter of 0.3 μm or more, which causes absorption and scattering of visible light, reducing the sensitivity of the photoreceptor. Furthermore, a problem peculiar to photoreceptors having a protective layer containing fine particles dispersed therein is a decrease in resolution. Furthermore, there is a manufacturing technology problem of uniformly dispersing the fine particles in the resin, which also leads to an increase in costs. Ball mills and the like have traditionally been used as a dispersion method, but in the process of fine dispersion, contamination of media materials and containers due to scratches cannot be avoided, which also poses a problem in manufacturing technology.
このようにSe系感光体が内包する上記■〜■の問題点
を副作用を伴うことなく、全面的に解決し得る技術は未
だ完成されてはいない。As described above, a technology that can completely solve the above-mentioned problems (1) to (3) inherent in Se-based photoreceptors without causing side effects has not yet been completed.
[目 的]
本発明は、上記した実情に鑑み、このような欠点を解消
した感光体を提供することを目的とするものであり、と
くに分光透過率にすぐれた表面保護層を有し、高感度、
高帯電性でなおかつ高耐久な(耐摩耗性に富んだ)電子
写真用感光体を提供することを目的とするものである。[Objective] In view of the above-mentioned circumstances, it is an object of the present invention to provide a photoreceptor that eliminates such drawbacks, and in particular has a surface protective layer with excellent spectral transmittance and has a high spectral transmittance. sensitivity,
The object of the present invention is to provide an electrophotographic photoreceptor that is highly chargeable and highly durable (rich in abrasion resistance).
[構 成コ
本発明者は有機スズ化合物と高分子化合物を溶媒中に含
有させ、これに水を加えることにより得られたスズ酸化
物及び/又は水酸基を含むスズ酸化物を含有する溶液を
塗布し、乾燥硬化させて設けた表面保護層を有する感光
体がすぐれた性能を持つことを知見し、本発明に至った
。[Constitution] The present inventor contains an organic tin compound and a polymer compound in a solvent, and applies a solution containing a tin oxide and/or a tin oxide containing a hydroxyl group obtained by adding water to the solvent. However, it was discovered that a photoreceptor having a surface protective layer provided by drying and curing had excellent performance, and the present invention was developed.
すなわち、本発明は導電性支持体上に感光層、11間層
及び表面保護層を順次積層した電子写真感光体において
、保護層が高分子化合物結着材中に主成分としてSn
(II)302 (OH)2の粒子を分散した層であ
ることを特徴とするものである。That is, the present invention provides an electrophotographic photoreceptor in which a photosensitive layer, an interlayer, and a surface protective layer are sequentially laminated on a conductive support, in which the protective layer contains Sn as a main component in a polymer binder.
(II) It is characterized by being a layer in which particles of 302 (OH)2 are dispersed.
本発明で使用するS n (II) 302 (01
1) 2はTin oxide hydroxideと
呼ばれる二価のスズの酸化物であり、かつ水酸化物であ
る複合化合物である。本発明者はこの粒子が保護層の抵
抗制御剤としてすぐれた性能を角°することを知見し、
本発明に至った。この化合物は二価スズアセチルアセト
ナート・Sn (II ) (C!Ia COCl+
2− COCl13 ) 2 (以後S n (II
) a c a c 2と略記する)の加水分解によっ
て、常温下、溶媒中で微粒子として生成させることがで
きる。S n (II) 302 (01
1) 2 is a complex compound called tin oxide hydroxide, which is a divalent tin oxide and hydroxide. The present inventor found that this particle has excellent performance as a resistance control agent for a protective layer,
This led to the present invention. This compound is divalent tin acetylacetonate Sn (II) (C!Ia COCl+
2- COCl13 ) 2 (hereinafter referred to as S n (II
) a c a c 2) can be produced as fine particles in a solvent at room temperature.
したがって、溶媒中で粒子を生成させて、分散液を得、
その後結着剤となる高分子化合物を加えて、保護層塗布
液としてもよい。又、S n (、II) (aca
c) 2を結む材を含む溶液中に混入しておき、水を加
えて分解してSn (n)302 (OH)2粒子を
分散液を得、保護層塗布液にしてもよい。Therefore, by generating particles in a solvent to obtain a dispersion,
Thereafter, a polymer compound serving as a binder may be added to form a protective layer coating solution. Also, S n (, II) (aca
c) The Sn (n) 302 (OH) 2 particles may be mixed into a solution containing a binding material and decomposed by adding water to obtain a dispersion of Sn (n) 302 (OH) 2 particles, which may be used as a protective layer coating solution.
本発明で使用する有機スズ化合物としては2価スズアセ
チルアセトナート(n ) X:S n (II )
(CH3CO・CH2COCl+3 ) 2テトラメ
トキシスズ: Sn (OCH3)4、テトラエトキシ
スズ: Sn (QC2H5)4、テトライソプロキシ
スズ:
Sn (QC)H7)4、
テトライソブトキシスズ:
Sn (OC4H9)4、
などがあげられる。The organic tin compound used in the present invention is divalent tin acetylacetonate (n) X:S n (II)
(CH3CO・CH2COCl+3) 2 Tetramethoxytin: Sn (OCH3)4, Tetraethoxytin: Sn (QC2H5)4, Tetraisoproxytin: Sn (QC)H7)4, Tetraisobutoxytin: Sn (OC4H9)4, etc.
この中で特に好ましい化合物はアセチルアセトンスズ(
II)である。Among these, a particularly preferred compound is tin acetylacetone (
II).
本発明に使用する高分子化合物としては、保護層の材料
として一般に用いられる有機・無機高分子化合物が使用
されるが、複写機内でのくり返し使用時に残留電位上昇
を起こさず、なおかつ解像度、シャープ性といった基本
画像に悪影響を及ぼさないものが好ましい。The polymer compound used in the present invention is an organic/inorganic polymer compound that is generally used as a material for a protective layer, but does not cause an increase in residual potential during repeated use in a copying machine, and has good resolution and sharpness. It is preferable to use a method that does not adversely affect the basic image.
本発明者らの検討結果では保護層の基本物性として、光
透過率が有効波長域において70%以上、好ましく80
%以上であり、電気抵抗率が+09 〜10’ Ω
” cm、好ま化< IO’0−1012 Ω ’
cmを満足すれば良好なる表面保護層となり得ること
が確認された。According to the study results of the present inventors, the basic physical properties of the protective layer include light transmittance of 70% or more in the effective wavelength range, preferably 80% or more.
% or more, and the electrical resistivity is +09 to 10' Ω
”cm, preferred <IO'0-1012Ω'
It was confirmed that a good surface protective layer can be obtained if the thickness of cm is satisfied.
そのような条件を満足する具体例としては、一般の有機
高分子化合物、例えばポリスチレン、M M A 、
n −B M A 、ポリアミド、ポリエステル、ポリ
ウレタン、ポリカーボネート、ポリビニルホルマール、
ポリシリコーン、ポリビニルアセクール、ポリビニルブ
チラール、エチルセルロース、メラミン樹脂、及びそれ
らの共重合体等があげられる。Specific examples that satisfy such conditions include general organic polymer compounds such as polystyrene, MMA,
n-BMA, polyamide, polyester, polyurethane, polycarbonate, polyvinyl formal,
Examples include polysilicone, polyvinyl acecool, polyvinyl butyral, ethyl cellulose, melamine resin, and copolymers thereof.
この中で特に好ましい有機高分子化合物はスチレン−メ
チルメタアクリレート−アクリル酸−N−メチロールア
クリルアミド共重合体が挙げられる。Among these, a particularly preferred organic polymer compound is a styrene-methyl methacrylate-acrylic acid-N-methylolacrylamide copolymer.
感光層としてはa−3i:H;a−3t:N:H,a−
3i :C:H;SeあるいはSeとTe、As等との
合金;ZnO,CdS。As a photosensitive layer, a-3i:H; a-3t:N:H, a-
3i: C:H; Se or alloy of Se and Te, As, etc.; ZnO, CdS.
CdSe等の無機粒子を結着樹脂中に分散したちの;ポ
リビニルカルバゾール、トリニトロフルオレノン、チア
ピリリウム塩とポリカーボネートとの共晶錯体等の有機
感光材料が用いられる。この感光層は単層体でも電荷発
生層と電荷輸送層との積層体、あるいは吸収波長域の異
なる感光層の積層体等の2層以上の積層体であってもよ
い。なお感光層の厚さは単層型では10〜70μm5好
ましくは15〜208m1積層型では電荷発生層が50
0人〜2μm1電荷輸送層が5〜50μmが適当である
。Organic photosensitive materials in which inorganic particles such as CdSe are dispersed in a binder resin, such as polyvinyl carbazole, trinitrofluorenone, and a eutectic complex of thiapyrylium salt and polycarbonate, are used. This photosensitive layer may be a single layer, a laminate of a charge generation layer and a charge transport layer, or a laminate of two or more layers such as a laminate of photosensitive layers having different absorption wavelength regions. Note that the thickness of the photosensitive layer is 10 to 70 μm for a single layer type, preferably 15 to 208 μm, and 50 μm for the charge generation layer for a laminated type.
Appropriately, the thickness of the charge transport layer is 0 to 2 .mu.m and the thickness of the charge transport layer is 5 to 50 .mu.m.
本発明においては好ましくはSe系感光体があげられる
。Seを含む感光層であれば単層あるいは積層のいずれ
も使用できる。又、感光層の処方は特に限定されないか
、保護層の積層法によっては感光層を高温(100℃以
上)に保たねばならない場合もあり、高温下でも変質を
起こさないもの、つまりガラス転移点(Tg)100℃
以上のものが望ましい。例えばAs2Se3のTgは約
180°Cであり、As、 5e1− (0,3<
y<0.5 )であればTg>100℃となる。感光層
は通常の真空蒸着法によって作製され、膜厚はIO〜1
100Lt、好ましくは30〜70μmである。In the present invention, Se-based photoreceptors are preferred. As long as the photosensitive layer contains Se, either a single layer or a stacked layer can be used. In addition, the formulation of the photosensitive layer is not particularly limited, and depending on the lamination method of the protective layer, the photosensitive layer may have to be kept at a high temperature (100°C or higher). (Tg)100℃
The above is desirable. For example, the Tg of As2Se3 is about 180°C, and As, 5e1- (0,3<
If y<0.5), Tg>100°C. The photosensitive layer is produced by a normal vacuum evaporation method, and the film thickness is IO~1
100 Lt, preferably 30-70 μm.
中間層は保護層と感光層との接着性を高めると共に、帯
電比6:jを保護層と感光層との中間に止めて電荷注入
による帯電電位の低下を防止するための層である。この
ような機能を有する中間層の材料としては例えば、エポ
キシ樹脂、ポリエステル樹脂、ポリアミド樹脂、ポリス
チレン樹脂、ポリ塩化ビニリデン樹脂、ポリ酢酸ビニル
、ポリ塩化ビニル、アクリル樹脂、シリコン樹脂、弗素
樹脂等の各種の有機高分子化合物;トリメチルモノメト
キシシラン、γ−グリシドキシプロピルトリメ!・キシ
シラン、γ−メタアクリロキシプロピルトリメトキシシ
ラン等のシランカップリング剤:チタンテトラブトキサ
イド、アルミニウムトリプロポキサイド、ジルコニウム
テトラブトキサイド等の金属アルコキサイド;チタンア
セチルアセトネート、ジルコニウムアセチルアセトネー
ト等の金属アセチルアセトン錯体の1種股は2種以上を
組合せることにより形成される高分子化合物を用いるこ
とができる。この中間層の厚さは通常10μm以下、1
子ましくは1μm以下である。The intermediate layer is a layer for increasing the adhesion between the protective layer and the photosensitive layer, and keeping the charging ratio of 6:j between the protective layer and the photosensitive layer to prevent the charging potential from decreasing due to charge injection. Examples of materials for the intermediate layer having such functions include epoxy resin, polyester resin, polyamide resin, polystyrene resin, polyvinylidene chloride resin, polyvinyl acetate, polyvinyl chloride, acrylic resin, silicone resin, and fluorine resin. organic polymer compounds; trimethylmonomethoxysilane, γ-glycidoxypropyl trime! - Silane coupling agents such as xysilane and γ-methacryloxypropyltrimethoxysilane: Metal alkoxides such as titanium tetrabutoxide, aluminum tripropoxide, and zirconium tetrabutoxide; Metals such as titanium acetylacetonate and zirconium acetylacetonate As one type of acetylacetone complex, a polymer compound formed by combining two or more types can be used. The thickness of this intermediate layer is usually 10 μm or less, 1
Preferably it is 1 μm or less.
導電性支持体としては、導電体あるいは絶縁体を導電処
理したものが用いられ、たとえば、ステンレス、A I
、N i、F e、MO% Cu。As the conductive support, a conductor or an insulator treated for conductivity is used, such as stainless steel, AI
, Ni, Fe, MO% Cu.
Ti5Auなどの金属あるいは合金;ポリエステル、ポ
リカーボネート、ポリイミド、ポリアミド、ポリプロピ
レン、ガラスなどの絶縁性基体上に、Al、Ag、Au
、Pbなどの金属あるいはIn2O3,5nOzなどの
導電材料の薄膜を蒸着などの方法で形成したちの;導電
処理した紙:導電性高分子等が例示できる。導電性支持
体の形状は特に問わず、たとえば、板状、ドラム状、エ
ンドレスベルト状などが例示できる。Metals or alloys such as Ti5Au; Al, Ag, Au on insulating substrates such as polyester, polycarbonate, polyimide, polyamide, polypropylene, glass, etc.
Examples include conductive treated paper, conductive polymer, etc., in which a thin film of a metal such as Pb or a conductive material such as In2O3, 5nOz is formed by a method such as vapor deposition. The shape of the conductive support is not particularly limited, and examples thereof include a plate shape, a drum shape, and an endless belt shape.
このような表面保護層を設けた本発明の感光体は、この
表面保護層が分光透過率に優れており、感度、耐久性、
耐候性に優れ感光体作製直後から安定した充分な表面抵
抗を有する。そして、白スジ等のない鮮明なコピーが得
られ、コピー上にSeが付着することもない。The photoreceptor of the present invention provided with such a surface protective layer has excellent spectral transmittance, and has excellent sensitivity, durability,
It has excellent weather resistance and stable and sufficient surface resistance immediately after the photoreceptor is manufactured. Clear copies without white streaks etc. can be obtained, and Se will not adhere to the copies.
さらに、Se系感光体の持つ良好な特性を何−つ損うこ
ともない。Furthermore, the good properties of the Se-based photoreceptor are not impaired in any way.
又、感光体に直接手をふれても、Se系感光層が結晶化
等により劣化することがないため、取扱い等が容易にな
る。Furthermore, even if the photoreceptor is directly touched, the Se-based photosensitive layer will not deteriorate due to crystallization or the like, making handling easier.
実施例1
以下の手順に従ってAI支持体上に真空蒸着法によりA
S2Se3感光層を蒸着した。Example 1 A was deposited on an AI support by vacuum deposition according to the following procedure.
A S2Se3 photosensitive layer was deposited.
(手順)
1) 80mmφX340mm51のAI支持体ドラム
をパークレン(120℃)で2分間洗浄した。(Procedure) 1) An AI support drum of 80 mm φ x 340 mm 51 was washed with percrene (120° C.) for 2 minutes.
2)次に、5wL%Na 3 PO4水溶液(80°C
)中にて60秒間アルカリエツチングし、その後水洗を
2度行った。2) Next, 5 wL% Na 3 PO 4 aqueous solution (80 °C
) for 60 seconds and then washed twice with water.
3)次いで、80℃温水により表面乾燥を行った後、蒸
着機にセットし1O−STorrまで排気した。3) Next, after drying the surface with 80° C. hot water, it was set in a vapor deposition machine and evacuated to 10-STorr.
4)更に、蒸着源温度400℃、支持体温度200℃の
条件下で、As25ea合金を35分間支持体上に蒸着
して、膜厚約60μの感光体を得た。4) Further, an As25ea alloy was vapor-deposited on the support for 35 minutes under conditions of a vapor deposition source temperature of 400° C. and a support temperature of 200° C. to obtain a photoreceptor with a film thickness of about 60 μm.
この感光層上にジルコニウムアセチルアセトン 2重量
部、γ−メタアクリロキシプロピルトリメトキシシラン
1重量部、n−ブタノール40重量部からなる混合液
を塗布乾燥して約2000人厚の中間層を設けた。A liquid mixture consisting of 2 parts by weight of zirconium acetylacetone, 1 part by weight of γ-methacryloxypropyltrimethoxysilane, and 40 parts by weight of n-butanol was applied onto this photosensitive layer and dried to form an intermediate layer having a thickness of about 2,000 layers.
次にスチレン−メチルメタアクリレート−アクリル酸−
N−メチロールアクリルアミド[共遁合比、35/ 6
0/ 2/ 3(vt%) ]220wt%溶液溶媒ト
ルエン/n−ブタノール−97l) 500重量部とS
n (II)acac2の20vt%溶液(溶媒トルエ
ン/n−ブタノール−9/I) 100重量部とこれに
水5重量部を加えて15分間混合撹拌した。得られた溶
液を中間層まで設けた感光体上にデツピングコートし、
130℃30分乾燥硬化して表面保護層(約5μ)を有
する感光体を作製した。Next, styrene-methyl methacrylate-acrylic acid-
N-Methylolacrylamide [co-association ratio, 35/6
0/2/3(vt%)]220wt% solution solvent toluene/n-butanol-97l) 500 parts by weight and S
100 parts by weight of a 20 vt% solution of n(II)acac2 (solvent toluene/n-butanol-9/I) and 5 parts by weight of water were added and mixed and stirred for 15 minutes. The obtained solution is applied by depping coating onto the photoconductor provided with the intermediate layer.
The photoreceptor was dried and cured at 130° C. for 30 minutes to produce a photoreceptor having a surface protective layer (approximately 5 μm thick).
比較例1
酸化スズ微粉末(三菱金属製)10重量部とスチレン−
メチルメタクリレート−アクリル酸−N−メチロールア
クリルアミド共重合体(実施例1と同じ)50重量部と
適当量の溶媒を加え、ボールミルにて120時間分散し
、塗布液とした以外、実施例1と同様の感光体を作製し
た。Comparative Example 1 10 parts by weight of tin oxide fine powder (manufactured by Mitsubishi Metals) and styrene
Same as Example 1 except that 50 parts by weight of methyl methacrylate-acrylic acid-N-methylolacrylamide copolymer (same as Example 1) and an appropriate amount of solvent were added and dispersed in a ball mill for 120 hours to prepare a coating solution. A photoreceptor was fabricated.
実施例1と比較例1の静電特性と表面保護層の分光透過
率を表−1、第1図に示す。The electrostatic properties and spectral transmittance of the surface protective layer of Example 1 and Comparative Example 1 are shown in Table 1 and FIG. 1.
表−1静電特性
実施例は比較例よりも静電特性、表面保j層の分光透過
率ともすぐれた特性を示した。Table 1 Electrostatic Properties The Examples exhibited better electrostatic properties and spectral transmittance of the surface j-layer than the Comparative Examples.
又、本発明の加水分解生成物のIR吸収スペクトルを第
2図に示した。実施例のスペクトルは明らかに比較例と
異なっている。Moreover, the IR absorption spectrum of the hydrolysis product of the present invention is shown in FIG. The spectrum of the example is clearly different from that of the comparative example.
実施例2
AI支持体上に真空蒸着法により、厚さ60μのAs2
5ea感光層を形成し感光体を作成した。Example 2 As2 with a thickness of 60μ was deposited on an AI support by vacuum evaporation method.
A 5ea photosensitive layer was formed to prepare a photoreceptor.
この感光層上にジルコニウムアセチルアセトン 2重量
部、γ−メタアクリロキシプロピルトリメトキシシラン
1重瓜部、n−ブタノール40重量部からなる混合液
を塗布乾燥して約2000人厚の中間層を設けた。On this photosensitive layer, a mixed solution consisting of 2 parts by weight of zirconium acetylacetone, 1 part by weight of γ-methacryloxypropyltrimethoxysilane, and 40 parts by weight of n-butanol was applied and dried to form an intermediate layer with a thickness of about 2,000 layers. .
次にスチレン−メチルメタアクリレート−アクリル酸〜
N−メチロールアクリルアミド[共重合比、35/[i
0/ 1 /4 (wt%)320wt%溶液(溶媒ト
ルエン/n−ブタノール−9/l) 500重量部とア
セチルアセトンスズ(II)の20wt%溶液(溶媒ト
ルエン/n−ブタノール−9/l) to。Next, styrene - methyl methacrylate - acrylic acid ~
N-methylolacrylamide [copolymerization ratio, 35/[i
0/ 1 /4 (wt%) 500 parts by weight of 320 wt% solution (solvent toluene/n-butanol-9/l) and 20 wt% solution of acetylacetone tin (II) (solvent toluene/n-butanol-9/l) to .
重量部とこれに水7重量部を加えて30分間、室温で混
合撹拌した。parts by weight and 7 parts by weight of water were added thereto and mixed and stirred at room temperature for 30 minutes.
得られた分散液を中間層まで設けた感光体上にディッピ
ングコートし、130°030分乾燥硬化して表面保護
層(約5μ)を有する感光体を作製した。The resulting dispersion was dip-coated onto a photoreceptor provided up to the intermediate layer, and dried and cured at 130 degrees for 30 minutes to produce a photoreceptor having a surface protective layer (approximately 5 μm).
比較例2
酸化スズ微粉末(三菱金属製)10重量部とスチレン−
メチルメタクリレート−アクリル酸〜N−メチロールア
クリルアミド共重合体(実施例2と同じ)50重量部と
適当量の溶媒を加え、ボールミルにて120時間分散し
塗布液とした。Comparative Example 2 10 parts by weight of tin oxide fine powder (manufactured by Mitsubishi Metals) and styrene
50 parts by weight of methyl methacrylate-acrylic acid to N-methylolacrylamide copolymer (same as in Example 2) and an appropriate amount of solvent were added and dispersed in a ball mill for 120 hours to obtain a coating liquid.
他は実施例2と同様にして感光体を作成した。A photoreceptor was produced in the same manner as in Example 2 except for this.
実施例2と比較例2の静電特性を表−2に示す。The electrostatic properties of Example 2 and Comparative Example 2 are shown in Table-2.
第1°図、第2図は実施例1と比較例1の表面保護層の
分光透過率及びIR吸収スペクトルを示すグラフ。Figures 1 and 2 are graphs showing the spectral transmittance and IR absorption spectrum of the surface protective layers of Example 1 and Comparative Example 1.
第3図は実施例2の表面保護層のX線回折パターンを示
すグラフ。FIG. 3 is a graph showing the X-ray diffraction pattern of the surface protective layer of Example 2.
実施例2は比較例2よりも実施例1と同様に感度、表面
保護層の分光透過率ともすぐれた特性を示した。Similar to Example 1, Example 2 exhibited better characteristics than Comparative Example 2 in terms of sensitivity and spectral transmittance of the surface protective layer.
又、S n (II) a c a C2の加水分解生
成物のX線回折パターンを第3図に示す。回折パターン
からこの分散液がS n (II) 302 (O1+
)2を含有することがわかる。Moreover, the X-ray diffraction pattern of the hydrolysis product of S n (II) a c a C2 is shown in FIG. The diffraction pattern shows that this dispersion is S n (II) 302 (O1+
)2.
[効 果]
以上の説明から明らがなように、本発明の構成による感
光体は、保護層が分光率に優れており、高感度、高帯電
性等にすぐれた静電特性を有するものである。[Effects] As is clear from the above description, the photoreceptor according to the present invention has a protective layer with excellent spectral ratio, and has excellent electrostatic properties such as high sensitivity and high chargeability. It is.
Claims (2)
を順次積層した電子写真感光体における表面保護層の製
造法において、この保護層を有機スズ化合物を含有させ
た樹脂液中に水を添加して、生成させたスズ酸化物又は
/および水酸基を含むスズ酸化物を含有する組成物を塗
布し乾燥硬化させることにより形成することを特徴とす
る上記保護層の製造方法。(1) In a method for producing a surface protective layer in an electrophotographic photoreceptor in which a photosensitive layer, an intermediate layer, and a surface protective layer are sequentially laminated on a conductive support, this protective layer is placed in a resin solution containing an organic tin compound. A method for producing the above-mentioned protective layer, characterized in that it is formed by adding water, applying a composition containing produced tin oxide or/and tin oxide containing a hydroxyl group, and drying and curing the composition.
を順次積層した電子写真感光体において、保護層が高分
子化合物結着材中に Sn_3(II)O_2(OH)_2の粒子を分散した層
であることを特徴とする電子写真感光体。(2) In an electrophotographic photoreceptor in which a photosensitive layer, an intermediate layer, and a surface protective layer are sequentially laminated on a conductive support, the protective layer includes particles of Sn_3(II)O_2(OH)_2 in a polymer compound binder. An electrophotographic photoreceptor characterized by being a layer in which are dispersed.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9826388A JPH02875A (en) | 1988-02-04 | 1988-04-22 | Production of protective layer of electrophotographic sensitive body |
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP63-22932 | 1988-02-04 | ||
JP2293288 | 1988-02-04 | ||
JP9826388A JPH02875A (en) | 1988-02-04 | 1988-04-22 | Production of protective layer of electrophotographic sensitive body |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH02875A true JPH02875A (en) | 1990-01-05 |
Family
ID=26360231
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP9826388A Pending JPH02875A (en) | 1988-02-04 | 1988-04-22 | Production of protective layer of electrophotographic sensitive body |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH02875A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02207268A (en) * | 1989-02-08 | 1990-08-16 | Fuji Xerox Co Ltd | Electrophotographic sensitive body |
-
1988
- 1988-04-22 JP JP9826388A patent/JPH02875A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02207268A (en) * | 1989-02-08 | 1990-08-16 | Fuji Xerox Co Ltd | Electrophotographic sensitive body |
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